ES344947A1 - Metodo y aparato para producir y mantener un plasma gaseo- so. - Google Patents
Metodo y aparato para producir y mantener un plasma gaseo- so.Info
- Publication number
- ES344947A1 ES344947A1 ES344947A ES344947A ES344947A1 ES 344947 A1 ES344947 A1 ES 344947A1 ES 344947 A ES344947 A ES 344947A ES 344947 A ES344947 A ES 344947A ES 344947 A1 ES344947 A1 ES 344947A1
- Authority
- ES
- Spain
- Prior art keywords
- gas
- plasma
- substrate
- contacted
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011261 inert gas Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000005546 reactive sputtering Methods 0.000 title 1
- 238000005477 sputtering target Methods 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 8
- 230000001681 protective effect Effects 0.000 abstract 3
- 239000000376 reactant Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 229910003691 SiBr Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- 230000002459 sustained effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/158—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S422/00—Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
- Y10S422/906—Plasma or ion generation means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Packages (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US57945266A | 1966-09-01 | 1966-09-01 | |
| US64109567A | 1967-04-28 | 1967-04-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES344947A1 true ES344947A1 (es) | 1968-11-01 |
Family
ID=27077766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES344947A Expired ES344947A1 (es) | 1966-09-01 | 1967-08-30 | Metodo y aparato para producir y mantener un plasma gaseo- so. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US3484358A (enEXAMPLES) |
| BE (1) | BE700937A (enEXAMPLES) |
| BR (1) | BR6792541D0 (enEXAMPLES) |
| CH (1) | CH468769A (enEXAMPLES) |
| DE (1) | DE1639042B2 (enEXAMPLES) |
| ES (1) | ES344947A1 (enEXAMPLES) |
| GB (1) | GB1202572A (enEXAMPLES) |
| IL (1) | IL28232A (enEXAMPLES) |
| MY (1) | MY7100087A (enEXAMPLES) |
| NL (1) | NL142016B (enEXAMPLES) |
| NO (1) | NO123048B (enEXAMPLES) |
| SE (1) | SE317237B (enEXAMPLES) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3664895A (en) * | 1969-06-13 | 1972-05-23 | Gen Electric | Method of forming a camera tube diode array target by masking and diffusion |
| FR2129996B1 (enEXAMPLES) * | 1971-03-25 | 1975-01-17 | Centre Nat Etd Spatiales | |
| SE435998B (sv) * | 1983-03-28 | 1984-11-05 | Skf Steel Eng Ab | Sett for uppvermning av for industriella processer avsedd processluft |
| US4579609A (en) * | 1984-06-08 | 1986-04-01 | Massachusetts Institute Of Technology | Growth of epitaxial films by chemical vapor deposition utilizing a surface cleaning step immediately before deposition |
| US4961832A (en) * | 1989-03-14 | 1990-10-09 | Shagun Vladimir A | Apparatus for applying film coatings onto substrates in vacuum |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3051639A (en) * | 1958-09-25 | 1962-08-28 | Union Carbide Corp | Arc torch chemical reactions |
| GB915771A (en) * | 1959-01-12 | 1963-01-16 | Ici Ltd | Method of conducting gaseous chemical reactions |
| US3294669A (en) * | 1963-07-22 | 1966-12-27 | Bell Telephone Labor Inc | Apparatus for sputtering in a highly purified gas atmosphere |
| US3390980A (en) * | 1964-01-20 | 1968-07-02 | Mhd Res Inc | Method of producing beryllium halides from beryllium ore in a high intensity ore |
-
1967
- 1967-04-28 US US641095A patent/US3484358A/en not_active Expired - Lifetime
- 1967-06-30 NO NO168880A patent/NO123048B/no unknown
- 1967-07-02 IL IL28232A patent/IL28232A/xx unknown
- 1967-07-05 BE BE700937D patent/BE700937A/xx unknown
- 1967-07-24 NL NL676710208A patent/NL142016B/xx unknown
- 1967-08-09 DE DE19671639042 patent/DE1639042B2/de active Pending
- 1967-08-17 GB GB37929/67A patent/GB1202572A/en not_active Expired
- 1967-08-30 BR BR192541/67A patent/BR6792541D0/pt unknown
- 1967-08-30 ES ES344947A patent/ES344947A1/es not_active Expired
- 1967-08-31 SE SE12111/67A patent/SE317237B/xx unknown
- 1967-09-01 CH CH1226967A patent/CH468769A/de unknown
-
1971
- 1971-12-30 MY MY87/71A patent/MY7100087A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL142016B (nl) | 1974-04-16 |
| NO123048B (enEXAMPLES) | 1971-09-20 |
| DE1639042B2 (de) | 1971-05-19 |
| IL28232A (en) | 1970-10-30 |
| SE317237B (enEXAMPLES) | 1969-11-10 |
| MY7100087A (en) | 1971-12-31 |
| CH468769A (de) | 1969-02-15 |
| BR6792541D0 (pt) | 1973-06-26 |
| GB1202572A (en) | 1970-08-19 |
| DE1639042A1 (de) | 1970-02-26 |
| NL6710208A (enEXAMPLES) | 1968-03-04 |
| US3484358A (en) | 1969-12-16 |
| BE700937A (enEXAMPLES) | 1967-12-18 |
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