ES310007A1 - Un dispositivo de efecto de campo de estado solido. - Google Patents

Un dispositivo de efecto de campo de estado solido.

Info

Publication number
ES310007A1
ES310007A1 ES0310007A ES310007A ES310007A1 ES 310007 A1 ES310007 A1 ES 310007A1 ES 0310007 A ES0310007 A ES 0310007A ES 310007 A ES310007 A ES 310007A ES 310007 A1 ES310007 A1 ES 310007A1
Authority
ES
Spain
Prior art keywords
translation
machine
field effect
legally binding
google translate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES0310007A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Radio Corporation of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp, Radio Corporation of America filed Critical RCA Corp
Publication of ES310007A1 publication Critical patent/ES310007A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92—Capacitors having potential barriers
    • H01L29/94—Metal-insulator-semiconductors, e.g. MOS

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
ES0310007A 1964-03-03 1965-03-02 Un dispositivo de efecto de campo de estado solido. Expired ES310007A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US349090A US3304469A (en) 1964-03-03 1964-03-03 Field effect solid state device having a partially insulated electrode

Publications (1)

Publication Number Publication Date
ES310007A1 true ES310007A1 (es) 1965-06-01

Family

ID=23370864

Family Applications (1)

Application Number Title Priority Date Filing Date
ES0310007A Expired ES310007A1 (es) 1964-03-03 1965-03-02 Un dispositivo de efecto de campo de estado solido.

Country Status (6)

Country Link
US (1) US3304469A (es)
DE (1) DE1514339B1 (es)
ES (1) ES310007A1 (es)
FR (1) FR1425906A (es)
GB (1) GB1099381A (es)
NL (1) NL6502611A (es)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3523188A (en) * 1965-12-20 1970-08-04 Xerox Corp Semiconductor current control device and method
US3700976A (en) * 1970-11-02 1972-10-24 Hughes Aircraft Co Insulated gate field effect transistor adapted for microwave applications
DE2321797C3 (de) * 1973-04-30 1981-12-17 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Sperrschicht-Feldeffekttransistor
US4065781A (en) * 1974-06-21 1977-12-27 Westinghouse Electric Corporation Insulated-gate thin film transistor with low leakage current
US4040073A (en) * 1975-08-29 1977-08-02 Westinghouse Electric Corporation Thin film transistor and display panel using the transistor
US4127860A (en) * 1977-04-18 1978-11-28 Rca Corporation Integrated circuit mesa bipolar device on insulating substrate incorporating Schottky barrier contact
US4169746A (en) * 1977-04-28 1979-10-02 Rca Corp. Method for making silicon on sapphire transistor utilizing predeposition of leads
FR2484141A1 (fr) * 1980-06-06 1981-12-11 Thomson Csf Element bipolaire a conduction non lineaire, et dispositif a commutation, de visualisation notamment, incorporant un tel element
EP0055032B1 (en) * 1980-12-23 1986-04-23 National Research Development Corporation Field effect transistors
GB2122419B (en) * 1982-04-30 1986-10-22 Suwa Seikosha Kk A thin film transistor and an active matrix liquid crystal display device
GB2140203B (en) * 1983-03-15 1987-01-14 Canon Kk Thin film transistor with wiring layer continuous with the source and drain
US4547789A (en) * 1983-11-08 1985-10-15 Energy Conversion Devices, Inc. High current thin film transistor
US5242844A (en) * 1983-12-23 1993-09-07 Sony Corporation Semiconductor device with polycrystalline silicon active region and method of fabrication thereof
US5172203A (en) * 1983-12-23 1992-12-15 Sony Corporation Semiconductor device with polycrystalline silicon active region and method of fabrication thereof
US5162892A (en) * 1983-12-24 1992-11-10 Sony Corporation Semiconductor device with polycrystalline silicon active region and hydrogenated passivation layer
US4668968A (en) * 1984-05-14 1987-05-26 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4673957A (en) * 1984-05-14 1987-06-16 Energy Conversion Devices, Inc. Integrated circuit compatible thin film field effect transistor and method of making same
US4670763A (en) * 1984-05-14 1987-06-02 Energy Conversion Devices, Inc. Thin film field effect transistor
US4769338A (en) * 1984-05-14 1988-09-06 Energy Conversion Devices, Inc. Thin film field effect transistor and method of making same
US4727044A (en) 1984-05-18 1988-02-23 Semiconductor Energy Laboratory Co., Ltd. Method of making a thin film transistor with laser recrystallized source and drain
JPH0215652A (ja) * 1988-07-01 1990-01-19 Mitsubishi Electric Corp 半導体装置及びその製造方法
TW215967B (en) * 1992-01-17 1993-11-11 Seiko Electron Co Ltd MOS Poly-Si thin film transistor with a flattened channel interface and method of producing same
EP2380202B1 (en) 2008-12-24 2016-02-17 3M Innovative Properties Company Stability enhancements in metal oxide semiconductor thin film transistors

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE968911C (de) * 1949-06-14 1958-04-10 Licentia Gmbh Elektrisch steuerbarer Trockengleichrichter und Verfahren zu seiner Herstellung
FR1037293A (fr) * 1951-05-19 1953-09-15 Licentia Gmbh Redresseur sec à contrôle électrique et son procédé de fabrication
US2900531A (en) * 1957-02-28 1959-08-18 Rca Corp Field-effect transistor
BE572049A (es) * 1957-12-03 1900-01-01
FR1191404A (fr) * 1958-02-10 1959-10-20 Ct D Etudes Et De Dev De L Ele Procédé de réalisation de diodes et produits industriels en résultant
US3097308A (en) * 1959-03-09 1963-07-09 Rca Corp Semiconductor device with surface electrode producing electrostatic field and circuits therefor
NL123574C (es) * 1959-05-27
NL257516A (es) * 1959-11-25
US3094650A (en) * 1960-04-22 1963-06-18 Servomechanisms Inc Method of making multiple layer condensers by vapor deposition and product thereof
US3237061A (en) * 1961-07-26 1966-02-22 Columbia Broadcasting Syst Inc Semiconductor device having exposed semiconductor surface and method of manufacture
US3254276A (en) * 1961-11-29 1966-05-31 Philco Corp Solid-state translating device with barrier-layers formed by thin metal and semiconductor material
IT699934A (es) * 1962-06-29
US3184659A (en) * 1962-08-13 1965-05-18 Gen Telephone & Elect Tunnel cathode having a metal grid structure

Also Published As

Publication number Publication date
US3304469A (en) 1967-02-14
DE1514339B1 (de) 1970-03-26
FR1425906A (fr) 1966-01-24
GB1099381A (en) 1968-01-17
NL6502611A (es) 1965-09-06

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