ES301501A1 - Método de fabricacion de un dispositivo fotosensible - Google Patents
Método de fabricacion de un dispositivo fotosensibleInfo
- Publication number
- ES301501A1 ES301501A1 ES0301501A ES301501A ES301501A1 ES 301501 A1 ES301501 A1 ES 301501A1 ES 0301501 A ES0301501 A ES 0301501A ES 301501 A ES301501 A ES 301501A ES 301501 A1 ES301501 A1 ES 301501A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- photosensitive
- intrinsic
- oxygen
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000007789 gas Substances 0.000 abstract 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 3
- 230000008020 evaporation Effects 0.000 abstract 3
- 238000001704 evaporation Methods 0.000 abstract 3
- 239000001301 oxygen Substances 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 238000005137 deposition process Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000010348 incorporation Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/085—Oxides of iron group metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
- H01J29/451—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
- H01J29/456—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions exhibiting no discontinuities, e.g. consisting of uniform layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
- H01L21/08—Preparation of the foundation plate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL63290119A NL147573B (nl) | 1963-03-12 | 1963-03-12 | Werkwijze voor het vervaardigen van een beeldopneembuis met een in hoofdzaak uit loodmonoxyde (pb0) bestaande trefplaat met p-i-n-structuur en beeldopneembuis vervaardigd door toepassing van deze werkwijze. |
Publications (1)
Publication Number | Publication Date |
---|---|
ES301501A1 true ES301501A1 (es) | 1965-01-16 |
Family
ID=19754515
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES0297429A Expired ES297429A1 (es) | 1963-03-12 | 1964-03-10 | Dispositivo fotosensible |
ES0301501A Expired ES301501A1 (es) | 1963-03-12 | 1964-06-27 | Método de fabricacion de un dispositivo fotosensible |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES0297429A Expired ES297429A1 (es) | 1963-03-12 | 1964-03-10 | Dispositivo fotosensible |
Country Status (12)
Country | Link |
---|---|
US (2) | US3372056A (es) |
JP (1) | JPS4212098B1 (es) |
AT (1) | AT247431B (es) |
BE (1) | BE645119A (es) |
CH (1) | CH441430A (es) |
DE (1) | DE1489147A1 (es) |
DK (1) | DK119469B (es) |
ES (2) | ES297429A1 (es) |
FR (1) | FR1389809A (es) |
NL (2) | NL147573B (es) |
NO (1) | NO118670B (es) |
SE (1) | SE322584B (es) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6500458A (es) * | 1965-01-15 | 1966-07-18 | ||
GB1215298A (en) * | 1967-03-31 | 1970-12-09 | Emi Ltd | Improvements in or relating to photoconductive members |
NL6710185A (es) * | 1967-07-22 | 1969-01-24 | ||
US3585430A (en) * | 1968-08-23 | 1971-06-15 | Rca Corp | Gallium arsenide phosphide camera tube target having a semi-insulating layer on the scanned surface |
NL6908066A (es) * | 1969-05-27 | 1970-12-01 | ||
US3668389A (en) * | 1969-09-19 | 1972-06-06 | United Aircraft Corp | Photosensitive device comprising photoconductive and photovoltaic layers |
NL6919053A (es) * | 1969-12-19 | 1971-06-22 | ||
US3909308A (en) * | 1974-08-19 | 1975-09-30 | Rca Corp | Production of lead monoxide coated vidicon target |
US4001099A (en) * | 1976-03-03 | 1977-01-04 | Rca Corporation | Photosensitive camera tube target primarily of lead monoxide |
US4150165A (en) * | 1976-06-04 | 1979-04-17 | Nippon Electric Co., Ltd. | Lead monoxide target and method of manufacturing same |
US4099199A (en) * | 1977-04-29 | 1978-07-04 | University Of Southern California | Photovoltaic cell employing a PbO-SnO heterojunction |
US4704635A (en) * | 1984-12-18 | 1987-11-03 | Sol Nudelman | Large capacity, large area video imaging sensor |
US7318958B2 (en) * | 2001-11-30 | 2008-01-15 | General Electric Company | Weatherable multilayer articles and method for their preparation |
US8057903B2 (en) * | 2001-11-30 | 2011-11-15 | Sabic Innovative Plastics Ip B.V. | Multilayer articles comprising resorcinol arylate polyester and method for making thereof |
EP1316419A3 (en) * | 2001-11-30 | 2004-01-28 | General Electric Company | Weatherable multilayer articles and method for their preparation |
US7270882B2 (en) * | 2003-02-21 | 2007-09-18 | General Electric Company | Weatherable multilayer articles and method for their preparation |
KR20050106447A (ko) * | 2003-02-21 | 2005-11-09 | 제너럴 일렉트릭 캄파니 | 내후성 다층 제품 및 그의 제조 방법 |
US20040253428A1 (en) * | 2003-06-12 | 2004-12-16 | General Electric Company | Weatherable multilayer articles and method for their preparation |
US20050144309A1 (en) * | 2003-12-16 | 2005-06-30 | Intel Corporation, A Delaware Corporation | Systems and methods for controlling congestion using a time-stamp |
US7153576B2 (en) * | 2004-01-20 | 2006-12-26 | General Electric Company | Weatherable multilayer article assemblies and method for their preparation |
US7649179B2 (en) * | 2005-02-08 | 2010-01-19 | Koninklijke Philips Electronics N.V. | Lead oxide based photosensitive device and its manufacturing method |
CA3012494C (en) * | 2016-02-08 | 2022-09-20 | Thunder Bay Regional Health Research Institute | Amorphous lead oxide based energy detection devices and methods of manufacture thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3003075A (en) * | 1950-12-05 | 1961-10-03 | Rca Corp | Infra-red sensitive devices |
NL88863C (es) * | 1953-06-13 | |||
NL225292A (es) * | 1957-02-26 |
-
0
- NL NL290119D patent/NL290119A/xx unknown
-
1963
- 1963-03-12 NL NL63290119A patent/NL147573B/xx not_active IP Right Cessation
-
1964
- 1964-03-09 DE DE19641489147 patent/DE1489147A1/de active Pending
- 1964-03-09 DK DK118364AA patent/DK119469B/da unknown
- 1964-03-09 NO NO152356A patent/NO118670B/no unknown
- 1964-03-09 CH CH298464A patent/CH441430A/de unknown
- 1964-03-09 AT AT200664A patent/AT247431B/de active
- 1964-03-10 ES ES0297429A patent/ES297429A1/es not_active Expired
- 1964-03-10 US US350713A patent/US3372056A/en not_active Expired - Lifetime
- 1964-03-12 JP JP1360364A patent/JPS4212098B1/ja active Pending
- 1964-03-12 BE BE645119A patent/BE645119A/xx unknown
- 1964-03-12 FR FR967119A patent/FR1389809A/fr not_active Expired
- 1964-03-12 SE SE3108/64A patent/SE322584B/xx unknown
- 1964-06-27 ES ES0301501A patent/ES301501A1/es not_active Expired
-
1967
- 1967-10-18 US US676198A patent/US3444412A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CH441430A (de) | 1967-08-15 |
BE645119A (es) | 1964-09-14 |
NL147573B (nl) | 1975-10-15 |
US3372056A (en) | 1968-03-05 |
ES297429A1 (es) | 1964-09-01 |
DE1489147B2 (es) | 1970-10-29 |
FR1389809A (fr) | 1965-02-19 |
DK119469B (da) | 1971-01-11 |
JPS4212098B1 (es) | 1967-07-10 |
SE322584B (es) | 1970-04-13 |
NO118670B (es) | 1970-01-26 |
DE1489147A1 (de) | 1969-01-16 |
NL290119A (es) | |
US3444412A (en) | 1969-05-13 |
AT247431B (de) | 1966-06-10 |
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