ES2526596T3 - Placa de soporte fotoconductora referenciada a un centro - Google Patents

Placa de soporte fotoconductora referenciada a un centro Download PDF

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Publication number
ES2526596T3
ES2526596T3 ES11801458.8T ES11801458T ES2526596T3 ES 2526596 T3 ES2526596 T3 ES 2526596T3 ES 11801458 T ES11801458 T ES 11801458T ES 2526596 T3 ES2526596 T3 ES 2526596T3
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ES
Spain
Prior art keywords
respect
central axis
central
loading roller
support plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES11801458.8T
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English (en)
Inventor
Jarrett Clark Gayne
David Keith Schattner
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Lexmark International Inc
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Lexmark International Inc
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Filing date
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/005—Transport systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/75—Details relating to xerographic drum, band or plate, e.g. replacing, testing
    • G03G15/751—Details relating to xerographic drum, band or plate, e.g. replacing, testing relating to drum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/0005—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge for removing solid developer or debris from the electrographic recording medium
    • G03G21/0011—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge for removing solid developer or debris from the electrographic recording medium using a blade; Details of cleaning blades, e.g. blade shape, layer forming
    • G03G21/0029—Details relating to the blade support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1642—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements for connecting the different parts of the apparatus
    • G03G21/1647—Mechanical connection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G03G21/1671—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus for the photosensitive element
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G03G21/169—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus for the cleaning unit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/18—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements using a processing cartridge, whereby the process cartridge comprises at least two image processing means in a single unit
    • G03G21/1803—Arrangements or disposition of the complete process cartridge or parts thereof
    • G03G21/1814—Details of parts of process cartridge, e.g. for charging, transfer, cleaning, developing

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electrophotography Configuration And Component (AREA)
  • Discharging, Photosensitive Material Shape In Electrophotography (AREA)
  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Cleaning In Electrography (AREA)

Abstract

Una placa de soporte (100a, 100b) adaptada para soportar rotatoriamente un tambor fotoconductor (20) que tiene un árbol central (24), comprendiendo: un cuerpo (102) que tiene un primer lado (104a), un segundo lado (104b), una superficie de borde (104c) entre el primero y segundo lados, y un orificio central (106) que se extiende a través del cuerpo desde el primer lado (104a) hasta el segundo lado (104b) adaptado para recibir rotatoriamente un extremo del árbol central y referenciar posicionalmente una superficie exterior (23) del tambor fotoconductor con respecto a un eje central (107) del orificio central; y un brazo de soporte (108) que se extiende desde el cuerpo (102); caracterizada por que el brazo de soporte tiene dispuesta una superficie de montaje (110) adaptada para montar un rodillo de carga (62), teniendo el rodillo de carga un árbol central (64) posicionalmente referenciado con respecto al eje central (107), y adaptado para montar una cuchilla de limpieza (42), adaptada para retirar tóner de la superficie exterior (23) del tambor fotoconductor (20), posicionalmente referenciado con respecto al eje central (107); comprendiendo la superficie de borde (104c) la superficie de montaje que se extiende en una dirección no radial con respecto al eje central (107); un dispositivo de alineación (114) formado en la superficie de montaje (110) del brazo de soporte (108) adaptado para ser aplicado cooperativamente a medios de montaje (50) del rodillo de carga (62) y a la cuchilla de limpieza (42) y a alinear el rodillo de carga y la cuchilla de limpieza con respecto al eje central (107).

Description

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Claims (1)

  1. imagen1
ES11801458.8T 2010-06-30 2011-06-30 Placa de soporte fotoconductora referenciada a un centro Active ES2526596T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US827775 2010-06-30
US12/827,775 US8380106B2 (en) 2010-06-30 2010-06-30 Center-referenced photoconductor bearing plate and assembly for electro-photographic cartridge
PCT/US2011/042710 WO2012003400A1 (en) 2010-06-30 2011-06-30 Center-referenced photoconductor bearing plate and assembly for electro-photographic cartridge

Publications (1)

Publication Number Publication Date
ES2526596T3 true ES2526596T3 (es) 2015-01-13

Family

ID=45399803

Family Applications (1)

Application Number Title Priority Date Filing Date
ES11801458.8T Active ES2526596T3 (es) 2010-06-30 2011-06-30 Placa de soporte fotoconductora referenciada a un centro

Country Status (21)

Country Link
US (1) US8380106B2 (es)
EP (1) EP2588922B1 (es)
KR (1) KR101351055B1 (es)
CN (1) CN102906644B (es)
AR (1) AR082055A1 (es)
AU (1) AU2011272795B2 (es)
BR (1) BR112012033122A2 (es)
CA (1) CA2792897C (es)
CL (1) CL2012002659A1 (es)
CO (1) CO6612280A2 (es)
ES (1) ES2526596T3 (es)
HK (1) HK1185669A1 (es)
IL (1) IL221898A (es)
MX (1) MX2012010858A (es)
NZ (1) NZ602354A (es)
PL (1) PL2588922T3 (es)
RU (1) RU2529731C1 (es)
SG (1) SG186051A1 (es)
TW (1) TWI416284B (es)
UY (1) UY33475A (es)
WO (1) WO2012003400A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100047675A (ko) * 2008-10-29 2010-05-10 삼성전자주식회사 피대전체용 대전부재 조립체 및 이를 구비한 화상형성장치용 대전장치
TWI453125B (zh) * 2011-07-27 2014-09-21 Cal Comp Electronics & Comm Co 軸套及事務機
US11126138B2 (en) 2019-08-28 2021-09-21 Lexmark International, Inc. Bushing assembly for an electrophotographic image forming device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6249661B1 (en) 1993-12-08 2001-06-19 Ricoh Company, Ltd. Device for supporting an image carrier included in an image forming apparatus
US5457520A (en) 1994-07-14 1995-10-10 Xerox Corporation Dual snap fit bearing
JPH09146411A (ja) * 1995-11-21 1997-06-06 Mita Ind Co Ltd ドラムユニット及びドラムユニットに用いられるアース板
JP3633258B2 (ja) * 1998-01-20 2005-03-30 セイコーエプソン株式会社 画像形成装置およびこれに用いる感光体カートリッジ
JP3320399B2 (ja) * 1999-05-20 2002-09-03 キヤノン株式会社 プロセスカートリッジ及びプロセスカートリッジの組み立て方法及び電子写真画像形成装置
JP3293818B2 (ja) * 1999-05-20 2002-06-17 キヤノン株式会社 プロセスカートリッジ及び電子写真画像形成装置
JP2004039125A (ja) * 2002-07-04 2004-02-05 Sony Corp 光記録再生装置、焦点制御方法
JP4439994B2 (ja) * 2003-05-14 2010-03-24 キヤノン株式会社 画像形成装置及びカートリッジ、カートリッジに搭載される記憶装置
JP4126254B2 (ja) 2003-06-30 2008-07-30 株式会社リコー 画像形成装置
JP4906251B2 (ja) * 2003-08-29 2012-03-28 株式会社リコー プロセスカートリッジ及び画像形成装置
US7340198B2 (en) * 2004-09-07 2008-03-04 Ricoh Company, Ltd. Process cartridge and image forming apparatus for reducing the effect of external forces
JP4494137B2 (ja) * 2004-09-07 2010-06-30 株式会社リコー プロセスカートリッジ及びそのプロセスカートリッジを有する画像形成装置
JP4496111B2 (ja) 2005-03-14 2010-07-07 株式会社リコー ユニットおよび画像形成装置
US7247827B1 (en) * 2006-05-31 2007-07-24 Academia Sinica System for measurement of the height, angle and their variations of the surface of an object
KR20080073593A (ko) * 2007-02-06 2008-08-11 삼성전자주식회사 화상형성장치
JP4451456B2 (ja) 2007-02-22 2010-04-14 株式会社沖データ 現像装置及び画像形成装置
JP4440295B2 (ja) * 2007-10-31 2010-03-24 キヤノン株式会社 プロセスカートリッジの再生産方法
JP4986948B2 (ja) * 2008-07-31 2012-07-25 キヤノン株式会社 プロセスカートリッジ及びプロセスカートリッジからマグネットローラを取り外すマグネットローラの取り外し方法

Also Published As

Publication number Publication date
CA2792897C (en) 2014-01-07
CO6612280A2 (es) 2013-02-01
US8380106B2 (en) 2013-02-19
US20120003004A1 (en) 2012-01-05
AR082055A1 (es) 2012-11-07
KR20130051933A (ko) 2013-05-21
CA2792897A1 (en) 2012-01-05
CN102906644B (zh) 2014-06-04
RU2529731C1 (ru) 2014-09-27
EP2588922A4 (en) 2013-12-18
UY33475A (es) 2012-01-31
TW201232198A (en) 2012-08-01
TWI416284B (zh) 2013-11-21
MX2012010858A (es) 2013-03-20
HK1185669A1 (en) 2014-02-21
NZ602354A (en) 2014-05-30
WO2012003400A1 (en) 2012-01-05
PL2588922T3 (pl) 2015-04-30
EP2588922A1 (en) 2013-05-08
RU2012142545A (ru) 2014-08-10
AU2011272795A1 (en) 2012-10-04
AU2011272795B2 (en) 2013-08-15
SG186051A1 (en) 2013-01-30
CL2012002659A1 (es) 2013-05-24
CN102906644A (zh) 2013-01-30
IL221898A (en) 2013-11-28
EP2588922B1 (en) 2014-11-19
KR101351055B1 (ko) 2014-01-10
BR112012033122A2 (pt) 2018-02-27

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