CL2012002659A1 - Placa soporte para soportar de manera giratoria un tambor fotoconductor que comprende un brazo de soporta para montar un rodillo de carga y una hoja de limpieza para retirar to9ner, y un dispositivo de alineacion fromado en el brazo de soporte para alinear el rodillo y la hoja de limpieza a un eje central de la placa. - Google Patents

Placa soporte para soportar de manera giratoria un tambor fotoconductor que comprende un brazo de soporta para montar un rodillo de carga y una hoja de limpieza para retirar to9ner, y un dispositivo de alineacion fromado en el brazo de soporte para alinear el rodillo y la hoja de limpieza a un eje central de la placa.

Info

Publication number
CL2012002659A1
CL2012002659A1 CL2012002659A CL2012002659A CL2012002659A1 CL 2012002659 A1 CL2012002659 A1 CL 2012002659A1 CL 2012002659 A CL2012002659 A CL 2012002659A CL 2012002659 A CL2012002659 A CL 2012002659A CL 2012002659 A1 CL2012002659 A1 CL 2012002659A1
Authority
CL
Chile
Prior art keywords
support
cleaning
plate
sheet
support arm
Prior art date
Application number
CL2012002659A
Other languages
English (en)
Inventor
Jarrett Clark Gayne
David Keith Schattner
Original Assignee
Lexmark Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lexmark Int Inc filed Critical Lexmark Int Inc
Publication of CL2012002659A1 publication Critical patent/CL2012002659A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/005—Transport systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/75—Details relating to xerographic drum, band or plate, e.g. replacing, testing
    • G03G15/751—Details relating to xerographic drum, band or plate, e.g. replacing, testing relating to drum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/0005—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge for removing solid developer or debris from the electrographic recording medium
    • G03G21/0011—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge for removing solid developer or debris from the electrographic recording medium using a blade; Details of cleaning blades, e.g. blade shape, layer forming
    • G03G21/0029—Details relating to the blade support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1642—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements for connecting the different parts of the apparatus
    • G03G21/1647—Mechanical connection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G03G21/1671—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus for the photosensitive element
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/1661—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus
    • G03G21/169—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements means for handling parts of the apparatus in the apparatus for the cleaning unit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
    • G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
    • G03G21/18—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements using a processing cartridge, whereby the process cartridge comprises at least two image processing means in a single unit
    • G03G21/1803—Arrangements or disposition of the complete process cartridge or parts thereof
    • G03G21/1814—Details of parts of process cartridge, e.g. for charging, transfer, cleaning, developing

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electrophotography Configuration And Component (AREA)
  • Discharging, Photosensitive Material Shape In Electrophotography (AREA)
  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • Cleaning In Electrography (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)

Abstract

Placa soporte para soportar giratoriamente un tambor fotoconductor que posee un árbol central, un cuerpo con un primer y segundo lado, una superficie de borde y un orificio central, un brazo de soporte que se extiende desde la superficie de borde en una dirección no radial que tiene una superficie de montaje para recibir un componente adicional referenciado con un eje central; y conjunto.
CL2012002659A 2010-06-30 2012-09-25 Placa soporte para soportar de manera giratoria un tambor fotoconductor que comprende un brazo de soporta para montar un rodillo de carga y una hoja de limpieza para retirar to9ner, y un dispositivo de alineacion fromado en el brazo de soporte para alinear el rodillo y la hoja de limpieza a un eje central de la placa. CL2012002659A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/827,775 US8380106B2 (en) 2010-06-30 2010-06-30 Center-referenced photoconductor bearing plate and assembly for electro-photographic cartridge

Publications (1)

Publication Number Publication Date
CL2012002659A1 true CL2012002659A1 (es) 2013-05-24

Family

ID=45399803

Family Applications (1)

Application Number Title Priority Date Filing Date
CL2012002659A CL2012002659A1 (es) 2010-06-30 2012-09-25 Placa soporte para soportar de manera giratoria un tambor fotoconductor que comprende un brazo de soporta para montar un rodillo de carga y una hoja de limpieza para retirar to9ner, y un dispositivo de alineacion fromado en el brazo de soporte para alinear el rodillo y la hoja de limpieza a un eje central de la placa.

Country Status (21)

Country Link
US (1) US8380106B2 (es)
EP (1) EP2588922B1 (es)
KR (1) KR101351055B1 (es)
CN (1) CN102906644B (es)
AR (1) AR082055A1 (es)
AU (1) AU2011272795B2 (es)
BR (1) BR112012033122A2 (es)
CA (1) CA2792897C (es)
CL (1) CL2012002659A1 (es)
CO (1) CO6612280A2 (es)
ES (1) ES2526596T3 (es)
HK (1) HK1185669A1 (es)
IL (1) IL221898A (es)
MX (1) MX2012010858A (es)
NZ (1) NZ602354A (es)
PL (1) PL2588922T3 (es)
RU (1) RU2529731C1 (es)
SG (1) SG186051A1 (es)
TW (1) TWI416284B (es)
UY (1) UY33475A (es)
WO (1) WO2012003400A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100047675A (ko) * 2008-10-29 2010-05-10 삼성전자주식회사 피대전체용 대전부재 조립체 및 이를 구비한 화상형성장치용 대전장치
TWI453125B (zh) * 2011-07-27 2014-09-21 Cal Comp Electronics & Comm Co 軸套及事務機
US11126138B2 (en) 2019-08-28 2021-09-21 Lexmark International, Inc. Bushing assembly for an electrophotographic image forming device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6249661B1 (en) 1993-12-08 2001-06-19 Ricoh Company, Ltd. Device for supporting an image carrier included in an image forming apparatus
US5457520A (en) 1994-07-14 1995-10-10 Xerox Corporation Dual snap fit bearing
JPH09146411A (ja) 1995-11-21 1997-06-06 Mita Ind Co Ltd ドラムユニット及びドラムユニットに用いられるアース板
JP3633258B2 (ja) * 1998-01-20 2005-03-30 セイコーエプソン株式会社 画像形成装置およびこれに用いる感光体カートリッジ
JP3293818B2 (ja) * 1999-05-20 2002-06-17 キヤノン株式会社 プロセスカートリッジ及び電子写真画像形成装置
JP3320399B2 (ja) 1999-05-20 2002-09-03 キヤノン株式会社 プロセスカートリッジ及びプロセスカートリッジの組み立て方法及び電子写真画像形成装置
JP2004039125A (ja) * 2002-07-04 2004-02-05 Sony Corp 光記録再生装置、焦点制御方法
JP4439994B2 (ja) * 2003-05-14 2010-03-24 キヤノン株式会社 画像形成装置及びカートリッジ、カートリッジに搭載される記憶装置
JP4126254B2 (ja) * 2003-06-30 2008-07-30 株式会社リコー 画像形成装置
JP4906251B2 (ja) * 2003-08-29 2012-03-28 株式会社リコー プロセスカートリッジ及び画像形成装置
JP4494137B2 (ja) * 2004-09-07 2010-06-30 株式会社リコー プロセスカートリッジ及びそのプロセスカートリッジを有する画像形成装置
EP1635230B1 (en) * 2004-09-07 2013-11-06 Ricoh Company, Ltd. Process cartridge with means to reduce vibration of a gear and image forming apparatus.
JP4496111B2 (ja) * 2005-03-14 2010-07-07 株式会社リコー ユニットおよび画像形成装置
US7247827B1 (en) * 2006-05-31 2007-07-24 Academia Sinica System for measurement of the height, angle and their variations of the surface of an object
KR20080073593A (ko) * 2007-02-06 2008-08-11 삼성전자주식회사 화상형성장치
JP4451456B2 (ja) 2007-02-22 2010-04-14 株式会社沖データ 現像装置及び画像形成装置
JP4440295B2 (ja) * 2007-10-31 2010-03-24 キヤノン株式会社 プロセスカートリッジの再生産方法
JP4986948B2 (ja) * 2008-07-31 2012-07-25 キヤノン株式会社 プロセスカートリッジ及びプロセスカートリッジからマグネットローラを取り外すマグネットローラの取り外し方法

Also Published As

Publication number Publication date
AU2011272795B2 (en) 2013-08-15
CO6612280A2 (es) 2013-02-01
TWI416284B (zh) 2013-11-21
US8380106B2 (en) 2013-02-19
RU2012142545A (ru) 2014-08-10
KR101351055B1 (ko) 2014-01-10
BR112012033122A2 (pt) 2018-02-27
CN102906644B (zh) 2014-06-04
MX2012010858A (es) 2013-03-20
EP2588922A4 (en) 2013-12-18
PL2588922T3 (pl) 2015-04-30
CA2792897A1 (en) 2012-01-05
TW201232198A (en) 2012-08-01
CN102906644A (zh) 2013-01-30
HK1185669A1 (en) 2014-02-21
US20120003004A1 (en) 2012-01-05
NZ602354A (en) 2014-05-30
WO2012003400A1 (en) 2012-01-05
CA2792897C (en) 2014-01-07
AU2011272795A1 (en) 2012-10-04
AR082055A1 (es) 2012-11-07
EP2588922A1 (en) 2013-05-08
SG186051A1 (en) 2013-01-30
RU2529731C1 (ru) 2014-09-27
EP2588922B1 (en) 2014-11-19
IL221898A (en) 2013-11-28
KR20130051933A (ko) 2013-05-21
ES2526596T3 (es) 2015-01-13
UY33475A (es) 2012-01-31

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