ES2189444T3 - Dispositivos semiconductores electro-opticos y metodo para fabricarlos. - Google Patents
Dispositivos semiconductores electro-opticos y metodo para fabricarlos.Info
- Publication number
- ES2189444T3 ES2189444T3 ES99933056T ES99933056T ES2189444T3 ES 2189444 T3 ES2189444 T3 ES 2189444T3 ES 99933056 T ES99933056 T ES 99933056T ES 99933056 T ES99933056 T ES 99933056T ES 2189444 T3 ES2189444 T3 ES 2189444T3
- Authority
- ES
- Spain
- Prior art keywords
- electro
- waveguide
- active
- core
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
- Liquid Crystal (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Led Devices (AREA)
Abstract
Un dispositivo semiconductor electroóptico (2) que comprende una guía (14) de ondas semiconductora con una región (12) de núcleo dentro de la cual está situada al menos un área activa (31, 31¿) caracterizada porque: el núcleo (12) de la guía (14) de ondas fuera del área o las áreas activas (31, 31¿) no está contaminado por material de área activa difuso; el área o las áreas activas (31, 31¿) y la guía (14) de ondas son monolíticas; y el área o las áreas activas (31, 31¿) y la guía (14) de ondas se desarrollan mediante un procedimiento de desarrollo aditivo sin operación intermedia alguna en la que se elimine material.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9815573.2A GB9815573D0 (en) | 1998-07-18 | 1998-07-18 | Electro-optic semiconductor devices and methods for making the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2189444T3 true ES2189444T3 (es) | 2003-07-01 |
Family
ID=10835693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES99933056T Expired - Lifetime ES2189444T3 (es) | 1998-07-18 | 1999-07-15 | Dispositivos semiconductores electro-opticos y metodo para fabricarlos. |
Country Status (12)
Country | Link |
---|---|
US (1) | US6630693B1 (es) |
EP (1) | EP1099283B1 (es) |
JP (1) | JP2003517714A (es) |
KR (1) | KR100634217B1 (es) |
AT (1) | ATE233442T1 (es) |
AU (1) | AU4923199A (es) |
CA (1) | CA2338065A1 (es) |
DE (1) | DE69905580T2 (es) |
ES (1) | ES2189444T3 (es) |
GB (1) | GB9815573D0 (es) |
TW (1) | TW449935B (es) |
WO (1) | WO2000004616A1 (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7345812B2 (en) * | 2003-02-21 | 2008-03-18 | University Of Kansas | Method and apparatus for use of III-nitride wide bandgap semiconductors in optical communications |
JP4464404B2 (ja) * | 2004-06-30 | 2010-05-19 | パナソニック株式会社 | 音響光学素子及びそれを用いた光描画装置 |
BRPI0419177A (pt) * | 2004-11-11 | 2007-12-18 | Ericsson Telecomunicacoes Sa | métodos para calibrar os nìveis de dopagem para pelo menos duas camadas de dopagem delta incluìdas em uma estrutura de semicondutor em multicamada e para gerar uma estrutura de semicondutor em multicamada, e, estruturas de semicondutor em multicamada e de poço quántico múltiplo |
FR2974423B1 (fr) | 2011-04-19 | 2013-12-27 | Commissariat Energie Atomique | Dispositif d'emission et de guidage d'un rayonnement infrarouge. |
CN109459817B (zh) * | 2018-11-30 | 2020-01-07 | 北京邮电大学 | 单片硅基光电集成芯片的制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5250462A (en) * | 1990-08-24 | 1993-10-05 | Nec Corporation | Method for fabricating an optical semiconductor device |
JP3146505B2 (ja) * | 1991-03-15 | 2001-03-19 | 日本電気株式会社 | 集積型半導体レーザ素子 |
JPH07193329A (ja) * | 1993-12-27 | 1995-07-28 | Hitachi Ltd | 半導体モードロックレーザ |
JP2982619B2 (ja) * | 1994-06-29 | 1999-11-29 | 日本電気株式会社 | 半導体光導波路集積型受光素子 |
US5418183A (en) | 1994-09-19 | 1995-05-23 | At&T Corp. | Method for a reflective digitally tunable laser |
-
1998
- 1998-07-18 GB GBGB9815573.2A patent/GB9815573D0/en not_active Ceased
-
1999
- 1999-07-15 ES ES99933056T patent/ES2189444T3/es not_active Expired - Lifetime
- 1999-07-15 EP EP99933056A patent/EP1099283B1/en not_active Expired - Lifetime
- 1999-07-15 AU AU49231/99A patent/AU4923199A/en not_active Abandoned
- 1999-07-15 JP JP2000560643A patent/JP2003517714A/ja active Pending
- 1999-07-15 US US09/743,446 patent/US6630693B1/en not_active Expired - Lifetime
- 1999-07-15 DE DE69905580T patent/DE69905580T2/de not_active Expired - Lifetime
- 1999-07-15 WO PCT/GB1999/002285 patent/WO2000004616A1/en active IP Right Grant
- 1999-07-15 CA CA002338065A patent/CA2338065A1/en not_active Abandoned
- 1999-07-15 KR KR1020017000719A patent/KR100634217B1/ko not_active IP Right Cessation
- 1999-07-15 AT AT99933056T patent/ATE233442T1/de not_active IP Right Cessation
- 1999-07-22 TW TW088112434A patent/TW449935B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2003517714A (ja) | 2003-05-27 |
ATE233442T1 (de) | 2003-03-15 |
TW449935B (en) | 2001-08-11 |
GB9815573D0 (en) | 1998-09-16 |
KR100634217B1 (ko) | 2006-10-16 |
EP1099283B1 (en) | 2003-02-26 |
DE69905580D1 (de) | 2003-04-03 |
AU4923199A (en) | 2000-02-07 |
CA2338065A1 (en) | 2000-01-27 |
KR20010071948A (ko) | 2001-07-31 |
US6630693B1 (en) | 2003-10-07 |
WO2000004616A1 (en) | 2000-01-27 |
EP1099283A1 (en) | 2001-05-16 |
DE69905580T2 (de) | 2003-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004061911A8 (en) | Semiconductor devices with reduced active region defects and unique contacting schemes | |
ATE512490T1 (de) | Verfahren zur herstellung von halbleitervorrichtungen mit mesastruktur und mehreren passivierungsschichten | |
WO1991017575A3 (en) | Optoelectronic device | |
MY128305A (en) | Nitride semiconductor substrate and method for manufacturing the same, and nitride semiconductor device using nitride semiconductor substrate | |
ATE380391T1 (de) | Herstellungsverfahren für soi- halbleiterbauelemente | |
EP0833395A3 (en) | Method of fabricating a device including compound semiconductor crystal and method of fabricating a compound semiconductor layer structure | |
EP0834972A3 (en) | Semiconductor optical device with active layer of quantum well structure, use method thereof, light source apparatus including the same, and optical communication system using the same | |
EP0792955A3 (en) | Sapphire single crystal, semiconductor laser diode using the same for substrate, and method for manufacturing the same | |
CA2206346A1 (en) | Contoured-tub fermi-threshold field effect transistor and method of forming same | |
ES2189444T3 (es) | Dispositivos semiconductores electro-opticos y metodo para fabricarlos. | |
TW347597B (en) | Method of forming a groove in a semiconductor laser diode and a semiconductor laser diode | |
SG47931A1 (en) | Semiconductor structures and a method of manufacturing semiconductor structures | |
SE9803767D0 (sv) | Method for semiconductor manufacturing | |
WO2002031863A3 (en) | A single frequency laser | |
AU2002343185A1 (en) | A method of manufacturing a semiconductor device | |
DE3785859D1 (de) | Halbleiterstrukturen. | |
SE9804422L (sv) | Metod för våglängdskompensering vid halvledartillverkning | |
JPS55108789A (en) | Semiconductor laser | |
JPS57162483A (en) | Semiconductor luminous device | |
JPS5749290A (en) | Semiconductor laser device | |
JPS57164573A (en) | Semiconductor device | |
SE8403302L (sv) | Framstellning av transistor | |
TW375772B (en) | Field implant method | |
EP0966036A3 (en) | Method for fabricating a semiconductor device having different gate oxide layers | |
JPS57124473A (en) | Semiconductor device and its manufacture |