ES2167376T3 - Catodo de campo magnetico. - Google Patents

Catodo de campo magnetico.

Info

Publication number
ES2167376T3
ES2167376T3 ES94926902T ES94926902T ES2167376T3 ES 2167376 T3 ES2167376 T3 ES 2167376T3 ES 94926902 T ES94926902 T ES 94926902T ES 94926902 T ES94926902 T ES 94926902T ES 2167376 T3 ES2167376 T3 ES 2167376T3
Authority
ES
Spain
Prior art keywords
catode
coil
magnetic field
objective
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94926902T
Other languages
English (en)
Inventor
Hermann Curtins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
W BLOSCH AG
Original Assignee
W BLOSCH AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by W BLOSCH AG filed Critical W BLOSCH AG
Application granted granted Critical
Publication of ES2167376T3 publication Critical patent/ES2167376T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Road Signs Or Road Markings (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Secondary Cells (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

SE DESCRIBE UN CATODO DE CAMPO MAGNETICO PARA EVAPORADORES DE DESCARGA DE ARCO QUE DISPONE DE UNA BOBINA (2) DE PERFIL ANULAR INTERIOR ASOCIADA CON EL CENTRO DEL OBJETIVO Y AL MENOS UNA BOBINA (3) DE PERFIL ANULAR EXTERIOR ASOCIADA CON EL AREA CIRCUNFERENCIAL DEL OBJETIVO. LA BOBINA (2) DE PERFIL ANULAR INTERIOR INCLUYE UN IMAN (4) PERMANENTE DISPUESTO EN EL CENTRO DEL OBJETIVO Y FORMA UN CONCENTRADOR DE CAMPO INTERNO CONJUNTAMENTE CON EL INDICADO IMAN (4) PERMANENTE.
ES94926902T 1993-08-30 1994-08-29 Catodo de campo magnetico. Expired - Lifetime ES2167376T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4329155A DE4329155A1 (de) 1993-08-30 1993-08-30 Magnetfeldkathode

Publications (1)

Publication Number Publication Date
ES2167376T3 true ES2167376T3 (es) 2002-05-16

Family

ID=6496355

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94926902T Expired - Lifetime ES2167376T3 (es) 1993-08-30 1994-08-29 Catodo de campo magnetico.

Country Status (10)

Country Link
US (1) US5861088A (es)
EP (1) EP0667034B1 (es)
JP (1) JPH08503104A (es)
CN (1) CN1066851C (es)
AT (1) ATE208958T1 (es)
CZ (1) CZ287483B6 (es)
DE (2) DE4329155A1 (es)
DK (1) DK0667034T3 (es)
ES (1) ES2167376T3 (es)
WO (1) WO1995006954A1 (es)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4443740B4 (de) * 1994-12-08 2005-09-15 W. Blösch AG Vorrichtung zum Beschichten von Substraten
US5907220A (en) * 1996-03-13 1999-05-25 Applied Materials, Inc. Magnetron for low pressure full face erosion
GB9606920D0 (en) * 1996-04-02 1996-06-05 Applied Vision Ltd Magnet array for magnetrons
DE19614487A1 (de) * 1996-04-12 1997-10-16 Leybold Ag Sputterkathode
TW345667B (en) * 1996-09-09 1998-11-21 Tokiin Corp High thermal conductivity composite magnetic substance
EP0946966B1 (de) 1996-12-21 2005-05-11 Singulus Technologies AG Vorrichtung zur kathodenzerstäubung
DE10121082C1 (de) * 2001-04-28 2002-07-11 Dresden Vakuumtech Gmbh Magnetsystem an einem Vakuumbogenverdampfer
DE10127012A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Lichtbogen-Verdampfungsvorrichtung
DE10127013A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Lichtbogen-Verdampfungsvorrichtung
EP1970464B1 (en) 2005-12-16 2010-03-03 Fundacion Tekniker Cathode evaporation machine
BRPI0711644B1 (pt) 2006-05-16 2019-03-19 Oerlikon Trading Ag, Trübbach Fonte de arco voltaico com um alvo e processo para a produção de peças revestidas por arco voltaico
US20090242397A1 (en) * 2008-03-31 2009-10-01 General Electric Company Systems for controlling cathodic arc discharge
WO2010072850A1 (es) 2008-12-26 2010-07-01 Fundacion Tekniker Evaporador de arco y método para operar el evaporador
AT12021U1 (de) 2010-04-14 2011-09-15 Plansee Se Beschichtungsquelle und verfahren zu deren herstellung
CN106435488A (zh) * 2010-05-04 2017-02-22 欧瑞康表面解决方案股份公司，普费菲孔 用于借助陶瓷靶进行电弧气相沉积的方法
CN102260850A (zh) * 2011-07-21 2011-11-30 广东世创金属科技有限公司 一种少液滴电弧靶及带少液滴电弧靶的等离子涂层系统
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CZ306607B6 (cs) 2016-02-05 2017-03-22 Platit A.S. Způsob nanášení otěruvzdorné DLC vrstvy
US10031559B1 (en) * 2016-09-19 2018-07-24 Apple Inc. Switchable magnetic array

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4401539A (en) * 1981-01-30 1983-08-30 Hitachi, Ltd. Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure
JPS58157973A (ja) * 1982-03-15 1983-09-20 Hitachi Ltd スパツタ電極
SU1116968A1 (ru) * 1983-04-15 1986-06-07 Институт сильноточной электроники СО АН СССР Способ получени цилиндрической плазменной оболочки
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
US4622122A (en) * 1986-02-24 1986-11-11 Oerlikon Buhrle U.S.A. Inc. Planar magnetron cathode target assembly
US4971674A (en) * 1986-08-06 1990-11-20 Ube Industries, Ltd. Magnetron sputtering method and apparatus
JP2537210B2 (ja) * 1986-09-18 1996-09-25 株式会社東芝 高密度プラズマの発生装置
DE3735162A1 (de) * 1986-10-17 1988-04-28 Hitachi Ltd Aufdampfvorrichtung
DE4017111C2 (de) * 1990-05-28 1998-01-29 Hauzer Holding Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
DE3727901A1 (de) * 1987-08-21 1989-03-02 Leybold Ag Zerstaeubungskathode nach dem magnetronprinzip
DD265506A1 (de) * 1987-10-05 1989-03-01 Karl Marx Stadt Tech Hochschul Verfahren und vorrichtung zur vakuumbogengestuetzten verdampfung elektrisch leitender materialien
US4964968A (en) * 1988-04-30 1990-10-23 Mitsubishi Kasei Corp. Magnetron sputtering apparatus
US4865708A (en) * 1988-11-14 1989-09-12 Vac-Tec Systems, Inc. Magnetron sputtering cathode
JPH02194171A (ja) * 1989-01-20 1990-07-31 Ulvac Corp マグネトロンスパッタリング源
DD285463A5 (de) * 1989-06-22 1990-12-12 Veb Hochvakuum Dresden,Dd Verfahren zur regelung der brennfleckpostion bei einem vakuumbogenverdampfer
US5174875A (en) * 1990-08-29 1992-12-29 Materials Research Corporation Method of enhancing the performance of a magnetron sputtering target
ES2084886T3 (es) * 1991-12-28 1996-05-16 Leybold Ag Catodo para recubrir un substrato.

Also Published As

Publication number Publication date
JPH08503104A (ja) 1996-04-02
DE4329155A1 (de) 1995-03-02
DK0667034T3 (da) 2002-03-11
WO1995006954A1 (de) 1995-03-09
CZ107795A3 (en) 1995-11-15
ATE208958T1 (de) 2001-11-15
CN1066851C (zh) 2001-06-06
DE59409955D1 (de) 2001-12-20
EP0667034B1 (de) 2001-11-14
EP0667034A1 (de) 1995-08-16
CN1115191A (zh) 1996-01-17
CZ287483B6 (en) 2000-12-13
US5861088A (en) 1999-01-19

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