DK0667034T3 - Magnetfeltkatode - Google Patents
MagnetfeltkatodeInfo
- Publication number
- DK0667034T3 DK0667034T3 DK94926902T DK94926902T DK0667034T3 DK 0667034 T3 DK0667034 T3 DK 0667034T3 DK 94926902 T DK94926902 T DK 94926902T DK 94926902 T DK94926902 T DK 94926902T DK 0667034 T3 DK0667034 T3 DK 0667034T3
- Authority
- DK
- Denmark
- Prior art keywords
- pct
- target
- magnetic field
- ring coil
- field cathode
- Prior art date
Links
- 238000010891 electric arc Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4329155A DE4329155A1 (de) | 1993-08-30 | 1993-08-30 | Magnetfeldkathode |
PCT/EP1994/002849 WO1995006954A1 (de) | 1993-08-30 | 1994-08-29 | Magnetfeldkathode |
Publications (1)
Publication Number | Publication Date |
---|---|
DK0667034T3 true DK0667034T3 (da) | 2002-03-11 |
Family
ID=6496355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK94926902T DK0667034T3 (da) | 1993-08-30 | 1994-08-29 | Magnetfeltkatode |
Country Status (10)
Country | Link |
---|---|
US (1) | US5861088A (da) |
EP (1) | EP0667034B1 (da) |
JP (1) | JPH08503104A (da) |
CN (1) | CN1066851C (da) |
AT (1) | ATE208958T1 (da) |
CZ (1) | CZ287483B6 (da) |
DE (2) | DE4329155A1 (da) |
DK (1) | DK0667034T3 (da) |
ES (1) | ES2167376T3 (da) |
WO (1) | WO1995006954A1 (da) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4443740B4 (de) * | 1994-12-08 | 2005-09-15 | W. Blösch AG | Vorrichtung zum Beschichten von Substraten |
US5907220A (en) * | 1996-03-13 | 1999-05-25 | Applied Materials, Inc. | Magnetron for low pressure full face erosion |
GB9606920D0 (en) * | 1996-04-02 | 1996-06-05 | Applied Vision Ltd | Magnet array for magnetrons |
DE19614487A1 (de) * | 1996-04-12 | 1997-10-16 | Leybold Ag | Sputterkathode |
KR100510921B1 (ko) * | 1996-09-09 | 2005-10-25 | 엔이씨 도낀 가부시끼가이샤 | 고열전도성복합자성체 |
EP0946965B1 (de) | 1996-12-21 | 2006-05-17 | Singulus Technologies AG | Vorrichtung und verfahren zur kathodenzerstäubung |
DE10121082C1 (de) * | 2001-04-28 | 2002-07-11 | Dresden Vakuumtech Gmbh | Magnetsystem an einem Vakuumbogenverdampfer |
DE10127012A1 (de) * | 2001-06-05 | 2002-12-12 | Gabriel Herbert M | Lichtbogen-Verdampfungsvorrichtung |
DE10127013A1 (de) * | 2001-06-05 | 2002-12-12 | Gabriel Herbert M | Lichtbogen-Verdampfungsvorrichtung |
DE602005019800D1 (de) | 2005-12-16 | 2010-04-15 | Fundacion Tekniker | Kathodenverdampfungsmaschine |
BRPI0711644B1 (pt) * | 2006-05-16 | 2019-03-19 | Oerlikon Trading Ag, Trübbach | Fonte de arco voltaico com um alvo e processo para a produção de peças revestidas por arco voltaico |
US20090242397A1 (en) * | 2008-03-31 | 2009-10-01 | General Electric Company | Systems for controlling cathodic arc discharge |
WO2010072850A1 (es) | 2008-12-26 | 2010-07-01 | Fundacion Tekniker | Evaporador de arco y método para operar el evaporador |
AT12021U1 (de) | 2010-04-14 | 2011-09-15 | Plansee Se | Beschichtungsquelle und verfahren zu deren herstellung |
KR101814228B1 (ko) * | 2010-05-04 | 2018-01-04 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 세라믹 타겟을 사용한 스파크 증착 방법 |
CN102260850A (zh) * | 2011-07-21 | 2011-11-30 | 广东世创金属科技有限公司 | 一种少液滴电弧靶及带少液滴电弧靶的等离子涂层系统 |
US9153422B2 (en) | 2011-08-02 | 2015-10-06 | Envaerospace, Inc. | Arc PVD plasma source and method of deposition of nanoimplanted coatings |
CZ201660A3 (cs) * | 2016-02-05 | 2017-03-22 | Platit A.S. | Způsob nanášení otěruvzdorné DLC vrstvy |
US10031559B1 (en) * | 2016-09-19 | 2018-07-24 | Apple Inc. | Switchable magnetic array |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
US4401539A (en) * | 1981-01-30 | 1983-08-30 | Hitachi, Ltd. | Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure |
JPS58157973A (ja) * | 1982-03-15 | 1983-09-20 | Hitachi Ltd | スパツタ電極 |
SU1116968A1 (ru) * | 1983-04-15 | 1986-06-07 | Институт сильноточной электроники СО АН СССР | Способ получени цилиндрической плазменной оболочки |
US4448659A (en) * | 1983-09-12 | 1984-05-15 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization including initial target cleaning |
US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
US4622122A (en) * | 1986-02-24 | 1986-11-11 | Oerlikon Buhrle U.S.A. Inc. | Planar magnetron cathode target assembly |
US4971674A (en) * | 1986-08-06 | 1990-11-20 | Ube Industries, Ltd. | Magnetron sputtering method and apparatus |
JP2537210B2 (ja) * | 1986-09-18 | 1996-09-25 | 株式会社東芝 | 高密度プラズマの発生装置 |
DE3735162A1 (de) * | 1986-10-17 | 1988-04-28 | Hitachi Ltd | Aufdampfvorrichtung |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
DE3727901A1 (de) * | 1987-08-21 | 1989-03-02 | Leybold Ag | Zerstaeubungskathode nach dem magnetronprinzip |
DD265506A1 (de) * | 1987-10-05 | 1989-03-01 | Karl Marx Stadt Tech Hochschul | Verfahren und vorrichtung zur vakuumbogengestuetzten verdampfung elektrisch leitender materialien |
US4964968A (en) * | 1988-04-30 | 1990-10-23 | Mitsubishi Kasei Corp. | Magnetron sputtering apparatus |
US4865708A (en) * | 1988-11-14 | 1989-09-12 | Vac-Tec Systems, Inc. | Magnetron sputtering cathode |
JPH02194171A (ja) * | 1989-01-20 | 1990-07-31 | Ulvac Corp | マグネトロンスパッタリング源 |
DD285463A5 (de) * | 1989-06-22 | 1990-12-12 | Veb Hochvakuum Dresden,Dd | Verfahren zur regelung der brennfleckpostion bei einem vakuumbogenverdampfer |
US5174875A (en) * | 1990-08-29 | 1992-12-29 | Materials Research Corporation | Method of enhancing the performance of a magnetron sputtering target |
EP0549854B1 (de) * | 1991-12-28 | 1996-03-20 | Leybold Aktiengesellschaft | Kathode zum Beschichten eines Substrats |
-
1993
- 1993-08-30 DE DE4329155A patent/DE4329155A1/de not_active Ceased
-
1994
- 1994-08-29 JP JP7507935A patent/JPH08503104A/ja active Pending
- 1994-08-29 ES ES94926902T patent/ES2167376T3/es not_active Expired - Lifetime
- 1994-08-29 WO PCT/EP1994/002849 patent/WO1995006954A1/de active IP Right Grant
- 1994-08-29 DE DE59409955T patent/DE59409955D1/de not_active Expired - Lifetime
- 1994-08-29 EP EP94926902A patent/EP0667034B1/de not_active Expired - Lifetime
- 1994-08-29 DK DK94926902T patent/DK0667034T3/da active
- 1994-08-29 AT AT94926902T patent/ATE208958T1/de not_active IP Right Cessation
- 1994-08-29 US US08/428,155 patent/US5861088A/en not_active Expired - Fee Related
- 1994-08-29 CN CN94190742A patent/CN1066851C/zh not_active Expired - Fee Related
- 1994-08-29 CZ CZ19951077A patent/CZ287483B6/cs not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH08503104A (ja) | 1996-04-02 |
ATE208958T1 (de) | 2001-11-15 |
DE4329155A1 (de) | 1995-03-02 |
EP0667034B1 (de) | 2001-11-14 |
ES2167376T3 (es) | 2002-05-16 |
CZ287483B6 (en) | 2000-12-13 |
CZ107795A3 (en) | 1995-11-15 |
WO1995006954A1 (de) | 1995-03-09 |
DE59409955D1 (de) | 2001-12-20 |
US5861088A (en) | 1999-01-19 |
CN1115191A (zh) | 1996-01-17 |
EP0667034A1 (de) | 1995-08-16 |
CN1066851C (zh) | 2001-06-06 |
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