ES2092250T3 - Procedimiento para formar un deposito que contiene silicio en la superficie de un sustrato metalico, y procedimiento de tratamiento anticorrosion. - Google Patents

Procedimiento para formar un deposito que contiene silicio en la superficie de un sustrato metalico, y procedimiento de tratamiento anticorrosion.

Info

Publication number
ES2092250T3
ES2092250T3 ES93401396T ES93401396T ES2092250T3 ES 2092250 T3 ES2092250 T3 ES 2092250T3 ES 93401396 T ES93401396 T ES 93401396T ES 93401396 T ES93401396 T ES 93401396T ES 2092250 T3 ES2092250 T3 ES 2092250T3
Authority
ES
Spain
Prior art keywords
procedure
forming
containing silicon
anticorrosion treatment
tank containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93401396T
Other languages
English (en)
Inventor
Frank Slootman
Pascal Bouard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Application granted granted Critical
Publication of ES2092250T3 publication Critical patent/ES2092250T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

LA INVENCION CONCIERNE A UN PROCESO PARA FORMAR UN DEPOSITO CONTENIENDO SILICIO EN LA SUPERFICIE DE UN SUBSTRATO METALICO SEGUN EL CUAL SE PONE EN MARCHA, CONCOMITANTEMENTE O SUCESIVAMENTE, LAS ETAPAS SIGUIENTES: (1) LA SUMISION DE LA DICHA SUPERFICIE A UNA DESCARGA ELECTRICA CON BARRERA DIELECTRICA; (2) LA EXPOSICION DE LA DICHA SUPERFICIE A UNA ATMOSFERA QUE COMPORTA UN COMPUESTO DE SILICIO EN EL ESTADO GASEOSO, LAS ETAPAS (1) Y (2) SON EFECTUADAS A UNA PRESION SUPERIOR A 10.000 PA. LA INVENCION CONCIERNE IGUALMENTE A UN PROCESO DE TRATAMIENTO ANTICORROSION DE SUBSTRATO METALICO, ASI COMO UN SOPORTE POLIMERO METALIZADO.
ES93401396T 1992-06-17 1993-06-02 Procedimiento para formar un deposito que contiene silicio en la superficie de un sustrato metalico, y procedimiento de tratamiento anticorrosion. Expired - Lifetime ES2092250T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9207377A FR2692598B1 (fr) 1992-06-17 1992-06-17 Procédé de dépôt d'un film contenant du silicium à la surface d'un substrat métallique et procédé de traitement anti-corrosion.

Publications (1)

Publication Number Publication Date
ES2092250T3 true ES2092250T3 (es) 1996-11-16

Family

ID=9430856

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93401396T Expired - Lifetime ES2092250T3 (es) 1992-06-17 1993-06-02 Procedimiento para formar un deposito que contiene silicio en la superficie de un sustrato metalico, y procedimiento de tratamiento anticorrosion.

Country Status (9)

Country Link
US (1) US5523124A (es)
EP (1) EP0577447B1 (es)
JP (1) JP3403219B2 (es)
AT (1) ATE143061T1 (es)
AU (1) AU666546B2 (es)
CA (1) CA2098436A1 (es)
DE (1) DE69304819T2 (es)
ES (1) ES2092250T3 (es)
FR (1) FR2692598B1 (es)

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FR2714917B1 (fr) * 1994-01-07 1996-03-01 Pechiney Recherche Bande à base d'aluminium revêtue, résistant à la corrosion et déformable, procédé d'obtention et applications.
US5900317A (en) * 1996-09-13 1999-05-04 Minnesota Mining & Manufacturing Company Flame-treating process
US6083355A (en) * 1997-07-14 2000-07-04 The University Of Tennessee Research Corporation Electrodes for plasma treater systems
US6106659A (en) * 1997-07-14 2000-08-22 The University Of Tennessee Research Corporation Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials
NL1009956C2 (nl) * 1998-08-27 2000-02-29 Tno Werkwijze voor het aanbrengen van een bekleding op een substraat.
US6054018A (en) * 1998-08-28 2000-04-25 Wisconsin Alumni Research Foundation Outside chamber sealing roller system for surface treatment gas reactors
FR2782837B1 (fr) * 1998-08-28 2000-09-29 Air Liquide Procede et dispositif de traitement de surface par plasma a pression atmospherique
US6082292A (en) * 1999-01-05 2000-07-04 Wisconsin Alumni Research Foundation Sealing roller system for surface treatment gas reactors
CA2399090A1 (en) * 2000-02-04 2001-08-09 Anna Nihlstrand Fibrous structure and absorbent article comprising said fibrous structure
KR20010088089A (ko) * 2000-03-10 2001-09-26 구자홍 플라즈마 중합처리 시스템의 친수성 향상 방법
EP1582270A1 (en) * 2004-03-31 2005-10-05 Vlaamse Instelling voor Technologisch Onderzoek Method and apparatus for coating a substrate using dielectric barrier discharge
US20050238816A1 (en) * 2004-04-23 2005-10-27 Li Hou Method and apparatus of depositing low temperature inorganic films on plastic substrates
CN101184615A (zh) * 2005-03-24 2008-05-21 3M创新有限公司 耐腐蚀性金属化膜和其制造方法
EP1866154A1 (en) * 2005-03-24 2007-12-19 3M Innovative Properties Company Metallized films and articles containing the same
DE102005028121A1 (de) 2005-06-10 2006-12-14 Decoma (Germany) Gmbh Verfahren zum Behandeln einer Oberfläche
WO2013110963A1 (fr) 2012-01-24 2013-08-01 Arcelormittal Investigacion Y Desarrollo Sl Appareil et procédé de revêtement d'un substrat métallique en défilement

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DE275264C (es) *
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JPS5821814B2 (ja) * 1975-11-08 1983-05-04 松下電器産業株式会社 ケンカイガタコンデンサ
GB2104054B (en) * 1981-08-11 1984-11-14 British Petroleum Co Plc Protective silica coatings
GB2107360B (en) * 1981-10-12 1985-09-25 Central Electr Generat Board Depositing silicon on metal
DE3379816D1 (en) * 1982-06-18 1989-06-08 Kempten Elektroschmelz Gmbh Process for the stable deposition of metallic layers on a plastic foil, and their utilization in self-healing capacitors
US4603056A (en) * 1985-04-25 1986-07-29 International Business Machines Corporation Surface treatment of a molybdenum screening mask
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JPS6369958A (ja) * 1986-09-10 1988-03-30 Daiichi Jitsugyo Kk 溶射プロセスの前処理方法
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JP2811820B2 (ja) * 1989-10-30 1998-10-15 株式会社ブリヂストン シート状物の連続表面処理方法及び装置
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Also Published As

Publication number Publication date
FR2692598A1 (fr) 1993-12-24
US5523124A (en) 1996-06-04
DE69304819D1 (de) 1996-10-24
FR2692598B1 (fr) 1995-02-10
EP0577447A1 (fr) 1994-01-05
CA2098436A1 (fr) 1993-12-18
ATE143061T1 (de) 1996-10-15
DE69304819T2 (de) 1997-01-30
EP0577447B1 (fr) 1996-09-18
AU666546B2 (en) 1996-02-15
AU4125093A (en) 1993-12-23
JPH0688240A (ja) 1994-03-29
JP3403219B2 (ja) 2003-05-06

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