ES2083777T3 - Procedimiento y dispositivo para el recubrimiento con capas de materia dura de cuerpos de substrato. - Google Patents
Procedimiento y dispositivo para el recubrimiento con capas de materia dura de cuerpos de substrato.Info
- Publication number
- ES2083777T3 ES2083777T3 ES92924544T ES92924544T ES2083777T3 ES 2083777 T3 ES2083777 T3 ES 2083777T3 ES 92924544 T ES92924544 T ES 92924544T ES 92924544 T ES92924544 T ES 92924544T ES 2083777 T3 ES2083777 T3 ES 2083777T3
- Authority
- ES
- Spain
- Prior art keywords
- substrate
- cage
- pct
- procedure
- vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Abstract
LA INVENCION SE REFIERE A UN PROCESO CVD ACTIVADO DE EFECTO CORONA PARA EL RECUBRIMIENTO DE CUERPOS (14) DE SUBSTRATO LOCALIZADOS EN UNA JAULA (13) ESTANDO RODEADOS POR TODOS LOS LADOS. SE GENERA UNA DESCARGA (20) EN CORONA MEDIANTE UNA FUENTE (17) DE VOLTAJE SOBRE LA SUPERFICIE INTERIOR DE LA JAULA QUE ENFRENTA EL CUERPO DE SUBSTRATO, FLUYENDO AL MISMO TIEMPO UNA MEZCLA DE GAS APROPIADO A TRAVES DEL ESPACIO INTERIOR DEL CATODO A UNA TEMPERATURA Y PRESION PRESELECCIONADAS PARA FORMAR LA CAPA DE RECUBRIMIENTO DE LA SUSTANCIA DURA DESEADA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4140158A DE4140158A1 (de) | 1991-12-05 | 1991-12-05 | Verfahren und vorrichtung zur hartstoffbeschichtung von substratkoerpern |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2083777T3 true ES2083777T3 (es) | 1996-04-16 |
Family
ID=6446372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES92924544T Expired - Lifetime ES2083777T3 (es) | 1991-12-05 | 1992-11-30 | Procedimiento y dispositivo para el recubrimiento con capas de materia dura de cuerpos de substrato. |
Country Status (7)
Country | Link |
---|---|
US (1) | US5496594A (es) |
EP (1) | EP0615552B1 (es) |
JP (1) | JP3373204B2 (es) |
AT (1) | ATE132916T1 (es) |
DE (2) | DE4140158A1 (es) |
ES (1) | ES2083777T3 (es) |
WO (1) | WO1993011275A1 (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4239234A1 (de) * | 1992-11-21 | 1994-06-09 | Krupp Widia Gmbh | Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers |
US5591268A (en) * | 1994-10-14 | 1997-01-07 | Fujitsu Limited | Plasma process with radicals |
DE19719195A1 (de) * | 1997-05-09 | 1998-11-12 | Widia Gmbh | Schneideinsatz zum Zerspanen und Verfahren zur Herstellung dieses Schneideinsatzes |
DE10016958A1 (de) * | 2000-04-06 | 2001-10-18 | Widia Gmbh | Verfahren zur Herstellung von Multilagenschichten auf Substratkörpern und Verbundwerkstoff, bestehend aus einem beschichteten Substratkörper |
US20040258547A1 (en) * | 2003-04-02 | 2004-12-23 | Kurt Burger | Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3757733A (en) * | 1971-10-27 | 1973-09-11 | Texas Instruments Inc | Radial flow reactor |
JPS601952B2 (ja) * | 1980-01-25 | 1985-01-18 | 三菱電機株式会社 | プラズマエツチング装置 |
JPS59193265A (ja) * | 1983-03-14 | 1984-11-01 | Stanley Electric Co Ltd | プラズマcvd装置 |
JPS59207620A (ja) * | 1983-05-10 | 1984-11-24 | Zenko Hirose | アモルフアスシリコン成膜装置 |
FR2557149B1 (fr) * | 1983-12-27 | 1989-11-17 | France Etat | Procede et dispositif pour le depot, sur un support, d'une couche mince d'un materiau a partir d'un plasma reactif |
JPS6137968A (ja) * | 1984-07-31 | 1986-02-22 | Canon Inc | プラズマcvd装置 |
DE3841731C1 (en) * | 1988-12-10 | 1990-04-12 | Krupp Widia Gmbh, 4300 Essen, De | Process for coating a tool base, and tool produced by this process |
JPH03211726A (ja) * | 1990-01-16 | 1991-09-17 | Plasma Syst:Kk | プラズマ処理装置 |
-
1991
- 1991-12-05 DE DE4140158A patent/DE4140158A1/de not_active Withdrawn
-
1992
- 1992-11-30 EP EP92924544A patent/EP0615552B1/de not_active Expired - Lifetime
- 1992-11-30 DE DE59205046T patent/DE59205046D1/de not_active Expired - Fee Related
- 1992-11-30 AT AT92924544T patent/ATE132916T1/de not_active IP Right Cessation
- 1992-11-30 WO PCT/DE1992/001005 patent/WO1993011275A1/de active IP Right Grant
- 1992-11-30 JP JP50970693A patent/JP3373204B2/ja not_active Expired - Fee Related
- 1992-11-30 ES ES92924544T patent/ES2083777T3/es not_active Expired - Lifetime
- 1992-11-30 US US08/244,689 patent/US5496594A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO1993011275A1 (de) | 1993-06-10 |
ATE132916T1 (de) | 1996-01-15 |
DE4140158A1 (de) | 1993-06-09 |
US5496594A (en) | 1996-03-05 |
EP0615552A1 (de) | 1994-09-21 |
JPH07501582A (ja) | 1995-02-16 |
JP3373204B2 (ja) | 2003-02-04 |
EP0615552B1 (de) | 1996-01-10 |
DE59205046D1 (de) | 1996-02-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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