ES2074586T3 - Metodo de fabricar hilos cuanticos de silicio. - Google Patents
Metodo de fabricar hilos cuanticos de silicio.Info
- Publication number
- ES2074586T3 ES2074586T3 ES90917418T ES90917418T ES2074586T3 ES 2074586 T3 ES2074586 T3 ES 2074586T3 ES 90917418 T ES90917418 T ES 90917418T ES 90917418 T ES90917418 T ES 90917418T ES 2074586 T3 ES2074586 T3 ES 2074586T3
- Authority
- ES
- Spain
- Prior art keywords
- layer
- wafer
- silicon
- hydrofluoric acid
- level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 3
- 239000010703 silicon Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000005424 photoluminescence Methods 0.000 abstract 1
- 239000011148 porous material Substances 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 238000001429 visible spectrum Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/34—Materials of the light emitting region containing only elements of Group IV of the Periodic Table
- H01L33/346—Materials of the light emitting region containing only elements of Group IV of the Periodic Table containing porous silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/96—Porous semiconductor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/962—Quantum dots and lines
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Weting (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Light Receiving Elements (AREA)
- Bipolar Transistors (AREA)
- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
Abstract
UN METODO PARA LA FABRICACION DE CABLES CUANTICOS SEMICONDUCTORES EN QUE SU UTILIZA UN PLAQUITA SEMICONDUCTORA (14) COMO EL MATERIAL INICIAL. LA PLAQUITA (14) ES DEL TIPO P DEBILMENTE DOPADA CON UNA CAPA P DELGADA MUY DOPADA DENTRO PARA QUE LA CORRIENTE FLUYA DE MANERA UNIFORME. LA PLAQUITA (14) SE ANODIZA EN ACIDO FLUORHIDRICO ACUSOSO AL 20% PARA PRODUCIR UNA CAPA (5) GRUESA EN MICRAS CON UNA POROSIDAD DEL 70% Y BUENA CRISTALINIDAD. A CONTINUACION SE GRABA LA CAPA CON ACIDO FLUORHIDRICO CONCENTRADO, LO CUAL PROPORCIONA UNA VELOCIDAD DE ATAQUE LENTA. EL ATAQUE HACE QUE AUMENTE LA POROSIDAD A UN NIVEL DEL 80% EN LA REGION O SUPERIOR. A TAL NIVEL, LOS POROS SE SUPERPONEN Y SE ESPERA QUE SE FORMEN CABLES CUANTICOS AISLADOS CON DIAMETROS MENORES O IGUALES A 3 NM. LA CAPA GRABADA PRESENTA UNA EMISION FOTOLUMINISCENTE A ENERGIAS FOTONICAS MUY POR ENCIMA DEL HUECO DE BANDA DE SILICIO (1,1 EV) Y QUE SE EXTIENDE HASTA LA REGION ROJA (1,6 - 2,0 EV) DEL ESPECTRO VISIBLE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898927709A GB8927709D0 (en) | 1989-12-07 | 1989-12-07 | Silicon quantum wires |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2074586T3 true ES2074586T3 (es) | 1995-09-16 |
Family
ID=10667590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90917418T Expired - Lifetime ES2074586T3 (es) | 1989-12-07 | 1990-12-06 | Metodo de fabricar hilos cuanticos de silicio. |
Country Status (10)
Country | Link |
---|---|
US (4) | US5348618A (es) |
EP (2) | EP0504170B1 (es) |
JP (2) | JP2611072B2 (es) |
AT (1) | ATE125066T1 (es) |
CA (1) | CA2073030C (es) |
DE (1) | DE69020906T2 (es) |
DK (1) | DK0504170T3 (es) |
ES (1) | ES2074586T3 (es) |
GB (3) | GB8927709D0 (es) |
WO (1) | WO1991009420A1 (es) |
Families Citing this family (79)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8927709D0 (en) * | 1989-12-07 | 1990-02-07 | Secretary Of The State For Def | Silicon quantum wires |
US6171512B1 (en) | 1991-02-15 | 2001-01-09 | Canon Kabushiki Kaisha | Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
EP0499488B9 (en) * | 1991-02-15 | 2004-01-28 | Canon Kabushiki Kaisha | Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
GB9108176D0 (en) * | 1991-04-17 | 1991-06-05 | Secr Defence | Electroluminescent silicon device |
DE4126955C2 (de) * | 1991-08-14 | 1994-05-05 | Fraunhofer Ges Forschung | Verfahren zum Herstellen von elektrolumineszenten Siliziumstrukturen |
EP0534474B1 (en) * | 1991-09-27 | 2002-01-16 | Canon Kabushiki Kaisha | Method of processing a silicon substrate |
DE69233314T2 (de) * | 1991-10-11 | 2005-03-24 | Canon K.K. | Verfahren zur Herstellung von Halbleiter-Produkten |
US5454915A (en) * | 1992-10-06 | 1995-10-03 | Kulite Semiconductor Products, Inc. | Method of fabricating porous silicon carbide (SiC) |
US5689603A (en) * | 1993-07-07 | 1997-11-18 | Huth; Gerald C. | Optically interactive nanostructure |
EP0652600B1 (en) | 1993-11-02 | 1999-04-28 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing an aggregate of semiconductor micro-needles |
US6734451B2 (en) | 1993-11-02 | 2004-05-11 | Matsushita Electric Industrial Co., Ltd. | Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same |
GB2299210B (en) * | 1993-12-06 | 1997-12-24 | Secr Defence | Porous semiconductor material |
CN1142875A (zh) * | 1993-12-06 | 1997-02-12 | 英国国防部 | 多孔半导体材料 |
US5510633A (en) * | 1994-06-08 | 1996-04-23 | Xerox Corporation | Porous silicon light emitting diode arrays and method of fabrication |
US5427648A (en) * | 1994-08-15 | 1995-06-27 | The United States Of America As Represented By The Secretary Of The Army | Method of forming porous silicon |
WO1996014206A1 (en) * | 1994-11-08 | 1996-05-17 | Spectra Science Corporation | Semiconductor nanocrystal display materials and display apparatus employing same |
GB2313479B (en) * | 1995-03-20 | 1999-10-20 | Secr Defence | Electroluminescent device comprising porous silicon |
GB2299204A (en) * | 1995-03-20 | 1996-09-25 | Secr Defence | Electroluminescent device |
GB9611437D0 (en) | 1995-08-03 | 1996-08-07 | Secr Defence | Biomaterial |
US5690807A (en) * | 1995-08-03 | 1997-11-25 | Massachusetts Institute Of Technology | Method for producing semiconductor particles |
US5920078A (en) * | 1996-06-20 | 1999-07-06 | Frey; Jeffrey | Optoelectronic device using indirect-bandgap semiconductor material |
US6074546A (en) * | 1997-08-21 | 2000-06-13 | Rodel Holdings, Inc. | Method for photoelectrochemical polishing of silicon wafers |
JP3490903B2 (ja) * | 1997-09-11 | 2004-01-26 | Kddi株式会社 | 半導体発光素子およびその製造方法 |
JPH11243076A (ja) * | 1998-02-26 | 1999-09-07 | Canon Inc | 陽極化成方法及び陽極化成装置並びに半導体基板の製造方法 |
GB9808052D0 (en) | 1998-04-17 | 1998-06-17 | Secr Defence | Implants for administering substances and methods of producing implants |
GB9815819D0 (en) * | 1998-07-22 | 1998-09-16 | Secr Defence | Transferring materials into cells and a microneedle array |
US6197654B1 (en) * | 1998-08-21 | 2001-03-06 | Texas Instruments Incorporated | Lightly positively doped silicon wafer anodization process |
US6417069B1 (en) * | 1999-03-25 | 2002-07-09 | Canon Kabushiki Kaisha | Substrate processing method and manufacturing method, and anodizing apparatus |
EP1208002A4 (en) | 1999-06-03 | 2006-08-02 | Penn State Res Found | MATERIALS WITH NETWORK OF SURFACE POROSITY COLUMNS DEPOSITED IN THIN FILM |
GB9929521D0 (en) | 1999-12-15 | 2000-02-09 | Secr Defence | Bonded products and methods of fabrication therefor |
GB0008494D0 (en) | 2000-04-07 | 2000-05-24 | Secr Defence | Microprojectile delivery system |
US20030066998A1 (en) * | 2001-08-02 | 2003-04-10 | Lee Howard Wing Hoon | Quantum dots of Group IV semiconductor materials |
US6794265B2 (en) * | 2001-08-02 | 2004-09-21 | Ultradots, Inc. | Methods of forming quantum dots of Group IV semiconductor materials |
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JP2003124574A (ja) * | 2001-10-09 | 2003-04-25 | Fujitsu Ltd | 光半導体装置及びその製造方法 |
GB0130608D0 (en) | 2001-12-21 | 2002-02-06 | Psimedica Ltd | Medical fibres and fabrics |
AU2003206031A1 (en) * | 2002-03-08 | 2003-09-22 | Koninklijke Philips Electronics N.V. | Method of manufacturing nanowires and an electronic device |
US6955745B1 (en) * | 2002-08-01 | 2005-10-18 | University Of Florida Research Foundation, Inc. | Method of spark-processing silicon and resulting materials |
CA2408483C (en) * | 2002-10-17 | 2011-01-04 | Yujie Han | Laser chemical fabrication of nanostructures |
CN1711211A (zh) * | 2002-11-18 | 2005-12-21 | 皇家飞利浦电子股份有限公司 | 半导体材料纳米线的分散系 |
JP2004335662A (ja) * | 2003-05-06 | 2004-11-25 | Canon Inc | 部材及び部材の製造方法 |
US8420435B2 (en) * | 2009-05-05 | 2013-04-16 | Solexel, Inc. | Ion implantation fabrication process for thin-film crystalline silicon solar cells |
US9508886B2 (en) | 2007-10-06 | 2016-11-29 | Solexel, Inc. | Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam |
US8399331B2 (en) | 2007-10-06 | 2013-03-19 | Solexel | Laser processing for high-efficiency thin crystalline silicon solar cell fabrication |
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US20100304521A1 (en) * | 2006-10-09 | 2010-12-02 | Solexel, Inc. | Shadow Mask Methods For Manufacturing Three-Dimensional Thin-Film Solar Cells |
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US9890465B2 (en) * | 2009-01-15 | 2018-02-13 | Trutag Technologies, Inc. | Apparatus and methods for uniformly forming porous semiconductor on a substrate |
US9076642B2 (en) | 2009-01-15 | 2015-07-07 | Solexel, Inc. | High-Throughput batch porous silicon manufacturing equipment design and processing methods |
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JPS6027179B2 (ja) * | 1975-11-05 | 1985-06-27 | 日本電気株式会社 | 多孔質シリコンの形成方法 |
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US4392011A (en) * | 1980-04-30 | 1983-07-05 | Rca Corporation | Solar cell structure incorporating a novel single crystal silicon material |
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JPS57153478A (en) * | 1981-03-19 | 1982-09-22 | Agency Of Ind Science & Technol | Photoelectric conversion device |
US4532700A (en) * | 1984-04-27 | 1985-08-06 | International Business Machines Corporation | Method of manufacturing semiconductor structures having an oxidized porous silicon isolation layer |
DE3420887A1 (de) * | 1984-06-05 | 1985-12-05 | Telefunken electronic GmbH, 7100 Heilbronn | Solarzelle |
US4581103A (en) * | 1984-09-04 | 1986-04-08 | Texas Instruments Incorporated | Method of etching semiconductor material |
US4751194A (en) * | 1986-06-27 | 1988-06-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Structures including quantum well wires and boxes |
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DE3727823A1 (de) * | 1987-08-20 | 1989-03-02 | Siemens Ag | Tandem-solarmodul |
US4801380A (en) * | 1987-12-23 | 1989-01-31 | The Texas A&M University System | Method of producing a silicon film with micropores |
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-
1989
- 1989-12-07 GB GB898927709A patent/GB8927709D0/en active Pending
-
1990
- 1990-12-06 EP EP90917418A patent/EP0504170B1/en not_active Expired - Lifetime
- 1990-12-06 DE DE69020906T patent/DE69020906T2/de not_active Expired - Fee Related
- 1990-12-06 JP JP3500255A patent/JP2611072B2/ja not_active Expired - Lifetime
- 1990-12-06 DK DK90917418.7T patent/DK0504170T3/da active
- 1990-12-06 EP EP94201681A patent/EP0616378A3/en not_active Withdrawn
- 1990-12-06 ES ES90917418T patent/ES2074586T3/es not_active Expired - Lifetime
- 1990-12-06 WO PCT/GB1990/001901 patent/WO1991009420A1/en active IP Right Grant
- 1990-12-06 US US07/852,208 patent/US5348618A/en not_active Expired - Lifetime
- 1990-12-06 AT AT90917418T patent/ATE125066T1/de not_active IP Right Cessation
- 1990-12-06 CA CA002073030A patent/CA2073030C/en not_active Expired - Fee Related
-
1992
- 1992-05-01 GB GB9209555A patent/GB2254188C/en not_active Expired - Fee Related
- 1992-10-14 US US07/960,694 patent/US6147359A/en not_active Expired - Lifetime
-
1993
- 1993-03-10 GB GB9304855A patent/GB2266994B/en not_active Expired - Fee Related
- 1993-07-26 US US08/096,410 patent/US5358600A/en not_active Expired - Lifetime
-
1994
- 1994-04-26 US US08/233,338 patent/US6369405B1/en not_active Expired - Lifetime
- 1994-05-16 JP JP10119794A patent/JP2963617B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB2254188B (en) | 1994-07-20 |
US6147359A (en) | 2000-11-14 |
DE69020906D1 (de) | 1995-08-17 |
DE69020906T2 (de) | 1995-12-14 |
GB9304855D0 (en) | 1993-04-28 |
CA2073030C (en) | 1999-02-23 |
GB2254188C (en) | 1994-12-23 |
JP2611072B2 (ja) | 1997-05-21 |
ATE125066T1 (de) | 1995-07-15 |
GB9209555D0 (en) | 1992-07-01 |
EP0616378A2 (en) | 1994-09-21 |
DK0504170T3 (da) | 1995-09-04 |
EP0504170B1 (en) | 1995-07-12 |
GB2266994A (en) | 1993-11-17 |
JP2963617B2 (ja) | 1999-10-18 |
WO1991009420A1 (en) | 1991-06-27 |
GB2254188A (en) | 1992-09-30 |
GB8927709D0 (en) | 1990-02-07 |
US6369405B1 (en) | 2002-04-09 |
US5348618A (en) | 1994-09-20 |
GB2266994B (en) | 1994-08-03 |
JPH0774392A (ja) | 1995-03-17 |
EP0616378A3 (en) | 1998-05-06 |
JPH05502978A (ja) | 1993-05-20 |
EP0504170A1 (en) | 1992-09-23 |
CA2073030A1 (en) | 1991-06-08 |
US5358600A (en) | 1994-10-25 |
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