ES2035374T3 - Metodo para calentar un tubo de cristal de cuarzo. - Google Patents
Metodo para calentar un tubo de cristal de cuarzo.Info
- Publication number
- ES2035374T3 ES2035374T3 ES198989100793T ES89100793T ES2035374T3 ES 2035374 T3 ES2035374 T3 ES 2035374T3 ES 198989100793 T ES198989100793 T ES 198989100793T ES 89100793 T ES89100793 T ES 89100793T ES 2035374 T3 ES2035374 T3 ES 2035374T3
- Authority
- ES
- Spain
- Prior art keywords
- crystal tube
- quartz crystal
- quartz
- tube
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010453 quartz Substances 0.000 title abstract 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 7
- 239000013078 crystal Substances 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 3
- 238000010438 heat treatment Methods 0.000 title abstract 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/043—Heating devices specially adapted for re-forming tubes or rods in general, e.g. burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01876—Means for heating tubes or rods during or immediately prior to deposition, e.g. electric resistance heaters
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/336—Changing physical properties of treated surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Organic Chemistry (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Analytical Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Furnace Details (AREA)
Abstract
UN METODO DE CALENTAMIENTO DE UN TUBO DE CRISTAL DE CUARZO (1) CON UN MICROONDAS, QUE COMPRENDE EL ABASTECIMIENTO DE UN GAS (3) PARA GENERACION DE PLASMA EN EL TUBO DE CRISTAL DE CUARZO (1) APLICANDO UN MICROONDAS AL TUBO DE CRISTAL DE CUARZO (1) ASI COMO PARA GENERAR UN PLASMA CALIENTE (4) EN EL TUBO DE CRISTAL DE CUARZO (1) Y PARA PRECALENTAR EL TUBO DE CRISTAL DE CUARZO (1), Y ENTONCES INTERRUMPIENDO LA APLICACION DE MICROONDAS, Y ASI HACER QUE EL TUBO DE CRISTAL DE CUARZO QUE ABSORBE LOS MICROONDAS. CON ESTE METODO EL TUBO DE CRISTAL DE CUARZO (1) SE PUEDE CALENTAR A UNA TEMPERATURA SUFICIENTE DE UNA MANERA M,UY RAPIDA Y CLARA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63007008A JPH01183432A (ja) | 1988-01-18 | 1988-01-18 | 石英ガラス管の加熱方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2035374T3 true ES2035374T3 (es) | 1993-04-16 |
Family
ID=11654031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES198989100793T Expired - Lifetime ES2035374T3 (es) | 1988-01-18 | 1989-01-18 | Metodo para calentar un tubo de cristal de cuarzo. |
Country Status (7)
Country | Link |
---|---|
US (1) | US4900894A (es) |
EP (1) | EP0325227B1 (es) |
JP (1) | JPH01183432A (es) |
KR (1) | KR910002396B1 (es) |
AU (1) | AU607573B2 (es) |
DE (1) | DE68902995T2 (es) |
ES (1) | ES2035374T3 (es) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2234655A (en) * | 1989-07-07 | 1991-02-06 | Charles * Carter Arthur | Heating by gas ionization |
JP2958086B2 (ja) * | 1990-09-18 | 1999-10-06 | 奈良精機株式会社 | 注射針の熔融処理装置 |
GB9414561D0 (en) * | 1994-07-19 | 1994-09-07 | Ea Tech Ltd | Method of and apparatus for microwave-plasma production |
US5847355A (en) * | 1996-01-05 | 1998-12-08 | California Institute Of Technology | Plasma-assisted microwave processing of materials |
US5979190A (en) * | 1997-09-29 | 1999-11-09 | Lucent Technologies Inc. | Method for manufacturing an article comprising a refractory a dielectric body |
US6041623A (en) * | 1998-08-27 | 2000-03-28 | Lucent Technologies Inc. | Process for fabricating article comprising refractory dielectric body |
PL193607B1 (pl) * | 1999-06-17 | 2007-02-28 | Ustav Chemickych Procesu Akade | Sposób obróbki cieplnej materiałów szklanych orazmateriałów naturalnych zwłaszcza pochodzenia wulkanicznego i urządzenie do obróbki cieplnej materiałów szklanych oraz materiałów naturalnych zwłaszcza pochodzenia wulkanicznego |
US6408649B1 (en) * | 2000-04-28 | 2002-06-25 | Gyrotron Technology, Inc. | Method for the rapid thermal treatment of glass and glass-like materials using microwave radiation |
US6826929B2 (en) * | 2001-09-19 | 2004-12-07 | Premakaran T. Boaz | Method for simultaneously heating and cooling glass to produce tempered glass |
US20030070452A1 (en) * | 2001-10-12 | 2003-04-17 | Alcatel | Process for online spheroidization of quartz and silica particles |
US7164095B2 (en) * | 2004-07-07 | 2007-01-16 | Noritsu Koki Co., Ltd. | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
US20080202522A1 (en) * | 2007-02-23 | 2008-08-28 | General Electric Company | Setting mandatory mechanical ventilation parameters based on patient physiology |
US20080230062A1 (en) * | 2007-03-23 | 2008-09-25 | General Electric Company | Setting expiratory time in mandatory mechanical ventilation based on a deviation from a stable condition of exhaled gas volumes |
KR102557566B1 (ko) * | 2022-11-25 | 2023-07-21 | (주)태성아이엠티 | 환원 그래핀을 제조하기 위한 습식 마이크로웨이브 장치 |
KR102557565B1 (ko) * | 2022-11-25 | 2023-07-21 | (주)태성아이엠티 | 환원 그래핀을 제조하기 위한 건식 마이크로웨이브 장치 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2288958A1 (fr) * | 1974-10-21 | 1976-05-21 | Desmarquest & Cec | Installation pour le traitement par zone de produits de forme allongee |
GB1603949A (en) * | 1978-05-30 | 1981-12-02 | Standard Telephones Cables Ltd | Plasma deposit |
DE3217839A1 (de) * | 1982-05-12 | 1983-11-17 | Hans Dr.Rer.Nat. 5370 Kall Beerwald | Plasmaverfahren zur herstellung eines dielektrischen stabes |
DE3568570D1 (en) * | 1984-07-03 | 1989-04-13 | Stiftelsen Inst Mikrovags | Method and apparatus for heating thick-walled glass tubes |
NL8402225A (nl) * | 1984-07-13 | 1986-02-03 | Philips Nv | Werkwijze voor de vervaardiging van massieve glazen voorvormen uit holle voorvormen. |
DE3528275A1 (de) * | 1985-08-07 | 1987-02-19 | Philips Patentverwaltung | Verfahren und vorrichtung zum innenbeschichten von rohren |
JPH01183436A (ja) * | 1988-01-19 | 1989-07-21 | Sumitomo Electric Ind Ltd | 石英ガラスの加熱方法 |
-
1988
- 1988-01-18 JP JP63007008A patent/JPH01183432A/ja active Pending
-
1989
- 1989-01-11 AU AU28371/89A patent/AU607573B2/en not_active Ceased
- 1989-01-13 US US07/296,778 patent/US4900894A/en not_active Expired - Fee Related
- 1989-01-14 KR KR1019890000344A patent/KR910002396B1/ko not_active IP Right Cessation
- 1989-01-18 EP EP89100793A patent/EP0325227B1/en not_active Expired - Lifetime
- 1989-01-18 DE DE8989100793T patent/DE68902995T2/de not_active Expired - Fee Related
- 1989-01-18 ES ES198989100793T patent/ES2035374T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4900894A (en) | 1990-02-13 |
JPH01183432A (ja) | 1989-07-21 |
DE68902995T2 (de) | 1993-04-01 |
KR890011790A (ko) | 1989-08-22 |
EP0325227A2 (en) | 1989-07-26 |
DE68902995D1 (de) | 1992-11-05 |
AU607573B2 (en) | 1991-03-07 |
EP0325227B1 (en) | 1992-09-30 |
AU2837189A (en) | 1989-07-20 |
KR910002396B1 (ko) | 1991-04-22 |
EP0325227A3 (en) | 1990-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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