KR890011790A - 석영유리관의 가열방법 - Google Patents

석영유리관의 가열방법 Download PDF

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Publication number
KR890011790A
KR890011790A KR1019890000344A KR890000344A KR890011790A KR 890011790 A KR890011790 A KR 890011790A KR 1019890000344 A KR1019890000344 A KR 1019890000344A KR 890000344 A KR890000344 A KR 890000344A KR 890011790 A KR890011790 A KR 890011790A
Authority
KR
South Korea
Prior art keywords
glass tube
quartz glass
heating method
microwave
plasma generation
Prior art date
Application number
KR1019890000344A
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English (en)
Other versions
KR910002396B1 (ko
Inventor
고오타로 다나까
히로시 스가누마
아끼라 우라노
마사히로 타카기
승이치 미즈노
Original Assignee
나까하라 쯔네오
스미도모덴기고오교오 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나까하라 쯔네오, 스미도모덴기고오교오 가부시기가이샤 filed Critical 나까하라 쯔네오
Publication of KR890011790A publication Critical patent/KR890011790A/ko
Application granted granted Critical
Publication of KR910002396B1 publication Critical patent/KR910002396B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C03B23/043—Heating devices specially adapted for re-forming tubes or rods in general, e.g. burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01876—Means for heating tubes or rods during or immediately prior to deposition, e.g. electric resistance heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/336—Changing physical properties of treated surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Analytical Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Furnace Details (AREA)

Abstract

내용 없음

Description

석영유리관의 가열방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 한 구체예를 설명하는 개략도.
제2도는 본 발명의 플로우차아트.
제4도는 본 발명의 마이크로파 공급시스템의 설명도.

Claims (1)

  1. 마이크로파를 사용한 석영유리관의 가열방법에 있어서, 이 석영유리관내에 통상의 압력하에서 플라즈마 생성용 가스를 공급하고, 또한 이 석영유리관에 마이크로파를 인가함으로써 이 석영유리관내에 열플라즈마를 형성해서 이 석영유리관을 예열하고, 그후에 마이크로파는 인가한 그대로 상기 플라즈마 생성용 가스의 공급을 정지함으로써 마이크로파를 이 석영유리관에 흡수시키는 것을 특징으로 하는 석영유리관의 가열방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890000344A 1988-01-18 1989-01-14 석영유리관의 가열방법 KR910002396B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63-7008 1988-01-18
JP63007008A JPH01183432A (ja) 1988-01-18 1988-01-18 石英ガラス管の加熱方法

Publications (2)

Publication Number Publication Date
KR890011790A true KR890011790A (ko) 1989-08-22
KR910002396B1 KR910002396B1 (ko) 1991-04-22

Family

ID=11654031

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890000344A KR910002396B1 (ko) 1988-01-18 1989-01-14 석영유리관의 가열방법

Country Status (7)

Country Link
US (1) US4900894A (ko)
EP (1) EP0325227B1 (ko)
JP (1) JPH01183432A (ko)
KR (1) KR910002396B1 (ko)
AU (1) AU607573B2 (ko)
DE (1) DE68902995T2 (ko)
ES (1) ES2035374T3 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102557566B1 (ko) * 2022-11-25 2023-07-21 (주)태성아이엠티 환원 그래핀을 제조하기 위한 습식 마이크로웨이브 장치
KR102557565B1 (ko) * 2022-11-25 2023-07-21 (주)태성아이엠티 환원 그래핀을 제조하기 위한 건식 마이크로웨이브 장치

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2234655A (en) * 1989-07-07 1991-02-06 Charles * Carter Arthur Heating by gas ionization
JP2958086B2 (ja) * 1990-09-18 1999-10-06 奈良精機株式会社 注射針の熔融処理装置
GB9414561D0 (en) * 1994-07-19 1994-09-07 Ea Tech Ltd Method of and apparatus for microwave-plasma production
US5847355A (en) * 1996-01-05 1998-12-08 California Institute Of Technology Plasma-assisted microwave processing of materials
US5979190A (en) * 1997-09-29 1999-11-09 Lucent Technologies Inc. Method for manufacturing an article comprising a refractory a dielectric body
US6041623A (en) * 1998-08-27 2000-03-28 Lucent Technologies Inc. Process for fabricating article comprising refractory dielectric body
EP1228008B1 (en) * 1999-06-17 2004-02-11 Ustav Chemickych Procesu Akademie Ved Ceské Republiky Method and apparatus for heat treatment of glass materials and natural materials specifically of volcanic origin
US6408649B1 (en) * 2000-04-28 2002-06-25 Gyrotron Technology, Inc. Method for the rapid thermal treatment of glass and glass-like materials using microwave radiation
US6826929B2 (en) * 2001-09-19 2004-12-07 Premakaran T. Boaz Method for simultaneously heating and cooling glass to produce tempered glass
US20030070452A1 (en) * 2001-10-12 2003-04-17 Alcatel Process for online spheroidization of quartz and silica particles
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US20080202523A1 (en) * 2007-02-23 2008-08-28 General Electric Company Setting mandatory mechanical ventilation parameters based on patient physiology
US20080230062A1 (en) * 2007-03-23 2008-09-25 General Electric Company Setting expiratory time in mandatory mechanical ventilation based on a deviation from a stable condition of exhaled gas volumes

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288958A1 (fr) * 1974-10-21 1976-05-21 Desmarquest & Cec Installation pour le traitement par zone de produits de forme allongee
GB1603949A (en) * 1978-05-30 1981-12-02 Standard Telephones Cables Ltd Plasma deposit
DE3217839A1 (de) * 1982-05-12 1983-11-17 Hans Dr.Rer.Nat. 5370 Kall Beerwald Plasmaverfahren zur herstellung eines dielektrischen stabes
DE3568570D1 (en) * 1984-07-03 1989-04-13 Stiftelsen Inst Mikrovags Method and apparatus for heating thick-walled glass tubes
NL8402225A (nl) * 1984-07-13 1986-02-03 Philips Nv Werkwijze voor de vervaardiging van massieve glazen voorvormen uit holle voorvormen.
DE3528275A1 (de) * 1985-08-07 1987-02-19 Philips Patentverwaltung Verfahren und vorrichtung zum innenbeschichten von rohren
JPH01183436A (ja) * 1988-01-19 1989-07-21 Sumitomo Electric Ind Ltd 石英ガラスの加熱方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102557566B1 (ko) * 2022-11-25 2023-07-21 (주)태성아이엠티 환원 그래핀을 제조하기 위한 습식 마이크로웨이브 장치
KR102557565B1 (ko) * 2022-11-25 2023-07-21 (주)태성아이엠티 환원 그래핀을 제조하기 위한 건식 마이크로웨이브 장치

Also Published As

Publication number Publication date
EP0325227A3 (en) 1990-07-25
EP0325227B1 (en) 1992-09-30
DE68902995T2 (de) 1993-04-01
DE68902995D1 (de) 1992-11-05
KR910002396B1 (ko) 1991-04-22
ES2035374T3 (es) 1993-04-16
US4900894A (en) 1990-02-13
AU2837189A (en) 1989-07-20
JPH01183432A (ja) 1989-07-21
EP0325227A2 (en) 1989-07-26
AU607573B2 (en) 1991-03-07

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Payment date: 19960416

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