ES2026558T3 - Dispositivo de deposito al vacio, por pulverizacion catodica reactiva sobre una lamina de vidrio. - Google Patents

Dispositivo de deposito al vacio, por pulverizacion catodica reactiva sobre una lamina de vidrio.

Info

Publication number
ES2026558T3
ES2026558T3 ES198787402242T ES87402242T ES2026558T3 ES 2026558 T3 ES2026558 T3 ES 2026558T3 ES 198787402242 T ES198787402242 T ES 198787402242T ES 87402242 T ES87402242 T ES 87402242T ES 2026558 T3 ES2026558 T3 ES 2026558T3
Authority
ES
Spain
Prior art keywords
glass sheet
reactive cathodic
deposit device
cathodic spray
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198787402242T
Other languages
English (en)
Spanish (es)
Inventor
Xaver Heitzer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vegla Vereinigte Glaswerke GmbH
Saint Gobain Glass France SAS
Original Assignee
Vegla Vereinigte Glaswerke GmbH
Saint Gobain Vitrage International SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vegla Vereinigte Glaswerke GmbH, Saint Gobain Vitrage International SA filed Critical Vegla Vereinigte Glaswerke GmbH
Application granted granted Critical
Publication of ES2026558T3 publication Critical patent/ES2026558T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
  • Blinds (AREA)
  • Supports For Plants (AREA)
  • Window Of Vehicle (AREA)
  • Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
ES198787402242T 1986-10-11 1987-10-08 Dispositivo de deposito al vacio, por pulverizacion catodica reactiva sobre una lamina de vidrio. Expired - Lifetime ES2026558T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863634710 DE3634710A1 (de) 1986-10-11 1986-10-11 Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung

Publications (1)

Publication Number Publication Date
ES2026558T3 true ES2026558T3 (es) 1992-05-01

Family

ID=6311558

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198787402242T Expired - Lifetime ES2026558T3 (es) 1986-10-11 1987-10-08 Dispositivo de deposito al vacio, por pulverizacion catodica reactiva sobre una lamina de vidrio.

Country Status (7)

Country Link
US (1) US5080774A (OSRAM)
EP (1) EP0265320B1 (OSRAM)
JP (1) JPS63105963A (OSRAM)
AT (1) ATE66966T1 (OSRAM)
DE (2) DE3634710A1 (OSRAM)
ES (1) ES2026558T3 (OSRAM)
FI (1) FI82717C (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01152271A (ja) * 1987-12-09 1989-06-14 Toshiba Corp スパッタ装置
FR2698093B1 (fr) * 1992-11-17 1995-01-27 Saint Gobain Vitrage Int Vitrage à propriétés de transmission variant avec l'incidence.
KR970009828B1 (en) * 1994-02-23 1997-06-18 Sansung Electronics Co Ltd Fabrication method of collimator
US5614071A (en) * 1995-06-28 1997-03-25 Hmt Technology Corporation Sputtering shield
WO1998031845A1 (en) * 1997-01-16 1998-07-23 Bottomfield, Layne, F. Vapor deposition components and corresponding methods
JP2002105628A (ja) * 2000-10-03 2002-04-10 Nissin Electric Co Ltd 真空アーク蒸着装置
DE10132478C1 (de) * 2001-07-03 2003-04-30 Atotech Deutschland Gmbh Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung
US6495000B1 (en) * 2001-07-16 2002-12-17 Sharp Laboratories Of America, Inc. System and method for DC sputtering oxide films with a finned anode
US8500965B2 (en) * 2004-05-06 2013-08-06 Ppg Industries Ohio, Inc. MSVD coating process
KR101165466B1 (ko) * 2005-08-31 2012-07-13 엘지디스플레이 주식회사 캐리어 및 이를 구비한 공정 장치
US8603250B2 (en) * 2006-06-27 2013-12-10 First Solar, Inc. System and method for deposition of a material on a substrate
US20080017501A1 (en) * 2006-07-21 2008-01-24 Makoto Inagawa Cooled dark space shield for multi-cathode design
US20090194414A1 (en) * 2008-01-31 2009-08-06 Nolander Ira G Modified sputtering target and deposition components, methods of production and uses thereof
EP2354271A1 (en) * 2010-02-09 2011-08-10 Applied Materials, Inc. Substrate protection device and method
DE102010052761A1 (de) * 2010-11-30 2012-05-31 Leybold Optics Gmbh Vorrichtung zum Beschichten eines Substrats
KR20140047276A (ko) * 2012-10-12 2014-04-22 삼성디스플레이 주식회사 스퍼터링 장치
CN106756780B (zh) * 2017-01-23 2019-03-05 京东方科技集团股份有限公司 一种用于溅射成膜工艺的掩膜板及溅射装置
CH715877A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
DE102022103180A1 (de) 2022-02-10 2023-08-10 Voestalpine Stahl Gmbh Verfahren zum Erzeugen von beschichtetem perforiertem Stahlband

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3514391A (en) * 1967-05-05 1970-05-26 Nat Res Corp Sputtering apparatus with finned anode
US4094763A (en) * 1970-07-31 1978-06-13 Ppg Industries, Inc. Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
US4100055A (en) * 1977-06-10 1978-07-11 Varian Associates, Inc. Target profile for sputtering apparatus
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
DD140481A1 (de) * 1978-11-20 1980-03-05 Juergen Salm Verfahren und vorrichtung zum aufbringen von isolatorschichten
NL8202092A (nl) * 1982-05-21 1983-12-16 Philips Nv Magnetronkathodesputtersysteem.
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
US4545882A (en) * 1983-09-02 1985-10-08 Shatterproof Glass Corporation Method and apparatus for detecting sputtering target depletion
GB2194965B (en) * 1986-09-12 1991-01-09 Sharp Kk A process for preparing a soft magnetic film of ni-fe based alloy

Also Published As

Publication number Publication date
EP0265320B1 (fr) 1991-09-04
FI874464L (fi) 1988-04-12
JPS63105963A (ja) 1988-05-11
DE3772706D1 (de) 1991-10-10
DE3634710A1 (de) 1988-04-21
FI82717C (fi) 1991-04-10
EP0265320A1 (fr) 1988-04-27
FI874464A0 (fi) 1987-10-09
US5080774A (en) 1992-01-14
FI82717B (fi) 1990-12-31
DE3634710C2 (OSRAM) 1989-01-12
ATE66966T1 (de) 1991-09-15

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