EP4122005A4 - Système de transfert de plateau de substrat pour équipement de traitement de substrat - Google Patents
Système de transfert de plateau de substrat pour équipement de traitement de substrat Download PDFInfo
- Publication number
- EP4122005A4 EP4122005A4 EP20925671.8A EP20925671A EP4122005A4 EP 4122005 A4 EP4122005 A4 EP 4122005A4 EP 20925671 A EP20925671 A EP 20925671A EP 4122005 A4 EP4122005 A4 EP 4122005A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate
- processing equipment
- transfer system
- tray transfer
- substrate processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0608—Gripping heads and other end effectors with vacuum or magnetic holding means with magnetic holding means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Non-Mechanical Conveyors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062992690P | 2020-03-20 | 2020-03-20 | |
| PCT/US2020/024947 WO2021188122A1 (fr) | 2020-03-20 | 2020-03-26 | Système de transfert de plateau de substrat pour équipement de traitement de substrat |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4122005A1 EP4122005A1 (fr) | 2023-01-25 |
| EP4122005A4 true EP4122005A4 (fr) | 2024-05-29 |
Family
ID=77771473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP20925671.8A Pending EP4122005A4 (fr) | 2020-03-20 | 2020-03-26 | Système de transfert de plateau de substrat pour équipement de traitement de substrat |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4122005A4 (fr) |
| JP (1) | JP7539993B2 (fr) |
| KR (1) | KR102863993B1 (fr) |
| CN (1) | CN115335977A (fr) |
| TW (1) | TWI878497B (fr) |
| WO (1) | WO2021188122A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7767189B2 (ja) * | 2022-03-11 | 2025-11-11 | キオクシア株式会社 | プラズマ処理装置、プラズマ処理方法、および原版の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5882165A (en) * | 1986-12-19 | 1999-03-16 | Applied Materials, Inc. | Multiple chamber integrated process system |
| US6106631A (en) * | 1997-10-16 | 2000-08-22 | Sharp Kabushiki Kaisha | Plasma processing apparatus |
| US20100087028A1 (en) * | 2008-10-07 | 2010-04-08 | Applied Materials, Inc. | Advanced platform for processing crystalline silicon solar cells |
| KR20120053155A (ko) * | 2010-11-17 | 2012-05-25 | 주성엔지니어링(주) | 트레이와 이를 이용한 기판 처리 장치, 및 트레이의 제조 방법 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100223349B1 (ko) | 1994-08-26 | 1999-10-15 | 가나이 쓰도무 | 반송장치, 반송처리장치, 피처리물 반송처리방법 및 자세전환장치 |
| JP4084293B2 (ja) * | 2002-12-05 | 2008-04-30 | 株式会社アドヴァンスド・ディスプレイ・プロセス・エンジニアリング | Fpd製造装置 |
| US8668422B2 (en) * | 2004-08-17 | 2014-03-11 | Mattson Technology, Inc. | Low cost high throughput processing platform |
| KR100707390B1 (ko) * | 2005-12-19 | 2007-04-13 | 주식회사 아바코 | 기판 이송장치 |
| KR101288599B1 (ko) * | 2007-05-29 | 2013-07-22 | 엘지디스플레이 주식회사 | 기판 이송 장치 |
| US20100108708A1 (en) | 2008-10-30 | 2010-05-06 | Wawzynski Michael C | High volume, high pressure, refillable, continuous batter dispenser system and method |
| KR101167947B1 (ko) * | 2010-03-19 | 2012-07-23 | (주) 엔피홀딩스 | 스퍼터링 시스템 |
| JP5688838B2 (ja) * | 2010-10-29 | 2015-03-25 | 株式会社アルバック | 基板処理装置 |
| KR101277070B1 (ko) * | 2011-05-17 | 2013-06-20 | 주식회사 에스에프에이 | 기판 이송장치 |
| JP6018379B2 (ja) | 2011-12-27 | 2016-11-02 | 川崎重工業株式会社 | 基板保持装置 |
| JP6231078B2 (ja) * | 2012-04-26 | 2017-11-15 | インテヴァック インコーポレイテッド | 真空プロセスのためのシステム構成 |
| KR101328574B1 (ko) * | 2012-09-24 | 2013-11-13 | 주식회사 선익시스템 | 기판이송장치 |
| KR101531656B1 (ko) * | 2013-10-16 | 2015-06-25 | 한국전기연구원 | 자기 부상 이송 장치 |
| JP6719567B2 (ja) * | 2017-08-25 | 2020-07-08 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | キャリアを搬送するための装置、基板を真空処理するためのシステム、及び真空チャンバ内でキャリアを搬送するための方法 |
-
2020
- 2020-03-26 JP JP2022555789A patent/JP7539993B2/ja active Active
- 2020-03-26 KR KR1020227036231A patent/KR102863993B1/ko active Active
- 2020-03-26 EP EP20925671.8A patent/EP4122005A4/fr active Pending
- 2020-03-26 CN CN202080098832.5A patent/CN115335977A/zh active Pending
- 2020-03-26 WO PCT/US2020/024947 patent/WO2021188122A1/fr not_active Ceased
-
2021
- 2021-03-19 TW TW110109961A patent/TWI878497B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5882165A (en) * | 1986-12-19 | 1999-03-16 | Applied Materials, Inc. | Multiple chamber integrated process system |
| US6106631A (en) * | 1997-10-16 | 2000-08-22 | Sharp Kabushiki Kaisha | Plasma processing apparatus |
| US20100087028A1 (en) * | 2008-10-07 | 2010-04-08 | Applied Materials, Inc. | Advanced platform for processing crystalline silicon solar cells |
| KR20120053155A (ko) * | 2010-11-17 | 2012-05-25 | 주성엔지니어링(주) | 트레이와 이를 이용한 기판 처리 장치, 및 트레이의 제조 방법 |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2021188122A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI878497B (zh) | 2025-04-01 |
| KR102863993B1 (ko) | 2025-09-23 |
| WO2021188122A1 (fr) | 2021-09-23 |
| JP2023517711A (ja) | 2023-04-26 |
| TW202141676A (zh) | 2021-11-01 |
| KR20220154807A (ko) | 2022-11-22 |
| CN115335977A (zh) | 2022-11-11 |
| EP4122005A1 (fr) | 2023-01-25 |
| JP7539993B2 (ja) | 2024-08-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
| 17P | Request for examination filed |
Effective date: 20221013 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20240425 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 21/687 20060101ALI20240419BHEP Ipc: H01L 21/673 20060101ALI20240419BHEP Ipc: H01L 21/677 20060101ALI20240419BHEP Ipc: H01L 21/67 20060101AFI20240419BHEP |