EP4114820A1 - Verfahren zur alkylierung von aminen - Google Patents
Verfahren zur alkylierung von aminenInfo
- Publication number
- EP4114820A1 EP4114820A1 EP20922861.8A EP20922861A EP4114820A1 EP 4114820 A1 EP4114820 A1 EP 4114820A1 EP 20922861 A EP20922861 A EP 20922861A EP 4114820 A1 EP4114820 A1 EP 4114820A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- general formula
- metal
- compound
- metal element
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 150000001412 amines Chemical class 0.000 title claims abstract description 21
- 230000029936 alkylation Effects 0.000 title abstract description 6
- 238000005804 alkylation reaction Methods 0.000 title abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 152
- 239000002184 metal Substances 0.000 claims abstract description 150
- 239000003054 catalyst Substances 0.000 claims abstract description 91
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 40
- 239000001257 hydrogen Substances 0.000 claims abstract description 38
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims abstract description 28
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000006243 chemical reaction Methods 0.000 claims description 56
- 239000010949 copper Substances 0.000 claims description 47
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 46
- 150000001875 compounds Chemical class 0.000 claims description 41
- -1 octylenediamine Chemical compound 0.000 claims description 25
- 150000002431 hydrogen Chemical class 0.000 claims description 20
- 239000007983 Tris buffer Substances 0.000 claims description 15
- 150000002602 lanthanoids Chemical class 0.000 claims description 13
- 229910052782 aluminium Inorganic materials 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- 239000011701 zinc Substances 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 7
- 229910052791 calcium Inorganic materials 0.000 claims description 7
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 claims description 7
- 229910052748 manganese Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 229910052797 bismuth Inorganic materials 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- QMXSDTGNCZVWTB-UHFFFAOYSA-N n',n'-bis(3-aminopropyl)propane-1,3-diamine Chemical compound NCCCN(CCCN)CCCN QMXSDTGNCZVWTB-UHFFFAOYSA-N 0.000 claims description 6
- 229910052712 strontium Inorganic materials 0.000 claims description 6
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 5
- 229910052789 astatine Inorganic materials 0.000 claims description 5
- RYXHOMYVWAEKHL-UHFFFAOYSA-N astatine atom Chemical compound [At] RYXHOMYVWAEKHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- 239000007868 Raney catalyst Substances 0.000 claims description 4
- 229910052768 actinide Inorganic materials 0.000 claims description 4
- 150000001255 actinides Chemical class 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 4
- 229910052699 polonium Inorganic materials 0.000 claims description 4
- HZEBHPIOVYHPMT-UHFFFAOYSA-N polonium atom Chemical compound [Po] HZEBHPIOVYHPMT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052714 tellurium Inorganic materials 0.000 claims description 4
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052700 potassium Inorganic materials 0.000 claims description 3
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 claims description 3
- 230000035484 reaction time Effects 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910000564 Raney nickel Inorganic materials 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- MRNZSTMRDWRNNR-UHFFFAOYSA-N bis(hexamethylene)triamine Chemical compound NCCCCCCNCCCCCCN MRNZSTMRDWRNNR-UHFFFAOYSA-N 0.000 claims description 2
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 claims description 2
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 claims description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims description 2
- RTWNYYOXLSILQN-UHFFFAOYSA-N methanediamine Chemical compound NCN RTWNYYOXLSILQN-UHFFFAOYSA-N 0.000 claims description 2
- XIDCCVQQSRGENZ-UHFFFAOYSA-N methanetetramine Chemical compound NC(N)(N)N XIDCCVQQSRGENZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- BKHGFBHADSLTHZ-UHFFFAOYSA-N n',n'-bis(4-aminobutyl)butane-1,4-diamine Chemical compound NCCCCN(CCCCN)CCCCN BKHGFBHADSLTHZ-UHFFFAOYSA-N 0.000 claims description 2
- JNZCEYWMODDEQC-UHFFFAOYSA-N n',n'-bis(5-aminopentyl)pentane-1,5-diamine Chemical compound NCCCCCN(CCCCCN)CCCCCN JNZCEYWMODDEQC-UHFFFAOYSA-N 0.000 claims description 2
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052713 technetium Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 75
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 abstract description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 66
- 229910052757 nitrogen Inorganic materials 0.000 description 51
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 33
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 25
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 24
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 18
- 239000011787 zinc oxide Substances 0.000 description 17
- 235000014692 zinc oxide Nutrition 0.000 description 17
- 238000003756 stirring Methods 0.000 description 16
- 125000004429 atom Chemical group 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 12
- 239000011575 calcium Substances 0.000 description 10
- 239000011777 magnesium Substances 0.000 description 10
- 150000002739 metals Chemical class 0.000 description 10
- 230000002829 reductive effect Effects 0.000 description 10
- 239000011734 sodium Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000003517 fume Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000010907 mechanical stirring Methods 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 229910052752 metalloid Inorganic materials 0.000 description 5
- 150000002738 metalloids Chemical class 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- 239000011133 lead Substances 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000010457 zeolite Substances 0.000 description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910004247 CaCu Inorganic materials 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910052976 metal sulfide Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910003071 TaON Inorganic materials 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- HFLAMWCKUFHSAZ-UHFFFAOYSA-N niobium dioxide Chemical compound O=[Nb]=O HFLAMWCKUFHSAZ-UHFFFAOYSA-N 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 239000005968 1-Decanol Substances 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910002521 CoMn Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910000311 lanthanide oxide Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000011987 methylation Effects 0.000 description 1
- 238000007069 methylation reaction Methods 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- URKRYOHZWVRTIL-UHFFFAOYSA-N n',n'-bis[2-(diethylamino)ethyl]-n,n-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN(CCN(CC)CC)CCN(CC)CC URKRYOHZWVRTIL-UHFFFAOYSA-N 0.000 description 1
- VMGSQCIDWAUGLQ-UHFFFAOYSA-N n',n'-bis[2-(dimethylamino)ethyl]-n,n-dimethylethane-1,2-diamine Chemical compound CN(C)CCN(CCN(C)C)CCN(C)C VMGSQCIDWAUGLQ-UHFFFAOYSA-N 0.000 description 1
- DTKANQSCBACEPK-UHFFFAOYSA-N n',n'-bis[3-(dimethylamino)propyl]-n,n-dimethylpropane-1,3-diamine Chemical compound CN(C)CCCN(CCCN(C)C)CCCN(C)C DTKANQSCBACEPK-UHFFFAOYSA-N 0.000 description 1
- LIGIARLVFBHRJF-UHFFFAOYSA-N n'-[2-(diethylamino)ethyl]-n,n,n'-triethylethane-1,2-diamine Chemical compound CCN(CC)CCN(CC)CCN(CC)CC LIGIARLVFBHRJF-UHFFFAOYSA-N 0.000 description 1
- XSCOFLWZKMBZFE-UHFFFAOYSA-N n'-[2-(dipropylamino)ethyl]-n,n,n'-tripropylethane-1,2-diamine Chemical compound CCCN(CCC)CCN(CCC)CCN(CCC)CCC XSCOFLWZKMBZFE-UHFFFAOYSA-N 0.000 description 1
- MUESDKXVLSXRPO-UHFFFAOYSA-N n,n,n',n'-tetra(propan-2-yl)ethane-1,2-diamine Chemical compound CC(C)N(C(C)C)CCN(C(C)C)C(C)C MUESDKXVLSXRPO-UHFFFAOYSA-N 0.000 description 1
- OROFXWIKMNHVSV-UHFFFAOYSA-N n,n,n',n'-tetra(propan-2-yl)propane-1,3-diamine Chemical compound CC(C)N(C(C)C)CCCN(C(C)C)C(C)C OROFXWIKMNHVSV-UHFFFAOYSA-N 0.000 description 1
- DIHKMUNUGQVFES-UHFFFAOYSA-N n,n,n',n'-tetraethylethane-1,2-diamine Chemical compound CCN(CC)CCN(CC)CC DIHKMUNUGQVFES-UHFFFAOYSA-N 0.000 description 1
- RCZLVPFECJNLMZ-UHFFFAOYSA-N n,n,n',n'-tetraethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN(CC)CC RCZLVPFECJNLMZ-UHFFFAOYSA-N 0.000 description 1
- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 description 1
- HVBXZPOGJMBMLN-UHFFFAOYSA-N n,n,n',n'-tetrapropylethane-1,2-diamine Chemical compound CCCN(CCC)CCN(CCC)CCC HVBXZPOGJMBMLN-UHFFFAOYSA-N 0.000 description 1
- FQELQRCSRAWQAB-UHFFFAOYSA-N n,n,n',n'-tetrapropylpropane-1,3-diamine Chemical compound CCCN(CCC)CCCN(CCC)CCC FQELQRCSRAWQAB-UHFFFAOYSA-N 0.000 description 1
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 1
- OHWSRBFDUQYYSN-UHFFFAOYSA-N n-[2-[di(propan-2-yl)amino]ethyl]-n,n',n'-tri(propan-2-yl)ethane-1,2-diamine Chemical compound CC(C)N(C(C)C)CCN(C(C)C)CCN(C(C)C)C(C)C OHWSRBFDUQYYSN-UHFFFAOYSA-N 0.000 description 1
- BFRGSJVXBIWTCF-UHFFFAOYSA-N niobium monoxide Inorganic materials [Nb]=O BFRGSJVXBIWTCF-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052592 oxide mineral Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N oxygen(2-);yttrium(3+) Chemical class [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000006485 reductive methylation reaction Methods 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical class [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/04—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups
- C07C209/14—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups
- C07C209/16—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups with formation of amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/75—Cobalt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J25/00—Catalysts of the Raney type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J25/00—Catalysts of the Raney type
- B01J25/02—Raney nickel
Definitions
- the present invention pertains to a method for the alkylation of amines.
- N, N, N', N”, N”-pentamethyldiethylenetriamine is used in the formation of rigid foam polyurethane.
- Current technology for PMDTA production relies on the methylation of diethylenetriamine (DETA) in the presence of hydrogen by using formaldehyde as methyl source. This methodology is selective towards PMDTA.
- formaldehyde CMR compound raises HSE concerns.
- US Patent No. 5105013 teaches a process for the preparation of permethylated amines, particularly pentamethyldiethylenetriamine, by the reductive methylation of diethylenetriamine in the presence of hydrogen, formaldehyde aqueous solution, a catalyst, and a solvent. The reaction was carried out in two reaction phases and the flow rate of formaldehyde must be well controlled.
- the present invention therefore pertains to a method for preparing a compound having general formula (I) by reacting a compound having general formula (II) with an alcohol having general formula (III) in the presence of hydrogen and a metal catalyst:
- - R is an alkyl, alkenyl or alkynyl
- - n is an integer between 0 and 20
- - m is an integer between 1 and 3
- - p is an integer between 0 and 2
- the method of the invention enables to alkylate amines by using an environmentally friendly alkylation agent.
- the invention also concerns a mixture comprising:
- Fig. 1 is an image of temperature-yield curve of reaction of DETA with methanol over Pricat Cu 60/8P of Example 3;
- Fig. 2 is an image of H 2 pressure-yield curve of reaction of DETA with methanol over Pricat Cu 60/8P of Example 4;
- Fig. 3 is an image of time-yield curve of reaction of DETA with methanol over Pricat Cu 60/8P of Example 5;
- Fig. 4 is an image of mass ratio (Cat/DETA) -yield curve of reaction of DETA with methanol over Pricat Cu 60/8P of Example 6;
- Fig. 5 is an image of concentration (DETA in methanol) -yield curve of reaction of DETA with methanol over Pricat Cu 60/8P of Example 7.
- Ratios, concentrations, amounts, and other numerical data may be presented herein in a range format. It is to be understood that such a range format is used merely for convenience and brevity and should be interpreted flexibly to include not only the numerical values explicitly recited as the limits of the range, but also all the individual numerical values or sub-ranges encompassed within that range as if each numerical value or sub-range is explicitly recited.
- the compound having general formula (II) is a compound having general formula (IV) :
- n is an integer between 0 and 20, preferably between 0 and 9, and more preferably between 0 and 4.
- the compound having general formula (II) is a compound having general formula (V) :
- n is an integer between 0 and 20, preferably between 0 and 9, and more preferably between 0 and 4.
- the compound having general formula (II) is a compound having general formula (VI) :
- n is an integer between 0 and 20, preferably between 0 and 9, and more preferably between 0 and 4.
- the compound having general formula (II) can be selected from the group consisting of dimethylenetriamine, diethylenetriamine, dipropylenetriamine, dibutylenetriamine, dipentylenetriamine, dihexylenetriamine, diheptylenetriamine, dioctylenetriamine, dinonylenetriamine, didecylenetriamine, methylenediamine, ethylenediamine, propylenediamine, butylenediamine, pentylenediamine, hexylenediamine, heptylenediamine, octylenediamine, nonylenediamine, and decylenediamine, triaminomethylamine, tris (2-aminoethyl) amine, tris (3-aminopropyl) amine, tris (4-aminobutyl) amine, tris (5-aminopentyl) amine, tris (6-aminohexyl) amine, tris (7-aminoh
- the compound having general formula (II) can be selected from the group consisting of diethylenetriamine, dipropylenetriamine, dibutylenetriamine, dipentylenetriamine, ethylenediamine, propylenediamine, butylenediamine and pentylenediamine.
- R may be straight or branched. More preferably, R may be a C 1 -C 10 straight or branched alkyl.
- Examples of the alcohol having general formula (III) are methanol, ethanol, 1-propanol, 1-butanol, 1-pentanol, 1-hexanol, 1-heptanol, 1-octanol, 1-nonanol, 1-decanol, 2-propanol, 2-butanol and 3-butanol.
- the alcohol having general formula (III) can be selected from the group consisting of methanol, ethanol, 1-propanol and 2-propanol.
- the alcohol may comprise traces of corresponding aldehyde and/or carboxylic acid.
- methanol may comprise traces of formaldehyde and/or formic acid
- ethanol may comprise traces of acetaldehyde and/or acetic acid
- propanol may comprise traces of propionaldehyde and/or propanoic acid.
- the alcohol may contain 0.01-10000 ppm corresponding aldehyde and/or carboxylic acid.
- Preferred reactions of the present invention are the following:
- the metal catalyst may comprise at least one metal element in elemental form and/or at least one metal oxide of at least one metal element, wherein the metal element is selected from (i) elements of group IA except hydrogen, (ii) elements of group IIA, (iii) elements of group IIIA, (iv) elements of group IVA except carbon, (v) arsenic, antimony, bismuth, tellurium, polonium and astatine, (vi) elements of groups IB, IIB, IIIB, IVB, VB, VIB, VIIB and VIIIB, (vii) lanthanides and (viii) actinides.
- the metal element is selected from (i) elements of group IA except hydrogen, (ii) elements of group IIA, (iii) elements of group IIIA, (iv) elements of group IVA except carbon, (v) arsenic, antimony, bismuth, tellurium, polonium and astatine, (vi) elements of groups IB, IIB, IIIB, IVB, VB,
- the metal catalyst according to present invention can be a supported or unsupported catalyst.
- the support to the metal catalyst is not particularly limited. It can notably be a metal oxide chosen in the group consisting of aluminum oxide (Al 2 O 3 ) , silicon dioxide (SiO 2 ) , titanium oxide (TiO 2 ) , zirconium dioxide (ZrO 2 ) , calcium oxide (CaO) , magnesium oxide (MgO) , lanthanum oxide (La 2 O 3 ) , niobium dioxide (NbO 2 ) , cerium oxide (CeO 2 ) and mixtures thereof.
- Al 2 O 3 aluminum oxide
- SiO 2 silicon dioxide
- TiO 2 titanium oxide
- ZrO 2 zirconium dioxide
- CaO calcium oxide
- MgO magnesium oxide
- La 2 O 3 lanthanum oxide
- NbO 2 niobium dioxide
- CeO 2 cerium oxide
- the support can also be a zeolite.
- Zeolites are substances having a crystalline structure and a unique ability to change ions. People skilled in the art can easily understand how to obtain those zeolites by preparation method reported, such as zeolite L is described in US 4503023 or commercial purchase, such as ZSM available from ZEOLYST.
- the support of catalyst can even be Kieselguhr, clay or carbon.
- metals are the elements in the periodic system which are located left to the diagonal extending from boron (atomic number 5) to astatine (atomic number 85) ) .
- Metals of group IA Li, Na, K, Rb, Cs, Fr are also known as alkali metals and metals of group IIA (Be, Mg, Ca, Sr Ba and Ra) are generally referred to as alkaline earth metals.
- the metals of group IB, IIB, IIIB, IVB, VB, VIB, VIIB and VIIIB are often referred to as transition metals.
- This group comprises the elements with atomic number 21 to 30 (Sc to Zn) , 39 to 48 (Y to Cd) , 72 to 80 (Hf to Hg) and 104 to 112 (Hf to Cn) .
- the lanthanides encompass the metals with atomic number 57 to 71 and the actinides the metals with the atomic number 89 to 103.
- metalloids are sometimes also referred to as metalloids.
- the term metalloid is generally designating an element which has properties between those of metals and non-metals. Typically, metalloids have a metallic appearance but are relatively brittle and have a moderate electrical conductivity.
- the six commonly recognized metalloids are boron, silicon, germanium, arsenic, antimony, and tellurium.
- Other elements also recognized as metalloids include aluminum, polonium, and astatine. On a standard periodic table all of these elements may be found in a diagonal region of the p-block, extending from boron at one end, to astatine at the other (as indicated above) .
- the metal element is selected from elements of groups IA, IIA, IIIA, IVA, IB, IIB, IIIB, IVB, VB, VIB, VIIB and VIIIB. More preferably, the metal element is selected from elements of groups IA, IIA, IIIA, IVA, IB, IIB, VIB, VIIB and VIIIB.
- the metal catalyst comprises two, three, or four metal elements, which are present in elemental form and/or in metal oxide form.
- Metal oxide compounds comprise typically at least one oxygen atom and at least one metal atom which is chemically bound to the oxygen atom; the electronegativity of the oxygen atom is obviously higher than the electronegativity of the metal atom.
- the metal oxide compound of the present invention may be a single oxide or a mixed oxide.
- a single metal oxide is typically composed of one or more metal atom (s) of a same, unique metal element and one or more oxygen atom (s) .
- the metal atom comprised in the single metal oxide can be notably:
- Ln a lanthanide Ln, as in CeO 2 and in Ln 2 O 3 , or
- a mixed metal oxide is typically composed of one or more metal atom (s) of different metal elements and one or more oxygen atom (s) .
- Many metals can form mixed oxides with one or more other metals.
- Mixed oxide minerals appear in a great variety in nature and synthetic mixed oxides find use as components of different materials used in advanced technological applications.
- ZnO Al, ZnO: Cu, ZnO: Ag, ZnO: Ga, ZnO: Mg, ZnO: Cd, ZnO: In, ZnO: Sn, ZnO: Sc, ZnO: Y, ZnO: Co, ZnO: Mn, ZnO: Cr and ZnO: B
- cuprates superconductors such as YBa 2 Cu 3 O 7-x , Bi 2 Sr 2 CuO 6 , Bi 2 Sr 2 CaCu 2 O 8 , Bi 2 Sr 2 Ca 2 Cu 3 O 6 , Tl 2 Ba 2 CuO 6 , Tl 2 Ba 2 CaCu 2 O 8 , Tl 2 Ba 2 Ca 2 Cu 3 O 10 , TlBa 2 Ca 3 Cu 4 O 11 , HgBa 2 CuO 4 , HgBa 2 CaCu 2 O 6 and HgBa 2 Ca 2 Cu 3 O 8 ,
- A Ni, Mg, Mn, Fe, Co, Zn, Cu, Ca, Sr, Ba or Pb
- Ln represents a lanthanide metal
- perovskites such as LaGaO 3 , Na 1-x Bi x TiO 3 with 0 ⁇ x ⁇ 1,
- IGZO indium-gallium-zinc oxide
- ITO indium - mixed oxides of indium and tin, commonly referred to as ITO, which denotes a solid solution of indium (III) oxide (In 2 O 3 ) and tin (IV) oxide (SnO 2 ) , consisting essentially of or consisting of from 80 wt. %up to 95 wt. %of In 2 O 3 and from 5 wt. %to 20 wt. %of SnO 2 , in some cases about 90 wt. %In 2 O 3 and about 10 wt. %SnO 2 ; in particular for organic electronic device applications, ITO has been profitably used in the recent past.
- the metal catalyst according to the present invention can be Raney catalysts such as Raney nickel, Raney cobalt and Raney copper.
- the metal catalyst comprises Metal element A and optionally Metal element B, which are present in elemental form and/or in metal oxide form, wherein:
- Metal element A is at least one metal element selected from elements of groups IB and VIIIB, and
- Metal element B is at least one metal element selected from the group consisting of Al, Na, Mn, Mg, Si, Zn, Ni, Cr, K, Li, Cs, Be, Ca, Sr, Ba, Sc, Y, Ti, Zr, V, Nb, W, Mo, Tc, Re, Fe, Ru, Co, Ag, Cd, Hg, Ga, Pb, Bi, Ce, and mixtures thereof.
- Metal element A is Cu or Co and Metal element B is at least one metal element selected from the group consisting of Al, Na, Mn, Mg, Si, Zn, Ni, Cr and mixtures thereof.
- Metal element A can be supported on a support in this embodiment.
- Said support can be Al 2 O 3 , SiO 2 , TiO 2 , ZrO 2 , ZnO, MgO, NbO 2 , CeO 2 and mixtures thereof.
- the weight ratio of Metal element A based on the total weight of the catalyst is from 20 to 100 wt%.
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Al, Zn and Na.
- the weight ratio of Cu based on the total weight of the catalyst is from 35 to 55 wt%.
- the weight ratio of Al based on the total weight of the catalyst is from 3 to 7 wt%.
- the weight ratio of Zn based on the total weight of the catalyst is from10 to 30 wt%.
- the weight ratio of Na based on the total weight of the catalyst is from 0 to 1 wt%.
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Al and Mn.
- the weight ratio of Cu based on the total weight of the catalyst is from 40 to 65 wt%.
- the weight ratio of Al based on the total weight of the catalyst is from 20 to 40 wt%.
- the weight ratio of Mn based on the total weight of the catalyst is from 2 to 20 wt%.
- the metal catalyst may comprise Metal element A being Cu and Metal element B being Si.
- the weight ratio of Cu based on the total weight of the catalyst is from 85 to 100 wt%.
- the weight ratio of Si based on the total weight of the catalyst is from 0.005 to 10 wt%.
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Mg, Cr and Si.
- the weight ratio of Cu based on the total weight of the catalyst is from 60 to 90 wt%.
- the weight ratio of Mg based on the total weight of the catalyst is from 0 to 5 wt%.
- the weight ratio of Cr based on the total weight of the catalyst is from 0 to 3 wt%.
- the weight ratio of Si based on the total weight of the catalyst is from 0 to 10 wt%.
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Al and Si.
- the weight ratio of Cu based on the total weight of the catalyst is from 40 to 80 wt%.
- the weight ratio of Al based on the total weight of the catalyst is from 0 to 6 wt%.
- the weight ratio of Si based on the total weight of the catalyst is from 0 to 10 wt%
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Ni and Si.
- the weight ratio of Cu based on the total weight of the catalyst is from 45 to 95 wt%.
- the weight ratio of Ni based on the total weight of the catalyst is from 0 to 10 wt%.
- the weight ratio of Si based on the total weight of the catalyst is from 0 to 10 wt%.
- the metal catalyst may comprise Metal element A being Cu, and Metal element B being Cr and Si.
- the weight ratio of Cu based on the total weight of the catalyst is from 50 to 95 wt%.
- the weight ratio of Cr based on the total weight of the catalyst is from 0 to 40 wt%.
- the weight ratio of Si based on the total weight of the catalyst is from 0 to 10 wt%.
- the metal catalyst according to the present invention can further comprise at least one metal sulphide compound.
- metal sulphide compounds comprise typically at least one sulphur atom and at least one metal atom which is chemically bound to the sulphur atom; the electronegativity of the sulphur atom is obviously higher than the electronegativity of the metal atom.
- the (or at least one) metal atom comprised in the metal sulphide compound can be notably:
- the metal catalyst according to the present invention can further comprise at least one metal carbide compound.
- Metal carbide compounds comprise typically at least one carbon atom and at least one metal atom which is chemically bound to the carbon atom; the electronegativity of the carbon atom is obviously higher than the electronegativity of the metal atom.
- the (or at least one) metal atom comprised in the metal carbide compound can be notably:
- LaC 2 lanthanum percarbide
- Ln 2 C 3 sesquicarbide, wherein Ln denotes a lanthanide
- the metal catalyst according to the present invention can further comprise at least one metal nitride compound.
- Metal nitride compounds comprise typically at least one nitrogen atom and at least one metal atom which is chemically bound to the nitrogen atom; the electronegativity of the nitrogen atom is obviously higher than the electronegativity of the metal atom.
- the (or at least one) metal atom comprised in the metal nitride compound can be notably:
- the metal nitride is an oxynitride (i.e. a compound that qualifies as metal nitride compound and as metal oxide compound) . Examples thereof are:
- TaON tantalum oxynitride
- perovskite oxynitrides such as CaTaO 2 N, SrTaO 2 N, BaTaO 2 N, LaTaON 2 and BaNbO 2 N, and
- the metal catalyst is composed of metal element in elemental form and/or metal oxide.
- the metal catalyst according to the present invention can be obtained by pre-reduction of commercial catalysts, such as T-4489 P, T-8031 P from Süd-Chemie, T-4419 P from Clariant and Pricat CU 60/35 P, Pricat CU 50/8 P, Pricat 60/8 P from Johnson Matthey.
- commercial catalysts such as T-4489 P, T-8031 P from Süd-Chemie, T-4419 P from Clariant and Pricat CU 60/35 P, Pricat CU 50/8 P, Pricat 60/8 P from Johnson Matthey.
- the skilled person can pre-reduce the commercial catalysts by some well-known ways.
- the metal catalyst can be obtained by in situ-reduction. That is to say, the commercial catalysts can be in situ-reduced during the reaction of the compound having general formula (II) with the alcohol having general formula (III) in the presence of hydrogen.
- the weight ratio of the metal catalyst to the compound having general formula (II) is from 0.1 to 10 and preferably from 0.2 to 2.
- the weight ratio of the compound having general formula (II) to the alcohol having general formula (III) may be from 0.0001 to 0.1 and preferably from 0.001 to 0.05.
- the alcohol having general formula (III) is the reactant and also the only solvent of the compound having general formula (II) .
- the reaction may also be carried out in the presence of a second solvent other than the alcohol having general formula (III) as long as the second solvent does not participate in the reaction in place of the alcohol.
- solvent examples include water, formaldehyde (traces) , formic acid (traces) , benzene, toluene, dimethyl ether, etc.
- the concentration of the compound having general formula (II) in the solvent may be from 0.01wt%to 9wt%, preferably from 0.1wt%to 5wt%and more preferably from 0.1wt%to 2.5wt%.
- reaction of the compound having general formula (II) with the alcohol having general formula (III) is desirably carried out under a hydrogen pressure in a range of 15-70 bar, and more preferably 20-50 bar.
- hydrogen may be added during the reaction to make up for the consumption or continuously circulated through the reaction zone.
- the reaction may be carried out in the presence of an inert atmosphere such as N 2 or Ar.
- the reaction time may be from 4 to 24h and preferably from 10 to 20h.
- the reaction temperature may be from 140°C to 220°C and preferably from 180°C to 200°C.
- the invention also concerns a mixture comprising:
- the mixture may further comprise a second solvent selected from the group consisting of water, formaldehyde, formic acid, benzene, toluene and dimethyl ether.
- a second solvent selected from the group consisting of water, formaldehyde, formic acid, benzene, toluene and dimethyl ether.
- the mixture may further comprise a compound having general formula (I) .
- the compound having general formula (I) , the compound having general formula (II) , the alcohol having general formula (III) , the metal catalyst and the solvent have the same meaning as above defined.
- a gas mixture consisting of H 2 /Ar or H 2 /N 2 in 1/3 to 1/10 ratio is flew through the tube from one outlet to another which is connected directly to the atmosphere.
- the tube is weighed with and without catalyst to get the real weight ofthe catalyst.
- the catalyst is used freshly after reduction, or kept in a glove box filled with argon.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 30 bar of hydrogen.
- the sealing ofthe reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 10 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 30 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 20 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood. The liquid was firstly weighed and then filtered and analyzed by GC affording 28%yield of PMDTA.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 50 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to the temperatures described in Table 4 for 10 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with hydrogen till the pressures described in Table 5.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 10 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- Pre-reduced copper containing catalyst Pricat 60/8P was weighed (0.12g) .
- a clean autoclave was charged under nitrogen after vacuum&nitrogen exchanges for 3 times, catalyst was transferred into autoclave immediately.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 50 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for time described in Table 6 with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- Pre-reduced copper containing catalyst Pricat 60/8P was weighed to a certain amount described in Table 7. A clean autoclave was charged under nitrogen after vacuum&nitrogen exchanges for 3 times, catalyst was transferred into autoclave immediately.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 50 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 10 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- Pre-reduced copper containing catalyst Pricat 60/8P was weighed (0.13 g) . A clean autoclave was charged under nitrogen after vacuum&nitrogen exchanges for 3 times, catalyst was transferred into autoclave immediately.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 40 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and if the pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 20 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration.
- Pre-reduced copper containing catalyst Pricat 60/8P was weighed (0.12 g) . A clean autoclave was charged under nitrogen after vacuum&nitrogen exchanges for 3 times, catalyst was transferred into autoclave immediately.
- the autoclave was well sealed under nitrogen, and purged by hydrogen 10 bar and evacuated for 10 times, finally purged with 50 bar of hydrogen.
- the sealing of the reactor is checked by waiting 1 hour at room temperature without stirring, and ifthe pressure remains unchanged then the reactor is well-sealed. Then the reactor was stirred with mechanical stirring for 1 hour at ambient temperature to allow the absorption of the hydrogen, followed by heating up to 200°C for 10 hours with 500 rounds/min stirring speed.
- the reactor was cooled down to ambient temperature and the hydrogen gas was evacuated carefully in fume hood.
- To the reaction mixture was added internal standard bisphenyl with accurate weight. After complete dissolving of bisphenyl, the liquid was firstly weighed and then filtered and analyzed by GC. The conversion and yields were calculated using internal standard calibration. The yield of PMDTA was 68.1%.
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PCT/CN2020/078148 WO2021174522A1 (en) | 2020-03-06 | 2020-03-06 | A method for the alkylation of amines |
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EP4114820A4 EP4114820A4 (de) | 2024-01-17 |
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DE102004023529A1 (de) * | 2004-05-13 | 2005-12-08 | Basf Ag | Verfahren zur kontinuierlichen Herstellung eines Amins |
RU2009104740A (ru) * | 2006-07-14 | 2010-08-27 | Басф Се (De) | Способ получения амина |
KR20170083085A (ko) * | 2014-11-10 | 2017-07-17 | 로디아 오퍼레이션스 | 직접 아민화 반응에 의한 아민을 형성하는 방법 |
CN110325520A (zh) * | 2016-12-22 | 2019-10-11 | 罗地亚经营管理公司 | 用于生产包含至少两个胺官能团的四氢呋喃化合物的方法 |
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