EP3527093A1 - Base de perruque, perruque et procédé de fabrication de base de perruque - Google Patents

Base de perruque, perruque et procédé de fabrication de base de perruque Download PDF

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Publication number
EP3527093A1
EP3527093A1 EP17862356.7A EP17862356A EP3527093A1 EP 3527093 A1 EP3527093 A1 EP 3527093A1 EP 17862356 A EP17862356 A EP 17862356A EP 3527093 A1 EP3527093 A1 EP 3527093A1
Authority
EP
European Patent Office
Prior art keywords
fiber
wig
fabric
wig base
mesh region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP17862356.7A
Other languages
German (de)
English (en)
Other versions
EP3527093A4 (fr
Inventor
Toshiya ESASHIKA
Toshiki Maegawa
Hiroyuki Nosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aderans Co Ltd
Original Assignee
Aderans Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aderans Co Ltd filed Critical Aderans Co Ltd
Publication of EP3527093A1 publication Critical patent/EP3527093A1/fr
Publication of EP3527093A4 publication Critical patent/EP3527093A4/fr
Withdrawn legal-status Critical Current

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Classifications

    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41G—ARTIFICIAL FLOWERS; WIGS; MASKS; FEATHERS
    • A41G3/00—Wigs
    • A41G3/0041—Bases for wigs
    • A41G3/005—Bases for wigs made of a net structure
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41G—ARTIFICIAL FLOWERS; WIGS; MASKS; FEATHERS
    • A41G3/00—Wigs
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41G—ARTIFICIAL FLOWERS; WIGS; MASKS; FEATHERS
    • A41G3/00—Wigs
    • A41G3/0075—Methods and machines for making wigs

Definitions

  • the present invention relates to a wig base using a fabric, a wig obtained by implanting false hair on a wig base, and a method of manufacturing a wig base.
  • a fabric formed in mesh form is used for many wig bases in consideration of air permeability and wear comfort.
  • a wig in which artificial skin made from synthetic resin is used for a hair parted portion of a wig base or the like.
  • a location for implantation is restricted. This may cause difficulty in providing a desired amount of hair or forming a flow of hair for hair whorl, a hair parted portion, or the like.
  • the present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a wig base in which a difference in height at a boundary between regions having different mesh densities is suppressed, thereby improving fitting comfort, the wig base capable of being easily manufactured at low cost, a wig obtained by implanting false hair on the wig base, and a method of manufacturing the wig base.
  • a wig base includes a base fabric, which is an etched fabric, having a dense mesh region formed of two or more kinds of fibers including a first fiber and a second fiber and a coarse mesh region in which the first fiber is removed as compared with the dense mesh region.
  • a wig according to one embodiment of the present invention obtained by implanting false hair on the wig base.
  • a method of manufacturing a wig base is a method of manufacturing the wig base, the method including: a first step of preparing a fabric formed of two or more kinds of fibers including a first fiber and a second fiber; a second step of applying an etching agent that dissolves or decomposes the first fiber and does not dissolve or decompose the second fiber to a region of part of the fabric and heating the fabric if necessary; and a third step of washing the fabric after the second step to remove the first fiber having been dissolved or decomposed.
  • the present invention can provide a wig base in which a difference in height at a boundary between regions having different mesh densities is suppressed to improve fitting comfort, the wig base capable of being easily manufactured at low cost, a wig obtained by implanting false hair on the wig base, and a method of manufacturing the wig base.
  • a wig base according to a first embodiment of the present invention includes a base fabric, which is an etched fabric, having a dense mesh region formed of two or more kinds of fibers including a first fiber and a second fiber and a coarse mesh region in which the first fiber is removed as compared with the dense mesh region.
  • the dense mesh region and the coarse mesh region can be obtained by one etched fabric, it is possible to suppress a difference in height at the boundary between the regions having different mesh densities. Therefore, a misalignment hardly occurs between a wearer's head and the wig base when the wig is worn, and excellent fitting comfort is obtained. Further, by an etching process, it is possible to easily form the wig base at low cost without a complicated knitting process or the like.
  • a second embodiment of the present invention provides the wig base, according to the first embodiment, in which a knot of a fiber is not included in a boundary portion between the dense mesh region and the coarse mesh region.
  • the present embodiment does not have a knot of fibers, which has conventionally been formed when a hair parted portion and a mesh portion are sewn, at the boundary portion between the dense mesh region and the coarse mesh region. Accordingly, a wig using the base fabric does not cause uncomfortable feeling or discomfort due to a wearer's head hitting the knot, and a wig excellent in fitting comfort can be obtained.
  • a third embodiment of the present invention provides the wig base, according to the first or second embodiment, in which the dense mesh region is disposed in a hair parted portion.
  • the dense mesh region is disposed in the hair parted portion, wearing of a wig is hardly found out and a more natural appearance can be obtained.
  • a fourth embodiment of the present invention provides the wig base, according to any one of the first to third embodiments, in which the dense mesh region is disposed in an edge portion of the base fabric.
  • the dense mesh region is disposed in the edge portion of the base fabric, it is possible to increase the strength of the edge portion of the base fabric and to provide a wig base excellent in durability with less deformation.
  • a fifth embodiment of the present invention provides the wig base, according to any one of the first to fourth embodiments, in which at least part of the base fabric is colored to a color similar to a color of a wearer's scalp.
  • the wig base since at least part of the base fabric is colored to a color similar to a color of a wearer's scalp, the wig base fits the skin, and a natural appearance that does not cause visual discomfort can be obtained.
  • a wig according to a six embodiment of the present invention is obtained by implanting false hair on the wig base according to any one of the first to fifth embodiments.
  • a method of manufacturing a wig base according to a seventh embodiment of the present invention is a method of manufacturing the wig base according to any one of the first to fifth embodiments, the method including: a first step of preparing a fabric formed of two or more kinds of fibers including a first fiber and a second fiber; a second step of applying an etching agent that dissolves or decomposes the first fiber and does not dissolve or decompose the second fiber to a region of part of the fabric and heating the fabric if necessary; and a third step of washing the fabric after the second step to remove the first fiber having been dissolved or decomposed.
  • the wig base can be easily manufactured at low cost.
  • the wig base the wig obtained by implanting false hair on the wig base, and the method of manufacturing the wig base according to embodiments of the present invention will be described in detail below with referring to the drawings.
  • FIG. 1 is a plan view showing a wig base according to one embodiment of the present invention
  • FIGS. 2 and 3 are plan views showing the wig base according to another embodiment of the present invention.
  • a wig base 2 includes a base fabric 8, which is an etched fabric, having a dense mesh region 4 formed of two or more kinds of fibers including a first fiber and a second fiber, and a coarse mesh region 6 in which the first fiber is removed as compared with the dense mesh region 4.
  • a shape of the mesh is schematically shown.
  • the etched fabric is a fabric formed by an etching process and also referred to as an etched cloth.
  • an etching agent is applied to a predetermined region of a fabric, in which a fiber that is to be dissolved or decomposed by the etching agent and a fiber that is not to be dissolved or decomposed by the etching agent are combined, to remove one of the fibers.
  • the first fiber is a fiber which is dissolved or decomposed by etching
  • the second fiber is a fiber which is not dissolved or decomposed by etching. It is noted that the first fiber may include a plurality of fibers, and the second fiber may include a plurality of fibers.
  • FIGS. 4(a) to 4(d) show an example of a fabric formed into a dense mesh form using the first fiber and the second fiber.
  • FIG. 4 is a plan view showing a fabric in which the first fiber and the second fiber are knitted in a dense mesh form. As is apparent from the drawings, the first fiber 10 is knitted between coarse meshes made of the second fiber 12 to form a dense mesh.
  • an etched fabric having a dense mesh-like region and a coarse mesh-like region can be formed. It is noted that the fabric shown in FIGS. 4(a) to 4(d) is merely an example, and a fabric in which the first fiber 10 and the second fiber 12 are knitted in other optional patterns can be used.
  • the first fiber in the applied region is removed, and the base fabric 8 having the dense mesh region 4 and the coarse mesh region 6 as shown in FIGS. 1 to 3 is formed.
  • the fabric is preferably formed with a structure by which the fabric is hardly frayed even if some threads melt (or are decomposed) in the design of a knitting structure and a weaving structure.
  • the formed base fabric 8 does not have a knot of fibers, which has conventionally been formed when a hair parted portion and a mesh portion are sewn, at the boundary portion between the dense mesh region 4 and the coarse mesh region 6. Accordingly, a wig using the base fabric 8 does not cause uncomfortable feeling or discomfort due to a wearer's head hitting the knot, and a wig excellent in fitting comfort can be obtained.
  • the dense mesh region 4 is disposed in a hair parted portion.
  • the wig base 2 it is possible to bind false hair with a filament of the coarse mesh region 6, and also to bind false hair of an amount corresponding to a hairline with a filament in the dense mesh region 4 in the hair parted portion.
  • the dense mesh region 4 is disposed in the hair parted portion, wearing of a wig becomes inconspicuous and a more natural appearance can be obtained.
  • the dense mesh region 4 disposed in the hair parted portion is color similar to that of a scalp. In such a case, a more natural appearance can be obtained.
  • the dense mesh region 4 is disposed not only in a hair parted portion but also in an edge portion of the base fabric 8. In this manner, it is possible to increase the strength of the edge portion of the base fabric, and the wig base 2 with less deformation and excellent durability can be provided.
  • a reinforcing member 20 is further sewn to the edge portion of the base fabric 8 on which the dense mesh region 4 is disposed.
  • the reinforcing member 20 a cloth member having a denser mesh can be used. Further, the reinforcing member can be obtained by sewing thick threads, and other optional members can be used as reinforcing members.
  • the wig base for an entire head wig is shown.
  • the present invention is not limited to the embodiments, and there may be a case of a wig base for a partial wig.
  • the dense mesh region 4 is disposed in the hair parted portion and the edge portion of the base fabric.
  • the present invention is not limited to this, and the dense mesh region 4 can be placed at other optional positions in accordance with purposes.
  • the wig base 2 includes the base fabric 8 made from an etched fabric having the dense mesh region 4 formed of two or more kinds of fibers including the first fiber 10 and the second fiber 12, and the coarse mesh region 6 obtained by removing the first fiber 10 from the dense mesh region 4.
  • the dense mesh region 4 and the coarse mesh region 6 can be obtained by one etched fabric, it is possible to suppress a difference in height at the boundary between the regions having different mesh densities. Therefore, a misalignment hardly occurs between a wearer's head and the wig base when the wig is worn, and excellent fitting comfort is obtained. Further, by an etching process, it is possible to easily form the wig base at low cost without a complicated knitting process or the like.
  • Examples of the fabric used in the present invention include a knitted fabric and a woven fabric.
  • Examples of the knitted fabric include weft knitted fabric, such as plain stitch, rib stitch, pearl stitch, or the like and a warp knitted fabric, such as tricot stitch, cord stitch, atlas stitch, or the like.
  • Examples of the woven fabric include plain weave, twill weave, satin weave, or the like.
  • the fabric is not limited to the above.
  • a knitted fabric is preferably used from the viewpoint of elasticity and emphasis on appropriate see-through sensation and comfort.
  • a composite structure combining two or more kinds of structures is preferably used.
  • denbigh stitch that allows knitting to be performed evenly over an entire surface is preferably used, without limitation, as a structure of the first fiber.
  • the first fiber can be combined with the second fiber by a method, such as interknitting, combined weaving, mixed spinning, intertwisting, or the like. Among them, combination by interknitting and combined weaving is preferably used, so that the strength after etching is improved, and a coarse portion and a dense portion can be more clearly formed.
  • the second fiber in order to enhance durability, is preferably knitted with atlas stitch or two needle stitch of a knitting structure. Furthermore, combination by interknitting is preferably used for improving elasticity.
  • the first fiber is 20% to 75% by weight and the second fiber is 25% to 80% by weight, and more preferably, the first fiber is 30% to 70% by weight and the second fiber is preferably 30% to 70% by weight.
  • the form of the fabric can be secured at the time of etching.
  • the strength as a wig base material can be easily secured.
  • An aperture ratio in the coarse mesh region 6 is preferably 20% to 90%, and more preferably 50% to 80%. If the opening ratio is 90% or less, a hair implanted area that looks naturally can be secured. Further, if the opening ratio is 20% or more, sufficient air permeability can be obtained and the wig can be worn comfortably without the feeling of stuffiness.
  • a single fiber fineness of the first fiber is preferably 1 to 4 decitex, and more preferably 1 to 3 decitex.
  • the single fiber fineness is 4 decitex or less, flexibility is sufficiently obtained, and variations in dissolution or decomposition are reduced. If the single fiber fineness is 1 decitex or more, sufficient flexibility is obtained and wearing comfort for a wearer is improved.
  • a total fineness of the first fiber is preferably 11 to 110 decitex, more preferably 33 decitex or less, so that sufficient flexibility is obtained, variations in dissolution or decomposition of the first fiber are reduced, and also wearing comfort for a wearer is improved. Further, if the total fineness of the first fiber is 11 decitex or more, sufficient strength can be obtained, and breakage, split, or the like at the time of production can be reduced.
  • a single fiber fineness of the second fiber is preferably 1 to 9 decitex, and more preferably 1 to 6 decitex. If the single fiber fineness is 6 decitex or less, sufficient flexibility is obtained and also wearing comfort for a wearer is improved. Further, if the single fiber fineness is 1 decitex or more, sufficient strength can be obtained even in the coarse mesh region 6 which has been subject to an etching process.
  • the total fineness of the second fiber is preferably 20 to 100 decitex.
  • the second fiber is thin and lightweight, furthermore flexibility is sufficiently obtained, and wearing comfort for a wearer is improved. Further, if the total fineness of the second fiber is 20 decitex or more, occurrence of thread breakage due to external stress can be reduced.
  • the first fiber is not limited in particular as long as the first fiber is a fiber that is etched by an etching process, that is, a fiber that is dissolved or decomposed by the etching agent.
  • the first fiber can be determined based on a type of the etching agent to be used.
  • the etching agent is an alkaline aqueous solution containing guanidine weak acid salt, sodium hydroxide, alkali metal hydroxide, alkaline earth hydroxide, or the like
  • alkaline soluble cation dyeable polyester fiber or the like is exemplified as the first fiber.
  • the second fiber a nylon-based fiber, a regular polyester-based fiber, a polyurethane-based fiber, cotton, a cellulose-based fiber for rayon, and composite fibers of these can be used.
  • the etching agent is an acidic aqueous solution containing phenols, alcohols, aluminum sulfate, sodium acidic sulfate or the like
  • a cellulose-based fiber such as rayon, Bemberg (registered trademark), lyocell, cotton, hemp, acetate-based fiber, or the like
  • a nylon-based fibers such as nylon 6, nylon 66, or the like is exemplified as the first fiber.
  • the second fiber a polyester-based fiber, a polyurethane-based fiber, an animal-based natural fiber, such as wool and silk, which are fibers other than the above fibers can be used.
  • a water-soluble fiber such as vinylon
  • the second fiber a fiber other than a water-soluble fiber can be used.
  • the first fiber is a cation dyeable polyester fiber
  • the second fiber is nylon 6 or nylon 66
  • the etching agent is an acrylic aqueous solution
  • guanidine weak acid salt is preferable from the viewpoint that coarse and dense formation is easily obtained, and the environment and safety are excellent.
  • guanidine carbonate is particularly preferable from the viewpoint that pH of an aqueous solution is low, 10 to 13, as compared with other strong alkali, such as sodium hydroxide, the safety of work and the device are hardly corroded, there is less influence on the dye used for coloring the fiber, or the like.
  • guanidine carbonate is considered to decompose a cation dyeable polyester fiber because the guanidine carbonate is decomposed into urea and ammonia to be changed to strong alkali in a process of heat treatment performed after application of the guanidine carbonate.
  • FIG. 5 is a flowchart showing the method of manufacturing the wig base according to one embodiment of the present invention.
  • a fabric formed of two or more kinds of fibers including the first fiber and the second fiber is prepared (step S1).
  • a desired fabric is manufactured, or a fabric available on the market can be used.
  • the etching agent which dissolves or decomposes the first fiber and does not dissolve or decompose the second fiber is applied to a region (for example, a hair parted portion) of part of a fabric, and if necessary, the fabric is heated to dissolve or decompose the first fiber (step S2).
  • the etching agent can be applied to a region of part of the fabric by an inkjet method.
  • the etching agent can be applied in a complicated and fine shape. Accordingly, it is possible to obtain a base fabric having optimum coarse and dense patterns in accordance with the purposes.
  • coloring of a fabric can also be carried out in the same process by using an inkjet method, which can contribute to simplification of the manufacturing process and reduction of manufacturing cost.
  • the application of the etching agent is not limited to the case of using the inkjet method, but it is also possible to use a screen type or roller type printing device, such as silk screen.
  • the fabric is heated for a predetermined period of time in order to decompose the first fiber in step S2.
  • step S3 the fabric is washed to remove the first fiber having been dissolved or decomposed.
  • the base fabric 8 which is an etched fabric, having the dense mesh region 4 formed of two or more kinds of fibers including the first fiber and the second fiber, and the coarse mesh region 6 in which the first fiber is removed as compared with the dense mesh region can be obtained.
  • the wig base 2 can be easily manufactured at low cost.
  • FIG. 6 is a perspective view (photograph) showing an example of the wig base according to the present invention.
  • the dense mesh region 4 is disposed in a hair parted portion and an edge portion of the base fabric.
  • a wig can be manufactured by binding false hair with a filament constituting a mesh of the wig base 2.
  • a filament constituting a mesh of the wig base 2.
  • human hair can be used, or artificial hair made from a synthetic fiber can also be used.
  • a known optional binding method can be employed.
  • FIG. 7 shows an example of a wig 30 in which false hair 32 is implanted in the wig base 2 shown in FIG. 6 as described above.
  • FIG. 7 is a plan view (photograph) showing an example of the wig according to the present invention.
  • the wig according to the present invention can exhibit the above optional action and effect.

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Knitting Of Fabric (AREA)
  • Prostheses (AREA)
  • Woven Fabrics (AREA)
EP17862356.7A 2016-10-17 2017-10-10 Base de perruque, perruque et procédé de fabrication de base de perruque Withdrawn EP3527093A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016203726A JP6177407B1 (ja) 2016-10-17 2016-10-17 かつらベース、かつら及びかつらベースの製造方法
PCT/JP2017/036604 WO2018074277A1 (fr) 2016-10-17 2017-10-10 Base de perruque, perruque et procédé de fabrication de base de perruque

Publications (2)

Publication Number Publication Date
EP3527093A1 true EP3527093A1 (fr) 2019-08-21
EP3527093A4 EP3527093A4 (fr) 2020-05-13

Family

ID=59559140

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17862356.7A Withdrawn EP3527093A4 (fr) 2016-10-17 2017-10-10 Base de perruque, perruque et procédé de fabrication de base de perruque

Country Status (8)

Country Link
US (1) US20190246727A1 (fr)
EP (1) EP3527093A4 (fr)
JP (1) JP6177407B1 (fr)
CN (1) CN109843103A (fr)
CA (1) CA3040822A1 (fr)
SG (1) SG11201903416RA (fr)
TW (1) TWI713792B (fr)
WO (1) WO2018074277A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6978627B1 (ja) * 2021-06-17 2021-12-08 株式会社アデランス かつら及び増毛部材
CN115506047B (zh) * 2022-08-19 2023-08-22 邵阳深镁科技时尚有限公司 一种高强度假发及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5218977A (en) * 1990-02-26 1993-06-15 Masakatsu Takahashi Wig-like cool cap and method for manufacturing
JP3019231U (ja) * 1995-02-09 1995-12-12 株式会社アートヘアー かつら
JP2881400B2 (ja) * 1996-02-28 1999-04-12 株式会社ダイヤモンド・ライフ カツラ
EP1055757A4 (fr) * 1998-10-14 2001-01-24 Asahi Doken Kabushiki Kaisha Filet a structure tridimensionnelle, et materiau structurel composite utilisant ledit filet
JP2006070392A (ja) * 2004-09-02 2006-03-16 Aderans Co Ltd かつら用ネット
JP2008038332A (ja) * 2006-07-13 2008-02-21 Seiren Co Ltd 抜蝕加工カーテン用布帛
JP5221905B2 (ja) * 2007-03-26 2013-06-26 株式会社アートネイチャー かつらベース及びかつら
CN101156717A (zh) * 2007-06-19 2008-04-09 青岛新特发制品有限公司 一种人工头皮表层无毛发结扣的假发及其制造方法
ES2332254B1 (es) * 2008-01-23 2010-10-25 Juan Manuel Aloy Font Tejido y procedimiento de obtencion del mismo.
JP6422651B2 (ja) * 2014-01-20 2018-11-14 株式会社アートネイチャー かつらベースの製造方法
CN203789219U (zh) * 2014-04-23 2014-08-27 许先锋 假发网底
JP2016017245A (ja) * 2014-07-08 2016-02-01 株式会社クラレ 消臭性を有するエチレン−ビニルアルコール系繊維および糸、並びに繊維製品
CN104332795B (zh) * 2014-09-26 2017-02-01 中南大学 一种金属纤维电刷及其制备方法
CN107205509B (zh) * 2015-01-19 2019-07-19 荒川国子 内帽
JP5810231B1 (ja) * 2015-01-28 2015-11-11 株式会社アデランス カツラベースおよびカツラ

Also Published As

Publication number Publication date
JP2018066071A (ja) 2018-04-26
JP6177407B1 (ja) 2017-08-09
US20190246727A1 (en) 2019-08-15
TW201818838A (zh) 2018-06-01
SG11201903416RA (en) 2019-05-30
WO2018074277A1 (fr) 2018-04-26
TWI713792B (zh) 2020-12-21
CA3040822A1 (fr) 2018-04-26
EP3527093A4 (fr) 2020-05-13
CN109843103A (zh) 2019-06-04

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