EP3341958B1 - Appareil pour appliquer un medium fluide, dans lequel une radiation uv est introduite, sur un substrat - Google Patents

Appareil pour appliquer un medium fluide, dans lequel une radiation uv est introduite, sur un substrat Download PDF

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Publication number
EP3341958B1
EP3341958B1 EP16762983.1A EP16762983A EP3341958B1 EP 3341958 B1 EP3341958 B1 EP 3341958B1 EP 16762983 A EP16762983 A EP 16762983A EP 3341958 B1 EP3341958 B1 EP 3341958B1
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EP
European Patent Office
Prior art keywords
radiation
chamber
substrate
tube element
outlet opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP16762983.1A
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German (de)
English (en)
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EP3341958B8 (fr
EP3341958A1 (fr
Inventor
Peter Dress
Uwe Dietze
Peter Grabitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suss Microtec Solutions & Co Kg GmbH
Original Assignee
SUSS MicroTec Photomask Equipment GmbH and Co KG
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Publication date
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Publication of EP3341958A1 publication Critical patent/EP3341958A1/fr
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Publication of EP3341958B1 publication Critical patent/EP3341958B1/fr
Publication of EP3341958B8 publication Critical patent/EP3341958B8/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Definitions

  • the present invention relates to a device for applying a liquid medium exposed to UV radiation to a substrate in order to treat the substrate, the liquid being applied locally in the area of the device to a partial area of the substrate and UV radiation being introduced into the liquid.
  • photomasks for example, have to be subjected to different treatment steps, in particular cleaning steps, both during their manufacture and during their use.
  • cleaning steps for example, it is known to subject the photomasks to wet cleaning, in which a liquid film is produced at least locally on the substrate and UV radiation is introduced into this liquid film.
  • Corresponding cleaning steps are also known for semiconductor wafers during their manufacture.
  • the liquid and the UV radiation are coordinated in such a way that a large part of the UV radiation is absorbed in the liquid film in order to generate radicals in the liquid film, which promote cleaning.
  • hydroxyl radicals for example in diluted hydrogen peroxide water or ozone water O 3 -H 2 O.
  • Such hydroxyl radicals bring about a selective solution of organic materials from the substrate surface without attacking any metallic layers on the substrate surface.
  • an application unit for the liquid via which UV radiation is also introduced into the liquid, is usually moved over the substrate so that the liquid sweeps over the substrate.
  • a treatment with radicals takes place primarily below the application unit, since the radicals break down quickly when the application unit moves further and the areas that have just been exposed to UV radiation are no longer exposed to UV radiation.
  • a device suitable for this is, for example, from the applicant's DE 10 2009 058 962 A1 known.
  • this application shows a device according to the preamble of claim 1.
  • a high concentration of radicals occurs in a longitudinal central area below an outlet opening of an application unit, but this concentration falls rapidly in the direction transverse to the outlet opening.
  • the object of the present application is to provide a good distribution of free radicals on the surface of the substrate.
  • the present invention is distinguished over the apparatus of the above DE 10 2009 058 962 A1 characterized by the additional features of the characterizing part of claim 1.
  • a device for applying a liquid medium exposed to UV radiation to a substrate which has the following: a housing with an elongated chamber, at least one inlet opening which opens towards the chamber and a slot-shaped opposite of the at least one inlet opening outlet opening extending the length of the chamber, a tubular member extending longitudinally through the chamber and at least partially transparent to UV radiation, the tubular member being positioned in the chamber such that between the tubular member and the wall of the chamber a flow space is formed which is symmetrical with respect to a longitudinal median plane of the chamber, which intersects the outlet opening in the middle, and that the tubular element extends into the slot-shaped outlet opening in the housing, thereby forming two longitudinally extending outlet slots between the tubular element and the housing, and at least s a source of UV radiation in the tube element, arranged to emit UV radiation towards the flow space and out of the housing through the outlet opening.
  • the device is characterized by means that are suitable for influencing the radiation emanating from the at least one UV radiation source and exiting from the outlet opening in such a way that the radicals have a substantially homogeneous spatial distribution in an area below at least 50% of the outlet opening the surface of the substrate.
  • a high concentration of radicals develops in an area below the center of the outlet opening, which rapidly increases in the direction transverse to the outlet opening falls off.
  • This area can now be broadened transversely to the outlet opening by the above means in such a way that an essentially homogeneous spatial distribution of the radicals occurs below at least 50% of the outlet opening.
  • the spatial distribution in such an area is regarded as homogeneous if a deviation in the radical concentration deviates locally by a maximum of 20% compared to an average radical concentration of the area.
  • the means comprise a flat portion of the tubular element facing the surface of the substrate which can be arranged parallel to the substrate surface, the flat portion having an area which corresponds to at least 50% of an area of the outlet opening .
  • a uniform thickness of a liquid film formed on the substrate and thus a more uniform intensity distribution of the radiation that generates radicals in the liquid film, in particular in an interface region of the liquid film, can be achieved.
  • a uniform concentration of radicals can be set on the substrate surface in this area.
  • the means preferably have at least one optical element which is arranged to homogenize the intensity of the radiation passing through the flat area over the area of the flat area.
  • the tubular element has a circular cross-section and the means comprise at least one optical element arranged to vary the intensity of the radiation exiting through the outlet opening and the tubular element such that the Intensity decreases towards the longitudinal center plane of the chamber, in particular steadily decreases.
  • the at least one optical means has at least one mirror element, which is arranged on the side of the at least one radiation source pointing away from the substrate and/or adjacent thereto and reflects radiation in the direction of the outlet opening in such a way that the above intensity distribution is achieved.
  • the mirror element is preferably symmetrical here with respect to the longitudinal center plane of the chamber.
  • the at least one optical means may be at least one film member or coating within the tubular member that is at or adjacent to a portion of the tubular member that is within the outlet orifice or external to the chamber, wherein the film member / coating is a exhibits spatially changing transmissivity for UV radiation.
  • the at least one optical means may comprise at least a portion of the tubular element which is in the outlet opening or outside the chamber and has a spatially varying transmissivity for UV radiation.
  • a corresponding influencing of the radiation intensity distribution can be achieved by the material of the tubular element itself.
  • the transmissivity of the film element, the coating and/or the tubular element can increase from the longitudinal center plane in the direction of the outlet slots, in particular continuously.
  • the at least one optical means comprises a plurality of at least three UV radiation sources located within the tubular member adjacent to each other and adjacent to a portion of the tubular member which is in the outlet orifice or outside of the Chamber lie, wherein the adjacent radiation sources emit UV radiation with different radiation intensities, in particular such that the radiation intensity decreases towards the longitudinal center planes of the chamber.
  • at least one separating element can also be provided in the tubular element, which essentially blocks radiation from the multiplicity of UV radiation sources in the direction of the flow space, and is in particular reflective. This essentially means that at least 90% of the radiation from the multiplicity of UV radiation sources is blocked in the direction of the flow space.
  • bore is to be understood as a longitudinally extending blind or through opening that is independent is of the type of manufacture, ie it does not have to be made by the process of drilling, but can be made in any suitable way.
  • FIG. 1 shows a schematic plan view of a device 1, which is not part of the invention, for a UV-radiation-assisted wet treatment of substrates 2, in particular masks or semiconductor wafers for chip production, whereby the substrate can also be one of the following: a photomask for the production of semiconductor wafers, a semiconductor wafer, in particular a Si wafer, Ge wafer, GaAs wafer, InP wafer, a flat panel substrate, a multi-layer ceramic substrate.
  • 2 shows a schematic sectional view through the device 1 along the line II-II.
  • the device 1 consists essentially of a substrate holder 4 and an application unit 6.
  • the substrate holder 4 and the application unit 6 can be accommodated in a pressure chamber, not shown, in which an overpressure or a negative pressure can be generated by suitable means.
  • a liquid such as diluted hydrogen peroxide water or ozone water O 3 -H 2 O or also other liquids, in particular water-containing liquids, are applied to the substrate.
  • complex reactions occur and, for example, 14 different species are formed with water alone as a liquid, such as H 2 O, H • , HO • , e-aq, HO 2 • , O 2 •- , H 2 , O 2 , H 2 O 2 , H 2 O - , H 3 O + , HO - , O 3 •- and HO 3 • .
  • Such reactions are much more complex and radicals have much shorter lifetimes than in gases exposed to UV radiation and therefore a wet treatment device is not readily comparable with a treatment device using gases.
  • the reactions that occur are wavelength-dependent and can be influenced in certain directions by wavelength selection.
  • the substrate holder 4 is, as in the 1 is indicated, shown as a flat rectangular plate for receiving the substrate 2 also rectangular. However, the substrate holder 4 can also have different shapes and can be adapted to the shape of a substrate 2 to be treated.
  • the substrate holder 4 has at least one outlet (not shown) for liquid media, which can be applied to the substrate 2 via the application unit 6 .
  • the application unit 6 consists of a main part 8 and a supporting part 10 which supports the main part 8 movably as indicated by the double-headed arrows A and B.
  • the support part 10 consists of a support arm 12 which is connected at one end to the main part 8 and whose other end is connected to a drive, not shown.
  • the drive can provide, for example, a pivoting movement of the support arm 10 and thus of the main part 8 and/or a linear movement.
  • the main part 8 can be moved in the desired manner over a substrate 2 held on the substrate holder 4 in order to enable partial areas of the same or the entire surface to be treated.
  • the support arm 10 it is also possible for the support arm 10 to perform a lifting movement in order to be able to set a distance between the main part 8 and the surface of a substrate 2 located on the substrate holder 4 .
  • the main part 8 consists essentially of a housing 14, media connections 16 and a radiation part 18.
  • the housing 14 has an elongated cuboid body 20 made of a suitable plastic, such as TFM, a modified PTFE. However, the housing can also consist of another suitable material. The material must be selected so that it is resistant to the temperatures and media used.
  • a longitudinally extending chamber 22 is defined in the body 20 and extends the entire length through the body 20 . Covering elements (not shown) can be attached to the longitudinal ends of the body 20 in order to delimit the chamber 22 in the longitudinal direction.
  • the body 20 and thus the chamber 22 have a length that is greater than a width dimension of the substrate 2 in order to be able to apply a liquid medium to it over the entire width, as will be explained in more detail below. But it is also possible that the body 20 or the chamber 22 has smaller dimensions.
  • the inner wall 23 of the chamber can be so formed be that it has a high reflectivity, in particular for UV radiation, but essentially absorbs IR radiation.
  • the chamber 22 has an essentially round cross-section, the chamber 22 opening towards the underside of the body 20, so that the body 20 here defines an opening 21 pointing downwards (towards the substrate 2). Consequently, the inner wall 23 of the chamber 22 in section only describes a partial circle which is larger than a semicircle and is preferably in the range from 250° to 300°, in particular between 270° and 290°.
  • connection 16 In the upper region of the chamber 22 in the body 20 there is at least one supply line 24 which is in flow communication with the connection 16 and which is directly opposite the opening 21 .
  • the feed line 24 is in flow connection with the chamber 22 in order to be able to conduct a liquid medium into the chamber 22, as will be explained in more detail below.
  • connections 16 are shown, which can each be in fluid communication with the chamber 22 via a corresponding supply line 24 .
  • a single liquid medium can be fed into the chamber 22 via the connections 16, or else several media, which can be fed in simultaneously or sequentially.
  • Liquids in particular can be considered as media here, but gases can also be fed in, which are mixed, for example, with a liquid in the connection 16 and the feed line 24 before they are introduced into the chamber 22 .
  • the radiation part 18 is essentially formed by a tubular element 30 and at least one radiation source 32 .
  • the tubular element 30 has an elongate shape and extends along the entire chamber 22 and can optionally also pass through (or into) the cover elements (not shown) at the ends of the Body 20 extend.
  • the tubular element 30 is made of a material that is essentially transparent to UV radiation and has a round cross section.
  • the center point of the tubular member 30, which is round in cross-section, is offset towards the opening 21 with respect to the center point of the pitch circle of the inner wall 23 of the chamber 22 and extends partially through the opening 21 out of the housing 14, as shown in FIG 2 is shown.
  • a flow space is thus formed between the tubular element 30 and the inner wall 23 of the chamber 22 .
  • the flow space is relative to a longitudinal center plane C of the chamber 22 (see line IV-IV in 3 ), which intersects the outlet opening 21 and the inlet pipe 24 in the middle, is symmetrical and forms a right and a left branch, as in the cross-sectional view in FIG 2 can be seen.
  • Each of the branches has an exit slit 37 at the lower end, which is formed between the tubular element 30 and the respective end of the inner wall 23 in the region of the opening 21 .
  • each of the branches of the flow space has a tapering flow cross section.
  • the flow cross section of the flow space in each branch tapers continuously in the direction of the respective outlet slot 37.
  • the ratio of the flow cross section of the flow space in the area adjacent to the at least one feed line 24 and at the outlet slots 37 is in the range from 10:1 to 40:1 and is preferred in the range 15:1 to 25:1.
  • Media flowing in the direction of the outlet slots 37 are therefore significantly accelerated.
  • a corresponding acceleration of the media leads on the one hand to a homogenization of the flow and on the other hand to high flow velocities at the outlet slots 37.
  • the radiation source 32 is a rod-shaped lamp which is arranged centrally within the tubular element 30 .
  • the rod-shaped lamp 32 again extends over the entire length of the chamber 22 in order to provide a uniform distribution of radiation over the length of the chamber 22.
  • the radiation source 32 primarily emits UV radiation in a desired spectral range, the emitted radiation being emitted both into the flow space of the chamber 22 and through the opening 21 out of the housing 14 .
  • the radiation can be selected specifically for a specific purpose, as will be explained in more detail below.
  • the radiation can also be controlled in such a way that different radiation is emitted into the flow space than out of the opening 21 .
  • tubular radiation source instead of or in addition to such a tubular radiation source, other radiation sources can also be provided, some of which are illustrated in the following exemplary embodiments.
  • more than one radiation source 32 can be provided within the tubular element 30 .
  • Gas discharge lamps, for example, but also LEDs or other suitable light sources which emit in a desired spectral range (at least also in the UV range) can be used as the radiation source 32 .
  • a cooling medium in particular a gaseous cooling medium, can flow through the space 40 created between the tubular element 30 and the radiation source 32 in order to prevent the elements from overheating.
  • the cooling medium should be selected in such a way that it essentially does not absorb any UV radiation.
  • FIG. 8 A further embodiment, which is not part of the invention, of an application unit 6, in particular an alternative main part 108, which can be used in the device according to FIG 1 can be used, described.
  • the main part 108 essentially consists of a housing 114, a media guide 116 and a radiation part 118.
  • the housing 114 in turn has an elongate, parallelepiped-shaped body 120 of a suitable material (such as TFM) extending longitudinally extending chamber 122 which extends the entire length of the body 120 .
  • Covering elements can be attached to the longitudinal ends of the body 120 in order to delimit the chamber 122 in the longitudinal direction, for example by means of screws which provide a detachable connection. However, other preferably detachable connections are also possible.
  • the chamber 122 can in turn have a length that is greater than a width dimension of a substrate 2 to which a liquid medium is to be applied.
  • the chamber 122 has a substantially circular cross-section, with the chamber 122 opening onto an underside 124 of the body 120 such that a downwardly facing opening 121 is defined.
  • An inner wall 123 of the chamber 122 thus again describes a partial circle which, however, is larger than a semicircle.
  • the opening angle of the opening 121 is preferably in a range between 60° and 120°, in particular between 70° and 90°.
  • the underside 124 of the body 120 is configured to form a ramp that increases toward sidewalls 128 of the body 120 .
  • a substantially planar area is formed between the slope and the opening 121 , and the body 120 has a curve 126 directly adjacent to the opening 121 . This curvature connects the substantially planar portion of the underside 124 to the circular inner wall 123 of the chamber 122 and at its apex defines the actual opening 121 in the body 120.
  • a plurality of sloping recesses are provided in the transition area between the bottom 124 and side walls 128 of the body 120 in the region of these recesses 130.
  • the body 120 has a through hole 132 to the chamber 122 in each case.
  • the through hole 132 is stepped and has a wider area facing the recess 130 and a narrower area facing the chamber 122 .
  • the through bore 132 is provided with an internal thread.
  • the respective through-hole 132 serves to accommodate an adjusting element 134 which has a stepped shape corresponding to the through-hole 132 with a head part 136 and an adjusting part 138 .
  • the Head portion 136 is sized to fit through the narrow portion of port 132 to protrude into chamber 122 .
  • the adjusting portion 138 has a male thread engageable with the female thread in the wide portion of the through hole 132 to be screwed therein.
  • the screw-in depth of the adjusting part 138 determines how far the head part 136 of the adjusting element 134 protrudes into the chamber 122 .
  • the actuating element 134 is made from a suitable material that is stable at the temperatures and media used and can have a certain elasticity.
  • a PFA material polyfluoroalkoxyl polymer material
  • other materials, in particular other plastics, can also be used.
  • An upper side 140 of the body 120 has a multiplicity of recesses 142 which extend transversely to the longitudinal direction of the body 120 and are aligned with the recesses 130 in the longitudinal direction of the body 120 .
  • a further recess 144 and a threaded bore 146 are provided in the area of each recess 142 .
  • the threaded hole 146 serves to receive a screw, via which a cover plate 147 for filling the recess 142 can be fastened.
  • the recess 144 has a first portion which extends transversely to the longitudinal direction of the body 120 at the bottom of the recess 142 .
  • the recess 144 also has, in each case directly adjacent to the respective side walls 128 , a deep section extending parallel to the side walls 128 .
  • the recess 144 thus essentially forms a U-shape, as best shown in FIG figure 3 can be seen.
  • FIG 7 shows a perspective view of the clip element 150 in a non-installed and thus relaxed state.
  • the clip element 150 has a substantially U-shape, with legs 152 of the U-shaped clip element 150 (in the relaxed state) extending towards one another, starting from a base part 154 of the clip element 150, without each other to touch. In other words, the spacing of the free ends of the legs 152 is less than the spacing of the legs on the base portion 154.
  • legs 152 of the clip member 150 when the legs 152 of the clip member 150 are inserted into the U-shaped recess 144, they must be bent apart slightly and practiced then applies an inward bias to the inboard portion of the body 120 relative to the legs.
  • an inward bias is provided in the area of the adjusting elements 134 .
  • the aforementioned media guide 116 is integrally formed in the body 120 and will be discussed in more detail below.
  • the media guide 116 is essentially divided into supply elements 160 , a media distribution channel 162 and introductory channels 164 .
  • the lead members 160 are provided, which are spaced apart from one another in the longitudinal direction of the body 120 .
  • the feed line elements 160 are not evenly spaced. Rather, the distance between the central lead elements 160 is smaller than to their respective outer lead elements 160.
  • the lead elements 160 are each formed on the upper side 140 of the body 120 and each have a substantially frusto-conical section 166 which extends upwards from the upper side 140 extends. Above the frusto-conical portion 166 is provided an annular connector 168 suitably adapted for connection to an external lead.
  • a vertically extending through bore 170 is formed in the frusto-conical portion 166 . This extends completely through the frustoconical part 166 of the feed element 160 to the media distribution channel 162, which is explained in more detail below.
  • the media distribution channel 162 is formed by a longitudinal bore 174 lying centrally in the transverse direction of the body 120 .
  • the longitudinal bore 174 extends completely through the body 120 and is located between the top 140 and the chamber 122 . In the end areas, the longitudinal bore 174 has a widened area 176 which can be closed by suitable end caps, not shown in detail.
  • the actual media distribution channel 162 is formed only by the central, non-closed part of the longitudinal bore 174. As one skilled in the art will recognize, it would of course also be possible for the longitudinal bore 174 to only open towards one end of the body 120 and accordingly only have a widening 176 at this end, which can be closed off in a suitable manner.
  • the longitudinal bore 174 which forms the media distribution channel 162 is in fluid communication with the bores 170 at four points.
  • Medium introduced via the feed elements 160 can thus be introduced into the media distribution channel 162 at various points and can then be distributed within the media distribution channel 162 in the longitudinal direction of the body 120 .
  • a multiplicity of through-bores are formed, which fluidically connect the media distribution channel 162 and the chamber 122 and thus form the introduction channels 164 .
  • twelve induction channels 164 are provided.
  • the introduction channels 164 are arranged offset with respect to the bores 170 in the longitudinal direction of the body 120 .
  • a different number of introduction channels 164 can also be provided.
  • the inlet channels 164 are preferably evenly spaced in the longitudinal direction of the body 120, with a density in the range from 3/100 mm to 12/100 mm, in particular in the range from 4/100 mm to 10/100 mm being currently preferred in order to ensure the homogeneity of the To promote flow in the chamber 122.
  • the spacers 179 are made of a suitable material that is stable at the temperatures and media used and has a certain elasticity. In particular, PFA can also be used here again, as in the case of the actuating elements 134 .
  • the spacers 179 each have a foot (not shown) for receiving in a respective one of the blind bores 178 and a frustoconical main part which is in 3 can be seen.
  • the radiation part 118 of this embodiment will now be explained in more detail below.
  • the radiation part 118 has a tubular element 180 and at least one radiation source 182 .
  • the tube element 180 has an elongate shape with a round cross-section and consists of a material which is essentially transparent to UV radiation.
  • the tubular member 180 is accommodated in the chamber 122 so as to extend over the entire length, and the center of the tubular member 180 which is round in cross section is offset toward the opening 121 with respect to the center of the pitch circle of the inner wall 123 of the chamber 122 .
  • Round tubular member 180 in turn extends partially out of housing 114 through opening 121 .
  • a flow space 184 is formed between the tubular element 180 and the inner wall 123 of the chamber 122, which is symmetrical with respect to a longitudinal center plane C of the chamber 122, which intersects the opening 121 and the inlet elements 160 in the middle.
  • the flow space 184 forms right and left branches as in the cross-sectional view of FIG figure 3 can be seen.
  • Each of the branches has an outlet slit 186 at the lower end.
  • each of the branches of the flow space has a tapering flow cross-section. This tapers in the same way as in the first embodiment.
  • the tubular element 180 rests on the heads 136 of the respective adjusting elements 134 and contacts the spacers 179 on its upper side. These therefore provide a 3-point contact and thus indicate the exact position of the tubular element 180 in the chamber 122 before.
  • the width of the outlet slits 186 can be adjusted within a certain range via the adjusting elements 134 .
  • the respective heads 136 of the adjusting elements 134 form point supports which impair the flow of a medium around the heads little, so that a substantially continuous medium curtain can be formed in the area of the outlet slots 186 .
  • the radiation source 132 may be placed within the tubular member 180 in the same manner as in the first embodiment.
  • brackets 150 which provides an inward bias in the region of the chamber 122 is based on the Figures 8a and 8b explained in more detail.
  • a liquid medium is introduced into the chamber 122 via the media guide 116
  • an outwardly directed pressure develops on the inner walls 123 of the chamber.
  • a corresponding pressure can lead to a deformation of the body 120 in such a way that the distance at the outlet slots 186 increases. This applies in particular to a central area in the longitudinal direction of the body 120, since the cover caps (not shown) would counteract a corresponding deformation at the ends.
  • the clamps 150 in particular in combination with the adjusting elements 134, can ensure uniform widths of the exit slots 186.
  • the clamps 150, in particular in combination with the adjusting elements 134 can also be advantageous independently of a change in a flow cross section of the flow chamber, in order to ensure a constant width of the outlet slots 186.
  • Figure 9a a normal configuration similar 2 consisting of a tubular element 30 with a round cross-section and a rod-shaped radiation source 32 arranged centrally thereto. If appropriate, the same reference numerals are used below as in the first embodiment, with the different configurations of course also being able to be used in the second embodiment.
  • the housing 14 with chamber 22 and supply line 24 is indicated only schematically.
  • a substrate 2 is shown schematically.
  • the concentration of radicals has a direct effect on the paint layer that has been removed.
  • the concentration of radicals is in the area of the longitudinal center plane of the chamber 22 (see dashed line) is highest and drops sharply outwards. Consequently, the radical concentration on the surface of the substrate 2 across the chamber 22 is very different.
  • various configurations of the radiating part 18 are proposed.
  • the configuration according to Figure 9b a tubular element 30 with a radiation source 32.
  • the radiation source 32 corresponds to that previously described.
  • the tube element 30 has a flattening below the opening 21 of the main body 20 . This is arranged in such a way that, in a normal orientation, it extends horizontally and essentially parallel to an underside of the main body. This flattening allows the flattened underside of the tube element 30 to be arranged parallel to the surface of the substrate 2. This ensures a uniform spacing in this area.
  • a uniform liquid film can be formed between the tubular element 30 and the surface of the substrate 2 in such a way that a substantially uniform concentration of radicals forms on the surface of the substrate 2 over the width of the flattening.
  • the radical concentration is essentially proportional to the incident light intensity which reaches the surface of the substrate 2 .
  • the region with a constantly high concentration of radicals compared to the configuration according to Figure 9a significantly broadened and it also broadens the range of a high change in the resist layer thickness, which leads to an improvement in the efficiency of the arrangement.
  • FIG. 9c shows an alternative configuration.
  • a tubular element 30 with a round cross section is again used here.
  • the radiation source 32 is again the same as previously described.
  • the tube element 30 is modified in such a way that it has different transmissivity in different areas.
  • the tubular element 30 has a first transmissivity in the region located within the chamber 22 and a different, second transmissivity outside of the chamber 22 .
  • the first area has, for example, as high a Transmissivity to UV radiation, that is, within the flow chamber, essentially all of the UV radiation that is provided by the radiation source 32 can be introduced into the chamber 22.
  • the area of the tubular element 30 located outside the chamber has a lower transmissivity, due to increased absorption or reflection of UV radiation.
  • the tubular element 30 has the lowest transmissivity in the area of the longitudinal center plane, and starting from this area the transmissivity increases gradually in the direction of the outlet slots 36 .
  • the radiation intensity of the UV light in a liquid on the surface of the substrate 2 can be set in such a way that the radical concentration is essentially the same across the width of the opening 21 of the main body 20, as in the graph in FIG Figure 9c is shown.
  • the width of a uniform high paint thickness removal is also widened.
  • a corresponding effect can be achieved by the material of the tube element itself, or by a coating or a film on or adjacent to the corresponding area of the tube element.
  • a coating or foil would preferably be arranged inside the tubular element in order to avoid contamination of the liquid and also to be able to neglect the resistance of the coating to the media used.
  • a single radiation source 32 is again provided, which is accommodated in a tubular element 30 .
  • a mirror coating is provided on the part of the tube element 30 lying within the chamber 22 .
  • This can be formed, for example, as a layer or film that is attached to the tubular element, for example, applied to the inside or outside. This can be full for the radiation emanating from the radiation source 32 be reflective or it can be reflective only in certain wavelength ranges.
  • the shape of the mirror coating is designed in such a way that in use, i.e. when a medium is applied, the radiation emerging from the radiation source strikes the substrate substantially uniformly across the width of the opening 21 and thus a substantially uniform concentration of radicals in the medium on the Causes substrate surface.
  • the intensity of the radiation emerging from the tube element 30 must be higher in the areas adjacent to the exit slots 36 than in the area of the longitudinal center plane C.
  • Figure 10b shows another configuration of mirroring, showing another form of mirroring that is flat in an upper area and in section forms a chord to the round shape of the tube element.
  • a further radiation source (not shown), particularly in the upper area of the tubular element 30 (above the mirror coating). This could emit in a different spectral range than the radiation source 32 in order to provide different radiation in the area of the flow channel than in the area of the exit slots 36 and in the direction of the substrate 2.
  • wavelength selection providing radiation with different primary spectral ranges in different areas of the device, in particular inside the chamber 22 and outside the body).
  • the radiation emitted into the chamber 22 could be primarily in the range below 200 nm, for example around 185 nm.
  • the radiation emitted from the chamber 22 via the opening 21 could in particular primarily in the range above 200 nm, for example at about 254 nm. While the radiation below 200 nm should primarily serve to decompose the medium in the flow channel, the radiation above 200 nm should primarily serve to generate radicals.
  • an additional wavelength selection could easily be made in the above configurations, which provides different radiation within the flow chamber compared to the radiation emitted out of the chamber in the direction of the substrate 2 .
  • the beam part 18 again has a tube element 30 .
  • a first radiation source 32 which may be of the type previously described.
  • a mirror element 200 curved concavely upwards is provided below the first radiation source and essentially reflects radiation emanating from the radiation source 32 back upwards.
  • An arrangement of different second radiation sources 210 is provided below the mirror element 200 .
  • seven radiation sources 210 are shown. These each emit at least light in the UV range, specifically with different intensity ratios. In particular, the intensity increases continuously starting from the middle of the radiation sources 210 to the outer ones of the radiation sources 210 . This means that the radiation sources 210 lying furthest to the outside emit light with the greatest intensity. With this configuration, in turn, a more uniform intensity distribution of light on the substrate surface and thus also a more uniform radical distribution can be achieved.
  • a substantially uniform concentration of radicals can be obtained across the width of the opening 21 of the body 20 with the aforementioned advantages.
  • this configuration also enables a certain wavelength selection such that radiation in a different spectral range can be emitted into the flow space than out of the opening 21 .
  • the first radiation source can in turn emit in a range below 200 nm, for example at approximately 185 nm, while the radiation sources 210 emit, for example, in a range above 200 nm, in particular at approximately 254 nm.
  • FIGS. 11 and 12 12 show still further configurations of the radiating part 18. Again the body 20 with the chamber 22 and the opening 21 as well as a substrate 2 are shown schematically.
  • the radiation part 18 in the configuration according to FIG 11 in turn has a tubular element 30 which is essentially transparent to UV radiation.
  • Two radiation sources 220 and 222 are shown within the tubular element 30 .
  • the two radiation sources 220, 222 are arranged inside the tube element 30 one above the other.
  • the radiation sources 220, 222 are of different types and emit in particular in different spectral ranges. In this case, for example, the upper radiation source 220 primarily emits in a spectral range below 200 nm, for example at 185 nm, while the lower radiation source 222 primarily emits in a spectral range above 200 nm, for example at 254 nm.
  • a curved reflector 226 is provided between the radiation sources 220 and 222 and is reflective on both sides.
  • the reflector essentially separates the radiation emitted into the flow space from the radiation emitted from the opening 21 .
  • the reflector 226 is arranged in such a way that radiation from both the upper radiation source 220 and the lower radiation source 222 is emitted in the end region of the respective flow channels—adjacent to the outlet slots 36 .
  • the radiation below 200 nm is primarily intended to essentially lead to decomposition of the medium in the flow channel
  • the radiation above 200 nm serves to generate free radicals. Since a corresponding generation is desired as early as possible in the end region of the flow channel, the configuration shown is advantageous.
  • the curvature of the downward-facing area of the reflector 126 can be specially selected in such a way that the intensity distribution of the radiation on the substrate is as homogeneous as possible, as described above.
  • a tubular element 30 with a single radiation source 32 is again provided.
  • the tubular element 30 in turn has different absorption properties inside the chamber 22 and outside the chamber 22.
  • the region of the tubular element 30 lying outside the chamber is essentially transparent to UV radiation, while the region of the tubular element 30 lying inside the chamber 22 is a substantial proportion which absorbs UV radiation.
  • the absorption properties of the area lying within the chamber 22 are adjusted in such a way that primarily UV radiation in the range above 200 nm is absorbed.
  • the essentially transparent area partially extends into the chamber 22, so that, as mentioned above, UV radiation above 200 nm is also emitted in the end areas of the chamber 22 adjacent to the exit slits in order to already provide a desired generation of free radicals here .
  • a corresponding overlap between the end areas of the chamber 22 and the transparent area of the tubular element 30 can be provided in an angular range of up to 20° from the center point of the tubular element (therefore a common overlap of the end areas of up to 40°).
  • additional means can be provided which ensure that no UV radiation is emitted into the flow space in a third region of the tubular element which faces the flow space.
  • the second means can have an element opaque to UV radiation between the at least one radiation source and the flow space.
  • the third section would preferably point towards the at least one inlet opening and be arranged symmetrically with respect to the longitudinal center plane and extend in the circumferential direction of the tubular element over no more than 60°.
  • the application unit 6, in particular the main part 8, is brought into a position adjacent to a substrate 2 in which liquid escaping from the opening 21 does not reach the substrate 2.
  • Liquid medium such as diluted hydrogen peroxide water or ozone water O 3 -H 2 O, is introduced into the chamber 22 via the media connections 16, while the radiation source 32 is switched on at the same time.
  • a liquid flow builds up in the flow chamber between the tubular element 36 and the inner wall 23 of the chamber 22 and is accelerated in the direction of the outlet slots 36 .
  • the velocity of the liquid is accelerated by a factor of 10:1 to 40:1 and preferably in the range 15:1 to 25:1, starting from an area at the top at the end of the feed line 24 to the outlet slots, by a corresponding change in cross section.
  • a water curtain is formed below the main part 8 and extends uniformly over a substantial part of the length of the main part 8 .
  • the radiation emitted by the radiation source 32 decomposes the liquid in the flow channel, ie between the inlet 24 and the outlet slots 36, in order to destroy undesirable reactive species within the liquid.
  • radicals are generated by the radiation. These mechanisms primarily take place in different spectral ranges of the radiation. Radiation in a spectral range below 200 nm is advantageous for decomposition, while radiation above 200 nm, in particular at approximately 254 nm, is desired for free radical generation.
  • the radiation emanating from the radiation source 32 in the area of the flow channel and outside of the body 20 is essentially the same and usually contains radiation components both above and below 200 nm Reached flow and thus formed the liquid curtain homogeneous over a large width.
  • the liquid is decomposed in the flow channel and undesirable reactive species are broken up, while at the same time radicals, in particular hydroxyl radicals, are generated. These are also generated in particular in the area of the exit slots 36 so that they can exist long enough to reach the surface of the substrate 2 when the main part 8 of the application unit 6 is now moved over the substrate 2 .
  • the substrate 2 can be a photomask, for example, from which paint residues have to be cleaned. Such cleaning can take place over the entire surface or also only in certain areas of the mask.
  • the liquid curtain is moved over the substrate 2 by a movement of the main part 8 of the application unit 6 over the substrate.
  • the radiation source 32 continues to continuously generate radicals within the liquid, with a corresponding generation of radicals being particularly important in the area of the exit slits and below the opening 21 in the body 20 and possibly being concentrated here by certain measures, as described in the embodiments.
  • the liquid below the opening 21 is thus charged with radicals and is particularly effective for cleaning paintwork. Since the radicals break down quickly, the liquid is no longer as effective in areas that are not below the opening 21.
  • the sweeping speed can be adjusted to the required cleaning result in order to achieve sufficiently long dwell times of the liquid charged with radicals on the substrate.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Water Treatments (AREA)

Claims (7)

  1. Appareil (8 ; 108) pour appliquer un milieu liquide exposé à un rayonnement UV sur un substrat (2), l'appareil comprenant :
    un boîtier (14 ; 114) ayant une chambre allongée (22 ; 122), au moins une ouverture d'entrée (24 ; 164) qui s'ouvre vers la chambre (22 ; 122) et au moins une ouverture de sortie en forme de fente (21 ; 121) opposée à l'ouverture d'entrée (24 ; 124) qui s'étend sur la longueur de la chambre (22 ; 122) ;
    un élément de tube (30 ; 180) qui s'étend dans une direction longitudinale à travers la chambre (22 ; 122), et l'élément de tube (30 ; 180) étant au moins partiellement transparent au rayonnement UV, dans lequel l'élément de tube (30 ; 180) est agencé dans la chambre (22 ; 122) de sorte qu'un espace d'écoulement soit formé entre l'élément de tube (30 ; 180) et la paroi de la chambre (22 ; 122), l'espace d'écoulement étant symétrique par rapport à un plan central longitudinal de la chambre (22 ; 122), le plan central longitudinal croisant l'ouverture de sortie (21 ; 121) au niveau de son centre, et de sorte que l'élément de tube (30 ; 180) s'étende dans l'ouverture de sortie en forme de fente (21 ; 121) dans le boîtier (14 ; 114) et forme ainsi deux fentes de sortie s'étendant longitudinalement (37 ; 187) entre l'élément de tube (30 ; 180) et le boîtier (14 ; 114) ;
    au moins une source de rayonnement UV (32 ; 210 ; 222) dans l'élément de tube (30 ; 180), qui est agencée pour émettre un rayonnement UV dans la direction de l'espace d'écoulement et à travers l'ouverture de sortie (21 ; 121) à l'extérieur du boîtier (14 ; 114) afin de générer des radicaux dans le liquide et d'amener les radicaux à la surface du substrat (2) ;
    caractérisé par :
    des moyens qui sont adaptés pour influencer le rayonnement qui est émis par la au moins une source de rayonnement UV (32 ; 210 ; 222) et sort de l'ouverture de sortie (21 ; 121) de telle sorte qu'une distribution spatiale sensiblement homogène des radicaux dans une région inférieure à au moins 50 % de l'ouverture de sortie soit formée sur la surface du substrat (2),
    dans lequel les moyens comprennent au moins un élément miroir (200 ; 226) qui est agencé dans ou sur l'élément de tube (30 ; 180) au niveau du côté de la au moins une source de rayonnement (32 ; 210 ; 222) qui est orientée à l'opposé du substrat et/ou adjacent à la source de rayonnement et qui réfléchit un rayonnement vers l'ouverture de sortie (21 ; 121) ; et/ou
    dans lequel les moyens comprennent une pluralité d'au moins trois sources de rayonnement UV (210), dans lequel les sources de rayonnement UV (210) sont agencées à l'intérieur de l'élément de tube (30 ; 180) et sont adjacentes les unes aux autres et adjacentes à une partie de l'élément de tube (30 ; 180) qui est agencée dans l'ouverture de sortie (21 ; 121) ou à l'extérieur de la chambre (22 ; 122), dans lequel les sources de rayonnement adjacentes (210) émettent un rayonnement UV avec différentes intensités de rayonnement.
  2. Appareil selon la revendication 1, dans lequel l'élément de tube (30 ; 180) a une section transversale ronde et les moyens modifient l'intensité du rayonnement sortant par l'ouverture de sortie (21 ; 121) et l'élément de tube (30 ; 180) de sorte que l'intensité diminue régulièrement vers le plan central longitudinal de la chambre (22 ; 122).
  3. Appareil selon l'une quelconque des revendications précédentes, dans lequel les moyens comprennent un élément miroir (200 ; 226), dans lequel l'élément miroir (200 ; 226) est symétrique par rapport au plan central longitudinal de la chambre (22 ; 122).
  4. Appareil selon l'une quelconque des revendications précédentes, dans lequel les moyens comprennent au moins un élément miroir (200 ; 226), dans lequel l'au moins un élément miroir est un parmi au moins une feuille et un revêtement à l'intérieur formé sur l'intérieur ou l'extérieur d'une partie de l'élément de tube qui est dans la chambre (22).
  5. Appareil selon la revendication 1, dans lequel les moyens comprennent une pluralité d'au moins trois sources de rayonnement UV, l'appareil comprenant en outre un élément de séparation dans l'élément de tube, dans lequel l'au moins un élément de séparation bloque sensiblement le rayonnement de la pluralité de sources de rayonnement UV dans la direction de l'espace d'écoulement.
  6. Appareil selon l'une quelconque des revendications précédentes, dans lequel les moyens comprennent au moins un élément miroir dans l'élément de tube, l'appareil comprenant en outre une source supplémentaire de rayonnement UV (32 ; 220) qui est agencée dans l'élément de tube au niveau d'un côté de l'élément miroir (200 ; 226) qui est tourné à l'opposé de la au moins une source de rayonnement, dans lequel l'élément miroir (200 ; 226) est un élément miroir incurvé.
  7. Appareil selon la revendication 9, dans lequel le au moins un élément miroir (200 ; 226) est un réflecteur double face.
EP16762983.1A 2015-08-27 2016-08-24 Appareil pour appliquer un medium fluide, dans lequel une radiation uv est introduite, sur un substrat Active EP3341958B8 (fr)

Applications Claiming Priority (2)

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DE102015011229.5A DE102015011229B4 (de) 2015-08-27 2015-08-27 Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
PCT/EP2016/069989 WO2017032806A1 (fr) 2015-08-27 2016-08-24 Dispositif pour appliquer un milieu liquide exposé à un rayonnement uv sur un substrat

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EP3341958A1 EP3341958A1 (fr) 2018-07-04
EP3341958B1 true EP3341958B1 (fr) 2022-06-15
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EP (1) EP3341958B8 (fr)
JP (1) JP6676749B2 (fr)
KR (1) KR102103739B1 (fr)
CN (2) CN114653673A (fr)
DE (1) DE102015011229B4 (fr)
HK (1) HK1253008A1 (fr)
RU (1) RU2680112C1 (fr)
TW (1) TWI716437B (fr)
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Publication number Priority date Publication date Assignee Title
DE102017203351B4 (de) * 2017-03-01 2021-08-05 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
US20230157799A1 (en) 2019-06-30 2023-05-25 Perimetrics, Llc Determination of structural characteristics of an object

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04162516A (ja) * 1990-10-25 1992-06-08 Fujitsu Ltd 光励起プロセス装置
TW252211B (fr) * 1993-04-12 1995-07-21 Cauldron Ltd Parthership
US5789755A (en) * 1996-08-28 1998-08-04 New Star Lasers, Inc. Method and apparatus for removal of material utilizing near-blackbody radiator means
JP4088810B2 (ja) * 1998-09-01 2008-05-21 リアライズ・アドバンストテクノロジ株式会社 基板洗浄装置及び基板洗浄方法
EP1098153B1 (fr) * 1999-11-05 2003-07-23 Dr. Hönle AG Dispositif de rayonnement UV
JP4054159B2 (ja) * 2000-03-08 2008-02-27 東京エレクトロン株式会社 基板処理方法及びその装置
RU2195046C2 (ru) * 2000-06-15 2002-12-20 Акционерное общество открытого типа "НИИ молекулярной электроники и завод "Микрон" Способ очистки поверхности
DE10130999A1 (de) * 2000-06-29 2002-04-18 D M S Co Multifunktions-Reinigungsmodul einer Herstellungseinrichtung für Flachbildschirme und Reinigungsgerät mit Verwendung desselben
TWI251506B (en) 2000-11-01 2006-03-21 Shinetsu Eng Co Ltd Excimer UV photo reactor
JP2002298790A (ja) * 2001-03-29 2002-10-11 Shinetsu Engineering Kk エキシマ照明装置
JP2003159571A (ja) * 2001-11-27 2003-06-03 Ushio Inc 紫外線照射装置
JP3776092B2 (ja) * 2003-03-25 2006-05-17 株式会社ルネサステクノロジ エッチング装置、エッチング方法および半導体装置の製造方法
US7909595B2 (en) * 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
JP2008041998A (ja) * 2006-08-08 2008-02-21 Ushio Inc 基板乾燥装置及び基板乾燥方法
JP4905049B2 (ja) * 2006-10-17 2012-03-28 株式会社Ｇｓユアサ 紫外線照射装置及びそれの調整方法
JP2008108997A (ja) * 2006-10-27 2008-05-08 Shibuya Kogyo Co Ltd 洗浄装置
DE102009058962B4 (de) 2009-11-03 2012-12-27 Suss Microtec Photomask Equipment Gmbh & Co. Kg Verfahren und Vorrichtung zum Behandeln von Substraten
JP2012049305A (ja) * 2010-08-26 2012-03-08 Hitachi High-Technologies Corp 真空紫外光処理装置
CN103229277A (zh) * 2010-11-30 2013-07-31 应用材料公司 用于在uv腔室中调节晶圆处理轮廓的方法及装置
JP5348156B2 (ja) 2011-03-01 2013-11-20 ウシオ電機株式会社 光照射装置
US9287154B2 (en) * 2012-06-01 2016-03-15 Taiwan Semiconductor Manufacturing Co., Ltd. UV curing system for semiconductors
JP2014011256A (ja) * 2012-06-28 2014-01-20 Dainippon Screen Mfg Co Ltd 熱処理方法および熱処理装置
TW201534409A (zh) * 2013-11-22 2015-09-16 Nomura Micro Science Kk 紫外線穿透性基板的洗淨裝置及洗淨方法
DE102015011228B4 (de) * 2015-08-27 2017-06-14 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置

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TW201724228A (zh) 2017-07-01
DE102015011229B4 (de) 2020-07-23
WO2017032806A1 (fr) 2017-03-02
KR102103739B1 (ko) 2020-04-23
DE102015011229A1 (de) 2017-03-02
US20180221919A1 (en) 2018-08-09
EP3341958B8 (fr) 2023-03-01
JP6676749B2 (ja) 2020-04-08
JP2018528469A (ja) 2018-09-27
KR20180048792A (ko) 2018-05-10
CN114653673A (zh) 2022-06-24
CN108352340B (zh) 2022-03-29
EP3341958A1 (fr) 2018-07-04
US11090693B2 (en) 2021-08-17
HK1253008A1 (zh) 2019-06-06
CN108352340A (zh) 2018-07-31
TWI716437B (zh) 2021-01-21
RU2680112C1 (ru) 2019-02-15

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