Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0641—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/0021—Reactive sputtering or evaporation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/24—Vacuum evaporation
  • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
  • C23C14/325—Electric arc evaporation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/54—Controlling or regulating the coating process
  • C23C14/542—Controlling the film thickness or evaporation rate
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
  • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
  • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
  • F16J—PISTONS; CYLINDERS; SEALINGS
  • F16J9/00—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction
  • F16J9/26—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction characterised by the use of particular materials
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
  • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
  • Y10T428/2495—Thickness [relative or absolute]
  • Y10T428/24967—Absolute thicknesses specified
  • Y10T428/24975—No layer or component greater than 5 mils thick

Definitions

• the present invention relates to coatings for attaining reduction of wear or reduction of friction on surfaces of components.
• Such components for example can be used in the automotive sector or precision components (i.e. highly engineered components) sector.
• the components can be for example piston pins, cam followers or piston rings or nozzle needles.
• molybdenum coatings or molybdenum comprising coatings is well known.
• molybdenum nitride as wear reduction coating on surfaces of components is in particular well known.
• the behavior of the interface between the substrate surface of the component and the molybdenum nitride coating is however still today unsatisfactory and insufficient for meeting the current industrial requirements during application of the so coated components.
• the substrate material to be coated is not hard enough, it means in this context that the substrate material has a hardness for example between 50-65 HRC, in any case not higher than 65 HRC.
• Figure 1 shows a picture of a coated surface after Rockwell indentation HRC, where the hardness of the substrate is between 50 and 65 HRC and the substrate is coated with MoN. Ring-shaped fracture of the MoN coating can be clearly observed surrounding the HRC Rockwell indentation. It is possible that the observed ring-shaped fracture has been produced as a consequence of the big difference between the hardness and Young's modulus of the MoN coating and the hardness and Young's modulus of the substrate material.
• variable loads interrupted load
• substrates having a higher hardness such as e.g. substrates made of cemented carbide.
• the components used in many automotive applications are made of materials which have Rockwell hardness lower than 65 HRC.
• the objective of the present invention is to modify the molybdenum nitride coating and/or the substrate surface to be coated in order to improve the contact between substrate surface and MoN coating when the substrate exhibit a hardness of 65 HRC or lower and the coated substrate is subjected to load or especially to interrupted load.
• inventive solution makes possible that no ring-shaped fracture lines are produced during Rockwell indentation by conduction of HRC Rockwell tests in substrates coated with MoN based coatings when the substrate hardness is lower or equal to 65 HRC.
• the objective of the present invention is attained by providing a component having a layer or a layer system between the substrate surface and the coating comprising at least one MoN layer according to claim 1.
• the MoN coatings in the context of the present invention were deposited by using a reactive PVD process.
• reactive arc PVD process are demonstrated to be suitable for depositing MoN coatings on component surfaces hardened as suggested above. It is a special advantage of the used method that the nitriding processs of the substrate and the coating process can be done in a same vacuum chamber of a coating machine.
• the MoN coating can be deposited exhibiting a hexagonal phase or a cubic phase or a mixture of hexagonal and cubic phases.
• Figure 2 shows a picture of a surface coated according to the above mentioned inventive solution that was tested afterwards according to the standard HRC Rockwell test. In this picture it is clear to see that no ring-shaped fracture lines surrounding the Rockwell indentation can be observed.
• the inventors proposes to apply a multilayer structured MoN/CrN coating, which comprises alternate deposited individual layers of MoN and individual layers of CrN. Especially good results i.e. Rockwell indentations without ring-shaped fracture lines or further adhesive failures were in particular observed by using this second inventive solution when the thickness of the multilayer coating was about 4 to 5 ⁇ .
• the MoN layers can be also deposited exhibiting a hexagonal phase or a cubic phase or a mixture of hexagonal and cubic phases.
• the MoN and CrN individual layers can be deposited for example by using a reactive PVD process.
• a reactive arc PVD process is used for depositing the MoN and the CrN individual layers of the multilayer coating. Since as described in the first inventive solution the component surface to be coated with a MoN coating must be previously nitrided and standard nitriding processes are conducted at temperatures of 450 °C or higher, only components made of materials which can resist such temperatures can be treated in this manner.
• the second inventive solution (using a MoN/CrN multilayer coating) involves the advantage that the coating process can be conducted at temperatures lower than 450 °C, e.g. of 200 °C. Since as already mentioned no nitriding step is necessary, components made of temperature sensitive materials can be treated, like for example piston pins.
• an adhesion layer made of CrN This adhesion layer was deposited for example before depositing the MoN coating according to the first inventive solution or before depositing the modified MoN coating according to the second inventive solution, respectively.
• the CrN adhesion layer is preferably provided having a layer thickness of at least 30 nm. The thickness of the CrN adhesion layer preferably between 0.05 ⁇ and 1 ⁇ .
• cam follower treated according to the first inventive solution did not show any damage after the nitriding step.
• the components that can be treated according to the present invention are however not limited by this description.
• the surfaces of the components treated according to the present invention exhibit additionally very good tribological properties, in particular concerning increment of wear resistance. Examples: Different automotive and precision components were treated according to the present invention and stupendous improvements concerning increment of wear resistance were attained.
• cam followers were treated according to the state of the art and others were treated according to some preferred embodiments of the present invention. Subsequently, all treated cam followers were subjected to different analysis and tests.
• QRS Quretrachloro-1-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoetyl-N-trimethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoe
• Treatment A (state of the art): The surfaces of the QRS and the cam followers to be tested were coated with a MoN layer having a thickness of approximately 2.5 ⁇ on QRS and 4.5 ⁇ on cam follower. Between the MoN layer and the surface of the cam follower a thin CrN layer with thickness of approximately 50 nm was deposited as adhesion layer. The MoN layer was deposited by using reactive Arc PVD techniques. By deposition of the MoN layer a Mo target was arc vaporized in a vacuum atmosphere comprising nitrogen as reactive gas. The nitrogen partial pressure was maintained at 3 Pa and the substrate temperature (i.e. the temperature of surface of the cam follower being treated) was approximately 200 °C.
• the MoN layer was formed comprising basically only the hexagonal phase of molybdenum nitride.
• Treatment B (inventive): The surfaces of the QRS and the cam followers to be tested were coated with the same coating as described in Treatment A, but the cam follower surface was previously subjected to a hardening step consisting of a plasma nitriding process carried out in a vacuum chamber comprising nitrogen.
• the substrate temperature (the temperature of the component measured at the surface being subjected to treatment) was approximately 480 °C. In this manner a hardened, nitrogen-containing surface layer having a thickness of approximately 50 ⁇ was formed.
• a MoN layer was deposited by using reactive Arc PVD techniques.
• a Mo target was arc vaporized in a vacuum atmosphere comprising nitrogen as reactive gas.
• the nitrogen partial pressure was maintained at 3 Pa and the substrate temperature (i.e. the temperature of surface of the cam follower being treated) was approximately 480 °C.
• the MoN layer was formed comprising a mixture of hexagonal phase and at least one cubic phase of molybdenum nitride.
• a thin CrN layer with thickness of approximately 50 nm was deposited as adhesion layer between the MoN layer and the hardened, nitrogen-comprising surface layer.
• Treatment C The surfaces of the QRS and the cam followers to be tested were treated similarly as described in Treatment B, but after the hardening step, the coating chamber was cooled down until the substrates to be coated attained a temperature of approximately 200 °C and the MoN layer was then deposited by using a nitrogen partial pressure of 3 Pa but at a substrate temperature of approximately 200 °C. In this manner the MoN layer was formed comprising basically only the hexagonal phase of molybdenum nitride.
• the thickness of the hardened, nitrogen-containing surface layer was approximately 50 ⁇ .
• the thickness of the MoN layer was about 2.5 ⁇ on QRS and 4.5 ⁇ on cam follower.
• a thin CrN layer with thickness of approximately 50 nm was deposited as adhesion layer between the MoN layer and the hardened, nitrogen-comprising surface layer.
• Treatment D The surfaces of the QRS and the cam followers to be tested were coated with a multilayer MoN/CrN coating film having a thickness of approximately 4 ⁇ on both QRS and cam follower.
• the multilayer MoN/CrN coating film was deposited deposited by using reactive Arc PVD techniques. By deposition of the multilayer MoN/CrN coating film one Mo target and one Cr targets were arc vaporized in a vacuum atmosphere comprising nitrogen as reactive gas. The nitrogen partial pressure was maintained at 3 Pa and the substrate temperature was approximately 200 °C. MoN individual layers and CrN individual layers were deposited alternate one on each other as shown in Figure 3.
• FIG. 3 shows a picture of a cross section corresponding to a portion of a multilayer MoN/CrN coating film deposited on a cam follower according to the present invention.
• the individual MoN layers comprised in the multilayer MoN/CrN coating film deposited in this manner comprised a mixture of hexagonal phase and at least one cubic phase of molybdenum nitride.
• the treated QRS were tested by using the HRC Rockwell test and the cam followers were tested by using an engine valve test at different rotation speeds during up to 200 hours. ⁇
• the treated surfaces of the QRS were tested by using In HRC Rockwell test as mentioned above. All surfaces of the QRS treated with the Treatments A according to the state of the art presented ring-shaped fractures after HRC Rockwell test. Contrariwise, all surfaces of the QRS treated with the Treatments B, C and D according to the present invention presented surprisingly no ring-shaped fractures after HRC Rockwell test.
• the present invention relates to: a component comprising a substrate surface coated with a coating comprising at least one MoN layer having a thickness not less than 40 nm, wherein between the substrate surface and the at least one MoN layer a substrate surface hardened layer is comprised, which is a hardened, nitrogen-containing substrate surface layer that is the result of a nitriding treatment carried out at the substrate surface and has a thickness not less than 10 ⁇ , preferably not less than 20 ⁇ and not greater than 150 ⁇ , or a component comprising a substrate surface coated with a coating comprising at least one MoN layer having a thickness not less than 40 nm, wherein between the substrate surface and the at least one MoN layer:
• a substrate surface hardened layer which is a hardened, nitrogen- containing substrate surface layer that is the result of a nitriding treatment carried out at the substrate surface and has a thickness not less than 10 ⁇ , preferably not less than 20 ⁇ and not greater than 150 ⁇
• a layer system composed of more than 2 MoN layers and more than 2 CrN layers is comprised, wherein the MoN and CrN layers forming the layer system are individual layers deposited alternate one on each other forming a multilayer MoN/CrN coating film or a component comprising a substrate surface coated with a coating comprising at least one MoN layer having a thickness not less than 40 nm, wherein between the substrate surface and the at least one MoN layer a layer system composed of more than 2 MoN layers and more than 2 CrN layers is comprised, wherein the MoN and CrN layers forming the layer system are individual layers deposited alternate one on each other forming a multilayer MoN/CrN coating film.
• the at least one MoN layer has a thickness not less than 500 nm.
• the at least one MoN layer can be deposited in such a manner that it consists of molybdenum nitride comprising at least largely the hexagonal phase ⁇ - ⁇ or only the hexagonal phase ⁇ - ⁇ .
• the overall thickness of said at least one MoN layer is not less than 1 ⁇ and not less than 15 ⁇ , more preferably not less than 1,5 ⁇ and not greater than 10 ⁇ .
• said multilayer MoN/CrN coating film has a thickness not less than 460 nm.
• the above mentioned at least one MoN layer having a thickness not less than 40 nm can be also comprised between two multilayer MoN/CrN coating films, wherein each multilayer MoN/CrN coating film has preferably a film thickness not less than 460 nm.
• the sum of the thicknesses of both multilayer MoN/CrN coating films and said at least one MoN layer is not less than 1 ⁇ and not greater than 15 ⁇ ⁇ , preferably not less than 1,5 ⁇ and not greater than 10 ⁇ .
• an individual intermediate layer comprising Mo, Cr and N is comprised.
• the individual intermediate layer has a thickness not less than 10 nm and not greater than thickness of the individual CrN layer or the thickness of the individual MoN layer that is next to said individual intermediate layer.
• At least the majority of the individual MoN layers have an individual layer thickness not less than 40 nm and preferably not greater than 500 nm.
• At least the majority of the individual CrN layers have an individual layer thickness not less than 20 nm and preferably not greater than 500 nm.
• the overall thickness of said multilayer MoN/CrN coating film is not less than 1 ⁇ and not greater than 15 ⁇ , preferably not less than 1,5 ⁇ and not greater than 10 ⁇ .
• the individual MoN layers consists of molybdenum nitride comprising a mixture of phases, the mixture comprising:
• the treatments according to the present invention are particularly advantageously, when the component is an automotive component or a precision component, and more in particular if the substrate surface of the component has a hardness equal or lower than 65 HRC.
• a preferred method for producing a component according to at least one of the embodiments of the present invention comprises the deposition of said at least one MoN layer or of at least one of the individual MoN layers by means of a reactive PVD process.
• the method involves the use of a reactive Arc PVD process as reactive PVD process, wherein during deposition of the MoN layer or the MoN individual layer, at least one target of Mo is operated as cathode and in this manner evaporated by using Arc PVD techniques in an atmosphere comprising nitrogen as reactive gas.
• a reactive Arc PVD process as reactive PVD process, wherein during deposition of the MoN layer or the MoN individual layer, at least one target of Mo is operated as cathode and in this manner evaporated by using Arc PVD techniques in an atmosphere comprising nitrogen as reactive gas.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Inorganic Chemistry (AREA)
• Ceramic Engineering (AREA)
• General Engineering & Computer Science (AREA)
• Physical Vapour Deposition (AREA)
• Pistons, Piston Rings, And Cylinders (AREA)

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• 2016
  • 2016-05-25 CN CN201680030533.1A patent/CN107873064B/zh active Active
  • 2016-05-25 EP EP16728832.3A patent/EP3303651A1/en active Pending
  • 2016-05-25 US US15/575,031 patent/US11168392B2/en active Active
  • 2016-05-25 KR KR1020177028619A patent/KR102576846B1/ko active IP Right Grant
  • 2016-05-25 WO PCT/EP2016/000863 patent/WO2016188632A1/en active Application Filing
  • 2016-05-25 JP JP2017559821A patent/JP6741690B2/ja active Active
• 2021
  • 2021-10-18 US US17/503,563 patent/US20220145442A1/en active Pending

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