EP3200931A1 - Composite formé d'un substrat, d'une couche plasma polymère, d'une couche mixte et d'une couche de couverture - Google Patents

Composite formé d'un substrat, d'une couche plasma polymère, d'une couche mixte et d'une couche de couverture

Info

Publication number
EP3200931A1
EP3200931A1 EP15775176.9A EP15775176A EP3200931A1 EP 3200931 A1 EP3200931 A1 EP 3200931A1 EP 15775176 A EP15775176 A EP 15775176A EP 3200931 A1 EP3200931 A1 EP 3200931A1
Authority
EP
European Patent Office
Prior art keywords
layer
plasma
substrate
plasma polymer
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP15775176.9A
Other languages
German (de)
English (en)
Other versions
EP3200931B1 (fr
Inventor
Ralph Wilken
Thomas WÜBBEN
Jost Degenhardt
Jörg IHDE
Kira ROSANOVA
Uwe Lommatzsch
Christoph Regula
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of EP3200931A1 publication Critical patent/EP3200931A1/fr
Application granted granted Critical
Publication of EP3200931B1 publication Critical patent/EP3200931B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/56—Three layers or more
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2451/00—Type of carrier, type of coating (Multilayers)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2490/00—Intermixed layers
    • B05D2490/50—Intermixed layers compositions varying with a gradient perpendicular to the surface

Definitions

  • the present invention relates to a composite of a substrate, a plasma polymer layer, a cover layer and a mixed layer arranged between the cover layer and the plasma polymer layer. It further relates to the use of a plasma polymer layer and a mixed layer for improving the adhesion between a substrate and a cover layer and to a method for producing a corresponding mixed layer.
  • Coated articles are used in many technical fields.
  • the coatings have the function to convey certain properties to a substrate. These may be optical or anti-corrosion properties such as e.g. for paints or stain-resistant, adhesion-reducing properties such as PTFE coating or adhesion-promoting properties, such as those required for the application of adhesives and paints.
  • WO 2013/030503 A2 describes the adhesion promotion via a plasma polymer layer for a metal substrate and a PTFE coating.
  • Methods are generally known which are based on a plasma-activated gas phase layer deposition in low pressure (eg DE 19748240A1) or at atmospheric pressure (eg EP1230414B1).
  • Plasma processes are also known in which good adhesive properties of the material surfaces are produced without the deposition of adhesion-promoting layers being carried out (for example DE4325377C1) and other documents relating to certain pretreatments, e.g. EP0761415B9, DE4407478A1.
  • This is particularly interesting for materials that have poor adhesive properties: polyolefins (PP, PE), fluoro-organic polymers (PTFE, ETFE, PVDF), silicones, etc.
  • plasma-polymer coatings which have adhesion-promoting action (for example WO2004035857A2, JP6200217). These layers have good adhesive properties on the one hand to the substrate and on the other hand to subsequently applied adhesives, paints or sealants.
  • this object is achieved by a composite comprising a substrate and a plasma-polymer layer and a cover layer, wherein between the cover layer and the plasma-polymer layer a mixed layer is present which, with regard to its material composition, has a gradient of the composition of the plasma-polymer layer towards the composition of the cover layer.
  • the adhesion mediation between the substrate and the cover layer by means of a plasma polymer layer works particularly well when the layer deposited from a precursor by a plasma process at its surface at the time the cover layer is applied not yet reached the plasma polymer state Has. It is possible, under suitable deposition conditions (see also below), to have a layer deposited from a precursor by a plasma process for a certain period of time at its surface in a state in which not all groups reactive under normal atmospheric conditions exist in that state Layer are reacted, so that in the layer, for example, reactive silanol groups radicals or charges are present.
  • this test is carried out at room temperature and with de-ionised water, the change in the layer thickness being measured by reflectometry or, preferably, ellipsometry, from the time a layer removal of ⁇ 2 Nanometer per ten minutes under the abovementioned conditions, the (plasma polymer) coating is no longer considered a plasma oligomer but a finished plasma polymer
  • the coating according to the invention succeeds only if the time between application of the coating by means of plasma coating rfahren (atmospheric pressure plasma is preferred here) and the subsequent application of the cover layer material is so low that there is still a plasma oligomer on the surface of the applied by PECVD later plasma polymer layer.
  • the plasma oligomer to mix with the topcoat material.
  • the mixed layer is formed from parts of the not yet completely formed plasma polymer layer (plasma oligomers) and parts of the cover layer material. That's it also possible - and often desired that the plasma oligomers react with the constituents of the cover layer in the mixed layer.
  • a mixed layer in the sense of the present text always consists of a mixture of the upper constituents of a previously deposited plasma polymer layer and the constituents of the covering layer deposited or applied directly thereon.
  • the mixed layer is a transition zone which is formed from constituents and constituents of the subsequently applied top layer which are still present in the plasma oligomeric state on the surface of the deposited plasma polymer layer.
  • a mixed layer in the sense of this invention thus results from mixing of plasma oligomeric constituents on the surface of the plasma polymer layer with constituents of the subsequently applied top layer during application of the constituents or the precursor constituents of the top layer.
  • cover layers which are applied in the liquid state or in the gaseous state, the liquid state in particular being preferred.
  • the boundary between the plasma polymer layer and the mixed layer will be determined by means of TEM on lamellar sections across the composite. The same applies to the boundary of the mixed layer to the cover layer.
  • the limit should be set at the point at which at least one constituent of the plasma polymer layer or the cover layer differs by> 5 atomic% measured by means of TEM.
  • the concentration profile of the individual elements of the concentration in the plasma polymer layer is changed in each case in the context of a gradient to the concentration of the cover layer. This change will regularly result in a steady increase or decrease in the respective element content.
  • the boundary layer between cover layer and transition layer or plasma-polymer layer and transition layer begins where a chemical element is present for the first time which is not present in the plasma-polymer layer or the cover layer.
  • the expert in the concentration determination will take into account the typical droplet size of the corresponding phases or particle sizes. He can do this by selecting a sufficient cutting width for the TEM determination, so that any inhomogeneities which can be caused by the covering layer also in the mixed layer are statistically averaged out. In this case, it is preferable for the person skilled in the art to consider a TEM section having a width of at least five times the size of the substance inhomogeneities caused by the cover layer.
  • the “size of the substance inhomogeneities” means the longest diameter of the respective inhomogeneity, determined by means of transmission electron microscopy.
  • the slat cut will consider a width of> 6 microns.
  • this width relates to the x-axis of the TEM viewing volume, while the y-axis is perpendicular to the substrate surface and the distance along the y-axis must of course be long enough to the composition of the plasma polymer layer and the cover layer as respective reference layers to determine.
  • the x-axis in this image corresponds to the penetration depth of the selected TEM measurement method, and is preferably 100 nanometers.
  • the inventors of the present invention have surprisingly found that it is possible to target the deposition of plasma oligomers. By means of this control, it is possible to achieve a very good adhesion via the mixed layer to be used according to the invention.
  • a vapor deposition is used, as it can be used for coating semi-finished products of different materials.
  • the deposited coating has high chemical reactivity immediately after deposition, if the deposition conditions are appropriately selected, and is not yet fully crosslinked (plasma oligomer).
  • oligomeric constituents are extracted from the layer or oligomeric constituents of the layer in the water or optionally another Solvent dissolved. In extreme cases, the layer can even be completely removed from the substrate.
  • the deposition conditions of the plasma polymer layer must be selected with regard to the occurring gas phase reactions of the precursors so that excessive fragmentation is avoided, since otherwise a layer formation from plasma oligomers not is more possible and / or the fragments are so reactive that they react too quickly with each other and so do not provide a de facto usable plasma oligomer, but the layer is already present completely or to a high degree as plasma polymer.
  • deposition plasma nozzles with a relaxation space, wherein the introduction of the precursors for the plasma oligomeric deposition should be carried out downstream in the relaxing plasma.
  • a plasma nozzle is used, as described in DE102006038780A1.
  • the layer composition also plays a role; preference is given to using precursors which form layers consisting of carbon, silicon, oxygen, nitrogen, hydrogen and / or fluorine. Preference is given to using precursors which contain silicon, carbon and hydrogen and can be oxygen-containing or consist of these elements.
  • Preferred precursors are selected from the group consisting of HDMSO, tetramethylsilane, octamethyltetrasiloxane, tetramethyltetrasiloxane, tetraethoxysilane.
  • a plasma oligomer is also the substrate temperature at the deposition of the plasma polymer (PECVD deposited) layer: If it is too high or becomes too high during the deposition process, there is a risk that the resulting plasma oligomer reacts immediately or too quickly and is thus no longer available for the production of the layer composite according to the invention.
  • PECVD deposited plasma polymer
  • substrates with good heat conduction properties or good heat capacity particularly suitable for the formation of the plasma oligomers, as by the properties mentioned too high a substrate temperature can be easily avoided.
  • the competing reaction of the plasma oligomer with other reactants from the gas phase or on the substrate surface in the process according to the invention must be controlled and, if necessary, prevented.
  • adsorbate films of reactants and solvents such as water can lead to an undesirable reaction on the substrate surface.
  • concentration of such reactants in the gaseous phase (for example via the level of atmospheric moisture) can accelerate the reaction of the plasma oligomer, so that within the scope of the coating according to the invention the air humidity can be monitored and monitored
  • the person skilled in the art wears the cover layer on in time so that a plasma oligomer is still present.
  • this can be determined in case of doubt with a drop test, which means that a plasma oligomer is present within the meaning of this text as long as a drop of water removes two nanometers of layer thickness within ten minutes on wetting from the layer.
  • the application of the cover layer is also important for the formation of the composite according to the invention:
  • the cover layer must be applied in a state such that it is possible to mix the cover layer material with the plasma oligomers to form the mixed layer.
  • the cover layer is deposited in liquid form and / or as a vapor deposition.
  • the material for the cover layer is solvent-containing, wherein particularly preferably at least a part of the solvent is water.
  • Polyurethane topcoats may be used, but in some cases it may be preferred that the topcoat in the composite of the invention is not polyurethane.
  • the adhesion promoter area used from plasma polymer layer and mixed layer can be used for economic surface functionalization, both a surface as well as a local treatment of the surface to be coated are possible. They can be used as a replacement for solvent-containing adhesion promoters and / or primer layers. Preference is given to a composite according to the invention, wherein the cover layer is a polymeric layer.
  • a polymeric layer is a layer which is formed from typical polymers as the main constituent. Of course, such layers may also contain other ingredients, such as particles or fillers.
  • the mixed layer has a thickness of 2 to 1200 nm, preferably 20 to 500 nm, particularly preferably 50 to 200 nm.
  • Also preferred according to the invention is a composite according to the invention, wherein the substrate is metal-containing or consists of metal.
  • the plasma polymer layer to be used according to the invention consists of Si, C, O, N, H and / or F.
  • Plasma-polymer layers of these elements can be deposited particularly well by means of process control, which also promote the formation of plasma oligomers in the sense of the above invention.
  • the plasma polymer layer C is 5 to 45 at%, more preferably 10 to 25 at%.
  • Si 20-35 at%, more preferably 24-30 at% measured by XPS.
  • the atomic% data are based on the atoms measurable by XPS (H is not taken into account). In order to ensure reproducibility, the measurement using XPS takes place only when no more plasma oligomers are present. In case of doubt, this means that a drop of water will not cause any thinning of the layer thickness within ten minutes, if it has been applied to the plasma polymer layer.
  • Layers of the stated compositions give particularly good adhesion promotion and particularly good plasma oligomer formation (during deposition) for the composites according to the invention.
  • Part of the invention is also the use of a plasma polymer layer formed from plasma oligomers as described above and an intermediate layer as described above for improving the adhesion between a substrate and a cover layer.
  • Part of the invention is also a method for producing an intermediate layer as defined above, comprising the steps of: a) providing a substrate,
  • a plasma oligomeric layer is in the sense of the above invention, a layer deposited by means of PECVD, which is not yet fully reacted, and in which a
  • Part of the invention is also a composite comprising a mixed layer produced or preparable by a method according to the invention.
  • this mixed layer is the decisive factor in the composite according to the invention, since by utilizing this layer, a particularly good adhesion mediation by the plasma polymer layer is possible.
  • a polished aluminum substrate AA1050 with a thickness of 1 mm was treated as follows:
  • Step 1 Plasma cleaning and activation
  • a plasma system using a transformer HGR12 (manufacturer: Plasmatreat) and a generator FG5001 (manufacturer: Plasmatreat) was used.
  • the substrate temperature was room temperature (23 ° C) at the beginning of the treatment and was maintained at ⁇ 40 ° C during plasma cleaning and activation.
  • the frequency set at the generator was 19 kHz.
  • the plasma cycle time (PCT) to be set at the generator was 100%.
  • a voltage of 280 V was set on the generator.
  • the resulting current depends on the mentioned parameters.
  • the nozzle used consisted of PT21836 and PT21837 (part numbers, manufacturer Plasmatreat in offers also referred to as PAD-10). These are the nozzles described in DE 10 2006 038 780 A1.
  • step 1 the nozzle to substrate distance was 6 mm, the die was passed in parallel lines and 4 mm line spacing over the substrate at a speed of 20 m / min. Only 1 cycle was performed, i. the entire surface was overcoated only once with the nozzle in the manner described above.
  • the process gas used was compressed air with a process gas flow of 29 l / min.
  • Step 2 Deposition of the plasma oligomer
  • the substrate pretreated from step 1 was introduced into a coating plant which contained a transformer HGR12 (manufacturer: Plasmatreat) and a generator FG5001 (manufacturer: Plasmatreat).
  • the nozzle used was the nozzle described in step 1.
  • the substrate temperature at the beginning of the coating process was room temperature (23 ° C). Care was taken during the coating that the substrate temperature did not exceed 50 ° C. All temperature measurements (as in step 1) were made by IR thermometer.
  • the system was operated at a frequency of 19 kHz, a plasma cycle time (PCT) of 100% and a voltage of 280 V. The current resulted from the settings of the system.
  • PCT plasma cycle time
  • the die was passed over the substrate at a distance of 6 mm from the substrate in parallel lines of 4 mm line spacing at a speed of 30 m / min.
  • One coating cycle was carried out, the process gas was compressed air and the precursor HMDSO used.
  • the feed of the precursor was carried out at the nozzle head in the region of the relaxing plasma after preheating to 1 10 ° C (gaseous) with a precursor flow of 24 g / h.
  • the carrier gas was nitrogen with a gas flow of 2 l / min.
  • the process gas flow compressed air s.o.
  • a layer thickness (including the plasma oligomer) of 150 nm + - 15 nm results
  • the o.g. Treated aluminum substrate as follows:
  • a Teflon system was applied as described in application WO 2013 / 030503A1 in the examples for the mixture CP1 and as a finish mixture the mixture CF1. The order was made 30 seconds after step 2.
  • Noninventive example Step 1: as in Example 1.
  • Step 2 all parameters as in example 1, but plasma generator FG3001 and frequency 22 kHz, voltage 280V There was no formation of a plasma oligomer, it comes only to the deposition of SiO x nanoparticles that have no solubility in water and no reactivity and are unsuitable as a powder layer for the adhesion promotion in the context of the invention.
  • Step 3 Apply topcoat as in Step 3 of Example 1.
  • Step 1 as in example 1.
  • Step 2 all parameters as in example 1, but plasma generator FG3001 (manufacturer: Plasmatreat) and distance between nozzle and substrate 50 mm
  • Step 3 Coating was carried out as in Example 1, Step 3, the test mentioned there gave complete detachment of the cover layer.
  • Step 1 as in Example 1, but plasma generator FG3001 and process gas 10 l / min: The nozzle does not ignite, there was no usable plasma.
  • Example 5
  • Step 2 all parameters as in example 1, but plasma generator FG3001 and precursor flow 0.01 g / h
  • Non-Inventive Example Step 1: As in Example 1. Step 2: All Parameters As in Example 1, Substrate Temperature at Layer Deposition 80
  • step 1 and step 2 as described in example 1.
  • step 1 application of a drop of distilled water at room temperature to the freshly deposited coating (10 sec after deposition) through a pipette (volume of the drop 100 ⁇ ), removal of the drop after 2 min by sucking in a pipette and blowing off with a bellows.
  • the substrate After complete removal of the water is allowed to the substrate with coating for 30 min. stand. (Substrate, for example, smooth Si wafer). Thereafter, the layer thickness of the plasma polymer layer in the drop area and outside the drop area is measured: (measurement by reflectometer)
  • Thickness outside 120 nm + - 12 nm
  • Thickness outside 120 nm + - 12 nm
  • the substrate After complete removal of the water is allowed to the substrate with coating for 30 min. stand. (Substrate, for example, smooth Si wafer). Thereafter, the layer thickness is measured in the drop area and outside the drop area: (measurement by reflectometer)
  • Thickness outside 120 nm + - 15 nm
  • the substrate After complete removal of the water is allowed to the substrate with coating for 30 min. stand. (Substrate, for example, smooth Si wafer). Thereafter, the layer thickness is measured in the drop area and outside the drop area: (measurement by reflectometer)
  • Thickness outside 120 nm + - 7 nm
  • Thickness within: 120 nm + - 8 nm It turns out that with time less and less coating material was removed. In other words, under the given conditions, the plasma oligomers have reacted further with increasing time to plasma-polymer layer. After 20 min. there is no longer any plasma oligomer.
  • Measurement parameters The XPS investigations were carried out using a Thermo K-Alpha K1 102 system with an upstream argon glovebox for the handling of air-sensitive samples. Parameters: acceptance angle of the photoelectrons 0 °, monochromatized AI Ko excitation, Constant Analyzer Energy-Mode (CAE) with 150 eV matching energy in overview spectra and 40 eV in energetically high-resolution line spectra, analysis area: 0.40 mm diameter.
  • CAE Constant Analyzer Energy-Mode
  • the neutralization of electrically non-conductive samples is carried out by a combination of low-energy electrons and low-energy argon ions. For ablation, an argon ion sputtering source can be used.
  • Example 7 The layer from Example 7 was coated after the following service life after deposition with a water droplet as described in Example 7. This resulted in the following static water edge angle, measured with the system MobileDrop GH1 1 from Krüss and according to the instructions of this device.
  • the water edge angle of the coating increased to 85.5 °.
  • the contact angle measurements were carried out using the MobileDrop GH1 1 system from Krüss.
  • Example 10 Compositions Using Infrared Spectra
  • the substrate used was an aluminum-vapor-deposited silicon wafer, which was coated analogously to Example 1.
  • the IR spectra were recorded by means of the device Vertex 80 (manufacturer: Bruker) at an angle of 45 ° and at an aperture of 0.5 mm.

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un composite formé d'un substrat, d'une couche plasma polymère, d'une couche de couverture et d'une couche mixte disposée entre la couche de couverture et la couche plasma polymère. L'invention concerne également l'utilisation d'une couche plasma polymère et d'une couche mixte pour améliorer l'adhérence entre un substrat et une couche de couverture, ainsi qu'un procédé pour fabriquer une telle couche mixte.
EP15775176.9A 2014-10-01 2015-10-01 Composite formé d'un substrat, d'une couche plasma polymère, d'une couche mixte et d'une couche de couverture Active EP3200931B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014219979.4A DE102014219979A1 (de) 2014-10-01 2014-10-01 Verbund aus Substrat, plasmapolymerer Schicht, Mischschicht und Deckschicht
PCT/EP2015/072741 WO2016050937A1 (fr) 2014-10-01 2015-10-01 Composite formé d'un substrat, d'une couche plasma polymère, d'une couche mixte et d'une couche de couverture

Publications (2)

Publication Number Publication Date
EP3200931A1 true EP3200931A1 (fr) 2017-08-09
EP3200931B1 EP3200931B1 (fr) 2022-08-24

Family

ID=54252296

Family Applications (1)

Application Number Title Priority Date Filing Date
EP15775176.9A Active EP3200931B1 (fr) 2014-10-01 2015-10-01 Composite formé d'un substrat, d'une couche plasma polymère, d'une couche mixte et d'une couche de couverture

Country Status (4)

Country Link
EP (1) EP3200931B1 (fr)
DE (1) DE102014219979A1 (fr)
ES (1) ES2927149T3 (fr)
WO (1) WO2016050937A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016226191B4 (de) * 2016-12-23 2018-12-13 HS-Group GmbH Verfahren und Vorrichtung zur Herstellung eines mit einer Sperrschicht und einer Schutzschicht beschichteten Substrats
DE102017130353A1 (de) 2017-12-18 2019-06-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Sol-Gel-basierte Haftvermittlungsschicht für PTFE-basierte Beschichtungen und Verfahren zur Herstellung derselben
DE102018131228A1 (de) 2018-12-06 2020-06-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Kontaktstelle für einen elektrischen Kontakt

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3357695B2 (ja) 1992-12-28 2002-12-16 王子タック株式会社 フッ素樹脂粘着テープの製造方法
DE4407478C2 (de) 1993-03-10 1997-09-18 Fraunhofer Ges Forschung Verfahren zum Fügen von faserverstärkten Polyetheretherketon-Kunststoffen
DE4325377C1 (de) 1993-07-26 1995-08-17 Gvu Ges Fuer Verfahrenstechnik Verfahren zur Herstellung eines als Pulverbeschichtungsmaterial und/oder Schmelzkleber einsetzbaren Kunststoffes
DE4441313A1 (de) * 1994-11-21 1996-05-23 Grohe Armaturen Friedrich Dichtungselement, insbesondere für Absperr- und Regelorgane und Verfahren zu seiner Herstellung
DE19532412C2 (de) 1995-09-01 1999-09-30 Agrodyn Hochspannungstechnik G Vorrichtung zur Oberflächen-Vorbehandlung von Werkstücken
DE19748240C2 (de) 1997-10-31 2001-05-23 Fraunhofer Ges Forschung Verfahren zur korrosionsfesten Beschichtung von Metallsubstraten mittels Plasmapolymerisation und dessen Anwendung
DE29919142U1 (de) 1999-10-30 2001-03-08 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Plasmadüse
DE10034737C2 (de) * 2000-07-17 2002-07-11 Fraunhofer Ges Forschung Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung
DE10248085A1 (de) 2002-10-15 2004-05-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Plasmapolymere Haftschichten
EP1852522B1 (fr) * 2005-02-22 2013-04-24 Toyo Seikan Kaisha, Ltd. Film depose par evaporation sous vide par un procede de depot chimique en phase vapeur assiste par plasma
WO2007051803A1 (fr) * 2005-10-31 2007-05-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Couche de demoulage et procede pour la produire
DE102006038780A1 (de) 2006-08-18 2008-02-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Herstellen einer Beschichtung
DE102011005234A1 (de) * 2011-03-08 2012-09-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasbarriereschichtsystem
FR2979214B1 (fr) 2011-08-26 2014-04-25 Seb Sa Article comportant un revetement antiadhesif presentant des proprietes ameliorees d'adherence au support
WO2013167596A1 (fr) * 2012-05-07 2013-11-14 Vrije Universiteit Brussel Revêtements de protection anticorrosion efficaces

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
ANONYMOUS: "Duroplaste - Wikipedia", 24 January 2020 (2020-01-24), XP055675308, Retrieved from the Internet <URL:https://de.wikipedia.org/wiki/Duroplaste> [retrieved on 20200310] *
ANONYMOUS: "Plasmapolymerisation - Wikipedia", 10 October 2018 (2018-10-10), XP055675273, Retrieved from the Internet <URL:https://de.wikipedia.org/wiki/Plasmapolymerisation> [retrieved on 20200310] *
See also references of WO2016050937A1 *

Also Published As

Publication number Publication date
EP3200931B1 (fr) 2022-08-24
WO2016050937A1 (fr) 2016-04-07
ES2927149T3 (es) 2022-11-02
DE102014219979A1 (de) 2016-04-07

Similar Documents

Publication Publication Date Title
EP2012938B1 (fr) Pproduits polymeres de plasma flexibles, articles et utilisation y afferents
EP2203258B1 (fr) Couche anticorrosion antirayures et extensible pour substrats en métal léger
EP2640866B1 (fr) Procédé de liaison de substrats et structure composite pouvant être obtenue grâce audit procédé
WO2013160437A1 (fr) Ensemble comprenant une feuille de protection temporaire
DE102009028830A1 (de) Plasmabeschichtungen und Verfahren zu deren Herstellung
EP3200931B1 (fr) Composite formé d&#39;un substrat, d&#39;une couche plasma polymère, d&#39;une couche mixte et d&#39;une couche de couverture
WO2019121518A1 (fr) Corps solides de polymère plasma, en particulier couche de polymère plasma avec formation de réseau d&#39;hydrocarbures, leur utilisation et procédé de production de ceux-ci
DE10353530A1 (de) Wafer mit Deckschicht und Trennschicht, Verfahren zur Herstellung eines solchen Wafers sowie Verfahren zum Dünnen bzw. Rückseitenmetallisieren eines Wafers
DE102007010071A1 (de) Schichtverbund umfassend eine Lack- und eine Trennschicht sowie Lack-Träger-Anordnung zur Übertragung von Lack
WO2009127373A1 (fr) Système de couches barrières transparent
DE102007040655B4 (de) Funktionsschichtübertragungsanordnung, Verfahren zu deren Herstellung, Übertragungsverfahren für eine Funktionsschicht und Verwendung einer plasmapolymeren Schicht oder einer Funktionsschichtübertragungsanordnung zum Übertragen einer Funktionsschicht auf ein Substrat
EP3532260A1 (fr) Feuille composite pour le transfert d&#39;une matière de revêtement, son utilisation et procédé pour fabriquer cette feuille composite, et procédé pour fabriquer un élément en plastique pourvu d&#39;un revêtement
WO2006108503A1 (fr) Procede pour ameliorer les proprietes barriere de couches barriere ceramiques
DE102013220383A1 (de) Metall-Trennelement für eine Brennstoffzelle und Herstellungsverfahren dafür
EP2707152B1 (fr) Ensemble support-couche fonctionnelle
EP2742513B1 (fr) Revêtement à haute résistance à l&#39;effet corona et procédé de fabrication dudit revêtement
EP3129543A1 (fr) Fibres de carbone à surface modifiée et procédé de modification d&#39;une surface de fibre de carbone et utilisation des fibres de carbone
DE102011005234A1 (de) Gasbarriereschichtsystem
WO2020104699A1 (fr) Film en etfe revêtu, procédé de production et d&#39;utilisation dudit film
DE102006028809B4 (de) Wafer-Träger-Anordnung, Schichtverbund zur Verwendung bei der Herstellung einer solchen Wafer-Träger-Anordnung sowie entsprechende Verfahren und Verwendungen
DE102017130353A1 (de) Sol-Gel-basierte Haftvermittlungsschicht für PTFE-basierte Beschichtungen und Verfahren zur Herstellung derselben
DE102022119250A1 (de) Plasmapolymerer siliziumorganischer Festkörper, insbesondere plasmacopolymere siliziumorganische Schicht, und beschichtetes Substrat sowie Verfahren zur Herstellung und Verwendung der plasma(co)polymeren siliziumorganischen Schicht
EP2501557B1 (fr) Nouveau type de roues ou cylindres à absorption des chocs, et procédé de fabrication correspondant
EP1975215B1 (fr) Procédé de formation de fines couches liquides sur des substrats flexibles en polymère et/ou métal
EP3620301A2 (fr) Procédé de modification et de revêtement de surfaces de matières polymères, matière polymère et dispositif

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20170502

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20181207

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20220310

RAP3 Party data changed (applicant data changed or rights of an application transferred)

Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

RIN1 Information on inventor provided before grant (corrected)

Inventor name: REGULA, CHRISTOPH

Inventor name: LOMMATZSCH, UWE

Inventor name: ROSANOVA, KIRA

Inventor name: IHDE, JOERG

Inventor name: DEGENHARDT, JOST

Inventor name: WUEBBEN, THOMAS

Inventor name: WILKEN, RALPH

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502015016034

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1513273

Country of ref document: AT

Kind code of ref document: T

Effective date: 20220915

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2927149

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20221102

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221226

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221124

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221224

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221125

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502015016034

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230524

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20221001

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20221031

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20221031

26N No opposition filed

Effective date: 20230525

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20221001

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: TR

Payment date: 20230919

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20231025

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20231117

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20231031

Year of fee payment: 9

Ref country code: FR

Payment date: 20231023

Year of fee payment: 9

Ref country code: DE

Payment date: 20231018

Year of fee payment: 9

Ref country code: AT

Payment date: 20231019

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20231023

Year of fee payment: 9

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20151001

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220824