EP3161315B1 - Getter pumping system - Google Patents
Getter pumping system Download PDFInfo
- Publication number
- EP3161315B1 EP3161315B1 EP15741603.3A EP15741603A EP3161315B1 EP 3161315 B1 EP3161315 B1 EP 3161315B1 EP 15741603 A EP15741603 A EP 15741603A EP 3161315 B1 EP3161315 B1 EP 3161315B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- getter
- cartridges
- pumping system
- heaters
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005086 pumping Methods 0.000 title claims description 36
- 239000000463 material Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 6
- 239000006187 pill Substances 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000005247 gettering Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 108010083687 Ion Pumps Proteins 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 102000006391 Ion Pumps Human genes 0.000 description 1
- 229910004688 Ti-V Inorganic materials 0.000 description 1
- 229910010968 Ti—V Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000986 non-evaporable getter Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
- H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances
Definitions
- the present invention relates to an improved getter pumping system, particularly useful for linear accelerators or more generally for high-volume environments to be evacuated such as large UHV/HV machines for thin film deposition processes like sputtering or vacuum process, for semiconductor manufacturing as dry etching, ion implant or for large detectors kept in vacuum.
- Another application is the control of residual gas pressure, as for instance H 2 and its isotopes, in specific chambers of nuclear energy systems, in particular fusion-based systems.
- getter-based solutions for vacuum control in high-volume environments fall into two main categories.
- the first one is for example described in EP 0964741 and EP 0906635 , and consists in a thin film coating of essentially the whole metallic surface of metal chambers.
- the second solution widely diffused consists instead in using a plurality of getter pumps distributed along the perimeter of an accelerator and connected thereto by means of suitable openings.
- This solution is described in various references, see for example the paper by Ferrario et al., "Distributed pumping by non-evaporable getters in particle accelerators", IEEE transaction on nuclear science, Vol. 28, Nr. 3, June 1981 .
- Getter pumps are discrete systems envisioning the use of getter cartridges, and they may be used as stand-alone systems, as described in the US patent number 6149392 , in the applicant's name, showing a standard pumping system with a limited and small number of getter cartridges.
- the getter cartridges are contained in a vacuum-tight closed housing, whereas in the present invention they are mounted on a wall chamber without any further holding/containing case.
- getter pumps may be jointly used with other vacuum pumps, see for example EP 2409034 and WO 2014/060879 , both in the applicant's name, for the latest developments on these pumping systems.
- the purpose of the present invention is to improve the performance of prior art getter pumping systems by providing higher overall capacity and/or pumping speed, more specifically a pumping system according to the present invention achieves a pumping speed for H 2 higher than 10 5 l/s and a capacity higher than 10 5 mbar liter for residual gases as CO, H 2 O.
- the invention consists in a getter pumping system comprising a wall portion, a plurality of getter cartridges having a linear support connected to said wall portion and a plurality of linear heaters wherein said wall portion has a surface area of at least 0,5 m 2 , the density of getter cartridges is comprised between 20 and 2500 cartridges per square meter and the density of linear heaters is comprised between 20 and 5000 heaters per square meter.
- getter cartridges and heaters takes into account the different possibilities for getter cartridges embodiments, each cartridge containing one or more getter elements.
- This variation is associated with the getter elements geometries (the most common configurations being disk, square and folded planar strip) as well as the getter cartridge upper area, which is defined as the projection of the uppermost getter element of a getter cartridge on a plane perpendicular to the getter cartridge linear support, that typically spans from 1,5 to 15 cm 2 .
- the variation is related also to the different cartridge spacing with respect to each other.
- the number of getter cartridges per square meter multiplied by the average getter cartridge upper area expressed in square meters is comprised between 0,04 and 0,7.
- all the getter cartridges are identical, i.e. they have the same number of getter elements per cartridge, the same getter elements geometries and the same area. Due to the unavoidable variation and tolerances on real products, the average getter cartridge upper area is used in the above consideration on the preferred getter cartridge density.
- getter cartridge in the context of the present invention is to be intended as any elongated element containing or holding at least 1,5 grams of getter material.
- amount of getter material per cartridge is equal to or less than 500 grams.
- the holding configuration is typically obtained by attaching spaced disks of sintered getter powders to a central element, and such configuration is shown for example in the above-mentioned US 6149392 in the applicant's name.
- Another alternate configuration for the getter cartridges according to the present invention envisions the use of pills of getter material contained in an enclosure comprising a metallic netted structure whose purpose is both to retain the pills as well as released particles, if any.
- the porosity of the netted structure can be designed to modulate the throughput of the sorbed gases in combination with other pumps such as a cryogenic or sputter ion pump. In this way, transient peak pressure can be managed in a suitable way.
- Such getter cartridge structure even if in a bulkier configuration, is for example described in US 5154582 .
- getter disks it is the diameter of the disk that sets the maximum distance of the getter material from the linear support, while in the case of discrete getter elements (pills), the distance is determined by the outermost elements.
- these two are the two most interesting and common configurations, especially the one envisioning the use of getter disks mounted on a central support, but other configurations for the getter cartridges are possible and encompassed by the present invention.
- page 228 of the book "Capture Pumping Technology” (1991 ) describes another type of getter cartridge in which the getter material is supported on planar substrates; this pump is available on the market and sold by Applicant under the tradename of Sorb-AC.
- the outermost edges of the coated getter strips determine the maximum distance for the linear getter cartridge as defined above.
- the getter pumping systems according to the present invention envision the presence of heaters to reactivate the getter cartridges.
- These heaters can be integrated into the getter pumping systems according to the present invention in two main modalities. In the first one the heaters are linear elements separate and distinct from the getter cartridges, in the second one the heaters are embedded in the getter cartridges themselves.
- the heater in the case of cartridges made up of stacked and spaced getter disks the heater can be the linear metallic support on which the getter disks are mounted.
- Embedded heaters in getter cartridges made with getter materials having a high thermal capacity may not be sufficient to achieve activation and operative conditions in reasonable timeframes, especially for bigger or spread-out systems, therefore in these cases it is envisioned to use also external (to the getter cartridge) and separate heaters.
- heaters embedded in the gettering units is disclosed in US 2002/0037633 showing gettering units that encompass a silicon substrate, a thin film heater disposed on the silicon substrate, and a gettering layer disposed selectively on the thin film heater.
- the area of the gettering layer is smaller than the area of the thin film heater so as to expose first and second end terminals of the thin film heater that serve as bonding pads in the assembling process.
- the invention is not limited to a specific getter material, but any suitable material capable to sorb gases by means of a thermal treatment may be employed and falls within the definition of getter materials for the scope and purposes of the present invention.
- getter materials are available to a person skilled in the art and may be easily retrieved from various sources, such as EP 0742370 .
- Particularly advantageous are getter metals or alloys comprising at least 30% of one or more of titanium, zirconium, yttrium.
- Even more preferred materials are Zr-Ti-V alloys as described in WO 2013/175340 in the applicant's name or Zr-Ti-V-Al alloys as described in the unpublished Italian patent application number MI2013A001921 also in the applicant's name.
- the getter pumping systems according to the invention present an optimal ratio between the number of getter cartridges and the number of heaters, in particular said ratio is preferably comprised between 0,66 and 4.
- the preferred orientation of the linear elements that constitute the getter pumping system according to the present invention, being them getter cartridges or linear heaters, is such that the average angle formed by adjacent linear elements is preferably equal to or less than 30°, preferably equal to or less than 15°.
- the elements of the getter pumping system according to the present invention being them heaters, getter cartridges, or getter cartridges with integrated heater, are separately replaceable (i.e. separately connected to the wall).
- Preferred connections are achieved by means of screws, junction pockets, interlocking, but also non separately replaceable connections such as welding and riveting may be employed.
- the getter pumping system is made up of a plurality of platform subassemblies, each containing between 2 and 10 linear cartridges and between 1 and 11 linear heaters.
- Figure 1 shows a view from above of a portion 10 of a getter pumping system according to the present invention which is made up of a number n of portions like the one represented in figure 1 , so as to form a "honeycomb" type structure which is one of the favourite structures.
- a central getter cartridge 100 is surrounded by other getter cartridges 100', 100",... 100 n and linear heaters 120, 120',... 120 n all mounted on a wall 11, each getter cartridge being made up of a plurality of getter disks (only the top one being visible in the view from above) mounted on a central linear element 110, 110', 110",... 110 n .
- Said configuration envisions getter cartridges made of disks and separate and distinct linear heaters but, as previously mentioned, this configuration could be alternatively made with getter cartridges in which the getter material is in the form of pills, or getter cartridges in which the central linear supporting elements act also as heaters.
- Fig.2 shows a side view of a getter pumping system 20 according to the present invention, where a plurality of getter cartridges 210, 210',... 210 n are mounted on a wall section 21 and in which the central linear supporting elements act also as heaters.
- the wall section 21 on which the getter cartridges (and optional additional external heaters) are mounted may be curved, such as in the case of particle accelerators.
- FIG. 3 The side view of an alternate embodiment of a getter pumping system 30 according to the present invention is shown in figure 3 .
- a linear vertical wall 31 that on both its left surface 31' and right surface 31" carries a plurality of getter cartridges 310, 310',...310 n and 320, 320', ...320 n respectively, in which the central linear supporting elements act also as heaters.
- both the embodiments shown in figure 2 and 3 could comprise other types of getter cartridges, such as the type using getter pills, and linear heaters external to the getter cartridges.
- getter pumping systems according to the present invention may be used jointly with standard vacuum pumps such as cryogenic, titanium sublimation and sputter ion pumps or getter pumps both connected to the chamber/volume containing the getter pumping system according to the present invention, or as auxiliary elements within the chamber/volume itself.
- standard vacuum pumps such as cryogenic, titanium sublimation and sputter ion pumps or getter pumps both connected to the chamber/volume containing the getter pumping system according to the present invention, or as auxiliary elements within the chamber/volume itself.
- the invention consists in a method for evacuating a chamber having an internal nominal surface of at least 10 m 2 by mounting therein a plurality of getter cartridges having a linear support and a plurality of linear heaters on a wall, wherein said wall has a surface area of at least 0,5 m 2 , the density of getter cartridges is comprised between 20 and 2500 cartridges per square meter and the density of linear heaters is comprised between 20 and 5000 heaters per square meter.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI20141157 | 2014-06-26 | ||
PCT/IB2015/054728 WO2015198235A1 (en) | 2014-06-26 | 2015-06-24 | Getter pumping system |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3161315A1 EP3161315A1 (en) | 2017-05-03 |
EP3161315B1 true EP3161315B1 (en) | 2017-12-20 |
Family
ID=51398734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15741603.3A Active EP3161315B1 (en) | 2014-06-26 | 2015-06-24 | Getter pumping system |
Country Status (7)
Country | Link |
---|---|
US (1) | US9685308B2 (zh) |
EP (1) | EP3161315B1 (zh) |
JP (2) | JP6835592B2 (zh) |
KR (1) | KR102154893B1 (zh) |
CN (1) | CN107076133B (zh) |
RU (1) | RU2663813C2 (zh) |
WO (1) | WO2015198235A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EA201991117A1 (ru) * | 2016-11-04 | 2019-09-30 | Таэ Текнолоджиз, Инк. | Системы и способы улучшенного поддержания высокоэффективной конфигурации с обращенным полем с вакуумированием с захватом многомасштабного типа |
CN112012908A (zh) * | 2020-09-01 | 2020-12-01 | 宁波盾科新材料有限公司 | 一种吸气泵及使用该吸气泵的移动储罐 |
EP4392673A1 (en) | 2022-08-01 | 2024-07-03 | Saes Getters S.p.A. | Snap-on getter pump assembly and its use |
GB2628573A (en) * | 2023-03-29 | 2024-10-02 | Edwards Ltd | Gas capture element |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2034633C3 (de) * | 1969-07-24 | 1979-10-25 | S.A.E.S. Getters S.P.A., Mailand (Italien) | Kartusche für eine Getterpumpe |
JPS53131511A (en) * | 1977-04-22 | 1978-11-16 | Hitachi Ltd | Non-evaporation type cetter pump |
JPH03189380A (ja) * | 1989-12-20 | 1991-08-19 | Jeol Ltd | ゲッタポンプ |
JPH0667870U (ja) * | 1991-02-02 | 1994-09-22 | 株式会社日本製鋼所 | 高真空排気装置 |
US5154582A (en) | 1991-08-20 | 1992-10-13 | Danielson Associates, Inc. | Rough vacuum pump using bulk getter material |
IT1255438B (it) * | 1992-07-17 | 1995-10-31 | Getters Spa | Pompa getter non evaporabile |
US5972183A (en) * | 1994-10-31 | 1999-10-26 | Saes Getter S.P.A | Getter pump module and system |
US5911560A (en) | 1994-10-31 | 1999-06-15 | Saes Pure Gas, Inc. | Getter pump module and system |
US5685963A (en) * | 1994-10-31 | 1997-11-11 | Saes Pure Gas, Inc. | In situ getter pump system and method |
IT1274478B (it) * | 1995-05-11 | 1997-07-17 | Getters Spa | Insieme di riscaldamento per pompe getter e purificatori di gas |
IT237018Y1 (it) * | 1995-07-10 | 2000-08-31 | Getters Spa | Pompa getter perfezionata in particolare per uno strumento dianalisi chimiche portatile |
FR2750248B1 (fr) * | 1996-06-19 | 1998-08-28 | Org Europeene De Rech | Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter |
FR2760089B1 (fr) | 1997-02-26 | 1999-04-30 | Org Europeene De Rech | Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse |
IT1295340B1 (it) * | 1997-10-15 | 1999-05-12 | Getters Spa | Pompa getter ad elevata velocita' di assorbimento di gas |
IT1302694B1 (it) * | 1998-10-19 | 2000-09-29 | Getters Spa | Dispositivo di schermatura mobile in funzione della temperatura trapompa getter e pompa turbomolecolare collegate in linea. |
JP2001357814A (ja) * | 2000-06-15 | 2001-12-26 | Jeol Ltd | 極高真空スパッタイオンポンプ |
JP3565153B2 (ja) * | 2000-09-26 | 2004-09-15 | 日産自動車株式会社 | ゲッタ装置およびセンサ |
JP3828487B2 (ja) * | 2002-12-24 | 2006-10-04 | 三菱電機株式会社 | 非蒸発型ゲッター |
CN200958468Y (zh) * | 2006-10-25 | 2007-10-10 | 北京有色金属研究总院 | 一种使用安全大抽速吸气剂泵 |
JP5194534B2 (ja) * | 2007-04-18 | 2013-05-08 | パナソニック株式会社 | 真空処理装置 |
WO2009118398A1 (en) * | 2008-03-28 | 2009-10-01 | Saes Getters S.P.A. | Combined pumping system comprising a getter pump and an ion pump |
ITMI20090402A1 (it) * | 2009-03-17 | 2010-09-18 | Getters Spa | Sistema di pompaggio combinato comprendente una pompa getter ed una pompa ionica |
CN201865882U (zh) * | 2010-11-26 | 2011-06-15 | 中国航天科工集团第二研究院二○三所 | 一种用于氢原子频标的外加热式钛基吸气剂泵 |
ITMI20120872A1 (it) | 2012-05-21 | 2013-11-22 | Getters Spa | Leghe getter non evaporabili particolarmente adatte per l'assorbimento di idrogeno e azoto |
ITMI20121732A1 (it) * | 2012-10-15 | 2014-04-16 | Getters Spa | Pompa getter |
ITMI20131921A1 (it) | 2013-11-20 | 2015-05-21 | Getters Spa | Leghe getter non evaporabili particolarmente adatte per l'assorbimento di idrogeno e monossido di carbonio |
TWI660125B (zh) * | 2014-04-03 | 2019-05-21 | 義大利商沙斯格特斯公司 | 吸氣泵 |
-
2015
- 2015-06-24 EP EP15741603.3A patent/EP3161315B1/en active Active
- 2015-06-24 JP JP2016567349A patent/JP6835592B2/ja active Active
- 2015-06-24 KR KR1020167031408A patent/KR102154893B1/ko active IP Right Grant
- 2015-06-24 CN CN201580024517.7A patent/CN107076133B/zh active Active
- 2015-06-24 US US15/308,057 patent/US9685308B2/en active Active
- 2015-06-24 RU RU2017102266A patent/RU2663813C2/ru active
- 2015-06-24 WO PCT/IB2015/054728 patent/WO2015198235A1/en active Application Filing
-
2019
- 2019-07-30 JP JP2019139803A patent/JP2019203201A/ja not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
CN107076133B (zh) | 2019-06-18 |
WO2015198235A1 (en) | 2015-12-30 |
RU2663813C2 (ru) | 2018-08-10 |
EP3161315A1 (en) | 2017-05-03 |
KR20170026331A (ko) | 2017-03-08 |
JP2017522481A (ja) | 2017-08-10 |
JP2019203201A (ja) | 2019-11-28 |
CN107076133A (zh) | 2017-08-18 |
KR102154893B1 (ko) | 2020-09-11 |
US9685308B2 (en) | 2017-06-20 |
JP6835592B2 (ja) | 2021-02-24 |
RU2017102266A (ru) | 2018-07-31 |
US20170076925A1 (en) | 2017-03-16 |
RU2017102266A3 (zh) | 2018-07-31 |
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