EP3136418A1 - Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz - Google Patents

Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz Download PDF

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Publication number
EP3136418A1
EP3136418A1 EP16180059.4A EP16180059A EP3136418A1 EP 3136418 A1 EP3136418 A1 EP 3136418A1 EP 16180059 A EP16180059 A EP 16180059A EP 3136418 A1 EP3136418 A1 EP 3136418A1
Authority
EP
European Patent Office
Prior art keywords
electrode
potential
plasma chamber
tube
intended
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16180059.4A
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English (en)
French (fr)
Other versions
EP3136418B1 (de
Inventor
Olivier Delferriere
Olivier Tuske
Francis HARRAULT
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Publication of EP3136418A1 publication Critical patent/EP3136418A1/de
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Publication of EP3136418B1 publication Critical patent/EP3136418B1/de
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids

Definitions

  • the present invention relates to an electron cyclotron resonance ion generating device, and more specifically to an ECR or "electron cyclotron resonance" type ion source, for electron cyclotron resonance.
  • ECR sources electronic cyclotron resonance devices, also called ECR sources, are used to produce mono-charged or multicharged ions (that is, atoms to which one or more electrons have been torn off).
  • This device is particularly advantageous because it is very compact due to the presence of the insulating structure upstream of the plasma chamber, which reduces the total length of the device. However, it is still relatively bulky.
  • this device comprises an accelerator tube for extracting the ions from the plasma chamber.
  • the accelerator tube comprises a plurality of electrodes whose shape is simplified compared to the devices of the prior art.
  • the second electrode of this device of the prior art also called “intermediate electrode” because it is biased to an intermediate potential, has a complex geometry to avoid electrical breakdown in the accelerator tube.
  • the invention aims to overcome the drawbacks of the state of the art by providing a more compact electronic cyclotron resonance ion generating device than those of the prior art.
  • the invention also aims to propose a device in which the risk of Penning type discharge is limited.
  • the invention also aims to provide a simpler device than those of the prior art, in which the risk of electrical breakdown is also reduced.
  • upstream and downstream are used with respect to the direction of propagation of an ion beam at the outlet of the plasma chamber.
  • the electron cyclotron resonance ion generating device is particularly advantageous because it is more compact than those of the prior art since the insulating structure is now in contact with the metal tube in which are hollowed out the waveguide and the plasma chamber. There is therefore no air gap between the insulating structure and the waveguide, in contrast to the devices of the prior art.
  • this geometry makes it possible to have a limited risk of breakdown in the device, as well as a risk of limited Penning discharge.
  • the extraction of the ion beam is therefore more reliable in the device according to the first aspect of the invention.
  • by removing the air gap between the insulating structure and the waveguide it eliminates the need for a pumping sleeve, which further simplifies the device.
  • the device according to the first aspect of the invention may also have one or more of the following features taken independently or in any technically possible combination.
  • the extraction means further comprise a second electrode disposed between the first and the third electrode, the second electrode being intended to be placed at a variable potential, the second electrode being able to be connected to means for adjusting the potential. .
  • the second electrode is connected to the ceramic tube, the second electrode having an annular shape.
  • the second electrode therefore has a simpler geometry than in the devices of the prior art. This simplification of the geometry of the second electrode is made possible by the fact that the air gap between the insulating structure and the walls of the plasma chamber and the waveguide has been eliminated.
  • the device further comprises a ceramic ring interposed between the first and the second electrode.
  • This ceramic ring keeps the first and the second electrode in place while reducing the risk of breakdown in the extraction means.
  • connection socket is located on a lateral outer wall of the ceramic tube, the connection means further comprising a radial connection duct connecting the longitudinal connection duct to the connection socket.
  • the device further comprises an inlet flange, the connection socket being located on an outer wall of the inlet flange.
  • the ceramic tube comprises two concentric tubular parts.
  • the longitudinal connection duct may thus be formed by a groove dug in one of the two tubular portions.
  • the groove is preferably hollowed in the inner tubular portion.
  • the longitudinal connection duct is thus easier to achieve, since it can be achieved by digging a groove on an outer surface of the inner tubular portion of the ceramic tube.
  • the ceramic tube is formed by an integral piece.
  • the extraction means further comprise a fifth electrode downstream of the fourth electrode, the fifth electrode being intended to be placed at the second potential.
  • connection flange is fixed on the ceramic tube.
  • an additional support flange can be dispensed with and the device can be directly attached to the ion transport line via the connection flange.
  • the device is thus shortened and the ion transport line is brought closer to the plasma chamber, which results in a better quality ion beam in the ion transport line.
  • the metal tube is pierced by a conduit arranged to allow the injection of a gas from outside the metal tube into the plasma chamber.
  • This device comprises a metal tube 1.
  • the metal tube 1 extends along a reference axis 2.
  • the metal tube 1 has a symmetry of revolution with respect to the reference axis 2.
  • the metal tube 1 has an upstream end 5 and a downstream end 6.
  • the metal tube 1 may for example be made of copper.
  • the metal tube 1 comprises a first cavity which forms a plasma chamber 3 intended to contain a plasma.
  • the metal tube 1 also comprises a second cavity which forms a waveguide 4.
  • the waveguide 4 is intended to be traversed by a high frequency wave so as to inject it into the plasma chamber 3.
  • a high-frequency wave frequency is a wave that has a frequency between 1 and 15 GHz.
  • the waveguide 4 comprises an upstream end 10 intended to be connected to means for generating a high frequency wave and a downstream end 11 which opens into the plasma chamber 3.
  • the plasma chamber 3 and the waveguide 4 are formed by a piece in one piece, which simplifies the structure of the device.
  • the metal tube 1 is also pierced by a conduit 7 which preferably connects the plasma chamber 3 to the upstream end of the metal tube.
  • This duct 7 makes it possible to inject a gas into the plasma chamber 3 from outside the device.
  • the device also comprises means 8 for generating a magnetic field in the plasma chamber 3.
  • These generation means 8 may for example comprise one or more coil (s) or permanent magnets.
  • the plasma chamber 3 is supplied with atoms via the conduit 7.
  • the waveguide 4 conducts a high frequency wave in the plasma chamber 3 while the generation means 8 generate a magnetic field in the plasma chamber 3.
  • the coupling of this high-frequency wave and this magnetic field makes it possible to obtain an electron cyclotron resonance in the plasma chamber 3.
  • the atoms present in the plasma chamber 3 are then ionized and a plasma is obtained in the plasma chamber 3.
  • the plasma chamber 3 is placed at a first potential V 1 .
  • the entire metal tube 1 is placed at this first potential V 1 .
  • the device also comprises extraction means 12 configured to extract ions from the plasma chamber 3.
  • the extraction means 12 comprise an upstream end 15 connected to the plasma chamber 3 and a downstream end 16 intended to be connected to a line
  • the upstream end 15 of the extraction means is therefore intended to be placed at the same potential as the plasma chamber 3, that is to say at the first potential V 1 .
  • the downstream end 16 of the extraction means is intended to be placed at the same potential as the ion transport line 22.
  • the downstream end 16 of the extraction means is therefore intended to be placed at a second potential V 2 different of the first potential V 1 .
  • the potential difference between the first potential V 1 and the second potential V 2 is preferably between 1 and 200 kV.
  • the second potential V 2 is advantageously close to 0 V.
  • the device comprises an insulating structure.
  • This insulating structure comprises a ceramic tube 17.
  • This ceramic tube 17 may for example be made of alumina.
  • the ceramic tube 17 is preferably fixed to the metal tube 1 via an annular inlet flange 28 secured to the metal tube 1.
  • the ceramic tube 17 is preferably fixed by screws 29 to the inlet flange 28 preferably via metal inserts.
  • This ceramic tube 17 preferably comprises an inner tubular portion 18 which surrounds the metal tube 1.
  • the inner tubular portion 18 is in contact with the metal tube 1, which makes it possible to have a less bulky device radially and which limits the risk breakdown in the device.
  • the ceramic tube also has a concentric outer tubular portion 19 of the inner tubular portion 18.
  • the outer tubular portion 19 preferably has a first cylindrical portion 19a that surrounds the inner tubular portion 18 and a second portion 19b that at least partially surrounds a portion of the electrodes of the extraction means 12.
  • the second cylindrical portion 19b surrounds the first and the second electrode 13a, 13b.
  • the first electrode 13a is fixed on the metal tube 1.
  • the second electrode 13b is fixed on the outer tubular part 19b.
  • a ceramic ring 23 is interposed between the first and the second electrode 13a, 13b in order to isolate them electrically from each other and to avoid electrical breakdowns.
  • the device also comprises a connection flange 21 for fixing the device to an ion transport line 22.
  • the connection flange 21 is fixed to the ceramic tube 17.
  • the connection flange 21 preferably surrounds the third, fourth and fifth electrodes 13c, 13d, 13th.
  • the third, fourth and fifth electrodes 13c, 13d, 13e are preferably fixed on an input flange of the transmission line 22.
  • the third, fourth and fifth electrodes 13c, 13d, 13e can be separated from each other either by air gaps and insulated spacers, or by ceramic rings.
  • the device preferably comprises connection means able to connect the second electrode 13b to means for adjusting the potential. These connection means make it possible to polarize the second electrode 11b by connecting it to a high-voltage power supply.
  • connection plug 26 The longitudinal connection duct 25 and the radial connection duct 36 are traversed by a metal wire 24 connecting the connection plug 26 to the second electrode 13b.
  • the wire 24 has a first end 34 pinched on the second electrode 11b by means of a screw. The wire 24 then passes successively into the first orifice 33, the second orifice 31 and the groove 30.
  • the wire therefore passes in particular the collar 32 of the metal tube 1.
  • the wire 24 is not at the same potential as the flange 32.
  • the wire is at the same potential as the second electrode 13b, while the flange is at the same potential as the plasma chamber.
  • the wire is therefore at a potential between the first potential V 1 and the second potential V 2 while the flange 32 is at the first potential V 1 .
  • an insulating sleeve 35 is inserted into the second orifice 31.
  • the insulating sleeve 35 is therefore interposed between the flange 32 and the wire 24.
  • the insulating sleeve 35 is preferably formed by a glass tube . This insulating sleeve 35 extends on either side of the second orifice 31, into the alumina parts on either side of the collar 32 to avoid any risk of contact between the wire 24 and the collar 32.
  • the means for generating the magnetic field 8 preferably surround the ceramic tube 17. More specifically, the means for generating the magnetic field 8 are preferably located at the plasma chamber 3. Thus, the magnetic field generation means 8 surround preferably the plasma chamber 3 in order to optimize the generation of the magnetic field at the level of the plasma chamber 3.
  • the device thus produced is compact longitudinally and radially. Indeed, the overall volume of the device has been divided by ten compared to the devices of the prior art.
  • the device also has a risk of discharge type Penning and limited breakdown.
  • it makes it possible to connect the ion transport line 22 directly at the outlet of the plasma chamber 3, which makes it possible to have a beam of better quality and more easily controllable in the ion transport line.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
EP16180059.4A 2015-07-21 2016-07-19 Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz Active EP3136418B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1556871A FR3039316B1 (fr) 2015-07-21 2015-07-21 Dispositif generateur d'ions a resonance cyclotronique electronique

Publications (2)

Publication Number Publication Date
EP3136418A1 true EP3136418A1 (de) 2017-03-01
EP3136418B1 EP3136418B1 (de) 2020-09-09

Family

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EP16180059.4A Active EP3136418B1 (de) 2015-07-21 2016-07-19 Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz

Country Status (3)

Country Link
US (1) US9852873B2 (de)
EP (1) EP3136418B1 (de)
FR (1) FR3039316B1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019111908B4 (de) * 2019-05-08 2021-08-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0955170A (ja) * 1995-08-10 1997-02-25 Nissin Electric Co Ltd イオン源
FR2969371A1 (fr) 2010-12-15 2012-06-22 Commissariat Energie Atomique Dispositif generateur d’ions a resonance cyclotronique electronique

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3376921D1 (en) * 1982-09-10 1988-07-07 Nippon Telegraph & Telephone Ion shower apparatus
JPH08102279A (ja) * 1994-09-30 1996-04-16 Hitachi Ltd マイクロ波プラズマ生成装置
US8148922B2 (en) * 2008-08-11 2012-04-03 Ion Beam Applications Sa High-current DC proton accelerator

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0955170A (ja) * 1995-08-10 1997-02-25 Nissin Electric Co Ltd イオン源
FR2969371A1 (fr) 2010-12-15 2012-06-22 Commissariat Energie Atomique Dispositif generateur d’ions a resonance cyclotronique electronique

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
GOBIN R ET AL: "High intensity ECR ion source (H+, D+, H-) developments at CEA/Saclay", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 73, no. 2, 1 February 2002 (2002-02-01), pages 922 - 924, XP012039757, ISSN: 0034-6748, DOI: 10.1063/1.1428783 *

Also Published As

Publication number Publication date
FR3039316B1 (fr) 2019-07-12
US20170025240A1 (en) 2017-01-26
FR3039316A1 (fr) 2017-01-27
EP3136418B1 (de) 2020-09-09
US9852873B2 (en) 2017-12-26

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