EP3136418B1 - Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz - Google Patents

Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz Download PDF

Info

Publication number
EP3136418B1
EP3136418B1 EP16180059.4A EP16180059A EP3136418B1 EP 3136418 B1 EP3136418 B1 EP 3136418B1 EP 16180059 A EP16180059 A EP 16180059A EP 3136418 B1 EP3136418 B1 EP 3136418B1
Authority
EP
European Patent Office
Prior art keywords
electrode
potential
plasma chamber
tube
intended
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP16180059.4A
Other languages
English (en)
French (fr)
Other versions
EP3136418A1 (de
Inventor
Olivier Delferriere
Olivier Tuske
Francis HARRAULT
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Publication of EP3136418A1 publication Critical patent/EP3136418A1/de
Application granted granted Critical
Publication of EP3136418B1 publication Critical patent/EP3136418B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids

Definitions

  • the present invention relates to an electron cyclotron resonance ion generator device, and more precisely to an ion source of the ECR or “electron cyclotron resonance” type, for electron cyclotron resonance.
  • ECR sources electronic cyclotron resonance devices, also called ECR sources, are used to produce mono-charged or multi-charged ions (that is to say atoms from which one or more electrons have been torn off).
  • This device is particularly advantageous because it is very compact thanks to the presence of the insulating structure upstream of the plasma chamber, which makes it possible to reduce the total length of the device. However, it is still relatively bulky.
  • this device comprises an accelerator tube making it possible to extract the ions from the plasma chamber.
  • the accelerator tube comprises several electrodes whose shape is simplified compared to the devices of the prior art.
  • the second electrode of this device of the prior art also called “intermediate electrode” because it is polarized at an intermediate potential, has a complex geometry in order to avoid electrical breakdowns in the accelerator tube.
  • the invention aims to remedy the drawbacks of the state of the art by proposing an electron cyclotron resonance ion generator device that is more compact than those of the prior art.
  • the invention also aims to provide a device in which the risk of Penning-type discharge is limited.
  • the invention also aims to provide a device that is simpler than those of the prior art, in which the risk of electrical breakdown is also reduced.
  • upstream and downstream are used with respect to the direction of propagation of an ion beam at the outlet of the plasma chamber.
  • the electron cyclotron resonance ion generator device is particularly advantageous because it is more compact than those of the prior art given that the insulating structure is now in contact with the metal tube in which are hollowed out the waveguide and the plasma chamber. There is therefore no longer an air gap between the insulating structure and the waveguide, unlike the devices of the prior art.
  • this geometry makes it possible to have a limited risk of breakdown in the device, as well as a limited risk of Penning type discharge. The extraction of the ion beam is therefore more reliable in the device according to the first aspect of the invention.
  • the need for a pumping sleeve is eliminated, which further simplifies the device.
  • the device according to the first aspect of the invention can also have one or more of the characteristics below taken independently or according to any technically possible combination.
  • the extraction means further comprise a second electrode arranged between the first and the third electrode, the second electrode being intended to be placed at a variable potential, the second electrode being able to be connected to means for adjusting the potential. .
  • the second electrode is connected to the ceramic tube, the second electrode having an annular shape.
  • the second electrode therefore has a simpler geometry than in the devices of the prior art. This simplification of the geometry of the second electrode is made possible thanks to the fact that the air gap between the insulating structure and the walls of the plasma chamber and of the waveguide has been eliminated.
  • the device further comprises a ceramic ring interposed between the first and the second electrode.
  • This ceramic ring keeps the first and the second electrode in place, while reducing the risk of breakdown in the extraction means.
  • connection socket is located on a lateral outer wall of the ceramic tube, the connection means further comprising a radial connection duct connecting the longitudinal connection duct to the connection socket.
  • the device further comprises an inlet flange, the connection socket being located on an outer wall of the inlet flange.
  • the ceramic tube comprises two concentric tubular parts.
  • the longitudinal connection duct can thus be formed by a groove hollowed out in one of the two tubular parts.
  • the groove is preferably hollowed out in the internal tubular part.
  • the longitudinal connection duct is thus easier to produce, since it can be produced by hollowing out a groove on an external surface of the internal tubular part of the ceramic tube.
  • the ceramic tube is formed by a single piece.
  • the extraction means further comprise a fifth electrode downstream from the fourth electrode, the fifth electrode being intended to be placed at the second potential.
  • the metal tube is pierced by a conduit arranged to allow the injection of a gas from outside the metal tube into the plasma chamber.
  • This device comprises a metal tube 1.
  • the metal tube 1 extends along a reference axis 2.
  • the metal tube 1 has a symmetry of revolution with respect to the reference axis 2.
  • the metal tube 1 has an upstream end 5 and a downstream end 6.
  • the metal tube 1 can for example be made of copper.
  • the metal tube 1 comprises a first cavity which forms a plasma chamber 3 intended to contain a plasma.
  • the metal tube 1 also comprises a second cavity which forms a waveguide 4.
  • the waveguide 4 is intended to be traversed by a high frequency wave so as to inject it into the plasma chamber 3.
  • a high wave. frequency is a wave that has a frequency between 1 and 15 GHz.
  • the waveguide 4 comprises an upstream end 10 intended to be connected to means for generating a high frequency wave and a downstream end 11 which opens into the plasma chamber 3.
  • the plasma chamber 3 and the waveguide 4 are formed by a single piece, which simplifies the structure of the device.
  • the metal tube 1 is also pierced by a conduit 7 which preferably connects the plasma chamber 3 to the upstream end of the metal tube.
  • This duct 7 makes it possible to inject a gas into the plasma chamber 3 from outside the device.
  • the device also comprises means 8 for generating a magnetic field in the plasma chamber 3.
  • These generating means 8 may for example comprise one or more coil (s) or permanent magnets.
  • the plasma chamber 3 is supplied with atoms via the conduit 7.
  • the waveguide 4 conducts a high frequency wave in the plasma chamber 3 while the generation means 8 generate a magnetic field in the plasma chamber 3.
  • the coupling this high-frequency wave and this magnetic field makes it possible to obtain an electronic cyclotronic resonance in the plasma chamber 3.
  • the atoms present in the plasma chamber 3 are then ionized and a plasma is obtained in the plasma chamber 3.
  • the plasma chamber 3 is placed at a first potential V 1 .
  • the whole of the metal tube 1 is placed at this first potential V 1 .
  • the device also comprises extraction means 12 configured to extract ions from the plasma chamber 3.
  • the extraction means 12 comprise an upstream end 15 connected to the plasma chamber 3 and a downstream end 16 intended to be connected to a line. for transporting ions 22.
  • the upstream end 15 of the extraction means is therefore intended to be placed at the same potential as the plasma chamber 3, that is to say at the first potential V 1 .
  • the downstream end 16 of the extraction means is intended to be placed at the same potential as the ion transport line 22.
  • the downstream end 16 of the extraction means is therefore intended to be placed at a second different potential V 2. of the first potential V 1 .
  • the potential difference between the first potential V 1 and the second potential V 2 is preferably between 1 and 200 kV.
  • the second potential V 2 is advantageously close to 0 V.
  • the device comprises an insulating structure.
  • This insulating structure comprises a ceramic tube 17.
  • This ceramic tube 17 can for example be made of alumina.
  • the ceramic tube 17 is preferably fixed to the metal tube 1 by means of an annular inlet flange 28 integral with the metal tube 1.
  • the ceramic tube 17 is preferably fixed by screws 29 to the inlet flange 28 , preferably by means of metal inserts.
  • This ceramic tube 17 preferably comprises an internal tubular part 18 which surrounds the metal tube 1.
  • the internal tubular part 18 is in contact with the metal tube 1, which makes it possible to have a less bulky device radially and which limits the risk. breakdown in the device.
  • the ceramic tube also comprises an outer tubular part 19 concentric with the inner tubular part 18.
  • the outer tubular part 19 preferably comprises a first cylindrical part 19a which surrounds the inner tubular part 18 and a second part 19b which at least partially surrounds at least a part of the electrodes of the extraction means 12.
  • the second cylindrical part 19b surrounds the first and the second electrode 13a, 13b.
  • the first electrode 13a is fixed on the metal tube 1.
  • the second electrode 13b is fixed on the outer tubular part 19b.
  • a ceramic ring 23 is interposed between the first and the second electrode 13a, 13b in order to electrically insulate them from one another and to avoid electrical breakdowns.
  • the device also includes a connection flange 21 enabling the device to be fixed to an ion transport line 22.
  • the connection flange 21 is fixed to the ceramic tube 17.
  • the connection flange 21 preferably surrounds the third, fourth and fifth electrodes. 13c, 13d, 13th.
  • the third, fourth and fifth electrodes 13c, 13d, 13e are preferably fixed to an inlet flange of the transport line 22.
  • the third, fourth and fifth electrodes 13c, 13d, 13e can be separated from each other either by air gaps and isolated spacers, or by ceramic rings.
  • the device preferably comprises connection means capable of connecting the second electrode 13b to means for adjusting the potential. These connection means make it possible to polarize the second electrode 11b by connecting it to a high voltage supply.
  • connection duct 25 and the radial connection duct 36 are crossed by a metal wire 24 connecting the connection socket 26 to the second electrode 13b.
  • the metal wire 24 has a first end 34 clamped on the second electrode 11b by means of a screw. The metal wire 24 then passes successively through the first orifice 33, the second orifice 31 and the groove 30.
  • the metal wire therefore passes in particular through the collar 32 of the metal tube 1.
  • the metal wire 24 is not at the same potential as the collar 32.
  • the metal wire is at the same potential as the second electrode 13b, while the collar is at the same potential as the plasma chamber.
  • the metal wire is therefore at a potential between the first potential V 1 and the second potential V 2 while the collar 32 is at the first potential V 1 .
  • an insulating sleeve 35 is inserted into the second orifice 31.
  • the insulating sleeve 35 is therefore interposed between the collar 32 and the metal wire 24.
  • the insulating sleeve 35 is preferably formed by a glass tube. . This insulating sleeve 35 extends on either side of the second orifice 31, into the alumina parts on either side of the collar 32 in order to avoid any risk of contact between the metal wire 24 and the collar. 32.
  • the means for generating the magnetic field 8 preferably surround the ceramic tube 17. More precisely, the means for generating the magnetic field 8 are preferably located at the level of the plasma chamber 3. Thus, the means for generating the magnetic field 8 surround preferably the plasma chamber 3 in order to optimize the generation of the magnetic field at the level of the plasma chamber 3.
  • the device thus produced is compact longitudinally and radially.
  • the overall volume of the device has thus been divided by ten compared to the devices of the prior art.
  • the device also presents a risk of Penning-type discharge and limited breakdown.
  • it makes it possible to connect the ion transport line 22 directly at the outlet of the plasma chamber 3, which makes it possible to have a better quality and more easily controllable beam in the ion transport line.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)

Claims (14)

  1. Vorrichtung zur Erzeugung von Ionen mit Elektronen-Zyklotronresonanz, aufweisend:
    - ein Metallrohr (1), wobei das Metallrohr (1) bestimmt ist, an einem ersten Potential (V1) platziert zu sein, wobei das Metallrohr (1) durchbrochen ist von:
    ∘ einem ersten Hohlraum, der eine Plasmakammer (3) bildet, die bestimmt ist, ein Plasma zu enthalten;
    ∘ einem zweiten Hohlraum, der mit dem ersten Hohlraum verbunden ist, wobei der zweite Hohlraum einen Wellenleiter (4) bildet, der eingerichtet ist, um eine Hochfrequenzwelle in die Plasmakammer (3) einzuleiten,
    - Extraktionsmittel (12), die eingerichtet sind, um Ionen aus der Plasmakammer (3) zu extrahieren, wobei die Extraktionsmittel (12) ein vorgelagertes Ende (15) aufweisen, das an die Plasmakammer (3) angeschlossen ist, und ein nachgelagertes Ende (16), das mit einem Anschlussflansch (21) versehen ist, der bestimmt ist, an einer lonentransportlinie (22) angeschlossen zu sein, wobei der Anschlussflansch (21) bestimmt ist, an einem zweiten Potential (V2), das sich vom ersten Potential (V1) unterscheidet, platziert zu sein,
    - Erzeugungsmittel (8) eines Magnetfelds, die ausgelegt sind, um ein Magnetfeld in der Plasmakammer (3) zu erzeugen,
    - eine isolierende Struktur, die eingerichtet ist, um das Metallrohr (1) vom nachgelagerten Ende (16) der Extraktionsmittel elektrisch zu isolieren, wobei die isolierende Struktur ein Keramikrohr (17) in Kontakt mit dem Metallrohr (1) aufweist, wobei das Keramikrohr (17) das Metallrohr (1) und mindestens einen Teil der Extraktionsmittel (12) umgibt.
  2. Vorrichtung nach vorangehendem Anspruch, wobei die Extraktionsmittel (12) mindestens aufweisen:
    - eine erste Elektrode (13a), die mit dem Metallrohr (1) fest verbunden ist, wobei die erste Elektrode (13a) bestimmt ist, am ersten Potential (V1) platziert zu sein,
    - eine dritte Elektrode (13c), die der ersten Elektrode (13b) nachgelagert ist, wobei die dritte Elektrode (13c) bestimmt ist, am zweiten Potential (V2) platziert zu sein;
    - eine vierte Elektrode (13d), die der dritten Elektrode nachgelagert ist, wobei die vierte Elektrode (13d) bestimmt ist, an einem negativen Potential (Vneg) platziert zu sein.
  3. Vorrichtung nach vorangehendem Anspruch, wobei die Extraktionsmittel (12) ferner eine zweite Elektrode (13b) aufweisen, die zwischen der ersten und der dritten Elektrode (13a, 13c) angeordnet ist, wobei die zweite Elektrode (13b) bestimmt ist, an einem variablen Potential (Vvar) platziert zu sein, wobei die zweite Elektrode (13b) imstande ist, mit Einstellmitteln des Potentials verbunden zu sein.
  4. Vorrichtung nach vorangehendem Anspruch, wobei die zweite Elektrode (13b) mit dem Keramikrohr (17) verbunden ist, wobei die zweite Elektrode (13b) ringförmig ist.
  5. Vorrichtung nach einem der Ansprüche 3 oder 4, aufweisend ferner einen Keramikring (23), der zwischen der ersten (13a) und der zweiten Elektrode (13b) zwischengestellt ist.
  6. Vorrichtung nach einem der Ansprüche 3 bis 5, wobei die Vorrichtung Anschlussmittel aufweist, die imstande sind, die zweite Elektrode (13b) an Einstellmittel des Potentials anzuschließen, wobei die Anschlussmittel aufweisen:
    - eine Anschlussbuchse (26), die sich außerhalb des Keramikrohrs (17) befindet;
    - eine längliche Anschlussleitung (25), die das Keramikrohr (17) längs durchquert, wobei die Anschlussleitung (25) von einem Metalldraht (24) durchquert wird, der die Anschlussbuchse (26) mit der zweiten Elektrode (13b) verbindet.
  7. Vorrichtung nach Anspruch 6, wobei sich die Anschlussbuchse auf einer äußeren Seitenwand (27) des Keramikrohrs befindet, wobei die Anschlussmittel ferner eine radiale Anschlussleitung (36) aufweisen, die die längliche Anschlussleitung mit der Anschlussbuchse (26) verbindet.
  8. Vorrichtung nach Anspruch 6, aufweisend ferner einen Eingangsflansch (28), wobei sich die Anschlussbuchse auf einer Außenwand des Eingangsflanschs befindet.
  9. Vorrichtung nach einem der Ansprüche 1 bis 8, wobei das Keramikrohr (17) zwei konzentrische Rohrteile (18, 19) aufweist.
  10. Vorrichtung nach einem der Ansprüche 1 bis 8, wobei das Keramikrohr (17) von einem Teil einstückig gebildet ist.
  11. Vorrichtung nach einem der Ansprüche 2 bis 10, wobei die Extraktionsmittel ferner eine fünfte Elektrode (13e) aufweisen, die der vierten Elektrode (13d) nachgelagert ist, wobei die fünfte Elektrode (13e) bestimmt ist, am zweiten Potential (V2) platziert zu sein.
  12. Vorrichtung nach einem der vorangehenden Ansprüche, wobei der Anschlussflansch (21) auf dem Keramikrohr (17) befestigt ist.
  13. Vorrichtung nach einem der vorangehenden Ansprüche, wobei die Erzeugungsmittel (8) eines Magnetfelds, die eingerichtet sind, um ein Magnetfeld in der Plasmakammer (3) zu erzeugen, das Keramikrohr (17) umgeben, wobei sich die Erzeugungsmittel (8) des Magnetfelds im Bereich der Plasmakammer (3) befinden.
  14. Vorrichtung nach einem der vorangehenden Ansprüche, wobei das Metallrohr (1) von einer Leitung (7) durchbrochen ist, die eingerichtet ist, um das Einleiten eines Gases von außerhalb des Metallrohrs (1) in die Plasmakammer (3) zu erlauben.
EP16180059.4A 2015-07-21 2016-07-19 Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz Active EP3136418B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1556871A FR3039316B1 (fr) 2015-07-21 2015-07-21 Dispositif generateur d'ions a resonance cyclotronique electronique

Publications (2)

Publication Number Publication Date
EP3136418A1 EP3136418A1 (de) 2017-03-01
EP3136418B1 true EP3136418B1 (de) 2020-09-09

Family

ID=54366328

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16180059.4A Active EP3136418B1 (de) 2015-07-21 2016-07-19 Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz

Country Status (3)

Country Link
US (1) US9852873B2 (de)
EP (1) EP3136418B1 (de)
FR (1) FR3039316B1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019111908B4 (de) * 2019-05-08 2021-08-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3376921D1 (en) * 1982-09-10 1988-07-07 Nippon Telegraph & Telephone Ion shower apparatus
JPH08102279A (ja) * 1994-09-30 1996-04-16 Hitachi Ltd マイクロ波プラズマ生成装置
JPH0955170A (ja) * 1995-08-10 1997-02-25 Nissin Electric Co Ltd イオン源
US8148922B2 (en) * 2008-08-11 2012-04-03 Ion Beam Applications Sa High-current DC proton accelerator
FR2969371B1 (fr) * 2010-12-15 2013-01-04 Commissariat Energie Atomique Dispositif generateur d?ions a resonance cyclotronique electronique

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
FR3039316B1 (fr) 2019-07-12
US20170025240A1 (en) 2017-01-26
FR3039316A1 (fr) 2017-01-27
EP3136418A1 (de) 2017-03-01
US9852873B2 (en) 2017-12-26

Similar Documents

Publication Publication Date Title
EP1496727B1 (de) Plasmabeschleuniger mit geschlossener Elektronenbahn
EP0781921B1 (de) Ionenquelle mit geschlossener Elektronendrift
WO1994002738A1 (fr) Moteur a plasma a derive fermee d'electrons
EP2353347B1 (de) Einrichtung und verfahren zum erzeugen und/oder eingrenzen eines plasmas
EP0127523B1 (de) Elektronzyklotronresonanz-Ionenquelle
EP0145586B1 (de) Quelle von mehrfachgeladenen Ionen mit mehreren Elektronzyclotronresonanz-Zonen
EP3146204A1 (de) Vorrichtung zur formung eines quasi-neutralen strahls von gegensätzlich geladenen partikeln
EP0711100A1 (de) Plasmaerzeugungsvorrichtung, ermöglichend eine Trennung zwischen Mikrowellenübertragung und -absorptionszonen
EP3136418B1 (de) Vorrichtung zur erzeugung von ionen mit elektronen-zyklotron-resonanz
EP2652766B1 (de) Elektron-zyklotron-resonanzionenquelle
FR2904178A1 (fr) Dispositif et procede de production et/ou de confinement d'un plasma
EP3087580B1 (de) Mikrowellengenerator mit oszillierender virtueller kathode, mit achsgeometrie, mit mindestens einem reflektor und einem magnetring mit konfiguration zur ansteuerung durch einen hochohmigen generator
FR2641899A1 (fr) Canon a electrons muni d'un dispositif actif produisant un champ magnetique au voisinage de la cathode
EP0532411B1 (de) Elektronzyklotronresonanz-Ionenquelle mit koaxialer Zuführung elektromagnetischer Wellen
FR2969372A1 (fr) Dispositif d’ionisation a la resonance cyclotron electronique
EP0946961B1 (de) Magnetische vorrichtung, insbesondere fuer elektronzyklotronresonanzionenquellen, die die erzeugung geschlossener oberflaechen mit konstanter magnetfeldstaerke b und beliebiger groesse ermoeglichen
EP0527082A1 (de) Elektroncyclotionresonanz-Ionenquelle vom Wellenleiter-Typ zur Erzeugung mehrfachgeladenen Ionen
FR3046520A1 (fr) Systeme de generation de faisceau plasma a derive d'electrons fermee et propulseur comprenant un tel systeme
EP0813223A1 (de) Magnetfelderzeugungsvorrichtung und ECR Ionenquelle dafür
FR2985366A1 (fr) Generateur d'ondes hyperfrequences et procede de generation d'une onde hyperfrequence associe
FR3062951A1 (fr) Source d'ions positifs pour un spectrometre de masse de terrain
FR3052326A1 (fr) Generateur de plasma
FR2826542A1 (fr) Dispositif pour la production d'ions de charges positives variables et a resonnance cyclotronique
FR2999332A1 (fr) Generateur d'ondes hyperfrequences et procede de generation d'ondes associe
FR3019562A1 (fr) Enceinte de traitement d'un substrat au moyen d'un plasma

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20170725

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20200326

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1312620

Country of ref document: AT

Kind code of ref document: T

Effective date: 20200915

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602016043580

Country of ref document: DE

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201210

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201209

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201209

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1312620

Country of ref document: AT

Kind code of ref document: T

Effective date: 20200909

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20200909

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210111

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210109

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602016043580

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20210610

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20210731

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210731

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210731

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210719

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210719

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210731

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20160719

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20230724

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20230724

Year of fee payment: 8

Ref country code: DE

Payment date: 20230720

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200909