EP0527082A1 - Elektroncyclotionresonanz-Ionenquelle vom Wellenleiter-Typ zur Erzeugung mehrfachgeladenen Ionen - Google Patents

Elektroncyclotionresonanz-Ionenquelle vom Wellenleiter-Typ zur Erzeugung mehrfachgeladenen Ionen Download PDF

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Publication number
EP0527082A1
EP0527082A1 EP92402219A EP92402219A EP0527082A1 EP 0527082 A1 EP0527082 A1 EP 0527082A1 EP 92402219 A EP92402219 A EP 92402219A EP 92402219 A EP92402219 A EP 92402219A EP 0527082 A1 EP0527082 A1 EP 0527082A1
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EP
European Patent Office
Prior art keywords
enclosure
ion source
axis
source according
magnets
Prior art date
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Granted
Application number
EP92402219A
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English (en)
French (fr)
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EP0527082B1 (de
Inventor
Pascal Sortais
Patrick Leherissier
Jean-Yves Pacquet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
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Publication of EP0527082A1 publication Critical patent/EP0527082A1/de
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the present invention relates to an electron cyclotron resonance (ECR) ion source specially designed for the production of positive multi-charged ions. It finds many applications, depending on the different values of the kinetic energy of the extracted ions and their charges, in the field of ion implantation, microgravure and more particularly in the equipment of particle accelerators, also used both scientific and medical.
  • ECR electron cyclotron resonance
  • a source of multicharged ions is called a source whose current produced by the ions once charged is greater than that produced by ions at least twice charged.
  • the ions are obtained by ionization of a gaseous medium consisting of one or more gases or metallic vapors, contained in a sealed enclosure with axial symmetry, by means of a plasma of electrons strongly accelerated by electronic cyclotron resonance.
  • the residual pressure prevailing in the enclosure is of the order of 10 ⁇ 4 to 10 ⁇ 2 Pa.
  • Cyclotronic resonance is obtained thanks to the combined action of a high frequency electromagnetic field (UHF), injected into the enclosure, and of an axially symmetrical magnetic field having a structure called "minimum”
  • UHF high frequency electromagnetic field
  • An ion extraction system located on the side of the enclosure opposite to that of the high frequency injection, is provided.
  • the axial magnetic field is created either by coils or by permanent magnets surrounding the sealed enclosure.
  • the quantity of ions that can be produced results from the competition between two processes: on the one hand the formation of ions by electronic impact on neutral atoms constituting the gaseous medium to be ionized, and on the other hand, the losses of these same ions by recombination due to a collision of these ions with a neutral atom of the gaseous medium not yet ionized or else by diffusion to the walls of the enclosure.
  • the sources of multicharged ions known to date include a confinement enclosure of transverse dimension (measured perpendicular to the longitudinal axis of the enclosure) significantly larger than that of the conduit through which the electromagnetic power is injected (3 to 5 times greater in the ECR source of document EP-A-0 238 397). Under these conditions, the enclosure behaves like a multimode resonant cavity, favoring the uniform filling of the electromagnetic power in the volume useful for the ionization of the gaseous medium and thus allowing efficient heating of the plasma.
  • the frequency f of the electromagnetic wave intended for the creation of the plasma must be of the order of magnitude of the cut-off frequency associated with the electronic density n e of the plasma; this cutoff frequency is given by the equation n e .e2 / m. ⁇ o , where m and e have the previous meanings and ⁇ o represents the dielectric permittivity of the vacuum.
  • n e In the case of a plasma intended to create multicharged ions, the electron density n e must be as high as possible, hence the choice of the highest possible electromagnetic frequency f , compatible with current microwave technology: generally f is chosen from 10 to 14 GHz; the wavelength in the vacuum of these electromagnetic waves is of the order of 3 centimeters (rectangular guide of 10 ⁇ 22 mm for 8 to 12 GHz and of 7 ⁇ 14 mm for 12 to 18 GHz). This dimension defines the diameter or the section of the HF conduit which feeds the discharge.
  • plasma cord having a marked density in the vicinity of the axis with an almost cylindrical symmetry.
  • the characteristic dimension of this plasma is also of the order of a centimeter.
  • oversized confinement chambers implies either the use of coils to create the magnetic confinement field (axial field + radial field) and therefore the use of high electrical power taking into account the cooling system associated with these coils, ie the use of large quantities of permanent magnets making the source expensive and heavy.
  • the total size of the source varies as the cube of the diameter of the enclosure.
  • the subject of the invention is a new source of multicharged ions with electronic cyclotron resonance with sealed confinement enclosure of reduced dimensions, making it possible to remedy the various drawbacks mentioned above.
  • the introduction of the high frequency electromagnetic field can be ensured, either by a transition of the coaxial type, or by a direct injection, from a rectangular or circular waveguide in fundamental mode.
  • the enclosure has, according to its median plane, a section substantially equal to that of the waveguide ensuring the injection of the field electromagnetic in the enclosure.
  • the dimension of the plasma confinement enclosure is limited only by the smallest dimensions of the waveguide, rectangular or circular, associated with the electromagnetic frequency of the wave used.
  • the particular configuration of the magnets used in the invention allows, with small magnets, the production of high magnetic fields and therefore the production of multicharged ions. These magnets are notably highly coercive.
  • the means for creating the magnetic field with axial symmetry comprise first permanent magnets with axial symmetry, surrounding the enclosure, the magnetization of which is substantially perpendicular to the axis of the enclosure, these magnets being located at the first and second ends.
  • FIG. 1 there is shown schematically, in longitudinal section, a source of multicharged positive ions with electronic cyclotron resonance, according to the invention.
  • This ECR source comprises a non-resonant waveguide 2, constituting a containment vacuum enclosure, equipped with an axis of symmetry 4.
  • This enclosure may have a circular section or a square section.
  • the reference P indicates the median plane of the enclosure 2, perpendicular to the axis 4 and C indicates the middle of the enclosure (intersection of the plane P and the axis 4).
  • l the width or diameter of the guide 2; l is called, below, the characteristic dimension of the enclosure.
  • This enclosure also has an inlet end 6 and an outlet end 8, centered along the axis 4.
  • the waveguide 2 is excited by a high frequency electromagnetic field (HF or UHF) of frequency ⁇ 6GHz, injected at its end 6.
  • This high frequency field is produced by a source 10 such as a klystron, coupled to the confinement enclosure 2, via a transition cavity 12 comprising an opening 14, arranged in the extension of guide 2 and coaxially.
  • This opening 14 has a width (or diameter) substantially equal to that of the waveguide 2.
  • the transition cavity 12 has at its HF lateral inlet a sealed window 16 made of dielectric material.
  • the characteristic dimension l of the enclosure 2 is of the same order of magnitude as the wavelength.
  • l / ⁇ satisfies the equation 0.5 ⁇ l / ⁇ ⁇ 1.5 where ⁇ is the wavelength of the HF field used.
  • the injection of the high frequency into the enclosure 2 is carried out coaxially with the introduction of the gas or metallic vapor into the enclosure 2, intended to form the plasma.
  • the transition cavity 12 is crossed by a pipe 18 for supplying gas or vapor, centered on the axis 4 of the enclosure and opening downstream of the end 6 of the waveguide 2.
  • the guide 2 and the pipe 18 are metallic and define a coaxial line.
  • Plasma can consist of hydrogen, neon, xenon, argon, oxygen, tungsten, titanium, etc.
  • a vacuum pump not shown makes it possible to create in the enclosure 2 a vacuum of 10 ⁇ 4 to 102 Pa.
  • the vacuum pump is generally placed downstream of the outlet end 8 of the vacuum chamber 2.
  • the electromagnetic wave can be continuous or pulsed and have a frequency ranging from 6 to 30 GHz and typically equal to 10 GHz.
  • the confinement chamber 2 is brought to a positive potential with respect to ground, thanks to an electrical power source 18 and is surrounded by a magnetic structure 19, for example of symmetry of revolution when the enclosure 2 is cylindrical, intended to create the magnetic field in the guide enclosure 2.
  • a mechanical system 20 makes it possible to maintain this magnetic structure on the guide enclosure 2.
  • a shield 24 of cylindrical external shape and of frustoconical internal shape arranged coaxially with the waveguide 2 and in its extension; the internal diameter of this shield 24 widens from upstream to downstream of the source.
  • This shielding is made of soft iron core or permanent magnet.
  • the angle T formed by the internal wall of the shield 24 with a direction parallel to the axis 4 is approximately 20 °.
  • the shape of the shield 24 ensures the electrostatic isolation distance from the chamber 2 with the ion extraction electrode 28.
  • a cylindrical shell 26 made of material electrically insulating, serving as a support for an ion extraction electrode 28.
  • This electrode 28 has the shape of a cylinder and is arranged coxially to the waveguide 2. It is brought to the potential of the mass in order to accelerate the ions formed in the enclosure.
  • the magnetic structure 19 allows the creation, in the enclosure 2, of equimagnetic lines 30 closed.
  • the value of the induction B on these lines satisfies the resonance equation (1).
  • the induction B decreases from the center C to the periphery of the enclosure 2.
  • the magnetic structure 19 can consist solely of a system of highly coercive permanent magnets, juxtaposed surrounding the confinement enclosure 2. These magnets are made of FeNdB or SmCO5 (magnetic materials " hard ").
  • This magnetic structure as shown in Figures 1 and 3, has axial symmetry and constitutes an open magnetic circuit.
  • permanent magnets 32 and 34 with radial magnetization disposed respectively at the inlet and at the outlet of the chamber 2, make it possible to create therein the magnetic field of axial symmetry.
  • These magnets 32 and 34 are in the form of a cylindrical ring.
  • the input magnet 32 has its magnetization vector oriented so that its south pole is directed substantially towards the enclosure 2.
  • the output magnet 34 is such that its north pole is directed substantially towards the pregnant 2.
  • magnets 32 and 34 allow the creation of a magnetic field with axial symmetry having in the median plane P of the chamber 2 a minimum value in passing through maximum values at the magnets 32 and 34. These magnets 32 and 34 therefore define two magnetic mirrors.
  • Permanent magnets 36 and 38 surrounding the waveguide 2 are arranged so that their magnetization vector is oriented substantially from the inlet end 6 to the outlet end 8 of the enclosure. These magnets 36 and 38 have the shape of a ring and contribute with the magnets 32 and 34 to the creation of the magnetic field of axial symmetry in the enclosure 2. These magnets are used to magnetize the whole of the guide enclosure on a distance D1.
  • the annular opening 35 of length D2 separating the magnets 36 and 38 from the magnetic structure makes it possible to control the magnetic field of axial symmetry, in the median plane P of the enclosure 2.
  • the magnets with axial magnetization 36 and 38 are attached respectively to the magnets 32 and 34 and located between these magnets 32 and 34.
  • the internal radii R1 and R2 of the magnets 36 and 38 are greater than the internal radii R3 and R4 of the magnets 32 and 34.
  • Magnetized bars 40 and 42 are housed in the annular space defined between the guide enclosure 2 and the magnets 32, 34, 36 and 38. These magnets have a radial magnetization and define a multipole structure, for example quadrupole , hexapolar, octopolar or dodecapolar; the polarities of the magnets 40 and 42 are alternated. In particular, these bars are distant from R1 from axis 4.
  • These magnetic bars define in enclosure 2 the radial confinement field.
  • the maximum lengths L1 and L2 of the magnets 32 and 34 can be adapted to define a possible imbalance of the module of the magnetic field resulting between the input and the output 'of the source, unbalance to optimize the plasma leakage rate.
  • the field modulus at the entrance must therefore be stronger than at the exit.
  • L1 can be chosen greater than L2.
  • the same effect can also be achieved by optimizing the internal radii R1 and R2 of the annular magnets 32 and 34, by optimizing the external radii R3 and R4 of the magnets 32, 36 on the one hand and 34, 38 on the other hand as well as by optimization of the angles a1, b1, a2, b2 formed by the magnetization of the magnets 32, 36, 34 and 38 with the axis 4.
  • the distance R1 separating the axis 4 from the magnet 32 located at the entry end 6 is less than the distance R2 separating the axis from the magnet 34 located at the end 8 Release.
  • angles C1 and C2 that, with respect to a direction parallel to the axis 4, make the ends of the magnets 32 and 36 opposite on the one hand and the angles C3 and C4 that make, with respect to a direction parallel to axis 4, the ends of the magnets 34 and 38 opposite on the other hand, can be optimized so as to define an ideal magnetic circuit (continuity of the magnetic flux).
  • the magnets 34 and 32 of the invention make it possible to reduce the mass and the dimension of the magnets 38 and 36 significantly.
  • An ion source comprising a chamber 2 with an internal diameter l of 26mm and a length A of approximately 160mm has been produced. It was excited by a 10 GHz UHF field and a magnetic field whose induction B varied progressively from 0.3 T at the center C of the enclosure to 0.8 T at the side walls of enclosure 2.
  • FIGS. 4 to 6 With this source, multiple ion spectra given in FIGS. 4 to 6 were produced. These spectra give the intensity, expressed in microamperes, of the ion current I leaving the ion source as a function of the current in the analysis magnet, expressed in amperes; this current of analysis gives the ratio Q / A where Q is the charge of the ion and A its mass.
  • Figures 4 and 5 relate to argon and Figure 6 to tantalum.
  • This current is the image of the total current of multicharged ions contained in the spectrum. It can be seen that this has evolved in the ratio of the cross sections of the plasma chambers, ie in proportion to the volume of plasma which is contained therein.
  • the diameter of a source of the invention is, at the same electromagnetic frequency, about one third less than that of the prior art.
  • the source of the invention also allows, at equivalent extracted average load, an energy gain of the order of 40 KW to a few hundred Watts and moreover an implementation cost of 10 to 20 times lower than that of the sources. of the prior art.
EP19920402219 1991-08-05 1992-08-03 Elektroncyclotionresonanz-Ionenquelle vom Wellenleiter-Typ zur Erzeugung mehrfachgeladenen Ionen Expired - Lifetime EP0527082B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9109945 1991-08-05
FR9109945A FR2680275B1 (fr) 1991-08-05 1991-08-05 Source d'ions a resonance cyclotronique electronique de type guide d'ondes.

Publications (2)

Publication Number Publication Date
EP0527082A1 true EP0527082A1 (de) 1993-02-10
EP0527082B1 EP0527082B1 (de) 1996-05-08

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EP19920402219 Expired - Lifetime EP0527082B1 (de) 1991-08-05 1992-08-03 Elektroncyclotionresonanz-Ionenquelle vom Wellenleiter-Typ zur Erzeugung mehrfachgeladenen Ionen

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EP (1) EP0527082B1 (de)
DE (1) DE69210501T2 (de)
FR (1) FR2680275B1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2718568A1 (fr) * 1994-04-06 1995-10-13 France Telecom Procédé d'implantation haute énergie à partir d'un implanteur de type faible ou moyen courant et dispositifs correspondants.
EP2357658A2 (de) * 2008-11-20 2011-08-17 Korea Basic Science Institute Vorrichtung einer elektronencyclotronresonanz-ionenquelle und herstellungsverfahren dafür
FR2969372A1 (fr) * 2010-12-21 2012-06-22 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9224745D0 (en) * 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
FR2947378A1 (fr) 2009-06-29 2010-12-31 Quertech Ingenierie Systeme magnetique formant des surfaces iso modules fermees a partir de structures magnetiques de type "cusp" et sources d'ions de type rce mettant en oeuvre un tel systeme
FR3015109A1 (fr) * 2013-12-13 2015-06-19 Centre Nat Rech Scient Source d'ions a resonance cyclotronique electronique

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0238397A1 (de) * 1986-03-13 1987-09-23 Commissariat A L'energie Atomique Elektronenzyklotronresonanz-Ionenquelle mit koaxialer Injektion elektromagnetischer Wellen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0238397A1 (de) * 1986-03-13 1987-09-23 Commissariat A L'energie Atomique Elektronenzyklotronresonanz-Ionenquelle mit koaxialer Injektion elektromagnetischer Wellen

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. B vol. 37/38, no. 2, Février 1989, AMSTERDAM NL pages 87 - 89 K. AMEMYA ET AL 'NEW MICROWAVE ION SOURCE FOR HIGH ENERGY ION IMPLANTER' *
PROCEEDINGS OF THE 1987 IEEE PARTICLE ACCELERATOR CONFERENCE ; ACCELRATOR ENGENEERING AND TECHNOLOGY vol. 1, 19 Mars 1987, WASHINGTON , D.C. pages 254 - 258 C. M. LYNEIS 'STATUS OF ECR SOURCE TECHNOLOGY' *
REVIEW OF SCIENTIFIC INSTRUMENTS. vol. 61, no. 1, Janvier 1990, NEW YORK US pages 288 - 290 P. SORTAIS ET AL 'ECRIS DEVELOPMENT AT GANIL' *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2718568A1 (fr) * 1994-04-06 1995-10-13 France Telecom Procédé d'implantation haute énergie à partir d'un implanteur de type faible ou moyen courant et dispositifs correspondants.
WO1995027996A1 (fr) * 1994-04-06 1995-10-19 France Telecom Procede d'implantation haute energie a partir d'un implanteur de type faible ou moyen courant et dispositifs correspondants
US5625195A (en) * 1994-04-06 1997-04-29 France Telecom High-energy implantation process using an ion implanter of the low-or medium-current type and corresponding devices
EP2357658A2 (de) * 2008-11-20 2011-08-17 Korea Basic Science Institute Vorrichtung einer elektronencyclotronresonanz-ionenquelle und herstellungsverfahren dafür
EP2357658A4 (de) * 2008-11-20 2013-04-10 Korea Basic Science Inst Vorrichtung einer elektronencyclotronresonanz-ionenquelle und herstellungsverfahren dafür
FR2969372A1 (fr) * 2010-12-21 2012-06-22 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
WO2012084968A1 (fr) 2010-12-21 2012-06-28 Commissariat à l'Energie Atomique et aux Energies Alternatives Dispositif d'ionisation à la résonance cyclotron électronique

Also Published As

Publication number Publication date
EP0527082B1 (de) 1996-05-08
DE69210501D1 (de) 1996-06-13
FR2680275A1 (fr) 1993-02-12
DE69210501T2 (de) 1996-12-12
FR2680275B1 (fr) 1997-07-18

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