EP3036760A4 - Ultra high void volume polishing pad with closed pore structure - Google Patents
Ultra high void volume polishing pad with closed pore structure Download PDFInfo
- Publication number
- EP3036760A4 EP3036760A4 EP14837394.7A EP14837394A EP3036760A4 EP 3036760 A4 EP3036760 A4 EP 3036760A4 EP 14837394 A EP14837394 A EP 14837394A EP 3036760 A4 EP3036760 A4 EP 3036760A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- polishing pad
- ultra high
- pore structure
- void volume
- closed pore
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/973,639 US20150056895A1 (en) | 2013-08-22 | 2013-08-22 | Ultra high void volume polishing pad with closed pore structure |
PCT/US2014/052021 WO2015027026A1 (en) | 2013-08-22 | 2014-08-21 | Ultra high void volume polishing pad with closed pore structure |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3036760A1 EP3036760A1 (en) | 2016-06-29 |
EP3036760A4 true EP3036760A4 (en) | 2017-05-03 |
Family
ID=52480787
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP14837394.7A Withdrawn EP3036760A4 (en) | 2013-08-22 | 2014-08-21 | Ultra high void volume polishing pad with closed pore structure |
Country Status (8)
Country | Link |
---|---|
US (1) | US20150056895A1 (ja) |
EP (1) | EP3036760A4 (ja) |
JP (2) | JP6693875B2 (ja) |
KR (1) | KR20160045092A (ja) |
CN (2) | CN107520743A (ja) |
SG (2) | SG11201601177SA (ja) |
TW (1) | TWI600501B (ja) |
WO (1) | WO2015027026A1 (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201409248D0 (en) * | 2014-05-23 | 2014-07-09 | Zotefoams Plc | Method for producing three dimensional foam articles |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
CN107078048B (zh) | 2014-10-17 | 2021-08-13 | 应用材料公司 | 使用加成制造工艺的具复合材料特性的cmp衬垫建构 |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
TWI769988B (zh) * | 2015-10-07 | 2022-07-11 | 美商3M新設資產公司 | 拋光墊與系統及其製造與使用方法 |
TWI690388B (zh) * | 2015-10-30 | 2020-04-11 | 日商古河電氣工業股份有限公司 | 硏磨墊、使用硏磨墊的硏磨方法及該硏磨墊的使用方法 |
WO2017074773A1 (en) | 2015-10-30 | 2017-05-04 | Applied Materials, Inc. | An apparatus and method of forming a polishing article that has a desired zeta potential |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
CN117283450A (zh) | 2016-01-19 | 2023-12-26 | 应用材料公司 | 多孔化学机械抛光垫 |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
JP2019160996A (ja) * | 2018-03-13 | 2019-09-19 | 東芝メモリ株式会社 | 研磨パッド、半導体製造装置、および半導体装置の製造方法 |
SG11202010448TA (en) | 2018-05-07 | 2020-11-27 | Applied Materials Inc | Hydrophilic and zeta potential tunable chemical mechanical polishing pads |
JP7299970B2 (ja) | 2018-09-04 | 2023-06-28 | アプライド マテリアルズ インコーポレイテッド | 改良型研磨パッドのための配合物 |
US11851570B2 (en) | 2019-04-12 | 2023-12-26 | Applied Materials, Inc. | Anionic polishing pads formed by printing processes |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
US20210323116A1 (en) * | 2020-04-18 | 2021-10-21 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Offset pore poromeric polishing pad |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050277371A1 (en) * | 2002-10-28 | 2005-12-15 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5564965A (en) * | 1993-12-14 | 1996-10-15 | Shin-Etsu Handotai Co., Ltd. | Polishing member and wafer polishing apparatus |
US6126532A (en) * | 1997-04-18 | 2000-10-03 | Cabot Corporation | Polishing pads for a semiconductor substrate |
JP3956364B2 (ja) * | 2001-04-09 | 2007-08-08 | 東洋ゴム工業株式会社 | ポリウレタン組成物および研磨パッド |
US20050276967A1 (en) * | 2002-05-23 | 2005-12-15 | Cabot Microelectronics Corporation | Surface textured microporous polishing pads |
US6913517B2 (en) * | 2002-05-23 | 2005-07-05 | Cabot Microelectronics Corporation | Microporous polishing pads |
US7311862B2 (en) * | 2002-10-28 | 2007-12-25 | Cabot Microelectronics Corporation | Method for manufacturing microporous CMP materials having controlled pore size |
US7066801B2 (en) * | 2003-02-21 | 2006-06-27 | Dow Global Technologies, Inc. | Method of manufacturing a fixed abrasive material |
US6998166B2 (en) * | 2003-06-17 | 2006-02-14 | Cabot Microelectronics Corporation | Polishing pad with oriented pore structure |
US20040259479A1 (en) * | 2003-06-23 | 2004-12-23 | Cabot Microelectronics Corporation | Polishing pad for electrochemical-mechanical polishing |
US8075372B2 (en) * | 2004-09-01 | 2011-12-13 | Cabot Microelectronics Corporation | Polishing pad with microporous regions |
US7220167B2 (en) * | 2005-01-11 | 2007-05-22 | Hitachi Global Storage Technologies Netherlands B.V. | Gentle chemical mechanical polishing (CMP) liftoff process |
US20060277371A1 (en) * | 2005-06-01 | 2006-12-07 | Intel Corporation | System and method to instrument references to shared memory |
KR101276962B1 (ko) * | 2006-07-28 | 2013-06-19 | 도레이 카부시키가이샤 | 상호 침입 고분자 그물형 구조체의 제조 방법 및 이를 이용한 연마 패드의 제조 방법 |
SG177963A1 (en) * | 2007-01-15 | 2012-02-28 | Toyo Tire & Rubber Co | Polishing pad and method for producing the same |
JP5078527B2 (ja) * | 2007-09-28 | 2012-11-21 | 富士紡ホールディングス株式会社 | 研磨布 |
CN102046699B (zh) * | 2008-05-26 | 2012-09-05 | 巴斯夫欧洲公司 | 制备多孔材料的方法和通过该方法制备的多孔材料 |
US8383003B2 (en) * | 2008-06-20 | 2013-02-26 | Nexplanar Corporation | Polishing systems |
US20100015895A1 (en) * | 2008-07-15 | 2010-01-21 | Hendron Jeffrey J | Chemical mechanical polishing pad having electrospun polishing layer |
WO2010009420A1 (en) * | 2008-07-18 | 2010-01-21 | 3M Innovative Properties Company | Polishing pad with floating elements and method of making and using the same |
US8303375B2 (en) * | 2009-01-12 | 2012-11-06 | Novaplanar Technology, Inc. | Polishing pads for chemical mechanical planarization and/or other polishing methods |
JP5184448B2 (ja) * | 2009-06-23 | 2013-04-17 | 富士紡ホールディングス株式会社 | 研磨パッド、その製造方法および研磨加工方法 |
US8162728B2 (en) * | 2009-09-28 | 2012-04-24 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Dual-pore structure polishing pad |
WO2012077592A1 (ja) * | 2010-12-07 | 2012-06-14 | Jsr株式会社 | 化学機械研磨パッドおよびそれを用いた化学機械研磨方法 |
US9211628B2 (en) * | 2011-01-26 | 2015-12-15 | Nexplanar Corporation | Polishing pad with concentric or approximately concentric polygon groove pattern |
JP5687118B2 (ja) * | 2011-04-15 | 2015-03-18 | 富士紡ホールディングス株式会社 | 研磨パッド及びその製造方法 |
CA2867350C (en) * | 2012-03-16 | 2017-05-23 | Saint-Gobain Abrasives, Inc. | Abrasive products and methods for finishing surfaces |
-
2013
- 2013-08-22 US US13/973,639 patent/US20150056895A1/en not_active Abandoned
-
2014
- 2014-08-21 CN CN201710887971.6A patent/CN107520743A/zh active Pending
- 2014-08-21 SG SG11201601177SA patent/SG11201601177SA/en unknown
- 2014-08-21 KR KR1020167007013A patent/KR20160045092A/ko not_active Application Discontinuation
- 2014-08-21 EP EP14837394.7A patent/EP3036760A4/en not_active Withdrawn
- 2014-08-21 SG SG10201801419XA patent/SG10201801419XA/en unknown
- 2014-08-21 JP JP2016536441A patent/JP6693875B2/ja not_active Expired - Fee Related
- 2014-08-21 WO PCT/US2014/052021 patent/WO2015027026A1/en active Application Filing
- 2014-08-21 CN CN201480046528.0A patent/CN105474366A/zh active Pending
- 2014-08-22 TW TW103129117A patent/TWI600501B/zh active
-
2019
- 2019-05-08 JP JP2019088323A patent/JP2019171567A/ja not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050277371A1 (en) * | 2002-10-28 | 2005-12-15 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
Also Published As
Publication number | Publication date |
---|---|
SG11201601177SA (en) | 2016-03-30 |
EP3036760A1 (en) | 2016-06-29 |
KR20160045092A (ko) | 2016-04-26 |
CN105474366A (zh) | 2016-04-06 |
TW201519999A (zh) | 2015-06-01 |
CN107520743A (zh) | 2017-12-29 |
TWI600501B (zh) | 2017-10-01 |
US20150056895A1 (en) | 2015-02-26 |
JP6693875B2 (ja) | 2020-05-13 |
SG10201801419XA (en) | 2018-03-28 |
JP2019171567A (ja) | 2019-10-10 |
JP2016528054A (ja) | 2016-09-15 |
WO2015027026A1 (en) | 2015-02-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3036760A4 (en) | Ultra high void volume polishing pad with closed pore structure | |
IL244111A0 (en) | The survival benefit of patients with resistant tumors with high levels of c-creative protein | |
SG11201600242PA (en) | Low density polishing pad | |
HK1222905A1 (zh) | 與腎功能相關的生物標記及其使用方法 | |
ZA201504446B (en) | 81-facet diamond with 10-heart-and-10-arrow structure inside | |
EP2989813A4 (en) | COMMUNICATION SERVICE IN COMMUNICATION MODES | |
EP2967479A4 (en) | BIOPSY GUIDED BY TOMOSYNTHESIS IN A LAYERED POSITION | |
GB201317217D0 (en) | Volume reducing classifier | |
LT2983866T (lt) | Abrazyvinis įrankis | |
EP2997270A4 (en) | Improvements in karabiners | |
EP3066474A4 (en) | Bladder Carcinoma Biomarkers | |
EP3013519A4 (en) | Combination sharpener assembly | |
SG11201605109SA (en) | Ultra pure rubber | |
EP3019451A4 (en) | Highly porous aerogels | |
EP3020495A4 (en) | Gear-use polishing body | |
HUE036683T2 (hu) | Mûgyantakötéses csiszolókorong | |
EP3084647A4 (en) | Reconciling volumelets in volume cohorts | |
GB2512356B (en) | Methods and apparatuses enabling selection between cellular and non-cellular radio connections | |
EP3027444B8 (en) | Mobile accommodation | |
GB201300079D0 (en) | Improvements in cone springs | |
AU352937S (en) | Mobile camping kitchen | |
AU2013904325A0 (en) | I Phone / I Pad Cancer Cell Detector | |
AU2013901718A0 (en) | Improvements in karabiners | |
AU2013903564A0 (en) | Mobile sauna | |
AU2013903781A0 (en) | Support for use in mine |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20160316 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20170405 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B24B 37/24 20120101ALI20170330BHEP Ipc: H01L 21/304 20060101AFI20170330BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
17Q | First examination report despatched |
Effective date: 20200417 |
|
18W | Application withdrawn |
Effective date: 20200505 |