EP3007900A4 - Systèmes et procédés d'enceinte à gaz à faible taux de particules - Google Patents

Systèmes et procédés d'enceinte à gaz à faible taux de particules Download PDF

Info

Publication number
EP3007900A4
EP3007900A4 EP14810543.0A EP14810543A EP3007900A4 EP 3007900 A4 EP3007900 A4 EP 3007900A4 EP 14810543 A EP14810543 A EP 14810543A EP 3007900 A4 EP3007900 A4 EP 3007900A4
Authority
EP
European Patent Office
Prior art keywords
methods
low
gas enclosure
particle gas
enclosure systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14810543.0A
Other languages
German (de)
English (en)
Other versions
EP3007900A1 (fr
Inventor
Justin Mauck
Alexander Sou-Kang Ko
Eliyahu Vronsky
Shandon Alderson
Alexey Stepanov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kateeva Inc
Original Assignee
Kateeva Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/205,340 external-priority patent/US9604245B2/en
Application filed by Kateeva Inc filed Critical Kateeva Inc
Publication of EP3007900A1 publication Critical patent/EP3007900A1/fr
Publication of EP3007900A4 publication Critical patent/EP3007900A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/12—Guards, shields or dust excluders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/17—Ink jet characterised by ink handling
    • B41J2/175—Ink supply systems ; Circuit parts therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/17—Ink jet characterised by ink handling
    • B41J2/175—Ink supply systems ; Circuit parts therefor
    • B41J2/17503—Ink cartridges
    • B41J2/17506—Refilling of the cartridge
    • B41J2/17509—Whilst mounted in the printer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/02—Framework
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/12—Guards, shields or dust excluders
    • B41J29/13—Cases or covers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/377—Cooling or ventilating arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/811—Controlling the atmosphere during processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ink Jet (AREA)
EP14810543.0A 2013-06-10 2014-05-12 Systèmes et procédés d'enceinte à gaz à faible taux de particules Withdrawn EP3007900A4 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201361833398P 2013-06-10 2013-06-10
US201361911934P 2013-12-04 2013-12-04
US201461925578P 2014-01-09 2014-01-09
US14/205,340 US9604245B2 (en) 2008-06-13 2014-03-11 Gas enclosure systems and methods utilizing an auxiliary enclosure
US201461983417P 2014-04-23 2014-04-23
PCT/US2014/037722 WO2014200642A1 (fr) 2013-06-10 2014-05-12 Systèmes et procédés d'enceinte à gaz à faible taux de particules

Publications (2)

Publication Number Publication Date
EP3007900A1 EP3007900A1 (fr) 2016-04-20
EP3007900A4 true EP3007900A4 (fr) 2017-05-10

Family

ID=52022653

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14810543.0A Withdrawn EP3007900A4 (fr) 2013-06-10 2014-05-12 Systèmes et procédés d'enceinte à gaz à faible taux de particules

Country Status (5)

Country Link
EP (1) EP3007900A4 (fr)
JP (5) JP6378327B2 (fr)
KR (6) KR20210156864A (fr)
CN (3) CN110816072B (fr)
WO (1) WO2014200642A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102327982B1 (ko) 2014-06-17 2021-11-17 카티바, 인크. 인쇄 시스템 조립체 및 방법
GB201510464D0 (en) * 2015-06-15 2015-07-29 Videojet Technologies Inc Printer
KR101857056B1 (ko) * 2016-10-31 2018-05-11 세메스 주식회사 집적회로 소자 제조용 이송 장치
CN107908245B (zh) * 2017-11-15 2020-08-21 常州信息职业技术学院 一种方便移动的电脑机箱
CN109445038B (zh) * 2018-10-30 2023-10-03 广东硕泰智能装备有限公司 一种光纤头组装生产线
KR102067697B1 (ko) * 2019-06-18 2020-01-17 (주)고려기연 대형 oled 엔클로져 박스
CN114127973A (zh) * 2019-07-10 2022-03-01 科迪华公司 沉积机的基底定位
CN111167667A (zh) * 2020-02-28 2020-05-19 张家港市欧微自动化研发有限公司 一种基于涂布机的涂布方法
CN111572182A (zh) * 2020-05-20 2020-08-25 安徽阜南县向发工艺品有限公司 一种木质地板加工用表面印花装置及其工作方法
US11780242B2 (en) 2020-10-27 2023-10-10 Kateeva, Inc. Substrate positioning for deposition machine
CN114453284A (zh) * 2020-11-10 2022-05-10 西安奕斯伟硅片技术有限公司 硅片分选机

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040086631A1 (en) * 2002-10-25 2004-05-06 Yu-Kai Han Ink jet printing device and method
US20100201749A1 (en) * 2008-06-13 2010-08-12 Kateeva, Inc. Method And Apparatus for Load-Locked Printing
US20130004656A1 (en) * 2011-07-01 2013-01-03 Kateeva, Inc. Apparatus and method to separate carrier liquid vapor from ink
US20130040061A1 (en) * 2011-08-09 2013-02-14 Kateeva, Inc. Face-down printing apparatus and method
EP2973676A2 (fr) * 2013-03-13 2016-01-20 Kateeva, Inc. Systèmes d'enceinte de gaz et procédés utilisant une enceinte auxiliaire

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4226897A (en) * 1977-12-05 1980-10-07 Plasma Physics Corporation Method of forming semiconducting materials and barriers
JPS57135184A (en) * 1981-02-17 1982-08-20 Nippon Telegr & Teleph Corp <Ntt> Printer
JP3162313B2 (ja) * 1997-01-20 2001-04-25 工業技術院長 薄膜製造方法および薄膜製造装置
JP3460500B2 (ja) * 1997-03-14 2003-10-27 株式会社荏原製作所 気体の清浄装置とそれを用いた密閉空間の清浄方法及び密閉空間
JP2002093878A (ja) * 2000-09-12 2002-03-29 Hitachi Kokusai Electric Inc 半導体製造装置
JP2002359180A (ja) * 2001-06-01 2002-12-13 Toshiba Corp ガス循環システム
FR2827682B1 (fr) * 2001-07-20 2004-04-02 Gemplus Card Int Regulation de pression par transfert d'un volume de gaz calibre
JP3868280B2 (ja) * 2001-12-04 2007-01-17 株式会社美和製作所 有機電界発光素子の製造装置
JP4066661B2 (ja) * 2002-01-23 2008-03-26 セイコーエプソン株式会社 有機ｅｌ装置の製造装置および液滴吐出装置
JP3925257B2 (ja) * 2002-03-15 2007-06-06 セイコーエプソン株式会社 気密チャンバにおける接続ラインの貫通構造およびこれを備えた吐出装置、並びに液晶表示装置の製造方法、有機ｅｌ装置の製造方法、電子放出装置の製造方法、ｐｄｐ装置の製造方法、電気泳動表示装置の製造方法、カラーフィルタの製造方法、有機ｅｌの製造方法、スペーサ形成方法、金属配線形成方法、レンズ形成方法、レジスト形成方法および光拡散体形成方法
JP3979135B2 (ja) * 2002-03-20 2007-09-19 セイコーエプソン株式会社 チャンバ装置、これを備えた電気光学装置および有機ｅｌ装置
JP4225076B2 (ja) 2003-02-19 2009-02-18 セイコーエプソン株式会社 液滴吐出装置
JP2004361493A (ja) * 2003-06-02 2004-12-24 Seiko Epson Corp カラーフィルタ基板の製造方法及びその製造装置、エレクトロルミネッセンス基板の製造方法及びその製造装置、電気光学装置の製造方法、並びに電子機器の製造方法
TWI225008B (en) * 2003-12-31 2004-12-11 Ritdisplay Corp Ink-jet printing apparatus
JP2005254038A (ja) * 2004-03-09 2005-09-22 Neomax Co Ltd リニアモータ駆動ステージ及びそれを用いた機能性薄膜用製造装置、並びにｚ軸リニアモータ
JP4805555B2 (ja) * 2004-07-12 2011-11-02 株式会社東芝 塗布装置及び塗布方法
US7556334B2 (en) * 2004-11-04 2009-07-07 Applied Materials, Inc. Methods and apparatus for aligning print heads
US7908885B2 (en) * 2004-11-08 2011-03-22 New Way Machine Components, Inc. Non-contact porous air bearing and glass flattening device
JP2009112889A (ja) * 2007-11-02 2009-05-28 Nakan Corp 液状原料塗工装置、液状原料塗工方法、およびそれを用いた基体
JP2010134315A (ja) * 2008-12-08 2010-06-17 Seiko Epson Corp 液状体吐出装置
US20120056923A1 (en) * 2009-01-05 2012-03-08 Kateeva, Inc. Control systems and methods for thermal-jet printing
US20100188457A1 (en) * 2009-01-05 2010-07-29 Madigan Connor F Method and apparatus for controlling the temperature of an electrically-heated discharge nozzle
CN201446232U (zh) * 2009-07-10 2010-05-05 西北工业大学 一种封闭循环净化惰性气氛控制装置
US8453329B2 (en) * 2009-10-22 2013-06-04 Zamtec Ltd Method of fabricating inkjet printhead having low-loss contact for thermal actuators
JP5062339B2 (ja) * 2010-05-12 2012-10-31 パナソニック株式会社 インクジェット装置
US8414688B1 (en) * 2011-06-15 2013-04-09 Kla-Tencor Corporation Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shipping
US9120344B2 (en) * 2011-08-09 2015-09-01 Kateeva, Inc. Apparatus and method for control of print gap
JP5529220B2 (ja) * 2012-08-16 2014-06-25 東京エレクトロン株式会社 デバイス製造方法
CN202903692U (zh) 2012-09-06 2013-04-24 北京京东方光电科技有限公司 一种阵列基板检测设备

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040086631A1 (en) * 2002-10-25 2004-05-06 Yu-Kai Han Ink jet printing device and method
US20100201749A1 (en) * 2008-06-13 2010-08-12 Kateeva, Inc. Method And Apparatus for Load-Locked Printing
US20130004656A1 (en) * 2011-07-01 2013-01-03 Kateeva, Inc. Apparatus and method to separate carrier liquid vapor from ink
US20130040061A1 (en) * 2011-08-09 2013-02-14 Kateeva, Inc. Face-down printing apparatus and method
EP2973676A2 (fr) * 2013-03-13 2016-01-20 Kateeva, Inc. Systèmes d'enceinte de gaz et procédés utilisant une enceinte auxiliaire

Also Published As

Publication number Publication date
WO2014200642A1 (fr) 2014-12-18
CN108162606A (zh) 2018-06-15
JP6871203B2 (ja) 2021-05-12
KR20190014589A (ko) 2019-02-12
CN108162606B (zh) 2020-03-31
JP2020123574A (ja) 2020-08-13
KR20200111834A (ko) 2020-09-29
CN110816072A (zh) 2020-02-21
JP2016529649A (ja) 2016-09-23
KR20160019485A (ko) 2016-02-19
CN110816072B (zh) 2021-09-03
JP6986770B2 (ja) 2021-12-22
JP2018206777A (ja) 2018-12-27
KR20230065385A (ko) 2023-05-11
KR102161419B1 (ko) 2020-09-29
KR20210156864A (ko) 2021-12-27
CN105431294B (zh) 2018-04-24
KR102342098B1 (ko) 2021-12-21
JP2023138525A (ja) 2023-10-02
EP3007900A1 (fr) 2016-04-20
CN105431294A (zh) 2016-03-23
JP2022058335A (ja) 2022-04-12
KR101946694B1 (ko) 2019-02-11
JP7351543B2 (ja) 2023-09-27
KR20200053634A (ko) 2020-05-18
JP6378327B2 (ja) 2018-08-22

Similar Documents

Publication Publication Date Title
EP3025635A4 (fr) Manipulateur et système de manipulateur
EP3081042A4 (fr) Systèmes et procédés pour une opération à connectivité multiple
EP3081035A4 (fr) Systèmes et procédés pour un fonctionnement à connectivités multiples
EP2973676A4 (fr) Systèmes d&#39;enceinte de gaz et procédés utilisant une enceinte auxiliaire
EP3050370A4 (fr) Systèmes et procédés pour un fonctionnement multiconnecté
EP3033005A4 (fr) Systèmes et procédés d&#39;évaluation de revascularisation
EP3080970A4 (fr) Systèmes et procédés de poussée de message
EP3071991A4 (fr) Système et aide à la géolocalisation
EP2983600A4 (fr) Procédés et systèmes médicaux
EP3007900A4 (fr) Systèmes et procédés d&#39;enceinte à gaz à faible taux de particules
EP2993996A4 (fr) Systemes et procedes de fabrication de jus
EP3029406A4 (fr) Procédé de refroidissement d&#39;hydrogène gazeux et système de refroidissement d&#39;hydrogène gazeux
EP2974350A4 (fr) Systèmes et procédés pour exécuter un système d&#39;entrée/sortie de couche transport
EP3078199A4 (fr) Systèmes et procédés à temps non déterministe
EP3003024A4 (fr) Systèmes cryogéniques
EP3068338A4 (fr) Dispositifs de greffe, systèmes et procédés associés
EP3025631A4 (fr) Manipulateur et système de manipulateur
EP2926363A4 (fr) Ensemble enceinte à gaz et système associé
EP3013218A4 (fr) Systèmes et procédés de support de décision de site d&#39;insertion
EP3051976A4 (fr) Systèmes et procédés de conditionnement
EP3064609A4 (fr) Dispositif de dépôt et procédé de dépôt
EP2971222A4 (fr) Appareil et procédés de dépôt
EP3025634A4 (fr) Manipulateur et système de manipulateur
EP3033454A4 (fr) Systèmes et procédés permettant de supporter des bornes d&#39;interdiction
EP3031027A4 (fr) Systèmes et procédés pour annonces publicitaires

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20160111

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

RIN1 Information on inventor provided before grant (corrected)

Inventor name: VRONSKY, ELIYAHU

Inventor name: STEPANOV, ALEXEY

Inventor name: MAUCK, JUSTIN

Inventor name: ALDERSON, SHANDON

Inventor name: KO, ALEXANDER SOU-KANG

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20170412

RIC1 Information provided on ipc code assigned before grant

Ipc: B05D 3/06 20060101ALI20170406BHEP

Ipc: H01L 51/00 20060101ALI20170406BHEP

Ipc: B41J 29/12 20060101ALI20170406BHEP

Ipc: B41J 29/13 20060101ALI20170406BHEP

Ipc: B41J 29/377 20060101ALI20170406BHEP

Ipc: B41J 2/01 20060101AFI20170406BHEP

Ipc: F24F 3/16 20060101ALI20170406BHEP

Ipc: H01L 51/56 20060101ALI20170406BHEP

17Q First examination report despatched

Effective date: 20190520

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20190729