EP3002638A2 - Method for manufacturing a thermocompensated hairspring - Google Patents
Method for manufacturing a thermocompensated hairspring Download PDFInfo
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- EP3002638A2 EP3002638A2 EP15183042.9A EP15183042A EP3002638A2 EP 3002638 A2 EP3002638 A2 EP 3002638A2 EP 15183042 A EP15183042 A EP 15183042A EP 3002638 A2 EP3002638 A2 EP 3002638A2
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Images
Classifications
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- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
Definitions
- the present invention relates to a method for manufacturing a thermocompensated mechanical oscillator of a watch movement, a MEMS sensor or another precision instrument, such as in particular a thermocompensated spiral spring which is intended to equip a resonator mechanical balance-balance.
- the present invention also relates to an oscillator obtained by the method.
- An oscillator or mechanical balance-spring resonator of a mechanical watch is conventionally composed of a flywheel, called a balance wheel and a spiral spring, called a spiral or spiral spring, fixed at one end to the axis of the balance wheel and by the other end on a bridge, called rooster, in which pivots the axis of the pendulum.
- the spiral spring equipping to date, the movements of mechanical watches is an elastic metal blade of rectangular section wound on itself spiral Archimedes and comprising from 12 to 15 turns.
- the sprung balance oscillates around its equilibrium position (or dead point). When the pendulum leaves this position, it arms the hairspring. This creates a return torque which, when the balance is released, returns it to its equilibrium position. As he has acquired a certain speed, therefore a kinetic energy, he exceeds his dead point until the opposite pair of the hairspring stops him and forces him to turn in the other direction. Thus, the spiral regulates the period of oscillation of the balance.
- the accuracy of mechanical watches depends on the stability of the natural frequency of the oscillator formed by the sprung balance.
- the thermal expansions of the spiral and the balance, as well as the variation of the Young's modulus of the spiral modify the natural frequency of this oscillating assembly, disturbing the accuracy of the watch.
- the thermal compensation of the mechanical oscillator is obtained by adjusting the spiral CTE according to the coefficients of thermal expansion of the spiral and the balance.
- a spiral spring is made of monocrystalline silicon coated with silicon dioxide so as to obtain good stability of the spiral shape with temperature variations.
- the thermal stability of the constant of the return torque of this spring is also not mentioned in this document.
- the silicon CTE is strongly influenced by the temperature and a compensation of this effect is necessary for its use in horological applications. Indeed, the silicon CTE is of the order of -60 x 10 -6 / ° C and the thermal drift of a spiral spring silicon is thus about 155 seconds / day, for a temperature variation of 23 ° C +/- 15 ° C. This makes it incompatible with watchmaking requirements which are of the order of 8 seconds / day.
- the document EP1422436 discloses a spiral spring cut into a ⁇ 001 ⁇ monocrystalline silicon plate.
- the hairspring comprises a layer of SiO 2 , having a CTE opposite to that of silicon and formed around the outer surface of the hairspring, in order to minimize the thermal drift of the balance-hairspring assembly.
- thermocompensated resonator comprising a body formed by ceramic wherein at least a part of the body comprises at least one coating whose variations of Young's modulus as a function of temperature (CTE) are of opposite sign (CTE) of the material used for the core to allow said resonator to have a frequency variation as a function of the temperature at least to the first order substantially zero.
- the ceramics may comprise both first and second order positive and negative thermoelastic coefficients, and the coating or coatings used may incidentally comprise both negative and positive thermoelastic coefficients in the first order and in the second order.
- Germanium oxide (GeO 2 ) or tantalum oxide (Ta 2 O 5 ) and / or zirconium or hafnium oxides can be used as coatings.
- the coatings also form a moisture barrier, and a tie layer may be deposited between the core and the coating.
- thermocompensated resonator comprising a body formed from a cutting plate in a quartz crystal and having a coating, for example germanium or tantalum oxide, deposited at least partially against the soul.
- the present invention relates to a method for manufacturing a mechanical oscillator such as a spiral spring intended to equip a mechanical balance spring-balance resonator of a watch movement or other precision instrument.
- the spiral spring comprises a core made of a material chosen from metals and their alloys, metalloids of which silicon (amorphous, monocrystalline or polycrystalline), ceramics, carbon is its various allotropic forms, or composite materials having a first coefficient thermoelastic of a first sign.
- the spring also comprises a peripheral coating of an oxide, preferably SiO 2 , having a second thermoelastic coefficient of a second sign opposite to the first sign of the first thermoelastic coefficient, the process comprising depositing the coating at a temperature of less than 500 °. C, and a thermal annealing treatment of the coating at a temperature of at least 550 ° C.
- the annealing heat treatment of the coating may be preceded by a gradual increase in temperature.
- the method may comprise depositing an Al 2 O 3 bonding layer between the core and the coating.
- the bonding layer can be deposited with a thickness of about 5 nm.
- the method may include deposition of an outer layer of Al 2 O 3 on the coating.
- the outer layer may be deposited with a thickness of about 300 nm.
- the outer layer can then control the frequency of the oscillator and / or protect the assembly formed by the core and the coating against moisture.
- the present invention relates to a spiral spring obtained by the method as well as a mechanical spring balance resonator comprising such a spiral spring.
- the present invention also relates to other types of mechanical oscillators such as tuning forks and MEMS sensors.
- the proposed solution makes it possible to manufacture a spiral spring whose core consists of a material whose control of the thermoelastic behavior, in particular the abnormal evolution of the value of the Young's modulus, is not or can not be obtained for various reasons by the growth of a thermal oxide on its surface, but instead involves the deposition of an oxide on the surface of the core by a deposition process. This is the case, for example, where an SiO 2 coating is formed on a non-silicon core.
- the solution of the present invention is also applicable, for example, to an oscillator comprising a silicon core and an SiO 2 coating where the coating is formed by a deposition process itself and not by the growth of a thermal oxide. .
- an oscillator coated by such a method may be advantageous where it is desired to better control the size and frequency of the oscillator, because with a growth of a thermal oxide on the surface of a silicon core a portion of the core becomes oxidized during the oxidation step.
- This solution is applicable to a set of materials compatible with heat treatment processes used to stabilize the compensation, and is intended inter alia for functions exploiting the stability of mechanical properties, and in particular elastic, such as oscillators and resonators.
- the figure 1 shows a top view of a spiral spring 1 and the Figures 2a and 2b show a longitudinal and transverse sectional view of the spiral spring 1 according to the invention.
- the spiral spring 1 comprises a core 2 formed of a material having a first thermoelastic coefficient ⁇ 1 of a first sign (typically negative or normal).
- the spiral spring 1 also comprises a peripheral coating 4 of an oxide, preferably of silicon dioxide (SiO 2 ), deposited and at least partially covering the outer surface of the core 2.
- An attachment layer 3 can also be deposited between the core 2 and the coating 4.
- the core has a helical shape and comprises at least one turn of rectangular section of thickness w and height h.
- the geometry of the soul may be other than that illustrated in this example, for example, the soul may have a straight or circular section.
- the core 2 may be made of monocrystalline silicon, with an orientation such as ⁇ 001 ⁇ , ⁇ 111 ⁇ or the like, or it may be made of a polycrystalline or amorphous material (polycrystalline silicon, amorphous silicon, quartz glass, silica glass).
- the core material may also be a metallic material whose melting point remains compatible with the heat treatment step (described below) of the present invention.
- the material of the core may comprise a ceramic material, in particular a silicon nitride, a silicon carbide, or a silicon oxynitride.
- the core material may further comprise a composite material or a polymer or carbon material.
- the core 2 may be a composite of carbon fibers, the list of materials mentioned here being absolutely not exhaustive.
- the core is made of a material whose coefficient Thermoelastic is normal and the melting point is compatible with the heat treatments applied as indicated below.
- the coating 4 is deposited using a low temperature deposition process, that is to say, at a temperature substantially lower than that used for post-treatment, especially below 500 ° C.
- the deposition of the coating 1 is performed at a temperature below 300 ° C, even more preferred at a temperature below 200 ° C and alternatively at a temperature of about 100 ° C.
- the deposition temperature may vary, and in particular it may go down during this deposition step.
- the coating 4 may be deposited using a thin film deposition process which may include, but is not limited to, methods such as physical vapor deposition (PVD) or a chemical vapor deposition (CVD). Other thin layer deposition methods are also conceivable for the deposition of the coating 4 provided that the deposition temperature remains at or below 500 ° C.
- the coating 4 can be deposited using a plasma enhanced chemical vapor deposition (PECVD), high density plasma (HDPCVD), molecular vapor deposition (MVD) method.
- PECVD plasma enhanced chemical vapor deposition
- HDPCVD high density plasma
- MWD molecular vapor deposition
- ALD Atomic Layer Deposition
- deposits obtained using sol-gels sol-gels.
- Table A testing Process step 0 1 2 3 4 5 Step 1 - ALD Al 2 O 3 ALD Al 2 O 3 ALD Al 2 O 3 ALD Al 2 O 3 ALD Al 2 O 3 2nd step - - PECVD SiO 2 PECVD SiO 2 PECVD SiO 2 PECVD SiO 2 step 3 - - - annealing 800 ° C annealing 1050 ° C ALD Al 2 O 3 step 4 - - - ALD Al 2 O 3 ALD Al 2 O 3 annealing 800 ° C variation in temp.
- the SiO 2 coating obtained from such a low temperature deposition process is in principle structurally or chemically different from an SiO 2 coating obtained by thermal oxidation of silicon at substantially higher temperatures, for example the order of 1000 ° C.
- the coating 4 of SiO 2 can also include a small percentage of hydrogen or other impurities. Under these conditions, the thermoelastic coefficient of SiO 2 is not necessarily (or not sufficiently) abnormal to obtain the desired thermocompensation.
- the method of manufacturing the spiral spring 1 comprises a heat treatment annealing coating 4, to make the thermoelastic coefficient sufficiently compensatory (or enough abnormal in the context of SiO 2 ) and stabilize it.
- the annealing heat treatment can be carried out with an annealing temperature of at least 550 ° C, and preferably a temperature of between about 800 ° C and 1050 ° C.
- the annealing temperature is either about 800 ° C or about 1050 ° C.
- the annealing time is between 2 to 6 hours, and in one embodiment it is around four hours.
- this annealing operation can take place in continuity with the deposition operation of the coating 4 or indifferently spaced apart by a time interval of several days.
- the annealing heat treatment of the coating 4 can make it possible to modify the coating 4 so that the second thermoelastic coefficient ⁇ 2 of the coating 4 has a second sign opposite to the first sign of the first thermoelastic coefficient ⁇ 1 of the core 2 in order to adjust the second thermoelastic coefficient ⁇ 2 so that it compensates the effect of the variation of the first thermoelastic coefficient ⁇ 1 of the core with temperature.
- the annealing heat treatment can be carried out under an inert atmosphere, for example under a nitrogen atmosphere.
- the annealing temperature can be reached by a gradual rise in temperature of the order of 10 ° C / min from a charging temperature, for example 200 ° C. After annealing, the temperature can be decreased to a speed of the order of 3 ° C / min, up to an unloading temperature, for example of about 200 ° C.
- the annealing heat treatment makes it possible to modify the structure, in particular to densify the coating and to reduce the internal stresses of the coating 4.
- the annealing heat treatment of the coating 4 deposited by the low temperature deposition process can therefore modify the thermoelastic behavior of the coating. coating 4 and make it possible to obtain compensation for the effect of the variation of the CTE of the core with the temperature.
- the desired compensation effect is preferably obtained when the annealing temperature is between about 800 ° C and 1050 ° C. This effect is not as important when moving away from these annealing temperatures and is generally not obtained below a temperature of 550 ° C.
- the annealing heat treatment also makes it possible to stabilize the properties of the SiO 2 coating 4 obtained by the low temperature deposition process.
- the oxide coating 4 may be deposited in the presence of a flux, including in particular one of Na 2 O, K 2 O, Li 2 O, CaO, MgO, Al 2 O 3 , B 2 O 3 or a combination of these streams, so as to reduce the melting temperature of SiO 2 , which modifies the post-treatment temperature accordingly.
- a flux including in particular one of Na 2 O, K 2 O, Li 2 O, CaO, MgO, Al 2 O 3 , B 2 O 3 or a combination of these streams, so as to reduce the melting temperature of SiO 2 , which modifies the post-treatment temperature accordingly.
- fluxes such as Al 2 O 3 or B 2 O 3 can increase the value of the Young's modulus.
- Using the feed CaO can likewise increase the tensile strength of the coating 4 and act as a stabilizer against the absorption of water by SiO 2 .
- the thickness of the coating 4 can be adjusted to obtain a desired value of the thermoelastic coefficient of the spiral spring. Indeed, the thermoelastic coefficient of the spiral spring depends on the combination of the first thermoelastic coefficient ⁇ 1 of the core material 2 and the second thermoelastic coefficient ⁇ 2 of the coating 4. In practice, the thickness of the coating 4 is between 0.1 ⁇ m and 10 ⁇ m, and preferably between 1 ⁇ m and 5 ⁇ m. In one embodiment, the coating 4 is deposited with a thickness of about 2 microns.
- the core 2 of the spiral spring 1 is a flexible structure subjected to mechanical stresses, a separation of the coating 4 deposited on the core 2 is possible.
- the uncoupling can be caused, for example, following a delamination. Such uncoupling is all the more possible as the mechanical properties, such as the coefficient of thermal expansion, the Young's modulus, of the material making up the core 2 of that of the coating 4 differ.
- the internal stresses in the deposited coating 4 can be high.
- the method of manufacturing the spiral spring 1 comprising the deposition of a fastening layer 3 between the core 2 and the coating 4.
- the attachment layer 3 consists of a aluminum oxide (Al 2 O 3 ).
- the attachment layer 3 can be deposited using an ALD deposition process.
- the ALD deposition process has a very good microscopic distribution power.
- the ALD deposition has the advantage of being able to deposit the aluminum oxide in accordance with the surface of the core 2, including in the pores present on the surface of the core 2.
- the quality of the anchoring of the attachment layer 3 is all the better.
- the deposition of the attachment layer 3 of Al 2 O 3 makes it possible to form strong bonds between the aluminum oxide and the functional groups active elements available on the surface of the core 2, in particular of the different forms of carboxyls and hydroxyls present on the surface of the core 2 (which depends on the material constituting the core).
- the attachment layer 3 is deposited with a thickness of about 5 nm.
- a small thickness of the attachment layer 3 has the advantage of not significantly modifying the mechanical properties of the core 2, and in particular the frequency of the spiral balance oscillator.
- a small thickness of the attachment layer 3 also makes it possible to make the spiral spring production process 1 economically more interesting.
- the coating 4, especially when it comprises SiO 2 may have hydrophilic properties, even if the annealing heat treatment decreases the hydrophilic character of the coating 4.
- the method of manufacturing the spiral spring 1 comprises deposition of an outer layer 5 of an aluminum oxide (Al 2 O 3 ) at least partially covering the outer surface of the coating 4.
- the outer layer 5 is preferably deposited with a thickness of about 300 nm.
- the deposition step of the outer layer 5 makes the entire core 2 and coating 4 less sensitive to the effects of moisture.
- the mechanical properties of the SiO 2 coating 4 may be adversely affected in the presence of moisture.
- the heat treatment stage must preferably be carried out before the deposition of the outer layer.
- a heat treatment at the end of deposition of the layer 5 does not produce the desired effects.
- Table A shows the variation values of the CTE with the temperature and the relative humidity, for a spiral spring comprising the attachment layer 3 of Al 2 O 3 deposited by ALD, the coating 4 of SiO 2 deposited by PECVD and the outer layer 5 of Al 2 O 3 filed by ALD. (columns 3 to 5).
- the variation of the CTE with temperature and relative humidity is minimal.
- a significant increase in the variation of the CTE is observed when the annealing is performed after the deposition step of the outer layer 5.
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Abstract
Procédé de fabrication d'un oscillateur mécanique (1) destiné à équiper un résonateur mécanique d'un mouvement d'horlogerie, un senseur MEMS ou un autre instrument de précision; l'oscillateur (1) comprenant une âme (2) fabriquée dans un matériau ayant un premier coefficient thermoélastique (β1) et un revêtement périphérique (4) en un oxyde présentant un second coefficient thermoélastique (β2); le procédé comprenant la déposition du revêtement (4) à une température qui reste inférieure ou égale à 500°C, et un traitement thermique de recuit du revêtement (4) à une température d'au moins 550°C, afin d'ajuster le second coefficient thermoélastique (β2) du revêtement (4) pour que ce dernier compense l'effet de la variation du premier coefficient thermoélastique (β1) de l'âme avec la température. A method of manufacturing a mechanical oscillator (1) for equipping a mechanical resonator with a watch movement, a MEMS sensor or other precision instrument; the oscillator (1) comprising a core (2) made of a material having a first thermoelastic coefficient (β1) and a peripheral coating (4) of an oxide having a second thermoelastic coefficient (β 2 ); the method comprising depositing the coating (4) at a temperature which remains at or below 500 ° C, and heat treating annealing the coating (4) at a temperature of at least 550 ° C, to adjust the second thermoelastic coefficient (β 2 ) of the coating (4) so that the latter compensates for the effect of the variation of the first thermoelastic coefficient (β 1 ) of the core with the temperature.
Description
La présente invention concerne un procédé de fabrication d'un oscillateur mécanique thermocompensé d'un mouvement d'horlogerie, d'un senseur MEMS ou d'un autre instrument de précision, tel que notamment un ressort spiral thermocompensé qui est destiné à équiper un résonateur mécanique balancier-spiral. La présente invention concerne également un oscillateur obtenu par le procédé.The present invention relates to a method for manufacturing a thermocompensated mechanical oscillator of a watch movement, a MEMS sensor or another precision instrument, such as in particular a thermocompensated spiral spring which is intended to equip a resonator mechanical balance-balance. The present invention also relates to an oscillator obtained by the method.
Un oscillateur ou résonateur mécanique balancier-spiral d'une montre mécanique est conventionnellement composé d'un volant d'inertie, appelé balancier et d'un ressort en spirale, appelé spiral ou ressort spiral, fixé par une extrémité sur l'axe du balancier et par l'autre extrémité sur un pont, appelé coq, dans lequel pivote l'axe du balancier. Plus précisément, le ressort spiral équipant, à ce jour, les mouvements de montres mécaniques est une lame métallique élastique de section rectangulaire enroulée sur elle-même en spirale d'Archimède et comportant de 12 à 15 tours.An oscillator or mechanical balance-spring resonator of a mechanical watch is conventionally composed of a flywheel, called a balance wheel and a spiral spring, called a spiral or spiral spring, fixed at one end to the axis of the balance wheel and by the other end on a bridge, called rooster, in which pivots the axis of the pendulum. More specifically, the spiral spring equipping, to date, the movements of mechanical watches is an elastic metal blade of rectangular section wound on itself spiral Archimedes and comprising from 12 to 15 turns.
Le balancier-spiral oscille autour de sa position d'équilibre (ou point mort). Lorsque le balancier quitte cette position, il arme le spiral. Cela crée un couple de rappel qui, lorsque le balancier est libéré, le fait revenir à sa position d'équilibre. Comme il a acquis une certaine vitesse, donc une énergie cinétique, il dépasse son point mort jusqu'à ce que le couple contraire du spiral l'arrête et l'oblige à tourner dans l'autre sens. Ainsi, le spiral régule la période d'oscillation du balancier.The sprung balance oscillates around its equilibrium position (or dead point). When the pendulum leaves this position, it arms the hairspring. This creates a return torque which, when the balance is released, returns it to its equilibrium position. As he has acquired a certain speed, therefore a kinetic energy, he exceeds his dead point until the opposite pair of the hairspring stops him and forces him to turn in the other direction. Thus, the spiral regulates the period of oscillation of the balance.
La précision des montres mécaniques dépend de la stabilité de la fréquence propre de l'oscillateur formé du balancier-spiral. Lorsque la température varie, les dilatations thermiques du spiral et du balancier, ainsi que la variation du module de Young du spiral, modifient la fréquence propre de cet ensemble oscillant, perturbant la précision de la montre.The accuracy of mechanical watches depends on the stability of the natural frequency of the oscillator formed by the sprung balance. When the temperature varies, the thermal expansions of the spiral and the balance, as well as the variation of the Young's modulus of the spiral, modify the natural frequency of this oscillating assembly, disturbing the accuracy of the watch.
La plupart des méthodes proposées pour compenser ces variations de fréquence sont basées sur la considération que cette fréquence propre dépend exclusivement du rapport entre la constante du couple de rappel exercé par le spiral sur le balancier et le moment d'inertie de ce dernier, comme indiqué dans la relation suivante:
où F est la fréquence propre de l'oscillateur, C est la constante du couple de rappel exercé par le spiral de l'oscillateur, et I est le moment d'inertie du balancier de l'oscillateur.Most of the methods proposed to compensate for these frequency variations are based on the consideration that this natural frequency depends exclusively on the ratio between the constant of the return torque exerted by the balance spring on the balance and the moment of inertia of the latter, as indicated. in the following relation:
where F is the natural frequency of the oscillator, C is the constant of the return torque exerted by the spiral of the oscillator, and I is the moment of inertia of the pendulum of the oscillator.
Par exemple, depuis la découverte des alliages à base de Fe-Ni possédant un coefficient thermique du module de Young (ci-après CTE) positif, la compensation thermique de l'oscillateur mécanique est obtenue en ajustant le CTE du spiral en fonction des coefficients de dilatation thermique du spiral et du balancier. En effet, en exprimant le couple et l'inertie à partir des caractéristiques du spiral et du balancier, puis en dérivant l'équation (1) par rapport à la température, on obtient la variation thermique de la fréquence propre :
où l'expression "1/E dE/dT" correspond au coefficient thermique du module de Young du spiral (CTE), cs est le coefficient de dilatation thermique du spiral, et cb est le coefficient de dilatation thermique du balancier.For example, since the discovery of Fe-Ni-based alloys having a positive Young's modulus (hereinafter CTE) thermal coefficient, the thermal compensation of the mechanical oscillator is obtained by adjusting the spiral CTE according to the coefficients of thermal expansion of the spiral and the balance. Indeed, by expressing the torque and the inertia from the characteristics of the balance spring and the balance, then by deriving the equation (1) with respect to the temperature, one obtains the thermal variation of the natural frequency:
where the expression "1 / E dE / dT" corresponds to the thermal coefficient of the Young's modulus of the spiral (CTE), c s is the coefficient of thermal expansion of the spiral, and c b is the coefficient of thermal expansion of the balance.
En ajustant le terme d'autocompensation A = ½ (CTE + 3cs) à la valeur du coefficient de dilatation thermique du balancier cb, il est possible d'annuler l'équation (2). Ainsi, la variation thermique de la fréquence propre de l'oscillateur mécanique peut être éliminée.By adjusting the autocompensation term A = ½ (CTE + 3c s ) to the value of the coefficient of thermal expansion of the pendulum c b , it is possible to cancel equation (2). Thus, the thermal variation of the natural frequency of the mechanical oscillator can be eliminated.
Actuellement, on utilise des alliages complexes, tant par le nombre des composants que par les procédés métallurgiques utilisés dans le but d'obtenir une autocompensation des variations du module d'élasticité du métal en combinant deux influences contraires: celle de la température et celle de la magnétoconstriction (contraction des corps magnétiques sous l'effet de l'aimantation).At present, complex alloys are used, both in the number of components and in the metallurgical processes used to obtain self-compensation for variations in the modulus of elasticity of the metal by combining two opposite influences: that of temperature and that of magnetoconstriction (contraction of magnetic bodies under the effect of magnetization).
Cependant, les spiraux composés de ces alliages sont difficiles à fabriquer. Tout d'abord, en raison de la complexité des procédés utilisés pour réaliser les alliages, les propriétés mécaniques intrinsèques du métal ne sont pas constantes d'une production à l'autre. Ensuite, le réglage de l'organe régulateur, qui est la technique permettant de faire en sorte que la montre indique en tout temps l'heure la plus juste, est fastidieux et long. Cette opération nécessite de nombreuses interventions manuelles et beaucoup de pièces défectueuses doivent être éliminées. Pour ces raisons, la production est coûteuse et le maintien d'une qualité constante est un défi permanent.However, the spirals made of these alloys are difficult to manufacture. First of all, because of the complexity of the processes used to make the alloys, the intrinsic mechanical properties of the metal are not constant from one production to another. Then, the setting of the regulating organ, which is the technique to ensure that the watch indicates at all times the most accurate time, is tedious and long. This operation requires many manual interventions and many defective parts must be eliminated. For these reasons, production is expensive and maintaining consistent quality is an ongoing challenge.
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Le CTE du silicium est fortement influencé par la température et une compensation de cet effet est nécessaire pour son utilisation dans des applications horlogères. En effet, le CTE du silicium est de l'ordre de -60 x 10-6/°C et la dérive thermique d'un ressort spiral en silicium est ainsi d'environ 155 secondes/jour, pour une variation de température de 23°C +/-15°C. Cela le rend incompatible avec les exigences horlogères qui sont de l'ordre de 8 secondes/jour.The silicon CTE is strongly influenced by the temperature and a compensation of this effect is necessary for its use in horological applications. Indeed, the silicon CTE is of the order of -60 x 10 -6 / ° C and the thermal drift of a spiral spring silicon is thus about 155 seconds / day, for a temperature variation of 23 ° C +/- 15 ° C. This makes it incompatible with watchmaking requirements which are of the order of 8 seconds / day.
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La présente invention concerne un procédé de fabrication d'un oscillateur mécanique tel qu'un ressort spiral destiné à équiper un résonateur mécanique balancier-spiral d'un mouvement d'horlogerie ou autre instrument de précision. Le ressort spiral comprend une âme fabriquée dans un matériau choisi parmi les métaux et leurs alliages, les métalloïdes dont le silicium (amorphe, monocristallin ou polycristallin), les céramiques, le carbone est ses différentes formes allotropiques, ou les matériaux composites ayant un premier coefficient thermoélastique d'un premier signe. Le ressort comprend également un revêtement périphérique en un oxyde, de préférence le SiO2, présentant un second coefficient thermoélastique d'un second signe opposé au premier signe du premier coefficient thermoélastique, le procédé comprenant la déposition du revêtement à une température inférieure à 500°C, et un traitement thermique de recuit du revêtement à une température d'au moins 550°C.The present invention relates to a method for manufacturing a mechanical oscillator such as a spiral spring intended to equip a mechanical balance spring-balance resonator of a watch movement or other precision instrument. The spiral spring comprises a core made of a material chosen from metals and their alloys, metalloids of which silicon (amorphous, monocrystalline or polycrystalline), ceramics, carbon is its various allotropic forms, or composite materials having a first coefficient thermoelastic of a first sign. The spring also comprises a peripheral coating of an oxide, preferably SiO 2 , having a second thermoelastic coefficient of a second sign opposite to the first sign of the first thermoelastic coefficient, the process comprising depositing the coating at a temperature of less than 500 °. C, and a thermal annealing treatment of the coating at a temperature of at least 550 ° C.
Dans un mode de réalisation, le traitement thermique de recuit du revêtement peut être précédé d'un accroissement progressif de la température.In one embodiment, the annealing heat treatment of the coating may be preceded by a gradual increase in temperature.
Dans un autre mode de réalisation, le procédé peut comprendre la déposition d'une couche d'accrochage de Al2O3 entre l'âme et le revêtement. La couche d'accrochage peut être déposée avec une épaisseur d'environ 5 nm.In another embodiment, the method may comprise depositing an Al 2 O 3 bonding layer between the core and the coating. The bonding layer can be deposited with a thickness of about 5 nm.
Encore dans un autre mode de réalisation, le procédé peut comprendre la déposition d'une couche externe de Al2O3 sur le revêtement. La couche externe peut être déposée avec une épaisseur d'environ 300 nm. La couche externe peut alors contrôler la fréquence de l'oscillateur et/ou protéger l'ensemble formé par l'âme et le revêtement contre l'humidité.In yet another embodiment, the method may include deposition of an outer layer of Al 2 O 3 on the coating. The outer layer may be deposited with a thickness of about 300 nm. The outer layer can then control the frequency of the oscillator and / or protect the assembly formed by the core and the coating against moisture.
La présente invention concerne un ressort spiral obtenu par le procédé ainsi qu'un résonateur mécanique balancier-spiral comprenant un tel ressort spiral. La présente invention concerne également d'autres types d'oscillateurs mécaniques tels que des diapasons et senseurs MEMS.The present invention relates to a spiral spring obtained by the method as well as a mechanical spring balance resonator comprising such a spiral spring. The present invention also relates to other types of mechanical oscillators such as tuning forks and MEMS sensors.
La solution proposée permet de fabriquer un ressort spiral dont l'âme est constituée d'un matériau dont la maitrise du comportement thermoélastique, en particulier l'évolution anormale de la valeur du module de Young, n'est pas ou ne peut être obtenue pour diverses raisons par la croissance d'un oxyde thermique à sa surface, mais à la place implique la déposition d'un oxyde sur la surface de l'âme par un procédé de déposition. Ceci est le cas, par exemple, où un revêtement SiO2 est formé sur une âme ne comportant pas le silicium. Cependant la solution de la présente invention est également applicable, par exemple, à un oscillateur comprenant une âme en silicium et un revêtement en SiO2 où le revêtement est formé par un procédé de déposition proprement dit et pas par la croissance d'un oxyde thermique. L'obtention d'un oscillateur revêtu par un tel procédé peut être avantageux où il est désiré de mieux contrôler les dimensions et la fréquence de l'oscillateur, car avec une croissance d'un oxyde thermique à la surface d'une âme en silicium une portion de l'âme devient oxydée durant l'étape d'oxydation. Cette solution est applicable à un ensemble de matériaux compatibles avec les procédés traitement thermiques utilisés pour stabiliser la compensation, et est destinées entre-autres à des fonctions exploitant la stabilité des propriétés mécaniques, et en particulier élastiques, comme les oscillateurs et résonateurs.The proposed solution makes it possible to manufacture a spiral spring whose core consists of a material whose control of the thermoelastic behavior, in particular the abnormal evolution of the value of the Young's modulus, is not or can not be obtained for various reasons by the growth of a thermal oxide on its surface, but instead involves the deposition of an oxide on the surface of the core by a deposition process. This is the case, for example, where an SiO 2 coating is formed on a non-silicon core. However, the solution of the present invention is also applicable, for example, to an oscillator comprising a silicon core and an SiO 2 coating where the coating is formed by a deposition process itself and not by the growth of a thermal oxide. . Obtaining an oscillator coated by such a method may be advantageous where it is desired to better control the size and frequency of the oscillator, because with a growth of a thermal oxide on the surface of a silicon core a portion of the core becomes oxidized during the oxidation step. This solution is applicable to a set of materials compatible with heat treatment processes used to stabilize the compensation, and is intended inter alia for functions exploiting the stability of mechanical properties, and in particular elastic, such as oscillators and resonators.
Des exemples de mise en oeuvre de l'invention sont indiqués dans la description illustrée par les figures annexées dans lesquelles :
- la
figure 1 montre une vue du dessus d'un ressort spiral selon l'invention; et - les
figures 2a et 2b montrent une vue en coupe transversale droite (figure 2a ) et longitudinale (figure 2b ) du ressort spiral comprenant une âme et un revêtement, selon un mode de réalisation.
- the
figure 1 shows a top view of a spiral spring according to the invention; and - the
Figures 2a and 2b show a right cross-sectional view (figure 2a ) and longitudinal (figure 2b ) of the spiral spring comprising a core and a coating, according to one embodiment.
La
L'âme 2 peut être fabriquée dans le silicium monocristallin, avec une orientation telle que {001}, {111} ou autre, ou encore elle peut être fabriquée dans un matériau polycristallin ou amorphe (silicium polycristallin ; silicium amorphe, verre de quartz, verre de silice). Le matériau de l'âme peut également être un matériau métallique dont le point de fusion reste compatible avec l'étape de traitement thermique (décrite ci-dessous) de la présente invention. Par ailleurs, le matériau de l'âme peut comprendre un matériau céramique, notamment un nitrure de silicium, un carbure de silicium, ou un oxynitrure de silicium. Le matériau de l'âme peut en outre comprendre un matériau composite ou un matériau de polymère ou carbone. Par exemple, l'âme 2 peut être un composite de fibres de carbone, la liste des matériaux mentionnes ici n'étant absolument pas exhaustive. De préférence, l'âme est en un matériau dont le coefficient thermoélastique est normal et le point de fusion est compatible avec les traitements thermiques appliqués comme indiqués ci-dessous.The
Dans un mode de réalisation, un procédé de fabrication du ressort spiral 1 comprend les étapes de:
- fournir
l'âme 2 dans le matériau ayant le premier coefficient thermoélastique β1; et - déposer le revêtement oxyde 4 d'un second coefficient thermoélastique β2 au moins partiellement sur la surface extérieure de l'âme 2.
- supplying the
core 2 in the material having the first thermoelastic coefficient β 1 ; and - depositing the
oxide coating 4 with a second thermoelastic coefficient β 2 at least partially on the outer surface of thecore 2.
Dans un mode de réalisation, le revêtement 4 est déposé à l'aide d'un procédé de déposition à basse température, c'est-à-dire, à une température sensiblement inférieure à celle utilisée pour le post traitement, notamment en dessous de 500°C. De façon préférée, la déposition du revêtement 1 est réalisée à une température inférieure à 300°C, encore plus privilégiée à une température inférieure à 200°C et selon une variante à une température d'environ 100°C. La température de déposition peut varier, et notamment elle peut descendre, lors de cette étape de déposition.In one embodiment, the
En particulier, le revêtement 4 peut être déposé à l'aide d'un procédé de déposition de couches minces pouvant comprendre, de façon non exhaustive, des procédés tels que la déposition physique en phase vapeur (PVD) ou encore d'un procédé de déposition chimique en phase vapeur (CVD). D'autres procédés de déposition de couches minces sont également envisageables pour la déposition du revêtement 4 pourvu que la température de dépôt reste égale ou inférieure à 500°C. Par exemple, le revêtement 4 peut être déposé à l'aide d'un procédé de dépôt chimique en phase vapeur assisté par plasma (PECVD), plasma de haute densité (HDPCVD), dépôt moléculaire en phase vapeur (molecular vapour deposition, MVD), déposition de couches atomiques (Atomic Layer Deposition, ou ALD), ou encore des dépôts obtenus à l'aide de sol-gels.In particular, the
Nos résultats expérimentaux, tel qu'indiqué dans le Tableau A ci-dessous, démontrent cependant que le revêtement 4 déposé par un procédé de déposition physique ou chimique à basse température, tel que décrit ci-dessus, ne permet pas nécessairement d'obtenir, tel quel, une compensation suffisante de l'effet de la variation du CTE de l'âme avec la température. Dans le Tableau A, la variation du CTE pour une âme en carbone amorphe sur une base journalière en fonction de la température est comparée pour un ressort spiral ne comportant pas le revêtement (colonne 0), un ressort spiral comprenant une couche d'accrochage 3 de Al2O3 déposé par ALD (colonne 1) et avec le revêtement 4 de SiO2 déposé par PECVD (colonne 2). Dans tous les cas, la variation du CTE avec la température reste importante. La variation du CTE sur une base journalière en fonction de l'humidité relative (RH%) est également montré dans la Tableau A.
En effet, le revêtement de SiO2 obtenu d'un tel procédé de déposition à basse température est en principe structurellement ou chimiquement différent d'un revêtement de SiO2 obtenu par oxydation thermique du silicium à des températures substantiellement plus élevées, par exemple, de l'ordre de 1000°C. Le revêtement 4 de SiO2 peut également comprendre un faible pourcentage d'hydrogène ou d'autres impuretés. Dans ces conditions, le coefficient thermoélastique du SiO2 n'est pas nécessairement (ou n'est pas suffisamment) anormal pour obtenir la thermocompensation désirée.Indeed, the SiO 2 coating obtained from such a low temperature deposition process is in principle structurally or chemically different from an SiO 2 coating obtained by thermal oxidation of silicon at substantially higher temperatures, for example the order of 1000 ° C. The
Selon la présente invention, le procédé de fabrication du ressort spiral 1 comprend un traitement thermique de recuit du revêtement 4, permettant de rendre le coefficient thermoélastique suffisamment compensatoire (voire suffisamment anormal dans le cadre de SiO2) et de le stabiliser. En particulier, le traitement thermique de recuit peut être réalisé avec une température de recuit d'au moins 550°C, et de préférence une température comprise entre environ 800°C et 1050°C. Selon un mode d'exécution, la température de recuit est soit d'environ 800°C soit d'environ 1050°C. De préférence, le temps de recuit est entre 2 à 6 heures, et dans une forme d'exécution il est aux environs de quatre heures. Par ailleurs, cette opération de recuit peut se dérouler en continuité à l'opération de déposition du revêtement 4 ou indifféremment espacée d'un intervalle de temps de plusieurs jours.According to the present invention, the method of manufacturing the
Selon les matériaux utilisés pour l'âme 2 et le revêtement 4, le traitement thermique de recuit du revêtement 4 peut permettre de modifier le revêtement 4 de sorte à ce que le second coefficient thermoélastique β2 du revêtement 4 ait un second signe opposé au premier signe du premier coefficient thermoélastique β1 de l'âme 2 afin d'ajuster le second coefficient thermoélastique β2 pour que ce dernier compense l'effet de la variation du premier coefficient thermoélastique β1 de l'âme avec la température.According to the materials used for the
Le traitement thermique de recuit peut être réalisé sous atmosphère inerte, par exemple sous atmosphère d'azote. La température de recuit peut être atteinte par une montée progressive en température de l'ordre de 10°C/min à partir d'une température de chargement, par exemple de 200°C. Après le recuit, la température peut être diminuée à une vitesse de l'ordre de 3°C/min, jusqu'à une température de déchargement, par exemple d'environ 200°C.The annealing heat treatment can be carried out under an inert atmosphere, for example under a nitrogen atmosphere. The annealing temperature can be reached by a gradual rise in temperature of the order of 10 ° C / min from a charging temperature, for example 200 ° C. After annealing, the temperature can be decreased to a speed of the order of 3 ° C / min, up to an unloading temperature, for example of about 200 ° C.
Le traitement thermique de recuit permet de modifier la structure, notamment de densifier le revêtement et de réduire les contraintes internes du revêtement 4. Le traitement thermique de recuit du revêtement 4 déposé par le procédé de déposition à basse température peut donc modifier le comportement thermoélastique du revêtement 4 et permettre d'obtenir une compensation de l'effet de la variation du CTE de l'âme avec la température. En particulier, selon les expérimentations des inventeurs, l'effet de compensation recherché est préférablement obtenu lorsque la température de recuit est comprise entre environ 800°C et 1050°C. Cet effet n'est pas aussi important lorsque l'on s'éloigne de ces températures de recuit et il n'est généralement pas obtenu en dessous d'une température de 550°C. Le traitement thermique de recuit permet également de stabiliser les propriétés du revêtement 4 de SiO2 obtenu par le procédé de déposition à basse température.The annealing heat treatment makes it possible to modify the structure, in particular to densify the coating and to reduce the internal stresses of the
L'effet du traitement thermique de recuit sur le revêtement 4 d'oxyde peut s'expliquer par la modification de la valeur du coefficient de dilation thermique du revêtement [
Dans une variante, le revêtement 4 d'oxyde peut être déposé en présence d'un flux, incluant notamment l'un de Na2O, K2O, Li2O, CaO, MgO, Al2O3, B2O3 ou une combinaison de ces flux, de manière à réduire la température de fusion du SiO2 ce qui modifie d'autant la température de post traitement. On notera que l'utilisation de flux tels que l'Al2O3 ou le B2O3 peut augmenter la valeur du module de Young. L'utilisation du flux CaO peut de même augmenter la résistance à la traction du revêtement 4 et agir comme un stabilisateur contre l'absorption de l'eau par le SiO2.Alternatively, the
L'épaisseur du revêtement 4 peut être ajustée de manière à obtenir une valeur souhaitée du coefficient thermoélastique du ressort spiral. En effet, le coefficient thermoélastique du ressort spiral dépend de la combinaison du premier coefficient thermoélastique β1 du matériau de l'âme 2 et du second coefficient thermoélastique β2 du revêtement 4. En pratique, l'épaisseur du revêtement 4 est comprise entre 0.1 µm et 10 µm, et préférablement entre 1 µm et 5 µm. Dans un mode de réalisation, le revêtement 4 est déposé avec une épaisseur d'environ 2 µm.The thickness of the
Comme l'âme 2 du ressort spiral 1 est une structure flexible soumise à des sollicitations mécaniques, une désolidarisation du revêtement 4 déposé sur l'âme 2 est possible. La désolidarisation peut être causée, par exemple, suite à une délamination. Une telle désolidarisation est d'autant plus possible que les propriétés mécaniques, telles que le coefficient de dilatation thermique, le module de Young, du matériau composant l'âme 2 de celui du revêtement 4 diffèrent. De plus, les contraintes internes dans le revêtement 4 déposé peuvent être élevées.As the
Dans un mode de réalisation, le procédé de fabrication du ressort spiral 1 comprenant la déposition d'une couche d'accrochage 3 entre l'âme 2 et le revêtement 4. De façon préférée, la couche d'accrochage 3 est constituée d'un oxyde d'aluminium (Al2O3). La couche d'accrochage 3 peut être déposée à l'aide d'un procédé de déposition ALD. Le procédé de déposition ALD a un très bon pouvoir de répartition microscopique. Autrement dit, la déposition ALD a l'avantage de pouvoir déposer l'oxyde d'aluminium de façon conforme à la surface de l'âme 2, y compris dans les pores présents sur la surface de l'âme 2. La qualité de l'ancrage de la couche d'accrochage 3 est d'autant meilleure.In one embodiment, the method of manufacturing the
Le dépôt de la couche d'accrochage 3 en Al2O3 permet de former des liaisons fortes entre l'oxyde d'aluminium et les groupes fonctionnels actifs disponibles à la surface de l'âme 2, notamment des différentes formes de carboxyles et hydroxyles présentes à la surface de l'âme 2 (ce qui dépend du matériau constituant l'âme).The deposition of the
De façon préférée, la couche d'accrochage 3 est déposée avec une épaisseur d'environ 5 nm. Une faible épaisseur de la couche d'accrochage 3 a l'avantage de ne pas modifier significativement les propriétés mécaniques de l'âme 2, et en particulier la fréquence de l'oscillateur balancier spiral. Une faible épaisseur de la couche d'accrochage 3 permet en outre de rendre le procédé de fabrication du ressort spiral 1 économiquement plus intéressant.Preferably, the
Le revêtement 4, surtout lorsqu'il comprend le SiO2, peut avoir des propriétés hydrophiles, même si le traitement thermique de recuit diminue le caractère hydrophile du revêtement 4. Encore dans un mode de réalisation, le procédé de fabrication du ressort spiral 1 comprend la déposition d'une couche externe 5 d'un oxyde d'aluminium (Al2O3) couvrant au moins partiellement la surface extérieure du revêtement 4. La couche externe 5 est préférablement déposée avec une épaisseur d'environ 300 nm. L'étape de déposition de la couche externe 5 permet de rendre l'ensemble âme 2 et revêtement 4 moins sensible aux effets de l'humidité. En particulier, les propriétés mécaniques du revêtement 4 en SiO2 peuvent être défavorablement affectées en présence d'humidité. La demanderesse a découvert au cours d'expérimentations élaborées que pour maintenir à la fois les effets de compensation thermoélastique et de protection contre les effets de l'humidité, l'étape de traitement thermique doit préférablement être conduite avant la déposition de la couche externe 5. Un traitement thermique en fin de déposition de la couche 5 ne produit pas les effets recherchés.The
A titre illustratif, le Tableau A reporte des valeurs de variation du CTE avec la température et l'humidité relative, pour un ressort spiral comprenant la couche d'accrochage 3 de Al2O3 déposé par ALD le revêtement 4 de SiO2 déposé par PECVD et la couche externe 5 de Al2O3 déposé par ALD. (colonnes 3 à 5). Dans le cas où un recuit à 200°C et à 1050°C est effectué après le dépôt du revêtement, la variation du CTE avec la température et l'humidité relative est minimale. Une augmentation notable de la variation du CTE est cependant observée lorsque le recuit est effectué après l'étape de déposition de la couche externe 5.By way of illustration, Table A shows the variation values of the CTE with the temperature and the relative humidity, for a spiral spring comprising the
- 11
- ressort spiralspiral spring
- 22
- âmesoul
- 33
- couche d'accrochagetie layer
- 44
- revêtement périphériqueperipheral coating
- 55
- couche externeouter layer
- β1 β 1
- premier coefficient thermoélastiquefirst thermoelastic coefficient
- β2 β 2
- second coefficient thermoélastiquesecond thermoelastic coefficient
- hh
- hauteurheight
- ww
- épaisseurthickness
Claims (16)
caractérise en ce que le procédé comprend :
characterized in that the method comprises:
dans lequel le revêtement (4) est déposé à l'aide d'un procédé de déposition de couches minces.Process according to claim 1,
wherein the coating (4) is deposited using a thin film deposition process.
dans lequel ledit procédé de déposition de couches minces comprend un dépôt physique en phase vapeur (PVD) ou un dépôt chimique en phase vapeur (CVD) ou leurs procédés dérivés tels que dépôt chimique en phase vapeur assisté par plasma (PECVD) ou assisté par plasma de haute densité (HDPCVD), des dépôts de type moléculaire (MVD) ou atomiques (ALD), ou des dépôts obtenus à l'aide de sol-gels.Process according to claim 2,
wherein said thin film deposition process comprises a physical vapor deposition (PVD) or a chemical vapor deposition (CVD) or derivative processes such as plasma enhanced chemical vapor deposition (PECVD) or plasma assisted deposition high density (HDPCVD), molecular-type (MVD) or atomic (ALD) deposits, or deposits obtained using sol-gels.
dans lequel la déposition du revêtement (4) est réalisée à une température qui reste inférieure ou égale à 300°C, ou qui reste inférieure ou égale à 200°C ou à une température d'environ 100°C.Method according to one of claims 1 to 3,
wherein the deposition of the coating (4) is carried out at a temperature which remains less than or equal to 300 ° C, or which remains less than or equal to 200 ° C or a temperature of about 100 ° C.
dans lequel le traitement thermique de recuit du revêtement (4) a lieu à une température d'au moins environ 600°C, préférablement supérieur à 800°C.Method according to one of claims 1 to 4,
wherein the annealing heat treatment of the coating (4) takes place at a temperature of at least about 600 ° C, preferably greater than 800 ° C.
dans lequel le traitement thermique de recuit du revêtement (4) a lieu à une température inférieure à environ 1050°C.Method according to one of claims 1 to 5,
wherein the annealing heat treatment of the coating (4) takes place at a temperature below about 1050 ° C.
dans lequel le traitement thermique de recuit du revêtement (4) est appliqué pendant pour une durée de 2 à 6 heures.Method according to one of claims 1 to 6,
wherein the annealing heat treatment of the coating (4) is applied for a period of 2 to 6 hours.
dans lequel le revêtement (4) est déposé avec une épaisseur de l'ordre du micron, de préférence 2 µm.Method according to one of claims 1 to 7,
wherein the coating (4) is deposited with a thickness of about one micron, preferably 2 microns.
comprenant en outre la déposition d'une couche d'accrochage (3) de Al2O3 entre l'âme (2) et le revêtement (4).Method according to one of claims 1 to 8,
further comprising depositing an Al 2 O 3 bonding layer (3) between the core (2) and the coating (4).
dans lequel couche d'accrochage (3) est déposés à l'aide d'un procédé de déposition de couches atomiques (ALD).Process according to claim 9,
wherein the bonding layer (3) is deposited using an atomic layer deposition (ALD) method.
comprenant en outre la déposition d'une couche externe (5) de Al2O3 sur le revêtement (4).Process according to one of Claims 1 to 10,
further comprising depositing an outer layer (5) Al 2 O 3 on the coating (4).
dans lequel la couche externe (5) est déposée après le traitement thermique de recuit du revêtement (4).Process according to claim 11,
wherein the outer layer (5) is deposited after the annealing heat treatment of the coating (4).
dans lequel le matériau composant l'âme comprend le carbone, le silicium ou une céramique.Method according to one of Claims 1 to 12,
wherein the core material comprises carbon, silicon or a ceramic.
dans lequel le revêtement comprend le dioxyde de silicium.Method according to one of claims 1 to 22,
wherein the coating comprises silicon dioxide.
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CH13492014 | 2014-09-08 |
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EP3002638A3 EP3002638A3 (en) | 2016-07-13 |
EP3002638B1 EP3002638B1 (en) | 2021-08-18 |
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EP15183042.9A Active EP3002638B1 (en) | 2014-09-08 | 2015-08-28 | Method for manufacturing a thermocompensated hairspring |
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Cited By (4)
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EP3456859A1 (en) | 2017-09-13 | 2019-03-20 | Rolex Sa | Protective coating for a complex watch component |
KR20200017341A (en) * | 2018-08-08 | 2020-02-18 | 니바록스-파 에스.에이. | Coloured thermocompensated spiral and a method for the production thereof |
EP3502785B1 (en) | 2017-12-21 | 2020-08-12 | Nivarox-FAR S.A. | Hairspring for clock movement and method for manufacturing same |
EP3502288B1 (en) | 2017-12-21 | 2020-10-14 | Nivarox-FAR S.A. | Method for manufacturing a hairspring for clock movement |
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Cited By (4)
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EP3456859A1 (en) | 2017-09-13 | 2019-03-20 | Rolex Sa | Protective coating for a complex watch component |
EP3502785B1 (en) | 2017-12-21 | 2020-08-12 | Nivarox-FAR S.A. | Hairspring for clock movement and method for manufacturing same |
EP3502288B1 (en) | 2017-12-21 | 2020-10-14 | Nivarox-FAR S.A. | Method for manufacturing a hairspring for clock movement |
KR20200017341A (en) * | 2018-08-08 | 2020-02-18 | 니바록스-파 에스.에이. | Coloured thermocompensated spiral and a method for the production thereof |
Also Published As
Publication number | Publication date |
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EP3002638A3 (en) | 2016-07-13 |
EP3002638B1 (en) | 2021-08-18 |
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