EP2105807B1 - Monobloc elevated curve spiral and method for manufacturing same - Google Patents

Monobloc elevated curve spiral and method for manufacturing same Download PDF

Info

Publication number
EP2105807B1
EP2105807B1 EP08153598.1A EP08153598A EP2105807B1 EP 2105807 B1 EP2105807 B1 EP 2105807B1 EP 08153598 A EP08153598 A EP 08153598A EP 2105807 B1 EP2105807 B1 EP 2105807B1
Authority
EP
European Patent Office
Prior art keywords
hairspring
silicon
layer
based material
balance spring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP08153598.1A
Other languages
German (de)
French (fr)
Other versions
EP2105807A1 (en
Inventor
Pierre-André Bühler
Marco Verardo
Thierry Conus
Jean-Philippe Thiébaud
Jean-Bernard Peters
Pierre Cusin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Montres Breguet SA
Original Assignee
Montres Breguet SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Montres Breguet SA filed Critical Montres Breguet SA
Priority to EP08153598.1A priority Critical patent/EP2105807B1/en
Priority to TW098109548A priority patent/TWI463282B/en
Priority to SG200902111-4A priority patent/SG155873A1/en
Priority to CN200910203911.3A priority patent/CN101550978B/en
Priority to JP2009081425A priority patent/JP5243324B2/en
Priority to US12/414,309 priority patent/US8296953B2/en
Publication of EP2105807A1 publication Critical patent/EP2105807A1/en
Priority to HK10103325.8A priority patent/HK1138055A1/en
Priority to US13/601,128 priority patent/US8622611B2/en
Application granted granted Critical
Publication of EP2105807B1 publication Critical patent/EP2105807B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0002—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
    • G04D3/0035—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
    • G04D3/0041—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for coil-springs
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49579—Watch or clock making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49579—Watch or clock making
    • Y10T29/49581—Watch or clock making having arbor, pinion, or balance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49607—Spring-head clip making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49609—Spring making

Definitions

  • the invention relates to a hairspring and its method of manufacture and, more particularly, to a spiral curve elevation formed in one piece.
  • the regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
  • the document EP 1 605 323 proposes to replace the elevation of the outer turn by a particular curvature in the same plane to obtain the same effect while keeping a flat spiral.
  • the document CH 695395 proposes forming a flat spiral whose ferrule is in one piece with the spiral spring.
  • the object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc curve-up spiral whose thermo-elastic coefficient can be adjusted and which is obtained by means of a manufacturing process which minimizes the difficulties of realization.
  • the invention relates to a monobloc spiral according to the appended claim 1.
  • the invention relates to a timepiece characterized in that it comprises a monobloc spring according to one of the preceding variants.
  • the invention relates to a method for manufacturing a monobloc balance spring according to claims 10 and 13 appended hereto.
  • the invention relates to a generally annotated method 1 and which is intended to manufacture a monobloc curved elevation hairspring 21, 21 'for a timepiece movement.
  • method 1 comprises successive steps for forming at least one type of spiral which can be formed integrally of silicon-based material.
  • the first step 100 is to provide a substrate 3 of the type silicon on insulator (also known by the acronym SOI).
  • the substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of silicon-based material.
  • the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final balance spring 21.
  • the upper layer 5 is used as spacing means with respect to the lower layer 7. Consequently, the height of the upper layer 5 will be adapted according to the configuration of the upward spiral spring 21, 21 '.
  • a cavity 8 is selectively etched, for example by a deep reactive ion etching process (also known as DRIE), in the upper layer 5 of silicon-based material.
  • DRIE deep reactive ion etching process
  • the cavity 8 makes it possible to form a pattern 6 defining the inner and outer contours of a silicon part belonging to the lifting device 2 of the hairspring 21, 21 '.
  • the pattern 6 forms the intermediate portion of the elevating means 4 of the lifting device 2 of the hairspring 21.
  • the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 leaves all freedom as to the geometry of the pattern 6.
  • it may not necessarily be rectangular but, for example, trapezoidal.
  • the pattern 6 forms the intermediate portion of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 gives full freedom as to the geometry of the pattern 6.
  • it may not necessarily be rectangular but, for example, form a complete ring.
  • another cavity 10 may be etched in step 101 to form the pattern 9 distinct from the pattern 6 defining the inner and outer contours of a silicon part respectively belonging to a shell 27 of the hairspring 21.
  • the pattern 9 thus forms the middle part of the shell 27 of the spiral with a curve elevation 21.
  • the pattern 9 is substantially circular cylinder-shaped, however, advantageously according to the method 1, the etching on the upper layer 5 leaves no freedom as to the geometry of the pattern 9.
  • it may not necessarily be circular but, for example, elliptical and / or comprise a non-circular inner diameter.
  • At least one material bridge 16 is made in order to keep the curvature spiral 21, 21 'during manufacture at the substrate 3.
  • a material bridge 16 is left between one of the main faces of the pattern 6 and the remainder of the unetched layer 5.
  • step 102 as visible in figure 3 an additional layer 11 made of silicon-based material is added to substrate 3.
  • the additional layer 11 is fixed on the upper layer 5 by means of a fusion welding of silicon (also known by the acronym SFB).
  • step 102 advantageously makes it possible to cover the upper layer 5 by bonding with a very strong adhesion, in particular the upper faces of the patterns 6 and, possibly, 9 on the lower face of the additional layer 11.
  • cavities 18 and 20 are selectively etched, for example, by a method of the DRIE type similar to that of steps 101, in the additional layer 11 of silicon-based material. These cavities 18 and 20 make it possible to form three patterns 17, 19 and 24 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.
  • the pattern 17 is substantially circular cylinder shaped and the pattern 19 substantially spiral.
  • the etching in the additional layer 11 leaves all freedom on the geometry of the patterns 17 and 19.
  • the pattern 19 may, for example, comprise more turns or an inner turn having a curve Grossmann type to improve its concentricity development as explained in the document EP 1 612 627 .
  • the pattern 17 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 9 made in the upper layer 5.
  • the cavities 18 and 10 respectively forming the inner diameters of the patterns 17 and 9 communicate together and are substantially one above the other.
  • the patterns 9 and 17 form the upper and middle parts of the ferrule 27 of the spiral 21.
  • the patterns 17 and 19 being etched at the same time, they therefore form a single piece in the additional layer 11.
  • the patterns 17 and 19 respectively form the lower part of the ferrule 27 and the spiral spring 25 of the curved spiral spring 21.
  • the patterns 17 and 19 respectively form the first ferrule 27 'and the first spiral spring 25' of the curvature spiral 21 '.
  • the pattern 24 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 6 made in the upper layer 5.
  • the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 of the elevating device 2 of the hairspring 21.
  • the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern of the material bridge 16 may be extended in the additional layer 11 in step 103.
  • the method 1 may comprise a fifth step 104 of oxidizing at least the pattern 19, that is to say the spiral spring 25, 25 'of the hairspring 21, 21' to make it more mechanically resistant and of adjust its thermo-elastic coefficient.
  • a fifth step 104 of oxidizing at least the pattern 19, that is to say the spiral spring 25, 25 'of the hairspring 21, 21' to make it more mechanically resistant and of adjust its thermo-elastic coefficient.
  • Such an oxidation step is explained in particular in the patent EP 1 422 436 .
  • the method 1 can comprise three embodiments A, B and C as illustrated in FIG. figure 9 .
  • each of the three embodiments A, B and C ends with the same final step 106 of releasing the curved hairspring 21, 21 'from the substrate 3.
  • the release step 106 can be simply performed by providing a force to the hairspring 21, 21 'able to break the material bridge 16.
  • This force can, for example, be generated manually by an operator or by machining.
  • cavities 12 and 14 are selectively etched, for example, by a method of the DRIE type similar to that of step 101 and 103, in the lower layer 7 of material based on silicon. These cavities 12 and 14 make it possible to form three patterns 13, 15 and 22 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.
  • the pattern 13 is substantially circular cylinder shaped and the pattern 15 substantially spiral.
  • the pattern 22 is shaped curved rectangular plate.
  • the etching on the lower layer 7 leaves complete freedom on the geometry of the patterns 13, 15 and 22.
  • the pattern 15 may, for example, comprise more turns.
  • the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 9 and 17 made in the upper and additional layers 5 and 5.
  • the cavities 12, 10 and 18 respectively forming the inside diameter patterns 13, 9 and 17 communicate together and are substantially one above the other.
  • patterns 17, 9 and 13 form respectively the upper, middle and lower parts of the ferrule 27 of the spiral 21.
  • the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 17 made in the additional layer 11. This means that the cavities 12 and 18 respectively forming the inner diameter of the patterns 13 and 17 are substantially one above the other without being contiguous.
  • the patterns 17 and 13 respectively form the first ferrule 27 'and the second ferrule 27 "of the double spiral series 21'.
  • the pattern 22 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 6 formed in the upper layer 5.
  • the patterns 22, 6 and 24 respectively form the low, middle and high parts of the elevation means 4 of the elevating device 2 of the hairspring 21.
  • the patterns 22, 6 and 24 form respectively the lower, middle and upper parts of the elevating means 4 'of the elevating device 2' of the hairspring 21 '.
  • the pattern of the material bridge 16 can be extended in the lower layer 7 during step 105.
  • the pattern 15 is made to meet the criteria of a spiral type Phillips.
  • the patterns 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7.
  • the units 22 and 15 respectively form the lower part of the elevating means 4 and the end curve 23 of the elevating device 2 of the hairspring 21.
  • the pattern 15 is made similarly to the pattern 19 made during the step 103.
  • the patterns 13, 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7.
  • the units 22, 15 and 13 respectively form the lower part of the elevating means 4 'and the second spiral spring 23' of the elevating device 2 ', and the second shell 27 "of the series double spiral 21'.
  • the etching in the lower layer 7 leaves all freedom on the geometry in particular of the pattern 15.
  • the latter may, for example, comprise more turns or an inner turn having a Grossmann type curve allowing improve its concentricity of development as explained in the document EP 1 612 627 .
  • a curved spiral 21 or 21 'formed integrally with silicon-based materials is obtained by means of the first embodiment A. to the Figures 10 and 11 or 12 . It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • the hairspring 21 comprises a hairspring 25 coaxially connected to a shell 27, the outer coil of which comprises an elevating device 2 mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as elevation means 4 and a terminal curve 23.
  • the spiral curve elevation 21 thus obtained also has a configuration also called spiral Breguet® type.
  • the shell 27 is also etched in three layers 11, 5, 7 which improves the guiding of the hairspring 21.
  • the inner turn 26 of the hairspring 25 has a curve of the Grossmann type in order to improve its concentricity of development.
  • the etchings made according to steps 103 and 105 of method 1 leave all freedom on the geometry of the terminal curve 23, spiral spring 25, elevation means 4 and ferrule 27.
  • the continuity between the spiral spring 25, the elevation means 4 and the end curve 23 may consist of a substantially different geometry.
  • the ferrule 27 may also comprise dimensions and / or geometries uniformly clean or different on at least one of the lower parts 13, median 9 and / or high 17.
  • the inner diameter may have a complementary shape on all or part of the height of the shell 27.
  • the inner and / or outer diameters are not necessarily circular but, for example, elliptical and / or or polygonal.
  • the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radius of the spiral spring 25, that is to say the outer diameter of the shell 27, which allows the miniaturization of the inner and outer diameters of the shell 27. It will therefore be understood that the hairspring 21 is adapted to receive through its cavities 18, 10 and 12, advantageously, an axis of smaller diameter than is currently manufactured.
  • said axis may be fixed to the inner diameter 18 and / or 10 and / or 12 of the ferrule 27.
  • the clamping may for example be carried out using elastic means etched in the ferrule 27 made of silicon-based material .
  • Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the hairspring 21 ' comprises a first hairspring 25' coaxially connected to a shell 27 'and the outer coil of which comprises an elevating device 2' mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as means 4 ', a second spiral spring 23' and a second ferrule 27 ", as visible in figure 12 , the hairspring 21 'thus obtained thus comprises a configuration of the double spiral type in series.
  • the engravings made according to steps 103 and 105 of the method 1 leave all freedom on the geometry of the spiral springs 25 'and 23', elevation means 4 'and ferrules 27' and 27 ".
  • the continuity between the spiral springs 25 ', 23' and the elevation means 4 ' may consist of a substantially different geometry.It is also conceivable, in the manner of the first variant, that the internal turns of each of the springs -spirals 25 'and 23' may have a Grossmann type curve in order to improve their concentricity of development.
  • the ferrules 27 'and 27 may also comprise dimensions or / and geometries that are specific or different: according to the ferrule 27', 27" with which the axis is intended to be mounted, the diameter inside said ferrule may then have a complementary shape.
  • the inner and / or outer diameters of each shell 27 ', 27 are not necessarily circular but, for example, elliptical and / or polygonal.
  • the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radii of each of the spiral springs 25 'and 23', that is to say the outer diameter of the ferrules 27 ' and 27 ", which allows the miniaturization of the inner and outer diameters of the ferrules 27 'and 27". It is therefore understood that the hairspring 21 'is adapted to receive by its cavities 18 or 12, advantageously, an axis of smaller diameter than is currently manufactured.
  • said axis may be fixed to the inner diameter 18 and / or 12 of one of the ferrules 27 ', 27 ", the other ferrule may then be mounted either on the bridge of the spring balance or on the balance.
  • the axis can for example be made using elastic means etched in the ferrule 27 'or 27 "of silicon-based material.
  • Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG. figure 6 , consisting in implementing a process of the LIGA type (a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung").
  • LIGA a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung”
  • Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 107 may consist in depositing a cylinder 29.
  • the cylinder 29 is intended to receive, advantageously, by driving an axis.
  • a disadvantage of silicon lies in its very weak elastic and plastic zones which makes it very brittle.
  • the invention therefore proposes to perform the clamping of an axis, for example, balance not against the silicon-based material of the shell 27, 27 'or 27 "but on the inner diameter 28 of the metal cylinder 29 electrodeposited during of step 107.
  • the cylinder 29 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 28 is not necessarily circular but, for example, polygonal, which could make it possible to improve the transmission of rotational force with a correspondingly shaped axis.
  • a seventh step 108 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.
  • a one-piece curved elevation spiral formed of silicon-based materials with the same advantages as the embodiment A with, in addition, a portion 29 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • an axis can be driven against the internal diameter 28 of the metal part 29. It is thus possible, preferably, that the cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inner diameter. 28 of the metal part 29 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".
  • the method 1 comprises, after the step 103 or 104, in a sixth step 109, as visible at the figure 7 , selectively etching a cavity 30, for example, by a DRIE-type method, to a limited depth in the lower layer 7 of silicon-based material.
  • the cavity 30 makes it possible to form a recess able to serve as a container for a metal part.
  • the cavity 30 obtained may take the form of a disc.
  • the etching on the lower layer 7 leaves all freedom on the geometry of the cavity 30.
  • Method 1 comprises the implementation of a galvanic growth type or LIGA type process for filling the cavity 30 in a particular metallic form.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 110 may consist in depositing a cylinder 31 in the cavity 30.
  • the cylinder 31 is intended for receive, advantageously, by driving an axis.
  • an advantageous characteristic according to the invention is to achieve the clamping of the axis, for example, pendulum not against the silicon-based material of the shell 27, 27 'or 27 but on the inside diameter 32 of the metal cylinder 31 electrodeposited during step 110.
  • the cylinder 31 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 32 is not necessarily circular but, for example, polygonal which could improve the transmission of force in rotation with a corresponding shape of the axis.
  • the method 1 may include an eighth step 111 of polishing the metal deposit 31 made in step 110 to make it plane.
  • a ninth step 112 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to the patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.
  • a monobloc spring formed of silicon-based materials with the same advantages as the embodiment A with in addition, a portion 31 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.
  • an axis can be driven against the inner diameter 32 of the metal part. It is thus possible, preferentially, that cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inside diameter 32. the metal part 31 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".
  • the final spiral 21 or 21 ' is thus assembled before being structured, that is to say before being etched and / or modified by electroplating. This advantageously makes it possible to minimize the dispersions generated by the current fabrications and, consequently, improves the accuracy of a regulator member of which it would be dependent.
  • Process 1 may comprise, after step 105, 108 or 112, a step of the same type as that which would consist in oxidizing the pattern 15, that is to say the end curve 23 or the spiral spring 23 'of the spiral 21 or 21 'to make it more mechanically strong and adjust its thermo-elastic coefficient.
  • a polishing step of the type of step 111 can also be performed between step 107 and step 108.
  • the method 1 allows the step 103 of engraving the spiral spring 25, 25 'and the shell 27, 27' in the layer additional 11 is interchanged with that 105, 108 or 112 of engraving the end curve 23 or the spiral spring 23 'and the ferrule 27 "in the lower layer 7.
  • the end curve 23 or the spiral spring 23' and the ferrule 27 can be etched first on the additional layer 11 and then the spiral spring 25, 25 'and the shell 27, 27', in the lower layer 7.
  • a conductive layer is deposited on at least a portion of the hairspring 21 or 21 'to avoid problems of isochronism.
  • a conductive layer may be of the type disclosed in the document EP 1 837 722 .
  • the height of ferrule 27 may be more limited than Figures 10 and 11 of the first variant illustrated, that is to say, for example, it can be limited to the layers 5 and 11.
  • the elevation means 4 can also take a completely different shape than a curved rectangular plate.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Springs (AREA)

Description

DOMAINE DE L'INVENTIONFIELD OF THE INVENTION

L'invention se rapporte à un spiral et son procédé de fabrication et, plus particulièrement, à un spiral à élévation de courbe formé en une seule pièce.The invention relates to a hairspring and its method of manufacture and, more particularly, to a spiral curve elevation formed in one piece.

ARRIERE PLAN DE L'INVENTIONBACKGROUND OF THE INVENTION

L'organe régulateur d'une pièce d'horlogerie comporte généralement un volant d'inertie appelé balancier et un résonateur appelé spiral. Ces pièces sont déterminantes pour la qualité de marche de la pièce d'horlogerie. En effet, elles régulent le mouvement, c'est-à-dire qu'elles contrôlent la fréquence du mouvement.The regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.

Dans le cas d'un spiral à élévation de courbe, beaucoup de matériaux et de procédés ont été testés sans que les difficultés de réalisation en résonance ne disparaissent. Le document EP 1 605 323 propose de remplacer l'élévation de la spire externe par une courbure particulière dans le même plan permettant d'obtenir le même effet tout en gardant un spiral plat. Le document CH 695395 propose de former un spiral plat dont la virole est en une seule pièce avec le ressort-spiral.In the case of a curvature spiral, many materials and processes have been tested without resonance difficulties disappearing. The document EP 1 605 323 proposes to replace the elevation of the outer turn by a particular curvature in the same plane to obtain the same effect while keeping a flat spiral. The document CH 695395 proposes forming a flat spiral whose ferrule is in one piece with the spiral spring.

RESUME DE L'INVENTIONSUMMARY OF THE INVENTION

Le but de la présente invention est de pallier tout ou partie les inconvénients cités précédemment en proposant un spiral à élévation de courbe monobloc dont le coefficient thermo-élastique peut être ajusté et qui est obtenu à l'aide d'un procédé de fabrication qui minimise les difficultés de réalisation. A cet effet, l'invention se rapporte à un spiral monobloc selon la revendication 1 annexée.The object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc curve-up spiral whose thermo-elastic coefficient can be adjusted and which is obtained by means of a manufacturing process which minimizes the difficulties of realization. For this purpose, the invention relates to a monobloc spiral according to the appended claim 1.

Conformément à d'autres caractéristiques avantageuses de l'invention :

  • le dispositif d'élévation comporte une courbe terminale reliée auxdits moyens d'élévation et formée dans une troisième couche de matériau à base de silicium ce qui permet de former un spiral du type Breguet® ;
  • la courbe terminale est du type Phillips ;
  • la virole comporte une partie en prolongement faisant saillie dudit ressort-spiral afin d'améliorer le guidage dudit spiral ;
  • le dispositif d'élévation comporte un deuxième ressort-spiral monté coaxialement sur une deuxième virole reliés auxdits moyens d'élévation et formés dans une troisième couche de matériau à base de silicium permettant la formation d'un spiral double en série ;
  • le spiral comporte au moins une partie en dioxyde de silicium afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique ;
  • au moins une virole comporte une partie en métal destinée à recevoir par chassage un axe ce qui permet d'éviter la détérioration des diamètres internes en matériaux à base de silicium ;
  • au moins une spire interne de ressort-spiral comporte une courbe du type Grossmann afin d'améliorer la concentricité du développement dudit spiral.
According to other advantageous features of the invention:
  • the elevating device comprises an end curve connected to said elevating means and formed in a third layer of silicon-based material which makes it possible to form a spiral of the Breguet® type;
  • the terminal curve is of the Phillips type;
  • the ferrule comprises an extension part projecting from said spiral spring in order to improve the guiding of said spiral;
  • the lifting device comprises a second spiral spring mounted coaxially on a second ferrule connected to said elevating means and formed in a third layer of silicon-based material for forming a double spiral in series;
  • the hairspring comprises at least one portion of silicon dioxide in order to make it more mechanically strong and to adjust its thermoelastic coefficient;
  • at least one ferrule comprises a metal part intended to receive by driving an axis, which makes it possible to avoid the deterioration of the internal diameters of silicon-based materials;
  • at least one inner spiral spring coil has a Grossmann-type curve to improve the concentricity of the development of said hairspring.

Plus généralement, l'invention se rapporte à une pièce d'horlogerie caractérisée en ce qu'elle comporte un spiral monobloc selon l'une des variantes précédentes.More generally, the invention relates to a timepiece characterized in that it comprises a monobloc spring according to one of the preceding variants.

Enfin l'invention se rapporte à un procédé de fabrication d'un spiral monobloc selon les revendications 10 et 13 annexées.Finally, the invention relates to a method for manufacturing a monobloc balance spring according to claims 10 and 13 appended hereto.

Conformément à d'autres caractéristiques avantageuses de l'invention :

  • la gravure du ressort-spiral et de la virole de l'étape d) est inversée avec celle de la courbe terminale de l'étape e) ;
  • le motif d'une partie en prolongement de la virole est gravé dans au moins une des autres couches en matériaux à base de silicium ;
  • après une étape de gravure d'un ressort-spiral, le procédé comporte l'étape g) : oxyder le ressort-spiral en matériau à base de silicium afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique ;
  • avant l'étape e), le procédé comporte l'étape h) : déposer sélectivement au moins une couche de métal sur la couche inférieure pour définir le motif d'une partie métallique sur la virole ;
  • l'étape h) comporte l'étape i) : faire croître ledit dépôt par couches successives métalliques au moins partiellement sur la surface de la couche inférieure afin de former la partie métallique destinée à recevoir par chassage un axe ;
  • l'étape h) comporte les étapes j) : graver sélectivement au moins une cavité dans la couche inférieure destinée à recevoir la partie métallique et k) : faire croître ledit dépôt par couches successives métalliques au moins partiellement dans ladite au moins une cavité afin de former la partie métallique destinée à recevoir par chassage un axe ;
  • l'étape h) comporte une dernière étape l) : polir le dépôt métallique ;
  • plusieurs spiraux monoblocs sont réalisés sur un même substrat.
According to other advantageous features of the invention:
  • the etching of the spiral spring and the ferrule of step d) is reversed with that of the terminal curve of step e);
  • the pattern of an extension part of the shell is etched in at least one of the other layers of silicon-based materials;
  • after a step of etching a spiral spring, the method comprises step g): oxidizing the spiral spring of silicon-based material to make it more mechanically strong and adjust its thermo-elastic coefficient;
  • before step e), the method comprises step h): selectively depositing at least one layer of metal on the lower layer to define the pattern of a metal part on the ferrule;
  • step h) comprises step i): growing said deposition in successive metal layers at least partially on the surface of the lower layer to form the metal part intended to receive a shaft by driving;
  • step h) comprises steps j): selectively etching at least one cavity in the lower layer intended to receive the metal part and k): growing said deposition by successive metallic layers at least partially in said at least one cavity in order to forming the metal part intended to receive by driving an axis;
  • step h) comprises a last step 1): polishing the metal deposit;
  • several monobloc spirals are made on the same substrate.

DESCRIPTION SOMMAIRE DES DESSINSSUMMARY DESCRIPTION OF THE DRAWINGS

D'autres particularités et avantages ressortiront clairement de la description qui en est faite ci-après, à titre indicatif et nullement limitatif, en référence aux dessins annexés, dans lesquels :

  • les figures 1 à 5 représentent des vues successives du procédé de fabrication selon l'invention ;
  • les figures 6 à 8 représentent des vues des étapes successives de modes de réalisation alternatifs ;
  • la figure 9 représente un schéma fonctionnel du procédé selon l'invention ;
  • les figures 10 et 11 sont des représentations en perspective d'un spiral monobloc selon l'invention ;
  • la figure 12 est une représentation en perspective d'une spiral selon une variante de l'invention.
Other particularities and advantages will emerge clearly from the description which is given hereinafter, by way of indication and in no way limiting, with reference to the appended drawings, in which:
  • the Figures 1 to 5 represent successive views of the manufacturing method according to the invention;
  • the Figures 6 to 8 represent views of the successive steps of alternative embodiments;
  • the figure 9 represents a block diagram of the process according to the invention;
  • the Figures 10 and 11 are perspective representations of a monobloc spiral according to the invention;
  • the figure 12 is a perspective representation of a spiral according to a variant of the invention.

DESCRIPTION DETAILLEE DES MODES DE REALISATION PREFERESDETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

L'invention se rapporte à un procédé généralement annoté 1 et qui est destiné à fabriquer un spiral à élévation de courbe monobloc 21, 21' pour un mouvement de pièce d'horlogerie. Comme illustré aux figures 1 à 9, le procédé 1 comporte des étapes successives destinées à former au moins un type de spiral qui peut être formé intégralement en matériau à base de silicium.The invention relates to a generally annotated method 1 and which is intended to manufacture a monobloc curved elevation hairspring 21, 21 'for a timepiece movement. As illustrated in Figures 1 to 9 method 1 comprises successive steps for forming at least one type of spiral which can be formed integrally of silicon-based material.

En référence aux figures 1 et 9, la première étape 100 consiste à se munir d'un substrat 3 du type silicium sur isolant (également connu sous l'acronyme anglais SOI). Le substrat 3 comporte une couche supérieure 5 et une couche inférieure 7 composées chacune de matériau à base de silicium.With reference to figures 1 and 9 , the first step 100 is to provide a substrate 3 of the type silicon on insulator (also known by the acronym SOI). The substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of silicon-based material.

Préférentiellement dans cette étape 100, le substrat 3 est choisi afin que la hauteur de la couche inférieure 7 corresponde à la hauteur d'une partie du spiral final 21.Preferentially in this step 100, the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final balance spring 21.

Préférentiellement, la couche supérieure 5 est utilisée comme moyen d'espacement par rapport à la couche inférieure 7. Par conséquent, la hauteur de la couche supérieure 5 sera adaptée en fonction de la configuration du spiral à élévation de courbe 21, 21'.Preferentially, the upper layer 5 is used as spacing means with respect to the lower layer 7. Consequently, the height of the upper layer 5 will be adapted according to the configuration of the upward spiral spring 21, 21 '.

Dans une deuxième étape 101, comme visible à la figure 2, une cavité 8 est sélectivement gravée, par exemple par un procédé de gravure ionique réactive profonde (également connu sous l'acronyme anglais DRIE), dans la couche supérieure 5 en matériau à base de silicium. La cavité 8 permet de former un motif 6 définissant les contours intérieur et extérieur d'une partie en silicium appartenant au dispositif d'élévation 2 du spiral 21, 21'.In a second step 101, as visible in the figure 2 a cavity 8 is selectively etched, for example by a deep reactive ion etching process (also known as DRIE), in the upper layer 5 of silicon-based material. The cavity 8 makes it possible to form a pattern 6 defining the inner and outer contours of a silicon part belonging to the lifting device 2 of the hairspring 21, 21 '.

Dans une première variante illustrée aux figures 10 et 11, le motif 6 forme la partie intermédiaire des moyens d'élévation 4 du dispositif d'élévation 2 du spiral 21. Comme illustré à la figure 2, le motif 6 est sensiblement en forme de plaque rectangulaire courbe, cependant, avantageusement selon le procédé 1, la gravure sur la couche supérieure 5 laisse toute liberté quant à la géométrie du motif 6. Ainsi, notamment, il pourrait ne pas forcément être rectangulaire mais, par exemple, trapézoïdal.In a first variant illustrated in Figures 10 and 11 , the pattern 6 forms the intermediate portion of the elevating means 4 of the lifting device 2 of the hairspring 21. As illustrated in FIG. figure 2 , the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 leaves all freedom as to the geometry of the pattern 6. Thus, in particular, it may not necessarily be rectangular but, for example, trapezoidal.

Dans une deuxième variante illustrée à la figure 12, le motif 6 forme la partie intermédiaire des moyens d'élévation 4' du dispositif d'élévation 2' du spiral 21'. Comme illustré à la figure 2, le motif 6 est sensiblement en forme de plaque rectangulaire courbe, cependant, avantageusement selon le procédé 1, la gravure sur la couche supérieure 5 laisse toute liberté quant à la géométrie du motif 6. Ainsi, notamment, il pourrait ne pas forcément être rectangulaire mais, par exemple, former un anneau complet.In a second variant illustrated in figure 12 , the pattern 6 forms the intermediate portion of the elevating means 4 'of the elevating device 2' of the hairspring 21 '. As illustrated in figure 2 , the pattern 6 is substantially in the form of a curved rectangular plate, however, advantageously according to the method 1, the etching on the upper layer 5 gives full freedom as to the geometry of the pattern 6. Thus, in particular, it may not necessarily be rectangular but, for example, form a complete ring.

Préférentiellement pour la première variante des figures 10 et 11, une autre cavité 10 peut être gravée lors de l'étape 101 afin de former le motif 9 distinct du motif 6 définissant les contours intérieur et extérieur d'une partie en silicium appartenant respectivement à une virole 27 du spiral 21.Preferably for the first variant of Figures 10 and 11 another cavity 10 may be etched in step 101 to form the pattern 9 distinct from the pattern 6 defining the inner and outer contours of a silicon part respectively belonging to a shell 27 of the hairspring 21.

Dans l'exemple illustré aux figures 10 et 11, le motif 9 forme ainsi la partie médiane de la virole 27 du spiral à élévation de courbe 21. Comme illustré à la figure 2, le motif 9 est sensiblement en forme de cylindre à section circulaire, cependant, avantageusement selon le procédé 1, la gravure sur la couche supérieure 5 laisse toute liberté quant à la géométrie du motif 9. Ainsi, notamment, il pourrait ne pas forcément être circulaire mais, par exemple, elliptique et/ou comporter un diamètre intérieur non circulaire.In the example shown in Figures 10 and 11 , the pattern 9 thus forms the middle part of the shell 27 of the spiral with a curve elevation 21. As illustrated in FIG. figure 2 , the pattern 9 is substantially circular cylinder-shaped, however, advantageously according to the method 1, the etching on the upper layer 5 leaves no freedom as to the geometry of the pattern 9. Thus, in particular, it may not necessarily be circular but, for example, elliptical and / or comprise a non-circular inner diameter.

Préférentiellement, lors de l'étape 101, au moins un pont de matière 16 est réalisé afin de maintenir au substrat 3 le spiral à élévation de courbe 21, 21' lors de sa fabrication. Dans l'exemple illustré à la figure 2, on peut voir qu'un pont de matières 16 est laissé entre une des faces principales du motif 6 et le reste de la couche 5 non gravée.Preferably, during step 101, at least one material bridge 16 is made in order to keep the curvature spiral 21, 21 'during manufacture at the substrate 3. In the example shown in figure 2 it can be seen that a material bridge 16 is left between one of the main faces of the pattern 6 and the remainder of the unetched layer 5.

Dans une troisième étape 102, comme visible à la figure 3, une couche supplémentaire 11 en matériau à base de silicium est ajoutée au substrat 3. Préférentiellement, la couche supplémentaire 11 est fixée sur la couche supérieure 5 au moyen d'un soudage par fusion du silicium (également connu sous l'acronyme anglais SFB). Ainsi, l'étape 102 permet avantageusement de recouvrir la couche supérieure 5 en liant avec une très forte adhérence notamment les faces supérieures des motifs 6 et, éventuellement, 9 sur la face inférieure de la couche supplémentaire 11.In a third step 102, as visible in figure 3 an additional layer 11 made of silicon-based material is added to substrate 3. Preferably, the additional layer 11 is fixed on the upper layer 5 by means of a fusion welding of silicon (also known by the acronym SFB). Thus, step 102 advantageously makes it possible to cover the upper layer 5 by bonding with a very strong adhesion, in particular the upper faces of the patterns 6 and, possibly, 9 on the lower face of the additional layer 11.

Dans une quatrième étape 103, comme visible à la figure 4, des cavités 18 et 20 sont sélectivement gravées, par exemple, par un procédé du type DRIE semblable à celui des étapes 101, dans la couche supplémentaire 11 en matériau à base de silicium. Ces cavités 18 et 20 permettent de former trois motifs 17, 19 et 24 définissants les contours intérieur et extérieur de parties en silicium du spiral à élévation de courbe 21, 21'.In a fourth step 103, as visible in figure 4 cavities 18 and 20 are selectively etched, for example, by a method of the DRIE type similar to that of steps 101, in the additional layer 11 of silicon-based material. These cavities 18 and 20 make it possible to form three patterns 17, 19 and 24 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.

Dans l'exemple illustré à la figure 4, le motif 17 est sensiblement en forme de cylindre à section circulaire et, le motif 19, sensiblement en forme de spirale. Cependant, avantageusement selon le procédé 1, la gravure dans la couche supplémentaire 11 laisse toute liberté sur la géométrie des motifs 17 et 19. Ainsi, notamment, le motif 19 peut, par exemple, comporter plus de spires ou une spire interne comportant une courbe du type Grossmann permettant d'améliorer sa concentricité de développement comme expliqué dans le document EP 1 612 627 .In the example shown in figure 4 , the pattern 17 is substantially circular cylinder shaped and the pattern 19 substantially spiral. However, advantageously according to the method 1, the etching in the additional layer 11 leaves all freedom on the geometry of the patterns 17 and 19. Thus, in particular, the pattern 19 may, for example, comprise more turns or an inner turn having a curve Grossmann type to improve its concentricity development as explained in the document EP 1 612 627 .

Préférentiellement pour la première variante des figures 10 et 11, le motif 17 réalisé dans la couche supplémentaire 11 est de forme similaire et sensiblement à l'aplomb du motif 9 réalisé dans la couche supérieure 5. Cela signifie que les cavités 18 et 10 formant respectivement les diamètres intérieurs des motifs 17 et 9 communiquent ensemble et sont sensiblement les unes au-dessus des autres. Dans l'exemple illustré aux figures 10 et 11, les motifs 9 et 17 forment les parties haute et médiane de la virole 27 du spiral 21.Preferably for the first variant of Figures 10 and 11 , the pattern 17 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 9 made in the upper layer 5. This means that the cavities 18 and 10 respectively forming the inner diameters of the patterns 17 and 9 communicate together and are substantially one above the other. In the example shown in Figures 10 and 11 , the patterns 9 and 17 form the upper and middle parts of the ferrule 27 of the spiral 21.

Avantageusement, les motifs 17 et 19 étant gravés en même temps, ils forment donc une pièce monobloc dans la couche supplémentaire 11. Dans la première variante illustrée aux figures 10 et 11, les motifs 17 et 19 forment respectivement la partie basse de la virole 27 et le ressort-spiral 25 du spiral à élévation de courbe 21. Dans la deuxième variante illustrée à la figure 12, les motifs 17 et 19 forment respectivement la première virole 27' et le premier ressort-spiral 25' du spiral à élévation de courbe 21'.Advantageously, the patterns 17 and 19 being etched at the same time, they therefore form a single piece in the additional layer 11. In the first variant illustrated in FIGS. Figures 10 and 11 , the patterns 17 and 19 respectively form the lower part of the ferrule 27 and the spiral spring 25 of the curved spiral spring 21. In the second variant illustrated in FIG. figure 12 the patterns 17 and 19 respectively form the first ferrule 27 'and the first spiral spring 25' of the curvature spiral 21 '.

De manière préférée, le motif 24 réalisé dans la couche supplémentaire 11 est de forme similaire et sensiblement à l'aplomb du motif 6 réalisé dans la couche supérieure 5. Dans la première variante illustrée aux figures 10 et 11, les motifs 6 et 24 forment respectivement les parties haute et intermédiaire des moyens d'élévation 4 du dispositif d'élévation 2 du spiral 21.Preferably, the pattern 24 made in the additional layer 11 is of similar shape and substantially perpendicular to the pattern 6 made in the upper layer 5. In the first variant illustrated in FIGS. Figures 10 and 11 , the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 of the elevating device 2 of the hairspring 21.

Dans la deuxième variante illustrée à la figure 12, les motifs 6 et 24 forment respectivement les parties haute et intermédiaire des moyens d'élévation 4' du dispositif d'élévation 2' du spiral 21'. Bien entendu, de manière similaire, le motif du pont de matière 16 peut être prolongé dans la couche supplémentaire 11 lors de l'étape 103.In the second variant illustrated in figure 12 , the patterns 6 and 24 respectively form the upper and middle portions of the elevating means 4 'of the elevating device 2' of the hairspring 21 '. Of course, similarly, the pattern of the material bridge 16 may be extended in the additional layer 11 in step 103.

A la suite de cette quatrième étape 103, on comprend que les motifs 17, 19 et 24 gravés dans la couche supplémentaire 11 sont reliés, par le dessous du motif 24, avec une très forte adhérence, au-dessus du motif 6 gravé de la couche supérieure 5.Following this fourth step 103, it is understood that the patterns 17, 19 and 24 etched in the additional layer 11 are connected, from below the pattern 24, with a very strong adhesion, above the engraved pattern 6 of the upper layer 5.

Préférentiellement comme représenté en traits interrompus à la figure 9, le procédé 1 peut comporter une cinquième étape 104 consistant à oxyder au moins le motif 19, c'est-à-dire le ressort-spiral 25, 25' du spiral 21, 21' afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique. Une telle étape d'oxydation est expliquée notamment dans le brevet EP 1 422 436 .Preferably as shown in dashed lines at the figure 9 , the method 1 may comprise a fifth step 104 of oxidizing at least the pattern 19, that is to say the spiral spring 25, 25 'of the hairspring 21, 21' to make it more mechanically resistant and of adjust its thermo-elastic coefficient. Such an oxidation step is explained in particular in the patent EP 1 422 436 .

Avantageusement selon l'invention, après la quatrième étape 103 ou préférentiellement après la cinquième étape 104, le procédé 1 peut comporter trois modes de réalisations A, B et C comme illustré à la figure 9. Cependant, chacun des trois modes de réalisation A, B et C se termine par la même étape finale 106 consistant à libérer du substrat 3 le spiral à élévation de courbe 21, 21' fabriqué.Advantageously according to the invention, after the fourth step 103 or preferentially after the fifth step 104, the method 1 can comprise three embodiments A, B and C as illustrated in FIG. figure 9 . However, each of the three embodiments A, B and C ends with the same final step 106 of releasing the curved hairspring 21, 21 'from the substrate 3.

Avantageusement, l'étape 106 de libération peut être simplement réalisée en fournissant un effort au spiral 21, 21' apte à casser le pont de matière 16. Cet effort peut, par exemple, être généré manuellement par un opérateur ou par usinage.Advantageously, the release step 106 can be simply performed by providing a force to the hairspring 21, 21 'able to break the material bridge 16. This force can, for example, be generated manually by an operator or by machining.

Selon un premier mode de réalisation A, dans une sixième étape 105, des cavités 12 et 14 sont sélectivement gravées, par exemple, par un procédé du type DRIE semblable à celui de l'étape 101 et 103, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités 12 et 14 permettent de former trois motifs 13, 15 et 22 définissants les contours intérieur et extérieur de parties en silicium du spiral à élévation de courbe 21, 21'.According to a first embodiment A, in a sixth step 105, cavities 12 and 14 are selectively etched, for example, by a method of the DRIE type similar to that of step 101 and 103, in the lower layer 7 of material based on silicon. These cavities 12 and 14 make it possible to form three patterns 13, 15 and 22 defining the inner and outer contours of silicon parts of the curvature spiral 21, 21 '.

Dans la première variante illustrée à la figure 5, le motif 13 est sensiblement en forme de cylindre à section circulaire et, le motif 15, sensiblement en forme de spirale. De plus, le motif 22 est en forme plaque rectangulaire courbe. Cependant, avantageusement selon le procédé 1, la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie des motifs 13, 15 et 22. Ainsi, notamment, le motif 15 peut, par exemple, comporter plus de spires.In the first variant illustrated in figure 5 , the pattern 13 is substantially circular cylinder shaped and the pattern 15 substantially spiral. In addition, the pattern 22 is shaped curved rectangular plate. However, advantageously according to the method 1, the etching on the lower layer 7 leaves complete freedom on the geometry of the patterns 13, 15 and 22. Thus, in particular, the pattern 15 may, for example, comprise more turns.

Préférentiellement pour la première variante des figures 10 et 11, le motif 13 réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb des motifs 9 et 17 réalisés dans les couches supérieure 5 et supplémentaire 11. Cela signifie que les cavités 12, 10 et 18 formant respectivement le diamètre intérieur des motifs 13, 9 et 17 communiquent ensemble et sont sensiblement l'une au-dessus de l'autre. Dans la première variante illustrée aux figures 10 et 11, les motifs 17, 9 et 13 forment respectivement les parties haute, médiane et basse de la virole 27 du spiral 21.Preferably for the first variant of Figures 10 and 11 , the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 9 and 17 made in the upper and additional layers 5 and 5. This means that the cavities 12, 10 and 18 respectively forming the inside diameter patterns 13, 9 and 17 communicate together and are substantially one above the other. In the first variant illustrated in Figures 10 and 11 , patterns 17, 9 and 13 form respectively the upper, middle and lower parts of the ferrule 27 of the spiral 21.

Préférentiellement pour la deuxième variante de la figure 12, le motif 13 réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb du motif 17 réalisé dans la couche supplémentaire 11. Cela signifie que les cavités 12 et 18 formant respectivement le diamètre intérieur des motifs 13 et 17 sont sensiblement l'une au-dessus de l'autre sans être contiguës. Dans la deuxième variante illustrée à la figure 12, les motifs 17 et 13 forment respectivement la première virole 27' et la deuxième virole 27" du spiral double en série 21'.Preferably for the second variant of the figure 12 , the pattern 13 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 17 made in the additional layer 11. This means that the cavities 12 and 18 respectively forming the inner diameter of the patterns 13 and 17 are substantially one above the other without being contiguous. In the second variant illustrated in figure 12 , the patterns 17 and 13 respectively form the first ferrule 27 'and the second ferrule 27 "of the double spiral series 21'.

De manière préférée, le motif 22 réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb du motif 6 réalisé dans la couche supérieure 5. Dans la première variante illustrée aux figures 10 et 11, les motifs 22, 6 et 24 forment respectivement les parties basse, intermédiaire et haute des moyens d'élévation 4 du dispositif d'élévation 2 du spiral 21. Dans la deuxième variante illustrée à la figure 12, les motifs 22, 6 et 24 forment respectivement les parties basse, intermédiaire et haute des moyens d'élévation 4' du dispositif d'élévation 2' du spiral 21'. Bien entendu, le motif du pont de matière 16 peut être prolongé dans la couche inférieure 7 lors de l'étape 105.Preferably, the pattern 22 made in the lower layer 7 is of similar shape and substantially perpendicular to the pattern 6 formed in the upper layer 5. In the first variant illustrated in FIGS. Figures 10 and 11 , the patterns 22, 6 and 24 respectively form the low, middle and high parts of the elevation means 4 of the elevating device 2 of the hairspring 21. In the second variant illustrated in FIG. figure 12 , the patterns 22, 6 and 24 form respectively the lower, middle and upper parts of the elevating means 4 'of the elevating device 2' of the hairspring 21 '. Of course, the pattern of the material bridge 16 can be extended in the lower layer 7 during step 105.

De plus, préférentiellement pour la première variante des figures 10 et 11, le motif 15 est réalisé afin de répondre aux critères d'une spirale de type Phillips. Ainsi, avantageusement, les motifs 22 et 15 étant gravés en même temps, ils forment donc une pièce monobloc dans la couche inférieure 7. Dans la première variante illustrée aux figures 10 et 11, les motifs 22 et 15 forment respectivement la partie basse des moyens d'élévation 4 et la courbe terminale 23 du dispositif d'élévation 2 du spiral 21.In addition, preferably for the first variant of the Figures 10 and 11 , the pattern 15 is made to meet the criteria of a spiral type Phillips. Thus, advantageously, the patterns 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7. In the first variant illustrated in FIGS. Figures 10 and 11 , the units 22 and 15 respectively form the lower part of the elevating means 4 and the end curve 23 of the elevating device 2 of the hairspring 21.

Enfin, préférentiellement pour la deuxième variante de la figure 12, le motif 15 est réalisé de manière similaire au motif 19 réalisé lors de l'étape 103. Ainsi, avantageusement, les motifs 13, 22 et 15 étant gravés en même temps, ils forment donc une pièce monobloc dans la couche inférieure 7. Dans la deuxième variante illustrée à la figure 12, les motifs 22, 15 et 13 forment respectivement la partie basse des moyens d'élévation 4' et le deuxième ressort-spiral 23' du dispositif d'élévation 2', et la deuxième virole 27" du spiral double en série 21'. Avantageusement selon le procédé 1, la gravure dans la couche inférieure 7 laisse toute liberté sur la géométrie notamment du motif 15. Ainsi, ce dernier peut, par exemple, comporter plus de spires ou une spire interne comportant une courbe du type Grossmann permettant d'améliorer sa concentricité de développement comme expliqué dans le document EP 1 612 627 .Finally, preferentially for the second variant of the figure 12 , the pattern 15 is made similarly to the pattern 19 made during the step 103. Thus, advantageously, the patterns 13, 22 and 15 being etched at the same time, they therefore form a single piece in the lower layer 7. In the second variant illustrated in FIG. figure 12 , the units 22, 15 and 13 respectively form the lower part of the elevating means 4 'and the second spiral spring 23' of the elevating device 2 ', and the second shell 27 "of the series double spiral 21'. Advantageously according to method 1, the etching in the lower layer 7 leaves all freedom on the geometry in particular of the pattern 15. Thus, the latter may, for example, comprise more turns or an inner turn having a Grossmann type curve allowing improve its concentricity of development as explained in the document EP 1 612 627 .

A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc, à l'aide du premier mode de réalisation A, un spiral à élévation de courbe 21 ou 21' monobloc formé intégralement en matériaux à base de silicium comme visible aux figures 10 et 11 ou 12. On comprend donc qu'il n'y a plus de problème de réalisation car les parties sont directement formées sur des éléments fixes pendant la fabrication du spiral 21 ou 21'.As a result of the final step 106 explained above, using a first embodiment of the embodiment of the invention, a curved spiral 21 or 21 'formed integrally with silicon-based materials is obtained by means of the first embodiment A. to the Figures 10 and 11 or 12 . It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '.

Dans la première variante illustrée aux figures 10 et 11, le spiral 21 comprend un ressort-spiral 25 raccordé coaxialement à une virole 27 dont la spire externe comporte un dispositif d'élévation 2 comprenant principalement une plaque rectangulaire gravée dans trois couches 11, 5, 7 servant de moyens d'élévation 4 et une courbe terminale 23. Comme visible aux figures 10 et 11, le spiral à élévation de courbe 21 ainsi obtenu comporte ainsi une configuration également appelée spiral du type Breguet®. Avantageusement selon l'invention, on remarque que la virole 27 est également gravée dans trois couches 11, 5, 7 ce qui permet d'améliorer le guidage du spiral 21. De plus, la spire interne 26 du ressort-spiral 25 comporte une courbe du type Grossmann afin d'améliorer sa concentricité de développement.In the first variant illustrated in Figures 10 and 11 , the hairspring 21 comprises a hairspring 25 coaxially connected to a shell 27, the outer coil of which comprises an elevating device 2 mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as elevation means 4 and a terminal curve 23. As shown in Figures 10 and 11 , the spiral curve elevation 21 thus obtained also has a configuration also called spiral Breguet® type. Advantageously according to the invention, it is noted that the shell 27 is also etched in three layers 11, 5, 7 which improves the guiding of the hairspring 21. Moreover, the inner turn 26 of the hairspring 25 has a curve of the Grossmann type in order to improve its concentricity of development.

De plus, les gravures réalisées selon les étapes 103 et 105 du procédé 1 laissent toute liberté sur la géométrie de la courbe terminale 23, du ressort-spiraux 25, des moyens d'élévation 4 et de la virole 27. Ainsi, notamment, la continuité entre le ressort-spiral 25, les moyens d'élévation 4 et la courbe terminale 23 peut consister en une géométrie sensiblement différente.In addition, the etchings made according to steps 103 and 105 of method 1 leave all freedom on the geometry of the terminal curve 23, spiral spring 25, elevation means 4 and ferrule 27. Thus, in particular, the continuity between the spiral spring 25, the elevation means 4 and the end curve 23 may consist of a substantially different geometry.

Selon le même raisonnement, la virole 27 peut également comporter des dimensions et/ou géométries uniformément propres ou différentes sur au moins une des parties basse 13, médiane 9 et/ou haute 17. En effet, suivant l'axe avec lequel la virole 27 est prévue d'être montée, le diamètre intérieur peut posséder une forme complémentaire sur tout ou partie de la hauteur de la virole 27. De même, les diamètres intérieur et/ou extérieur ne sont pas forcément circulaires mais, par exemple, elliptiques et/ou polygonaux.According to the same reasoning, the ferrule 27 may also comprise dimensions and / or geometries uniformly clean or different on at least one of the lower parts 13, median 9 and / or high 17. In fact, along the axis with which the ferrule 27 is intended to be mounted, the inner diameter may have a complementary shape on all or part of the height of the shell 27. Similarly, the inner and / or outer diameters are not necessarily circular but, for example, elliptical and / or or polygonal.

Il faut également noter que la très bonne précision structurelle d'une gravure ionique réactive profonde permet de diminuer le rayon de départ de du ressort-spiral 25, c'est-à-dire le diamètre extérieur de la virole 27, ce qui autorise la miniaturisation des diamètres intérieurs et extérieurs de la virole 27. On comprend donc que le spiral 21 est apte à recevoir par ses cavités 18, 10 et 12, avantageusement, un axe de diamètre plus petit que ce qui est communément fabriqué actuellement.It should also be noted that the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radius of the spiral spring 25, that is to say the outer diameter of the shell 27, which allows the miniaturization of the inner and outer diameters of the shell 27. It will therefore be understood that the hairspring 21 is adapted to receive through its cavities 18, 10 and 12, advantageously, an axis of smaller diameter than is currently manufactured.

Préférentiellement, ledit axe peut être fixé sur le diamètre intérieur 18 et/ou 10 et/ou 12 de la virole 27. Le serrage peut par exemple être réalisé à l'aide de moyens élastiques gravés dans la virole 27 en matériau à base de silicium. De tels moyens élastiques peuvent, par exemple, prendre la forme de ceux divulgués dans les figures 10A à 10E du brevet EP 1 655 642 ou ceux divulgués dans les figures 1, 3 et 5 du brevet EP 1 584 994 .Preferably, said axis may be fixed to the inner diameter 18 and / or 10 and / or 12 of the ferrule 27. The clamping may for example be carried out using elastic means etched in the ferrule 27 made of silicon-based material . Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .

Dans la deuxième variante illustrée à la figure 12, le spiral 21' comprend un premier ressort-spiral 25' raccordé coaxialement à une virole 27' et dont la spire externe comporte un dispositif d'élévation 2' comprenant principalement une plaque rectangulaire gravée dans trois couches 11, 5, 7 servant de moyens d'élévation 4', un deuxième ressort-spiral 23' et une deuxième virole 27". Comme visible à la figure 12, le spiral 21' ainsi obtenu comporte ainsi une configuration du type spiral double en série.In the second variant illustrated in figure 12 , the hairspring 21 'comprises a first hairspring 25' coaxially connected to a shell 27 'and the outer coil of which comprises an elevating device 2' mainly comprising a rectangular plate engraved in three layers 11, 5, 7 serving as means 4 ', a second spiral spring 23' and a second ferrule 27 ", as visible in figure 12 , the hairspring 21 'thus obtained thus comprises a configuration of the double spiral type in series.

De plus, les gravures réalisées selon les étapes 103 et 105 du procédé 1 laissent toute liberté sur la géométrie des ressort-spiraux 25' et 23', des moyens d'élévation 4' et des viroles 27' et 27". Ainsi, notamment, la continuité entre les ressort-spiraux 25', 23' et les moyens d'élévation 4' peut consister en une géométrie sensiblement différente. Il est également envisageable, à la manière de la première variante, que les spires internes de chacun des ressort-spiraux 25' et 23' puissent comporter une courbe du type Grossmann afin d'améliorer chacun leur concentricité de développement.In addition, the engravings made according to steps 103 and 105 of the method 1 leave all freedom on the geometry of the spiral springs 25 'and 23', elevation means 4 'and ferrules 27' and 27 ". , the continuity between the spiral springs 25 ', 23' and the elevation means 4 'may consist of a substantially different geometry.It is also conceivable, in the manner of the first variant, that the internal turns of each of the springs -spirals 25 'and 23' may have a Grossmann type curve in order to improve their concentricity of development.

Selon le même raisonnement, les viroles 27' et 27" peuvent également comporter des dimensions et/ou géométries propres ou différentes. En effet, suivant la virole 27', 27" avec laquelle l'axe est prévue d'être montée, le diamètre intérieur de ladite virole peut alors posséder une forme complémentaire. De même, les diamètres intérieur et/ou extérieur de chaque virole 27', 27" ne sont pas forcément circulaires mais, par exemple, elliptiques et/ou polygonaux.According to the same reasoning, the ferrules 27 'and 27 "may also comprise dimensions or / and geometries that are specific or different: according to the ferrule 27', 27" with which the axis is intended to be mounted, the diameter inside said ferrule may then have a complementary shape. Similarly, the inner and / or outer diameters of each shell 27 ', 27 "are not necessarily circular but, for example, elliptical and / or polygonal.

Il faut également noter que la très bonne précision structurelle d'une gravure ionique réactive profonde permet de diminuer les rayons de départ de chacun des ressort-spiraux 25' et 23', c'est-à-dire le diamètre extérieur des viroles 27' et 27", ce qui autorise la miniaturisation des diamètres intérieurs et extérieurs des viroles 27' et 27". On comprend donc que le spiral 21' est apte à recevoir par ses cavités 18 ou 12, avantageusement, un axe de diamètre plus petit que ce qui est communément fabriqué actuellement.It should also be noted that the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radii of each of the spiral springs 25 'and 23', that is to say the outer diameter of the ferrules 27 ' and 27 ", which allows the miniaturization of the inner and outer diameters of the ferrules 27 'and 27". It is therefore understood that the hairspring 21 'is adapted to receive by its cavities 18 or 12, advantageously, an axis of smaller diameter than is currently manufactured.

Préférentiellement, ledit axe peut être fixé sur le diamètre intérieur 18 et/ou 12 d'une des viroles 27', 27". L'autre virole pouvant alors être monté soit sur le pont du balancier-spiral soit sur le balancier. Le serrage de l'axe peut par exemple être réalisé à l'aide de moyens élastiques gravés dans la virole 27' ou 27" en matériau à base de silicium. De tels moyens élastiques peuvent, par exemple, prendre la forme de ceux divulgués dans les figures 10A à 10E du brevet EP 1 655 642 ou ceux divulgués dans les figures 1, 3 et 5 du brevet EP 1 584 994 .Preferably, said axis may be fixed to the inner diameter 18 and / or 12 of one of the ferrules 27 ', 27 ", the other ferrule may then be mounted either on the bridge of the spring balance or on the balance. the axis can for example be made using elastic means etched in the ferrule 27 'or 27 "of silicon-based material. Such elastic means may, for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .

Selon un second mode de réalisation B, le procédé 1 comporte, après l'étape 103 ou 104, une sixième étape 107, comme visible à la figure 6, consistant à mettre en oeuvre un processus du type LIGA (acronyme très connu provenant de l'allemand « röntgenLIthographie, Galvanoformung & Abformung »). Un tel processus comporte une succession d'étapes permettant d'électrodéposer selon une forme particulière un métal sur la couche inférieure 7 du substrat 3 à l'aide d'une résine photostructurée. Ce processus du type LIGA étant très connu, il ne sera pas d'avantage détaillé ci-après. Préférentiellement, le métal déposé peut être, par exemple, de l'or ou du nickel ou un de leurs alliages.According to a second embodiment B, the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG. figure 6 , consisting in implementing a process of the LIGA type (a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung"). Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin. As this process of the LIGA type is well known, it will not be more detailed below. Preferably, the deposited metal may be, for example, gold or nickel or one of their alloys.

Dans l'exemple illustré à la figure 6, l'étape 107 peut consister à déposer un cylindre 29. Dans l'exemple illustré à la figure 6, le cylindre 29 est destiné à recevoir, avantageusement, par chassage un axe. En effet, un inconvénient du silicium réside dans ses très faibles zones élastique et plastique ce qui le rend très cassant. L'invention propose donc à réaliser le serrage d'un axe, par exemple, de balancier non pas contre le matériau à base de silicium de la virole 27, 27' ou 27" mais sur le diamètre intérieur 28 du cylindre métallique 29 électrodéposé lors de l'étape 107.In the example shown in figure 6 , step 107 may consist in depositing a cylinder 29. In the example illustrated in FIG. figure 6 , the cylinder 29 is intended to receive, advantageously, by driving an axis. Indeed, a disadvantage of silicon lies in its very weak elastic and plastic zones which makes it very brittle. The invention therefore proposes to perform the clamping of an axis, for example, balance not against the silicon-based material of the shell 27, 27 'or 27 "but on the inner diameter 28 of the metal cylinder 29 electrodeposited during of step 107.

Avantageusement selon le procédé 1, le cylindre 29 obtenu par électrodéposition laisse toute liberté quant à sa géométrie. Ainsi, notamment, le diamètre intérieur 28 n'est pas forcément circulaire mais, par exemple, polygonal ce qui pourrait permettre d'améliorer la transmission d'effort en rotation avec un axe de forme correspondante.Advantageously according to method 1, the cylinder 29 obtained by electroplating leaves full freedom as to its geometry. Thus, in particular, the inner diameter 28 is not necessarily circular but, for example, polygonal, which could make it possible to improve the transmission of rotational force with a correspondingly shaped axis.

Dans une septième étape 108, similaire à l'étape 105 visible à la figure 5, des cavités sont sélectivement gravées, par exemple, par un procédé du type DRIE, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités permettent de former des motifs semblables aux motifs 13, 15 et 22 du premier mode de réalisation A selon l'une des deux variantes.In a seventh step 108, similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.

A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc, à l'aide du second mode de réalisation B, un spiral à élévation de courbe monobloc formé en matériaux à base de silicium avec les mêmes avantages que le mode de réalisation A avec, en plus, une partie 29 en métal. On comprend donc qu'il n'y a plus de problème de réalisation car les parties sont directement formées sur des éléments fixes pendant la fabrication du spiral 21 ou 21'. Enfin, avantageusement, un axe peut être chassé contre le diamètre intérieur 28 de la partie métallique 29. Il est ainsi envisageable, préférentiellement, que les cavités 10 et/ou 18 selon la variante comportent des sections de plus grandes dimensions que celle du diamètre intérieur 28 de la partie métallique 29 afin d'éviter que l'axe soit en contact gras avec la virole 27, 27' ou 27".As a result of the final step 106 explained above, using a second embodiment of the second embodiment B, a one-piece curved elevation spiral formed of silicon-based materials with the same advantages as the embodiment A with, in addition, a portion 29 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '. Finally, advantageously, an axis can be driven against the internal diameter 28 of the metal part 29. It is thus possible, preferably, that the cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inner diameter. 28 of the metal part 29 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".

Selon un troisième mode de réalisation C, le procédé 1 comporte, après l'étape 103 ou 104, dans une sixième étape 109, comme visible à la figure 7, consistant à sélectivement graver une cavité 30, par exemple, par un procédé du type DRIE, selon une profondeur limitée dans la couche inférieure 7 en matériau à base de silicium. La cavité 30 permet de former un évidement apte à servir de contenant pour une partie métallique. Comme dans l'exemple illustré à la figure 7, la cavité 30 obtenue peut prendre la forme d'un disque. Cependant, avantageusement selon le procédé 1, la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie de la cavité 30.According to a third embodiment C, the method 1 comprises, after the step 103 or 104, in a sixth step 109, as visible at the figure 7 , selectively etching a cavity 30, for example, by a DRIE-type method, to a limited depth in the lower layer 7 of silicon-based material. The cavity 30 makes it possible to form a recess able to serve as a container for a metal part. As in the example shown in figure 7 the cavity 30 obtained may take the form of a disc. However, advantageously according to method 1, the etching on the lower layer 7 leaves all freedom on the geometry of the cavity 30.

Dans une septième étape 110, comme illustré à la figure 7, le procédé 1 comporte la mise en oeuvre d'un processus du type croissance galvanique ou du type LIGA permettant de combler la cavité 30 selon une forme métallique particulière. Préférentiellement, le métal déposé peut être, par exemple, de l'or ou du nickel ou un de leurs alliages.In a seventh step 110, as illustrated in FIG. figure 7 , Method 1 comprises the implementation of a galvanic growth type or LIGA type process for filling the cavity 30 in a particular metallic form. Preferably, the deposited metal may be, for example, gold or nickel or one of their alloys.

Dans l'exemple illustré à la figure 8, l'étape 110 peut consister à déposer un cylindre 31 dans la cavité 30. Le cylindre 31 est destiné à recevoir, avantageusement, par chassage un axe. En effet, comme déjà expliqué ci-dessus, une caractéristique avantageuse selon l'invention consiste à réaliser le serrage de l'axe, par exemple, de balancier non pas contre le matériau à base de silicium de la virole 27, 27' ou 27" mais sur le diamètre intérieur 32 du cylindre métallique 31 électrodéposé lors de l'étape 110.In the example shown in figure 8 , step 110 may consist in depositing a cylinder 31 in the cavity 30. The cylinder 31 is intended for receive, advantageously, by driving an axis. Indeed, as already explained above, an advantageous characteristic according to the invention is to achieve the clamping of the axis, for example, pendulum not against the silicon-based material of the shell 27, 27 'or 27 but on the inside diameter 32 of the metal cylinder 31 electrodeposited during step 110.

Avantageusement selon le procédé 1, le cylindre 31 obtenu par électrodéposition laisse toute liberté quant à sa géométrie. Ainsi, notamment, le diamètre intérieur 32 n'est pas forcément circulaire mais, par exemple, polygonal ce qui pourrait permettre d'améliorer la transmission d'effort en rotation avec un axe de forme correspondante.Advantageously according to method 1, the cylinder 31 obtained by electroplating leaves full freedom as to its geometry. Thus, in particular, the inner diameter 32 is not necessarily circular but, for example, polygonal which could improve the transmission of force in rotation with a corresponding shape of the axis.

Préférentiellement, le procédé 1 peut comporter une huitième étape 111 consistant à polir le dépôt métallique 31 réalisé lors de l'étape 110 afin de le rendre plan.Preferably, the method 1 may include an eighth step 111 of polishing the metal deposit 31 made in step 110 to make it plane.

Dans une neuvième étape 112, similaire à l'étape 105 visible à la figure 5, des cavités sont sélectivement gravées, par exemple, par un procédé du type DRIE, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités permettent de former des motifs semblables aux motifs 13, 15 et 22 du premier mode de réalisation A selon l'une des deux variantes.In a ninth step 112, similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form patterns similar to the patterns 13, 15 and 22 of the first embodiment A according to one of the two variants.

A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc, à l'aide du second mode de réalisation C, un spiral monobloc formé en matériaux à base de silicium avec les mêmes avantages que le mode de réalisation A avec, en plus, une partie 31 en métal. On comprend donc qu'il n'y a plus de problème de réalisation car les parties sont directement formées sur des éléments fixes pendant la fabrication du spiral 21 ou 21'. Enfin, avantageusement, un axe peut être chassé contre le diamètre intérieur 32 de la partie métallique. Il est ainsi envisageable, préférentiellement, que les cavités 10 et/ou 18 selon la variante comportent des sections de plus grandes dimensions que celle du diamètre intérieur 32 de la partie métallique 31 afin d'éviter que l'axe soit en contact gras avec la virole 27, 27' ou 27".As a result of the final step 106 explained above, therefore, using the second embodiment C, a monobloc spring formed of silicon-based materials with the same advantages as the embodiment A with in addition, a portion 31 of metal. It is therefore understood that there is no longer a problem of implementation because the parts are directly formed on fixed elements during the manufacture of the hairspring 21 or 21 '. Finally, advantageously, an axis can be driven against the inner diameter 32 of the metal part. It is thus possible, preferentially, that cavities 10 and / or 18 according to the variant comprise sections of larger dimensions than that of the inside diameter 32. the metal part 31 to prevent the axis is in bold contact with the ferrule 27, 27 'or 27 ".

Selon les trois modes de réalisation A, B et C, il faut comprendre que spiral final 21 ou 21' est ainsi assemblé avant d'être structuré, c'est-à-dire avant d'être gravé et/ou modifié par électrodéposition. Cela permet avantageusement de minimiser les dispersions engendrées par les fabrications actuelles et, par conséquent, améliore la précision d'un organe régulateur dont il serait dépendant.According to the three embodiments A, B and C, it should be understood that the final spiral 21 or 21 'is thus assembled before being structured, that is to say before being etched and / or modified by electroplating. This advantageously makes it possible to minimize the dispersions generated by the current fabrications and, consequently, improves the accuracy of a regulator member of which it would be dependent.

Avantageusement selon l'invention, on comprend également qu'il est possible que plusieurs spiraux à élévation de courbe 21 ou 21' puissent être réalisés sur le même substrat 3 ce qui autorise une production en série.Advantageously according to the invention, it is also understood that it is possible for several curve-rising spirals 21 or 21 'to be able to be produced on the same substrate 3, which authorizes mass production.

De plus, il est possible de réaliser un insert de chassage du type des dépôts métalliques 29 et/ou 31 également ou seulement à partir des couches supplémentaire 11 et/ou supérieure 5.In addition, it is possible to make a metal deposits type of firing insert 29 and / or 31 also or only from the additional layers 11 and / or greater 5.

Le procédé 1 peut comporter après l'étape 105, 108 ou 112, une étape du même type que celle 104 qui consisterait à oxyder le motif 15, c'est-à-dire la courbe terminale 23 ou le ressort-spiral 23' du spiral 21 ou 21' afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique. Une étape de polissage du type de l'étape 111 peut également être réalisée entre l'étape 107 et l'étape 108.Process 1 may comprise, after step 105, 108 or 112, a step of the same type as that which would consist in oxidizing the pattern 15, that is to say the end curve 23 or the spiral spring 23 'of the spiral 21 or 21 'to make it more mechanically strong and adjust its thermo-elastic coefficient. A polishing step of the type of step 111 can also be performed between step 107 and step 108.

Avantageusement selon l'invention, quel que soit le mode de réalisation A, B, ou C, le procédé 1 permet que l'étape 103 consistant à graver le ressort-spiral 25, 25' et la virole 27, 27' dans la couche supplémentaire 11 soit intervertie avec celle 105, 108 ou 112 consistant à graver la courbe terminale 23 ou le ressort-spiral 23' et la virole 27" dans la couche inférieure 7. Cela signifie que la courbe terminale 23 ou le ressort-spiral 23' et la virole 27" peuvent être gravés en premier sur la couche supplémentaire 11 puis le ressort-spiral 25, 25' et la virole 27, 27', dans la couche inférieure 7. On pourra dans ce cas réaliser, par exemple, l'oxydation selon l'étape 104, par exemple, de la courbe terminale 23 avant celle du ressort-spiral 25.Advantageously according to the invention, whatever the embodiment A, B, or C, the method 1 allows the step 103 of engraving the spiral spring 25, 25 'and the shell 27, 27' in the layer additional 11 is interchanged with that 105, 108 or 112 of engraving the end curve 23 or the spiral spring 23 'and the ferrule 27 "in the lower layer 7. This means that the end curve 23 or the spiral spring 23' and the ferrule 27 "can be etched first on the additional layer 11 and then the spiral spring 25, 25 'and the shell 27, 27', in the lower layer 7. In this case, it will be possible to produce, for example, the oxidation according to step 104, for example, of the end curve 23 before that of the spiral spring 25.

Il peut également être prévu qu'une couche conductrice soit déposée sur au moins une partie du spiral 21 ou 21' afin d'éviter des problèmes d'isochronisme. Une telle couche peut être du type divulgué dans le document EP 1 837 722 .It can also be expected that a conductive layer is deposited on at least a portion of the hairspring 21 or 21 'to avoid problems of isochronism. Such a layer may be of the type disclosed in the document EP 1 837 722 .

La hauteur de la virole 27 peut être plus limitée qu'aux figures 10 et 11 de la première variante illustrée, c'est-à-dire, par exemple, qu'elle peut se limiter aux couches 5 et 11. Les moyens d'élévation 4 peuvent également prendre une toute autre forme qu'une plaque rectangulaire courbe.The height of ferrule 27 may be more limited than Figures 10 and 11 of the first variant illustrated, that is to say, for example, it can be limited to the layers 5 and 11. The elevation means 4 can also take a completely different shape than a curved rectangular plate.

Enfin, il peut être envisagé au moins un deuxième pont de matière, afin de maintenir au substrat 3 le spiral 21 lors de sa fabrication, qui pourrait être réalisé entre la courbe externe du motif 19 et le reste de la couche 11 non gravée.Finally, it can be envisaged at least a second material bridge, to maintain the substrate 3 the hairspring 21 during its manufacture, which could be made between the outer curve of the pattern 19 and the remainder of the ungraved layer 11.

Claims (19)

  1. One-piece hairspring (21, 21'), which comprises a balance spring (25, 25') coaxially mounted on a collet (27, 27'), made in the same layer of silicon-based material, characterized in that it includes an elevation device (2, 2') for the outer coil of said balance spring, above said layer of silicon-based material so as to improve the concentric development of said hairspring and in that the elevation device (2, 2') includes elevation means (4, 4') connecting the outer coil of the balance spring (25, 25'), which are made in a second layer of silicon based material.
  2. Hairspring according to claim 1, characterized in that the elevation device (2) includes a terminal curve (23) connected to said elevation means (4) and formed in a third layer of silicon based material.
  3. Hairspring according to claim 2, characterized in that the terminal curve (23) is a Phillips curve.
  4. Hairspring according to any of the preceding claims, characterized in that the collet (27) includes one extended part (9, 13) that projects from said balance spring so as to improve the guiding of said hairspring.
  5. Hairspring according to claim 1, characterized in that the elevation device (2') includes a second balance spring (23') coaxially mounted on a second collet (27") connected to said elevation means (4') and formed in a third layer of silicon based material for forming a double series hairspring.
  6. Hairspring according to any of the preceding claims, characterized in that it includes at least one silicon dioxide part to make said hairspring more mechanically resistant and to adjust the thermo-elastic coefficient thereof.
  7. Hairspring according to any of the preceding claims, characterized in that at least one collet (27, 27', 27") has one metal part (29, 31) for receiving an arbour that is driven therein.
  8. Hairspring according to any of the preceding claims, characterized in that at least one balance spring (25, 25', 23') inner coil (26) has a Grossmann curve so as to improve the concentric development of said hairspring.
  9. Timepiece characterized in that it includes a one-piece hairspring (21, 21') according to any of the preceding claims.
  10. Method (1) of manufacturing a one-piece hairspring characterised in that it includes the following steps:
    a) providing (100) a substrate (3) including a top layer (5) and a bottom layer (7) of silicon-based materials,
    b) selectively etching (101) at least one cavity (8, 10) in the top layer (5) to define elevation means (4) made of silicon-based material, of said hairspring,
    c) joining (102) an additional layer (11) of silicon-based material to the etched top layer (5) of the substrate (3),
    d) selectively etching (103) at least one cavity (18, 20) in the additional layer (11) to continue the pattern of the elevation means (4) and to define the patterns of a balance spring (25) and a collet (27), made of silicon-based material, of said hairspring;
    e) selectively etching (105, 108, 112) at least one cavity (12, 14) in the bottom layer (7) to continue the pattern of the elevation means (4) and to define the pattern of a terminal curve (23);
    f) releasing (106) the one-piece hairspring (21) from the substrate.
  11. Method according to claim 10, characterized in that the etch of the balance spring (25) and collet (27) in step d) is reversed with that of the terminal curve (23) in step e).
  12. Method according to claim 10 or 11, characterized in that, a pattern (9, 13) of an extended part of the collet (27) is etched in at least one of the other layers of silicon-based material.
  13. Method (1) of manufacturing a one-piece hairspring characterised in that it includes the following steps:
    a) providing (100) a substrate (3) including a top layer (5) and a bottom layer (7) of silicon-based materials;
    b) selectively etching (101) at least one cavity (8, 10) in the top layer (5) to define elevation means (4) made of silicon-based material, of said hairspring;
    c) joining (102) an additional layer (11) of silicon-based material to the etched top layer (5) of the substrate (3);
    d) selectively etching (103) at least one cavity (18, 20) in the additional layer (11) to continue the pattern of the elevation means (4) and to define the patterns of a balance spring (25) and a collet (27), made of silicon-based material, of said hairspring;
    e) selectively etching (105, 108, 112) at least one cavity (12, 14) in the bottom layer (7) to continue the pattern of the elevation means (4) and to define the patterns of a second balance spring (23') and a second collet (27") in order to form a double hairspring (21') in series of a terminal curve (23);
    f) releasing (106) the one-piece hairspring (21) from the substrate.
  14. Method according to any of claims 10 to 13, characterized in that, after a step of etching a balance spring (25, 25', 23'), it further includes the following step:
    g) oxidising the balance spring (25, 25', 23'), made of silicon-based material, so as to make said balance spring more mechanically resistant and to adjust the thermo-elastic coefficient thereof.
  15. Method according to any of claims 10 to 14, characterized in that, prior to step e), it further includes the following step:
    h) selectively depositing (107, 110) at least one metal layer on the bottom layer to define the pattern of a metal part (29, 31) of said hairspring.
  16. Method according to claim 15, characterized in that step h) includes the following step:
    i) growing (107) said deposition by successive metal layers at least partially over the surface of the bottom layer so as to form the metal part (29) for receiving an arbour that is driven therein.
  17. Method according to claim 15, characterized in that step h) includes the following phases:
    j) selectively etching (109) at least one cavity (30) in the bottom layer for receiving the metal part (31);
    k) growing (110) said deposition by successive metal layers at least partially in said at least one cavity so as to form the metal part (31) for receiving an arbour, which is driven therein.
  18. Method according to any of claims 15 to 17, characterized in that step h) includes the following last phase:
    l)polishing (111) the metal deposition.
  19. Method according to any of claims 10 to 18, characterized in that several one-piece hairsprings (21, 21') are made on the same substrate (3).
EP08153598.1A 2008-03-28 2008-03-28 Monobloc elevated curve spiral and method for manufacturing same Active EP2105807B1 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
EP08153598.1A EP2105807B1 (en) 2008-03-28 2008-03-28 Monobloc elevated curve spiral and method for manufacturing same
TW098109548A TWI463282B (en) 2008-03-28 2009-03-24 One-piece hairspring and method of manufacturing the same
SG200902111-4A SG155873A1 (en) 2008-03-28 2009-03-26 One-piece hairspring and method of manufacturing the same
CN200910203911.3A CN101550978B (en) 2008-03-28 2009-03-27 One-piece hairspring and method for manufacturing same
JP2009081425A JP5243324B2 (en) 2008-03-28 2009-03-30 Monolithic hairspring and manufacturing method thereof
US12/414,309 US8296953B2 (en) 2008-03-28 2009-03-30 Method of manufacturing a one-piece hairspring
HK10103325.8A HK1138055A1 (en) 2008-03-28 2010-03-31 One-piece double balance spring and method of manufacturing the same
US13/601,128 US8622611B2 (en) 2008-03-28 2012-08-31 One-piece hairspring and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08153598.1A EP2105807B1 (en) 2008-03-28 2008-03-28 Monobloc elevated curve spiral and method for manufacturing same

Publications (2)

Publication Number Publication Date
EP2105807A1 EP2105807A1 (en) 2009-09-30
EP2105807B1 true EP2105807B1 (en) 2015-12-02

Family

ID=39929744

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08153598.1A Active EP2105807B1 (en) 2008-03-28 2008-03-28 Monobloc elevated curve spiral and method for manufacturing same

Country Status (7)

Country Link
US (2) US8296953B2 (en)
EP (1) EP2105807B1 (en)
JP (1) JP5243324B2 (en)
CN (1) CN101550978B (en)
HK (1) HK1138055A1 (en)
SG (1) SG155873A1 (en)
TW (1) TWI463282B (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2104005A1 (en) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Composite balance and method of manufacturing thereof
EP2104008A1 (en) * 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body regulating organ and method for manufacturing same
EP2151722B8 (en) * 2008-07-29 2021-03-31 Rolex Sa Hairspring for balance-spring resonator
CH699882A2 (en) * 2008-11-06 2010-05-14 Montres Breguet Sa Elevated curve hairspring e.g. breguet hairspring, for use in timepiece, has lifting device arranged between external layer of spring and terminal curve so as to increase concentric development of hairspring
EP2196867A1 (en) * 2008-12-15 2010-06-16 Montres Breguet S.A. Hairspring with curve elevation made from a silicon-based material
CH702156B1 (en) * 2009-11-13 2017-08-31 Nivarox Far Sa Spiral balance resonator for a timepiece.
GB201001897D0 (en) * 2010-02-05 2010-03-24 Levingston Gideon Non magnetic mateial additives and processes for controling the thermoelastic modulus and spring stiffness within springs for precision instruments
CH703172B1 (en) * 2010-05-18 2014-11-14 Montres Breguet Sa Spiral to rise silicon curve.
EP2397919B1 (en) * 2010-06-21 2017-11-08 Montres Breguet SA Manufacturing method for a hairspring assembly of a timepiece made of micro-machinable material or silicon
EP2405312A1 (en) * 2010-07-09 2012-01-11 Montres Breguet S.A. Balance hairspring with two levels and immobile mass centre
CH704649B1 (en) * 2011-03-23 2019-04-15 Lvmh Swiss Mft Sa Oscillating element for clock-setting device.
EP2570871B1 (en) * 2011-09-14 2014-03-19 Montres Breguet SA Hairspring with two spiral springs
EP2579104B1 (en) * 2011-10-07 2014-06-25 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Method for manufacturing a composite timepiece
EP2607974A1 (en) 2011-12-22 2013-06-26 The Swatch Group Research and Development Ltd. Method for manufacturing a resonator
EP2613206B1 (en) * 2012-01-05 2022-05-11 Montres Breguet SA Hairspring with two spiral springs with improved isochronism
JP5961755B2 (en) * 2012-06-28 2016-08-02 ニヴァロックス−ファー ソシエテ アノニム Clock spring
EP2690506B1 (en) * 2012-07-25 2015-01-14 Nivarox-FAR S.A. Anti-tripping clock hairspring
HK1193537A2 (en) 2013-07-29 2014-09-19 Master Dynamic Ltd Silicon overcoil balance spring
JP6345493B2 (en) * 2014-02-25 2018-06-20 シチズン時計株式会社 Hairspring
EP2952972B1 (en) * 2014-06-03 2017-01-25 The Swatch Group Research and Development Ltd. Method for manufacturing a composite compensator spiral
FR3032810B1 (en) * 2015-02-13 2017-02-24 Tronic's Microsystems MECHANICAL OSCILLATOR AND METHOD OF MAKING SAME
CH710759A2 (en) * 2015-02-20 2016-08-31 Nivarox Far Sa Oscillator for a timepiece.
EP3106930A1 (en) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Manufacturing method comprising a modified machining step
EP3159747A1 (en) * 2015-10-22 2017-04-26 ETA SA Manufacture Horlogère Suisse Compact hairspring with constant cross-section
EP3483666A1 (en) * 2017-11-10 2019-05-15 Patek Philippe SA Genève Device for guiding the rotation of a mobile component
TWI774925B (en) 2018-03-01 2022-08-21 瑞士商Ｃｓｅｍ瑞士電子及微技術研發公司 Method for manufacturing a spiral spring
EP3543796A1 (en) * 2018-03-21 2019-09-25 Nivarox-FAR S.A. Method for manufacturing a silicon hairspring
EP3557333B1 (en) * 2018-04-16 2020-11-04 Patek Philippe SA Genève Method for manufacturing a timepiece mainspring
EP3839626B1 (en) * 2019-12-18 2023-10-11 Nivarox-FAR S.A. Method for manufacturing a timepiece component

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3553956A (en) 1969-09-11 1971-01-12 Timex Corp Double hairspring clamping device
FR2315714A1 (en) * 1975-06-27 1977-01-21 Anvar End coupling for spiral spring - is used in timepiece or measuring instrument and positioned in different plane to spring
JPS6055655A (en) * 1983-09-07 1985-03-30 Nissan Motor Co Ltd Semiconductor device having beam structure
FR2700065B1 (en) * 1992-12-28 1995-02-10 Commissariat Energie Atomique Method of manufacturing accelerometers using silicon on insulator technology.
FR2731715B1 (en) * 1995-03-17 1997-05-16 Suisse Electronique Microtech MICRO-MECHANICAL PART AND METHOD FOR PRODUCING THE SAME
JP2002341054A (en) * 2001-05-11 2002-11-27 Seiko Instruments Inc Hair spring, its structural body, and speed governing mechanism and timepiece using it
DE10127733B4 (en) * 2001-06-07 2005-12-08 Silicium Energiesysteme E.K. Dr. Nikolaus Holm Screw or spiral spring elements of crystalline, in particular monocrystalline silicon
EP1302821A3 (en) * 2001-10-10 2010-05-05 Franck Muller-Watchland SA Balance-spring for time measuring apparatus
EP1422436B1 (en) 2002-11-25 2005-10-26 CSEM Centre Suisse d'Electronique et de Microtechnique SA Spiral watch spring and its method of production
US7148603B1 (en) * 2002-11-27 2006-12-12 Sandia Corporation Mechanically latchable tiltable platform for forming micromirrors and micromirror arrays
CH695395A5 (en) 2003-02-06 2006-04-28 Eta Sa Mft Horlogere Suisse Hairspring for balance wheel-hairspring resonator of watch, has self-locking washer with triangular contour in its central opening to subject hairspring to pin of balance wheel, where contour has openings formed through washer
EP1445670A1 (en) 2003-02-06 2004-08-11 ETA SA Manufacture Horlogère Suisse Balance-spring resonator spiral and its method of fabrication
EP2224293B1 (en) * 2003-04-29 2012-07-18 Patek Philippe SA Genève Balance and flat hairspring regulator for a watch movement
EP1519250B1 (en) * 2003-09-26 2010-06-30 Asulab S.A. Thermally compensated balance-hairspring resonator
JP2005140674A (en) * 2003-11-07 2005-06-02 Seiko Epson Corp Spring, spiral spring and hair spring for watch, and watch
ATE421720T1 (en) 2004-04-06 2009-02-15 Nivarox Sa SPIRAL ROLL WITHOUT DEFORMATION OF THE FIXATION RADIUS OF THE SPIRAL SPRING AND PRODUCTION METHOD OF SUCH SPIRAL ROLL
EP1605323A3 (en) 2004-04-13 2006-07-12 Coredem S.A. Spiral spring for mechanical clockwork
EP1612627B1 (en) 2004-07-02 2009-05-06 Nivarox-FAR S.A. Bi-material autocompensating hairspring
JP2006214821A (en) * 2005-02-02 2006-08-17 Seiko Instruments Inc Mechanical timepiece with regulating mechanism
EP1818736A1 (en) * 2006-02-09 2007-08-15 The Swatch Group Research and Development Ltd. Shockproof collet
EP1837722B1 (en) 2006-03-24 2016-02-24 ETA SA Manufacture Horlogère Suisse Micro-mechanical component in an insulating material and method of manufacture thereof
KR20070096834A (en) * 2006-03-24 2007-10-02 에타 쏘시에떼 아노님 마누팍투레 홀로게레 스위세 Micro-mechanical part made of insulating material and method of manufacturing the same
CH699882A2 (en) * 2008-11-06 2010-05-14 Montres Breguet Sa Elevated curve hairspring e.g. breguet hairspring, for use in timepiece, has lifting device arranged between external layer of spring and terminal curve so as to increase concentric development of hairspring
EP2196867A1 (en) * 2008-12-15 2010-06-16 Montres Breguet S.A. Hairspring with curve elevation made from a silicon-based material
CH703172B1 (en) * 2010-05-18 2014-11-14 Montres Breguet Sa Spiral to rise silicon curve.

Also Published As

Publication number Publication date
JP5243324B2 (en) 2013-07-24
CN101550978B (en) 2012-09-05
US20090245030A1 (en) 2009-10-01
US8622611B2 (en) 2014-01-07
EP2105807A1 (en) 2009-09-30
TWI463282B (en) 2014-12-01
HK1138055A1 (en) 2010-08-13
JP2009244266A (en) 2009-10-22
SG155873A1 (en) 2009-10-29
CN101550978A (en) 2009-10-07
TW201003341A (en) 2010-01-16
US8296953B2 (en) 2012-10-30
US20120320718A1 (en) 2012-12-20

Similar Documents

Publication Publication Date Title
EP2105807B1 (en) Monobloc elevated curve spiral and method for manufacturing same
EP2104006B1 (en) Single-body double spiral and method for manufacturing same
EP2257856B1 (en) Integral adjusting member and method for making same
EP2257855B1 (en) Process of manufacturing of a composite balance
EP2259997B2 (en) Method for manufacturing a composite silicon-metal micromechanical component
EP2196868B1 (en) Hairspring with curve elevation made from a silicon-based material
WO2009115470A1 (en) Integral hairspring made of a silicon-based material and method for making same
EP1612627B1 (en) Bi-material autocompensating hairspring
EP2326995B1 (en) Gear system for a timepiece
EP2145237A2 (en) Timepiece component and method for making same
EP1445670A1 (en) Balance-spring resonator spiral and its method of fabrication
EP2520984B1 (en) Barrel comprising additional resilient means for the accumulation of energy
EP3202708A1 (en) Method for manufacturing a hybrid clock component
CH710112B1 (en) Mechanical component, manufacturing process of a mechanical component, movement and timepiece.
EP2309341B1 (en) Manufacturing method of a loose-mounted wheel made from a micro-machinable material
CH705433B1 (en) Manufacturing micromechanics composite silicon-metal part useful in clock element, comprises manufacturing substrate with upper and lower layers, and selectively etching cavity in upper layer to define pattern in portion of silicon part
CH706252B1 (en) Method for manufacturing integral single-piece spiral of clock element, involves selectively engraving cavity in additional layer to define portion for spiral spring made of material containing silicon, and releasing spiral of substrate
EP3412625A1 (en) Method for manufacturing a micromechanical part
CH707297B1 (en) Single-piece regulating element for timepiece, has balancer cooperating with spiral having hairspring mounted coaxially on ferrule, where axial extension portion of ferrule is connected to balancer as single-piece
CH704889B1 (en) barrel spring with additional energy storage curvatures.
CH704890A2 (en) Barrel for timepiece, has spring torque increasing device including energy accumulating units formed by elastic protuberances mounted on portion of spring coils such that torque of barrel is personalized based on winding tension of spring

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA MK RS

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MONTRES BREGUET SA

17P Request for examination filed

Effective date: 20100330

17Q First examination report despatched

Effective date: 20100506

AKX Designation fees paid

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20150508

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 763887

Country of ref document: AT

Kind code of ref document: T

Effective date: 20151215

Ref country code: CH

Ref legal event code: EP

Ref country code: CH

Ref legal event code: NV

Representative=s name: ICB INGENIEURS CONSEILS EN BREVETS SA, CH

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602008041359

Country of ref document: DE

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 9

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20160302

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 763887

Country of ref document: AT

Kind code of ref document: T

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160302

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160303

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160404

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160402

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160331

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602008041359

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

Ref country code: LU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160328

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

26N No opposition filed

Effective date: 20160905

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160328

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 10

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 11

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20080328

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20151202

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230611

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240220

Year of fee payment: 17

Ref country code: GB

Payment date: 20240220

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20240221

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20240401

Year of fee payment: 17