EP1837722B1 - Micro-mechanical component in an insulating material and method of manufacture thereof - Google Patents

Micro-mechanical component in an insulating material and method of manufacture thereof Download PDF

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Publication number
EP1837722B1
EP1837722B1 EP07104385.5A EP07104385A EP1837722B1 EP 1837722 B1 EP1837722 B1 EP 1837722B1 EP 07104385 A EP07104385 A EP 07104385A EP 1837722 B1 EP1837722 B1 EP 1837722B1
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EP
European Patent Office
Prior art keywords
balance
conductive material
insulating material
micro
silicon
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EP07104385.5A
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German (de)
French (fr)
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EP1837722A3 (en
EP1837722A2 (en
Inventor
Thierry Conus
Marc Lippuner
Philippe Marmy
Benjamin Krähenbühl
Michael Reber
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ETA Manufacture Horlogere Suisse SA
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ETA Manufacture Horlogere Suisse SA
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Priority claimed from EP06111727A external-priority patent/EP1837721A1/en
Priority claimed from CH00595/06A external-priority patent/CH707669B1/en
Application filed by ETA Manufacture Horlogere Suisse SA filed Critical ETA Manufacture Horlogere Suisse SA
Priority to EP07104385.5A priority Critical patent/EP1837722B1/en
Publication of EP1837722A2 publication Critical patent/EP1837722A2/en
Publication of EP1837722A3 publication Critical patent/EP1837722A3/en
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Publication of EP1837722B1 publication Critical patent/EP1837722B1/en
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    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00Escapements
    • G04B15/14Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/063Balance construction
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/066Manufacture of the spiral spring

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)

Description

Domaine techniqueTechnical area

La présente invention concerne une pièce de micro-mécanique réalisée en un matériau isolant, et plus particulièrement une pièce fixe ou mobile d'un mouvement horloger dont la proximité d'autres pièces ne perturbe pas le fonctionnement d'une pièce mobile, directement, ou indirectement par l'attraction de particules.The present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.

Arrière plan technologiqueTechnological background

Les matériaux isolants, tels que le silicium et ses composés, le quartz, le diamant, le verre, la céramique ou autres sont de plus en plus utilisés pour réaliser des pièces de micro-mécanique horlogère, qu'il s'agisse de pièces fixes, telles que des platines ou des ponts, ou de pièces mobiles faisant par exemple partie de la chaîne cinématique, ou du système réglant telles que le spiral, le balancier ou l'échappement.Insulating materials, such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.

On a observé, en particulier sur un spiral totalement isolé des autres pièces par exemple par pitonnage et collage au moyen d'une colle non conductrice, que l'emploi du silicium avait un inconvénient. En effet au bout d'un certain temps de fonctionnement, un certain nombre de spires situées entre la courbe à l'extérieur et la courbe à l'intérieur du spiral a tendance à venir se coller au coq, ce qui nuit forcément à l'isochronisme du système réglant. Le même phénomène pourrait être observé avec d'autres pièces réalisées en silicium ou en un autre matériau isolant, ce qui aurait également au final un effet néfaste sur l'isochronisme.It has been observed, in particular on a spiral completely isolated from other parts for example by pitting and gluing by means of a non-conductive glue, that the use of silicon had a disadvantage. Indeed, after a certain period of operation, a number of turns located between the curve on the outside and the curve inside the spiral tends to stick to the cock, which necessarily adversely affects the isochronism of the regulating system. The same phenomenon could be observed with other parts made of silicon or another insulating material, which would also ultimately have a detrimental effect on isochronism.

Le document EP 1 422 436 divulgue la fabrication d'un ressort-spiral à partir du découpage d'une plaque en silicium monocristallin. Le ressort-spiral comporte un revêtement en oxyde de silicium afin de minimiser sa dérive thermique.The document EP 1 422 436 discloses the manufacture of a spiral spring from the cutting of a monocrystalline silicon plate. The coil spring has a silicon oxide coating to minimize thermal drift.

Le document US 2002/171150 divulgue la fabrication d'une structure mobile en silicium dont des faces sont revêtues de siliciure métallique afin de limiter l'influence induite par des charges électrostatiques.The document US 2002/171150 discloses the manufacture of a mobile silicon structure whose faces are coated with metal silicide in order to limit the influence induced by electrostatic charges.

Le document US 2002/0060954 divulgue un mouvement électronique dont la génératrice est freinée magnétiquement par une référence temporelle à quartz.The document US 2002/0060954 discloses an electronic movement whose generator is braked magnetically by a quartz time reference.

Le document EP 1 482 282 divulgue un mouvement électronique avec un dispositif de détection des moyens d'affichage afin de corriger automatiquement des déplacements indus des moyens d'affichage.The document EP 1 482 282 discloses an electronic movement with a display means detecting means for automatically correcting undue movements of the display means.

Résumé de l'inventionSummary of the invention

La présente invention vise donc à apporter une solution au problème évoqué ci-dessus en procurant une pièce de micro-mécanique fixe ou mobile réalisée en un matériau isolant dont un traitement de surface permet d'éviter le risque de collage.The present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.

A cet effet l'invention a pour objet une pièce de micro-mécanique réalisée en un matériau isolant, tel que le silicium, et ses composés, le diamant, le verre, la céramique ou autres, dont tout ou une partie de sa surface est revêtue d'un mince dépôt d'un matériau conducteur électrique tel qu'une couche d'un matériau métallique ou d'un matériau non métallique conducteur. Le dépôt conducteur présente de préférence une épaisseur inférieure à 50 nm. Ce très mince dépôt invisible à l'oeil nu, mais décelable par les moyens d'analyse actuels permet de supprimer les risques d'attraction et de collage par une pièce voisine, cette attraction pouvant être due à des pouvant être due à des frottements ou des tensions susceptible de créer dans la pièce des charges électrostatiques.For this purpose the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin deposit of an electrically conductive material such as a layer of a metallic material or a conductive non-metallic material. The conductive deposit preferably has a thickness of less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and bonding by a neighboring room, this attraction may be due to may be due to friction or tension that can create electrostatic charges in the room.

Ce dépôt peut être effectué sur une pièce en matériau isolant monobloc ou composite, c'est-à-dire dont au moins la surface extérieure est en matériau isolant.This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.

Parmi les matériaux permettant d'atteindre le but sus-indiqué on choisit de préférence les métaux inoxydables et amagnétiques tels que l'or, le platine, le rhodium, le palladium.Among the materials making it possible to achieve the above-mentioned purpose, the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen.

Parmi les matériaux conducteurs non métalliques on choisira de préférence un matériau parmi l'ensemble comprenant le graphite, le carbone, le silicium dopé, et les polymères conducteurs.
Ces métaux peuvent être déposés par des procédés connus permettant de contrôler l'épaisseur en ajustant les conditions opératoires, par exemple par sputtering, PVD, dopage, implantation ionique ou par un procédé électrolytique. Les mêmes techniques pourront être utilisées pour déposer les matériaux non métalliques conducteurs.
Among the non-metallic conductive materials one will preferably choose one of the group comprising graphite, carbon, doped silicon, and conductive polymers.
These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process. The same techniques can be used to deposit conductive non-metallic materials.

Dans un mode d'application préféré, ladite pièce de micro-mécanique est une pièce de la chaîne cinématique d'un mouvement horloger, telle qu'un spiral, une ancre, une roue d'échappement ou une roue dentée, ou n'importe quelle autre pièce fixe pouvant par exemple constituer le palier de l'axe d'un mobile. Dans la description détaillée qui va suivre, l'invention sera plus particulièrement illustrée par un spiral qui est la pièce la plus sensible d'un mouvement horloger.In a preferred embodiment, said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile. In the following detailed description, the invention will be more particularly illustrated by a hairspring which is the most sensitive part of a watch movement.

L'invention concerne également une pièce d'horlogerie intégrant une telle pièce de micro-mécanique.The invention also relates to a timepiece incorporating such a micro-mechanical part.

Brève description des dessinsBrief description of the drawings

D'autres caractéristiques et avantages de la présente invention apparaîtront plus clairement dans la description qui suit d'un exemple de réalisation, donné à titre illustratif et non limitatif, en référence aux dessins annexés dans lesquels :

  • la figure 1 représente en vue de dessus partiellement arrachée un balancier-spiral pourvu d'un spiral traité selon l'invention, et
  • la figure 2 est une représentation en coupe selon la ligne II-II de la figure 1, avec représentation de la partie arrachée.
Other features and advantages of the present invention will appear more clearly in the following description of an example embodiment, given by way of nonlimiting illustration, with reference to the appended drawings in which:
  • the figure 1 represents in plan view partially cut away a sprung balance provided with a spiral treated according to the invention, and
  • the figure 2 is a sectional representation along line II-II of the figure 1 , with representation of the part torn off.

Description détaillée de l'inventionDetailed description of the invention

L'invention sera plus particulièrement illustrée par un dispositif réglant balancier-spiral représenté à la figure 1, dans lequel le spiral 1 est réalisé, à titre d'exemple, en silicium, en adaptant les procédés de micro-usinage employés dans la fabrication de circuits intégrés ou d'accéléromètres à partir d'une plaquette de silicium ou de tout autre matériau isolant amorphe ou cristallin. On peut par exemple effectuer une attaque chimique par voie humide, un usinage à sec par plasma ou une gravure ionique réactive (RIE) en utilisant des masques appropriés au contour souhaité pour le spiral.The invention will be more particularly illustrated by a sprung balance adjusting device shown in FIG. figure 1 , in which the spiral 1 is made, for example, of silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material. For example, wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.

Compte tenu des petites dimensions, une même plaquette de silicium permet de fabriquer un lot de spiraux dont les caractéristiques sont déterminées par l'épaisseur de la plaquette et la forme des masques, lesdites caractéristiques étant calculées pour un fonctionnement du spiral dans un plan.Given the small dimensions, the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.

En se référant maintenant à la figure 2, dont la représentation en coupe est limitée au spiral 1 et au coq 9, on a représenté dans la partie gauche le comportement des spires 11 au bout d'un certain temps de fonctionnement lorsque le spiral 1 n'a subi aucun traitement. Comme on peut le voir, les spires 11 s'écartent de leur position normale représentée en pointillés en étant attirées par le coq 9 et peuvent même venir coller à celui-ci, ce qui perturbe évidemment la marche normale, c'est-à-dire une marche n'ayant que des mouvements d'extension/contraction dans un plan.Referring now to the figure 2 , whose sectional representation is limited to the hairspring 1 and the cock 9, there is shown in the left side the behavior of the turns 11 after a certain time of operation when the hairspring 1 has not undergone any treatment. As can be seen, the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.

Dans la partie droite on a représenté le spiral 1 après traitement, la ligne en pointillés représentant la position qu'occuperaient les spires 11 en absence de traitement. Comme on le voit le spiral reste parfaitement dans un plan. On s'est en effet aperçu de façon surprenante qu'en effectuant un traitement consistant en un très faible dépôt d'un matériau conducteur électrique tel qu'un matériau métallique sur tout ou partie de la surface des spires, on annihilait l'effet néfaste précédemment décrit, sans pour autant modifier les propriétés mécaniques intrinsèques du spiral. Par "très faible dépôt", on entend un dépôt ayant une épaisseur inférieure à 50 nm de préférence comprise entre 10 et 20nm. Lorsque le dépôt est inférieur à 50 nm, les propriétés mécaniques intrinsèques de la pièce ne sont pas modifiées et le dépôt est invisible à l'oeil nu, mais néanmoins décelable par les techniques actuelles d'analyse. Le matériau utilisé est de préférence un métal inoxydable et amagnétique tel que l'or, le platine, le rhodium, le palladium, lorsqu'il s'agit d'un matériau conducteur métallique. Ce dépôt peut être effectué au moyen de divers procédés connus, tels que le sputtering, le dépôt PVD, l'implantation ionique ou le dépôt électrolytique.In the right part is shown spiral 1 after treatment, the dotted line representing the position that would occupy the turns 11 in the absence of treatment. As we see the spiral stays perfectly in a plane. Surprisingly, it has been found that by carrying out a treatment consisting of a very small deposition of an electrically conductive material such as a metallic material on all or part of the surface of the turns, the harmful effect is annihilated. previously described, without modifying the intrinsic mechanical properties of the spiral. "Very low deposition" means a deposit having a thickness of less than 50 nm, preferably between 10 and 20 nm. When the deposit is less than 50 nm, the intrinsic mechanical properties of the part are not modified and the deposit is invisible to the naked eye, but nevertheless detectable by the current analysis techniques. The material used is preferably a stainless and non-magnetic metal such as gold, platinum, rhodium, palladium, when it is a metallic conductive material. This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.

A titre d'exemple on a effectué un dépôt d'or de 15 nm par "sputtering", c'est-à-dire en effectuant une métallisation par pulvérisation cathodique sous vide, avec une cible en or, en appliquant un courant de 60 mA pendant 15 secondes.By way of example, a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a current of 60 mA for 15 seconds.

Lorsque un matériau conducteur non métallique est déposé on le choisira de préférence parmi l'ensemble comprenant le graphite, le carbone, le silicium dopé, et les polymères conducteurs et on utilisera des techniques de dépôt et des épaisseurs comme mentionnées ci-dessus.When a non-metallic conductive material is deposited, it will preferably be chosen from the group comprising graphite, carbon, doped silicon, and conducting polymers and deposition techniques and thicknesses as mentioned above will be used.

On vient de décrire un spiral en silicium, mais d'autres matériaux amorphes ou cristallins non conducteurs peuvent également être utilisés, tels qu'indiqués précédemment, et être traités avec une métallisation superficielle évitant les risques d'attraction ou de collage.A silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.

Il est également possible d'utiliser un matériau composite pour réaliser par exemple un spiral ayant une âme en silicium et un revêtement épais en dioxyde de silicium sur lequel sera effectué le dépôt de matériau conducteur de faible épaisseur.It is also possible to use a composite material to produce for example a hairspring having a silicon core and a thick coating of silicon dioxide on which the deposition of conductive material of small thickness will be performed.

Un "matériau composite" peut également comprendre une âme métallique noyée dans un matériau isolant.A "composite material" may also include a metal core embedded in an insulating material.

Claims (8)

  1. Balance-spring made of at least one insulating material and to be integrated in a timepiece movement, said insulating material including a silicon core on which a silicon dioxide coating is formed with a thickness greater than 50 nm, characterized in that all or part of the surface of the balance-spring is coated with a deposition of conductive material.
    that it.
  2. Balance-spring according to the preceding claim, characterized in that the conductive material is a metallic material.
  3. Balance-spring according to the preceding claim, characterized in that the metal is selected from among gold, platinum, rhodium and palladium.
  4. Balance-spring according to claim 1, characterized in that the conductive material is a non-metallic conductive material.
  5. Balance-spring according to the preceding claim, characterized in that the non-metallic conductive material is selected from among graphite, carbon, doped silicon and conductive polymers.
  6. Balance-spring according to any of the preceding claims, characterized in that the deposition of conductive material has a thickness of less than 50 nm.
  7. Balance-spring according to any of the preceding claims, characterized in that the deposition of conductive material has a thickness comprised between 10 and 20 nm.
  8. Timepiece including a micro-mechanical part according to any of the preceding claims.
EP07104385.5A 2006-03-24 2007-03-19 Micro-mechanical component in an insulating material and method of manufacture thereof Active EP1837722B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP07104385.5A EP1837722B1 (en) 2006-03-24 2007-03-19 Micro-mechanical component in an insulating material and method of manufacture thereof

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06111727A EP1837721A1 (en) 2006-03-24 2006-03-24 Micro-mechanical piece made from insulating material and method of manufacture therefor
CH00595/06A CH707669B1 (en) 2006-04-10 2006-04-10 micro-mechanical part of electrically insulating material or silicon or its compounds and its manufacturing process.
EP07104385.5A EP1837722B1 (en) 2006-03-24 2007-03-19 Micro-mechanical component in an insulating material and method of manufacture thereof

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EP1837722A2 EP1837722A2 (en) 2007-09-26
EP1837722A3 EP1837722A3 (en) 2008-06-04
EP1837722B1 true EP1837722B1 (en) 2016-02-24

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EP2104008A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body regulating organ and method for manufacturing same
EP2104005A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Composite balance and method of manufacturing thereof
DE602008001778D1 (en) 2008-03-20 2010-08-26 Nivarox Sa Monoblock double spiral and its manufacturing process
EP2104007A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body spiral made from a silicon-based material and manufacturing method
EP2105807B1 (en) * 2008-03-28 2015-12-02 Montres Breguet SA Monobloc elevated curve spiral and method for manufacturing same
CH699882A2 (en) 2008-11-06 2010-05-14 Montres Breguet Sa Elevated curve hairspring e.g. breguet hairspring, for use in timepiece, has lifting device arranged between external layer of spring and terminal curve so as to increase concentric development of hairspring
US10324419B2 (en) 2009-02-06 2019-06-18 Domasko GmbH Mechanical oscillating system for a clock and functional element for a clock
WO2010088891A2 (en) * 2009-02-06 2010-08-12 Konrad Damasko Mechanical oscillating system for watches and functional element for watches
CH703172B1 (en) 2010-05-18 2014-11-14 Montres Breguet Sa Spiral to rise silicon curve.
EP2920653A1 (en) 2012-11-16 2015-09-23 Nivarox-FAR S.A. Resonator that is less sensitive to climatic variations
EP2781968A1 (en) 2013-03-19 2014-09-24 Nivarox-FAR S.A. Resonator that is less sensitive to climate variations
HK1209578A2 (en) 2015-02-17 2016-04-01 Master Dynamic Ltd Silicon hairspring
JP6629854B2 (en) 2015-06-15 2020-01-15 シチズン時計株式会社 Clock governor
EP3534222A1 (en) * 2018-03-01 2019-09-04 Rolex Sa Method for producing a thermally compensated oscillator
EP3742237A1 (en) * 2019-05-23 2020-11-25 Nivarox-FAR S.A. Component, in particular for a timepiece, with a surface topology and manufacturing method thereof
EP3859449A1 (en) * 2020-01-30 2021-08-04 ETA SA Manufacture Horlogère Suisse Hairspring driving cord

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EP1837722A3 (en) 2008-06-04
EP1837722A2 (en) 2007-09-26

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