EP3859449A1 - Hairspring driving cord - Google Patents

Hairspring driving cord Download PDF

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Publication number
EP3859449A1
EP3859449A1 EP20154530.8A EP20154530A EP3859449A1 EP 3859449 A1 EP3859449 A1 EP 3859449A1 EP 20154530 A EP20154530 A EP 20154530A EP 3859449 A1 EP3859449 A1 EP 3859449A1
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EP
European Patent Office
Prior art keywords
electrically conductive
conductive layer
watch
deposition method
hairspring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20154530.8A
Other languages
German (de)
French (fr)
Inventor
Sylvain Huot-Marchand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ETA SA Manufacture Horlogere Suisse
Original Assignee
ETA SA Manufacture Horlogere Suisse
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ETA SA Manufacture Horlogere Suisse filed Critical ETA SA Manufacture Horlogere Suisse
Priority to EP20154530.8A priority Critical patent/EP3859449A1/en
Priority to US17/146,793 priority patent/US20210240141A1/en
Priority to JP2021006883A priority patent/JP7164641B2/en
Priority to CN202110127601.9A priority patent/CN113267987A/en
Priority to KR1020210013657A priority patent/KR20210098388A/en
Publication of EP3859449A1 publication Critical patent/EP3859449A1/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/066Manufacture of the spiral spring
    • GPHYSICS
    • G04HOROLOGY
    • G04DAPPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0089Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the regulating mechanism, e.g. coil springs
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/32Component parts or constructional details, e.g. collet, stud, virole or piton
    • G04B17/325Component parts or constructional details, e.g. collet, stud, virole or piton for fastening the hairspring in a fixed position, e.g. using a block
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/02Processes for applying liquids or other fluent materials performed by spraying
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/02Coating starting from inorganic powder by application of pressure only
    • C23C24/04Impact or kinetic deposition of particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05FSTATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00Carrying-off electrostatic charges

Definitions

  • the present invention relates to an oscillating system for a clockwork movement.
  • the present invention relates in particular to an oscillating system comprising a clock hairspring from which electrostatic charges can be eliminated.
  • the material used for making the balance springs is usually an alloy based on iron, cobalt, nickel and chromium. Ductile, such an alloy must resist corrosion. Recent developments suggest making the balance springs out of silicon. Due to their very small dimensions and the friction with the air and between the turns, the spirals tend to become charged with static electricity, so that the turns stick to each other. The balance springs are then unusable as they are.
  • the current methods aiming to discharge the electrostatic charges in the movement via the eyebolt involve an electrically conductive adhesive binding the eyebolt and balance spring. It is generally the mixture of a photo- or UV-curable adhesive and conductive particles. But these particles interfere with the crosslinking of the whole. This can lead to partial crosslinking and therefore piton-hairspring separation, which is detrimental to the operation of the oscillator.
  • Another solution is to increase the crosslinking time significantly, but this goes against industrial production rates.
  • the electrostatic charges can be located elsewhere than on the hairspring but in the environment close to the latter, for example a component made of insulating material initially charged during assembly or charged during movement.
  • the present invention provides an oscillating system for a clockwork movement comprising a clockwork balance spring from which electrostatic charges can be eliminated.
  • said watch hairspring comprises at least one inner coil fixed by a ferrule and at least one outer coil fixed by said eyebolt.
  • said at least one first electrically conductive layer is deposited on the outside of said peak.
  • said at least one first electrically conductive layer can be easily deposited.
  • the deposition of said first electrically conductive layer is carried out by an atomizer.
  • said atomizer comprises said at least one first electroconductive layer in liquid form surrounded by a sheathing gas so as to be unidirectional.
  • said atomizer is unidirectional.
  • said first electrically conductive layer comprises a continuous electrically conductive layer and / or a plurality of discrete electrically conductive layers so as to form a continuous electrically conductive layer.
  • said at least one dimension is the length of said watch hairspring.
  • the figure 1 illustrates a method of depositing 500 of an electrically conductive layer on an oscillating system 100 of a watch movement comprising a watch balance spring 101 with at least one inner coil fixed by a ferrule and at least one outer coil 105 fixed by a stud 102.
  • One of the steps of said deposition process 500 is the supply 510 of said oscillating system 100. This is followed by the deposition of at least one first electrically conductive layer 110 by an atomizer 900 electrically connecting said at least one outer coil 105 and said pin 102. . preferably, said first electrically conductive layer 110 includes a continuous electrically conductive layer 111 and / or a plurality of discrete electrically conductive layers 115 so as to form a continuous electrically conductive layer 111.
  • Said at least one first electrically conductive layer 110 more particularly, said continuous electrically conductive layer 111 is deposited and / or said plurality of discrete electrically conductive layers 115 are deposited on the outside of said peak 102, more exactly on the part of said peak 102 being on the outside. of said watch hairspring 101 because it is easier to reach than the part which faces the turns of said watch hairspring 101.
  • Said atomizer 900 is configured to deposit said at least one first electroconductive layer 110 in liquid form surrounded by a sheath gas 119 so as to be unidirectional and therefore deposit said first electroconductive layer 110 on said at least one dimension, preferably the length of said watch balance spring 101, and representing at least 1%, in particular 5%, preferably 10% and / or at most 90%, in particular at most 75%, preferably at most 50% of at least one dimension of said watch balance spring 101.
  • said atomizer 900 being unidirectional, the deposition of said at least one first electroconductive layer 110 may only partially cover the width of said watch hairspring 101 but perhaps not the whole of the width of said watch hairspring 101 which makes it possible to avoid a change in characteristic of said watch balance spring 101 such as for example its inertia or its frequency, or a modification of its elastic response.
  • the deposition process is economical by virtue of its simplicity, and the little material deposited.
  • this deposition process does not expose employees to potentially dangerous particles during said preparation of these glues or during deposition due to their inhalation. because the spraying is rarely directional or even unidirectional.
  • Another disadvantage to conventional spraying is that this can pollute nearby moving components such as the escapement or the balance axle and therefore disrupt their tribological functions.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Springs (AREA)

Abstract

La présente invention concerne un procédé de dépôt (500) d'une couche électroconductrice reliant électriquement au moins une spire extérieure (105) et un piton (102) et représentant au moins 1%, notamment 5%, de préférence 10% et/ou au plus 90%, notamment au plus 75%, de préférence au plus 50% d'au moins une dimension d'un spiral horloger (101).The present invention relates to a method for depositing (500) an electrically conductive layer electrically connecting at least one outer coil (105) and a peak (102) and representing at least 1%, in particular 5%, preferably 10% and / or at most 90%, in particular at most 75%, preferably at most 50% of at least one dimension of a watch balance spring (101).

Description

Domaine techniqueTechnical area

La présente invention concerne un système oscillant pour mouvement d'horlogerie. La présente invention concerne en particulier un système oscillant comprenant un spiral horloger duquel les charges électrostatiques peuvent être éliminées.The present invention relates to an oscillating system for a clockwork movement. The present invention relates in particular to an oscillating system comprising a clock hairspring from which electrostatic charges can be eliminated.

Arrière-plan technologiqueTechnological background

Il est connu dans le domaine de l'horlogerie les spiraux qui constituent avec le balancier la base de temps des pièces d'horlogerie mécaniques. Ces spiraux se présentent schématiquement sous la forme d'un très fin ressort enroulé en spires concentriques et dont une première extrémité est reliée à une virole et dont une seconde extrémité est reliée à un piton.It is known in the field of watchmaking the balance springs which constitute with the balance the time base of mechanical timepieces. These spirals are schematically in the form of a very fine spring wound in concentric turns and a first end of which is connected to a ferrule and a second end of which is connected to a stud.

Le matériau utilisé pour la réalisation des spiraux est habituellement un alliage à base de fer, de cobalt, de nickel et de chrome. Ductile, un tel alliage doit résister à la corrosion. Des développements récents proposent de réaliser les spiraux en silicium. Du fait de leurs très faibles dimensions et des frottements avec l'air et entre les spires, les spiraux ont tendance à se charger en électricité statique, de telle sorte que les spires collent les unes aux autres. Les spiraux sont alors inutilisables tels quels.The material used for making the balance springs is usually an alloy based on iron, cobalt, nickel and chromium. Ductile, such an alloy must resist corrosion. Recent developments suggest making the balance springs out of silicon. Due to their very small dimensions and the friction with the air and between the turns, the spirals tend to become charged with static electricity, so that the turns stick to each other. The balance springs are then unusable as they are.

Par ailleurs, les méthodes actuelles visant à décharger les charges électrostatiques dans le mouvement via le piton font intervenir une colle électroconductrice liant piton et spiral. Elle est généralement le mélange d'une colle photo- ou UV-durcissable et de particules conductrices. Mais ces particules gênent la réticulation de l'ensemble. Cela peut conduire à une réticulation partielle et donc une désolidarisation piton-spiral, néfaste pour le fonctionnement de l'oscillateur. Une autre solution est d'augmenter significativement la durée de réticulation mais cela va à l'encontre de rythmes de production industriels.Furthermore, the current methods aiming to discharge the electrostatic charges in the movement via the eyebolt involve an electrically conductive adhesive binding the eyebolt and balance spring. It is generally the mixture of a photo- or UV-curable adhesive and conductive particles. But these particles interfere with the crosslinking of the whole. This can lead to partial crosslinking and therefore piton-hairspring separation, which is detrimental to the operation of the oscillator. Another solution is to increase the crosslinking time significantly, but this goes against industrial production rates.

Enfin, dans certains cas, les charges électrostatiques peuvent être localisées ailleurs que sur le spiral mais dans l'environnement proche de ce dernier, par exemple un composant en matériau isolant initialement chargé lors de l'assemblage ou chargé lors d'un déplacement. Ces charges, généralement liées à un élément significativement plus massif que le spiral, vont donc attirer le spiral et entrainer des dysfonctionnements en introduisant des contraintes en son sein et donc une modification de sa fréquence propre.Finally, in certain cases, the electrostatic charges can be located elsewhere than on the hairspring but in the environment close to the latter, for example a component made of insulating material initially charged during assembly or charged during movement. These loads, generally linked to an element significantly more massive than the balance spring, will therefore attract the balance spring and lead to malfunctions by introducing stresses within it and therefore a modification of its natural frequency.

Pour pallier à ces problèmes, des solutions plus ou moins complexes suggérant par exemple d'effectuer sur tout ou partie de la surface des spiraux un faible dépôt d'un matériau, de préférence inoxydable et amagnétique, tel que de l'or, du platine, du rhodium ou du silicium ont été proposées. De telles techniques nécessitent cependant des étapes de fabrication supplémentaires qui ont notamment pour inconvénient d'être coûteuses. En outre, ces techniques ont tendance à ralentir les cadences de fabrication. Pour remédier à ces inconvénients, la présente invention propose un système oscillant pour mouvement d'horlogerie comprenant un spiral horloger duquel les charges électrostatiques peuvent être éliminées.To overcome these problems, more or less complex solutions suggesting for example to carry out on all or part of the surface of the balance-springs a weak deposit of a material, preferably stainless and non-magnetic, such as gold, platinum. , rhodium or silicon have been proposed. However, such techniques require additional manufacturing steps which have the particular drawback of being expensive. In addition, these techniques tend to slow down production rates. To remedy these drawbacks, the present invention provides an oscillating system for a clockwork movement comprising a clockwork balance spring from which electrostatic charges can be eliminated.

Résumé de l'inventionSummary of the invention

Pour remédier à ces inconvénients, la présente invention propose un procédé de dépôt d'une couche électroconductrice sur un système oscillant d'un mouvement horloger comprenant un spiral horloger avec au moins une spire fixée par un piton ; ledit procédé de dépôt comprenant une étape de :

  • Fourniture dudit système oscillant ; et/ou
  • Dépôt d'au moins une première couche électroconductrice reliant électriquement ladite au moins une spire extérieure et ledit piton et représentant au moins 1%, notamment 5%, de préférence 10% et/ou au plus 90%, notamment au plus 75%, de préférence au plus 50% d'au moins une dimension dudit spiral horloger.
To remedy these drawbacks, the present invention proposes a method for depositing an electrically conductive layer on an oscillating system of a watch movement comprising a watch balance spring with at least one turn fixed by a stud; said deposition process comprising a step of:
  • Provision of said oscillating system; and or
  • Deposit of at least a first electrically conductive layer electrically connecting said at least one outer turn and said peak and representing at least 1%, in particular 5%, preferably 10% and / or at most 90%, in particular at most 75%, preferably at most 50% of at least one dimension of said watch balance spring.

Grâce à cette disposition, un système oscillant pour mouvement d'horlogerie comprenant un spiral horloger duquel les charges électrostatiques peuvent être éliminées.Thanks to this arrangement, an oscillating system for a clockwork movement comprising a clockwork balance spring from which electrostatic charges can be eliminated.

Selon un mode de réalisation, ledit spiral horloger comprend au moins une spire intérieure fixée par une virole et au moins une spire extérieure fixée par ledit piton.According to one embodiment, said watch hairspring comprises at least one inner coil fixed by a ferrule and at least one outer coil fixed by said eyebolt.

Selon un mode de réalisation, ladite au moins une première couche électroconductrice est déposée sur l'extérieur dudit piton.According to one embodiment, said at least one first electrically conductive layer is deposited on the outside of said peak.

Grâce à cette disposition, ladite au moins une première couche électroconductrice peut être facilement déposée.Thanks to this arrangement, said at least one first electrically conductive layer can be easily deposited.

Selon un mode de réalisation, le dépôt de ladite première couche électroconductrice est réalisée par un atomiseur.According to one embodiment, the deposition of said first electrically conductive layer is carried out by an atomizer.

Selon un mode de réalisation, ledit atomiseur comprend ladite au moins une première couche électroconductrice sous forme liquide entourée par un gaz de gainage de sorte à être unidirectionnel.According to one embodiment, said atomizer comprises said at least one first electroconductive layer in liquid form surrounded by a sheathing gas so as to be unidirectional.

Selon un mode de réalisation, ledit atomiseur est unidirectionnel.According to one embodiment, said atomizer is unidirectional.

Selon un mode de réalisation, ladite première couche électroconductrice comprend une couche électroconductrice continu et/ou une pluralité de couches électroconductrices discrètes de sorte à former une couche électroconductrice continue.According to one embodiment, said first electrically conductive layer comprises a continuous electrically conductive layer and / or a plurality of discrete electrically conductive layers so as to form a continuous electrically conductive layer.

Grâce à l'une ou l'autre de ces dispositions précédentes, il peut être déposé une couche électroconductrice continu et/ou une pluralité de couches électroconductrices discrètes de manière ciblée soit unidirectionnel.
Selon un mode de réalisation, ladite au moins une dimension est la longueur dudit spiral horloger.
By virtue of one or the other of these preceding arrangements, it can be deposited a continuous electrically conductive layer and / or a plurality of discrete electrically conductive layers in a targeted or unidirectional manner.
According to one embodiment, said at least one dimension is the length of said watch hairspring.

Grâce à cette disposition, un système oscillant pour mouvement d'horlogerie comprenant un spiral horloger duquel les charges électrostatiques peuvent être éliminées.Thanks to this arrangement, an oscillating system for a clockwork movement comprising a clockwork balance spring from which electrostatic charges can be eliminated.

Brève description de la figureBrief description of the figure

L'invention sera décrite ci-après de manière plus détaillée à l'aide du dessin annexé, donné à titre d'exemple nullement limitatif, lequel représentant un procédé de dépôt (500) d'une couche électroconductrice sur un système oscillant (100) d'un mouvement horloger.The invention will be described below in more detail with the aid of the appended drawing, given by way of non-limiting example, which represents a method of depositing (500) an electrically conductive layer on an oscillating system (100). of a watch movement.

Description détaillée de l'inventionDetailed description of the invention

La figure 1 illustre un procédé de dépôt 500 d'une couche électroconductrice sur un système oscillant 100 d'un mouvement horloger comprenant un spiral horloger 101 avec au moins une spire intérieure fixée par une virole et au moins une spire extérieure 105 fixée par un piton 102. The figure 1 illustrates a method of depositing 500 of an electrically conductive layer on an oscillating system 100 of a watch movement comprising a watch balance spring 101 with at least one inner coil fixed by a ferrule and at least one outer coil 105 fixed by a stud 102.

L'une des étapes dudit procédé de dépôt 500 est la fourniture 510 dudit système oscillant 100. S'ensuit le dépôt d'au moins une première couche électroconductrice 110 par un atomiseur 900 reliant électriquement ladite au moins une spire extérieure 105 et ledit piton 102. De préférence, ladite première couche électroconductrice 110 comprend une couche électroconductrice continu 111 et/ou une pluralité de couches électroconductrices discrètes 115 de sorte à former une couche électroconductrice continu 111. One of the steps of said deposition process 500 is the supply 510 of said oscillating system 100. This is followed by the deposition of at least one first electrically conductive layer 110 by an atomizer 900 electrically connecting said at least one outer coil 105 and said pin 102. . preferably, said first electrically conductive layer 110 includes a continuous electrically conductive layer 111 and / or a plurality of discrete electrically conductive layers 115 so as to form a continuous electrically conductive layer 111.

Ladite au moins une première couche électroconductrice 110, plus particulièrement, ladite couche électroconductrice continu 111 est déposée et/ou ladite pluralité de couches électroconductrices discrètes 115 sont déposées sur l'extérieur dudit piton 102, plus exactement sur la partie dudit piton 102 étant à extérieure dudit spiral horloger 101 car plus facilement atteignable que la partie qui fait face aux spires dudit spiral horloger 101. Said at least one first electrically conductive layer 110, more particularly, said continuous electrically conductive layer 111 is deposited and / or said plurality of discrete electrically conductive layers 115 are deposited on the outside of said peak 102, more exactly on the part of said peak 102 being on the outside. of said watch hairspring 101 because it is easier to reach than the part which faces the turns of said watch hairspring 101.

Ledit atomiseur 900 est configuré pour déposer ladite au moins une première couche électroconductrice 110 sous forme liquide entourée par un gaz de gainage 119 de sorte à être unidirectionnel et donc déposer ladite première couche électroconductrice 110 sur ladite au moins une dimension, de préférence la longueur dudit spiral horloger 101, et représentant au moins 1%, notamment 5%, de préférence 10% et/ou au plus 90%, notamment au plus 75%, de préférence au plus 50% d'au moins une dimension dudit spiral horloger 101. Par ailleurs, ledit atomiseur 900 étant unidirectionnelle le dépôt de ladite au moins une première couche électroconductrice 110 peut couvrit seulement partiellement la largeur dudit spiral horloger 101 mais peut-être pas la totalité de la largeur dudit spiral horloger 101 ce qui permet d'éviter un changement de caractéristique dudit spiral horloger 101 comme par exemple son inertie ou sa fréquence, ou une modification de sa réponse élastique.Said atomizer 900 is configured to deposit said at least one first electroconductive layer 110 in liquid form surrounded by a sheath gas 119 so as to be unidirectional and therefore deposit said first electroconductive layer 110 on said at least one dimension, preferably the length of said watch balance spring 101, and representing at least 1%, in particular 5%, preferably 10% and / or at most 90%, in particular at most 75%, preferably at most 50% of at least one dimension of said watch balance spring 101. Furthermore, said atomizer 900 being unidirectional, the deposition of said at least one first electroconductive layer 110 may only partially cover the width of said watch hairspring 101 but perhaps not the whole of the width of said watch hairspring 101 which makes it possible to avoid a change in characteristic of said watch balance spring 101 such as for example its inertia or its frequency, or a modification of its elastic response.

Ainsi, grâce à cette disposition, la conduction des charges électriques est rendue possible par le dépôt de ladite au moins une première couche électroconductrice 110 sur sa surface.Thus, by virtue of this arrangement, the conduction of electric charges is made possible by the deposition of said at least one first electrically conductive layer 110 on its surface.

Par ailleurs, le procédé de dépôt est économique de par sa simplicité, et le peu de matière déposé. De plus contrairement à une colle chargée de nanoparticules d'Argent ou en carbone, par exemple, ce procédé de dépôt n'expose par les employés à des particules potentiellement dangereuses lors de ladite préparation de ces colles ou lors du dépôt à cause du leur inhalation car le sprayage est rarement directionnel voire unidirectionnel. Un autre désavantage au sprayage classique et que cela peut polluer des composants mobiles proches comme l'échappement ou l'axe de balancier et donc perturber leurs fonctions tribologiques.Moreover, the deposition process is economical by virtue of its simplicity, and the little material deposited. In addition, unlike a glue loaded with silver or carbon nanoparticles, for example, this deposition process does not expose employees to potentially dangerous particles during said preparation of these glues or during deposition due to their inhalation. because the spraying is rarely directional or even unidirectional. Another disadvantage to conventional spraying is that this can pollute nearby moving components such as the escapement or the balance axle and therefore disrupt their tribological functions.

Claims (7)

Procédé de dépôt (500) d'une couche électroconductrice sur un système oscillant (100) d'un mouvement horloger comprenant un spiral horloger (101) avec au moins une spire (105) fixée par un piton (102) ; ledit procédé de dépôt (500) comprenant une étape de : - Fourniture (510) dudit système oscillant (100) ; et/ou - Dépôt d'au moins une première couche électroconductrice (110) reliant électriquement ladite au moins une spire extérieure (105) et ledit piton (102) et représentant au moins 1%, notamment 5%, de préférence 10% et/ou au plus 90%, notamment au plus 75%, de préférence au plus 50% d'au moins une dimension dudit spiral horloger (101). A method of depositing (500) an electrically conductive layer on an oscillating system (100) of a watch movement comprising a watch balance spring (101) with at least one turn (105) fixed by a stud (102); said deposition process (500) comprising a step of: - Supply (510) of said oscillating system (100); and or - Deposit of at least a first electrically conductive layer (110) electrically connecting said at least one outer turn (105) and said peak (102) and representing at least 1%, in particular 5%, preferably 10% and / or at most 90%, in particular at most 75%, preferably at most 50% of at least one dimension of said watch balance spring (101). Procédé de dépôt (500) selon la revendication 1, dans lequel ladite au moins une première couche électroconductrice (110) est déposée sur l'extérieur dudit piton (102).A deposition method (500) according to claim 1, wherein said at least one first electrically conductive layer (110) is deposited on the exterior of said peak (102). Procédé de dépôt (500) selon la revendication 1 ou 2, dans lequel le dépôt de ladite première couche électroconductrice (110) est réalisée par un atomiseur (900).A deposition method (500) according to claim 1 or 2, wherein the deposition of said first electroconductive layer (110) is performed by an atomizer (900). Procédé de dépôt (500) selon la revendication 3, dans lequel ledit atomiseur (900) comprend ladite au moins une première couche électroconductrice (110) sous forme liquide entourée par un gaz de gainage (119) de sorte à être unidirectionnel.A deposition method (500) according to claim 3, wherein said atomizer (900) comprises said at least one first electrically conductive layer (110) in liquid form surrounded by a sheath gas (119) so as to be unidirectional. Procédé de dépôt (500) selon la revendication 4, dans lequel ledit atomiseur (900) est unidirectionnel.A deposition method (500) according to claim 4, wherein said atomizer (900) is unidirectional. Procédé de dépôt (500) selon l'une quelconque des revendications 3 à 5, dans lequel ladite première couche électroconductrice (110) comprend une couche électroconductrice continu (111) et/ou une pluralité de couches électroconductrices discrètes (115) de sorte à former une couche électroconductrice continu (111).A deposition method (500) according to any one of claims 3 to 5, wherein said first electrically conductive layer (110) comprises a continuous electrically conductive layer (111) and / or a plurality of discrete electrically conductive layers (115) so as to form a continuous electrically conductive layer (111). Procédé de dépôt (500) selon l'une quelconque des revendications précédentes, dans lequel ladite au moins une dimension est la longueur dudit spiral horloger (101).A deposition method (500) according to any preceding claim, wherein said at least one dimension is the length of said clock hairspring (101).
EP20154530.8A 2020-01-30 2020-01-30 Hairspring driving cord Pending EP3859449A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP20154530.8A EP3859449A1 (en) 2020-01-30 2020-01-30 Hairspring driving cord
US17/146,793 US20210240141A1 (en) 2020-01-30 2021-01-12 Conductive balance-spring cord
JP2021006883A JP7164641B2 (en) 2020-01-30 2021-01-20 Conductive hairspring cord
CN202110127601.9A CN113267987A (en) 2020-01-30 2021-01-29 Conductive hairspring cord
KR1020210013657A KR20210098388A (en) 2020-01-30 2021-01-29 Conductive balance-spring cord

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EP20154530.8A EP3859449A1 (en) 2020-01-30 2020-01-30 Hairspring driving cord

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EP4332687A1 (en) * 2022-08-30 2024-03-06 ETA SA Manufacture Horlogère Suisse Hairspring of a balance-hairspring assembly of a mechanical clock movement

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EP1837722A2 (en) * 2006-03-24 2007-09-26 ETA SA Manufacture Horlogère Suisse Micro-mechanical piece in thermal material and method of manufacture
WO2014023584A1 (en) * 2012-08-07 2014-02-13 Eta Sa Manufacture Horlogere Suisse Oscillating system for clock movement

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EP1837722A2 (en) * 2006-03-24 2007-09-26 ETA SA Manufacture Horlogère Suisse Micro-mechanical piece in thermal material and method of manufacture
WO2014023584A1 (en) * 2012-08-07 2014-02-13 Eta Sa Manufacture Horlogere Suisse Oscillating system for clock movement

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4332687A1 (en) * 2022-08-30 2024-03-06 ETA SA Manufacture Horlogère Suisse Hairspring of a balance-hairspring assembly of a mechanical clock movement
EP4332686A1 (en) * 2022-08-30 2024-03-06 ETA SA Manufacture Horlogère Suisse Hairspring for balance-hairspring assembly of a clock movement

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CN113267987A (en) 2021-08-17
US20210240141A1 (en) 2021-08-05
KR20210098388A (en) 2021-08-10
JP7164641B2 (en) 2022-11-01

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