EP1837722A2 - Micro-mechanical piece in thermal material and method of manufacture - Google Patents

Micro-mechanical piece in thermal material and method of manufacture Download PDF

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Publication number
EP1837722A2
EP1837722A2 EP07104385A EP07104385A EP1837722A2 EP 1837722 A2 EP1837722 A2 EP 1837722A2 EP 07104385 A EP07104385 A EP 07104385A EP 07104385 A EP07104385 A EP 07104385A EP 1837722 A2 EP1837722 A2 EP 1837722A2
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EP
European Patent Office
Prior art keywords
micro
mechanical part
part according
silicon
conductive material
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
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EP07104385A
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German (de)
French (fr)
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EP1837722A3 (en
EP1837722B1 (en
Inventor
Thierry Conus
Marc Lippuner
Philippe Marmy
Benjamin Krähenbühl
Michael Reber
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ETA SA Manufacture Horlogere Suisse
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ETA SA Manufacture Horlogere Suisse
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Priority claimed from EP06111727A external-priority patent/EP1837721A1/en
Priority claimed from CH00595/06A external-priority patent/CH707669B1/en
Application filed by ETA SA Manufacture Horlogere Suisse filed Critical ETA SA Manufacture Horlogere Suisse
Priority to EP07104385.5A priority Critical patent/EP1837722B1/en
Publication of EP1837722A2 publication Critical patent/EP1837722A2/en
Publication of EP1837722A3 publication Critical patent/EP1837722A3/en
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Publication of EP1837722B1 publication Critical patent/EP1837722B1/en
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/063—Balance construction
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring

Definitions

  • the present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
  • Insulating materials such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
  • the present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
  • the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin deposit of an electrically conductive material such as a layer of a metallic material or a conductive non-metallic material.
  • the conductive deposit preferably has a thickness of less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and collage by a neighboring room, this attraction may be due to friction or tension that can create electrostatic charges in the room.
  • This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
  • the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen.
  • non-metallic conductive materials one will preferably choose one of the group comprising graphite, carbon, doped silicon, and conductive polymers. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process. The same techniques can be used to deposit conductive non-metallic materials.
  • said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile.
  • a hairspring which is the most sensitive part of a watch movement.
  • the invention also relates to a timepiece incorporating such a micro-mechanical part.
  • the invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the invention.
  • manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material.
  • wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
  • the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
  • FIG. 2 whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment.
  • the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.
  • the material used is preferably a stainless and non-magnetic metal such as gold, platinum, rhodium, palladium, when it is a metallic conductive material.
  • This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.
  • a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a current of 60 mA for 15 seconds.
  • a non-metallic conductive material When a non-metallic conductive material is deposited, it will preferably be chosen from the group comprising graphite, carbon, doped silicon, and conducting polymers and deposition techniques and thicknesses as mentioned above will be used.
  • a silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
  • a composite material to produce for example a hairspring having a silicon core and a thick coating of silicon dioxide on which the deposition of conductive material of small thickness will be performed.
  • a “composite material” may also include a metal core embedded in an insulating material.
  • the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to other fixed parts. or moving a watch movement.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)

Abstract

The part (1) has a silicon core on which a silicon dioxide coating having a thickness exceeding fifty nanometers is formed, where the part is made of an insulating material e.g. silicon, diamond, glass, and ceramic, with surface treatment. A conducting material deposit has a thickness between ten to twenty nanometers, where the conducting material can be metallic material such as stainless steel, non-magnetic metal, platinum, rhodium, and palladium, or a non-metallic material such as graphite, carbon, doped silicon, and conducting polymer. An independent claim is also included for a method for manufacturing a micro-mechanical part.

Description

Domaine techniqueTechnical area

La présente invention concerne une pièce de micro-mécanique réalisée en un matériau isolant, et plus particulièrement une pièce fixe ou mobile d'un mouvement horloger dont la proximité d'autres pièces ne perturbe pas le fonctionnement d'une pièce mobile, directement, ou indirectement par l'attraction de particules.The present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.

Arrière plan technologiqueTechnological background

Les matériaux isolants, tels que le silicium et ses composés, le quartz, le diamant, le verre, la céramique ou autres sont de plus en plus utilisés pour réaliser des pièces de micro-mécanique horlogère, qu'il s'agisse de pièces fixes, telles que des platines ou des ponts, ou de pièces mobiles faisant par exemple partie de la chaîne cinématique, ou du système réglant telles que le spiral, le balancier ou l'échappement.Insulating materials, such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.

On a observé, en particulier sur un spiral totalement isolé des autres pièces par exemple par pitonnage et collage au moyen d'une colle non conductrice, que l'emploi du silicium avait un inconvénient. En effet au bout d'un certain temps de fonctionnement, un certain nombre de spires situées entre la courbe à l'extérieur et la courbe à l'intérieur du spiral a tendance à venir se coller au coq, ce qui nuit forcément à l'isochronisme du système réglant. Le même phénomène pourrait être observé avec d'autres pièces réalisées en silicium ou en un autre matériau isolant, ce qui aurait également au final un effet néfaste sur l'isochronisme.It has been observed, in particular on a spiral completely isolated from other parts for example by pitting and gluing by means of a non-conductive glue, that the use of silicon had a disadvantage. Indeed, after a certain period of operation, a number of turns located between the curve on the outside and the curve inside the spiral tends to stick to the cock, which necessarily adversely affects the isochronism of the regulating system. The same phenomenon could be observed with other parts made of silicon or another insulating material, which would also ultimately have a detrimental effect on isochronism.

Résumé de l'inventionSummary of the invention

La présente invention vise donc à apporter une solution au problème évoqué ci-dessus en procurant une pièce de micro-mécanique fixe ou mobile réalisée en un matériau isolant dont un traitement de surface permet d'éviter le risque de collage.The present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.

A cet effet l'invention a pour objet une pièce de micro-mécanique réalisée en un matériau isolant, tel que le silicium, et ses composés, le diamant, le verre, la céramique ou autres, dont tout ou une partie de sa surface est revêtue d'un mince dépôt d'un matériau conducteur électrique tel qu'une couche d'un matériau métallique ou d'un matériau non métallique conducteur. Le dépôt conducteur présente de préférence une épaisseur inférieure à 50 nm. Ce très mince dépôt invisible à l'oeil nu, mais décelable par les moyens d'analyse actuels permet de supprimer les risques d'attraction et de collage par une pièce voisine, cette attraction pouvant être due à des frottements ou des tensions susceptible de créer dans la pièce des charges électrostatiques.For this purpose the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin deposit of an electrically conductive material such as a layer of a metallic material or a conductive non-metallic material. The conductive deposit preferably has a thickness of less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and collage by a neighboring room, this attraction may be due to friction or tension that can create electrostatic charges in the room.

Ce dépôt peut être effectué sur une pièce en matériau isolant monobloc ou composite, c'est-à-dire dont au moins la surface extérieure est en matériau isolant.This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.

Parmi les matériaux permettant d'atteindre le but sus-indiqué on choisit de préférence les métaux inoxydables et amagnétiques tels que l'or, le platine, le rhodium, le palladium.Among the materials making it possible to achieve the above-mentioned purpose, the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen.

Parmi les matériaux conducteurs non métalliques on choisira de préférence un matériau parmi l'ensemble comprenant le graphite, le carbone, le silicium dopé, et les polymères conducteurs.
Ces métaux peuvent être déposés par des procédés connus permettant de contrôler l'épaisseur en ajustant les conditions opératoires, par exemple par sputtering, PVD, dopage, implantation ionique ou par un procédé électrolytique. Les mêmes techniques pourront être utilisées pour déposer les matériaux non métalliques conducteurs.Among the non-metallic conductive materials one will preferably choose one of the group comprising graphite, carbon, doped silicon, and conductive polymers.
These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process. The same techniques can be used to deposit conductive non-metallic materials.

Dans un mode d'application préféré, ladite pièce de micro-mécanique est une pièce de la chaîne cinématique d'un mouvement horloger, telle qu'un spiral, une ancre, une roue d'échappement ou une roue dentée, ou n'importe quelle autre pièce fixe pouvant par exemple constituer le palier de l'axe d'un mobile. Dans la description détaillée qui va suivre, l'invention sera plus particulièrement illustrée par un spiral qui est la pièce la plus sensible d'un mouvement horloger.In a preferred embodiment, said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile. In the following detailed description, the invention will be more particularly illustrated by a hairspring which is the most sensitive part of a watch movement.

L'invention concerne également une pièce d'horlogerie intégrant une telle pièce de micro-mécanique.The invention also relates to a timepiece incorporating such a micro-mechanical part.

Brève description des dessinsBrief description of the drawings

D'autres caractéristiques et avantages de la présente invention apparaîtront plus clairement dans la description qui suit d'un exemple de réalisation, donné à titre illustratif et non limitatif, en référence aux dessins annexés dans lesquels :

  • la figure 1 représente en vue de dessus partiellement arrachée un balancier-spiral pourvu d'un spiral traité selon l'invention, et
  • la figure 2 est une représentation en coupe selon la ligne II-II de la figure 1, avec représentation de la partie arrachée.
Other features and advantages of the present invention will appear more clearly in the following description of an example embodiment, given by way of nonlimiting illustration, with reference to the appended drawings in which:
  • FIG. 1 is a partially cut-away top view of a sprung balance provided with a spiral processed according to the invention, and
  • Figure 2 is a sectional representation along the line II-II of Figure 1, with representation of the part torn off.

Description détaillée de l'inventionDetailed description of the invention

L'invention sera plus particulièrement illustrée par un dispositif réglant balancier-spiral représenté à la figure 1, dans lequel le spiral 1 est réalisé, à titre d'exemple, en silicium, en adaptant les procédés de micro-usinage employés dans la fabrication de circuits intégrés ou d'accéléromètres à partir d'une plaquette de silicium ou de tout autre matériau isolant amorphe ou cristallin. On peut par exemple effectuer une attaque chimique par voie humide, un usinage à sec par plasma ou une gravure ionique réactive (RIE) en utilisant des masques appropriés au contour souhaité pour le spiral.The invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the invention. manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material. For example, wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.

Compte tenu des petites dimensions, une même plaquette de silicium permet de fabriquer un lot de spiraux dont les caractéristiques sont déterminées par l'épaisseur de la plaquette et la forme des masques, lesdites caractéristiques étant calculées pour un fonctionnement du spiral dans un plan.In view of the small dimensions, the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.

En se référant maintenant à la figure 2, dont la représentation en coupe est limitée au spiral 1 et au coq 9, on a représenté dans la partie gauche le comportement des spires 11 au bout d'un certain temps de fonctionnement lorsque le spiral 1 n'a subi aucun traitement. Comme on peut le voir, les spires 11 s'écartent de leur position normale représentée en pointillés en étant attirées par le coq 9 et peuvent même venir coller à celui-ci, ce qui perturbe évidemment la marche normale, c'est-à-dire une marche n'ayant que des mouvements d'extension/contraction dans un plan.Referring now to FIG. 2, whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment. As can be seen, the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.

Dans la partie droite on a représenté le spiral 1 après traitement, la ligne en pointillés représentant la position qu'occuperaient les spires 11 en absence de traitement. Comme on le voit le spiral reste parfaitement dans un plan. On s'est en effet aperçu de façon surprenante qu'en effectuant un traitement consistant en un très faible dépôt d'un matériau conducteur électrique tel qu'un matériau métallique sur tout ou partie de la surface des spires, on annihilait l'effet néfaste précédemment décrit, sans pour autant modifier les propriétés mécaniques intrinsèques du spiral. Par "très faible dépôt", on entend un dépôt ayant une épaisseur inférieure à 50 nm de préférence comprise entre 10 et 20nm. Lorsque le dépôt est inférieur à 50 nm, les propriétés mécaniques intrinsèques de la pièce ne sont pas modifiées et le dépôt est invisible à l'oeil nu, mais néanmoins décelable par les techniques actuelles d'analyse. Le matériau utilisé est de préférence un métal inoxydable et amagnétique tel que l'or, le platine, le rhodium, le palladium, lorsqu'il s'agit d'un matériau conducteur métallique. Ce dépôt peut être effectué au moyen de divers procédés connus, tels que le sputtering, le dépôt PVD, l'implantation ionique ou le dépôt électrolytique.In the right part is shown spiral 1 after treatment, the dotted line representing the position that would occupy the turns 11 in the absence of treatment. As we see the spiral stays perfectly in a plane. Surprisingly, it has been found that by carrying out a treatment consisting of a very small deposition of an electrically conductive material such as a metallic material on all or part of the surface of the turns, the harmful effect is annihilated. previously described, without modifying the intrinsic mechanical properties of the spiral. "Very low deposition" means a deposit having a thickness of less than 50 nm, preferably between 10 and 20 nm. When the deposit is less than 50 nm, the intrinsic mechanical properties of the part are not modified and the deposit is invisible to the naked eye, but nevertheless detectable by the current analysis techniques. The material used is preferably a stainless and non-magnetic metal such as gold, platinum, rhodium, palladium, when it is a metallic conductive material. This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.

A titre d'exemple on a effectué un dépôt d'or de 15 nm par "sputtering", c'est-à-dire en effectuant une métallisation par pulvérisation cathodique sous vide, avec une cible en or, en appliquant un courant de 60 mA pendant 15 secondes.By way of example, a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a current of 60 mA for 15 seconds.

Lorsque un matériau conducteur non métallique est déposé on le choisira de préférence parmi l'ensemble comprenant le graphite, le carbone, le silicium dopé, et les polymères conducteurs et on utilisera des techniques de dépôt et des épaisseurs comme mentionnées ci-dessus.When a non-metallic conductive material is deposited, it will preferably be chosen from the group comprising graphite, carbon, doped silicon, and conducting polymers and deposition techniques and thicknesses as mentioned above will be used.

On vient de décrire un spiral en silicium, mais d'autres matériaux amorphes ou cristallins non conducteurs peuvent également être utilisés, tels qu'indiqués précédemment, et être traités avec une métallisation superficielle évitant les risques d'attraction ou de collage.A silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.

Il est également possible d'utiliser un matériau composite pour réaliser par exemple un spiral ayant une âme en silicium et un revêtement épais en dioxyde de silicium sur lequel sera effectué le dépôt de matériau conducteur de faible épaisseur.It is also possible to use a composite material to produce for example a hairspring having a silicon core and a thick coating of silicon dioxide on which the deposition of conductive material of small thickness will be performed.

Un "matériau composite" peut également comprendre une âme métallique noyée dans un matériau isolant.A "composite material" may also include a metal core embedded in an insulating material.

De même l'invention n'est pas limitée à un spiral et peut s'appliquer à d'autres pièces en mouvement telles qu'une ancre, une roue d'échappement ou une roue dentée, ainsi qu'à d'autres pièces fixes ou mobiles d'un mouvement d'horlogerie.Similarly, the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to other fixed parts. or moving a watch movement.

Claims (15)

Pièce de micro-mécanique réalisée en au moins un matériau isolant, et destinée à être intégrée dans la chaîne cinématique d'un mouvement horloger, caractérisée en ce qu'elle est revêtue sur tout ou partie de sa surface d'un dépôt en un matériau conducteur.Micro-mechanical part made of at least one insulating material, intended to be integrated into the kinematic chain of a watch movement, characterized in that it is coated on all or part of its surface with a deposit made of a material driver. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce que le dépôt de matériau conducteur a une épaisseur inférieure à 50 nm, de préférence comprise entre 10 et 20nm.Micro-mechanical part according to claim 1, characterized in that the deposition of conductive material has a thickness less than 50 nm, preferably between 10 and 20 nm. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce que le matériau isolant est choisi parmi le silicium et ses composés, le diamant, le verre et la céramique.Micro-mechanical part according to claim 1, characterized in that the insulating material is selected from silicon and its compounds, diamond, glass and ceramic. Pièce de micro-mécanique selon la revendication 3, caractérisée en ce qu'elle comporte une âme en silicium sur laquelle est formé un revêtement de dioxyde de silicium ayant une épaisseur supérieure à 50 nm.Micro-mechanical part according to claim 3, characterized in that it comprises a silicon core on which is formed a coating of silicon dioxide having a thickness greater than 50 nm. Pièce de micro-mécanique selon l'une des revendications précédentes, caractérisée en ce que le matériau conducteur est un matériau métallique.Micro-mechanical part according to one of the preceding claims, characterized in that the conductive material is a metallic material. Pièce de micro-mécanique selon la revendication 5, caractérisée en ce que le métal utilisé pour effectuer le dépôt est un métal inoxydable et amagnétique.Micro-mechanical part according to claim 5, characterized in that the metal used for depositing is a stainless and non-magnetic metal. Pièce de micro-mécanique selon la revendication 6, caractérisée en ce que le métal est choisi parmi l'or, le platine le rhodium et le palladium.Micro-mechanical part according to Claim 6, characterized in that the metal is chosen from gold, platinum, rhodium and palladium. Pièce de micro-mécanique selon l'une des revendications 1 à 4, caractérisée en ce que le matériau conducteur est un matériau conducteur non métallique.Micro-mechanical part according to one of claims 1 to 4, characterized in that the conductive material is a non-metallic conductive material. Pièce de micro-mécanique selon la revendication 8, caractérisée en ce que le matériau conducteur non métallique utilisé pour effectuer le dépôt est choisi parmi l'ensemble des matériaux comprenant le graphite, le carbone, le silicium dopé, et les polymères conducteurs.Micro-mechanical part according to claim 8, characterized in that the non-metallic conductive material used to effect the deposition is chosen from all the materials comprising graphite, carbon, doped silicon, and conductive polymers. Pièce de micro-mécanique selon l'une quelconque des revendications précédentes, caractérisée en ce qu'elle consiste en un composant de l'échappement ou du système balancier-spiral tel que un spiral, une ancre, une roue d'échappement ou une roue dentée, ou toute autre pièce fixe ou mobile.Micro-mechanical part according to any one of the preceding claims, characterized in that it consists of a component of the escapement or the balance-balance system such as a hairspring, an anchor, an escape wheel or a wheel toothed, or any other fixed or movable part. Pièce d'horlogerie comportant une pièce de micro-mécanique selon une quelconque des revendications précédentes.Timepiece comprising a micro-mechanical part according to any one of the preceding claims. Procédé de fabrication d'une pièce de micro-mécanique selon une quelconque des revendications précédentes, caractérisé en ce qu'il comporte les étapes consistant à : - usiner une pièce ou un lot de pièces dans une plaque de matériau isolant, et - effectuer sur tout ou partie de la surface de la pièce un dépôt d'une couche d'un matériau conducteur en ajustant les conditions opératoires pour obtenir l'épaisseur désirée. A method of manufacturing a micro-mechanical part according to any one of the preceding claims, characterized in that it comprises the steps of: machining a part or a batch of parts in a plate of insulating material, and - Perform on all or part of the surface of the workpiece a deposit of a layer of a conductive material by adjusting the operating conditions to obtain the desired thickness. Procédé selon la revendication 12, caractérisé en ce que l'étape de dépôt consiste à déposer un matériau métallique ou un matériau conducteur non métallique.Process according to claim 12, characterized in that the depositing step consists of depositing a metallic material or a non-metallic conductive material. Procédé selon la revendication 13, caractérisé en ce que le dépôt conducteur est effectué par sputtering, PVD, dopage, implantation ionique, par un procédé électrolytique, ou tout autre procédé permettant d'obtenir un tel dépôt.Process according to Claim 13, characterized in that the conductive deposition is carried out by sputtering, PVD, doping, ion implantation, by an electrolytic process, or any other method making it possible to obtain such a deposit. Procédé selon la revendication 12, caractérisé en ce que le matériau isolant est du silicium recouvert d'oxyde de silicium et le matériau conducteur est de l'or.Method according to claim 12, characterized in that the insulating material is silicon coated silicon oxide and the conductive material is gold.
EP07104385.5A 2006-03-24 2007-03-19 Micro-mechanical component in an insulating material and method of manufacture thereof Active EP1837722B1 (en)

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EP06111727A EP1837721A1 (en) 2006-03-24 2006-03-24 Micro-mechanical piece made from insulating material and method of manufacture therefor
CH00595/06A CH707669B1 (en) 2006-04-10 2006-04-10 micro-mechanical part of electrically insulating material or silicon or its compounds and its manufacturing process.
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EP2104006A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body double spiral and method for manufacturing same
EP2104007A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body spiral made from a silicon-based material and manufacturing method
EP2104008A1 (en) 2008-03-20 2009-09-23 Nivarox-FAR S.A. Single-body regulating organ and method for manufacturing same
EP2105807A1 (en) 2008-03-28 2009-09-30 Nivarox-FAR S.A. Monobloc elevated curve spiral and method for manufacturing same
EP2184653A1 (en) * 2008-11-06 2010-05-12 Montres Breguet S.A. Spiral with terminal curve elevation in micro-machinable material
EP2201428A1 (en) * 2007-10-18 2010-06-30 DAMASKO, Konrad Method for producing functional elements for clockworks and functional element produced according to said method
US8322914B2 (en) 2010-05-18 2012-12-04 Montres Breguet Sa Silicon overcoil balance spring
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EP2781968A1 (en) * 2013-03-19 2014-09-24 Nivarox-FAR S.A. Resonator that is less sensitive to climate variations
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EP3056948B1 (en) 2015-02-17 2019-02-20 Master Dynamic Limited Silicon hairspring
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EP3742237A1 (en) * 2019-05-23 2020-11-25 Nivarox-FAR S.A. Component, in particular for a timepiece, with a surface topology and manufacturing method thereof
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EP2105807A1 (en) 2008-03-28 2009-09-30 Nivarox-FAR S.A. Monobloc elevated curve spiral and method for manufacturing same
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EP2184652A1 (en) * 2008-11-06 2010-05-12 Montres Breguet SA Spiral with terminal curve elevation in micro-machinable material
US8215828B2 (en) 2008-11-06 2012-07-10 Montres Breguet S.A. Breguet overcoil balance spring made of micro-machinable material
US7950847B2 (en) 2008-11-06 2011-05-31 Montres Breguet S.A. Breguet overcoil balance spring made of micro-machinable material
EP2184653A1 (en) * 2008-11-06 2010-05-12 Montres Breguet S.A. Spiral with terminal curve elevation in micro-machinable material
EP2394202B1 (en) * 2009-02-06 2016-09-07 DAMASKO GmbH Mechanical oscillating system for watches and functional element for watches
US10324419B2 (en) 2009-02-06 2019-06-18 Domasko GmbH Mechanical oscillating system for a clock and functional element for a clock
US8322914B2 (en) 2010-05-18 2012-12-04 Montres Breguet Sa Silicon overcoil balance spring
WO2014075859A1 (en) * 2012-11-16 2014-05-22 Nivarox-Far S.A. Resonator that is less sensitive to climatic variations
US10001749B2 (en) 2012-11-16 2018-06-19 Nivarox-Far S.A. Resonator with reduced sensitivity to climatic variations
WO2014146833A3 (en) * 2013-03-19 2014-11-13 Nivarox-Far S.A. Resonator with reduced sensitivity to climatic variations
US10001750B2 (en) 2013-03-19 2018-06-19 Nivarox-Far S.A. Resonator with reduced sensitivity to climatic variations
EP2781968A1 (en) * 2013-03-19 2014-09-24 Nivarox-FAR S.A. Resonator that is less sensitive to climate variations
EP3056948B1 (en) 2015-02-17 2019-02-20 Master Dynamic Limited Silicon hairspring
US10274897B2 (en) 2015-06-15 2019-04-30 Citizen Watch Co., Ltd. Speed governor for timepiece
US20190271946A1 (en) * 2018-03-01 2019-09-05 Rolex Sa Process for producing a thermo-compensated oscillator
EP3742237A1 (en) * 2019-05-23 2020-11-25 Nivarox-FAR S.A. Component, in particular for a timepiece, with a surface topology and manufacturing method thereof
US11586145B2 (en) 2019-05-23 2023-02-21 Nivarox-Far S.A. Component especially for horology with surface topology and method for manufacturing the same
EP3859449A1 (en) * 2020-01-30 2021-08-04 ETA SA Manufacture Horlogère Suisse Hairspring driving cord

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