EP1837721A1 - Micro-mechanical piece made from insulating material and method of manufacture therefor - Google Patents
Micro-mechanical piece made from insulating material and method of manufacture therefor Download PDFInfo
- Publication number
- EP1837721A1 EP1837721A1 EP06111727A EP06111727A EP1837721A1 EP 1837721 A1 EP1837721 A1 EP 1837721A1 EP 06111727 A EP06111727 A EP 06111727A EP 06111727 A EP06111727 A EP 06111727A EP 1837721 A1 EP1837721 A1 EP 1837721A1
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- European Patent Office
- Prior art keywords
- micro
- insulating material
- mechanical part
- silicon
- part according
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- 239000011810 insulating material Substances 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 238000000034 method Methods 0.000 title claims description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000919 ceramic Substances 0.000 claims abstract description 4
- 239000010432 diamond Substances 0.000 claims abstract description 4
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 4
- 239000011521 glass Substances 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000001465 metallisation Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000003754 machining Methods 0.000 claims description 2
- 239000002131 composite material Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel
Definitions
- the present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
- Insulating materials such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
- the present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
- the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin metal deposit preferably less than 50 nm.
- a thin metal deposit preferably less than 50 nm.
- This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
- the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process.
- said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile.
- a hairspring which is the most sensitive part of a watch movement.
- the invention also relates to a timepiece incorporating such a micro-mechanical part.
- the invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material.
- wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
- the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
- FIG. 2 whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment.
- the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.
- the metal used is preferably a stainless and amagnetic metal such as gold, platinum, rhodium, palladium.
- This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.
- a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a voltage of 60 mA for 15 seconds.
- a silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
- a composite material to produce, for example, a hairspring having a silicon core and a thick coating of silicon dioxide on which the very low metal deposition will be performed.
- a “composite material” may also include a metal core embedded in an insulating material.
- the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to fixed parts.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
Abstract
Description
La présente invention concerne une pièce de micro-mécanique réalisée en un matériau isolant, et plus particulièrement une pièce fixe ou mobile d'un mouvement horloger dont la proximité d'autres pièces ne perturbe pas le fonctionnement d'une pièce mobile, directement, ou indirectement par l'attraction de particules.The present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
Les matériaux isolants, tels que le silicium et ses composés, le quartz, le diamant, le verre, la céramique ou autres sont de plus en plus utilisés pour réaliser des pièces de micro-mécanique horlogère, qu'il s'agisse de pièces fixes, telles que des platines ou des ponts, ou de pièces mobiles faisant par exemple partie de la chaîne cinématique, ou du système réglant telles que le spiral, le balancier ou l'échappement.Insulating materials, such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
On a observé, en particulier sur un spiral totalement isolé des autres pièces par exemple par pitonnage et collage au moyen d'une colle non conductrice, que l'emploi du silicium avait un inconvénient. En effet au bout d'un certain temps de fonctionnement, un certain nombre de spires situées entre la courbe à l'extérieur et la courbe à l'intérieur du spiral a tendance à venir se coller au coq, ce qui nuit forcément à l'isochronisme du système réglant. Le même phénomène pourrait être observé avec d'autres pièces réalisées en silicium ou en un autre matériau isolant, ce qui aurait également au final un effet néfaste sur l'isochronisme.It has been observed, in particular on a spiral completely isolated from other parts for example by pitting and gluing by means of a non-conductive glue, that the use of silicon had a disadvantage. Indeed, after a certain period of operation, a number of turns located between the curve on the outside and the curve inside the spiral tends to stick to the cock, which necessarily adversely affects the isochronism of the regulating system. The same phenomenon could be observed with other parts made of silicon or another insulating material, which would also ultimately have a detrimental effect on isochronism.
La présente invention vise donc à apporter une solution au problème évoqué ci-dessus en procurant une pièce de micro-mécanique fixe ou mobile réalisée en un matériau isolant dont un traitement de surface permet d'éviter le risque de collage.The present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
A cet effet l'invention a pour objet une pièce de micro-mécanique réalisée en un matériau isolant, tel que le silicium, et ses composés, le diamant, le verre, la céramique ou autres, dont tout ou une partie de sa surface est revêtue d'un mince dépôt métallique de préférence inférieur à 50 nm. Ce très mince dépôt invisible à l'oeil nu, mais décelable par les moyens d'analyse actuels permet de supprimer les risques d'attraction et de collage par une pièce voisine, cette attraction pouvant être due à des frottements ou des tensions susceptible de créer dans la pièce des charges électrostatiques.For this purpose the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin metal deposit preferably less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and sticking by a neighboring room, this attraction may be due to friction or tension likely to create in the room electrostatic charges.
Ce dépôt peut être effectué sur une pièce en matériau isolant monobloc ou composite, c'est-à-dire dont au moins la surface extérieure est en matériau isolant.This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
Parmi les matériaux permettant d'atteindre le but sus-indiqué on choisit de préférence les métaux inoxydables et amagnétiques tels que l'or, le platine, , le rhodium, le palladium. Ces métaux peuvent être déposés par des procédés connus permettant de contrôler l'épaisseur en ajustant les conditions opératoires, par exemple par sputtering, PVD, dopage, implantation ionique ou par un procédé électrolytique.Among the materials making it possible to achieve the above-mentioned purpose, the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process.
Dans un mode d'application préféré, ladite pièce de micro-mécanique est une pièce de la chaîne cinématique d'un mouvement horloger, telle qu'un spiral, une ancre, une roue d'échappement ou une roue dentée, ou n'importe quelle autre pièce fixe pouvant par exemple constituer le palier de l'axe d'un mobile. Dans la description détaillée qui va suivre, l'invention sera plus particulièrement illustrée par un spiral qui est la pièce la plus sensible d'un mouvement horloger.In a preferred embodiment, said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile. In the following detailed description, the invention will be more particularly illustrated by a hairspring which is the most sensitive part of a watch movement.
L'invention concerne également une pièce d'horlogerie intégrant une telle pièce de micro-mécanique.The invention also relates to a timepiece incorporating such a micro-mechanical part.
D'autres caractéristiques et avantages de la présente invention apparaîtront plus clairement dans la description qui suit d'un exemple de réalisation, donné à titre illustratif et non limitatif, en référence aux dessins annexés dans lesquels :
- la figure 1 représente en vue de dessus partiellement arrachée un balancier-spiral pourvu d'un spiral traité selon l'invention, et
- la figure 2 est une représentation en coupe selon la ligne II-II de la figure 1, avec représentation de la partie arrachée.
- FIG. 1 is a partially cut-away top view of a sprung balance provided with a spiral processed according to the invention, and
- Figure 2 is a sectional representation along the line II-II of Figure 1, with representation of the part torn off.
L'invention sera plus particulièrement illustrée par un dispositif réglant balancier-spiral représenté à la figure 1, dans lequel le spiral 1 est réalisé, à titre d'exemple, en silicium, en adaptant les procédés de micro-usinage employés dans la fabrication de circuits intégrés ou d'accéléromètres à partir d'une plaquette de silicium ou de tout autre matériau isolant amorphe ou cristallin. On peut par exemple effectuer une attaque chimique par voie humide, un usinage à sec par plasma ou une gravure ionique réactive (RIE) en utilisant des masques appropriés au contour souhaité pour le spiral.The invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material. For example, wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
Compte tenu des petites dimensions, une même plaquette de silicium permet de fabriquer un lot de spiraux dont les caractéristiques sont déterminées par l'épaisseur de la plaquette et la forme des masques, lesdites caractéristiques étant calculées pour un fonctionnement du spiral dans un plan.Given the small dimensions, the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
En se référant maintenant à la figure 2, dont la représentation en coupe est limitée au spiral 1 et au coq 9, on a représenté dans la partie gauche le comportement des spires 11 au bout d'un certain temps de fonctionnement lorsque le spiral 1 n'a subi aucun traitement. Comme on peut le voir, les spires 11 s'écartent de leur position normale représentée en pointillés en étant attirées par le coq 9 et peuvent même venir coller à celui-ci, ce qui perturbe évidemment la marche normale, c'est-à-dire une marche n'ayant que des mouvements d'extension/contraction dans un plan.Referring now to FIG. 2, whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the
Dans la partie droite on a représenté le spiral 1 après traitement, la ligne en pointillés représentant la position qu'occuperaient les spires 11 en absence de traitement. Comme on le voit le spiral reste parfaitement dans un plan. On s'est en effet aperçu de façon surprenante qu'en effectuant un traitement consistant en un très faible dépôt métallique sur tout ou partie de la surface des spires, on annihilait l'effet néfaste précédemment décrit, sans pour autant modifier les propriétés mécaniques intrinsèques du spiral. Par "très faible dépôt", on entend un dépôt ayant une épaisseur inférieure à 50 nm de préférence comprise entre 10 et 20nm. Lorsque le dépôt est inférieur à 50 nm, les propriétés mécaniques intrinsèques de la pièce ne sont pas modifiées et le dépôt est invisible à l'oeil nu, mais néanmoins décelable par les techniques actuelles d'analyse. Le métal utilisé est de préférence un métal inoxydable et amagnétique tel que l'or, le platine, le rhodium, le palladium, . Ce dépôt peut être effectué au moyen de divers procédés connus, tels que le sputtering, le dépôt PVD, l'implantation ionique ou le dépôt électrolytique.In the right part is shown spiral 1 after treatment, the dotted line representing the position that would occupy the
A titre d'exemple on a effectué un dépôt d'or de 15 nm par "sputtering", c'est-à-dire en effectuant une métallisation par pulvérisation cathodique sous vide, avec une cible en or, en appliquant une tension de 60 mA pendant 15 secondes.By way of example, a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a voltage of 60 mA for 15 seconds.
On vient de décrire un spiral en silicium, mais d'autres matériaux amorphes ou cristallins non conducteurs peuvent également être utilisés, tels qu'indiqués précédemment, et être traités avec une métallisation superficielle évitant les risques d'attraction ou de collage.A silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
Il est également possible d'utiliser un matériau composite pour réaliser par exemple un spiral ayant une âme en silicium et un revêtement épais en dioxyde de silicium sur lequel sera effectué le très faible dépôt métallique.It is also possible to use a composite material to produce, for example, a hairspring having a silicon core and a thick coating of silicon dioxide on which the very low metal deposition will be performed.
Un "matériau composite" peut également comprendre une âme métallique noyée dans un matériau isolant.A "composite material" may also include a metal core embedded in an insulating material.
De même l'invention n'est pas limitée à un spiral et peut s'appliquer à d'autres pièces en mouvement telles qu'une ancre, une roue d'échappement ou une roue dentée, ainsi qu'à des pièces fixes.Similarly, the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to fixed parts.
Claims (11)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06111727A EP1837721A1 (en) | 2006-03-24 | 2006-03-24 | Micro-mechanical piece made from insulating material and method of manufacture therefor |
EP07104385.5A EP1837722B1 (en) | 2006-03-24 | 2007-03-19 | Micro-mechanical component in an insulating material and method of manufacture thereof |
TW096109746A TWI438588B (en) | 2006-03-24 | 2007-03-21 | Micro-mechanical part made of insulating material and method of manufacturing the same |
KR1020070027483A KR20070096834A (en) | 2006-03-24 | 2007-03-21 | Micro-mechanical part made of insulating material and method of manufacturing the same |
JP2007076624A JP5378654B2 (en) | 2006-03-24 | 2007-03-23 | Micromechanical part made of insulating material and method of manufacturing the same |
CN2007100893622A CN101042570B (en) | 2006-03-24 | 2007-03-23 | Micro-mechanical piece made from insulating material and method of manufacture therefor |
US11/691,063 US7824097B2 (en) | 2006-03-24 | 2007-03-26 | Micro-mechanical part made of insulating material and method of manufacturing the same |
HK08103103.0A HK1113948A1 (en) | 2006-03-24 | 2008-03-18 | Micro-mechanical part made of insulating material and method of manufacturing the same |
JP2013118770A JP5599917B2 (en) | 2006-03-24 | 2013-06-05 | Micro mechanical parts incorporated into the clockwork mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06111727A EP1837721A1 (en) | 2006-03-24 | 2006-03-24 | Micro-mechanical piece made from insulating material and method of manufacture therefor |
Publications (1)
Publication Number | Publication Date |
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EP1837721A1 true EP1837721A1 (en) | 2007-09-26 |
Family
ID=37625990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP06111727A Withdrawn EP1837721A1 (en) | 2006-03-24 | 2006-03-24 | Micro-mechanical piece made from insulating material and method of manufacture therefor |
Country Status (2)
Country | Link |
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EP (1) | EP1837721A1 (en) |
CN (1) | CN101042570B (en) |
Cited By (5)
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EP2589568A1 (en) * | 2011-11-03 | 2013-05-08 | Sigatec SA | Improved micromechanical part allowing an electric discharge |
WO2014023584A1 (en) * | 2012-08-07 | 2014-02-13 | Eta Sa Manufacture Horlogere Suisse | Oscillating system for clock movement |
EP2804054A1 (en) * | 2013-05-17 | 2014-11-19 | ETA SA Manufacture Horlogère Suisse | Anti-adhesion device of a spiral on a bridge |
US10274897B2 (en) | 2015-06-15 | 2019-04-30 | Citizen Watch Co., Ltd. | Speed governor for timepiece |
EP3667433A1 (en) | 2018-12-12 | 2020-06-17 | Nivarox-FAR S.A. | Spring and method for manufacturing same |
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ATE501467T1 (en) * | 2007-11-28 | 2011-03-15 | Manuf Et Fabrique De Montres Et De Chronometres Ulysse Nardin Le Locle S A | MECHANICAL OSCILLATOR WITH AN OPTIMIZED THERMOELASTIC COEFFICIENT |
EP2104008A1 (en) * | 2008-03-20 | 2009-09-23 | Nivarox-FAR S.A. | Single-body regulating organ and method for manufacturing same |
EP2264553B1 (en) * | 2009-06-19 | 2016-10-26 | Nivarox-FAR S.A. | Thermocompensated spring and manufacturing method thereof |
EP2706416B1 (en) * | 2012-09-07 | 2015-11-18 | The Swatch Group Research and Development Ltd | Constant force flexible anchor |
EP2781968A1 (en) * | 2013-03-19 | 2014-09-24 | Nivarox-FAR S.A. | Resonator that is less sensitive to climate variations |
EP3326963B1 (en) * | 2016-11-23 | 2020-01-01 | The Swatch Group Research and Development Ltd | Flexible blade for watchmaking and method of manufacturing |
EP3502289B1 (en) * | 2017-12-21 | 2022-11-09 | Nivarox-FAR S.A. | Manufacturing method of a hairspring for a timepiece movement |
EP3742237B1 (en) | 2019-05-23 | 2024-10-16 | Nivarox-FAR S.A. | Component, in particular for a timepiece, with a surface topology and manufacturing method thereof |
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EP0732635A1 (en) * | 1995-03-17 | 1996-09-18 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Micromechanical element and process for its manufacture |
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-
2006
- 2006-03-24 EP EP06111727A patent/EP1837721A1/en not_active Withdrawn
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2007
- 2007-03-23 CN CN2007100893622A patent/CN101042570B/en active Active
Patent Citations (6)
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EP0732635A1 (en) * | 1995-03-17 | 1996-09-18 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Micromechanical element and process for its manufacture |
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WO2004029733A2 (en) * | 2002-09-25 | 2004-04-08 | Fore Eagle Co Ltd | Mechanical parts |
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CH705724A1 (en) * | 2011-11-03 | 2013-05-15 | Sigatec Sa | micromechanical component, in particular for watches. |
WO2014023584A1 (en) * | 2012-08-07 | 2014-02-13 | Eta Sa Manufacture Horlogere Suisse | Oscillating system for clock movement |
EP2804054A1 (en) * | 2013-05-17 | 2014-11-19 | ETA SA Manufacture Horlogère Suisse | Anti-adhesion device of a spiral on a bridge |
US9348313B2 (en) | 2013-05-17 | 2016-05-24 | ETA SA Manufacture Horlogére Suisse | Anti-adhesion device for a balance spring on a bar |
US10274897B2 (en) | 2015-06-15 | 2019-04-30 | Citizen Watch Co., Ltd. | Speed governor for timepiece |
EP3667433A1 (en) | 2018-12-12 | 2020-06-17 | Nivarox-FAR S.A. | Spring and method for manufacturing same |
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CN101042570B (en) | 2011-09-14 |
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