EP2942111B1 - Vorrichtung zur ablagerung von partikeln auf einem substrat, und ablagerungsverfahren, bei dem eine solche vorrichtung zum einsatz kommt - Google Patents

Vorrichtung zur ablagerung von partikeln auf einem substrat, und ablagerungsverfahren, bei dem eine solche vorrichtung zum einsatz kommt Download PDF

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Publication number
EP2942111B1
EP2942111B1 EP15166479.4A EP15166479A EP2942111B1 EP 2942111 B1 EP2942111 B1 EP 2942111B1 EP 15166479 A EP15166479 A EP 15166479A EP 2942111 B1 EP2942111 B1 EP 2942111B1
Authority
EP
European Patent Office
Prior art keywords
chamber
liquid
particles
volume
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP15166479.4A
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English (en)
French (fr)
Other versions
EP2942111A2 (de
EP2942111A3 (de
Inventor
Emmanuel Picard
Julien Cordeiro
Kévin Berton
David Peyrade
Marc Zelsmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite Joseph Fourier Grenoble 1
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
Universite Joseph Fourier Grenoble 1
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Commissariat a lEnergie Atomique CEA, Universite Joseph Fourier Grenoble 1, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Centre National de la Recherche Scientifique CNRS
Publication of EP2942111A2 publication Critical patent/EP2942111A2/de
Publication of EP2942111A3 publication Critical patent/EP2942111A3/de
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Publication of EP2942111B1 publication Critical patent/EP2942111B1/de
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/12—Applying particulate materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/18—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material only one side of the work coming into contact with the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Definitions

  • the invention relates to the field of particle distribution on a surface.
  • the invention relates in particular to a device for depositing particles by a liquid route or a device for depositing particles by a liquid route.
  • the invention further relates to a method of liquid particle deposition.
  • the invention finally relates to a product obtained by the process according to the invention.
  • Liquid can be deposited on the surface and then the liquid evaporated.
  • the amount of particles deposited depends on the manner of depositing the liquid. To control this amount, it is necessary to deposit a calibrated volume of this liquid to always have the same amount of material available to fill structures of a structured substrate with the particles.
  • the document US20120040164A1 discloses a method of manufacturing a layer of material in a container. According to this method, a substrate is introduced into the container, water and a Teflon® disc floating on the water at the water / air interface. Next, particles are placed in a suspension and then a soluble polymer on the disc. After a few hours, the whole forms a layer of particles which is deposited on the substrate when the water is removed.
  • the object of the invention is to provide a liquid particle deposition device improving the known devices of the prior art.
  • the invention provides a simple device and allowing liquid particle deposition operations that are repeatable, reliable and accurate.
  • the vent and the communication port may be disposed opposite to each other in the second chamber or substantially opposite each other in the second chamber and / or the vent and the communication port may be disposed on two opposite or substantially opposed walls of the second chamber.
  • the first chamber and the second chamber may respectively have a first wall and a second wall disposed one in the continuity of the other.
  • the first chamber and the second bedroom may have a common ceiling.
  • the first chamber may be parallelepipedal or substantially parallelepipedal and / or the second chamber may be parallelepipedal or substantially parallelepipedal.
  • the volume of the first chamber may be smaller than the volume of the second chamber, or the volume of the first chamber may be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume. from the second bedroom.
  • the height of the first chamber may be less than the height of the second chamber, or the height of the first chamber may be less than half the height of the second chamber, or the height of the first chamber may be less than one-third from the height of the second chamber.
  • the device may comprise a base and a removable cover and / or attached to the base.
  • the device may be made of a silicone-based material, in particular PDMS.
  • the volume of the first chamber may be about 30 to 40 mm 3 and / or the volume of the second chamber may be about 100 mm 3 .
  • the method of depositing particles on a surface of a substrate comprises the use of a device defined above.
  • the step of feeding the first chamber into a liquid loaded with particles can be achieved by means of a tool, in particular a needle, the diameter of the end of which is less than the height of the first chamber.
  • the invention also relates to a product obtained by the implementation of the method defined above.
  • a first embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 1 to 3 .
  • a second embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 4 and 5 . Both embodiments differ from each other only in size characteristics and in the presence of a removable or attached lid 2 on a base 1 in the first mode, or a lid being in the second mode, either attached to the base, or being monobloc with the base.
  • the external environment is the ambient atmosphere, especially the ambient air.
  • the vent is disposed in a vertical wall of the second chamber which is not intended to come into contact with a liquid that will be injected into the chambers.
  • the first and second chambers connected by the communication orifice thus form a single cavity.
  • the communication orifice may not have a smaller cross-sectional area than that of the smaller-sized chamber, at least in the vicinity of the orifice.
  • the first chamber and the second chamber are made in the device, in particular in the base 1.
  • the lid 2 closes the first chamber and the second chamber on one side of the device.
  • the second chamber has an opening 129 intended to be closed by a surface 101 of a substrate to be treated as described below, that is to say a surface on which particles must be deposited.
  • the first chamber and the second chamber advantageously have respectively a first wall 111 of cover and a second wall 121 arranged one in the continuity of the other.
  • the cover can form a common ceiling 111, 121 to the first chamber and the second chamber.
  • the vent and the communication port are disposed opposite each other in the second chamber or substantially opposite each other in the second chamber.
  • the vent and the communication orifice may be disposed on two walls 122, 125 opposite or substantially opposite the second chamber, in particular parallel or substantially parallel walls. The advantage of such a disposition or configuration will be given below.
  • the first chamber is parallelepipedal or substantially parallelepipedic and / or the second chamber is parallelepipedal or substantially parallelepipedic.
  • the first chamber has a bottom 119 and side walls 113, 114, and 115.
  • the second chamber has sidewalls 122, 123, 124, and 125.
  • the volume of the first chamber is smaller than the volume of the second chamber.
  • the volume of the first chamber may in particular be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume of the second chamber.
  • the volume of the first chamber is approximately 30 to 40 mm 3 and / or the volume of the second chamber is approximately 100 mm 3 .
  • the volume of the first chamber is 36 mm 3 and the volume of the second chamber is 108 mm 3 . It is obvious that higher volumes can be brought into play using rooms covering areas up to several hundred cm 3 and on which we must deposit the particles.
  • the height h 'of the first chamber is preferably less than the height h of the second chamber, or the height h' of the first chamber is less than half the height h of the second chamber, or the height h 'of the first chamber is less than one third of the height h of the second chamber.
  • h is 3 mm and h 'is between 0.5 mm and 1.5 mm, especially 1 mm.
  • the second chamber is connected to the first chamber through the orifice 13, having an area of section equal to one third of the surface of one side of the second chamber to which the first chamber is connected.
  • the first chamber can measure the same width as the second chamber and / or their upper walls 111, 121 can be coplanar.
  • the device is preferably made of a material based on silicone, especially PDMS (or polydimethylsiloxane).
  • PDMS polydimethylsiloxane
  • the horizontal faces, that is to say the lid, can be made of glass.
  • the embodiment of the device can be carried out for example by molding PDMS in an aluminum mold.
  • Other materials may be used but the wettability of these materials by the liquid used will have to be similar to that of PDMS by water.
  • the method comprises the use of a device as defined or described previously.
  • the step of feeding the first chamber 11 into a liquid 30 charged with particles is carried out by means of a tool 110, in particular a needle, the diameter of the end of which is advantageously less than the height h 'of the first chamber 11 .
  • the filling continues in the second chamber, the liquid introduced into the first chamber migrating to the second chamber via the orifice 13.
  • This filling is done by means of a tool which makes it possible to pierce a wall of the first chamber, in particular the wall 111 or the wall 115.
  • the filling continues until it covers the surface 101 of the substrate on which particles must be deposited and stops before the complete filling of the second chamber, that is to say before the wall 122 having the vent 14 is wetted.
  • the dose of liquid contained in the tool must be calibrated and less than the volume of the cavity formed by the first and second chambers.
  • the liquid progressively wets the walls 125, 101, 121, 123 and 124 after being discharged through the orifice 13 and the front 31 of liquid progresses towards the wall 122 while driving off the gas, in particular the air contained in the second chamber, via the vent 14.
  • the first chamber must be completely filled (or substantially, there may remain one or more air pockets) before the filling of the second chamber begins.
  • the liquid will therefore be distributed in the second chamber, from the communication port 13 and therefore only by progressively wetting the surfaces of the second chamber, for example by progressively wetting five of the walls of the second chamber.
  • the wall 122 having the vent 14 is found in front of the liquid front, but is not reached by the liquid, the volume of liquid being determined or calibrated to prevent it from wetting the wall.
  • the liquid front 31 can thus be formed substantially parallel to the wall 122. This effect is obtained by the relative provisions of the vent and the communication port in the second chamber.
  • the vent and orifice are for example arranged opposite to each other or substantially opposite to each other in the second chamber.
  • the first chamber can be filled without any constraint on the position of the tool 110 ensuring the filling, in particular the needle 110.
  • the diameter of the end of the tool 110 is for example 0.5mm in diameter. This tool makes it possible to pierce the material of the device in order to inject the liquid. The effect obtained is independent of the position of the injection. Indeed, during injection, the end of the tool may be perpendicular to the bottom 119 of the device. Alternatively, the end of the tool may be parallel to the bottom 119 of the device. The end of the tool can still occupy any intermediate configuration.
  • the liquid front 31 moves towards the wall 125, the evaporation gas of the liquid being evacuated via the vent 14.
  • the liquid front leaves on the walls and on the surface 101 of the substrate, in particular in structures or etchings 102 made on the surface 101, a deposit 103 of particles which were previously suspended in the liquid. According to the density of particles in the liquid and according to the form and / or the size of the structures, one can thus deposit the number of particles that one wants in each structure.
  • the vent can be coupled to a suction system.
  • the adjustment of the suction system can, together with the heating, improve the efficiency of the deposition of particles.
  • the device may comprise several vents.
  • the vents are preferably distributed on the wall 125. It is also possible to remove the wall 125.
  • the opening of the second chamber at this level constitutes a large vent.
  • the device 10 can then be removed or deposited. In other words, the device 10 can be removed or separated from the substrate.
  • a product 100 or a substrate 100 is thus obtained by implementing the method defined or described above.
  • a product 100 or a substrate 100 on which particles have been deposited is thus obtained.
  • Deposition of particles on a surface may allow subsequent analysis of the particles and / or their characterization. Deposition of particles on a surface may allow functionalization of the surface where the particles provide a specific function, including a function that they provide intrinsically.
  • vent means any opening or passage or any set of openings or passages for the evacuation of gas.

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)

Claims (11)

  1. Vorrichtung (10) zur Ablagerung von Partikeln durch Nassverfahren, die Folgendes umfasst:
    - eine erste Kammer (11), die angepasst ist, um mit einer Flüssigkeit (30), die mit Partikeln beladen ist, versorgt zu werden,
    - eine zweite Kammer (12), die eine Öffnung (129) aufweist, die dazu bestimmt ist, durch eine Oberfläche (101) eines Substrats verschlossen zu werden, auf dem die Partikel abgelagert werden sollen,
    - eine Kommunikationsöffnung (13) zwischen der ersten Kammer (11) und der zweiten Kammer (12), wobei die Kommunikationsöffnung zu der Migration der Flüssigkeit von der ersten Kammer zu der zweiten Kammer fähig ist, und
    - eine Entlüftung (14), die in der zweiten Kammer vorgesehen ist und die zweite Kammer und ein Milieu (200) außerhalb der Vorrichtung verbindet.
  2. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, dass die Entlüftung und die Kommunikationsöffnung einander entgegengesetzt in der zweiten Kammer oder im Wesentlichen einander entgegengesetzt in der zweiten Kammer angeordnet sind, und/oder dass die Entlüftung und die Kommunikationsöffnung auf zwei Wänden (122, 125), die der zweiten Kammer entgegensetzt oder im Wesentlichen entgegengesetzt sind, angeordnet sind.
  3. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die erste Kammer und die zweite Kammer jeweils eine erste Wand (111) und eine zweite Wand (121) aufweisen, die eine in der Fortsetzung der anderen angeordnet sind, wobei die erste Kammer und die zweite Kammer insbesondere eine gemeinsame Decke (111, 121) aufweisen.
  4. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die erste Kammer parallelepipedisch oder im Wesentlichen parallelepipedisch ist, und/oder dass die zweite Kammer parallelepipedisch oder im Wesentlichen parallelepipedisch ist.
  5. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass das Volumen der ersten Kammer kleiner ist als das Volumen der zweiten Kammer, sogar dass das Volumen der ersten Kammer kleiner ist als die Hälfte des Volumens der zweiten Kammer, sogar dass das Volumen der ersten Kammer kleiner ist als das Drittel des Volumens der zweiten Kammer.
  6. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die Höhe der ersten Kammer kleiner ist als die Höhe der zweiten Kammer, sogar dass die Höhe der ersten Kammer kleiner ist als die Hälfte der Höhe der zweiten Kammer, sogar dass die Höhe der ersten Kammer kleiner ist als das Drittel der Höhe der zweiten Kammer.
  7. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die Vorrichtung eine Basis (1) und einem abnehmbaren Deckel (2), der abnehmbar und/oder auf dem Sockel angefügt ist, umfasst.
  8. Vorrichtung nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die Vorrichtung aus einem Material auf Silikonbasis, insbesondere aus PDMS, gefertigt ist.
  9. Verfahren zur Ablagerung von Partikeln auf einer Oberfläche (101) eines Substrats (100), das das Verwenden einer Vorrichtung nach einem der vorstehenden Ansprüche umfasst.
  10. Verfahren nach dem vorstehenden Anspruch, das die folgenden Schritte umfasst,
    - Einrichten der Vorrichtung auf der Oberfläche (101) des Substrats (100);
    - Versorgen der ersten Kammer (11) mit einer Flüssigkeit (30), die mit Partikeln beladen ist, insbesondere durch eine Wand (111) der ersten Kammer;
    - Verdampfen der Flüssigkeit.
  11. Verfahren nach dem vorstehenden Anspruch, wobei der Schritt des Versorgens der ersten Kammer (11) mit Flüssigkeit (30), die mit Partikeln beladen ist, dank einem Werkzeug (110), insbesondere einer Nadel, deren Durchmesser des Endes kleiner ist als die Höhe der ersten Kammer (11), ausgeführt wird.
EP15166479.4A 2014-05-08 2015-05-05 Vorrichtung zur ablagerung von partikeln auf einem substrat, und ablagerungsverfahren, bei dem eine solche vorrichtung zum einsatz kommt Active EP2942111B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1454166A FR3020767A1 (fr) 2014-05-08 2014-05-08 Dispositif de realisation d'un depot de particules sur un substrat et procede de depot utilisant un tel dispositif

Publications (3)

Publication Number Publication Date
EP2942111A2 EP2942111A2 (de) 2015-11-11
EP2942111A3 EP2942111A3 (de) 2016-01-20
EP2942111B1 true EP2942111B1 (de) 2019-04-24

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ID=51063697

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EP15166479.4A Active EP2942111B1 (de) 2014-05-08 2015-05-05 Vorrichtung zur ablagerung von partikeln auf einem substrat, und ablagerungsverfahren, bei dem eine solche vorrichtung zum einsatz kommt

Country Status (3)

Country Link
US (1) US9839938B2 (de)
EP (1) EP2942111B1 (de)
FR (1) FR3020767A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3071257B1 (fr) * 2017-09-19 2021-08-20 Safran Ceram Procede d'injection d'une suspension chargee dans une texture fibreuse et procede de fabrication d'une piece en materiau composite
FR3072038B1 (fr) 2017-10-05 2021-11-05 Centre Nat Rech Scient Procede d'assemblage de particules gravitationnel

Family Cites Families (7)

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Publication number Priority date Publication date Assignee Title
US6068878A (en) * 1998-09-03 2000-05-30 Micron Technology, Inc. Methods of forming layers of particulates on substrates
US7241341B2 (en) * 2002-05-10 2007-07-10 Nanometrix Inc. Method and apparatus for two dimensional assembly of particles
WO2008014604A1 (en) * 2006-08-02 2008-02-07 Nanometrix Inc. Modular transfer apparatus and process
TWI425648B (zh) * 2009-12-31 2014-02-01 Film making system and film making method
TWI421209B (zh) * 2010-08-12 2014-01-01 Academia Sinica 大面積單層微粒膜及其製備方法
US20120171448A1 (en) * 2010-11-24 2012-07-05 Austin Joseph Akey Ordered assembly of nanoparticles in spatially defined regions
WO2014066862A2 (en) * 2012-10-26 2014-05-01 Massachusetts Institute Of Technology Devices and methods for layer-by-layer assembly

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Also Published As

Publication number Publication date
EP2942111A2 (de) 2015-11-11
FR3020767A1 (fr) 2015-11-13
US9839938B2 (en) 2017-12-12
US20150321216A1 (en) 2015-11-12
EP2942111A3 (de) 2016-01-20

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