EP2942111B1 - Device for producing a deposit of particles on a substrate and depositing method using such a device - Google Patents

Device for producing a deposit of particles on a substrate and depositing method using such a device Download PDF

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Publication number
EP2942111B1
EP2942111B1 EP15166479.4A EP15166479A EP2942111B1 EP 2942111 B1 EP2942111 B1 EP 2942111B1 EP 15166479 A EP15166479 A EP 15166479A EP 2942111 B1 EP2942111 B1 EP 2942111B1
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EP
European Patent Office
Prior art keywords
chamber
liquid
particles
volume
height
Prior art date
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Application number
EP15166479.4A
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German (de)
French (fr)
Other versions
EP2942111A2 (en
EP2942111A3 (en
Inventor
Emmanuel Picard
Julien Cordeiro
Kévin Berton
David Peyrade
Marc Zelsmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite Joseph Fourier Grenoble 1
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
Universite Joseph Fourier Grenoble 1
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Publication of EP2942111A2 publication Critical patent/EP2942111A2/en
Publication of EP2942111A3 publication Critical patent/EP2942111A3/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/12—Applying particulate materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/18—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material only one side of the work coming into contact with the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Definitions

  • the invention relates to the field of particle distribution on a surface.
  • the invention relates in particular to a device for depositing particles by a liquid route or a device for depositing particles by a liquid route.
  • the invention further relates to a method of liquid particle deposition.
  • the invention finally relates to a product obtained by the process according to the invention.
  • Liquid can be deposited on the surface and then the liquid evaporated.
  • the amount of particles deposited depends on the manner of depositing the liquid. To control this amount, it is necessary to deposit a calibrated volume of this liquid to always have the same amount of material available to fill structures of a structured substrate with the particles.
  • the document US20120040164A1 discloses a method of manufacturing a layer of material in a container. According to this method, a substrate is introduced into the container, water and a Teflon® disc floating on the water at the water / air interface. Next, particles are placed in a suspension and then a soluble polymer on the disc. After a few hours, the whole forms a layer of particles which is deposited on the substrate when the water is removed.
  • the object of the invention is to provide a liquid particle deposition device improving the known devices of the prior art.
  • the invention provides a simple device and allowing liquid particle deposition operations that are repeatable, reliable and accurate.
  • the vent and the communication port may be disposed opposite to each other in the second chamber or substantially opposite each other in the second chamber and / or the vent and the communication port may be disposed on two opposite or substantially opposed walls of the second chamber.
  • the first chamber and the second chamber may respectively have a first wall and a second wall disposed one in the continuity of the other.
  • the first chamber and the second bedroom may have a common ceiling.
  • the first chamber may be parallelepipedal or substantially parallelepipedal and / or the second chamber may be parallelepipedal or substantially parallelepipedal.
  • the volume of the first chamber may be smaller than the volume of the second chamber, or the volume of the first chamber may be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume. from the second bedroom.
  • the height of the first chamber may be less than the height of the second chamber, or the height of the first chamber may be less than half the height of the second chamber, or the height of the first chamber may be less than one-third from the height of the second chamber.
  • the device may comprise a base and a removable cover and / or attached to the base.
  • the device may be made of a silicone-based material, in particular PDMS.
  • the volume of the first chamber may be about 30 to 40 mm 3 and / or the volume of the second chamber may be about 100 mm 3 .
  • the method of depositing particles on a surface of a substrate comprises the use of a device defined above.
  • the step of feeding the first chamber into a liquid loaded with particles can be achieved by means of a tool, in particular a needle, the diameter of the end of which is less than the height of the first chamber.
  • the invention also relates to a product obtained by the implementation of the method defined above.
  • a first embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 1 to 3 .
  • a second embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 4 and 5 . Both embodiments differ from each other only in size characteristics and in the presence of a removable or attached lid 2 on a base 1 in the first mode, or a lid being in the second mode, either attached to the base, or being monobloc with the base.
  • the external environment is the ambient atmosphere, especially the ambient air.
  • the vent is disposed in a vertical wall of the second chamber which is not intended to come into contact with a liquid that will be injected into the chambers.
  • the first and second chambers connected by the communication orifice thus form a single cavity.
  • the communication orifice may not have a smaller cross-sectional area than that of the smaller-sized chamber, at least in the vicinity of the orifice.
  • the first chamber and the second chamber are made in the device, in particular in the base 1.
  • the lid 2 closes the first chamber and the second chamber on one side of the device.
  • the second chamber has an opening 129 intended to be closed by a surface 101 of a substrate to be treated as described below, that is to say a surface on which particles must be deposited.
  • the first chamber and the second chamber advantageously have respectively a first wall 111 of cover and a second wall 121 arranged one in the continuity of the other.
  • the cover can form a common ceiling 111, 121 to the first chamber and the second chamber.
  • the vent and the communication port are disposed opposite each other in the second chamber or substantially opposite each other in the second chamber.
  • the vent and the communication orifice may be disposed on two walls 122, 125 opposite or substantially opposite the second chamber, in particular parallel or substantially parallel walls. The advantage of such a disposition or configuration will be given below.
  • the first chamber is parallelepipedal or substantially parallelepipedic and / or the second chamber is parallelepipedal or substantially parallelepipedic.
  • the first chamber has a bottom 119 and side walls 113, 114, and 115.
  • the second chamber has sidewalls 122, 123, 124, and 125.
  • the volume of the first chamber is smaller than the volume of the second chamber.
  • the volume of the first chamber may in particular be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume of the second chamber.
  • the volume of the first chamber is approximately 30 to 40 mm 3 and / or the volume of the second chamber is approximately 100 mm 3 .
  • the volume of the first chamber is 36 mm 3 and the volume of the second chamber is 108 mm 3 . It is obvious that higher volumes can be brought into play using rooms covering areas up to several hundred cm 3 and on which we must deposit the particles.
  • the height h 'of the first chamber is preferably less than the height h of the second chamber, or the height h' of the first chamber is less than half the height h of the second chamber, or the height h 'of the first chamber is less than one third of the height h of the second chamber.
  • h is 3 mm and h 'is between 0.5 mm and 1.5 mm, especially 1 mm.
  • the second chamber is connected to the first chamber through the orifice 13, having an area of section equal to one third of the surface of one side of the second chamber to which the first chamber is connected.
  • the first chamber can measure the same width as the second chamber and / or their upper walls 111, 121 can be coplanar.
  • the device is preferably made of a material based on silicone, especially PDMS (or polydimethylsiloxane).
  • PDMS polydimethylsiloxane
  • the horizontal faces, that is to say the lid, can be made of glass.
  • the embodiment of the device can be carried out for example by molding PDMS in an aluminum mold.
  • Other materials may be used but the wettability of these materials by the liquid used will have to be similar to that of PDMS by water.
  • the method comprises the use of a device as defined or described previously.
  • the step of feeding the first chamber 11 into a liquid 30 charged with particles is carried out by means of a tool 110, in particular a needle, the diameter of the end of which is advantageously less than the height h 'of the first chamber 11 .
  • the filling continues in the second chamber, the liquid introduced into the first chamber migrating to the second chamber via the orifice 13.
  • This filling is done by means of a tool which makes it possible to pierce a wall of the first chamber, in particular the wall 111 or the wall 115.
  • the filling continues until it covers the surface 101 of the substrate on which particles must be deposited and stops before the complete filling of the second chamber, that is to say before the wall 122 having the vent 14 is wetted.
  • the dose of liquid contained in the tool must be calibrated and less than the volume of the cavity formed by the first and second chambers.
  • the liquid progressively wets the walls 125, 101, 121, 123 and 124 after being discharged through the orifice 13 and the front 31 of liquid progresses towards the wall 122 while driving off the gas, in particular the air contained in the second chamber, via the vent 14.
  • the first chamber must be completely filled (or substantially, there may remain one or more air pockets) before the filling of the second chamber begins.
  • the liquid will therefore be distributed in the second chamber, from the communication port 13 and therefore only by progressively wetting the surfaces of the second chamber, for example by progressively wetting five of the walls of the second chamber.
  • the wall 122 having the vent 14 is found in front of the liquid front, but is not reached by the liquid, the volume of liquid being determined or calibrated to prevent it from wetting the wall.
  • the liquid front 31 can thus be formed substantially parallel to the wall 122. This effect is obtained by the relative provisions of the vent and the communication port in the second chamber.
  • the vent and orifice are for example arranged opposite to each other or substantially opposite to each other in the second chamber.
  • the first chamber can be filled without any constraint on the position of the tool 110 ensuring the filling, in particular the needle 110.
  • the diameter of the end of the tool 110 is for example 0.5mm in diameter. This tool makes it possible to pierce the material of the device in order to inject the liquid. The effect obtained is independent of the position of the injection. Indeed, during injection, the end of the tool may be perpendicular to the bottom 119 of the device. Alternatively, the end of the tool may be parallel to the bottom 119 of the device. The end of the tool can still occupy any intermediate configuration.
  • the liquid front 31 moves towards the wall 125, the evaporation gas of the liquid being evacuated via the vent 14.
  • the liquid front leaves on the walls and on the surface 101 of the substrate, in particular in structures or etchings 102 made on the surface 101, a deposit 103 of particles which were previously suspended in the liquid. According to the density of particles in the liquid and according to the form and / or the size of the structures, one can thus deposit the number of particles that one wants in each structure.
  • the vent can be coupled to a suction system.
  • the adjustment of the suction system can, together with the heating, improve the efficiency of the deposition of particles.
  • the device may comprise several vents.
  • the vents are preferably distributed on the wall 125. It is also possible to remove the wall 125.
  • the opening of the second chamber at this level constitutes a large vent.
  • the device 10 can then be removed or deposited. In other words, the device 10 can be removed or separated from the substrate.
  • a product 100 or a substrate 100 is thus obtained by implementing the method defined or described above.
  • a product 100 or a substrate 100 on which particles have been deposited is thus obtained.
  • Deposition of particles on a surface may allow subsequent analysis of the particles and / or their characterization. Deposition of particles on a surface may allow functionalization of the surface where the particles provide a specific function, including a function that they provide intrinsically.
  • vent means any opening or passage or any set of openings or passages for the evacuation of gas.

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)

Description

L'invention concerne le domaine de la répartition de particules sur une surface. L'invention concerne en particulier un dispositif de dépôt de particules par voie liquide ou un dispositif pour le dépôt de particules par voie liquide. L'invention concerne encore un procédé de dépôt de particules par voie liquide. L'invention concerne enfin un produit obtenu par le procédé selon l'invention.The invention relates to the field of particle distribution on a surface. The invention relates in particular to a device for depositing particles by a liquid route or a device for depositing particles by a liquid route. The invention further relates to a method of liquid particle deposition. The invention finally relates to a product obtained by the process according to the invention.

Il est connu de déposer sur une surface des particules en suspension dans un liquide. On peut déposer du liquide sur la surface puis d'évaporer le liquide.It is known to deposit on a surface particles suspended in a liquid. Liquid can be deposited on the surface and then the liquid evaporated.

Toutefois, il est délicat de déposer des particules sur des surfaces de manière répétable selon ce processus. En effet, la quantité des particules déposées dépend de la manière de déposer le liquide. Pour maîtriser cette quantité, il est nécessaire de déposer un volume calibré de ce liquide pour avoir toujours la même quantité de matière à disposition afin de remplir des structures d'un substrat structuré avec les particules.However, it is difficult to deposit particles on surfaces in a repeatable manner according to this process. Indeed, the amount of particles deposited depends on the manner of depositing the liquid. To control this amount, it is necessary to deposit a calibrated volume of this liquid to always have the same amount of material available to fill structures of a structured substrate with the particles.

Lorsque les volumes de liquide à déposer sont faibles et que les tailles deviennent petites, des phénomènes de capillarité deviennent prépondérants et compliquent les choses.When the liquid volumes to be deposited are small and the sizes become small, phenomena of capillarity become preponderant and complicate things.

Le document US20120040164A1 décrit un procédé de fabrication d'une couche de matériau dans un container. Selon ce procédé, on introduit dans le container, un substrat, de l'eau et un disque de Teflon® flottant sur l'eau à l'interface eau/air. Ensuite, on positionne des particules dans une suspension, puis un polymère soluble sur le disque. Au bout de quelques heures l'ensemble forme une couche de particules qui se dépose sur le substrat lorsque l'eau est retirée.The document US20120040164A1 discloses a method of manufacturing a layer of material in a container. According to this method, a substrate is introduced into the container, water and a Teflon® disc floating on the water at the water / air interface. Next, particles are placed in a suspension and then a soluble polymer on the disc. After a few hours, the whole forms a layer of particles which is deposited on the substrate when the water is removed.

Le but de l'invention est de fournir un dispositif de dépôt de particules par voie liquide améliorant les dispositifs connus de l'art antérieur. En particulier, l'invention propose un dispositif simple et permettant des opérations de dépôt de particules par voie liquide qui soient répétables, fiables et précises.The object of the invention is to provide a liquid particle deposition device improving the known devices of the prior art. In particular, the invention provides a simple device and allowing liquid particle deposition operations that are repeatable, reliable and accurate.

Selon l'invention, le dispositif de dépôt de particules par voie liquide, comprend:

  • une première chambre apte à être alimentée en un liquide chargé en particules,
  • une deuxième chambre, présentant une ouverture destinée à être obturée par une surface d'un substrat sur laquelle les particules doivent être déposées,
  • un orifice de communication entre la première chambre et la deuxième chambre, l'orifice de communication étant apte à la migration du liquide de la première chambre vers la deuxième chambre, et
  • un évent prévu dans la deuxième chambre et mettant en communication la deuxième chambre et un milieu extérieur au dispositif.
According to the invention, the liquid particle deposition device comprises:
  • a first chamber capable of being fed with a liquid loaded with particles,
  • a second chamber, having an opening to be closed by a surface of a substrate on which the particles are to be deposited,
  • a communication orifice between the first chamber and the second chamber, the communication orifice being adapted to the migration of the liquid from the first chamber to the second chamber, and
  • a vent provided in the second chamber and communicating the second chamber and an external environment to the device.

L'évent et l'orifice de communication peuvent être disposés à l'opposé l'un de l'autre dans la deuxième chambre ou sensiblement à l'opposé l'un de l'autre dans la deuxième chambre et/ou l'évent et l'orifice de communication peuvent être disposés sur deux parois opposées ou sensiblement opposées de la deuxième chambre.The vent and the communication port may be disposed opposite to each other in the second chamber or substantially opposite each other in the second chamber and / or the vent and the communication port may be disposed on two opposite or substantially opposed walls of the second chamber.

La première chambre et la deuxième chambre peuvent présenter respectivement une première paroi et une deuxième paroi disposées l'une dans la continuité de l'autre. La première chambre et la deuxième chambre peuvent présenter notamment un plafond commun.The first chamber and the second chamber may respectively have a first wall and a second wall disposed one in the continuity of the other. The first chamber and the second bedroom may have a common ceiling.

La première chambre peut être parallélépipédique ou sensiblement parallélépipédique et/ou la deuxième chambre peut être parallélépipédique ou sensiblement parallélépipédique.The first chamber may be parallelepipedal or substantially parallelepipedal and / or the second chamber may be parallelepipedal or substantially parallelepipedal.

Le volume de la première chambre peut être inférieur au volume de la deuxième chambre, voire le volume de la première chambre peut être inférieur à la moitié du volume de la deuxième chambre, voire le volume de la première chambre peut être inférieur au tiers du volume de la deuxième chambre.The volume of the first chamber may be smaller than the volume of the second chamber, or the volume of the first chamber may be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume. from the second bedroom.

La hauteur de la première chambre peut être inférieure à la hauteur de la deuxième chambre, voire la hauteur de la première chambre peut être inférieure à la moitié de la hauteur de la deuxième chambre, voire la hauteur de la première chambre peut être inférieure au tiers de la hauteur de la deuxième chambre.The height of the first chamber may be less than the height of the second chamber, or the height of the first chamber may be less than half the height of the second chamber, or the height of the first chamber may be less than one-third from the height of the second chamber.

Le dispositif peut comprendre une embase et un couvercle amovible et/ou rapporté sur l'embase.The device may comprise a base and a removable cover and / or attached to the base.

Le dispositif peut être réalisé en un matériau à base de silicone, notamment en PDMS.The device may be made of a silicone-based material, in particular PDMS.

Le volume de la première chambre peut être d'environ 30 à 40 mm3 et/ou le volume de la deuxième chambre peut être d'environ 100 mm3.The volume of the first chamber may be about 30 to 40 mm 3 and / or the volume of the second chamber may be about 100 mm 3 .

Selon l'invention, le procédé de dépôt de particules sur une surface d'un substrat comprend l'utilisation d'un dispositif défini précédemment.According to the invention, the method of depositing particles on a surface of a substrate comprises the use of a device defined above.

Le procédé peut comprendre les étapes suivantes,

  • Mettre en place le dispositif sur la surface du substrat ;
  • Alimenter la première chambre en un liquide chargé en particules, notamment au travers d'une paroi de la première chambre ;
  • Evaporer le liquide.
The method may comprise the following steps,
  • Set up the device on the surface of the substrate;
  • Feeding the first chamber into a liquid loaded with particles, in particular through a wall of the first chamber;
  • Evaporate the liquid.

L'étape d'alimentation de la première chambre en un liquide chargé en particules peut être réalisée grâce à un outil, notamment une aiguille, dont le diamètre de l'extrémité est inférieur à la hauteur de la première chambre.The step of feeding the first chamber into a liquid loaded with particles can be achieved by means of a tool, in particular a needle, the diameter of the end of which is less than the height of the first chamber.

L'invention porte aussi sur un produit obtenu par la mise en oeuvre du procédé défini précédemment.The invention also relates to a product obtained by the implementation of the method defined above.

L'invention sera mieux comprise à la lecture de la description qui va suivre, donnée uniquement à titre d'exemple et faite en se référant aux dessins annexés sur lesquels :

  • La figure 1 est une vue en perspective éclatée d'un premier mode de réalisation du dispositif selon l'invention.
  • La figure 2 est une vue de dessus de l'embase du dispositif selon le premier mode de réalisation, les dimensions étant indiquées en mm.
  • La figure 3 est une vue en coupe, selon le plan III-III, de l'embase du dispositif selon le premier mode de réalisation.
  • La figure 4 est une vue de dessus du dispositif selon un deuxième mode de réalisation de l'invention.
  • La figure 5 est une vue en coupe du dispositif selon le deuxième mode de réalisation.
  • La figure 6 est une vue en coupe du dispositif selon le deuxième mode de réalisation, le dispositif étant utilisé pour mettre en oeuvre une première étape de réalisation d'un procédé de dépôt selon l'invention.
  • La figure 7 est une vue en coupe du dispositif selon le deuxième mode de réalisation, le dispositif étant utilisé pour mettre en oeuvre une deuxième étape de réalisation d'un procédé de dépôt selon l'invention.
The invention will be better understood on reading the description which follows, given solely by way of example and with reference to the appended drawings in which:
  • The figure 1 is an exploded perspective view of a first embodiment of the device according to the invention.
  • The figure 2 is a top view of the base of the device according to the first embodiment, the dimensions being indicated in mm.
  • The figure 3 is a sectional view, along the plane III-III, of the base of the device according to the first embodiment.
  • The figure 4 is a top view of the device according to a second embodiment of the invention.
  • The figure 5 is a sectional view of the device according to the second embodiment.
  • The figure 6 is a sectional view of the device according to the second embodiment, the device being used to implement a first step of performing a deposition method according to the invention.
  • The figure 7 is a sectional view of the device according to the second embodiment, the device being used to implement a second step of performing a deposition method according to the invention.

Un premier mode de réalisation d'un dispositif 10 de dépôt de particules par voie liquide selon l'invention est décrit ci-après en référence aux figures 1 à 3. Un deuxième mode de réalisation d'un dispositif 10 de dépôt de particules par voie liquide selon l'invention est décrit ci-après en référence aux figures 4 et 5. Les deux modes de réalisation diffèrent l'un de l'autre seulement par des caractéristiques de dimensions et par la présence d'un couvercle 2 amovible ou rapporté sur une embase 1 dans le premier mode, ou d'un couvercle étant, dans le deuxième mode, soit fixé à l'embase, soit étant monobloc avec l'embase.A first embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 1 to 3 . A second embodiment of a liquid particle deposition device 10 according to the invention is described below with reference to FIGS. Figures 4 and 5 . Both embodiments differ from each other only in size characteristics and in the presence of a removable or attached lid 2 on a base 1 in the first mode, or a lid being in the second mode, either attached to the base, or being monobloc with the base.

Le dispositif 10 comprend:

  • une première chambre 11,
  • une deuxième chambre 12,
  • un orifice 13 ou canal ou passage de communication entre la première chambre 11 et la deuxième chambre 12, et
  • un évent 14 prévu dans la deuxième chambre et mettant en communication la deuxième chambre et un milieu extérieur 200 au dispositif.
The device 10 comprises:
  • a first chamber 11,
  • a second room 12,
  • an orifice 13 or channel or passage of communication between the first chamber 11 and the second chamber 12, and
  • a vent 14 provided in the second chamber and communicating the second chamber and an external medium 200 to the device.

Le milieu extérieur est l'atmosphère ambiante, notamment l'air ambiant. L'évent est disposé dans une paroi verticale de la deuxième chambre qui n'est pas destinée à venir en contact avec un liquide qui sera injecté dans les chambres.The external environment is the ambient atmosphere, especially the ambient air. The vent is disposed in a vertical wall of the second chamber which is not intended to come into contact with a liquid that will be injected into the chambers.

Les première et deuxième chambres reliées par l'orifice de communication forment donc une cavité unique.The first and second chambers connected by the communication orifice thus form a single cavity.

L'orifice de communication peut ne pas présenter de section d'aire plus réduite que celle que présente la chambre de plus petite dimension, au moins au voisinage de l'orifice.The communication orifice may not have a smaller cross-sectional area than that of the smaller-sized chamber, at least in the vicinity of the orifice.

Comme vu précédemment, la première chambre et la deuxième chambre sont réalisées dans le dispositif, en particulier dans l'embase 1. Le couvercle 2 ferme la première chambre et la deuxième chambre d'un côté du dispositif. De l'autre côté du dispositif, la deuxième chambre présente une ouverture 129 destinée à être obturée par une surface 101 d'un substrat à traiter comme décrit plus bas, c'est-à-dire une surface sur laquelle on doit déposer des particules. La première chambre et la deuxième chambre présentent avantageusement respectivement une première paroi 111 de couvercle et une deuxième paroi 121 disposées l'une dans la continuité de l'autre. Ainsi, le couvercle peut former un plafond commun 111, 121 à la première chambre et à la deuxième chambre.As seen above, the first chamber and the second chamber are made in the device, in particular in the base 1. The lid 2 closes the first chamber and the second chamber on one side of the device. On the other side of the device, the second chamber has an opening 129 intended to be closed by a surface 101 of a substrate to be treated as described below, that is to say a surface on which particles must be deposited. . The first chamber and the second chamber advantageously have respectively a first wall 111 of cover and a second wall 121 arranged one in the continuity of the other. Thus, the cover can form a common ceiling 111, 121 to the first chamber and the second chamber.

De préférence, l'évent et l'orifice de communication sont disposés à l'opposé l'un de l'autre dans la deuxième chambre ou sensiblement à l'opposé l'un de l'autre dans la deuxième chambre. Notamment, l'évent et l'orifice de communication peuvent être disposés sur deux parois 122, 125 opposées ou sensiblement opposées de la deuxième chambre, notamment des parois parallèles ou sensiblement parallèles. L'avantage d'une telle disposition ou configuration sera donnée plus bas.Preferably, the vent and the communication port are disposed opposite each other in the second chamber or substantially opposite each other in the second chamber. In particular, the vent and the communication orifice may be disposed on two walls 122, 125 opposite or substantially opposite the second chamber, in particular parallel or substantially parallel walls. The advantage of such a disposition or configuration will be given below.

Par exemple, la première chambre est parallélépipédique ou sensiblement parallélépipédique et/ou la deuxième chambre est parallélépipédique ou sensiblement parallélépipédique. Par exemple, la première chambre présente un fond 119 et des parois latérales 113, 114 et 115. Par exemple, la deuxième chambre présente des parois latérales 122, 123, 124 et 125.For example, the first chamber is parallelepipedal or substantially parallelepipedic and / or the second chamber is parallelepipedal or substantially parallelepipedic. For example, the first chamber has a bottom 119 and side walls 113, 114, and 115. For example, the second chamber has sidewalls 122, 123, 124, and 125.

Le volume de la première chambre est inférieur au volume de la deuxième chambre. Le volume de la première chambre peut notamment être inférieur à la moitié du volume de la deuxième chambre, voire le volume de la première chambre peut être inférieur au tiers du volume de la deuxième chambre.The volume of the first chamber is smaller than the volume of the second chamber. The volume of the first chamber may in particular be less than half the volume of the second chamber, or the volume of the first chamber may be less than one third of the volume of the second chamber.

Notamment, le volume de la première chambre est d'environ 30 à 40 mm3 et/ou le volume de la deuxième chambre est d'environ 100 mm3. Avec les dimensions des chambres du dispositif de la figure 3, le volume de la première chambre vaut 36 mm3 et le volume de la deuxième chambre vaut 108 mm3. Il est évident que des volumes plus importants peuvent être mis en jeu en utilisant des chambres couvrant des surfaces pouvant aller jusqu'à plusieurs centaines de cm3 et sur lesquelles on doit déposer des particules.In particular, the volume of the first chamber is approximately 30 to 40 mm 3 and / or the volume of the second chamber is approximately 100 mm 3 . With the dimensions of the chambers of the device of the figure 3 the volume of the first chamber is 36 mm 3 and the volume of the second chamber is 108 mm 3 . It is obvious that higher volumes can be brought into play using rooms covering areas up to several hundred cm 3 and on which we must deposit the particles.

La hauteur h' de la première chambre est de préférence inférieure à la hauteur h de la deuxième chambre, voire la hauteur h' de la première chambre est inférieure à la moitié de la hauteur h de la deuxième chambre, voire la hauteur h' de la première chambre est inférieure au tiers de la hauteur h de la deuxième chambre. Par exemple, h vaut 3 mm et h' vaut entre 0,5 mm et 1,5 mm, notamment 1 mm.The height h 'of the first chamber is preferably less than the height h of the second chamber, or the height h' of the first chamber is less than half the height h of the second chamber, or the height h 'of the first chamber is less than one third of the height h of the second chamber. For example, h is 3 mm and h 'is between 0.5 mm and 1.5 mm, especially 1 mm.

La deuxième chambre est reliée à la première chambre par l'orifice 13, ayant une aire de section égale au tiers de la surface d'un côté de la deuxième chambre à laquelle est connectée la première chambre. La première chambre peut mesurer la même largeur que la deuxième chambre et/ou leurs parois supérieures 111, 121 peuvent être coplanaires.The second chamber is connected to the first chamber through the orifice 13, having an area of section equal to one third of the surface of one side of the second chamber to which the first chamber is connected. The first chamber can measure the same width as the second chamber and / or their upper walls 111, 121 can be coplanar.

Le dispositif est de préférence réalisé en un matériau à base de silicone, notamment en PDMS (ou polydiméthylsiloxane). Les faces horizontales, c'est-à-dire le couvercle, peuvent être réalisées en verre.The device is preferably made of a material based on silicone, especially PDMS (or polydimethylsiloxane). The horizontal faces, that is to say the lid, can be made of glass.

La réalisation du dispositif peut être effectuée par exemple par moulage de PDMS dans un moule en aluminium. D'autres matériaux peuvent être utilisés mais la mouillabilité de ces matériaux par le liquide utilisé devra être semblable à celle du PDMS par l'eau.The embodiment of the device can be carried out for example by molding PDMS in an aluminum mold. Other materials may be used but the wettability of these materials by the liquid used will have to be similar to that of PDMS by water.

Un mode d'exécution d'un procédé de dépôt de particules sur une surface 101 d'un substrat 100 est décrit ci-après en référence aux figures 6 et 7.One embodiment of a method for depositing particles on a surface 101 of a substrate 100 is described below with reference to Figures 6 and 7 .

Le procédé comprend l'utilisation d'un dispositif selon défini ou décrit précédemment.The method comprises the use of a device as defined or described previously.

Le procédé de dépôt comprend les étapes suivantes,

  • Mettre en place le dispositif 10 sur la surface 101 du substrat 100 comme représenté à la figure 6 ;
  • Alimenter la première chambre 11 en un liquide 30 chargé en particules, notamment au travers d'une paroi 111 de la première chambre, comme représenté à la figure 6 ;
  • Evaporer le liquide, comme représenté à la figure 7.
The deposition process comprises the following steps,
  • Place the device 10 on the surface 101 of the substrate 100 as shown in FIG. figure 6 ;
  • Feeding the first chamber 11 into a liquid 30 charged with particles, in particular through a wall 111 of the first chamber, as shown in FIG. figure 6 ;
  • Evaporate the liquid, as shown in figure 7 .

L'étape d'alimentation de la première chambre 11 en un liquide 30 chargé en particules est réalisée grâce à un outil 110, notamment une aiguille, dont le diamètre de l'extrémité est avantageusement inférieur à la hauteur h' de la première chambre 11.The step of feeding the first chamber 11 into a liquid 30 charged with particles is carried out by means of a tool 110, in particular a needle, the diameter of the end of which is advantageously less than the height h 'of the first chamber 11 .

Une fois le dispositif positionné sur la surface du substrat sur laquelle les particules doivent être déposées, il faut remplir d'abord la première chambre, puis le remplissage se poursuit dans la deuxième chambre, le liquide introduit dans la première chambre migrant vers la deuxième chambre via l'orifice 13. Ce remplissage se fait grâce à un outil qui permet de percer une paroi de la première chambre, notamment la paroi 111 ou la paroi 115. Le remplissage se poursuit jusqu'à couvrir la surface 101 de substrat sur laquelle des particules doivent être déposées et s'arrête avant le remplissage complet de la deuxième chambre, c'est-à-dire avant que la paroi 122 présentant l'évent 14 ne soit mouillée. La dose de liquide contenue dans l'outil doit donc être calibrée et inférieure au volume de la cavité formée par les première et deuxième chambres. Durant le remplissage, du fait des phénomènes de capillarité, le liquide mouille progressivement les parois 125, 101, 121, 123 et 124 après être sorti par l'orifice 13 et le front 31 de liquide progresse vers la paroi 122 en chassant le gaz, notamment l'air contenu dans la deuxième chambre, via l'évent 14.Once the device is positioned on the surface of the substrate on which the particles are to be deposited, it is necessary first to fill the first chamber, then the filling continues in the second chamber, the liquid introduced into the first chamber migrating to the second chamber via the orifice 13. This filling is done by means of a tool which makes it possible to pierce a wall of the first chamber, in particular the wall 111 or the wall 115. The filling continues until it covers the surface 101 of the substrate on which particles must be deposited and stops before the complete filling of the second chamber, that is to say before the wall 122 having the vent 14 is wetted. The dose of liquid contained in the tool must be calibrated and less than the volume of the cavity formed by the first and second chambers. During filling, due to the capillary phenomena, the liquid progressively wets the walls 125, 101, 121, 123 and 124 after being discharged through the orifice 13 and the front 31 of liquid progresses towards the wall 122 while driving off the gas, in particular the air contained in the second chamber, via the vent 14.

Grâce à la configuration du dispositif, il est possible d'imposer des conditions de mouillage au liquide avant son entrée dans la deuxième chambre. La première chambre doit être complètement remplie (ou sensiblement, il peut rester une ou plusieurs poches d'air) avant le début du remplissage de la deuxième chambre. Le liquide va donc se répartir dans la deuxième chambre, depuis l'orifice 13 de communication et donc uniquement en mouillant progressivement les surfaces de la deuxième chambre, par exemple en mouillant progressivement cinq des parois de la deuxième chambre. La paroi 122 présentant l'évent 14 se retrouve face au front de liquide, mais n'est pas atteint par le liquide, le volume de liquide étant déterminé ou calibré pour éviter qu'il vienne mouiller cette paroi. Le front de liquide 31 peut ainsi être formé sensiblement parallèlement à la paroi 122. Cet effet est obtenu par les dispositions relatives de l'évent et de l'orifice de communication dans la deuxième chambre. Les évent et orifice sont par exemple disposés à l'opposé l'un de l'autre ou sensiblement à l'opposé l'un de l'autre dans la deuxième chambre.Due to the configuration of the device, it is possible to impose wetting conditions on the liquid before entering the second chamber. The first chamber must be completely filled (or substantially, there may remain one or more air pockets) before the filling of the second chamber begins. The liquid will therefore be distributed in the second chamber, from the communication port 13 and therefore only by progressively wetting the surfaces of the second chamber, for example by progressively wetting five of the walls of the second chamber. The wall 122 having the vent 14 is found in front of the liquid front, but is not reached by the liquid, the volume of liquid being determined or calibrated to prevent it from wetting the wall. The liquid front 31 can thus be formed substantially parallel to the wall 122. This effect is obtained by the relative provisions of the vent and the communication port in the second chamber. The vent and orifice are for example arranged opposite to each other or substantially opposite to each other in the second chamber.

La première chambre peut être remplie sans aucune contrainte sur la position de l'outil 110 assurant le remplissage, notamment l'aiguille 110. Le diamètre de l'extrémité de l'outil 110 est par exemple de 0.5mm de diamètre. Cet outil permet de percer le matériau du dispositif afin d'injecter le liquide. L'effet obtenu est indépendant de la position de l'injection. En effet, lors de l'injection, l'extrémité de l'outil peut être perpendiculaire au fond 119 du dispositif. Alternativement, l'extrémité de l'outil peut être parallèle au fond 119 du dispositif. L'extrémité de l'outil peut encore occuper toute configuration intermédiaire.The first chamber can be filled without any constraint on the position of the tool 110 ensuring the filling, in particular the needle 110. The diameter of the end of the tool 110 is for example 0.5mm in diameter. This tool makes it possible to pierce the material of the device in order to inject the liquid. The effect obtained is independent of the position of the injection. Indeed, during injection, the end of the tool may be perpendicular to the bottom 119 of the device. Alternatively, the end of the tool may be parallel to the bottom 119 of the device. The end of the tool can still occupy any intermediate configuration.

Pour favoriser ou permettre l'évaporation du liquide comme représenté sur la figure 7, il est possible de réaliser un chauffage, notamment un chauffage du substrat 100 et/ou du dispositif 10. Lors de l'évaporation, le front de liquide 31 se déplace vers la paroi 125, le gaz d'évaporation du liquide étant évacué via l'évent 14. En se retirant, le front de liquide laisse sur les parois et sur la surface 101 du substrat, notamment dans des structures ou gravures 102 réalisées sur la surface 101, un dépôt 103 de particules qui se trouvaient préalablement en suspension dans le liquide. Selon la densité de particules dans le liquide et selon la forme et/ou la taille des structures, on peut ainsi déposer le nombre de particules que l'on veut dans chaque structure.To promote or allow the evaporation of the liquid as represented on the figure 7 it is possible to carry out a heating, in particular a heating of the substrate 100 and / or the device 10. During the evaporation, the liquid front 31 moves towards the wall 125, the evaporation gas of the liquid being evacuated via the vent 14. By withdrawing, the liquid front leaves on the walls and on the surface 101 of the substrate, in particular in structures or etchings 102 made on the surface 101, a deposit 103 of particles which were previously suspended in the liquid. According to the density of particles in the liquid and according to the form and / or the size of the structures, one can thus deposit the number of particles that one wants in each structure.

L'évent peut être couplé à un système d'aspiration. Le réglage du système d'aspiration peut, associé avec le chauffage, améliorer l'efficacité du dépôt de particules.The vent can be coupled to a suction system. The adjustment of the suction system can, together with the heating, improve the efficiency of the deposition of particles.

Dans le cas où des particules doivent être déposées sur une grande surface de substrat et dans le cas où la cavité présente un grand volume, le dispositif peut comprendre plusieurs évents. Les évents sont de préférence répartis sur la paroi 125. Il est également possible de supprimer la paroi 125. L'ouverture de la deuxième chambre à ce niveau constitue un évent de grandes dimensions.In the case where particles must be deposited on a large surface of the substrate and in the case where the cavity has a large volume, the device may comprise several vents. The vents are preferably distributed on the wall 125. It is also possible to remove the wall 125. The opening of the second chamber at this level constitutes a large vent.

Le dispositif 10 peut ensuite être retiré ou déposé. Autrement dit, le dispositif 10 peut être enlevé ou séparé du substrat. On obtient alors un produit 100 ou un substrat 100 réalisé par la mise en oeuvre du procédé défini ou décrit précédemment. On obtient donc un produit 100 ou un substrat 100 sur lequel des particules ont été déposées.The device 10 can then be removed or deposited. In other words, the device 10 can be removed or separated from the substrate. A product 100 or a substrate 100 is thus obtained by implementing the method defined or described above. A product 100 or a substrate 100 on which particles have been deposited is thus obtained.

Grâce à la solution décrite plus haut, il est possible d'obtenir une introduction de l'outil qui amène le liquide qui ne détruit ou n'endommage pas le substrat. Lorsque la quantité de liquide souhaitée est déterminée, l'opération devient reproductible puisque la quantité déposée sera toujours identique.With the solution described above, it is possible to obtain an introduction of the tool that brings the liquid that does not destroy or damage the substrate. When the desired quantity of liquid is determined, the operation becomes reproducible since the quantity deposited will always be identical.

Lorsque l'on injecte un liquide dans une cellule dont le volume est similaire à celui du liquide injecté, il est très difficile d'être déterministe sur les faces qui vont être en contact avec le liquide. Grâce à la solution décrite plus haut, il est ainsi possible d'injecter un liquide dans un volume fermé, par exemple de forme parallélépipédique, avec un outil, de manière déterministe. Le remplissage est reproductible et indépendant de la dextérité de l'opérateur. On sait que seules certaines parois déterminées de la deuxième chambre seront mouillées par le liquide. Enfin, grâce à la géométrie du dispositif, il est possible de ne pas détériorer les parois de la deuxième chambre ou la surface du substrat (par piqure de la paroi ou de la surface).When a liquid is injected into a cell whose volume is similar to that of the injected liquid, it is very difficult to be deterministic on the faces that will be in contact with the liquid. With the solution described above, it is thus possible to inject a liquid in a closed volume, for example of parallelepiped shape, with a tool, in a deterministic manner. The filling is reproducible and independent of the dexterity of the operator. It is known that only certain determined walls of the second chamber will be wetted by the liquid. Finally, thanks to the geometry of the device, it is possible not to deteriorate the walls of the second chamber or the surface of the substrate (by stitching the wall or the surface).

Un dépôt de particules sur une surface peut permettre l'analyse ultérieure des particules et/ou leur caractérisation. Un dépôt de particules sur une surface peut permettre une fonctionnalisation de la surface où les particules assurent une fonction déterminée, notamment une fonction qu'elles assurent intrinsèquement.Deposition of particles on a surface may allow subsequent analysis of the particles and / or their characterization. Deposition of particles on a surface may allow functionalization of the surface where the particles provide a specific function, including a function that they provide intrinsically.

Dans ce document, par « évent », on entend toute ouverture ou passage ou tout ensemble d'ouvertures ou de passages permettant l'évacuation de gaz.In this document, "vent" means any opening or passage or any set of openings or passages for the evacuation of gas.

Claims (11)

  1. Device (10) for depositing particles via the liquid route comprising:
    - a first chamber (11) adapted to being supplied with a liquid (30) charged with particles,
    - a second chamber (12) having an opening (129) which is intended to be closed by a surface (101) of a substrate on which particles have to be deposited,
    - a communication hole (13) between the first chamber (11) and the second chamber (12), the communication hole being adapted to the travelling of the liquid from the first chamber towards the second chamber, and
    - a vent (14) which is provided in the second chamber and which places the second chamber and a medium (200) which is external with respect to the device in communication.
  2. Device according to claim 1, characterised in that the vent and the communication hole are arranged opposite each other in the second chamber or substantially opposite each other in the second chamber and/or in that the vent and the communication hole are arranged on two opposing or substantially opposing walls (122, 125) of the second chamber.
  3. Device according to either of the preceding claims, characterised in that the first chamber and the second chamber have a first wall (111) and a second wall (121) which are arranged one in continuation of the other, respectively, the first chamber and the second chamber having in particular a common ceiling (111, 121).
  4. Device according to any one of the preceding claims, characterised in that the first chamber is parallelepipedal or substantially parallelepipedal and/or in that the second chamber is parallelepipedal or substantially parallelepipedal.
  5. Device according to any one of the preceding claims, characterised in that the volume of the first chamber is less than the volume of the second chamber, or in that the volume of the first chamber is less than half of the volume of the second chamber, or in that the volume of the first chamber is less than one-third of the volume of the second chamber.
  6. Device according to any one of the preceding claims, characterised in that the height of the first chamber is less than the height of the second chamber, or in that the height of the first chamber is less than half of the height of the second chamber, or in that the height of the first chamber is less than one-third of the height of the second chamber.
  7. Device according to any one of the preceding claims, characterised in that the device comprises a base (1) and a cover (2) which is removable and/or fitted to the base.
  8. Device according to any one of the preceding claims, characterised in that the device is produced from a silicone-based material, in particular PDMS.
  9. Method for depositing particles on a surface (101) of a substrate (100), comprising the use of a device according to any one of the preceding claims.
  10. Method according to the preceding claim, comprising the following steps,
    - positioning the device on the surface (101) of the substrate (100);
    - supplying the first chamber (11) with a liquid (30) charged with particles, in particular through a wall (111) of the first chamber;
    - evaporating the liquid.
  11. Method according to the preceding claim, in which the step of supplying the first chamber (11) with a liquid (30) charged with particles is carried out by means of a tool (110), in particular a needle, the end diameter of which is less than the height of the first chamber (11).
EP15166479.4A 2014-05-08 2015-05-05 Device for producing a deposit of particles on a substrate and depositing method using such a device Active EP2942111B1 (en)

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FR1454166A FR3020767A1 (en) 2014-05-08 2014-05-08 DEVICE FOR MAKING A DEPOSITION OF PARTICLES ON A SUBSTRATE AND DEPOSITION METHOD USING SUCH A DEVICE

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FR3071257B1 (en) * 2017-09-19 2021-08-20 Safran Ceram PROCESS FOR INJECTING A SUSPENSION LOADED IN A FIBROUS TEXTURE AND PROCESS FOR MANUFACTURING A PART FROM COMPOSITE MATERIAL
FR3072038B1 (en) * 2017-10-05 2021-11-05 Centre Nat Rech Scient GRAVITATIONAL PARTICLE ASSEMBLY PROCESS

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US6068878A (en) * 1998-09-03 2000-05-30 Micron Technology, Inc. Methods of forming layers of particulates on substrates
US7241341B2 (en) * 2002-05-10 2007-07-10 Nanometrix Inc. Method and apparatus for two dimensional assembly of particles
CA2695449A1 (en) * 2006-08-02 2008-02-07 Nanometrix Inc. Modular transfer apparatus and process
TWI425648B (en) * 2009-12-31 2014-02-01 Film making system and film making method
TWI421209B (en) * 2010-08-12 2014-01-01 Academia Sinica Large-area particle-monolayer and method for fabricating the same
US20120171448A1 (en) * 2010-11-24 2012-07-05 Austin Joseph Akey Ordered assembly of nanoparticles in spatially defined regions
US20150290669A1 (en) * 2012-10-26 2015-10-15 Massachusetts Institute Of Technology Devices and Methods for Layer-by-Layer Assembly

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FR3020767A1 (en) 2015-11-13
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US9839938B2 (en) 2017-12-12

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