EP2831648B1 - Nanostrukturiertes material und verfahren zur herstellung davon - Google Patents

Nanostrukturiertes material und verfahren zur herstellung davon Download PDF

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Publication number
EP2831648B1
EP2831648B1 EP13711170.4A EP13711170A EP2831648B1 EP 2831648 B1 EP2831648 B1 EP 2831648B1 EP 13711170 A EP13711170 A EP 13711170A EP 2831648 B1 EP2831648 B1 EP 2831648B1
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range
polymeric matrix
vol
nanostructured
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French (fr)
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EP2831648A1 (de
Inventor
Ta-Hua Yu
Moses M. David
Abdujabar K. Dire
Albert I. Everaerts
William Blake Kolb
Todd M. SANDMAN
Shunsuke Suzuki
Scott A. Walker
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3343—Problems associated with etching
    • H01J2237/3345—Problems associated with etching anisotropy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/781—Possessing nonosized surface openings that extend partially into or completely through the host material

Definitions

  • the back lighting for mobile hand held and laptop devices are not effective to provide desired display quality in the presence of the reflection of the external lighting from the top surface and internal interfaces of the display devices, which in turn reduces contrast ratio and can downgrade viewing quality from the interfering image of external objects.
  • antireflective coatings such as multilayer reflective coatings consisting of transparent thin film structures with alternating layers of contrasting refractive index to reduce reflection.
  • multilayer reflective coatings consisting of transparent thin film structures with alternating layers of contrasting refractive index to reduce reflection.
  • it can be difficult to achieve broadband antireflection using the multilayer antireflective coating technology.
  • subwavelength surface structure e.g., subwavelength scale surface gratings
  • the phrase subwavelength is used to describe an object or structure having one or more dimensions smaller than the length of the wave with which the object or structure interacts.
  • subwavelength structured features lead to continuous-profile surface-relief grating as an effective medium to minimize reflection for a range of wavelengths greater than the subwavelength structured features on the surface.
  • Reduction of reflection at broad angle is desired in applications related to optical and optoelectronic devices. It is difficult to fabricate deep surface structure providing low reflection ( ⁇ 1.5%) at 60 degree off angle (i.e., 60 degree from normal to the surface) with traditional subwavelength structure surface technology (e.g., by lithography). Micrometer-scale microstructures such as prism has been intensively utilized to reduce reflection at broad angle for solar applications, but this approach tends to result in high haze and is only applicable when light is transporting from low refractive index medium to high refractive index medium.
  • WO 2001/109284 disclolses nanostructured materials exhibiting random anisotropic nanostructured surface made by providing polymeric matrix comprising a nanodispered phase; and anisotropically eching the polymeric matrix using plasma to form the random nanostructured surface.
  • the present disclosure describes a nanostructured material exhibiting a random anisotropic nanostructured surface, and exhibiting an average reflection at 60 degrees off angle less than 1 percent (in some embodiments, less than 0.75, 0.5, 0.25, or less than 0.2 percent).
  • the nanostructured material comprises a polymeric matrix and a nanoscale dispersed phase.
  • the present disclosure describes a method of making nanostructured materials described herein, the method comprising:
  • the present disclosure describes a method of making nanostructured materials described herein, the method comprising:
  • articles described herein further comprise a functional layer (i.e., at least one of a transparent conductive layer or a gas barrier layer) disposed between the first major surface of a substrate and a layer of material described herein.
  • articles described herein further comprise a functional layer (i.e., at least one of a transparent conductive layer or a gas barrier layer) disposed on a layer of material described herein.
  • articles described herein further comprise a (second) layer of material (including those described herein and those described in PCT Appl. Nos. US2011/026454, filed February 28, 2011 , and U.S. Pat. Appl. Nos. 61/452,403 and 61/452,430 , filed March 14,) on the second major surface of a substrate.
  • articles described herein further comprise a functional layer (i.e., at least one of a transparent conductive layer or a gas barrier layer) disposed between the second major surface of a substrate and a (second) layer of material.
  • articles described herein further comprise a functional layer (i.e., at least one of a transparent conductive layer or a gas barrier layer) disposed on a (second) layer of material.
  • Articles described herein can be used, for example, for creating high performance, low fringing, antireflective optical articles.
  • a functional layer i.e., at least one of a transparent conductive layer or a gas barrier layer
  • articles described herein may have significantly enhanced optical performance.
  • Embodiments of nanostructured materials and articles described herein are useful for numerous applications including optical and optoelectronic devices, displays, solar cells, light sensors, eye wear, camera lenses, and glazing.
  • the nanostructured material comprises a polymeric matrix and a nanoscale dispersed phase.
  • the polymeric matrix comprises at least one of acrylate, urethane acrylate, methacrylate, polyester, epoxy, fluoropolymer, or siloxane.
  • the polymeric matrix can be made from reactive precursors.
  • precursors include polymerizable resins comprising at least one oligomeric urethane (meth)acrylate.
  • the oligomeric urethane (meth)acrylate is multi(meth)acrylate.
  • the term "(meth)acrylate” is used to designate esters of acrylic and methacrylic acids, and "multi(meth)acrylate” designates a molecule containing more than one (meth)acrylate group, as opposed to "poly(meth)acrylate” which commonly designates (meth)acrylate polymers.
  • the multi(meth)acrylate is a di(meth)acrylate, although other examples include tri(meth)acrylates and tetra(meth)acrylates.
  • Oligomeric urethane multi(meth)acrylates are available, for example, from Sartomer under the trade designation "PHOTOMER 6000 Series” (e.g.,, “PHOTOMER 6010” and “PHOTOMER 6020"), under the trade designation “CN 900 Series” (e.g., “CN966B85", “CN964", and “CN972”). Oligomeric urethane (meth)acrylates are also available, for example, from Surface Specialties under the trade designations "EBECRYL 8402", “EBECRYL 8807", and "EBECRYL 4827".
  • Oligomeric urethane (meth)acrylates may also be prepared, for example, by the initial reaction of an alkylene or aromatic diisocyanate of the formula OCN-R3-NCO, wherein R3 is a C2-100 alkylene or an arylene group with a polyol.
  • the polyol is a diol of the formula HO-R4-OH, wherein R4 is a C2-100 alkylene group.
  • the intermediate product is then a urethane diol or diisocyanate, which subsequently can undergo reaction with an isocyanate functional vinyl monomer, such as 2-isocyanatoethyl(meth)acrylate, respectively a 2-hydroxyalkyl (meth)acrylate.
  • Suitable diisocyanates include 2,2,4-trimethylhexylene diisocyanate and toluene diisocyanate.
  • Alkylene diisocyanates are generally preferred.
  • compound of this type may be prepared from 2,2,4-trimethylhexylene diisocyanate, poly(caprolactone)diol, and 2-hydroxyethyl methacrylate.
  • the urethane (meth)acrylate is preferably aliphatic.
  • the polymerizable precursors can be radiation curable compositions comprising at least one other monomer (i.e., other than an oligomeric urethane (meth)acrylate).
  • the other monomer may reduce viscosity and/or improve thermomechanical properties and/or increase refractive index.
  • Monomers having these properties include acrylic monomers (i.e., acrylate and methacrylate esters, acrylamides, and methacrylamides), styrene monomers, and ethylenically unsaturated nitrogen heterocycles.
  • Examples of UV curable acrylate monomers from Sartomer include "SR238", “SR351", “SR399", and "SR444".
  • Suitable acrylic monomers include monomeric (meth)acrylate esters. They include alkyl (meth)acrylates (e.g., methyl acrylate, ethyl acrylate, 1-propyl acrylate, methyl methacrylate, 2-ethylhexylacrylate, isobornyl(meth)acrylate, lauryl acrylate, tetrahydrofurfuryl acrylate, isooctyl acrylate, ethoxyethoxyethyl acrylate, methoxyethoxyethyl acrylate, and t-butyl acrylate). Also included are (meth)acrylate esters having other functionality.
  • alkyl (meth)acrylates e.g., methyl acrylate, ethyl acrylate, 1-propyl acrylate, methyl methacrylate, 2-ethylhexylacrylate, isobornyl(meth)acrylate, lauryl acrylate,
  • the other monomer may also be a monomeric N-substituted or N,N-disubstituted (meth)acrylamide, especially an acrylamide.
  • acrylamide include N-alkylacrylamides and N,N-dialkylacrylamides, especially those containing C1-4 alkyl groups. Examples are N-isopropylacrylamide, N-t-butylacrylamide, N,N-dimethylacrylamide, and N,N-diethylacrylamide.
  • the other monomer may further be a polyol multi(meth)acrylate.
  • Such compounds are typically prepared from aliphatic diols, triols, and/or tetraols containing 2-10 carbon atoms.
  • suitable poly(meth)acrylates are ethylene glycol diacrylate, 1,6-hexanediol diacrylate, 2-ethyl-2-hydroxymethyl-1,3-propanediol triacylate (trimethylolpropane triacrylate), di(trimethylolpropane) tetraacrylate, pentaerythritol tetraacrylate, the corresponding methacrylates, and the (meth)acrylates of alkoxylated (usually ethoxylated) derivatives of said polyols.
  • Monomers having at least two (ethylenically unsaturated groups can serve as a crosslinker.
  • Styrenic compounds suitable for use as the other monomer include styrene, dichlorostyrene, 2,4,6-trichlorostyrene, 2,4,6-tribromostyrene, 4-methylstyrene, and 4-phenoxystyrene.
  • Ethylenically unsaturated nitrogen heterocycles include N-vinylpyrrolidone and vinylpyridine.
  • polymerizable precursors include tetrafluoroethylene, vinylfluoride, vinylidene fluoride, chlorotrifluoroethylene, perfluoroakoxy, fluorinated ethylene-propylene, ethylenetetrafluoroethylene, ethylenechlorotrifluoroethylene, perfluoropolyether, perfluoropolyoxetane, hexafluoropropylene oxide, siloxane, organosilicon, siloxides, ethylene oxide, propylene oxide, acrylamide, amine, ether, sulfonate, acrylic acid, maleic anhydride, vinyl acid, vinyl alcohol, vinylpyridine, or vinypyrrolidone.
  • the nano-scale phase is a discontinuous phase randomly dispersed within the polymeric matrix, and can comprise nanoparticles (e.g., nanospheres and nanocubes), nanotubes, nanofibers, caged molecules, and hyperbranched molecules).
  • the nano-scale dispersed phase can be associated or unassociated or both.
  • the nano-scale dispersed phase can be well dispersed. Well dispersed means little agglomeration.
  • the average dimension of the nanoscale phase can be ranged from 1 nm to 100 nm.
  • nanostructured materials described herein the nanoscale phase is present in less than 1.25 wt.% (in some embodiments, less 1 wt.%, 0.75 wt.%, 0.5 wt.%, or even less than 0.35 wt.%), based on the total weight of the polymeric matrix and nanoscale phase.
  • nanostructured materials described herein include the nanoscale phase in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 in size, and less than 25 nm in size, wherein the nanoscale phase is present in a range from 0.25 wt.% to 50 wt.% (in some embodiments, 1 wt.% to 25 wt.%, 5 wt.% to 25 wt.%, or even 10 wt.% to 25 wt.%) for sizes in the range from 60 nm to 90 nm, 1 wt.% to 50 wt.% (in some embodiments, 1 wt.% to 25 wt.%, or even 1 wt.% to 10 wt.%) for sizes in the range from 30 nm to 50 nm, and 0.25 wt.% to 25 wt.% (in some embodiments, 0.5 wt.% to 10 wt.%, 0.5 wt.%,
  • nanostructured materials described herein included the nanoscale phase in a range from 60 nm to 90 nm in size, in a range from 30 nm to 50 in size, and less than 25 nm in size, wherein the nanoscale phase is present in a range from 0.1 vol.% to 35 vol.% (in some embodiments, 0.5 vol.% to 25 vol.%., 1 vol.% to 25 vol.%, or even 3 vol.% to 15 vol.%) for sizes in a range from 60 nm to 90 nm, 0.1 vol.% to 25 vol.% (in some embodiments, 0.25 vol.% to 10 vol.%., or even 0.25 vol.% to 5 vol.%) for sizes in a range from 30 nm to 50 nm, and 0.1 vol.% to 10 vol.% (in some embodiments, 0.25 vol.% to 10 vol.%., or even 0.1 vol.% to 2.5 vol.%) for sizes less than 25 nm, based on the total volume of the polymeric matrix
  • nanostructured materials described herein exhibit a random anisotropic nanostructured surface.
  • the nano-structured anisotropic surface typically comprises nanofeatures having a height to width ratio of at least 2:1 (in some embodiments, at least 5:1, 10:1, 25:1, 50:1, 75:1, 100:1, 150:1, or even at least 200:1).
  • Exemplary nanofeatures of the nano-structured anisotropic surface include nano-pillars or nano-columns, or continuous nano-walls comprising nano-pillars, nano-columns, anistropic nano-holes, or anisotropic nano-pores.
  • the nanofeatures have steep side walls that are roughly perpendicular to the functional layer-coated substrate.
  • the nano features are capped with dispersed phase material.
  • the average height of the nanostructured surface can be from 200 nm to 500 nm with a standard deviation ranged from 20 nm to 75 nm.
  • the nanostructural features are essentially randomized in the planar direction, and in some cases also in the z-direction.
  • the nanoscale phase comprises submicrometer particles.
  • the submicrometer particles have an average particle size in a range from 1 nm to 100 nm (in some embodiments, 1 nm to 75 nm, 1 nm to 50 nm, or even 1 nm to 25 nm).
  • the submicrometer particles are covalently bonded to the polymeric matrix.
  • the sub-micrometer particles can comprise carbon, metals, metal oxides (e.g., SiO 2 , ZrO 2 , TiO 2 , ZnO, magnesium silicate, indium tin oxide, and antimony tin oxide), carbides (e.g., SiC and WC), nitrides, borides, halides, fluorocarbon solids (e.g., poly(tetrafluoroethylene)), carbonates (e.g., calcium carbonate), and mixtures thereof.
  • metals e.g., SiO 2 , ZrO 2 , TiO 2 , ZnO, magnesium silicate, indium tin oxide, and antimony tin oxide
  • carbides e.g., SiC and WC
  • nitrides e.g., borides, halides, fluorocarbon solids (e.g., poly(tetrafluoroethylene)), carbonates (e.g., calcium carbonate), and mixtures thereof.
  • sub-micrometer particles comprises at least one of SiO 2 particles, ZrO 2 particles, TiO 2 particles, ZnO particles, Al 2 O 3 particles, calcium carbonate particles, magnesium silicate particles, indium tin oxide particles, antimony tin oxide particles, poly(tetrafluoroethylene) particles, or carbon particles.
  • Metal oxide particles can be fully condensed. Metal oxide particles can be crystalline.
  • the sub-micrometer particles can be monodisperse (all one size or unimodal) or have a distribution (e.g., bimodal, or other multimodal).
  • Exemplary silicas are commercially available, for example, from Nalco Chemical Co., Naperville, IL, under the trade designation "NALCO COLLOIDAL SILICA,” such as products 2329, 2329K, and 2329 PLUS.
  • Exemplary fumed silicas include those commercially available, for example, from Evonik Degusa Co., Parsippany, NJ, under the trade designation, "AEROSIL series OX-50", as well as product numbers -130, -150, and -200; and from Cabot Corp., Tuscola, IL, under the designations "CAB-O-SPERSE 2095", "PG002", “PG022", “CAB-O-SPERSE A105", and "CAB-O-SIL M5".
  • Other exemplary colloidal silica are available, for example, from Nissan Chemicals under the designations "MP1040", “MP2040", “MP3040", and "MP4040".
  • the sub-micrometer particles are surface modified.
  • the surface-treatment stabilizes the sub-micrometer particles so that the particles are well dispersed in the polymerizable resin, and result in a substantially homogeneous composition.
  • the sub-micrometer particles can be modified over at least a portion of its surface with a surface treatment agent so that the stabilized particles can copolymerize or react with the polymerizable resin during curing.
  • the sub-micrometer particles are treated with a surface treatment agent.
  • a surface treatment agent has a first end that will attach to the particle surface (covalently, ionically or through strong physisorption) and a second end that imparts compatibility of the particle with the resin and/or reacts with the resin during curing.
  • surface treatment agents include alcohols, amines, carboxylic acids, sulfonic acids, phosphonic acids, silanes, and titanates.
  • the preferred type of treatment agent is determined, in part, by the chemical nature of the metal oxide surface. Silanes are preferred for silica and other siliceous fillers. Silanes and carboxylic acids are preferred for metal oxides, such as zirconia.
  • the surface modification can be done either subsequent to mixing with the monomers or after mixing. It is preferred in the case of silanes to react the silanes with the particles or nanoparticle surface before incorporation into the resins.
  • the required amount of surface modifier is dependent on several factors such as particle size, particle type, molecular weight of the modifier, and modifier type.
  • surface treatment agents include compounds such as isooctyl tri-methoxy-silane, N-(3-triethoxysilylpropyl)methoxyethoxy-ethoxyethyl carbamate (PEG3TES), N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate (PEG2TES), 3-(methacryloyloxy)propyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-(methacryloyloxy)propyltriethoxysilane, 3-(methacryloyloxy)propylmethyldimethoxysilane, 3-(acryloyloxypropyl)methyldimethoxysilane, 3-(methacryloyloxy)propyldimethylethoxysilane, vinyldimethylethoxysilane, phenyltrimethoxysilane, n-oct
  • silane surface modifier is available, for example, from OSI Specialties, Crompton South Charleston, WV, under the trade designation "SILQUEST A1230".
  • silane agents can react and form covalent bonds with the hydroxyl groups on the surface of nanopartilces.
  • silane agents can react and form covalent bonds with the hydroxyl groups on the surface of nanoparticles and the functional groups (e.g., acrylate, epoxy, and/or vinyl) in the polymeric matrix.
  • Surface modification of the particles in the colloidal dispersion can be accomplished in a variety of ways.
  • the process involves the mixture of an inorganic dispersion with surface modifying agents.
  • a co-solvent can be added at this point, such as 1-methoxy-2-propanol, ethanol, isopropanol, ethylene glycol, N,N-dimethylacetamide, and 1-methyl-2-pyrrolidinone.
  • the co-solvent can enhance the solubility of the surface modifying agents as well as the surface modified particles.
  • the mixture comprising the inorganic sol and surface modifying agents is subsequently reacted at room or an elevated temperature, with or without mixing. In one method, the mixture can be reacted at 85°C for 24 hours, resulting in the surface modified sol.
  • the surface treatment of the metal oxide can preferably involve the adsorption of acidic molecules to the particle surface.
  • Surface modification of the heavy metal oxide preferably takes place at room temperature.
  • Surface modification of ZrO 2 with silanes can be accomplished under acidic conditions or basic conditions.
  • the silanes are heated under acid conditions for a suitable period of time. At which time the dispersion is combined with aqueous ammonia (or other base). This method allows removal of the acid counter ion from the ZrO 2 surface as well as reaction with the silane.
  • the particles are precipitated from the dispersion and separated from the liquid phase.
  • a combination of surface modifying agents can be useful, for example, wherein at least one of the agents has a functional group co-polymerizable with a crosslinkable resin.
  • the polymerizing group can be ethylenically unsaturated or a cyclic group subject to ring opening polymerization.
  • An ethylenically unsaturated polymerizing group can be, for example, an acrylate or methacrylate, or vinyl group.
  • a cyclic functional group subject to ring opening polymerization generally contains a heteroatom, such as oxygen, sulfur, or nitrogen, and preferably a 3-membered ring containing oxygen (e.g., an epoxide).
  • At least some of the submicrometer particles are functionalized with at least one multifunctional silane coupling agent comprising silanol and at least one of acrylate, epoxy, or vinyl functional groups.
  • the coupling agents and submicronmeter particles are typically mixed in solvents allowing silanol of coupling agents to react with hydroxyl groups on the surface of submicronmeter particles and form covalent bonds with particles at elevated temperatures.
  • the coupling agents form covalent bonds with the submicronmeter particles providing steric hinderance between subsmicronmeter particles reducing or preventing aggregation and precipitation in solvents.
  • Other functional groups on the coupling agents such as acrylate, methacrylate, epoxy, or vinyl can further enhance the dispersion of the functionalized submicronmeter particles in coating monomers or oligomers and in solvents.
  • nanostructured materials described herein are in the form of a layer.
  • the layer has a thickness of at least 500 nm (in some embodiments, at least 1 micrometer, 1.5 micrometer, 2 micrometer, 2.5 micrometers, 3 micrometers, 4 micrometers, 5 micrometers, 7.5 micrometers, or even at least 10 micrometers.
  • the layer further comprises in the range from 0.01 wt.% to 0.5 wt. % particles in the range from 1 micrometer to 10 micrometer particle in size.
  • the micrometer-scale particles can be made from wax, polytetrafluoroethylene (PTFE), polymethylmethacrylate (PMMA), polystyrene, polylactic acid (PLA), or silica. These micrometer-scale particles can be functionalized with the coupling agents as described above and dispersed in coating solutions by a blender or sonicator. The particles are typically added to coating resin binders in an amount in the range of 0.01-0.5 weight%, based on the total amount of the resin binders constituting the coatings.
  • the particles can form "undulation" (wavy protrusions/recesses) over the entire surface of the nanostructured material to form a surface shape which provided the anti-Newton ring property when in contact with the surface of another material.
  • This anti-Newton method can also be applied with other antireflective technologies such as traditional subwavelength scale surface gratings, multilayer antireflective coatings, ultra-low or low refractive index coatings using nano hollow sphere, porous fumed silica, or any other nanoporous coating methods to provide anti-Newton antireflective functionalities. Further details can be found, for example, in U.S. Pat. No. 6,592,950 (Toshima et al. )
  • Exemplary substrates include polymeric substrates, glass substrates or windows, and functional devices (e.g., organic light emitting diodes (OLEDs), displays, and photovoltaic devices).
  • the substrates have thicknesses in a range from 12.7 micrometers (0.0005 inch) to 762 micrometers (0.03 inch), although other thicknesses may also be useful.
  • Exemplary polymeric materials for the substrates include polyethylene terephthalate (PET), polystyrene, acrylonitrile butadiene styrene, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyacrylates, thermoplastic polyurethanes, polyvinyl acetate, polyamide, polyimide, polypropylene, polyester, polyethylene, poly(methyl methacrylate), polyethylene naphthalate, styrene acrylonitrile copolymer, silicone-polyoxamide polymers, fluoropolymers, cellulose triacetate polymer, cyclic olefin copolymers, and thermoplastic elastomers.
  • PET polyethylene terephthalate
  • polystyrene acrylonitrile butadiene styrene
  • polyvinyl chloride polyvinylidene chloride
  • polycarbonate polyacrylates
  • thermoplastic polyurethanes polyvinyl acetate,
  • Semicrystalline polymers e.g., polyethylene terephthalate (PET)
  • PET polyethylene terephthalate
  • low birefringent polymeric substrates such as triacetate cellulose, poly(methyl methacrylate), polycarbonate, and cyclic olefin copolymers, may be particularly desirable to minimize or avoid orientation induced polarization or dichroism interference with other optical components, such as polarizer, electromagnetic interference, or conductive touch functional layer in the optical display devices.
  • the polymeric substrates can be formed, for example, by melt extrusion casting, melt extrusion calendaring, melt extrusion with biaxial stretching, blown film processes, and solvent casting optionally with biaxial stretching.
  • the substrates are highly transparent (e.g., at least 90% transmittance in the visible spectrum) with low haze (e.g., less than 1%) and low birefringence (e.g., less than 50 nanometers optical retardance).
  • the substrates have a microstructured surface or fillers to provide hazy or diffusive appearance.
  • the substrate is a polarizer (e.g., a reflective polarizer or an absorptive polarizer).
  • polarizer films may be used as the substrate, including multilayer optical films composed, for example, of some combination of all birefringent optical layers, some birefringent optical layers, or all isotropic optical layers.
  • the multilayer optical films can have ten or less layers, hundreds, or even thousands of layers.
  • Exemplary multilayer polarizer films include those used in a wide variety of applications such as liquid crystal display devices to enhance brightness and/or reduce glare at the display panel.
  • the polarizer film may also be the type used in sunglasses to reduce light intensity and glare.
  • the polarizer film may comprise a polarizer film, a reflective polarizer film, an absorptive polarizer film, a diffuser film, a brightness enhancing film, a turning film, a mirror film, or a combination thereof.
  • Exemplary reflective polarizer films include those reported in U.S. Pat. Nos. 5,825,543 (Ouderkirk et al. ) 5,867,316 (Carlson et al. ), 5,882,774 (Jonza et al. ), 6,352,761 B1 (Hebrink et al. ), 6,368,699 B1 (Gilbert et al. ), and 6,927,900 B2 (Liu et al. ), U.S.
  • Exemplary reflective polarizer films also include those commercially available from 3M Company, St. Paul, MN, under the trade designations "VIKUITI DUAL BRIGHTNESS ENHANCED FILM (DBEF)", “VIKUITI BRIGHTNESS ENHANCED FILM (BEF)", “VIKUITI DIFFUSE REFLECTIVE POLARIZER FILM (DRPF)", “VIKUITI ENHANCED SPECULAR REFLECTOR (ESR)", and “ADVANCED POLARIZER FILM (APF)”.
  • Exemplary absorptive polarizer films are commercially available, for example, from Sanritz Corp., Tokyo, Japan, under the trade designation of "LLC2-5518SF”.
  • the optical film may have at least one non-optical layer (i.e., a layer(s) that does not significantly participate in the determination of the optical properties of the optical film).
  • the non-optical layers may be used, for example, to impart or improve mechanical, chemical, or optical, properties; tear or puncture resistance; weatherability; or solvent resistance.
  • Exemplary glass substrates include sheet glass (e.g., soda-lime glass) such as that made, for example, by floating molten glass on a bed of molten metal.
  • Other exemplary glass substrates include borosilicate glass, LCD glass and chemically strengthened glass.
  • low-E low-emissivity
  • Other coatings may also be desirable in some embodiments to enhance the electro-optical, catalytic, or conducting properties of glass.
  • One method for making nanostructured materials described herein comprises:
  • Another method for making nanostructured materials described herein comprises:
  • Nanostructured materials described herein exhibit an average reflection at 60 degrees off angle less than 1 percent (in some embodiments, less than 0.75, 0.5, 0.25, or less than 0.2 percent).
  • the reflection at 60 degree off angle is measured by Procedure 2 in the Examples below.
  • nanostructured materials described herein have a reflection less than 2 percent (in some embodiments, less than 1.5 percent or even less than 0.5 percent) as measured by Procedure 2 in the Examples below.
  • the nanostructured materials described herein can have a haze less than 3 percent (in some embodiments, less than 2 percent, 1.5 percent, or even less than 1 percent) as measured by Procedure 3 in the Examples below.
  • the article can be made, for example, by a method comprising:
  • the composite can be made, for example, by a method comprising:
  • said method can be conducted, for example, by applying the second nano-structured article on the functional layer as described above in the method, and then disposing a functional layer (which may be the same or different) on a major surface of the second nano-structured article.
  • a functional layer which may be the same or different
  • the second nano-structured article is applied simultaneously with the first nano-structured article.
  • the second functional layer is provided after the first nano-structured article applied, while in others, for example, during the application of the first nano-structured article.
  • Glass substrates have been widely used for making organic light emitting diodes. Glass substrates, however, tend to be undesirable for certain applications (e.g., electronic maps and portable computers). Where flexibility is desired, glass is brittle and hence undesirable. Also, for some applications (e.g., large area displays) glass is too heavy. Plastic substrates are an alternative to glass substrates.
  • the electrically-conductive layer can include a conductive elemental metal, a conductive metal alloy, a conductive metal oxide, a conductive metal nitride, a conductive metal carbide, a conductive metal boride, and combinations thereof.
  • Preferred conductive metals include elemental silver, copper, aluminum, gold, palladium, platinum, nickel, rhodium, ruthenium, aluminum, and zinc. Alloys of these metals, such as silver-gold, silver-palladium, silver-gold-palladium, or dispersions containing these metals in admixture with one another or with other metals also can be used.
  • Transparent conductive oxides such as indium-tin-oxide (ITO), indium-zinc-oxide (IZO), zinc oxide, with or without, dopants, such as aluminum, gallium and boron, other TCOs, and combinations thereof can also be used as an electrically-conductive layer.
  • TCO Transparent conductive oxides
  • the physical thickness of an electrically-conductive metallic layer is in a range from 3 nm to 50 nm (in some embodiments, 5 nm to 20 nm)
  • the physical thickness of the transparent conductive oxide layers are preferably in a range from about 10 nm to 500 nm (in some embodiments, 20 nm to 300 nm).
  • the resulting electrically-conductive layer can typically provide a sheet resistance of less than 300 ohms/sq. (in some embodiments, less than 200 ohms/sq., or even less than 100 ohms/sq.).
  • the layer may follow the surface contour of the structured surface so that the antireflection function is created at the interface between the structured surface and the deposited layer, and at the second surface of the functional coating layer contacting air or the surface of another substrate.
  • Transparent conductive films can be made, for example, from transparent conductive polymers.
  • Conductive polymers include derivatives of polyacetylene, polyaniline, polypyrrole, PETOT/PSS (poly(3,4-ethylenedioxythiophene)/polystyrenesulfonic acid), or polythiophenes (see, e.g., Skotheim et al., Handbook of Conducting Polymers, 1998 ). Although not wanting to be bound by theory, it is believed that these polymers have conjugated double bonds which allow for conduction. Further, although not wanting to be bound by theory, it is believed that by manipulating the band structure, polythiophenes have been modified to achieve a HUMO-LUMO separation that is transparent to visible light. In a polymer, the band structure is determined by the molecular orbitals. The effective bandgap is the separation between the highest occupied molecular orbital (HOMO) and lowest unoccupied molecular orbital (LUMO).
  • the transparent conductive layer can comprise, for example, anisotropic nano-scale materials which can be solid or hollow.
  • Solid anisotropic nano-scale materials include nanofibers and nanoplatelets.
  • Hollow anisotropic nano-scale materials include nanotubes.
  • the nanotube has an aspect ratio (length:diameter) greater than 10:1 (in some embodiments, greater than 50:1, or even greater than 100:1).
  • the nanotubes are typically greater than 500 nm (in some embodiments, greater than 1 micrometer, or even greater than 10 micrometers) in length.
  • These anisotropic nano-scale materials can be made from any conductive material. Most typically, the conductive material is metallic.
  • the metallic material can be an elemental metal (e.g., transition metals) or a metal compound (e.g., metal oxide).
  • the metallic material can also be a metal alloy or a bimetallic material, which comprises two or more types of metal. Suitable metals include silver, gold, copper, nickel, gold-plated silver, platinum, and palladium.
  • the conductive material can also be non-metallic (e.g., carbon or graphite (an allotrope of carbon)).
  • Gas (e.g., water vapor and oxygen) barrier films typically comprise a relatively thin (e.g., 100 nm to 300 nm) layer of a metal oxide, such as aluminum oxide, magnesium oxide, or silicon oxide on a film surface.
  • a metal oxide such as aluminum oxide, magnesium oxide, or silicon oxide
  • Other exemplary layers on films to provide a gas barrier film include ceramics, such as silicon oxide, silicon nitride, aluminum oxide nitride, magnesium oxide, zinc oxide, indium oxide, tin oxide, tin-doped indium oxide, and aluminum-doped zinc oxide.
  • Gas barrier films can be a single barrier layer or multiple barrier layers construction.
  • the barrier layer may also comprise multifunctional properties such as conductive functionality.
  • the surface of the polymeric matrix comprising the sub-micrometer particles may be microstructured.
  • a transparent conductive oxide-coated substrate, with a v-groove microstructured surface can be coated with polymerizable matrix materials comprising the sub-micrometer particles and treated by plasma etching to form nanostructures on v-groove microstructured surface.
  • Other examples include a fine micro-structured surface resulting from controlling the solvent evaporation process from multi-solvent coating solutions, reported as in U.S. Pat. No. 7,378,136 (Pokorny et al. ); or the structured surface from the micro-replication method reported in U.S. Pat. No. 7,604,381 (Hebrink et al. ); or any other structured surface induced, for example, by electrical and magnetic fields.
  • articles described herein further comprise an optically clear adhesive disposed on the second surface of the substrate.
  • the optically clear adhesives that may be used in the present disclosure preferably are those that exhibit an optical transmission of at least 90%, or even higher, and a haze value of below 5% or even lower, as measured on a 25 micrometer thick sample in the matter described below in the Example section under the Haze and Transmission Tests for optically clear adhesive.
  • Suitable optically clear adhesives may have antistatic properties, may be compatible with corrosion sensitive layers, and may be able to be released from the substrate by stretching the adhesive.
  • Illustrative optically clear adhesives include those described in PCT Pub. No.
  • the optically clear adhesive has a thickness of up to about 5 micrometer.
  • articles described herein further comprise a hardcoat comprising at least one of SiO 2 nanoparticles or ZrO 2 nanoparticles dispersed in a crosslinkable matrix comprising at least one of multi(meth)acrylate, polyester, epoxy, fluoropolymer, urethane, or siloxane (which includes blends or copolymers thereof).
  • a hardcoat comprising at least one of SiO 2 nanoparticles or ZrO 2 nanoparticles dispersed in a crosslinkable matrix comprising at least one of multi(meth)acrylate, polyester, epoxy, fluoropolymer, urethane, or siloxane (which includes blends or copolymers thereof).
  • hardcoats Commercially available liquid-resin based materials (typically referred to as "hardcoats") may be used as the polymeric matrix or as a component of the polymeric matrix. Such materials include that available from California Hardcoating Co., San Diego, CA, under the trade designation "PERMANEW”; and from Momentive
  • the articles described herein further comprises a surface protection adhesive sheet (laminate premasking film) having a releasable adhesive layer formed on the entire area of one side surface of a film, such as a polyethylene film, a polypropylene film, a vinyl chloride film, or a polyethylene terephthalate film to the surface of the articles, or by superimposing the above-mentioned polyethylene film, a polypropylene film, a vinyl chloride film, or a polyethylene terephthalate film on the surface of articles.
  • a surface protection adhesive sheet laminate premasking film having a releasable adhesive layer formed on the entire area of one side surface of a film, such as a polyethylene film, a polypropylene film, a vinyl chloride film, or a polyethylene terephthalate film to the surface of the articles, or by superimposing the above-mentioned polyethylene film, a polypropylene film, a vinyl chloride film, or a polyethylene terephthalate
  • the average % reflection (%R) of the plasma treated surface was measured using a UV/Vis/NIR Scanning Spectrophotometer (obtained from PerkinElmer. Walthan, MA, under the trade designation "PERKINELMER LAMBDA 950 URA UV-VIS-NIR SCANNING SPECTROPHOTOMETER").
  • One sample of each film was prepared by applying black vinyl tape to the backside of the sample. The black tape was laminated to the backside of the sample using a roller to ensure there were no air bubbles trapped between the black tape and the sample.
  • the front surface % reflection (specular) of a sample was measured by placing the sample in the machine so that the non-tape side was against the aperture. The % reflection was measured at a 60° off angle and average % reflection was calculated for the wavelength range of 400-700nm.
  • a dispersion of functionalized 15 nm SiO 2 dispersed in UV curable resin comprising photoinitiator was obtained from Momentive Performance Materials, Wilton, CT, under the trade designation "UVHC8558").
  • the weight percentage of 15 nm SiO 2 in the dispersion is 20 wt.%.
  • the jar was sealed and heated to 80°C for 16 hours to form a surface-modified silica dispersion.
  • the water was further removed from the mixture via rotary evaporation to form a solution of 42.4 percent by weight 75 nm SkiO 2 in 1-methoxy-2-propanol.
  • TMPTA Trimethylolpropantriacrylate
  • HDDA 1,6-hexanediol diacrylate
  • Photoinitiator was obtained from BASF Specialty Chemicals under the trade designation "IRGACURE 184").
  • Coating compositions 1-6 for Examples 1-9 and Comparative Examples 1-3 were prepared from mixing functionalized 15 nm SiO 2 dispersion ("UVHC8558”) with trimethylolpropantriacrylate (TMPTA) (obtained from Sartomer, Exton, PA, under the trade designation "SR351") and 1,6-hexanediol diacrylate (HDDA) (obtained from Sartomer under the trade designation "SR238”) to form 40 wt.% solids in 1-methoxoy-2-propanol (PM) and methyl ethyl ketone (MEK).
  • the compositions of coating compositions 1-6 are provided in Table 1, below.
  • Table 1 15 nm SiO 2 coating compositions (grams) Wt.%15 nm SiO 2 in coating (solid) "UVHC8558" "SR351" “SR238” PM MEK Composition 1 0.5 0.20 5.88 1.96 8.40 3.6 Composition 2 1 0.40 5.76 1.92 8.40 3.6 Composition 3 2 0.80 5.52 1.84 8.40 3.6 Composition 4 3 1.20 5.28 1.76 8.40 3.6 Composition 5 4 1.60 5.04 1.68 8.40 3.6 Composition 6 6 2.40 4.56 1.52 8.40 3.6
  • coatings compositions were applied on 80 micrometer thick triacetate cellulose film (obtained from Fuji Film Corporation, Tokyo, Japan, under the trade designation "FUJI TAC FILM") using a Meyer rod (#4 bar) coating device.
  • the coated substrates were dried at room temperature inside a ventilated hood for 5 minutes, and then cured using a UV processor equipped with a H-Bulb under a nitrogen atmosphere at 50 fpm (15.24 meter/minute).
  • the coating composition for Examples 10-11 as prepared from mixing functionalized 75 nm SiO 2 dispersion with trimethylolpropantriacrylate (TMPTA) ("SR351") and 1,6-hexanediol diacrylate (HDDA) ("SR238”) to form 40 wt.% solids in 1-methoxoy-2-propanol (PM) and methyl ethyl ketone (MEK).
  • TMPTA trimethylolpropantriacrylate
  • HDDA 1,6-hexanediol diacrylate
  • the compositions are provided in Table 3, below.
  • the coating composition was applied on 80 micrometers triacetate cellulose film ("FUJI TAC FILM") using a Meyer rod (#4 bar) coating device.
  • the coated substrate was dried at room temperature inside a ventilated hood for 5 minutes, and then cured using a UV processor equipped with a H-Bulb under a nitrogen atmosphere at 50 fpm (15.24 meter/minute).

Claims (13)

  1. Nanostrukturmaterial, eine Polymermatrix und eine nanoskalige dispergierte Phase umfassend, das eine zufällig anisotrope Nanostruktur-Oberfläche aufweist und eine durchschnittliche Reflexion bei 60 Grad Winkelverschiebung von weniger als 1 Prozent zeigt.
  2. Nanostrukturmaterial nach Anspruch 1, wobei die nanoskalige Phase in einem Größenbereich von 60 nm bis 90 nm, in einem Größenbereich von 30 nm bis 50 und unterhalb einer Größe von 25 nm vorhanden ist, und wobei die nanoskalige Phase für Größen im Bereich von 60 nm bis 90 nm in einem Bereich von 0,25 Gew.-% bis 50 Gew.-%, für Größen im Bereich von 30 nm bis 50 nm in einem Bereich von 1 Ges.-% bis 50 Gew.-% und für Größen von unter 25 nm von 0,25 Gew.-% bis 25 Gew.-% vorhanden ist, jeweils bezogen auf das Gesamtgewicht der Polymermatrix und der nanoskaligen Phase.
  3. Nanostrukturmaterial nach Anspruch 1, wobei die nanoskalige Phase in einem Größenbereich von 60 nm bis 90 nm, in einem Größenbereich von 30 nm bis 50 und unterhalb einer Größe von 25 nm vorhanden ist, und wobei die nanoskalige Phase für Größen im Bereich von 60 nm bis 90 nm im Bereich von 0,1 Vol.-% bis 35 Vol.-%, für Größen im Bereich von 30 nm bis 50 nm im Bereich von 0,1 Vol.-% bis 25 Vol.-% und für Größen von unter 25 nm von 0,1 Vol.-% bis 10 Vol.-% vorhanden ist, jeweils bezogen auf das Gesamtvolumen der Polymermatrix und der nanoskaligen Phase.
  4. Nanostrukturmaterial nach einem der vorstehenden Ansprüche, wobei die nanoskalige Phase Submikrometerpartikel umfasst.
  5. Nanostrukturmaterial nach einem der Ansprüche 2 bis 4, wobei die Submikrometerpartikel kovalent an die Polymermatrix gebunden sind.
  6. Nanostrukturmaterial nach einem der vorstehenden Ansprüche, wobei es sich dabei um eine Schicht handelt.
  7. Schicht nach Anspruch 6 mit einer Dicke von mindestens 500 nm.
  8. Artikel, ein Substrat umfassend mit ersten und zweiten, einander im Allgemeinen entgegengesetzten Hauptoberflächen, mit der Schicht nach Anspruch 6 oder 7 auf der ersten Hauptoberfläche.
  9. Artikel nach Anspruch 8 mit einer Trübung von weniger als 2 Prozent.
  10. Artikel nach Anspruch 8, ferner einen optisch klaren Klebstoff umfassend, der auf der zweiten Oberfläche des Substrats angeordnet ist, wobei der optisch klare Klebstoff eine mindestens 90 %ige Durchlässigkeit für sichtbares Licht und weniger als 5 % Trübung aufweist.
  11. Verfahren zur Herstellung des Nanostrukturmaterials nach einem der Ansprüche 1 bis 5, wobei das Verfahren Folgendes umfasst:
    Bereitstellen einer Polymermatrix, die eine nanodispergierte Phase umfasst; und
    anisotropes Ätzen der Polymermatrix unter Verwendung von Plasma, um die zufällige Nanostruktur-Oberfläche zu bilden.
  12. Verfahren nach Anspruch 11, wobei die Polymermatrix mindestens auf eine Tiefe in einem Bereich von 200 nm bis 500 nm geätzt wird.
  13. Verfahren zur Herstellung des Nanostrukturmaterials nach einem der Ansprüche 1 bis 5, wobei das Verfahren Folgendes umfasst:
    Bereitstellen einer Polymermatrix, die eine nanodispergierte Phase umfasst; und
    Ätzen von zumindest einem Teil der Polymermatrix unter Verwendung von Plasma, um die zufällige Nanostruktur-Oberfläche zu bilden.
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JP6339557B2 (ja) 2018-06-06
US20150077854A1 (en) 2015-03-19
US20170221680A1 (en) 2017-08-03
SG11201406122WA (en) 2014-10-30
WO2013148031A1 (en) 2013-10-03
CN104335078B (zh) 2017-08-08
JP6685987B2 (ja) 2020-04-22
KR20140139074A (ko) 2014-12-04
JP2015514231A (ja) 2015-05-18
JP2018028693A (ja) 2018-02-22
US9651715B2 (en) 2017-05-16
EP2831648A1 (de) 2015-02-04
US10126469B2 (en) 2018-11-13
CN104335078A (zh) 2015-02-04

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