EP2828421A2 - Behandlung einer anodisch oxidierten Oberfläche - Google Patents
Behandlung einer anodisch oxidierten OberflächeInfo
- Publication number
- EP2828421A2 EP2828421A2 EP13711670.3A EP13711670A EP2828421A2 EP 2828421 A2 EP2828421 A2 EP 2828421A2 EP 13711670 A EP13711670 A EP 13711670A EP 2828421 A2 EP2828421 A2 EP 2828421A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- aluminum
- sic
- och
- conversion layer
- rinsing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 58
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 58
- 238000000034 method Methods 0.000 claims abstract description 42
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 20
- 238000006243 chemical reaction Methods 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 24
- 238000007906 compression Methods 0.000 claims description 10
- 230000006835 compression Effects 0.000 claims description 9
- 150000004756 silanes Chemical class 0.000 claims description 7
- 238000010276 construction Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000007743 anodising Methods 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 claims description 4
- 101150065749 Churc1 gene Proteins 0.000 claims description 4
- 102100038239 Protein Churchill Human genes 0.000 claims description 4
- 238000005096 rolling process Methods 0.000 claims description 4
- 229910003849 O-Si Inorganic materials 0.000 claims description 2
- 229910003872 O—Si Inorganic materials 0.000 claims description 2
- 229910003923 SiC 4 Inorganic materials 0.000 claims description 2
- 238000010306 acid treatment Methods 0.000 claims description 2
- 238000005238 degreasing Methods 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 2
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims description 2
- 238000005554 pickling Methods 0.000 claims description 2
- 150000004760 silicates Chemical class 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 2
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 15
- 238000007704 wet chemistry method Methods 0.000 abstract description 2
- 239000004411 aluminium Substances 0.000 abstract 3
- 239000010410 layer Substances 0.000 description 68
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 229910017639 MgSi Inorganic materials 0.000 description 7
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 238000002048 anodisation reaction Methods 0.000 description 6
- 238000005524 ceramic coating Methods 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 238000004659 sterilization and disinfection Methods 0.000 description 5
- XQMTUIZTZJXUFM-UHFFFAOYSA-N tetraethoxy silicate Chemical compound CCOO[Si](OOCC)(OOCC)OOCC XQMTUIZTZJXUFM-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000000280 densification Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- 230000001954 sterilising effect Effects 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005338 heat storage Methods 0.000 description 2
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 2
- 208000014451 palmoplantar keratoderma and congenital alopecia 2 Diseases 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- XFBXDGLHUSUNMG-UHFFFAOYSA-N alumane;hydrate Chemical class O.[AlH3] XFBXDGLHUSUNMG-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 229940024546 aluminum hydroxide gel Drugs 0.000 description 1
- SMYKVLBUSSNXMV-UHFFFAOYSA-K aluminum;trihydroxide;hydrate Chemical compound O.[OH-].[OH-].[OH-].[Al+3] SMYKVLBUSSNXMV-UHFFFAOYSA-K 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- -1 siloxanes Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ASTWEMOBIXQPPV-UHFFFAOYSA-K trisodium;phosphate;dodecahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].[Na+].[O-]P([O-])([O-])=O ASTWEMOBIXQPPV-UHFFFAOYSA-K 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
- C25D11/246—Chemical after-treatment for sealing layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
Definitions
- the invention relates to a process for the treatment of an anodized aluminum or aluminum alloy surface by means of a wet-chemical process, wherein the surface is pretreated from aluminum or aluminum alloy, anodized, rinsed and heat-densified.
- Another object of the present invention is a corresponding aluminum surface, which is obtainable in particular by means of the erfindungsmä.
- aluminum alloys are known to be produced by alloying aluminum with other metals, such as manganese, magnesium, copper, silicon, nickel, zinc and beryllium.
- the starting material for the alloys is AI99.5 (pure aluminum) in most cases.
- EP 1 407 935 A1 and the associated patent family describes a method for applying a thin-ceramic coating material to a surface of a motor vehicle attachment which is to be coated, consisting of aluminum, wherein the Aluminum is anodized before coating, and by the anodizing a roughness of the surface to be coated for adherence of the coating material is achieved. Then, the thin-ceramic coating material composed of exclusively inorganic constituents is applied by means of an electrostatic application method or by means of a wet-chemical application method with a virtually constant layer thickness as a coating with a nonporous and closed surface.
- This technical teaching is based on the object to improve the quality of known thin-ceramic coatings.
- a method is to be specified, which allows a cost-effective production of high-quality thin-ceramic coatings.
- parts or objects are to be created, which have a high quality thin-ceramic coating and are inexpensive to produce. It is also essential that the thin-ceramic coating consists exclusively of inorganic constituents. The description of the method ends with the application of the coating on the aluminum surface.
- WO 2009/068168 A1 and the associated patent family describes a component made of aluminum and / or an aluminum alloy, in particular a decorative or functional part, with a very high corrosion resistance and a method for its production.
- the conversion layer should be compressed in the course of at least 3 min / ⁇ layer thickness.
- the high corrosion resistance, especially a high alkali resistance should be achieved in that the surface of the component has a uniformly generated by anodization oxide layer and the porous oxide layer occluding and uniformly covering cover layer.
- the cover layer is thereby produced by an oxide layer hydrate compound closing the pores of the oxide layer and by an additional incorporation of vitreous substances and a simultaneous buildup of same on the oxide layer.
- the topcoat may also comprise exclusively aluminum oxides and / or aluminum hydrates and / or alumina hydrates and / or alkali silicates and / or aluminosilicates.
- WO 2011/020556 A2 and the associated patent family likewise describe a shaped and / or structured part made of aluminum or an aluminum alloy and a method for protecting the surface thereof.
- a sol-gel system corrosion protection layer which is to be produced in an optimized, that is shortened process sequence by an integrated curing or drying.
- EP 2 328 183 A1 and the associated patent family is dispensed with an anodized layer.
- a first side of the metal foil for arranging a photovoltaic absorber layer is provided.
- a protective layer of a silicon-based sol-gel varnish arranged.
- EP 1 306 467 A1 describes an aluminum plate coated with a thermoplastic resin, the aluminum plate carrying a low-porous (semi-non-porous) conversion layer by means of a pretreatment.
- the term "semi-non-porous" layer is characterized in that the ratio (called porosity) of the vacant areas of the pores present in the conversion layer on the surface of the aluminum plate to the total area of the anodized Films is 30% or less. If the porosity is 5% or less, then the film is considered to be practically non-porous.
- the thickness of this layer may be in the range of 50 to 3000 ⁇ (5 to 300 nm).
- the conversion layer is coated according to [0031] with a polymer containing silicon. This polymer has corresponding thermoplastic properties and is prepared from various silanes or siloxanes as a precursor.
- JP 06316787 A describes the anodization of an aluminum surface by immersion in a water-containing alcoholic HCL solution containing a small amount ( ⁇ 2% by weight) of an alkoxysilane. In this case, a fully compressed conversion layer is obtained.
- JP 60-179475 A describes the formation of a conversion layer on aluminum surfaces by using an inorganic paint containing an organosilicone high-condensate but which does not have silanol groups. This is applied to a conventionally anodized aluminum surface.
- EP 1 780 313 A2 relates to an article comprising a substrate having an aluminum or aluminum alloy surface, a sealing anodic coating disposed on at least a portion of the substrate and a layer of a silicone-containing polymer disposed on the anodic sealing layer , According to the description, the coating takes place directly with the polymer or even with an aqueous solution of a silane without carrying out a cold or heat seal directly after the preparation of the conversion layer. So this is also shown in the embodiment 1.
- MIL-A-8625F the military Specification of the US Department of Defense
- the applied polymer coating should be dried at a temperature in the range of 10 to 100 ° C.
- the object of the present invention is to provide a further process for the production of components made of aluminum or an aluminum alloy with improved corrosion resistance, which in particular achieve an alkali resistance up to pH values of 13.5, without the other positive properties of an anodized surface, such as For example, their corrosion resistance to salt and acid pollution, their weathering and scratch resistance, are negatively affected.
- the solution of the aforementioned object consists in a substantial process step of the hot compression of an anodized aluminum or aluminum alloy surface.
- a conventional anodization method of pretreatment anodic oxidation and rinsing
- the anodized surface is only partially hot-compacted, so that a high porosity of the surface is maintained.
- this surface is brought into contact with a material containing organosilicon network former, and then cured at a temperature of up to 250 ° C. Too high a temperature of the curing may cause discoloration or detachment of the aluminum surface, which is not accepted by the purchaser of the component with the aluminum or aluminum alloy.
- the invention in a first embodiment, a method for treating an anodized aluminum or aluminum alloy surface by means of a wet chemical method, wherein a surface of aluminum or an aluminum alloy pretreated, anodized, rinsed and hot densified, the
- one carries out a partial hot compression in water at a temperature of up to 100 ° C in the course of up to 30S / MITI layer thickness of the conversion layer, then bringing a silicon organic network former material containing the partially hot-bonded surface in contact and then at a temperature of up to 250 ° C hardens.
- Components produced according to the invention were subjected to a salt spray test in accordance with DIN EN ISO 9227. This is a 480 h salt spray test (NSS) according to DIN EN ISO 9227 NSS and a 48 h CASS test according to DIN EN ISO 9227 CASS.
- NSS salt spray test
- the requirement for the component is that no optical change to the delivery condition must be recognizable, also no detachment of the protective layer and no corrosion on the A-visible surface and B-visible surface of the component is accepted.
- the components obtainable according to the invention had no optical change, in particular no whitening, compared to the delivery condition.
- components produced according to the invention had a sterilization process of at least 500 cycles, which is customary in medical technology.
- the component was first cleaned with water at 40 to 60 ° C for at least 5 minutes.
- Suitable cleaners may also be suitable pH-neutral or alkaline products, for example pH ⁇ 11.5.
- the sterilization was then performed with moist heat with fractionated vacuum (steam sterilization, DIN EN ISO 17665-1) at 134 ° C, a pressure of 3 bar, a holding period of at least 5 Minutes and a drying time of at least 15 minutes per cycle.
- anodized components in particular decorative parts on delivery are free of polishing defects, scratches, damage or similar defects that may affect the appearance of the components, in particular decorative parts.
- the surface of the component must not show any matting, cloudiness, optical changes (for example, blue blaze), cracking or shadow-like areas, even in use.
- the components are preferably, as is customary in the prior art, initially degreased, electrically pre-glazed and deoxidized before the usual anodization process, for example in sulfuric acid is carried out with direct current or alternating current. Naturally, the aluminum component is rinsed or splash-rinsed between the respective steps.
- the cold compacting is, for example, in a bath of demineralized water with the addition of a Metallfluorids, such as nickel fluoride and / or sodium fluoride containing Verdichtungsmitteis at a temperature above room temperature (25 ° C), for example at 28 ° C to 32 ° C and a slightly acidic to neutral pH, for example, from 6.0 to 7.0 for a few minutes, for example, carried out by at least 4 minutes, as described in WO 2009/068168 AI.
- a Metallfluorids such as nickel fluoride and / or sodium fluoride containing Verdichtungsmitteis
- a slightly acidic to neutral pH for example, from 6.0 to 7.0 for a few minutes, for example, carried out by at least 4 minutes, as described in WO 2009/068168 AI.
- the method according to the invention can also be carried out without this cold compacting step, so that both variants are equally preferred.
- the hot compression is used.
- Page 580 of the Aluminum Handbook describes that the conventional densification by hydration of the oxide layer is as old as the process of anodic oxidation itself.
- the oxide layer produced is preferably a hot water treatment in demineralised water with a pH of 6 +/- 0 , 5 at over 96 ° C or a treatment with saturated steam over 98 ° C subjected.
- the treatment time is then usually at 3 to 4 min / ⁇ layer thickness.
- the oxide layer is superficially dissolved during the compression process. Any adsorbed anions from the anodizing bath go into solution.
- As the pH increases aluminum hydroxide gel precipitates on the surface which crystallizes. Thereby a transformation of the oxide into boehmite takes place.
- this process step of hot compression is of particular importance. Again, preferably in the above-mentioned temperature window is hot-compacted, but according to the invention a significantly shorter compression time is realized.
- the pretreatment of the process according to the invention comprises, in particular, degreasing, rinsing, pickling, rinsing, glazing, rinsing, acid treatment and rinsing before the actual anodic oxidation.
- the organosilicon-network-forming material is then contacted with the anodized surface. This can be done for example by flooding, dipping, spraying, rolling, doctoring and / or rolling. In this case, it is also possible to electrostatically charge the material and / or the substrate before and / or during the contacting.
- a material containing an organosilicon network former is used.
- fluorinated silanes in particular CF 3 CH 2 CH 2 SiY3, C 2 F 5 CH 2 CH 2 SiY 3, C 4 F 9 CH 2 CH 2 SiY 3, nC 6 Fi 3 CH 2 CH 2 SiY3, nC 8 Fi 7 CH 2 CH 2 SiY 3, n-Ci 0 F 2 iCH 2 CH 2 SiY 3 , wherein Y is OCH 3 and / or OC 2 H 5 , can be used.
- the material defined here is preferably solvent-free, in particular solvent-free.
- the material may also contain solvents or dispersants.
- the aforementioned silanes are crosslinked according to the invention on the partially compressed conversion layer by the sol-gel process. This material has no thermoplastic properties during and after the sol-gel process, even if the sol-gel process was started before contacting.
- the curing of the organosilicon network former material is carried out at a temperature protecting the aluminum in the range of 120 to 250 ° C, in particular up to 200 ° C.
- the sol-gel process causes an excellent curing, which causes the above properties, although the coating is extremely thin and has only a layer thickness in the nanometer range but also up to a few microns. Due to the incomplete pore closure, the uncured material penetrates into the conversion layer and also combines chemically with it. In this process step, the conversion layer is further compressed.
- the anodically produced conversion layer itself, whose layer thickness is preferably from 5 to 15 ⁇ m, in particular from 7 to 10 ⁇ m. Due to the extraordinary small thickness of the cured organosilicon network forming material on and in the surface of the conversion layer contains this Al-O-Si bonded Si organofunctional silicates. Thus, the above-mentioned material is chemically bonded in and with the conversion layer and thus leads to an extremely high adhesive strength thereof, which naturally has no thermoplastic properties.
- aluminum surface in the sense of the present invention comprises any aluminum substrates, for example the alloys described in EP 1 780 313 A2 in [0009] in addition to the pure metal.
- the aluminum surfaces obtainable according to the invention may naturally have a colorless and / or colored surface. In the event that the surface should be colored, this can be integrated into the anodization process or the coating process according to the method customary in the prior art.
- the anodically oxidized surfaces obtainable according to the invention can be found in a variety of forms, for example in the form of facades, window frames, door frames, fittings and decorative moldings in construction, in vehicle construction and in the furniture industry, rims, household appliances, signs, lighting elements, furniture components, machine elements, handles, construction parts , Brackets or engine components and heat exchangers, for example for air conditioning systems in vehicles or buildings.
- the components according to the invention can be used. These components meet the manufacturer's specifications, if they are treated for example with ozone, steam or hydrogen peroxide.
- this partially densified component in a composition of 58.80 g tetraethoxy orthosilicate, 24.90 g of [3- (2,3-epoxypropoxy) propyl] trimethoxysilane, 25, 17 g of demineralized water and 2.13 g of 32 percent hydrochloric acid, which with a Was diluted mixture of 184.53g 2-propanol and 3.72 g of deionized water, immersed and pulled out so slowly that when pulling out a visible wet film remained visible on the component. After a flash-off time of 10 minutes, the mixture was heated for one hour at 200 ° C. in a circulating-air oven and the silicate-mixed anodized layer was finally compacted or hardened. The total layer thickness of the conversion layer including the silicate layer was about 8.5 ⁇ .
- Embodiment 2 An aluminum component of Al 99.85 MgSi anodized according to the state of the art (aluminum paperback loc cit.) With a 7.5 ⁇ m thick conversion layer was partially compressed for 3 minutes (24 seconds / ⁇ m conversion layer) in> 96 ° C hot water. After rinsing and drying, the component was stored for a further 24 hours under standard laboratory atmosphere.
- this partially densified component was blended in a composition of 58.80 g of tetraethoxyorthosilicate, 24.90 g of [3- (2,3-epoxypropoxy) propyl] trimethoxysilane, 25.17 g of deionized water and 2.13 g of 32 percent hydrochloric acid containing a mixture from 184.53 g of 2-propanol and 3.72 g of deionized water, dipped and pulled out so slowly that a visible wet film remained on the component when pulled out. After a flash-off time of 10 minutes, the mixture was heated for one hour at 200 ° C. in a circulating-air oven and the silicate-mixed anodized layer was finally compacted or hardened. The total layer thickness of the conversion layer including the silicate layer was about 8.5 ⁇ .
- a component treated according to embodiment 1 or 2 passed the following test:
- the test was carried out at a temperature of 23 ° C. The following tests were carried out successively on the same component in the stated order.
- pH 13.5 Buffer solution of 12.7 g of sodium hydroxide, 4.64 g of sodium phosphate dodecahydrate (equivalent to 2 g of sodium phosphate), 0.33 g of sodium chloride (equivalent to 200 mg of chloride) dissolved in 1 liter of water.
- this compacted member was blended in a composition of 58.80 g of tetraethoxyorthosilicate, 24.90 g of [3- (2,3-epoxypropoxy) propyl] trimethoxysilane, 25.17 g of deionized water and 2.13 g of 32 percent hydrochloric acid mixed with a mixture from 184.53 g of 2-propanol and 3.72 g of deionized water, dipped and pulled out so slowly that a visible wet film remained on the component when pulled out. After a flash-off time of 10 minutes was heated in a convection oven for one hour at 200 ° C and the silicate staggered anodized hardened. The total layer thickness of the conversion layer including the silicate layer was about 8.5 ⁇ .
- a component treated in this way did not pass the test according to the exemplary embodiments. There was a visual change from the original state. The component turned white.
- this compacted member was blended in a composition of 58.80 g of tetraethoxyorthosilicate, 24.90 g of [3- (2,3-epoxypropoxy) propyl] trimethoxysilane, 25.17 g of deionized water and 2.13 g of 32 percent hydrochloric acid mixed with a mixture from 184.53 g of 2-propanol and 3.72 g of deionized water, dipped and pulled out so slowly that a visible wet film remained on the component when pulled out. After a flash-off time of 10 minutes was heated in a convection oven for one hour at 200 ° C and the silicate staggered anodized hardened. The total layer thickness of the conversion layer including the silicate layer was about 8.5 ⁇ . A component treated in this way did not pass the test according to the exemplary embodiments. There was a visual change from the original state. The component turned white.
- this component was prepared in a composition of 58.80 g tetraethoxy orthosilicate, 24.90 g [3- (2,3-)
- Epoxypropoxy) propyl] trimethoxysilane 25.17g of deionized water and 2.13g of 32% hydrochloric acid diluted with a mixture of 4019g of 2-propanol and 82g of deionized water were dipped in and pulled out so slowly that when pulled out a visible Wet film remained visible on the component. After a flash-off time of 10 minutes, the mixture was heated for one hour at 200 ° C. in a circulating-air oven and the silicate-mixed anodized layer was finally compacted or hardened. The total layer thickness of the conversion layer including the silicate layer was less than 8.5 ⁇ and corresponded substantially to the original layer thickness.
- a component treated in this way did not pass the test according to exemplary embodiments 1 and 2. It was a visual change to recognize the original state. The component turned white.
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DE102012204636A DE102012204636A1 (de) | 2012-03-22 | 2012-03-22 | Behandlung einer anodisch oxidierten Oberfläche |
PCT/EP2013/055913 WO2013139899A2 (de) | 2012-03-22 | 2013-03-21 | Behandlung einer anodisch oxidierten Oberfläche |
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US (1) | US10385470B2 (de) |
EP (1) | EP2828421B1 (de) |
CN (1) | CN104160070B (de) |
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WO2014056944A1 (de) * | 2012-10-08 | 2014-04-17 | Süddeutsche Aluminium Manufaktur GmbH | Verfahren zum herstellen einer sol-gel-beschichtung auf einer zu beschichtenden oberfläche eines bauteils sowie entsprechendes bauteil |
FR3014910B1 (fr) * | 2013-12-18 | 2017-06-23 | Turbomeca | Procede de traitement anti-corrosion et anti-usure |
JP5724021B1 (ja) * | 2014-06-25 | 2015-05-27 | アイシン軽金属株式会社 | 高耐アルカリ性アルミニウム部材及びその製造方法 |
EP3023522A1 (de) | 2014-11-21 | 2016-05-25 | AGC Glass Europe | Behandlung von anodisierten Aluminium und Legierungen |
CN104630862A (zh) * | 2015-01-29 | 2015-05-20 | 湖州市织里新飞铝业有限公司 | 一种防摔的铝合金 |
DE102015111440B4 (de) | 2015-07-15 | 2023-07-13 | Plasman Europe Ab | Verfahren zur Behandlung einer anodisch oxidierten Oberfläche aus Aluminium oder einer Aluminiumlegierung und beschichtete Aluminiumoberfläche, die aus einem derartigen Verfahren erhalten wird |
CN105463549B (zh) * | 2015-12-03 | 2018-06-26 | 中国航空工业集团公司北京航空材料研究院 | 一种提高铝及铝合金防护性能的阳极化方法 |
CN108102440A (zh) * | 2017-12-06 | 2018-06-01 | 安徽金达节能材料发展有限公司 | 一种铝合金门窗涂料 |
US11312107B2 (en) * | 2018-09-27 | 2022-04-26 | Apple Inc. | Plugging anodic oxides for increased corrosion resistance |
IT202000020590A1 (it) | 2020-08-28 | 2022-02-28 | Ossidazione Anodica S R L | Strati anodizzati resistenti agli acidi ed agli alcali |
CN113652726A (zh) * | 2021-07-30 | 2021-11-16 | 北京曙光航空电气有限责任公司 | 防止铝件阳极化黑色膜高温变色的封闭液、制备及使用方法 |
CN114540902B (zh) * | 2022-02-14 | 2023-05-09 | 河南开瑞铝业有限公司 | 一种用于铝卷的表面处理装置及其处理方法 |
CN114807806B (zh) * | 2022-06-13 | 2023-03-17 | 常州市嘉瑞化工有限公司 | 一种三氟氯乙烯包装碳钢瓶的表面钝化工艺 |
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EP2828421B1 (de) | 2024-06-19 |
US20150034487A1 (en) | 2015-02-05 |
DE102012204636A1 (de) | 2013-09-26 |
CN104160070A (zh) | 2014-11-19 |
US10385470B2 (en) | 2019-08-20 |
WO2013139899A3 (de) | 2014-06-26 |
WO2013139899A2 (de) | 2013-09-26 |
CN104160070B (zh) | 2018-04-10 |
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