EP2799939A1 - Support pour le traitement de pièces de micromécanique - Google Patents

Support pour le traitement de pièces de micromécanique Download PDF

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Publication number
EP2799939A1
EP2799939A1 EP13166047.4A EP13166047A EP2799939A1 EP 2799939 A1 EP2799939 A1 EP 2799939A1 EP 13166047 A EP13166047 A EP 13166047A EP 2799939 A1 EP2799939 A1 EP 2799939A1
Authority
EP
European Patent Office
Prior art keywords
support
leaching
micromechanical parts
galvanic deposition
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13166047.4A
Other languages
German (de)
English (en)
French (fr)
Inventor
Gérard Rossier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universo SA
Original Assignee
Universo SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universo SA filed Critical Universo SA
Priority to EP13166047.4A priority Critical patent/EP2799939A1/fr
Priority to EP14712315.2A priority patent/EP2992388B1/fr
Priority to KR1020157031112A priority patent/KR101800100B1/ko
Priority to US14/782,624 priority patent/US10001754B2/en
Priority to PCT/EP2014/056038 priority patent/WO2014177324A2/fr
Priority to JP2016508064A priority patent/JP6087022B2/ja
Priority to CN201480024220.6A priority patent/CN105164591B/zh
Priority to TW103115048A priority patent/TWI510679B/zh
Publication of EP2799939A1 publication Critical patent/EP2799939A1/fr
Priority to HK16106758.1A priority patent/HK1218790A1/zh
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D1/00—Gripping, holding, or supporting devices
    • G04D1/06—Supporting devices for clockworks or parts of time-pieces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C25D17/08—Supporting racks, i.e. not for suspending
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/08—Machines or apparatus for cleaning

Definitions

  • the invention relates to a support for performing treatments on micromechanical parts, for example watch hands.
  • the invention relates to a support for leaching and / or deposition by electroplating on micromechanical parts and in particular such a support for performing electroplating surface treatment operations on micromechanical parts comprising a through orifice or light like watch hands or the like.
  • the watch hands are, after cutting in a flank of material, leached and treated by galvanic deposition in an electrolyte bath in order to be covered with a thin coating, for example a layer of gold to protect them from oxidation and give them a color giving them an attractive aesthetic appearance.
  • a thin coating for example a layer of gold to protect them from oxidation and give them a color giving them an attractive aesthetic appearance.
  • Electroplating is a well-known deposition technique of using a continuous electric current to deposit a metallic material on the surface of a conductive part, the metal initially being in the form of cations in solution in a solvent.
  • the workpiece must therefore be polarized.
  • the invention aims to propose a solution improving the cleaning and / or the quality of the galvanic deposit.
  • the subject of the invention is a support for treating micromechanical parts, in particular for leaching and / or galvanic deposition, consisting of a bearing structure having attachment points for micromechanical parts to be treated, the parts each comprising at least one lumen or through orifice, this support being characterized in that the attachment points are presented by at least one rigid rod on which rod the micromechanical parts are threaded via their lights and are kept apart from each other by a means of spacing.
  • the spacer means are spacers made of electrically insulating material, having a central through hole for the passage of the rigid rod and each spacer has a bearing track distant from the central hole on which track rests the micromechanical part typically the needle.
  • the track is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position.
  • the spacing means are of electrically insulating material and are in the form of a ring connected by branches to a central portion provided with a bore for engaging a rod and the branches carry the track on which rests the micromechanical part.
  • the ring of the spacer means has pads.
  • a support 1 for leaching and / or galvanic deposition on micromechanical parts In the example below, the micromechanical parts are watch hands but it is understood that the support of the invention could be used with any other micromechanical part having an orifice or a through-light.
  • This device also called “loop", loaded with parts to be treated, is intended to be immersed in a bath of laundry and / or electrolyte and is a cathode which cooperates with an anode to deposit on the surface of said parts, typically a deposit of gold, or rhodium or the like
  • the support for the leaching and / or the galvanic deposition consists of a carrier structure 1 having attachment points 2 for needles 3 of watches each provided with a light 3A.
  • the needle light 3A is used to mount the needle on the training outputs of the watch movement through the watch dial.
  • This carrier 1 carries electric current and therefore has a current-conducting element.
  • the attachment points 2 are presented by at least one rigid conductive rod 10 on which rod the needles are stacked via their light 3A and are kept spaced apart by means 11 of separation.
  • the needles are mounted free to rotate on the rod 10 but the operating clearance is low because there must be sufficient electrical contact between the needle 3 and the rod 10. This contact is preferably permanent to obtain a uniform deposit on the surface needles.
  • the spacing means are preferably free to rotate relative to the rod 10.
  • the conductive rods for example of steel, are preferably coated with a layer of gold to improve electrical contact with the lights 3A needles.
  • the rods 10 have a diameter of the order of 0.5 mm. It is important that these rods are rigid enough to withstand without deformation rotations of the support during the deposition, rinsing and drying operations of the workpieces.
  • the support 1 comprises a perforated plate 4 carried by a central axis 1A to drive it in rotation and the rods 10 are spaced from said axis of rotation.
  • the perforated plate 4 has bases 5 intended to receive at least indirectly the rods 10 for example via an intermediate part 6 formed in the illustrated example of a stepped tube introduced into the bases. This allows for the regular exchange of the rods 10 which during the galvanic deposition operation will cover a deposit. A conductive connection of electricity is of course provided between the rods 10 and the central axis 1A.
  • the plate 4 is of generally circular shape.
  • This plate 4 perforated is in the form of a hoop 4A connected to the axis 1A of rotation by spokes 4B as the rim of a wheel bicycle poles.
  • the support has six rays.
  • the bases 5 are carried by the spokes and / or the hoop.
  • Each base is hollow with a conductive inner surface which is intended to receive the bottom of the rod 10 or the intermediate piece 6 which then houses the bottom of the rod 10.
  • the height of the base is here about twice thickness of the hoop 4A.
  • the structure 1, comprising the central axis, the plate 4, the bases, the intermediate parts and the rods are electrically conductive material, the current from the axis 1A attached to a current source belonging to the electroplating machine.
  • the spacer means 11 are spacers of electrically insulating material having a central hole 11A for the passage of the rigid rod 10 and each spacer has a bearing track 11B remote from the central hole 11A on which track rests the needle.
  • This track 11B only serves to support the needle at a point remote from the light of said needle. The needle is supported at the level of the light and the track 11B.
  • the track 11B is defined by the trajectory, over an angular amplitude of 360 °, of the end of a radius of variable length according to its angular position.
  • the track will be more or less close to the rod so that this track does not describe a circle of constant radius. We will understand further the desired result.
  • the needle must by gravity travel along the track 11B of the spacer and to do this two solutions exist.
  • the rods 10 are parallel to the axis 1A of general rotation but during assembly in the electrolysis bath said general axis of rotation is inclinedly mounted relative to the vertical so that during the rotation of the support about its axis 1A, the needle travels along the track 11B with a moving contact area, which improves the uniformity of the deposit. If the track was circular, the fulcrum of the needle on the track would always be the same and being in contact, there would be no deposit on this area.
  • the rods 10 are inclined relative to the axis 1A central rotation of the support which is held vertical in the electrolysis bath.
  • the spacing means 11 which are made of electrically insulating material are in the form of a ring 12 connected by branches 13 to a central portion 14 provided with a bore for engaging a rod 10 and the branches carry the track 11B who is not a driver.
  • these rings 12 may be made of polyamide. It will also be noted that the track 11B is elevated relative to the branches 13.
  • the ring 12 of the spacer means bears one of its faces studs 20 perpendicular to the plane of the ring, the pads 20 serving as support for the spacer means located above.
  • Six regular studs have been represented here.
  • the branches 13 laterally bear the track 11B which is positioned above the level of the branches.
  • a washer 21 At the base of the stack of spacing means 11 is placed a washer 21 called stabilization electrically insulating material and perforated.
  • This stabilizer washer 21 prevents the spacer means 11 from being placed at an angle.
  • This is a disc with a holey or meshed surface.
  • This washer bears on the intermediate part 6 which serves to mount the rod on the base.
  • This intermediate piece has an enlarged head 6A.
  • the stacks of the spacer means are held in place by a perforated lid 30 which for example will be fixed on the general axis of rotation 1A by a fastening means such as a clamp P
  • the lid 30 is composed of circles interconnected by elongate elements. The center of these circles coincide with the position of the rods10.
  • the rods 10 are not necessarily made of an electrically conductive material and the spacers are not made of insulating material.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Micromachines (AREA)
EP13166047.4A 2013-04-30 2013-04-30 Support pour le traitement de pièces de micromécanique Withdrawn EP2799939A1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
EP13166047.4A EP2799939A1 (fr) 2013-04-30 2013-04-30 Support pour le traitement de pièces de micromécanique
EP14712315.2A EP2992388B1 (fr) 2013-04-30 2014-03-26 Support pour le traitement de pieces de micromecanique
KR1020157031112A KR101800100B1 (ko) 2013-04-30 2014-03-26 마이크로기계 부품을 처리하기 위한 마운트
US14/782,624 US10001754B2 (en) 2013-04-30 2014-03-26 Support for treating micromechanical components
PCT/EP2014/056038 WO2014177324A2 (fr) 2013-04-30 2014-03-26 Support pour le traitement de pieces de micromecanique
JP2016508064A JP6087022B2 (ja) 2013-04-30 2014-03-26 マイクロメカニカル部品を処理するための支持体
CN201480024220.6A CN105164591B (zh) 2013-04-30 2014-03-26 用于处理微机械部件的支座和包括该支座的组件
TW103115048A TWI510679B (zh) 2013-04-30 2014-04-25 用於處理微機械構件之支撐件
HK16106758.1A HK1218790A1 (zh) 2013-04-30 2016-06-13 用於處理微機械部件的支座

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP13166047.4A EP2799939A1 (fr) 2013-04-30 2013-04-30 Support pour le traitement de pièces de micromécanique

Publications (1)

Publication Number Publication Date
EP2799939A1 true EP2799939A1 (fr) 2014-11-05

Family

ID=48288828

Family Applications (2)

Application Number Title Priority Date Filing Date
EP13166047.4A Withdrawn EP2799939A1 (fr) 2013-04-30 2013-04-30 Support pour le traitement de pièces de micromécanique
EP14712315.2A Active EP2992388B1 (fr) 2013-04-30 2014-03-26 Support pour le traitement de pieces de micromecanique

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP14712315.2A Active EP2992388B1 (fr) 2013-04-30 2014-03-26 Support pour le traitement de pieces de micromecanique

Country Status (8)

Country Link
US (1) US10001754B2 (ja)
EP (2) EP2799939A1 (ja)
JP (1) JP6087022B2 (ja)
KR (1) KR101800100B1 (ja)
CN (1) CN105164591B (ja)
HK (1) HK1218790A1 (ja)
TW (1) TWI510679B (ja)
WO (1) WO2014177324A2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3543795A1 (fr) * 2018-03-20 2019-09-25 Patek Philippe SA Genève Procede de fabrication de composants horlogers en silicium

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102540215B1 (ko) * 2021-11-25 2023-06-02 장민성 스티프너 핸들링 트레이

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1389830A (fr) * 1963-03-22 1965-02-19 Carl Hass Fa Récipient d'emballage pour le transport de spiraux de montres ou similaires
GB1047675A (en) * 1965-03-16 1966-11-09 Greiner Electronic Ag Clockwork component support device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5054624A (en) * 1989-07-05 1991-10-08 Camp Betty J Jewelry caddy
US7087144B2 (en) * 2003-01-31 2006-08-08 Applied Materials, Inc. Contact ring with embedded flexible contacts
WO2005079128A1 (en) * 2004-01-15 2005-08-25 International Business Machines Corporation Micro-electromechanical sub-assembly having an on-chip transfer mechanism
CN101007298B (zh) * 2006-01-24 2011-06-29 深圳富泰宏精密工业有限公司 支架稳固装置
DE102006013844A1 (de) * 2006-03-25 2007-10-11 Khs Ag Vakuumtrommel sowie Etikettiermaschine mit einer solchen Trommel für die Rundum-Etikettierung von Flaschen oder dergleichen Behälter
EP2010700B1 (de) * 2006-04-18 2010-01-20 Basf Se Vorrichtung und verfahren zur galvanischen beschichtung
EP2010699A2 (de) * 2006-04-18 2009-01-07 Basf Se Vorrichtung und verfahren zur galvanischen beschichtung
CH699110A1 (fr) * 2008-07-10 2010-01-15 Swatch Group Res & Dev Ltd Procédé de fabrication d'une pièce micromécanique.
EP2189854A1 (fr) * 2008-11-21 2010-05-26 Nivarox-FAR S.A. Procédé de fabrication d'une pièce de micromécanique
US8636259B2 (en) * 2010-07-14 2014-01-28 Semba Biosciences, Inc. Adjustable carriage holder for support apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1389830A (fr) * 1963-03-22 1965-02-19 Carl Hass Fa Récipient d'emballage pour le transport de spiraux de montres ou similaires
GB1047675A (en) * 1965-03-16 1966-11-09 Greiner Electronic Ag Clockwork component support device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3543795A1 (fr) * 2018-03-20 2019-09-25 Patek Philippe SA Genève Procede de fabrication de composants horlogers en silicium
WO2019180596A1 (fr) * 2018-03-20 2019-09-26 Patek Philippe Sa Geneve Procede de fabrication de composants horlogers en silicium
EP3907567A1 (fr) * 2018-03-20 2021-11-10 Patek Philippe SA Genève Organe de support pour le traitement thermique d'une plaquette
EP3769162B1 (fr) 2018-03-20 2022-08-10 Patek Philippe SA Genève Procede de fabrication de composants horlogers en silicium
US11880165B2 (en) 2018-03-20 2024-01-23 Patek Philippe Sa Geneve Method for manufacturing silicon timepiece components

Also Published As

Publication number Publication date
TW201512462A (zh) 2015-04-01
JP6087022B2 (ja) 2017-03-01
EP2992388B1 (fr) 2017-02-01
US10001754B2 (en) 2018-06-19
KR20150135525A (ko) 2015-12-02
KR101800100B1 (ko) 2017-12-20
WO2014177324A2 (fr) 2014-11-06
CN105164591B (zh) 2017-05-31
TWI510679B (zh) 2015-12-01
EP2992388A2 (fr) 2016-03-09
US20160041528A1 (en) 2016-02-11
HK1218790A1 (zh) 2017-03-10
JP2016522322A (ja) 2016-07-28
WO2014177324A3 (fr) 2015-05-07
CN105164591A (zh) 2015-12-16

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