EP2797853A1 - Procédé de production de substrats dcb - Google Patents
Procédé de production de substrats dcbInfo
- Publication number
- EP2797853A1 EP2797853A1 EP12821253.7A EP12821253A EP2797853A1 EP 2797853 A1 EP2797853 A1 EP 2797853A1 EP 12821253 A EP12821253 A EP 12821253A EP 2797853 A1 EP2797853 A1 EP 2797853A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- copper
- ceramic layer
- ceramic
- surface side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 69
- 239000000758 substrate Substances 0.000 title claims abstract description 15
- 239000000919 ceramic Substances 0.000 claims abstract description 86
- 239000002184 metal Substances 0.000 claims abstract description 49
- 229910052751 metal Inorganic materials 0.000 claims abstract description 48
- 239000011888 foil Substances 0.000 claims abstract description 30
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 144
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 46
- 229910052802 copper Inorganic materials 0.000 claims description 38
- 239000010949 copper Substances 0.000 claims description 38
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 28
- 239000002344 surface layer Substances 0.000 claims description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 238000005245 sintering Methods 0.000 claims description 21
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 14
- 239000005751 Copper oxide Substances 0.000 claims description 14
- 229910000431 copper oxide Inorganic materials 0.000 claims description 14
- 238000007254 oxidation reaction Methods 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 230000003647 oxidation Effects 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000000243 solution Substances 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 8
- 229910001431 copper ion Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 4
- 239000012670 alkaline solution Substances 0.000 claims description 3
- 238000005422 blasting Methods 0.000 claims description 3
- 230000001680 brushing effect Effects 0.000 claims description 3
- 238000003490 calendering Methods 0.000 claims description 3
- 238000005266 casting Methods 0.000 claims description 3
- 238000005234 chemical deposition Methods 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 238000005488 sandblasting Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 238000012993 chemical processing Methods 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000006263 metalation reaction Methods 0.000 claims 1
- 238000001465 metallisation Methods 0.000 abstract description 17
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 abstract 1
- 239000011889 copper foil Substances 0.000 description 8
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 5
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 3
- -1 barium nitride Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 230000005496 eutectics Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 239000002223 garnet Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000004972 metal peroxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
- C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
- C04B37/025—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used consisting of glass or ceramic material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/103—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by bonding or embedding conductive wires or strips
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
- C04B37/021—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
- C04B2237/04—Ceramic interlayers
- C04B2237/06—Oxidic interlayers
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
- C04B2237/04—Ceramic interlayers
- C04B2237/06—Oxidic interlayers
- C04B2237/064—Oxidic interlayers based on alumina or aluminates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
- C04B2237/04—Ceramic interlayers
- C04B2237/09—Ceramic interlayers wherein the active component for bonding is not the largest fraction of the interlayer
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
- C04B2237/12—Metallic interlayers
- C04B2237/124—Metallic interlayers based on copper
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/36—Non-oxidic
- C04B2237/366—Aluminium nitride
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/40—Metallic
- C04B2237/402—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/40—Metallic
- C04B2237/407—Copper
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/52—Pre-treatment of the joining surfaces, e.g. cleaning, machining
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/54—Oxidising the surface before joining
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
- C04B2237/708—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the interlayers
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/72—Forming laminates or joined articles comprising at least two interlayers directly next to each other
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/86—Joining of two substrates at their largest surfaces, one surface being complete joined and covered, the other surface not, e.g. a small plate joined at it's largest surface on top of a larger plate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/30—Foil or other thin sheet-metal making or treating
- Y10T29/301—Method
- Y10T29/302—Clad or other composite foil or thin metal making
Definitions
- the invention relates to a method for the manufacture len of DCB substrates, in particular in the form of printed circuit boards for electrical circuits and / or modules, according to the preamble of claim 1. Methods of this kind are known.
- DCB process Direct Copper Bond Technology
- metal ltiken or sheets eg copper sheets or - fol ies
- metal sheets or films especially those of copper or copper alloys, on their surface sides a layer or coating of a chemical
- this layer or coating forms together with the adjacent metal l a eutectic (reflow) with a melting temperature below the melting temperature of the metal ls (for example, copper), so that by placing the film on the ceramic and heating all ichl layers can be connected to each other, through
- This DCB method then indicates e.g. the following process steps:
- Oxidizing a metal foil e.g. Kupferfol ie such that there is a uniform metal or copper oxide layer;
- metal foil for example copper foil
- DCB bonding Substrates prepared by this method (hereinafter also referred to as “DCB bonding") are hereinafter referred to as "DCB substrates", regardless of the metal I used for the metal layers or foils.
- DCB substrates When using aluminum nitride (AIN) ceramic layers, it is also known to produce an intermediate layer of aluminum oxide (Al 2 O 3) on at least one surface side of the respective ceramic layer, first by thermal oxidation in air or in an oxygen-containing atmosphere. Only via this intermediate layer is it then possible to connect the metallization forming the corresponding metal foil, for example copper foil, by DCB bonding with the ceramic.
- Al 2 O 3 aluminum oxide
- the object of the invention is to provide a method by which DCB substrates with at least one ceramic layer consisting essentially of aluminum nitride with improved quality, in particular with improved mechanical and / or electrical and / or thermal properties, can be produced.
- a method according to claim 1 is formed.
- an essential feature of the method according to the invention is that the particular ceramic layer used, which consists essentially of aluminum nitride (AIN), for example, with an aluminum nitride content of at least 90%, preferably with an aluminum nitride content of at least 96%, with further constituents including sintering aids such as yttria Y203), calcium oxide (CaO), magnesium oxide (MgO) and release agents such as boron nitride (BN) and reaction products such as garnet (Y203 " Al203), and boron oxide (B203), prior to producing the at least one intermediate layer of alumina (AI203) is mechanically and / or chemically cleaned on the relevant surface side, ie a surface layer existing therefrom which results from the sintering process and contains, inter alia, reaction processes from the sintering process is developed in a further development of the invention.
- AIN aluminum nitride
- the removal of the surface layer, in particular also of the surface layer containing an oxidic ceramic takes place mechanically, for example by brushing, grinding, lapping, sandblasting, pressure blasting,
- the removal of the surface layer takes place by chemical treatment, for example by treatment with an alkaline solution, preferably with an aqueous solution having a pH greater than 10, preferably with a pH greater than 12,
- a treatment temperature in the range between 20 ° C and 100 ° C, preferably at a temperature greater than 50 ° C,
- KOH Potassium hydroxide
- Na2C03 sodium carbonate
- the removal of the surface layer takes place thermally in liquid and / or vapor, for example by treatment under pressure in an autoclave
- a thin layer of copper or copper oxide or of at least one other copper-containing compound is applied to the ceramic layer on at least one surface side prior to the production of the at least one intermediate layer, and that subsequently the at least one intermediate layer is produced by thermal oxidation,
- the application of the thin layer of copper or copper oxide or of the at least one copper-containing compound is effected by immersing the ceramic layer in an aqueous copper ion-containing solution, for example in an aqueous solution with 0.005 to 2.0 mol / ICu + + ion content,
- the application of the thin layer of copper or of copper oxide or of the at least one other copper-containing compound takes place by sputtering and / or by CVD deposition and / or by chemical deposition, and or
- the at least one intermediate layer by thermal oxidation, i. by heating the ceramic layer to a temperature in the range between 800 ° C and 1 450 ° C in air or in an oxygen-containing atmosphere with an oxygen content between 10% and 90%,
- the method comprises the following method steps:
- the method comprises the following method steps:
- a are made of a ceramic layer, that on at least one surface side of the ceramic layer, the intermediate layer is produced and then the pre-oxidized metal layer or metal foil is connected by DCB bonding, that before generating the at least one intermediate layer on the respective surface side of the ceramic layer there existing, from the Sintering process resulting surface layer is removed, and then that the intermediate layer is generated,
- Figure 1 is a DCB substrate with an insulating or ceramic layer of aluminum nitride (AIN) in section.
- AIN aluminum nitride
- FIG. 3 shows an enlarged view of the ceramic layer of aluminum nitride together with an intermediate layer applied to this ceramic layer essentially consisting of aluminum oxide (Al 2 O 3) in the method of FIG.
- Substrates of Figure 1 in a further embodiment of the invention 5 shows an enlarged view of the ceramic layer of aluminum nitride together with an intermediate layer applied to this ceramic layer essentially consisting of aluminum oxide (Al 2 O 3) in the method of FIG. 4.
- FIG. 1, 1 is a metal-ceramic substrate or a DCB substrate which is in the
- Substantially consists of a ceramic layer 2 of protective or intermediate layers 3, each of which is located on a surface side of the ceramic layer 2, as well as metallizations 4 and 5, which are each applied to one of the intermediate layers 3 and of which the metal isation 3 for forming of metal areas 3.1, for example in the form of
- Conductor tracks, contact surfaces, mounting surfaces, etc. is structured.
- the ceramic layer 2 is one made of aluminum nitride (AIN), for example, with a content of aluminum nitride (AIN) of at least 90% by weight, preferably with a content of aluminum nitride (AIN) of about 96% by weight, the remainder each being further additives or substantially other additives, in particular sintering aids, such as
- yttria Y203
- ceria CaO
- barium oxide B203
- barium nitride BN
- calcium oxide CaO
- the intermediate layers 3 are also ceramic layers and consist of aluminum oxide (AI302) with a small proportion of other constituents, in particular
- Sintering aids for example with a small proportion of yttrium oxide (Y203),
- the metallizations 4 and 5 are layers or foils of copper, of a copper alloy, or of aluminum or an aluminum alloy.
- the basic process steps for producing the substrate 1 are shown in FIG. 2 in the local positions a) -f).
- the ceramic layer 2 of aluminum nitride is first provided, by casting and / or calendering and / or pressing a crumb foil 2.1 made of aluminum nitride (AIN) with the sintering aids and by subsequent sintering of the respective green sheet 2.1, also in the stack with further Crünfolien at the required sintering temperature, for example at a temperature in the range between 1 600 ° C and 1 900 ° C.
- the green ceramic layer 2.2 (ceramic layer as-fired) is obtained according to the position b).
- This raw ceramic layer 2.2 has, in particular, surface layers 6 originating from the sintering process, for example with a thickness in the range between 0.05 mm and 0.3 mm.
- the surface layers 6 consist essentially of
- Impurities and components or compounds of the sintering aids and release agents such.
- the intermediate layers 3 e.g. by thermal oxidation.
- the ceramic layer 2 in air or in an oxygen-containing atmosphere, for example in an atmosphere containing inert gas, for example nitrogen, argon, etc., and oxygen in a proportion of 10% - 90%, to a temperature in the range between 800 ° C heated to 1450 ° C.
- the intermediate layers 3 likewise contain constituents (3.1) or reaction products of the sintering aids, for example Y 2 O 3, BN, B 2 O 3 etc. (FIGS. 3 and 5)
- the pre-oxidized metal layers or metal foils are respectively placed on an intermediate layer 3 and then subsequently connected by DCB bonding with the intermediate layers 3 and via the with the ceramic layer 2.
- the DCB bonding is performed by heating the assembly formed by the metal foils or layers and the ceramic layer 2 with the intermediate layers 3 to the DCB temperature in the range between
- the structuring of at least the metallization 4 takes place in accordance with the position f) to form the metal regions 4.1, which are also electrically separated from one another, using a suitable and known masking and etching method.
- This structuring can be omitted if the metallizations 4 and 5 and in particular the metallization 4 already pre-structured on with the
- removing the surface layers 6, in particular a mechanical and / or material-removing treatment and / or a chemical treatment for example a chemical treatment with a suitable aqueous solution or alkali, preferably with an aqueous alkaline solution having a pH greater oil or preferably greater than 12, for example by immersing the
- sodium hydroxide solution NaOH
- a 5% sodium hydroxide solution are suitable as the treatment solution.
- other alkaline treatment solutions for example KOH, Na 2 CO 3, are also suitable for the treatment.
- the treatment is preferably carried out at a temperature in the range between 20 ° C and 100 ° C, preferably at a temperature greater than 50 ° C.
- Another possibility is a treatment with the solutions mentioned under pressure in an autoclave to 300 ° C.
- a mechanical treatment removing the material of the surface layers 6 is also possible, for example removal of the surface layers 6 by brushing and / or grinding and / or lapping, sand blasting, pressure blasting, etc.
- Treatment before the chemical treatment or following the chemical treatment are mechanical treatment and chemical treatment carried out at least partially overlapping in time.
- connection of the metallizations 4 and 5 with the ceramic and in terms of electrical properties can be achieved when in the intermediate layer 3 copper or copper oxide or copper ions are incorporated. It has been shown that 3 discontinuities 7 form without incorporation of copper or copper oxide or copper ions in the intermediate layers, in which the respective intermediate layer 3 is not completely formed or interrupted.
- discontinuities 7 i. in particular the pores and interruptions, lead to the fact that in the region of discontinuities 7 no DCB connection between the ceramic and the respective metallization 4 or 5 comes about, ie below the respective
- Metallization 4 and 5 bubbles or cavities form. Through these bubbles or voids u.a. not only the mechanical strength of the connection between the metallizations 4 and 5 and the ceramic, but in particular the dielectric strength of the substrate 1 between the metallizations 4 and 5 significantly affected.
- the discontinuities 7 and the associated disadvantages are effectively avoided (FIG. 5).
- FIG. 4 shows in the positions a-f the essential steps a method in which, after the provision of the ceramic ceramics 2.1 (position a), after the sintering and cleaning of the raw ceramics 2.2 (Positions b and c) on both surface sides of the cleaned, ie freed from the surface layers 6 ceramic layer 2 is applied in each case a thin layer 8 of copper or a copper-containing compound, as shown in Figure 4 in the position c) subsequent Position c) 'is indicated. Following this, in turn, according to position d), the two intermediate layers 3 having the desired thicknesses are produced by thermal oxidation in an oxygen-containing atmosphere.
- the intermediate layers 3 are set to a layer thickness between about 0.5 // m and 10 ym.
- the further method steps (positions e) and f)) correspond to the method as described in connection with FIG.
- the layers 8 for example, with a thickness in the range between 1, 5 x 10 "4 // m and 1 200 x 10" 4 // m.
- the layers 8 can be obtained, for example, by immersing the cleaned ceramic layer 2 in an aqueous solution containing copper ions, for example in an aqueous solution with 0.005 to 2.0 mol / ICu + + ion content and / or by sputtering and / or by CVD deposition and / or chemical deposition can be applied.
- the layers 8 can also be produced by the use of brushes with bristles containing copper in the case of mechanical removal of the surface layers 6.
- Another method for doping the Al 2 O 3 intermediate layers 3 with copper during the thermal oxidation can be carried out by the following method steps:
- Another method for doping the Al 2 O 3 intermediate layers 3 with copper can be carried out by the following method steps:
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Products (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
Abstract
L'invention concerne un procédé de production de substrats DCB comportant respectivement une couche céramique constituée principalement de nitrure d'aluminium (AlN), qui est dotée sur au moins une face d'une couche intermédiaire constituée principalement d'oxyde d'aluminium, ainsi que d'une métallisation constituée d'une couche métallique ou d'une feuille métallique, placée sur la couche intermédiaire.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011057058 | 2011-12-27 | ||
DE102012100792 | 2012-01-31 | ||
DE102012101057A DE102012101057A1 (de) | 2011-12-27 | 2012-02-09 | Verfahren zur Herstellung von DCB-Substraten |
PCT/DE2012/100400 WO2013097845A1 (fr) | 2011-12-27 | 2012-12-27 | Procédé de production de substrats dcb |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2797853A1 true EP2797853A1 (fr) | 2014-11-05 |
Family
ID=48575712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12821253.7A Withdrawn EP2797853A1 (fr) | 2011-12-27 | 2012-12-27 | Procédé de production de substrats dcb |
Country Status (7)
Country | Link |
---|---|
US (1) | US20140338162A1 (fr) |
EP (1) | EP2797853A1 (fr) |
JP (1) | JP2015503500A (fr) |
KR (1) | KR20140119047A (fr) |
CN (1) | CN104105678A (fr) |
DE (1) | DE102012101057A1 (fr) |
WO (1) | WO2013097845A1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012102611B4 (de) * | 2012-02-15 | 2017-07-27 | Rogers Germany Gmbh | Metall-Keramik-Substrat sowie Verfahren zum Herstellen eines Metall-Keramik-Substrates |
DE102014109706A1 (de) * | 2014-07-10 | 2016-01-14 | Bundesrepublik Deutschland, Vertreten Durch Den Bundesminister Für Wirtschaft Und Energie, Dieser Vertreten Durch Den Präsidenten Der Bundesanstalt Für Materialforschung Und -Prüfung (Bam) | Aufbau und Verwendung einer geometrisch dicht gepackten Pulverschicht |
DE102017128316B4 (de) * | 2017-11-29 | 2019-12-05 | Rogers Germany Gmbh | Verfahren zur Herstellung eines Metall-Keramik-Substrats und Metall-Keramik-Substrat |
KR102435986B1 (ko) * | 2019-08-08 | 2022-08-26 | 세메스 주식회사 | 코팅 장치 및 코팅 방법 |
TWI761734B (zh) * | 2019-11-26 | 2022-04-21 | 財團法人工業技術研究院 | 覆銅陶瓷基板 |
CN115216770B (zh) * | 2022-06-27 | 2023-08-22 | 佛山华智新材料有限公司 | 一种金刚石/铜复合材料表面金属涂层的制备方法 |
CN117303932B (zh) * | 2023-10-18 | 2024-03-19 | 江苏富乐华半导体科技股份有限公司 | 一种彻底解决湿法氧化dbc烧结大气泡的方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3766634A (en) | 1972-04-20 | 1973-10-23 | Gen Electric | Method of direct bonding metals to non-metallic substrates |
US3744120A (en) | 1972-04-20 | 1973-07-10 | Gen Electric | Direct bonding of metals with a metal-gas eutectic |
JP3157520B2 (ja) * | 1990-11-30 | 2001-04-16 | イビデン株式会社 | 窒化アルミニウム基板の製造方法 |
US5418002A (en) * | 1990-12-24 | 1995-05-23 | Harris Corporation | Direct bonding of copper to aluminum nitride substrates |
JP3208438B2 (ja) * | 1992-01-16 | 2001-09-10 | イビデン株式会社 | 金属層を備えたセラミックス基板とその製造方法 |
JP3593707B2 (ja) * | 1993-03-19 | 2004-11-24 | 住友電気工業株式会社 | 窒化アルミニウムセラミックスとその製造方法 |
DE9407157U1 (de) * | 1994-04-29 | 1995-08-31 | Akyuerek Altan | Aus einem Nitrid bestehendes, hochwärmeleitendes Keramiksubstrat |
DE19603822C2 (de) * | 1996-02-02 | 1998-10-29 | Curamik Electronics Gmbh | Verfahren zur Herstellung eines Keramik-Substrat sowie Keramik-Substrat |
JP4467659B2 (ja) * | 1999-03-26 | 2010-05-26 | 株式会社東芝 | セラミックス回路基板 |
AT407987B (de) * | 1999-11-17 | 2001-07-25 | Electrovac | Verfahren zur vorbereitung eines a1n-substrates auf die verbindung mit einer kupferschicht |
JP4030285B2 (ja) * | 2001-10-10 | 2008-01-09 | 株式会社トクヤマ | 基板及びその製造方法 |
JP2005089265A (ja) * | 2003-09-18 | 2005-04-07 | Toshiba Corp | 窒化アルミニウム−金属接合基板の製造方法 |
DE102004056879B4 (de) * | 2004-10-27 | 2008-12-04 | Curamik Electronics Gmbh | Verfahren zum Herstellen eines Metall-Keramik-Substrates |
DE102005061049A1 (de) * | 2005-12-19 | 2007-06-21 | Curamik Electronics Gmbh | Metall-Keramik-Substrat |
CN101445386B (zh) * | 2007-11-27 | 2011-06-15 | 比亚迪股份有限公司 | 一种陶瓷覆铜基板的制备方法 |
WO2009139354A1 (fr) * | 2008-05-16 | 2009-11-19 | 日本特殊陶業株式会社 | Substrat céramique, substrat céramique fonctionnel, carte sonde et procédé de fabrication du substrat céramique |
-
2012
- 2012-02-09 DE DE102012101057A patent/DE102012101057A1/de not_active Withdrawn
- 2012-12-27 EP EP12821253.7A patent/EP2797853A1/fr not_active Withdrawn
- 2012-12-27 KR KR1020147020815A patent/KR20140119047A/ko not_active Application Discontinuation
- 2012-12-27 WO PCT/DE2012/100400 patent/WO2013097845A1/fr active Application Filing
- 2012-12-27 JP JP2014549360A patent/JP2015503500A/ja active Pending
- 2012-12-27 CN CN201280069294.2A patent/CN104105678A/zh active Pending
- 2012-12-27 US US14/368,968 patent/US20140338162A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
---|
See references of WO2013097845A1 * |
Also Published As
Publication number | Publication date |
---|---|
DE102012101057A1 (de) | 2013-06-27 |
WO2013097845A1 (fr) | 2013-07-04 |
CN104105678A (zh) | 2014-10-15 |
US20140338162A1 (en) | 2014-11-20 |
KR20140119047A (ko) | 2014-10-08 |
JP2015503500A (ja) | 2015-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2797853A1 (fr) | Procédé de production de substrats dcb | |
EP1966824B1 (fr) | Substrat métal-céramique | |
DE102013113736B4 (de) | Verfahren zum Herstellen eines Metall-Keramik-Substrates | |
DE102005042554A1 (de) | Metall-Keramik-Substrat | |
WO2014067511A1 (fr) | Substrat métal-céramique et procédé pour fabriquer un substrat métal-céramique | |
DE102013113734A1 (de) | Verfahren zum Herstellen eines Metall-Keramik-Substrates | |
WO2010112000A1 (fr) | Substrat métal-céramique | |
DE102013108610A1 (de) | Metall-Keramik-Substrat sowie Verfahren zum Herstellen eines Metall-Keramik-Substrates | |
DE102010024520B4 (de) | Verfahren zur Erhöhung der thermo-mechanischen Beständigkeit eines Metall-Keramik-Substrats | |
DE19603822C2 (de) | Verfahren zur Herstellung eines Keramik-Substrat sowie Keramik-Substrat | |
EP3419949B1 (fr) | Composite en ceramique/cuivre | |
EP3210951B1 (fr) | Composite en ceramique/cuivre | |
WO2003097557A1 (fr) | Procede de fabrication d'un substrat composite ceramique-cuivre | |
DE69734341T2 (de) | Leiterplatte für Leistungsmodul | |
EP1487759A1 (fr) | Procede pour la production d'un substrat metal-ceramique, de preference d'un substrat cuivre-ceramique | |
DE102010025311B4 (de) | Verfahren zum Aufbringen einer metallischen Schicht auf ein keramisches Substrat, Verwendung des Verfahrens und Materialverbund | |
DE10212495A1 (de) | Verfahren zum Herstellen eines Metall-Keramik-Substrats, vorzugsweise eines Kupfer-Keramik-Substrats | |
DE102014114132B4 (de) | Metall-Keramik-Substrat und Verfahren zum Herstellen eines Metall-Keramik-Substrates | |
DE4444681C2 (de) | Keramik-Substrat sowie Verfahren zu seiner Herstellung | |
EP1241148B1 (fr) | Substrat en nitrure d'aluminium et procédé de preparation de ce substrat à la liaison avec une feuille de cuivre | |
DE10221876B4 (de) | Verfahren zum Herstellen eines Keramik-Kupfer-Verbundsubstrats | |
DE102014106694B3 (de) | Verfahren zur Metallisierung zumindest eines plattenförmigen Keramiksubstrates sowie Metall-Keramik-Substrat | |
DE102019207227A1 (de) | Verfahren zur Herstellung thermoelektrischer Elemente mit elektrischen An-schlusskontakten sowie ein mit dem Verfahren hergestelltes thermoelektrisches Modul | |
WO2021122035A1 (fr) | Procédé de fabrication d'un substrat métal-céramique, et substrat métal-céramique fabriqué par un tel procédé | |
WO2024022743A1 (fr) | Substrat métal-céramique avec zone de contact |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20140626 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
DAX | Request for extension of the european patent (deleted) | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ROGERS GERMANY GMBH |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20170701 |