EP2731731B1 - Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement - Google Patents

Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement Download PDF

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Publication number
EP2731731B1
EP2731731B1 EP12733713.7A EP12733713A EP2731731B1 EP 2731731 B1 EP2731731 B1 EP 2731731B1 EP 12733713 A EP12733713 A EP 12733713A EP 2731731 B1 EP2731731 B1 EP 2731731B1
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EP
European Patent Office
Prior art keywords
particles
substrate
particle
film
facility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP12733713.7A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2731731A1 (fr
Inventor
Olivier Dellea
Philippe Coronel
Pascal Fugier
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Publication of EP2731731A1 publication Critical patent/EP2731731A1/fr
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B05C19/04—Apparatus specially adapted for applying particulate materials to surfaces the particulate material being projected, poured or allowed to flow onto the surface of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1036—Means for supplying a selected one of a plurality of liquids or other fluent materials, or several in selected proportions, to the applying apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B05C19/008—Accessories or implements for use in connection with applying particulate materials to surfaces; not provided elsewhere in B05C19/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B05C19/06—Storage, supply or control of the application of particulate material; Recovery of excess particulate material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/12—Applying particulate materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/20—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by magnetic fields
    • B05D3/203—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by magnetic fields pre-treatment by magnetic fields

Definitions

  • the invention relates to the field of installations and methods for the deposition of a film of ordered particles on a moving substrate.
  • the particle size may be between a few nanometers and several hundred micrometers.
  • the particles, preferably spherical in shape, may for example be silica particles, or polymer such as polystyrene.
  • the invention has many applications, in particular in the field of fuel cells, optics, photonics, polymer coating, chips, MEMs, surface structuring for organic electronics and photovoltaic, etc.
  • a transfer zone fed with particles, which float in a carrier liquid contained in the same transfer zone.
  • the particles ordered in the transfer zone, forming a monolayer of particles called thin film, are pushed by the arrival of other particles as well as by the circulation of the carrier liquid, towards an exit of this zone by which they reach the scrolling substrate on which they are deposited.
  • a capillary bridge usually ensures the connection between the substrate and the carrier liquid contained in the transfer zone.
  • the particles are kept ordered thanks in particular to the pressure exerted upstream by the moving particles intended to later reach this transfer zone.
  • the cohesion of the particle scheduling is further ensured by weak forces of capillary or electrostatic type.
  • the particle transfer zone is connected upstream to an inclined ramp on which the particles coming from a dispensing device run past, it is these same particles present on the inclined ramp which exert an pressure on the particles contained in the transfer zone, and which thus make it possible, in cooperation with the capillary forces of proximity, to preserve the ordering of the particles in this zone, until deposit on the substrate, by capillarity or direct contact.
  • the kinetic energy required for the ordering of the particles is here brought by the inclined ramp carrying the carrier liquid and the particles.
  • Other solutions are nevertheless possible, such as the setting in motion, with the aid of a pump, of the carrier liquid on a horizontal plane, the downstream part of which constitutes the zone of transfer of the particles.
  • Another solution is to replace said pump by a blower for applying a flow of air to the surface of the carrier liquid, on which the particles float.
  • the film deposited on the substrate has a determined width, corresponding to the full width of the exit of the transfer zone through which the particles escape.
  • Deposits of films of different widths are only envisaged by means of separate installations with appropriate dimensions. This generates disadvantages in terms of space, manufacturing costs and development costs of the facilities.
  • the delicate determination of the position of the particle front on the inclined ramp is a function of a multitude of parameters, some of which are specific to the installation concerned. This involves determining the position of the front for each different design facility.
  • the invention therefore aims to at least partially overcome the disadvantages mentioned above, relating to the achievements of the prior art.
  • the installation further comprises an accessory device in the form of a deposition head, intended to close off said particle outlet and designed to allow the deposition on the substrate of a film of ordered particles escaping through one end of a particle transfer channel of said deposition head, said end having a second width (L2) strictly smaller than said first width (L1).
  • an accessory device in the form of a deposition head, intended to close off said particle outlet and designed to allow the deposition on the substrate of a film of ordered particles escaping through one end of a particle transfer channel of said deposition head, said end having a second width (L2) strictly smaller than said first width (L1).
  • the invention thus cleverly provides an accessory device that can be mounted on the installation so as to obtain the deposition of a film of smaller width.
  • This solution therefore provides a satisfactory answer to the problems of space, manufacturing costs and development costs encountered in the embodiments of the prior art.
  • the position of the front can be preserved, whether or not the installation is equipped with the accessory device.
  • the same accessory device has a plurality of particle transfer channels, in order to simultaneously deposit several films on the same substrate, these films can then of course be of identical or different widths.
  • the second width may optionally be adjustable.
  • the installation according to the invention is remarkable in that it makes it possible to present a common base for a multitude of deposits of different shapes, only the accessory device forming a deposition head being adapted to the desired film size, or even removed when the deposit should have a maximum width corresponding to the first width of the particle outlet of the transfer zone.
  • the installation also comprises one or more suction nozzles capable of attracting the ordered particles present in the transfer zone to the particle transfer channel of said deposition head, when it is mounted on the installation.
  • the suction created makes it possible to promote the introduction, into the transfer channel, of the particles initially present in the transfer zone. This aspiration is preferably performed at the liquid / air interface in the particle transfer channel.
  • said one or more suction nozzles is arranged in said particle transfer channel near said end.
  • the installation also comprises means for acting on the particles before they enter the transfer channel and / or within the latter.
  • These means preferably make it possible to act on the orientation of the particles and / or on the properties physicochemical of these. To do this, these means may be laser, magnetic, electrical, thermal, ultrasonic, or any other design deemed appropriate by those skilled in the art.
  • the bottom of said transfer channel has a coating of hydrophilic material, interrupting before said end, made of hydrophobic material.
  • the coating of hydrophilic material promotes the advancement and withdrawal of the carrier liquid within the transfer channel.
  • the bottom of the portion of the deposition head located upstream of the transfer channel may also be provided with such a coating.
  • the hydrophobic character of the end of the channel designed to cooperate with the substrate, for its part, effectively breaks the contact between the liquid and the substrate during a removal operation of the carrier liquid from the depositing head, the end of a step of depositing a film on this substrate.
  • the ratio between the first and second widths (L1, L2) is between 2000 and 2, and preferably between 100 and 10.
  • the installation comprises an inclined ramp of particle circulation, attached to said inlet of the transfer zone, and on which said carrier liquid is also intended to circulate.
  • the kinetic energy required for the ordering of the particles in the normal regime is here brought by the inclined ramp carrying the carrier liquid and the particles.
  • Other solutions are nevertheless possible, such as the setting in motion, with the aid of a pump, the carrier liquid on a horizontal plane whose downstream part constitutes the particle transfer zone.
  • Another solution is to replace the pump by a blower for applying a flow of air to the surface of the carrier liquid, on which the particles float.
  • Other solutions are nevertheless conceivable, without departing from the scope of the invention, as a work of particle compression via a technique called "Langmuir-Blodgett".
  • said accessory device in the form of a deposition head is designed to allow the deposition, on the substrate, of a film of ordered particles escaping through the end of the particle transfer channel, with the aid of a direct contact provided between the end of the depositing head and the substrate.
  • a capillary bridge providing the connection between the carrier liquid contained in the particle transfer channel, and said substrate on which the ordered particle film is intended to be deposited.
  • the invention also relates to a method of depositing a film of ordered particles on a substrate, preferably in scrolling, using an installation as described above.
  • said deposition head accessory device is mounted or not on said installation, prior to said deposition.
  • FIG. 1 With reference first to Figures 1 and 2 , we can see a facility 1 for depositing a film of ordered particles on a moving substrate.
  • the installation is in a first configuration, in which it is not equipped with its accessory device deposit head, specific to the present invention and will be described below.
  • the installation 1 comprises a device 2 for dispensing particles 4, whose size may be between a few nanometers and several hundred micrometers.
  • the particles preferably of spherical shape, may for example be silica particles.
  • Other particles of interest can be made of metal or metal oxide such as platinum, TiO2, polymer such as polystyrene or PMMA, carbon, etc.
  • the particles are silica spheres of about 1 ⁇ m in diameter, stored in solution in the dispensing device 2.
  • the proportion of the medium is about 7 g of particles per 200 ml solution, here butanol.
  • the particles shown in the figures adopt a diameter greater than their actual diameter.
  • the dispensing device 2 has a controllable injection nozzle 6, about 500 microns in diameter.
  • the installation also comprises a liquid conveyor 10, incorporating an inclined ramp 12 of particle circulation, and a substantially horizontal transfer zone 14, or even having a slight inclination so as to promote the emptying of the installation, if necessary.
  • the upper end of the inclined ramp is designed to receive the particles injected from the dispensing device 2.
  • This ramp is straight, inclined at an angle between 5 and 60 °, preferably between 10 and 30 °, allowing the particles to be conveyed to the transfer zone 14.
  • a carrier liquid 16 flows on this ramp 12, into the transfer zone.
  • This liquid 16 can also be re-circulated using one or two pumps 18, between the transfer zone 14 and the upper end of the ramp.
  • This is preferably a deionized water, on which the particles 4 can float. Nevertheless, it is possible to favor a new liquid via an open circulation circuit.
  • the lower end of this same ramp is connected to an inlet of the particle transfer zone 14.
  • This inlet 22 is located at an inflection line 24 showing the junction between the surface of the carrier liquid present on the plane inclined of the ramp 12, and the surface of the carrier liquid present on the horizontal part of the transfer zone 14.
  • the particle inlet 22 is spaced apart from a particle outlet 26 by means of two lateral flanges 28 holding the carrier liquid 16 in the zone 14. These flanges 28, opposite and at a distance from one another , extend parallel to a main direction of flow of the carrier liquid and particles in the installation, this direction being shown schematically by the arrow 30 on the Figures 1 and 2 .
  • Area 14 therefore takes the form of a corridor or an open path at its entrance and exit.
  • the bottom of the downstream portion of the transfer zone has a plate 27 slightly inclined upstream relative to the horizontal direction, for example a value of the order of 5 to 10 °. It is the downstream end of this same plate 27, also called “blade”, which partly defines the output of particles 26.
  • the installation 1 is also provided with a substrate conveyor 36, for putting the substrate 38 in motion.
  • This substrate can be rigid or flexible. In the latter case, it can be set in motion on a roll 40 whose axis is parallel to the outlet 26 of the zone 14, near which it is located. Indeed, the substrate 38 is intended to scroll very close to the outlet 26, so that the particles escaping from this outlet can be easily deposited on this substrate, via a capillary bridge 42, also called meniscus, which connects to the carrier liquid 16. Even more preferably, the substrate may be in direct contact with the transfer zone, without departing from the scope of the invention. The capillary bridge mentioned above is then no longer required.
  • the width of the substrate corresponds to the width of the zone 14 and its outlet 26.
  • This is a first width L1 which also corresponds to the width of the particle film to be deposited. on the substrate.
  • This first width may be of the order of 25 to 30 cm.
  • the capillary bridge 42 is provided between the carrier liquid 16 which is located at the outlet 26, and a portion of the substrate 38 conforming to the guide / driving roller 40.
  • the axis of rotation of the latter roller can be located in the plane of the upper surface of the carrier liquid retained in zone 14.
  • the substrate 38 may be in a vertical direction, substantially orthogonal to the direction 30.
  • the injection nozzle 6 is activated to begin dispensing the particles 4 on the ramp 12. It is to implement an initial step of filling the transfer zone 14, by the particles 4, with the carrier liquid 16 already at the required level in the zone 14.
  • the particles dispensed by the device 2 circulate on the ramp 12, then enter the zone 14 in which they disperse, as has been schematized on the Figures 3 and 4 .
  • the upstream front of these particles tends to shift upstream, in the direction of the inflection line 24.
  • the injection of particles is continued even after this upstream front has passed the line 24, so that it rises on the inclined ramp 12.
  • the distance "d" can be of the order of 30 mm.
  • the particles 4 are ordered in the transfer zone and on the ramp 12, on which they are automatically arranged, without assistance, thanks in particular to their kinetic energy put to use at the moment of the impact on the front 54
  • the scheduling is such that the film obtained has a so-called "compact hexagonal" structure, in which each particle 4 is surrounded and contacted by six other particles 4 in contact with each other, as has been schematized on FIG. figure 6 .
  • This figure 6 shows the state of the installation after triggering the movement of the substrate 38, initiated as soon as the front 54 has reached the required level represented on the figure 5 .
  • the film of particles is then deposited on the same substrate 38, by taking the capillary bridge 42, in the manner of that described in the document CA 2,695,449 .
  • the width of this film 4 'corresponds to the first width L1 of the outlet 26.
  • the particle injection and the rate of travel of the substrate are adjusted so that the particle front remains in a substantially identical position.
  • the flow rate of the particles may be of the order of 0.1 ml / min to several ml / min, while the linear speed of the substrate 38, also called the drawing speed, may be of the order of a few mm / min to several hundred mm / min.
  • an accessory device specific to the present invention represented on FIG. figure 7 .
  • This accessory device 100 takes the form of a particle deposition head, intended to be mounted at the front end of the transfer zone 14, on the inclined plate 27. It comprises indeed a flat platform 50, intended to rest on the board 27 by marrying him.
  • a vertical wall 52 extends from a front end of the platform 50. It has a through opening which is extended forward by a remote structure 54, these elements jointly defining a transfer channel. particles 56 whose bottom is in the continuity before the platform 50. The length of this channel 56 is minimized so as to facilitate the circulation of the liquid and the passage of the particles.
  • the remote structure 54 has a bottom, two lateral flanks 58 corresponding to the edges of the channel 56, as well as a stop 60 extending downwards with respect to the platform 50, so as to be able to bear against the outlet 26 of the transfer zone and prevent the device 100 from sliding downwards in this same zone 14.
  • the front end 62 of the transfer channel 56 has a second width L2 less than the first width L1, a ratio of between 100 and 10 can be retained.
  • the platform 50 and the bottom of said transfer channel have a coating 66 of hydrophilic material, interrupting before the end 62, which is made of a hydrophobic material, such as preferably the entire structure of the accessory device 100.
  • This hydrophobic material is preferably Teflon (PTFE), retained for its hydrophobicity properties among which a surface tension of 73 mN.m -1 and a water contact angle of 112 °, as well as for its mechanical properties as its Young's modulus between 300 and 800 MPa, a Poisson's ratio of the order of 0.46, and a coefficient of friction of 0.05 to 0.2.
  • PTFE Teflon
  • its physicochemical properties are also interesting, in particular because of its insensitivity to the usual solvents.
  • the hydrophobicity of the vertical walls limits the risk of depositing particles on these walls, constituted by the vertical faces of the wall 52 and the flanks 58 of the transfer channel 56.
  • the mechanical properties mentioned above allow to confer a relatively rigid and relatively elastic material, allowing contact of the deposit head with the substrate without risk of collateral damage.
  • the physicochemical properties of Teflon imply that the device remains insensitive to most chemicals.
  • the hydrophobic nature of the end 62 of the channel makes it possible to effectively break the contact between the carrier liquid and the substrate, during a carrier liquid evacuation operation. out of the deposition head, at the end of a step of depositing a film on this substrate, as will be detailed below.
  • the accessory device is also equipped with two suction nozzles 70 capable of attracting the particles towards the transfer channel 56.
  • the suction is preferably provided at the end 62, at the liquid / air interface, at the end. proximity of the flanks 58 and the substrate, as shown schematically on the figure 7 .
  • Each nozzle may have an inner diameter of the order of a few tens of microns to a few mm.
  • the device also comprises means for acting on the particles, before entering the transfer channel 56, and / or within the latter.
  • These means 72 shown schematically on the figure 7 , preferentially allow to act on the orientation, and possibly the ordering of the particles and / or on the physicochemical properties thereof.
  • these means can be laser, magnetic, thermal, ultrasonic, or electrical.
  • the Functionalization of the transfer head is also possible thanks to the application of a normal external electric field to the surface of the carrier liquid.
  • the application of a normal electric field makes it possible to space the particles in a controlled manner and then arrange them in a compact and organized manner when the electric field is progressively reduced.
  • a laser beam to capture, move the particles. This means can be used to increase the initial scheduling.
  • the accessory device 100 is firstly placed at the downstream end of the transfer zone 14, with the platform 50 resting flat against the inclined plate 27, and with the abutment 60 bearing against the free end thereof same plateau, to prohibit the sliding of the device 100 downstream.
  • the vertical wall 52 extends over the entire first width L1 of the particle outlet 26, so as to prevent the passage of the latter other than through the transfer channel 56, of lower width L2 .
  • the setting up of the device 100 is preferably carried out dry, that is to say with the level of carrier liquid sufficiently low in the zone of transfer so as not to wet the device 100 when put in position. It is only after the positioning of the device 100 that the level of the carrier liquid 16 is increased, until it covers the end 62 of the channel 56, without exceeding the high end of the flanks 58.
  • the injection nozzle 6 is then activated to begin dispensing the particles 4 on the ramp 12. It is to implement a step of filling the transfer zone 14 and the deposition head 100, by the particles 4.
  • the particles dispensed by the device 2 circulate on the ramp 12, then enter the zone 14 in which they disperse. Then, they arrive near the wall 52 of the device 100 and enter the transfer channel 56.
  • the suction nozzles shown on the figure 7 are activated, the flow rate can be of the order of a few ml / min to several hundred ml / min. This suction is preferably short, for example exercised for half a second. It is preferably initiated after contact of the particles with the wall 52, when the film is already well ordered.
  • a capillary bridge can be created between the substrate 38 and the end 62 of the deposition head 100, or preferably, a contact is established between the same substrate 38 and the vertical edge 64 of the end 62. in the latter case, the contact pressure is preferably of the order of a few N / mm 2 .
  • the particles 4 are ordered in the transfer channel 56, in the transfer zone 14 and on the ramp 12, on which these particles are automatically ordered, without assistance, thanks in particular to their kinetic energy put to use at moment of impact on the forehead 54. Moreover, as shown on the figure 12 , in the transfer channel 56, the particles 4 and the liquid 16 do not extend beyond the lateral flanks 58, which ensures a subsequent deposition of quality.
  • the figure 13 shows the state of the installation after the triggering of the vertical movement of the substrate 38, initiated as soon as the front 54 has the required level, similar to that shown on the figure 5 .
  • the particles 4 are then deposited on the same substrate 38, to obtain a film 4 "of smaller width corresponding to the second width L2 of the end 62.
  • the injection of particles is stopped, and the level of carrier liquid is lowered so that the liquid is no longer in contact with the substrate.
  • the device 100 can then be dried before being removed from the installation, according to any means deemed appropriate by those skilled in the art, these means being of the conduction, convection, radiation, etc. type.
  • the installation 1 may comprise several accessory devices of the type just described, each dedicated to the deposition of one or more films of particles of determined width (s).
  • Figures 15 and 16 show an accessory device 100 according to an alternative embodiment, in which several channels 56 are provided, spaced from each other in the direction of the width, so as to deposit several films simultaneously.

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EP12733713.7A 2011-07-13 2012-07-10 Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement Not-in-force EP2731731B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1156430A FR2977810A1 (fr) 2011-07-13 2011-07-13 Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement
PCT/EP2012/063466 WO2013007719A1 (fr) 2011-07-13 2012-07-10 Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement

Publications (2)

Publication Number Publication Date
EP2731731A1 EP2731731A1 (fr) 2014-05-21
EP2731731B1 true EP2731731B1 (fr) 2015-09-16

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EP12733713.7A Not-in-force EP2731731B1 (fr) 2011-07-13 2012-07-10 Installation et procede pour le depot d'un film de particules ordonnees, de largeur reglable, sur un substrat en defilement

Country Status (6)

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US (1) US9751105B2 (ja)
EP (1) EP2731731B1 (ja)
JP (1) JP6427416B2 (ja)
KR (1) KR20140050008A (ja)
FR (1) FR2977810A1 (ja)
WO (1) WO2013007719A1 (ja)

Families Citing this family (10)

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Publication number Priority date Publication date Assignee Title
FR2985249B1 (fr) 2012-01-02 2014-03-07 Commissariat Energie Atomique Procede de transfert d'objets sur un substrat a l'aide d'un film compact de particules
FR2986720B1 (fr) * 2012-02-10 2014-03-28 Commissariat Energie Atomique Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide
FR2986722B1 (fr) 2012-02-10 2014-03-28 Commissariat Energie Atomique Procede de transfert d'objets sur un substrat a l'aide d'un film compact de particules, avec une etape de realisation de connecteurs sur les objets
FR2986721B1 (fr) * 2012-02-10 2014-06-27 Commissariat Energie Atomique Procede de depot d'un film de particules sur un substrat via un convoyeur liquide, comprenant une etape de structuration du film sur le substrat
FR2995228B1 (fr) 2012-09-10 2014-09-05 Commissariat Energie Atomique Procede de formation d'un film de particules sur liquide porteur, avec deplacement d'une rampe inclinee de compression des particules
FR3005432B1 (fr) 2013-05-13 2015-06-05 Commissariat Energie Atomique Procede de depot d'un film compact de particules sur la surface interieure d'une piece presentant un creux delimite par cette surface interieure
FR3006111B1 (fr) 2013-05-24 2016-11-25 Commissariat Energie Atomique Dispositif de conversion d'energie thermique en energie electrique a molecules thermo-sensibles
FR3011752B1 (fr) * 2013-10-11 2015-12-25 Commissariat Energie Atomique Installation et procede a rendement ameliore de formation d'un film compact de particules a la surface d'un liquide porteur
FR3011751B1 (fr) 2013-10-11 2015-12-25 Commissariat Energie Atomique Installation et procede a rendement ameliore de formation d'un film compact de particules a la surface d'un liquide porteur
FR3027449B1 (fr) 2014-10-21 2017-10-20 Commissariat Energie Atomique Procede ameliore de realisation d'interconnexions pour circuit integre 3d

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FR2971956B1 (fr) 2011-02-24 2013-03-29 Commissariat Energie Atomique Installation et procede pour le depot d'un film de particules ordonnees sur un substrat en defilement

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JP2014524834A (ja) 2014-09-25
WO2013007719A1 (fr) 2013-01-17
EP2731731A1 (fr) 2014-05-21
US20140147583A1 (en) 2014-05-29
FR2977810A1 (fr) 2013-01-18
JP6427416B2 (ja) 2018-11-21
US9751105B2 (en) 2017-09-05
KR20140050008A (ko) 2014-04-28

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