EP2671271A1 - Photovoltaisches element - Google Patents
Photovoltaisches elementInfo
- Publication number
- EP2671271A1 EP2671271A1 EP12741941.4A EP12741941A EP2671271A1 EP 2671271 A1 EP2671271 A1 EP 2671271A1 EP 12741941 A EP12741941 A EP 12741941A EP 2671271 A1 EP2671271 A1 EP 2671271A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- organic
- silver
- photovoltaic element
- group
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 157
- 229910052709 silver Inorganic materials 0.000 claims abstract description 83
- 239000004332 silver Substances 0.000 claims abstract description 83
- 239000007787 solid Substances 0.000 claims abstract description 79
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 76
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 76
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 95
- 239000011159 matrix material Substances 0.000 claims description 52
- 238000000034 method Methods 0.000 claims description 52
- 150000001875 compounds Chemical class 0.000 claims description 48
- -1 alkyl radical Chemical class 0.000 claims description 47
- 125000003118 aryl group Chemical group 0.000 claims description 46
- 239000007791 liquid phase Substances 0.000 claims description 33
- 125000001153 fluoro group Chemical group F* 0.000 claims description 29
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 28
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical class [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 27
- 239000012298 atmosphere Substances 0.000 claims description 23
- 150000003839 salts Chemical class 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 21
- 125000001072 heteroaryl group Chemical group 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 18
- 125000001424 substituent group Chemical group 0.000 claims description 18
- 150000001450 anions Chemical class 0.000 claims description 16
- 239000011368 organic material Substances 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 238000005538 encapsulation Methods 0.000 claims description 15
- 150000003413 spiro compounds Chemical class 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 14
- 150000007524 organic acids Chemical class 0.000 claims description 14
- 150000003949 imides Chemical class 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 12
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 10
- 150000007522 mineralic acids Chemical class 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 9
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 claims description 8
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 8
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical group OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 3
- 150000001449 anionic compounds Chemical class 0.000 claims description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 3
- 101710134784 Agnoprotein Proteins 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 107
- 239000000975 dye Substances 0.000 description 98
- 238000003786 synthesis reaction Methods 0.000 description 64
- 230000015572 biosynthetic process Effects 0.000 description 62
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 54
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 44
- 239000000758 substrate Substances 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 239000000243 solution Substances 0.000 description 31
- 239000000203 mixture Substances 0.000 description 30
- 239000002019 doping agent Substances 0.000 description 28
- 239000000463 material Substances 0.000 description 26
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 23
- 150000003254 radicals Chemical class 0.000 description 23
- 229910052760 oxygen Inorganic materials 0.000 description 22
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- 239000001301 oxygen Substances 0.000 description 20
- 239000011541 reaction mixture Substances 0.000 description 19
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 18
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 18
- 239000004020 conductor Substances 0.000 description 17
- 239000000047 product Substances 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000000872 buffer Substances 0.000 description 13
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000004440 column chromatography Methods 0.000 description 12
- 239000003480 eluent Substances 0.000 description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 230000037230 mobility Effects 0.000 description 11
- 239000004408 titanium dioxide Substances 0.000 description 11
- 239000003792 electrolyte Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 125000002619 bicyclic group Chemical group 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- HSYLTRBDKXZSGS-UHFFFAOYSA-N silver;bis(trifluoromethylsulfonyl)azanide Chemical compound [Ag+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F HSYLTRBDKXZSGS-UHFFFAOYSA-N 0.000 description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000002800 charge carrier Substances 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000004770 highest occupied molecular orbital Methods 0.000 description 7
- 239000012074 organic phase Substances 0.000 description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 7
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 6
- 150000005840 aryl radicals Chemical class 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000002950 monocyclic group Chemical group 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 238000002161 passivation Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- 230000006798 recombination Effects 0.000 description 6
- 238000005215 recombination Methods 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000003570 air Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 239000012043 crude product Substances 0.000 description 5
- 239000005457 ice water Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 238000006467 substitution reaction Methods 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- WYURNTSHIVDZCO-SVYQBANQSA-N oxolane-d8 Chemical compound [2H]C1([2H])OC([2H])([2H])C([2H])([2H])C1([2H])[2H] WYURNTSHIVDZCO-SVYQBANQSA-N 0.000 description 4
- 230000035515 penetration Effects 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- 238000010345 tape casting Methods 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- HQJQYILBCQPYBI-UHFFFAOYSA-N 1-bromo-4-(4-bromophenyl)benzene Chemical group C1=CC(Br)=CC=C1C1=CC=C(Br)C=C1 HQJQYILBCQPYBI-UHFFFAOYSA-N 0.000 description 3
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 3
- YSHMQTRICHYLGF-UHFFFAOYSA-N 4-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=NC=C1 YSHMQTRICHYLGF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000012327 Ruthenium complex Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000006887 Ullmann reaction Methods 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000001462 antimony Chemical class 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 3
- 125000004618 benzofuryl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 3
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 3
- 239000012876 carrier material Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006555 catalytic reaction Methods 0.000 description 3
- 238000012993 chemical processing Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 125000004987 dibenzofuryl group Chemical group C1(=CC=CC=2OC3=C(C21)C=CC=C3)* 0.000 description 3
- 125000005509 dibenzothiophenyl group Chemical group 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000011244 liquid electrolyte Substances 0.000 description 3
- 229910003002 lithium salt Inorganic materials 0.000 description 3
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 3
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 3
- ICPSWZFVWAPUKF-UHFFFAOYSA-N 1,1'-spirobi[fluorene] Chemical class C1=CC=C2C=C3C4(C=5C(C6=CC=CC=C6C=5)=CC=C4)C=CC=C3C2=C1 ICPSWZFVWAPUKF-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- MBHPOBSZPYEADG-UHFFFAOYSA-N 2-bromo-9,9-dimethylfluorene Chemical compound C1=C(Br)C=C2C(C)(C)C3=CC=CC=C3C2=C1 MBHPOBSZPYEADG-UHFFFAOYSA-N 0.000 description 2
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 2
- MVDKKZZVTWHVMC-UHFFFAOYSA-N 2-hexadecylpropanedioic acid Chemical compound CCCCCCCCCCCCCCCCC(C(O)=O)C(O)=O MVDKKZZVTWHVMC-UHFFFAOYSA-N 0.000 description 2
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000003682 3-furyl group Chemical group O1C([H])=C([*])C([H])=C1[H] 0.000 description 2
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 2
- 125000001541 3-thienyl group Chemical group S1C([H])=C([*])C([H])=C1[H] 0.000 description 2
- ZRXVCYGHAUGABY-UHFFFAOYSA-N 4-bromo-n,n-bis(4-bromophenyl)aniline Chemical compound C1=CC(Br)=CC=C1N(C=1C=CC(Br)=CC=1)C1=CC=C(Br)C=C1 ZRXVCYGHAUGABY-UHFFFAOYSA-N 0.000 description 2
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 2
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910013528 LiN(SO2 CF3)2 Inorganic materials 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 229920000144 PEDOT:PSS Polymers 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- PDZKZMQQDCHTNF-UHFFFAOYSA-M copper(1+);thiocyanate Chemical compound [Cu+].[S-]C#N PDZKZMQQDCHTNF-UHFFFAOYSA-M 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- QRUBYZBWAOOHSV-UHFFFAOYSA-M silver trifluoromethanesulfonate Chemical compound [Ag+].[O-]S(=O)(=O)C(F)(F)F QRUBYZBWAOOHSV-UHFFFAOYSA-M 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000004402 ultra-violet photoelectron spectroscopy Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G5/00—Compounds of silver
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
- C09B5/62—Cyclic imides or amidines of peri-dicarboxylic acids of the anthracene, benzanthrene, or perylene series
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/008—Triarylamine dyes containing no other chromophores
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/30—Doping active layers, e.g. electron transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/626—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing more than one polycyclic condensed aromatic rings, e.g. bis-anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/633—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the invention relates to a photovoltaic element, to a method for producing a solid organic p-type semiconductor for use in an organic component, and to a method for producing a photovoltaic element.
- photovoltaic elements and methods are used to convert electromagnetic radiation, in particular sunlight, into electrical energy; in particular, the invention can be applied to so-called dye-sensitized solar cells.
- the direct conversion of solar energy into electrical energy in solar cells is usually based on the so-called "internal photoelectric effect" of a semiconductor material, ie the generation of electron-hole pairs by absorption of photons and the separation of the negative and positive charge carriers at a pn junction In this way, a photovoltage is generated, which can cause a photocurrent in an external circuit, through which the solar cell gives off its power.
- the semiconductor which is larger than its band gap, so the size of the semiconductor band gap usually determines the proportion of sunlight, which can be converted into electrical energy.
- Dye solar cells of which there are now several variants, usually have two electrodes, of which at least one is transparent.
- the two electrodes are referred to according to their function as “working electrode” ⁇ also “anode", generation of electrons) and “counter electrode” (also called “cathode”).
- an n-conducting metal oxide is applied to the working electrode or in the vicinity of it, in particular as a porous, for example nanoporous, layer, for example a nanoporose layer of titanium dioxide (T1O2) about 10 to 20 ⁇ m thick.
- at least one so-called blocking layer may be provided between the layer of the n-type metal oxide and the working electrode, for example a dense layer of a metal oxide, for example T1O2.
- the n-type metal oxide is usually mixed with a light-sensitive dye.
- a monolayer of a light-sensitive dye for example, a ruthenium complex
- a monolayer of a light-sensitive dye for example, a ruthenium complex
- On or at the counter electrode is often a few pm thick catalytic layer, such as platinum.
- the area between the two electrodes is in the conventional dye solar cell usually with a redox electrolyte, such as a solution of iodine () and / or potassium iodide (Kl), filled.
- the function of the dye solar cell based on the fact that light is absorbed by the dye. From the excited dye, electrons are transferred to the n-type semiconducting metal oxide semiconductor and migrate therefrom to the anode, whereas the electrolyte provides for charge balance across the cathode.
- the n-halbieitende metal oxide, the dye and the electrolyte are therefore the essential components of Farbstoffsolarzelie.
- liquid electrolyte dye-sensitized cell often suffers from a non-optimal seal, which can lead to stability problems.
- the liquid redox electrolyte can in particular be replaced by a solid p-type semiconductor.
- Such solid dye solar cells are also referred to as sDSC (solid DSC).
- sDSC solid DSC
- the efficiency of the solid variant of the dye-sensitized solar cell is currently about 4.6-4.7% (Snaith, H., Angew Chem. Int. Ed., 2005, 44, 6413-64 7).
- inorganic p-type semiconductors such as Cul, CuBr-3 (S (C 4 Hg) 2) or CuSCN have heretofore been used in solid dye solar lines instead of the redox electrolyte.
- findings of photosynthesis can also be used.
- Cu (I) enzyme plastocyanin which in the photosystem l the oxidized chlorophyll dimer again reduced.
- Such p-type semiconductors can be processed by at least three different methods, namely: from a solution, by electrodeposition or by laser deposition. Organic polymers have also been used as solid p-type semiconductors.
- polypyrrole examples include polypyrrole, poly (3,4-ethylenedioxythiophene), carbazole-based polymers, polyaniline, poly (4-undecyl-2,2'-bithiophene), poly (3-octylthiophene), poly (triphenyldiamine) and poly (N vinylcarbazole).
- the efficiencies reach up to 2% in the case of poly (N-vinylcarbazole).
- An in-situ polymerized PEDOT poly (3,4-ethylenedioxythiophene) has also shown an efficiency of 0.53%
- the polymers described here are typically not used in their pure form but with additives.
- Inorganic-organic mixed systems have also been used instead of the redox electrolyte in dye solar cells.
- Cul was used together with PEDOT: PSS as a hole conductor in sDSC (Zhang J. Photochem: Photobio., 2007, 189, 329).
- low molecular weight organic p-type semiconductors ie non-polymerized, for example monomeric or else oligomeric, organic p-type semiconductors.
- the first use of a low-molecular-weight p-type semiconductor in solid dye-dye solar cells replaced the liquid electrolyte with a vapor-deposited layer of triphenyiamine (TPD).
- TPD triphenyiamine
- IPCE photocon to current conversion efficiency
- the efficiency could be increased to 2.56%, with the voltage at open circuit (V oc ) about 910 mV and the short-circuit current Isc about 5 mA at a active area of about 1.07 cm 2 (see Krüger et al., Appl. Phys. Lett., 2001, 79, 2085). Dyes which have better coverage of the TiO 2 layer and which have good wetting on spiro-MeOTAD show efficiencies of over 4%. Even better efficiencies (about 4.6%) were reported when the ruthenium complex was equipped with oxyethylene side chains. In Schmidt, Mende et al., Adv. Mater. 17, p.
- an indoline dye is proposed for dye-containing solar cells with spirobifluorenes as the amorphous organic p-conductor. beat.
- This organic dye which has a four-fold higher extinction coefficient than a ruthenium complex, shows high efficiency (4.1% for a sun) in solid dye-sensitizer cells.
- a concept was presented in which polymeric p-type semiconductors are bonded directly to a Ru dye (Peter, K., Appl., Phys. A 2004, 79, 65). In Durrant et al., Adv. Unc. Mater.
- a disadvantage of the dye-like solar cell is that the amount of light that can be used by the dye is usually limited by the energetic distance between the Fermi energies of the n- and p-type conductors used. The photovoltage is usually limited by this distance.
- dye solar cells usually have to be made comparatively thin due to the required charge transport (for example 1 to 2.5 micrometers), so that the utilization of the incident light is generally not optimal.
- e 1.6022 ⁇ 10 9
- C denotes the elementary charge of an electron or hole
- ⁇ denotes the charge carrier mobility
- N denotes the charge density, in this case the holes.
- the conductivity of a p-type material increases with the addition of additional holes, ie with p-doping.
- the fill factor in photovoltaics is usually the quotient of the maximum power of a solar cell at the point of maximum power and the product of the open circuit voltage and the short-circuit current.
- the filling factor can often be described as the area ratio of a maximum rectangle inscribed under the current-voltage curve to a minimal rectangle enclosing the curve.
- the fill factor is unitless.
- a low fill factor usually indicates that some of the power generated is lost at the line's internal resistance.
- the comparatively low filling factors can therefore be explained in particular by the high specific resistance of the spiro-MeOTAD, as also described, for example, in F, Fabregat-Santiago et al., J. Am. Chem. Soc., 2009, 131 (2), 558-562, especially at 1 sun light.
- an amount of dopant greater than 1 mole% is needed to enhance the charge mobility of an amorphous p-type conductor.
- organic p-type dopants such as F4-TCNQ (tetrafluoro-tetracyanoquinodimethanes) have been used with p-type organic polymers (see, eg, R. Friend et al, Adv. Mater., 2008, 20, 3319-3324, Zhang et ai, Adv.Funct., Mater., 2009, 19, 1901-1905).
- a so-called protonic doping of polythiophene by alkylsilanes has also been reported (see Podzorov et al., Advanced Functional Materials 2009, 19, 1906-191 1).
- devices with organic dopants have in many cases comparatively short lifetimes.
- metal oxides as dopants is also known from the prior art, for example from DE 10 2007 024 153 A1 or from DE 10 2007 023 876 A.
- Metaxoxides are vapor-deposited in organic layers and serve there as dopants.
- phenantroline derivatives are called as complex-forming matrix mate- rial, which are doped, for example, with rhenium oxides.
- Mo (tfd) 3 molybdenum dithioline (Mo (tfd) 3) in a concentration of 0-3.8 mol% can dope different Lochieiter.
- UPS experiments UV photoelectron spectroscopy
- inverted polymer cells in which holes from the p-type polymer in the cathode (in this case, usually Ag) to migrate, a VOx layer was vapor-deposited between the polymer and the silver, resulting in an improvement of the properties led the cell.
- metal oxide buffer layers from an aqueous solution is also known.
- vol. 94 described that MoO 3 layers were successfully used as a buffer layer on the anode in polymer solar cells. Such layers have also been used as part of a charge recombination layer in so-called organic tandem solar cells (see, for example, Kowalsky et al., Adv. Func. Mater., 2010, 20, 1762-1766).
- a dye solar cell which is stable even in an encapsulated state and which has a high quantum efficiency and a high fill factor would nevertheless be desirable, which is nevertheless easy to produce. Disclosure of the invention
- a photovoltaic element for converting electromagnetic radiation into electrical energy in particular a dye-sensitized solar cell.
- the photovoltaic element comprises at least one first electrode, at least one n-type semiconducting metal oxide, at least one electromagnetic radiation absorbing dye, at least one solid organic p-type semiconductor and at least one second electrode, preferably (but not necessarily) in the illustrated order or one reverse order, wherein the p-type semiconductor has silver in oxidized form.
- the p-type semiconductor may in particular be preparable or produced by applying at least one p-type organic material (128) and silver in oxidized form to at least one support element, the silver in oxidized form preferably being in the form of at least one silver (I).
- a m - is the anion of an organic or inorganic acid
- m is an integer in the range of 1 to 3, preferably wherein m is 1.
- [A m -] may in particular be an anion of an organic acid, preferably wherein the organic acid has at least one fluoro group -F or cyano group (-CN).
- [A m ] particularly preferably has a structure of the formula (II)
- R a is a fluoro group -F or a, at least with a fluoro group or cyano group (-CN) substituted alkyl radical, cycloalkyl radical, aryl radical or heteroaryl radical, and wherein X is -O- or -N " -R b , and wherein R b a fluoro group -F or a cyano group and wherein R b further comprises a group of the formula -S (0) 2 -.
- -CN fluoro group or cyano group
- R a may be selected from the group consisting of -F, -CF 3 , -CF 2 -CF 3 and -CH 2 -CN.
- X may in particular be " -R b , and R b may in particular be selected from the group consisting of -S (O) 2-F, -S (O) 2 -CF 3 , -S (O) 2 -CF 2 -CF 3 and -S (0) 2 -CH 2 -CN.
- [A m ] may in particular be selected from the group consisting of:
- [A TM -] bis (trifluoromethylsulfonyl) imide TMSI
- [A m -] is a trifluoroacetate group.
- [A m ] may in particular also be a NO 3 " group.
- the application can be done by any method.
- the application of the at least one organic material (128) and of silver in the context of the invention preferably takes place by deposition from a liquid phase.
- the p-type semiconductor is preferably preparable or produced by applying at least one p-type organic material (128) and at least silver, preferably of the at least one silver (l) salt [Ag + ] m [A m -], to at least one carrier element, the deposition being effected by deposition from a liquid phase comprising the at least one aligning organic material and the at least one silver (I) -Safz [Ag + ] m [A m -].
- the deposition can in turn be carried out in principle by any deposition process, for example by spin coating, doctor blading, printing or combinations of said and / or other deposition methods.
- the p-type semiconductor may in particular comprise at least one organic matrix material, wherein the anionic compound [A m -] and Ag + are mixed into the matrix material or contained in the matrix material, in particular dissolved.
- At least Ag + and preferably also the anionic compound [A m -] may be distributed substantially evenly, in particular in the matrix material.
- the matrix material may in particular comprise at least one low molecular weight organic p-type semiconductor.
- the low molecular weight organic p-type semiconductor may in particular comprise at least one spiro compound.
- the low molecular weight organic p-type semiconductor may in particular be selected from: a spiro compound, in particular spiro-MeOTAD; a compound with the structural formula:
- A, A 2 , A 3 independently of one another, are optionally substituted, aryl groups or heteroaryl groups
- R 1 , R 2 , R 3 are independently selected from the group consisting of the substituents -R, -OR, -NR 2 , -A 4 -OR and -A -NR 2 , wherein R is selected from the group consisting of Alkyl, aryl and heteroryl, and wherein A 4 is an aryl group or heteroaryl group, and wherein n is independently 0, 1, 2 or 3 for each occurrence in formula I, with the proviso that the sum of the individual values n is at least 2 and at least two of the radicals R 1 , R 2 and R 3 are -OR and / or -NR 2 .
- a 2 and A 3 are the same, therefore the compound of formula (I) preferably has the following structure (Ia)
- the photovoltaic element may further comprise at least one encapsulation, wherein the encapsulation is arranged to shield the photovoltaic element, in particular the electrodes and / or the p-type semiconductor, from an ambient atmosphere.
- the p-type semiconductor is prepared or producible by applying at least one p-type organic material (128) and at least one silver (I) salt [Ag + ] m [A m -] on at least one support element as described above, wherein the deposition by deposition from a liquid phase, the at least one p-type organic material and the at least one Silver (l) salt [Ag + ] m [A m -], and wherein the liquid phase contains at least one silver (l) -Sa!
- a method for producing a solid organic p-type semiconductor for use in an organic component, in particular a photovoltaic element according to one or more of the above-described or yet to be described embodiments of a photovoltaic element according to the present invention.
- At least one p-type organic matrix material and at least silver in oxiderter form preferably at least one of silver (l) salt, [Ag +] m [A m i, is applied at least egg ner liquid phase at least one support element, wherein [A] - is the anion of an organic or inorganic acid, and wherein the compound [Ag + ] m ] A m -] is preferably AgNC> 3 or silver bts- (trifluoromethylsulfonyI) imide.
- the liquid phase may further comprise at least one solvent, in particular an organic solvent, in particular a solvent selected from the group consisting of cyclohexanone; Chlorobenzene; Benzofuran and cyclopentanone.
- solvent in particular an organic solvent, in particular a solvent selected from the group consisting of cyclohexanone; Chlorobenzene; Benzofuran and cyclopentanone.
- the method can be carried out at least partially in an oxygen-poor atmosphere, for example an atmosphere containing less than 500 ppm oxygen, in particular less than 100 ppm oxygen and more preferably less than 50 ppm or even less than 10 ppm oxygen.
- an atmosphere containing less than 500 ppm oxygen in particular less than 100 ppm oxygen and more preferably less than 50 ppm or even less than 10 ppm oxygen.
- a method for producing a photovoltaic element, in particular a photovoltaic element according to one or more of the above-described or yet to be described embodiments of a photovoltaic element according to the present invention.
- at least one first electrode, at least one n-type semiconducting metal oxide, at least one electromagnetic radiation absorbing dye, at least one solid organic p-type semiconductor and at least one second electrode will be provided, particularly (but not necessarily) in the order shown or a reverse order, wherein the p-type semiconductor is produced by a method according to one or more of the above-described or to be described embodiments of a method according to the invention for producing a solid organic p-type semiconductor.
- silver in oxidized form can be used to achieve efficient p-doping, in particular in dye-dye cells.
- a particularly efficient p-doping can be achieved in particular by the use of a silver (I) salt of the formula [Ag + ] m [A m -], where [A m ] is the anion of an organic or inorganic acid, and m is an integer in the range of 1 to 3.
- These silver (I) salts can be applied in particular in a liquid phase by means of one or more organic solvents, preferably together with a p-semiconducting matrix material and optionally one or more organic salts. In this way, photovoltaic elements with high filling factors and a high long-term stability can be achieved.
- a photovoltaic element for converting electromagnetic radiation into electrical energy may in particular comprise one or more photovoltaic cells.
- the photovoltaic element may in particular comprise at least one layer structure, which may be applied, for example, to a substrate.
- the photovoltaic element may in particular comprise at least one dye solar cell and / or be designed as a dye solar cell.
- the photovoltaic element has at least one first electrode, at least one n-semiconducting metal oxide, at least one dye which absorbs electromagnetic radiation, at least one solid organic p-type semiconductor and at least one second electrode. It is proposed that the p-type semiconductor contains silver in oxidized form.
- the photovoltaic element may comprise the at least one first electrode, the at least one n-type semiconducting metal oxide, the at least one electromagnetic radiation absorbing dye, the at least one solid organic p-type semiconductor and the at least one second electrode.
- the dye and the n-semiconducting metal oxide may also be combined in whole or in part, as is usual in dye-sensitized solar cells.
- the n-type semiconducting metal oxide may be wholly or partially impregnated with the at least one dye or otherwise mixed with this dye.
- the n-semiconducting metal oxide can be sensitized in particular with the dye, so that, for example, dye molecules can be applied as a monolayer to particles of the n-semiconducting metal oxide.
- the photovoltaic element may in particular at least one layer of the n-semiconducting metal oxide, optionally with the dye, as well as at least one layer of solid organic p-type semiconductor. This layer structure can be embedded between the electrodes.
- the photovoltaic element may comprise one or more further layers.
- one or more further layers can be introduced between the first electrode and the n-semiconducting metal oxide, for example one or more buffer layers, for example layers of a metal oxide.
- the buffer layer is preferably designed to be dense
- the n-semiconducting metal oxide may in particular be made porous and / or particulate.
- the n-semiconducting metal oxide as will be described in more detail below, can be configured as a nanoparticulate layer.
- one or more further layers may also be provided between the n-semiconducting metal oxide and the solid organic p-semiconductor, as well as optionally one or more further layers may be provided between the p-semiconductor and the second electrode.
- the p-type semiconductor may in particular be p-doped by the silver in oxidized form, preferably by the at least one silver (I) salt of the formula [Ag + ] m [A m ].
- the p-type properties of the p-type semiconductor are generated or amplified by the silver in oxidized form, preferably by the at least one silver (I) salt of the formula [Ag + ] m [A m -].
- the silver in oxidized form, in particular the at least one silver (I) salt of the formula [Ag + ] m [A m ] can be designed to dope the p-type semiconductor or a matrix material contained in this p-type semiconductor.
- the p-type semiconductor may comprise at least one organic matrix material, wherein the silver in oxidized form, preferably the at least one silver (I) salt of the formula [Ag + ] m [A m -], is mixed into the matrix material.
- the silver in oxidized form preferably the at least one silver (I) salt of the formula [Ag + ] m [A m -]
- the organic matrix material be applied to at least one carrier material.
- the present invention preferably relates to a photovoltaic element as described above, wherein the p-type semiconductor is producible or manufactured by applying at least one p-type organic material (128) and silver in oxidized form to at least one support element the silver in oxidized form is preferably applied in the form of at least one silver (I) salt [Ag + ] m [A m -] on at least one support element, where A m ⁇ is the anion of an organic or inorganic acid, and m is an integer is in the range of 1 to 3, preferably where m is 1.
- the matrix material and the silver can be applied together or in separate steps on the Sumatreial.
- the matrix material and the silver are applied together on the carrier material.
- co-applied or “co-applied” means that preferably a mixture G comprising both the matrix material is applied to the carrier material in at least one step, preferably in one step.
- mixture G is a liquid phase.
- liquid phase in this context means that mixture G is present at least partly as a liquid
- mixture G or preferably the liquid phase comprises at least one solvent in which silver and the at least one organic matrix material are dissolved and / or dispersed
- the application is preferably carried out by deposition from the liquid phase, the deposition in turn may in principle be carried out by any deposition process, for example by spin coating, knife coating, printing or combinations of the above and / or others deposition.
- the low-molecular-weight organic p-type nitrile may in particular have at least one low molecular weight organic p-type semiconductor.
- a low-molecular-weight material is generally understood as meaning a material which is present in monomeric, non-polymerized or non-oligomerized form.
- the term "low molecular weight” as used herein means that the semiconductor has molecular weights in the range of 100 to 25,000 g / mol
- the low molecular weight substances have molecular weights of 500 to 2000 g / mol
- p-semiconducting properties are understood to be the property of materials, in particular organic molecules, to form holes and to transport these holes In particular, a stable oxidation of these molecules should be possible
- said low molecular weight organic p-type semiconductors may in particular comprise an extended ⁇ -electron system
- the at least one low-molecular-weight p-type semiconductor may consist of a sol be processible.
- the low molecular weight p-type semiconductor may in particular comprise at least one triphenylamine. It is particularly preferred if the low molecular weight organic p-type semiconductor comprises at least one spiro compound.
- a spiro compound is to be understood as meaning polycyclic organic compounds whose rings are connected to only one atom, which is also referred to as spiro atom.
- the spiro atom can be sp 3 -hybridized, so that the components of the spiro compound that are in communication with one another via the spiro atom are arranged, for example, in different planes relative to one another.
- the spiro compound has a structure of the following formula: where the radicals aryl, aryl 2 , aryl 3 , aryl 4 , ary! 5 , aryl 6 , aryl 7 and aryl 8 are independently selected from substituted aryl radicals and heteroaryl radicals, in particular from substituted phenyl radicals, where the aryl radicals and heteroaryl radicals, preferably the phenyl radicals, independently of one another, are preferably each selected with one or more substituents from the group consisting of -O-alkyl, -OH, -F, -Cl, -Br and -I, wherein alkyl is preferably methyl, ethyl, propyl or isopropyl.
- the phenyl radicals are each substituted by one or more substituents selected from the group consisting of -O-Me, -OH, -F, -Cl, -Br and -I.
- the spiro compound is a compound of the following formula:
- R r , R s , R l , R u , R, R w , R x and R v are independently selected from the group consisting of -O-alkyl, -OH, -F, -Cl, -Br and -I where alkyl is preferably methyl, ethyl, propyl or isopropyl. Particularly preferred are R r , R s , R ', R u , R v , R w , R x and R y , independently selected from the group consisting of -O-Me, -OH, -F, - Cl, -Br and -I.
- the p-type semiconductor or the matrix material may comprise spiro-MeOTAD or consist of spiro-MeOTAD, ie a compound of the formula (III) which is commercially available, for example, from Merck KGaA, Darmstadt, Germany, Taiwan:
- the low molecular mass organic p-type semiconductor or the matrix material comprises one or more compounds of the abovementioned general formula I, wherein, for example, reference may be made to the subsequently published PCT application with the number PCT / EP2010 / 051826.
- the p-type semiconductor may contain the at least one compound of the above-mentioned general formula I additionally or alternatively to the above-described spiro compound.
- alkyl or "alkyl group” or “alkyl radical” as used in the context of the present invention is to be understood as meaning generally substituted or unsubstituted C 1 -C 20 -alkyl radicals, preference being given to C 1 -C 10 -alkyl radicals, particularly preferably C 1 -C 8 -alkyl radicals
- the alkyl radicals may be both unbranched and branched
- the alkyl radicals having one or more substituents may be selected from the group consisting of C 1 -C 20 -alkoxy, halogen, preferably -F, and C 6 -C 30 -alkyl radicals.
- Aryl which in turn may be substituted or unsubstituted, be substituted.
- suitable alkyl groups are methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl and octyl and also isopropyl, isobutyl, isopentyl, sec-butyl, tert-butyl, neopentyl, 3,3-dimethylbutyl, 2-ethylhexyl and C6- C30-aryl, C1-C20-alkoxy and / or halogen, in particular F, substituted derivatives of said alkyl groups, for example -CF3.
- aryl or “aryl group” or “aryl” as used in the present invention are optionally substituted, C6-C30 aryl radicals are to be understood that of monocyclic, bicyclic, tricyclic and multicyclic aromatic rings
- the aryl moiety contains 5- and / or 6-membered aromatic rings, unless they are monocyclic systems, the term aryl for the second ring also includes the saturated form (perhydroform or the partially unsaturated form (for example, the dihydroform or tetrahydroform), if the respective forms are known and stable.
- aryl for the purposes of the present invention also includes, for example, bicyclic or tricyclic radicals in which both both and all three radicals are aromatic, as are bicyclic or tricyclic radicals in which only e in ring is aromatic as well as tricyclic radicals wherein two rings are aromatic.
- aryl are phenyl, naphthyl, indanyl, 1, 2-dihydronaphthenyl, 1, 4-dihydronaphthenyl, fluorenyl, indenyl, anthracenyl, phenanthrenyl or 1, 2,3,4-tetrahydronaphthyl.
- C6-C10-aryl radicals for example phenyl or naphthyl, very particularly preferably C6-aryl radicals, for example phenyl.
- aryl also includes ring systems comprising at least two monocyclic, bicyclic or multicyclic aromatic rings linked together via single or double bonds. As an example his biphenyl groups called.
- heteroaryl or “heteroaryl group” or “heteroaryl” as used in the present invention are to be understood as meaning optionally substituted 5- and 6-membered aromatic rings as well as multicyclic rings, for example bicyclic or tricyclic compounds
- the heteroaryls in the invention preferably contain 5 to 30 ring atoms They may be monocyclic, bicyclic or tricyclic and may be derived in part from the abovementioned aryl in which at least one aryl skeleton is present in the aryl skeleton Preferred heteroatoms are N, O and S.
- the hetaryl radicals have 5 to 13 ring atoms, more preferably the backbone of the heteroaryl radicals is selected from systems such as pyridine and five-membered heteroaromatics such as thiophene, pyrrole, imidazole or Furan.These skeletons can be given lls be fused with one or two six-membered aromatic radicals.
- heteroaryl also includes ring systems comprising at least two monocyclic, bicyclic or multicyclic aromatic rings which are linked together via single or double bonds, wherein at least one ring contains a heteroatom.
- heteroaryl for at least one ring, the saturated form (perhydroform) or the partially unsaturated form (for example, the dihydroform or tetrahydroform), if the respective forms are known and stable, is possible .
- heteroaryl also includes, for example, bicyclic or tricyclic radicals in which both both and all three radicals are aromatic, as well as bicyclic or tricyclic radicals in which only one ring is aromatic, and tricyclic radicals in which two Rings are aromatic, wherein at least one of the rings, ie at least one aromatic or a non-aromatic ring having a heteroatom.
- Suitable fused heteroaromatics are, for example, carbazolyl, benzimidazolyl, benzofuryl, dibenzofuryl or dibenzothiophenyl.
- the backbone may be substituted at one, several or all substitutable positions, with suitable substituents being those already mentioned under the definition of Ce-cao-aryl.
- the hetaryl radicals are preferably unsubstituted.
- Suitable hetaryl radicals are, for example, pyridin-2-yl, pyridin-3-yl, pyridin-4-yl, thiophen-2-yl, thiophen-3-yl, pyrro-2-yl, pyrrol-3-yl, furan -2-yl, furan-3-yl and imidazol-2-yl and the corresponding benzanell faced radicals, in particular carbazolyl, benzimidazolyl, benzofuryl, dibenzofuryl or dibenzothiophenyl.
- alkyl radicals such as, for example, methyl, ethyl , Propyl, butyl, pentyl, hexyl, heptyl and octyl and isopropyl, isobutyl, isopentyl, sec-butyl, tert-butyl, neopentyl, 3,3-dimethylbutyl and 2-ethylhexyl
- aryl radicals such as C6-C10- Aryl radicals, in particular phenyl or naphthyl, very particularly preferably C 6 -aryl radicals, for example phenyl, and hetaryl radicals, for example pyridin-2-yl, pyr
- the degree of substitution can vary from simple substitution to the maximum number of possible substituents.
- Preferred compounds of the formula I to be used according to the invention are characterized in that at least two of the radicals R, R 2 and R 3 are para-substituted -OR and / or NR 2 substituents. In this case, it may be at least two residues either only to -OR radicals, only -NR2 radicals or at least one -OR and at least one - act NR2 radical.
- Particularly preferred compounds of the formula I to be used according to the invention are characterized in that at least four of the radicals R, R 2 and R 3 are para-substituted -OR and / or -NR 2 substituents.
- the at least four radicals may be either only -OR radicals, only -NR 2 radicals or a mixture of -OR and -NR 2 radicals.
- Very particularly preferred compounds of the formula I to be used according to the invention are distinguished by the fact that all radicals R 1 , R 2 and R 3 are para-substituted -OR and / or -NR 2 substituents. These may be either only -OR radicals, only -NR 2 radicals or a mixture of -OR and -NR 2 radicals. In all cases, the two Rs in the -NR2 groups may be different from each other, but they are preferably the same.
- a 1 , A 2 and A 3 are independently selected from the group consisting of
- n is an integer value from 1 to 18,
- R 4 is preferably an aryl radical, more preferably a phenyl radical
- R 5 , R 6 independently of one another are H, alkyl, aryl or heteroaryl, wherein the aromatic and heteroaromatic rings of the structures shown may optionally be further substituted.
- the degree of substitution of the aromatic and heteroaromatic rings can vary from simple substitution to the maximum number of possible substituents.
- Preferred substituents in the case of a further substitution of the aromatic and heteroaromatic rings are the substituents already mentioned above for the one, two or three optionally substituted aromatic or heteroaromatic groups.
- the aromatic and heteroaromatic rings of the structures shown are not further substituted.
- A, A 2 and A 3 independently of one another, further
- the matrix material is ID322, ie
- the compounds to be used according to the invention can be prepared by customary methods of organic synthesis known to those skilled in the art. References to relevant (patent) references are also found in the Synthesis Examples below.
- At least one of the electrodes can be made transparent.
- the first electrode may be designed as a working electrode and the second electrode as a counter electrode or vice versa.
- the photovoltaic element may comprise at least one layer structure applied to a substrate, the layer structure comprising the first electrode, the n-semiconductive metal oxide, the dye, the fixed layer.
- the organic p-type semiconductor may include with the metal oxide and the at least one second electrode in the order named or in reverse order.
- the n-semiconducting metal oxide can be made porous, wherein between the n-semiconductive metal oxide and the first electrode, in particular, at least one buffer layer of a metal oxide can be introduced.
- This buffer layer can be used, for example, as a dense layer, i. as a non-particulate layer.
- this buffer layer can be applied by means of a PVD method, for example a vapor deposition method and / or a sputtering method.
- other methods can also be used, for example CVD methods and / or spray pyrolysis methods.
- the n-semi-conducting metal oxide is preferably applied by means of a paste process, for example by printing, spin-coating or knife-coating a paste of an n-semiconductive metal oxide.
- This paste can then be sintered by at least one temperature treatment step, for example by heating to above 200 ° C, in particular to above 400 ° C, for example 450 ° C.
- volatile constituents of the paste can be removed, so that preferably only the n-semiconductive metal oxide particles remain.
- the dye may be applied to the n-type semiconductive metal oxide in particular.
- This application is preferably carried out in such a way that the dye completely or partially penetrates an n-semiconducting metal oxide layer, for example a particulate layer, in order to sensitize the particles of the n-semiconductive metal oxide, for example by forming one or more layers of the dye on these particles be, for example, monomolecular layers.
- the application of the dye may, for example, be effected by means of at least one impregnation process, for example by immersing a sample comprising the n-type semiconducting metal oxide layer in a solution of the dye. Other impregnation methods can also be used.
- the photovoltaic element may in particular comprise at least one Verkapseiung.
- the silver in oxidized form for example the at least one silver (l) salt [Ag + ] m [ A m -] and particularly preferably the silver bis (trifluoromethylsulfonyl) imide, doped p-Halibleiter exist even without such an oxygen atmosphere for a long time.
- a Verkapseiung can be applied, which shields the photovoltaic element, in particular the electrodes and / or the p-type semiconductor, against an ambient atmosphere.
- the encapsulation can comprise, for example, an encapsulation by a solid capsule element, for example a plane or at least one well equipped capsule, which is applied for example to the layer structure that this completely or partially surrounds the layer structure.
- an edge of the encapsulation may completely or partially enclose the layer structure and may be connected to the substrate, for example, by a bond and / or another connection, preferably a material connection.
- the encapsulation may also comprise one or more layers of a material which prevents the penetration of harmful environmental influences, for example moisture and / or oxygen.
- organic and / or inorganic coatings can be applied to the layer structure.
- a shield from the ambient atmosphere can generally be understood to mean a slowing down of the penetration of gases and / or moisture from the ambient atmosphere into the layer structure. The slowing down can, for example, take place in such a way that concentration differences within and outside the encapsulation are only compensated within several hours, preferably several days, in particular even several weeks, months up to years.
- the dye-sensitized solar cell may further comprise, in particular, at least one passivation material between the n-semiconductive metal oxide and the p-type semiconductor.
- this passivation material may be configured to at least partially prevent electron transfer between the n-type semiconducting metal oxide and the p-type semiconductor.
- the passivation material may in particular be selected from: ⁇ ! 2 ⁇ 3 ⁇ a silane, in particular CH3SiCl3; an organometallic complex, in particular an Al 3+ complex, a 4-tert-butylpyridine; Hexadecylmalonic.
- This organic component may in particular be a photovoltaic element, for example a photovoltaic element in one or more of the embodiments described above, in particular a dye-sensitized line.
- a photovoltaic element for example a photovoltaic element in one or more of the embodiments described above, in particular a dye-sensitized line.
- other embodiments of the organic component are also possible in principle, including the intended use in organic light-emitting diodes, organic transistors, as well as other types of photovoltaic elements, for example organic solar cells.
- At least one p-type organic matrix material for example a matrix material of the type described above, and at least silver in oxidized form, preferably at least one silver (i) salt of the formula [Ag + ] m [A m "
- a p-type organic matrix material is understood to mean an organic material which can preferably be applied from the solution and which is capable of positive charges These positive charges may already be present in the matrix material and may only be increased by the p-doping or may be generated by the p-doping by means of the silver in oxidized form, in particular the matrix material may be stable and reversibly oxidizable and be set up to positive charges ("holes") to other molecules, for example wise adjacent molecules of the same kind to pass.
- the effect of the silver salt is based only on observed effects of an increase in p-conductivity. Accordingly, for example, a carrier density and / or a mobility of positive charges in the p-type semiconductor can be increased by adding the silver in oxidized form.
- the invention is not limited to the p-doping in a microscopic manner.
- the at least one organic matrix material and the silver in oxidized form, in particular the at least one silver (I) salt of the formula [Ag + ] m [A m as p-dopant, are preferably applied together from at least one liquid phase to the at least one carrier element , as described above.
- a carrier element can be understood to be a pure substrate, for example a glass and / or plastic and / or laminate substrate.
- the carrier element may also comprise further elements, for example one or more electrodes and / or one or more layers, which may already be applied to the substrate.
- the application of the p-type semiconductor from the liquid phase can take place to an already partially or completely finished layer structure, wherein, for example, one or more layers can already be applied to a substrate, whereupon at least one layer of the p-type semiconductor is applied.
- the at least one first electrode, the at least one n-type semiconducting metal oxide and preferably the dye applied before applied from the at least one liquid phase of the p-type semiconductor becomes.
- the application of a liquid phase may generally include, for example, a wet-chemical processing, for example spin-coating, knife coating, pouring, printing or similar wet-chemical processes or combinations of named and / or other procedures.
- a wet-chemical processing for example spin-coating, knife coating, pouring, printing or similar wet-chemical processes or combinations of named and / or other procedures.
- printing processes such as inkjet printing, screen printing, offset printing or the like can be used.
- drying of the p-type semiconductor can take place, for example in order to remove volatile constituents such as solvent of the liquid phase. This drying can be carried out, for example, under the influence of temperature, for example at temperatures of 30 ° C to 150 ° C.
- other embodiments are possible in principle.
- the matrix material may comprise at least one low molecular weight organic p-type semiconductor, for example as matrix material.
- the organic p-type semiconductors described above may be used.
- the low molecular weight organic p-type semiconductor may comprise at least one triphenylamine.
- the low molecular weight organic p-type semiconductor may in particular comprise at least one spiro compound, for example one or more of the spiro compounds described above.
- the liquid phase may furthermore comprise one or more additional components which have different uses can have.
- spiro compounds for example spiro-MeOTAD
- the liquid phase may accordingly further comprise, for example, at least one metal salt.
- this may be a metailorganisches salt.
- lithium salts can be used, for example organometallic lithium salts, preferably LiN (SO 2 CF 3) 2.
- the at least one liquid phase may, as described above, in particular comprise at least one solvent.
- solvent is used in the context of the present invention regardless of whether all, several or individual of the components contained in the liquid phase are actually present in dissolved form or if they are present in another form, for example as a suspension, dispersion, emulsion or in others Shape.
- the silver in oxidized form for example the at least one silver (I) salt and particularly preferably the silver bis (trifluoromethylsulfony!) imide, in dissolved form.
- the at least one matrix material may be dissolved or dispersed.
- the silver in oxidized form for example the at least one silver (I) salt [Ag + ] m [A m ] and particularly preferably the Si!
- Ber-bis (trifluoromethylsulfonyl) imide can be present in particular dissolved, but can also be present basically in a different form, for example, dispersed and / or suspended.
- Particularly preferred is the use of at least one organic solvent.
- one or more of the following solvents may be used: cyclohexanone; Chiorobenzol; benzofuran; Cyclopentanone.
- the proposed method for producing a solid organic p-type semiconductor may be used in particular for producing the above-described photovoltaic element in one or more of the described embodiments.
- other organic components can be produced by means of the method.
- a combination with other known methods is also conceivable, so that, for example, if several organic p-type semiconductors are provided, one or more of these p-type semiconductors can be produced by means of the proposed method according to the invention, and one or more of the conventional p-type semiconductors other procedures.
- an organic component is generally understood to mean a component which has one or more organic elements, for example one or more organic layers.
- organic components for example components in which the layer structure-if appropriate with the exception of the electrodes-comprises only organic layers.
- hybrid components for example components which comprise one or more inorganic layers in addition to one or more organic layers.
- one, several or all of the process steps for producing the organic device may be performed in an oxygen-poor atmosphere.
- the process step of producing the solid organic p-type semiconductor may be carried out in the low-oxygen atmosphere, in contrast to the known processes described above.
- the application of the liquid phase to the carrier element in the low-oxygen atmosphere can thus be carried out.
- Under an oxygen-poor atmosphere is generally an atmosphere to understand, which has a reduced Sauerstoffanteii compared to the ambient air.
- the low-oxygen atmosphere may have an oxygen content of less than 1000 ppm, preferably less than 500 ppm, and more preferably less than 100 ppm, for example 50 ppm or less.
- a further processing of the organic component, for example, the Dye solar cell be carried out under such an oxygen-poor atmosphere.
- the oxygen-poor atmosphere can not be interrupted until after the encapsulation. Complete processing of the entire component in the low-oxygen atmosphere is also possible without adversely affecting the electrical properties of the component.
- an oxygen-poor atmosphere in the form of an inert gas for example a nitrogen atmosphere and / or an argon atmosphere. Mixed gases can also be used.
- a method of manufacturing a photovoltaic element is proposed.
- This may in particular be a photovoltaic element according to one or more of the embodiments described above, for example a Farbstoffsoiarzelle.
- the proposed method for producing the photovoltaic element can be carried out in particular using the method described above for producing a solid organic p-type semiconductor, wherein the method for producing the solid organic p-type semiconductor is one or more times in the proposed method for producing the photovoltaic Elements can be used.
- a use of other methods is possible in principle.
- the proposed method preferably has the procedural steps described below, which can preferably, but not necessarily, be carried out in the order shown. Individual or several method steps are also overlapping in time and / or parallel feasible. Furthermore, the implementation of additional, not described process steps is possible.
- the proposed method provides at least one first electrode, at least one n-semiconducting etalloxide, at least one dye which absorbs electromagnetic radiation, at least one solid organic p-type semiconductor and at least one second electrode.
- This provision can be made, for example, in the order mentioned.
- the provision can be effected by producing a layer structure, for example as described above. This layer structure can be constructed, for example, successively on one or more substrates.
- one or more of the mentioned elements can also be combined to form a common layer, for example the n-semiconductive metal oxide and the dye.
- the p-type semiconductor is designed such that this silver in oxidized form, for example the at least one silver (I) salt [Ag + ] m [A m -] and particularly preferably the silver bis ( trifluoromethylsulfonyl) imide.
- the p-type semiconductor may comprise at least one organic matrix material which is oxidized by the silver, for example the at least one silver (I) salt [Ag + ] m [A m -] and more preferably the silver bis (trifluoromethylsulfonyl ) imid doped.
- the organic matrix material and / or the silver in oxidized form for example of the at least one silver (I) salt [Ag + ] m [A m -] and particularly preferably the silver bis (trifluoromethylsulfonyl) imide, can the above and below description are referenced.
- the p-type semi-conductor can be produced by a method in which wet-chemical processing is used, for example, according to the above description of the method for producing the solid organic p-type semiconductor.
- At least one p-type organic matrix material and the silver in oxidized form for example the at least one silver (l) salt [Ag + ] m [A m -] and particularly preferably the silver bis (trifluoromethylsulfonyl) imid, applied as p-type dopant from at least one liquid phase together on at least one carrier element.
- the at least one silver (l) salt [Ag + ] m [A m -] and particularly preferably the silver bis (trifluoromethylsulfonyl) imid applied as p-type dopant from at least one liquid phase together on at least one carrier element.
- the photovoltaic element may in particular comprise a layer structure, which may be applied, for example, to a substrate.
- the first electrode or the second electrode can be assigned to the substrate.
- At least one of the electrodes should be made transparent.
- a "transparent" electrode is to be understood in particular as meaning that within the visible spectral range and / or in the region of the solar spectrum (about 300 nm to 2000 nm) there is a transmission of at least 50%, preferably of at least 80%. If the substrate is designed as a transparent substrate, in particular the electrode assigning the substrate should be made transparent.
- the substrate may be or include, for example, a glass substrate and / or a plastic substrate.
- other materials including a combination of different materials, are in principle applicable, for example laminates.
- the constituents of the photovoltaic element can be applied as layers directly or indirectly to the substrate.
- the terms of a carrier element, a carrier and a substrate are used at least largely synonymously. If a carrier element is mentioned, this rather emphasizes the possibility that a layer is applied indirectly to the substrate, so that there is a difference between the layer to be applied and the actual substrate at least one further element, in particular at least one further layer can be located. However, a direct application is possible.
- the photovoltaic element can in particular be designed as a dye solar cell. Accordingly, in the following, the photovoltaic element is also generally referred to as a "cell", without being restricted to a specific layer structure
- a cell may in particular comprise the at least one first electrode, the n-type metal oxide, the dye, the p-type semiconductor and The n-type metal oxide, the dye, and the p-type semiconductor may also be referred to as functional layers which may be embedded between the electrodes
- the cell may comprise one or more further layers, for example also attributable to the functional layers
- One or more cells may be directly or indirectly applied to a substrate
- the photovoltaic element may in particular comprise one or more cells, in particular a single-celled structure or else a multicellular structure, for example a tandem-cell structure with several parallel ones and/ or one above the other on the substrate arranged cells.
- the photovoltaic element according to the present invention may be configured in one or more of the following ways.
- the embodiments of the elements of the photovoltaic element can also be combined in virtually any desired manner.
- the n-type semiconductor of the dye solar cell As the n-type semiconductor of the dye solar cell, a single metal oxide or a mixture of various oxides may be used. It is also possible to use mixed oxides.
- the n-semiconducting metal oxide may be porous and / or be used as a nanoparticulate oxide, nanoparticles in this context meaning particles having an average particle size of less than 0.1 micrometers.
- a nanoparticulate oxide is usually applied to a conductive substrate (i.e., a substrate having a conductive layer as a first electrode) by a sintering process as a high surface area, thin porous film.
- the substrate may be rigid or flexible.
- plastic substrates or foils and, in particular, glass plates or glass foils are suitable as substrate (hereinafter also referred to as carrier).
- Suitable electrode materials in particular for the first electrode according to the preferred structure described above, are in particular conductive materials such as transparent conductive oxides (TCOs), for example doped with fluorine and / or indium.
- TCOs transparent conductive oxides
- Tin oxide FTO or (TO) and / or aluminum-doped zinc oxide (AZO), carbon nanotubes or metal films
- AZO aluminum-doped zinc oxide
- thin metal films that still have sufficient transparency could be used Since the structure proposed usually requires only a single substrate, it is also possible to construct flexible cells, which makes it possible to use a large number of applications which would not be feasible or would be difficult to achieve with rigid substrates, such as For example, the use in bank cards, garments, etc.
- the first electrode, in particular the TCO layer may additionally be coated or coated with a (for example 10 to 200 nm thick) solid metal oxide buffer layer to direct contact of the p-type semiconductor with the TCO layer (see Peng et al., Coord. Chem. Rev.
- metal oxides are generally inexpensive solid semiconductor materials (n-type semiconductors), but their absorption due to large band gaps is usually not in the visible range of the electromagnetic spectrum but mostly in the ultraviolet spectral range.
- the metal oxides therefore generally have to be combined with a dye as photosensitizer, as is the case with the dye-cell solar cells, which absorbs in the wavelength range of sunlight, ie at from 300 to 2000 nm, and in the electronically excited state electrons injected into the conduction band of the semiconductor.
- the metal oxides can be used in the form of nanocrystalline porous layers. These layers have a large surface, which is coated with the dye as a sensitizer, so that a high absorption of sunlight is achieved. Structured metal oxide layers, such as nanorods, offer advantages such as higher electron mobilities or improved pore filling by the dye.
- the metal oxide semiconductors can be used alone or in the form of mixtures. It is also possible to coat a metal oxide with one or more other metal oxides. Furthermore, the metal oxides may also be used as a coating on another semiconductor, e.g. GaP, ZnP or ZnS, be applied.
- another semiconductor e.g. GaP, ZnP or ZnS
- Particularly preferred semiconductors are zinc oxide and titanium dioxide in the anatase modification, which is preferably used in nanocrystalline form.
- the sensitizers can advantageously be combined with all n-type semiconductors commonly used in these solar cells.
- Preferred examples are metal oxides used in the ceramic, such as titanium dioxide, zinc oxide, tin (IV) oxide, tungsten (VI) oxide, tantalum (V) oxide, niobium (V) oxide, cesium oxide, strontium titanate, zinc stannate, complex oxides of perovskite Type, eg Barium titanate, and called binary and ternary iron oxides, which may also be present in nanocrystalline or amorphous form.
- the terms of the dye, the sensitizer dye and the sensitizer are used synonymously in the context of the present invention, as is customary in DSCs, without being limited to possible embodiments.
- Numerous dyes that can be used in the context of the present invention are known from the prior art, so that for possible material examples, reference may also be made to the above description of the prior art for dye-sensitized solar cells. All listed and claimed dyes may in principle also be present as pigments.
- Color-sensitized solar cells based on titanium dioxide as capping material are described, for example, in US Pat. Nos. 4,927,721, Nature 353, pp. 737-740 (1991) and US Pat. No. 5,350,644 and Natura 395, p.
- dyes can also be used advantageously in the context of the present invention.
- These dye-sensitized solar cells preferably contain monomolecular films of transition metal complexes, in particular ruthenium complexes which are bonded to the titanium dioxide layer via acid groups, as sensitizers.
- Sensitizers not least for cost reasons, have repeatedly been proposed as metail-free organic dyes, which are likewise also usable in the context of the present invention.
- US Pat. No. 6,359,211 also describes the use, within the scope of the present invention, of cyanine, oxazine, thiazine and acridine dyes which have carboxyl groups bonded via an alkylene radical for attachment to the titanium dioxide semiconductor.
- Organic dyes have now reached efficiencies of nearly 12.1% in liquid cells (see, e.g., Wang et al., ACS., Nano 2010). Also, pyridinium-containing dyes have been reported, can be used in the present invention, and show promising efficiencies.
- Particularly preferred sensitizing dyes in the proposed dye solar cell are the perylene derivatives, terrylene derivatives and quatterylene derivatives described in DE 10 2005 053 995 A1 or WO 2007/054470 A1. The use of these dyes leads to photovoltaic elements with high efficiencies and high stabilities.
- the rylenes show strong absorption in the wavelength range of the sunlight and can, depending on the length of the conjugated system, a range of about 400 nm (perylene derivatives I from DE 10 2005 053 995 A1) up to about 900 nm (quaterrylene derivatives I from DE 10 2005 053 995 A1).
- terrylene-based rylene derivatives I absorb in a solid state adsorbed to titanium dioxide in a range from about 400 to 800 nm.
- the rylene derivatives I can easily and permanently be fixed on the n-type semiconducting metal oxide film. Binding takes place via the anhydride function (x1) or the carboxyl groups -COOH or -COO- formed in situ or via the acid groups A contained in the imide or condensate residues ((x2) or (x3)) In DE 10 2005 053 995 A1 described Rylenderivate I are well suited for use in dye-sensitized solar cells in the context of the present invention.
- the dyes have an anchor group at one end of the molecule which ensures their fixation on the n-semiarite film.
- the dyes preferably contain electron donors Y, which facilitate regeneration of the dye after electron donation to the n-type semiconductor and also prevent recombination with electrons already released to the semiconductor.
- the fixation of the dyes on or in the n-semiconducting Metalloxidfiimen can be done in a simple manner.
- the n-type semiconductive metal oxide films in freshly sintered (still hot) condition for a sufficient period of time e.g., about 0.5 to 24 hours
- a sufficient period of time e.g., about 0.5 to 24 hours
- This can be done, for example, by immersing the metal oxide-coated substrate in the solution of the dye.
- combinations of different dyes are used, they can be applied, for example, one after the other from one or more solutions or suspensions containing one or more of the dyes. Also possible is the use of two dyes separated by a layer of e.g. CuSCN are (see, for example, Tennakone, K.J., Phys. Chem B. 2003, 107, 13758). The most appropriate method can be determined comparatively easily in individual cases.
- the solar cell When selecting the dye and the size of the oxide particles of the n-semiconducting metal oxide, the solar cell should be designed so that as much light as possible is absorbed.
- the oxide layers should be structured so that the solid p-type semiconductor can fill the pores well.
- smaller particles have larger surfaces and are therefore able to adsorb a larger amount of dyes.
- larger particles generally have larger pores that allow better penetration through the p-type conductor.
- the proposed concept involves the use of one or more solid p-type semiconductors.
- the n- semiconducting metal oxide with the solid p-conductor, it is possible to distinguish between the n- semiconducting metal oxide and the p-type semiconductor at least one passivating layer are used, which has a passivation material.
- This layer should be as thin as possible and, if possible, should only cover the hitherto uncovered areas of the n-semiconducting metal oxide.
- the passivation material may also be applied to the metal oxide in time before the dye.
- passivation materials in particular one or more of the following substances are preferred: Al 2 O 3 ; Silanes, such as CH 3 SiCl 3 ; Al 3+ ; 4-tert-butylpyridine (TBP); MgO; GBA (4-guanidino-butyric acid) and similar derivatives; alkyl acids; Hexadecylmalonic acid (HDMA).
- Silanes such as CH 3 SiCl 3 ; Al 3+ ; 4-tert-butylpyridine (TBP); MgO; GBA (4-guanidino-butyric acid) and similar derivatives
- alkyl acids Hexadecylmalonic acid (HDMA).
- HDMA Hexadecylmalonic acid
- the pseudofiber comprises at least one solid organic p-type semiconductor as described above, at least silver in oxidized form.
- a p-type semiconductor is generally understood to mean a materal valley, in particular an organic material which is capable of conducting holes.
- it may be an organic material having an extended ⁇ electron system which can be stably oxidized at least once, for example, forming a so-called radical cation.
- the p-type semiconductor may comprise at least one organic matrix material which has the properties mentioned.
- the p-type semiconductor may be p-doped by the silver (1).
- the doping can increase a charge carrier density, in particular a hole density.
- a mobility of the charge carriers, in particular of the holes can be influenced by the doping, in particular increased.
- the doped p-type semiconductor as described above can be prepared or prepared by applying at least one p-type organic material and silver in oxidized form to at least one support element, wherein the silver in oxidized form is preferably in the form of at least one silver (l ) Salt [Ag + ] m [A m ] is applied to at least one support element, wherein A m - is the anion of an organic or inorganic acid, and m is an integer in the range of 1 to 3, preferably wherein m is 1 is.
- m is preferably 1 or 2, more preferably 1. Accordingly, a salt of the formula Ag + A- is used to prepare the p-type semiconductor.
- a m - is preferably an anion of an organic or inorganic acid.
- a m - is an anion of an organic acid, wherein the organic acid preferably contains at least one fluoro group or cyano group, (-CN) particularly preferably at least one fluoro group.
- [A m -] is preferably the anion of an organic carboxylic acid, sulfonic acid, phosphonic acid or sulfonic acidimide, preferably containing at least one fluoro group or cyano group.
- the present invention relates to a photovoltaic element as described above, wherein [A m -] has a structure of the formula (II),
- R a is a fluoro group -F or a substituted by at least one fluoro group or a cyano group, alkyl radical, cycloalkyl radical, aryl radical or heteroaryl radical, and wherein X is -O or N ⁇ -R b j s t, and wherein R b comprises a fluoro group -F or a cyano group, and wherein R b further comprises a group of the formula -S (0) 2-.
- cycloalkyl radical or cycloalkyl group refers to cyclic, optionally substituted, alkyl groups, preferably 5 or 6-membered rings or multicyclic rings, more preferably having 5 to 20 carbon atoms.
- R a is -F or a, at least one fluoro group or a cyano group, preferably at least one fluoro group, substituted alkyl radical, most preferably one with at least one fluoro group or a cyano group, preferably a fluoro group, substituted methyl group , Ethyl group or propyl group.
- the alkyl radical may contain at least one further substituent.
- R a preferably contains at least 3 fluorine substituents or a cyano group, preferably at least 3 fluorine substituents.
- R a is especially selected from the group consisting of -F, -CF 3, -CF 2 -CF 3 and -CH 2 -CN, more preferably selected from the group consisting of -F, -CF 3 and -CF 2 -CF 3.
- the present invention also relates to a photovoltaic element as described above, wherein [A m -] has a structure selected from the following formulas,
- R a is -CF 3 .
- R b is
- R b is a group comprising a fluoro group -F or a cyano group, wherein R b further comprises a group of the formula -S (0) 2-.
- R b comprises at least one alkyl, cycloalkyl, aryl or heteroaryl radical, wherein the alkyl, cycloalkyl, aryl or heteroaryl radical is in each case substituted by at least one fluoro group -F or one cyano group, preferably by at least one fluoro group and where R b further comprises a group of the formula -S (0) 2-.
- R b has a structure of the following formula:
- R bb is -F or a, with at least one fluorine group or a cyano group, preferably at least one fluoro group, substituted alkyl group, more preferably a substituted with at least one fluorine group methyl group, ethyl group or propyl group.
- the alkyl radical may contain at least one further substituent.
- R b contains at least 3 fluoro substituents.
- R bb is in particular selected from the group consisting of -F, -CF 3 , -CF 2 -CF 3 and -S (O) 2-CH 2 -CN, in particular selected from the group consisting of -F, -CF 3 and -CF 2 - CF3.
- the present invention also relates to a photovoltaic element as described above, wherein X is - N " - R b , and wherein R b is selected from the group consisting of -S (0) 2-F, -S (0) 2 -CF 3 , -S (O) 2 -CF 2 -CF 3 and -S (O) 2-CH 2 -CN, especially selected from the group consisting of -S (O) 2-F, -S (0 ) 2 -CF 3, and -S (O) 2 -CF 2 -CF 3 .
- [A m -] therefore very particularly preferably has one of the following structures:
- R a is in particular selected from the group consisting of -F, -CF 3 and - CF 2 -CF 3. That XN ⁇ -R b and R b are preferably in the case of the structure
- [A m ] is therefore particularly preferably a symmetrical sulfonylic acid imide. Accordingly, in a preferred embodiment, [A m -] is selected from bis (trifluoromethylsulfonyl) imide (TFSI), bis (trifluoroethylsulfonyl) imide, and bis (fluorosulfonyl) imide.
- TFSI bis (trifluoromethylsulfonyl) imide
- bis (trifluoroethylsulfonyl) imide bis (fluorosulfonyl) imide.
- the present invention relates to a photovoltaic element as described above, wherein [A m ] is a trifluoroacetate group.
- [A TM -] is the anion of an inorganic acid.
- [A m -] is preferably -NO 3 - (nitrate).
- the present invention also relates to a photovoltaic element as described above, wherein [A m -] selected from the group consisting of bis (trifluoromethylsulfonyl) imide (TFSI " ), bis (trifluoroethylsulfony! Imide, bis (fluorosulfonyl) imide, trifluoromethylsulfonate where [A m ] is bis (trifluoromethylsulfonyl) imide (TFSI-).
- [A m -] selected from the group consisting of bis (trifluoromethylsulfonyl) imide (TFSI " ), bis (trifluoroethylsulfony! Imide, bis (fluorosulfonyl) imide, trifluoromethylsulfonate where [A m ] is bis (trifluoromethylsulfonyl) imide (TFSI-).
- Solid p-type semiconductors doped with at least silver in oxidized form for example the at least one silver (I) salt [Ag + ] m [A m ] and particularly preferably the silver bis (trifluoromethylsulfonyl) imide, may be present in the photovoltaic compounds according to the invention
- Elements are also used without a large increase in cell resistance, especially when the dyes absorb strongly and therefore require only thin n- Ha! Bleiter harshen.
- the p-type semiconductor should essentially have a closed, dense layer, so that undesired recombination reactions resulting from contact between the n-semiconducting metal oxide (in particular in nanoporous form) with the second electrode and / or further elements of the photovoltaic element could be reduced.
- the silver in oxidized form for example, the at least one silver (I) salt [Ag + ] m [A m ] and particularly preferably the silver bis (trifluoromethylsulfonyl) imide, in particular together with the matrix material from the liquid phase Carrier element are applied.
- the silver in oxidized form for example the at least one silver (I) salt [Ag + ] m [A m ] and particularly preferably the silver bis (trifluoromethylsulfonyl) imide
- this at least one liquid phase may be added to at least one organic salt, for example for stabilization purposes and / or for improving the electrical properties.
- organic semiconductors ie low molecular weight, oligomeric or polymeric semiconductors or mixtures of such semiconductors
- p-type semiconductors which can be processed from a liquid phase.
- examples here are p-type semiconductors based on polymers such as polythiophene and polyarylamines, or of amorphous, reversibly oxidizable, nonpolymeric organic compounds, such as the spirobifluorenes mentioned at the beginning (cf., for example, US 2006/0049397 and the spiro compounds disclosed herein as p-type semiconductors, which can also be used in the context of the present invention).
- low molecular weight organic semiconductors are used.
- the solid p-type semiconductors can be used in doped form with silver in oxidized form, for example the at least one silver (I) salt [Ag + ] m [A m -] and particularly preferably the silver bis-itrifluoromethylsulfonyimide, as dopant , Furthermore, reference may also be made to the comments on the p-type semiconducting materials and dopants from the description of the prior art. For the other possible elements and the possible structure of the dye solar cell can be made to a large extent to the above description.
- the second electrode may be a bottom electrode to be assigned to the substrate or else a top electrode pointing away from the substrate.
- Metal electrodes which can comprise one or more metals in pure form or as a mixture / alloy, in particular aluminum or silver, can be used in particular as the second electrode. Also, the use of inorganic / organic mixing electrodes or multi-layer electrodes is possible, such as the use of LiF / Al electrodes.
- Electrodes in which the quantum efficiency of the components is increased by forcing the photons through corresponding reflections to pass through the absorbing layers at least twice.
- Such layer structures are also referred to as "concentrators” and are likewise described, for example, in WO 02/101838 (in particular pages 23-24).
- Figure 1 shows a schematic layer structure of an organic photovoltaic element according to the invention in a sectional view in side view;
- FIG. 2 shows a schematic arrangement of the energy levels in the layer construction according to FIG. 1;
- Figure 3 Current-voltage characteristic of a comparative sample without silver in oxidized form, measured 2 days after production;
- FIG. 1 shows a highly schematic sectional illustration of a photovoltaic element 110 which, in this exemplary embodiment, is shown in FIG. is formed as dye solar cell 112.
- the photovoltaic element 1 10 according to the schematic layer structure in Figure 1 can be configured according to the invention.
- the comparative sample according to the prior art can in principle correspond to the structure shown in Figure 1 and differ from it, for example, only with respect to the solid organic p-type semiconductor. It should be noted, however, that the present invention can also be used in the context of other layer structures and / or in the context of other structures.
- the photovoltaic element 110 includes a substrate 14, for example a glass substrate. Other substrates can also be used, as described above.
- a first electrode 16 which is also referred to as a working electrode and which, as described above, is preferably designed to be transparent.
- a blocking layer 118 of an optional metal oxide is applied, which is preferably non-porous and / or non-particulate.
- an n-type semiconducting metal oxide 120 is applied, which is sensitized with a dye 122.
- the substrate 1 4 and the layers 1 16 to 120 applied thereon form a carrier element 124 for at least one layer of a solid organic p-type semiconductor 126 applied thereon, which in turn in particular oxidizes at least one p-type semiconducting organic matrix material 128 and at least one silver Form 130, for example, the at least one silver (l) salt [Ag + ] m [A m ] and particularly preferably the silver bis (trifluoromethylsulfony [) imide, may include.
- a second electrode 132 is applied, which is also referred to as the counter electrode.
- FIG. 1 together form a layer structure 134, which is shielded from an ambient atmosphere by an encapsulation 136, for example in order to completely or partially protect the layer structure 134 from oxygen and / or moisture.
- One or both of the electrodes 116, 132 may, as indicated in FIG. 1 on the basis of the first electrode 116, be led out of the encapsulation 136 in order to be able to provide one or more contacting surfaces outside the encapsulation 136.
- FIG. 2 a highly detailed energy level diagram of the photovoltaic element 110, for example according to FIG. 1, is shown by way of example.
- materials for the first electrode 1 16 and the second electrode 132 are exemplified FTO (fluorine-doped tin oxide) and silver.
- the photovoltaic elements may optionally comprise further elements.
- photovoltaic elements 1 10 with or without encapsulation 136 the embodiments described below were realized, by means of which the effect of the present invention and in particular the p-doping of the p-type semiconductor 126 can be occupied by silver in oxidized form 130.
- a dye-solid solar cell with solid p-type semiconductor was prepared without doping by silver in oxidized form, as it is known in principle from the prior art.
- the base material and the substrate used were fluorodoped tin oxide (FTO) coated first 25 mm x 25 mm x 3 mm (Hartford Glass) glass plates coated first with glass cleaner (RBS 35), deionized water and acetone Treated for 5 min in an ultrasonic bath, then boiled for 10 min in iso-propanol and dried in nitrogen Ström.
- FTO fluorodoped tin oxide
- RBS 35 glass cleaner
- a spray pyrolysis method was used. Then, as the n-type semiconducting metal oxide, a TiO 2 paste (Dyesol) containing TiO 2 particles having a diameter of 25 nm in a terpineol / ethyl cellulose dispersion was spin-coated at 4500 rpm with a spin coater and at 90 ° C. for 30 minutes dried. After heating at 450 ° C. for 45 minutes and a sintering step at 450 ° C. for 30 minutes, the TiO 2 layer thickness was approximately 1.8 ⁇ m.
- a TiO 2 paste Dispersion containing TiO 2 particles having a diameter of 25 nm in a terpineol / ethyl cellulose dispersion was spin-coated at 4500 rpm with a spin coater and at 90 ° C. for 30 minutes dried. After heating at 450 ° C. for 45 minutes and a sintering step at 450 ° C. for 30
- the sample After removal from the oven, the sample was cooled to 80 ° C and 12 h in a 5 mM solution of an additive ID662 (obtainable, for example, according to Example H) and then for 1 h in a 0.5 mM solution of a dye in dichloromethane dipped.
- the dye 1D504 (obtainable, for example, according to Example G) was used as the dye.
- the sample After removal from the solution, the sample was then rinsed with the same solvent and dried in a stream of nitrogen. The samples thus produced were then dried at 40 ° C in a vacuum.
- a p-type semiconductor solution was spin-coated.
- a solution of 0.12 M Spiro-MeOTAD (Merck) and 20 mM LiN (SO 2 CF 3 ) 2 (Aldrich) in chlorobenzene was applied, 125 ⁇ L of this solution was applied to the sample and allowed to act for 60 s
- the solution was spun off for 30 s at 2000 rmp and the sample stored overnight in the dark in air As stated above, this storage is believed to cause oxygen doping of the p-type semiconductor, thereby increasing the conductivity of the p-type semiconductor.
- a metal back electrode was vacuum applied as a second electrode by thermal metal evaporation.
- Ag was used as metal which has been evaporated s at a rate of 3 ⁇ at a pressure of about 2 * 10 "6 mbar, so that a layer thickness of about 200 nm was formed.
- the respective current / voltage characteristic was measured with a Source Meter Model 2400 (Keithley Instruments Inc.) under irradiation with a xenon solar simulator (LOT-Oriei 300 W AM 1.5) two days after production. The initial measurement was carried out with unencapsulated cells. A power Voltage characteristic of the comparison sample measured after two days is shown in FIG. The comparative sample had the characteristics listed in Table 1.
- Table 1 Characteristics comparative sample without doping.
- the short-circuit current isc (ie the current density at zero load resistance) was 9.29 mA / cm 2 , the open-terminal voltage Voc (ie the load at which the current density has dropped to zero) was 860 mV, the filling factor FF was 55% and the ETA was 4.4%.
- the comparison sample described above was modified by doping the p-type semiconductor 126 or its matrix material 128 with silver bis (trifluoromethylsulfonyl) imide (Ag-TFSI).
- Ag-TFSI silver bis (trifluoromethylsulfonyl) imide
- the p-type semiconductor solution of 0.12 M Spiro-MeOTAD (source Merck) and 20 mM LiNB02CF3) 2 (source Aldrich) in chlorobenzene 5 mM silver bis (trifluoromethylsulfonyl) imide (source Aldrich) in cyclohexanone was then spun onto the sample as described in the comparative sample.
- the metal back electrode as the second electrode 132 was immediately vacuum deposited by thermal metal evaporation.
- the metal used was Ag, which was evaporated at a rate of 3 ⁇ / s at a pressure of about 2 ⁇ 10 -6 mbar to give a film thickness of about 200 nm.
- the respective current / voltage characteristic was measured with a Source Meter Model 2400 (Keithley Instruments Inc.) under irradiation with a xenon solar simulator (LOT-Oriel 300 W AM 1.5) immediately and 2 days after production. The initial measurement was carried out with unencapsulated cells.
- Table 2 Comparison of characteristic data of an undoped comparative sample and a sample according to Example 1 at different measurement times.
- Example 1 In order to investigate the influence of the amount of dopant on the properties of the photovoltaic element 110, variations of Example 1 with 1-20 mM Si-bis-bis (trifluoromethylsulfonyl) imide were further prepared. Otherwise, the samples were prepared as the sample according to Example 1 described above. The characteristics of these samples, measured after 2 days, are shown in Table 3. The illumination in these measurements was once again 100 Sun, as in the above measurements.
- Table 3 Comparison of characteristic data of samples according to Example 2 with different Ag-TFSI content.
- Example 3 Variation of the Matrix Material Furthermore, the influence of the matrix material 128 on the properties of the photovoltaic elements 110 was investigated as example 3.
- samples were prepared according to Example 1 described above, but Spiro-MeOTAD was replaced as matrix material 128 by different matrix materials 128 with different concentrations, in particular by the above-mentioned matrix materials of the type ID522, ID322 and ID367.
- Spiro-MeOTAD was replaced as matrix material 128 by different matrix materials 128 with different concentrations, in particular by the above-mentioned matrix materials of the type ID522, ID322 and ID367.
- 10 m of silver bis (trifluoromethylsulfonyl) imide were again used as dopant in each of the samples. The characteristics of the samples thus obtained are shown in Table 4.
- the indicated concentrations of 160 mg / ml and 200 mg / ml relate to the concentration of the matrix material 28 in the liquid phase.
- the characteristics were again recorded after 2 days and measured at 00 Sun [mW / cm 2 ].
- ID522 conc. 200mg / ml, 10 mMAgTFSI -7.07 740 70 3.7
- Example 4 4 different samples were prepared in Example 4, which again agree with Example 1 above except for the dopant.
- salts other than dopants each in an amount of 20 mM were added. The results are shown in Table 5. Ag nitrate was added as a solid in the p-conductor solution.
- TFSl generally leads to high efficiencies only as an anion in a silica salt.
- other silver salts show comparatively high efficiencies, in particular silver nitrate and oversize triflate.
- compounds, in particular salts can be used as dopant, which Silver in oxidized form, in particular silver (I) salts of the formula [Ag + ] m [A m -], particularly preferably Ag-TFSI, silver nitrate and silver triflate.
- the compounds of the formula I can be prepared via the sequence of the synthesis steps of the synthesis route I shown above.
- the coupling of the reactants in steps (I-R1) to (I-R3) can be carried out, for example, by Ullmann reaction with copper as catalyst or under palladium catalysis.
- the compounds of the formula I can be prepared via the sequence of the synthesis steps of the synthesis route II shown above.
- diarylamines are not commercially available in the synthesis steps I-R2 and II-R1 of the synthesis routes I and II, they can be prepared, for example, by Ullmann reaction with copper as catalyst or under palladium catalysis in accordance with the following reaction:
- reaction mixture was heated for 7 hours at a temperature of 100 ° C under a nitrogen atmosphere. After cooling to room temperature, the reaction mixture was quenched with ice-water, the precipitate filtered off and dissolved in ethyl acetate. The organic layer was washed with water, dried over sodium sulfate and purified by column chromatography (eluent: 5% ethyl acetate / hexane). A slightly yellow colored solid was obtained (7.58 g, yield: 82%).
- reaction mixture was diluted with 150 ml of toluene, filtered through Celite® and the organic layer was dried over Na 2 SC ⁇ 4. The solvent was removed and the crude product was reprecipitated three times from a mixture of tetrahydrofuran (THF) / methanol.
- THF tetrahydrofuran
- the solid was purified by column chromatography (eluent: 20% ethyl acetate / hexane) followed by precipitation with THF / methanol and charcoal purification. After removal of the solvent, the product was obtained as a pale yellow solid (1, 0g, yield: 86%).
- t-BuONa (686 mg, 7.14 mmol) was heated at 100 ° C under vacuum, then the reaction was rinsed with nitrogen and allowed to cool to room temperature. Then, 2,7-dibromo-9,9-dimethylfluorene (420 mg, 1.19 mmol), toluene (40 mL) and Pd [P ('Bu) 3] 2 (20 mg, 0.0714 mmol) were added and the reaction mixture stirred at room temperature for 15 minutes. Subsequently, ⁇ , ⁇ , ⁇ '- ⁇ -trimethoxy-triphenylbenzidine (1, 5 g, 1.27 mmol) was added to the reaction mixture and stirred at 120 ° C for 5 hours.
- Step 1
- reaction mixture was mixed with water and the product was precipitated from hexane.
- the aqueous phase was further extracted with ethyl acetate.
- the organic phase and the precipitated and filtered precipitate were combined and purified by column chromatography on SiC ⁇ phase (hexane: ethyl acetate 10: 1).
- reaction mixture was mixed with ice-cold water and extracted with ethyl acetate.
- product was precipitated from a mixture of hexane / ethyl acetate and purified by column chromatography on SiO 2 phase (hexane: ethyl acetate gradient 9: 1 ⁇ 5: 1).
- step a 4,4,5,5,4, 4 ', 5', 5'-octamethyl [2,2 '] bi [[1, 3,2] dioxaboro! Anyl] was reacted (step a). This was followed by coupling with 9Br-DIPP-PDCI (step b). This is followed by saponification to the anhydride (step c) and subsequent reaction with glycine to form the end compound (step d).
- Step b
- Step, d In 350mL of N-methyl-pyrrolidone 17.5g (22mmoi) of stage c, 16.4g (220mmol) of glycine and 4g (22mmol) of zinc acetate were added and stirred at 130 ° C for 12h.
- reaction mixture was added to 1 L of deionized water.
- the precipitate was filtered through a frit, washed with water and dried in a vacuum oven at 70 ° C.
- ID662 was prepared by reaction of the corresponding commercially available
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WO2008018982A2 (en) * | 2006-08-03 | 2008-02-14 | North Carolina State University | Self-assembled photosynthesis-inspired light harvesting material and solar cells containing the same |
JP5167636B2 (ja) * | 2006-12-21 | 2013-03-21 | セイコーエプソン株式会社 | 光電変換素子および電子機器 |
EP2174329B1 (de) * | 2007-07-23 | 2011-02-09 | Basf Se | Photovoltaische tandem-zelle |
WO2009070534A1 (en) * | 2007-11-28 | 2009-06-04 | Konarka Technologies Gmbh | Organic photovoltaic cells comprising a doped metal oxide buffer layer |
CN101544845B (zh) * | 2009-04-27 | 2012-11-07 | 中国科学院长春应用化学研究所 | 含不同种杂环及其衍生物共轭单元的纯有机染料及其在染料敏化太阳电池中的应用 |
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2012
- 2012-01-24 JP JP2013552291A patent/JP6150732B2/ja not_active Expired - Fee Related
- 2012-01-24 KR KR1020137022849A patent/KR20140007416A/ko active Search and Examination
- 2012-01-24 EP EP12741941.4A patent/EP2671271A4/de not_active Withdrawn
- 2012-01-24 CN CN201280014885.XA patent/CN103443948B/zh not_active Expired - Fee Related
- 2012-01-24 AU AU2012213134A patent/AU2012213134B2/en not_active Ceased
- 2012-01-24 WO PCT/IB2012/050315 patent/WO2012104742A1/de active Application Filing
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2013
- 2013-08-30 ZA ZA2013/06535A patent/ZA201306535B/en unknown
Non-Patent Citations (1)
Title |
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See references of WO2012104742A1 * |
Also Published As
Publication number | Publication date |
---|---|
CN103443948A (zh) | 2013-12-11 |
WO2012104742A1 (de) | 2012-08-09 |
JP2014509048A (ja) | 2014-04-10 |
JP6150732B2 (ja) | 2017-06-21 |
CN103443948B (zh) | 2016-05-04 |
AU2012213134B2 (en) | 2016-03-24 |
AU2012213134A1 (en) | 2013-09-05 |
KR20140007416A (ko) | 2014-01-17 |
ZA201306535B (en) | 2014-11-26 |
EP2671271A4 (de) | 2018-03-28 |
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