EP2601133A1 - Procédé de production de chlorure d'hydrogène - Google Patents

Procédé de production de chlorure d'hydrogène

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Publication number
EP2601133A1
EP2601133A1 EP11746282.0A EP11746282A EP2601133A1 EP 2601133 A1 EP2601133 A1 EP 2601133A1 EP 11746282 A EP11746282 A EP 11746282A EP 2601133 A1 EP2601133 A1 EP 2601133A1
Authority
EP
European Patent Office
Prior art keywords
hci
gas
plasma treatment
plasma
chlorine atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP11746282.0A
Other languages
German (de)
English (en)
Inventor
David Deegan
Fan Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tetronics International Ltd
Original Assignee
Tetronics International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tetronics International Ltd filed Critical Tetronics International Ltd
Publication of EP2601133A1 publication Critical patent/EP2601133A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G5/00—Incineration of waste; Incinerator constructions; Details, accessories or control therefor
    • F23G5/08—Incineration of waste; Incinerator constructions; Details, accessories or control therefor having supplementary heating
    • F23G5/085—High-temperature heating means, e.g. plasma, for partly melting the waste
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation

Definitions

  • the invention relates to a process for the production of aqueous HCI from a material that contains chlorine atoms.
  • the invention relates to a method and apparatus for the remediation of Air Pollution Control (APC) residue to obtain a product.
  • APC Air Pollution Control
  • Air Pollution Control (APC) residues are a mixture of fly ash, organic pollutants (including dioxins and furans), carbon and alkaline salts in powder form.
  • APC residues are classified as hazardous waste and are captured by the off-gas system and environmental pollution abatement systems of thermal plants. For example, they are generated from treatment processes associated with the operation of Municipal Solid Waste (MSW) incinerators, biomass combustion power production plants and other thermal and/or pyrometallurgical processes.
  • MSW Municipal Solid Waste
  • Current practice for handling these APC residues involves transporting them significant distances to high-cost, hazardous waste landfills, and other land- based disposal sites including salt mine disposal, that have finite disposal capacity. Here they are disposed of after suitable pre-treatment and compliance acceptance testing.
  • the APC residues are neutralised with acidic waste, or solidified with cementitious materials, before disposal. Due to rising levels of cost/taxation, tightening regulatory pressures and limited capacity this practice is increasingly undesirable and costly.
  • Alternative sustainable treatment methods are urgently required.
  • the pre-treatment methods which are currently used to treat dispose of APC residues are fairly rudimentary, e.g. mixing and washing. These methods represent simple packaging, dilution and dispersion and only serve to displace the problem presented by the waste.
  • Alternative disposal methods include use of 'specialist' cement stabilisation products followed by storage underground. However, all these non-recovery based solutions ultimately rely on disposal/storage (at landfill or foul sewer) and have poor overall environmental performance that is also subject to escalating taxation and regulation. Waste treatment using plasma technology is known (see, for example, US
  • EP 1896774 discloses a waste treatment method comprising a gasification step followed by a plasma treatment step. This results in
  • the object of the present invention is to tackle at least some of the problems associated with the prior art or at least to provide a commercially acceptable alternative solution thereto.
  • the present invention provides a process for the production of aqueous HCI from a material that contains chlorine atoms, the process
  • the method of the present invention is particularly suitable for treatment of a waste material that contains chlorine atoms, more particularly to a hazardous waste that contains chlorine atoms. It is noted that the chlorine atoms are most likely part of larger molecules such as inorganic compounds.
  • the method allows for the remediation of this waste and, in comparison to conventional treatment methods, produces a useful product form an otherwise less useful waste stream.
  • the recovery of aqueous HCI adds value which may, at least, offset the cost of the waste treatment, and also eliminates a large component of the effluent stream.
  • any remaining organic or volatile components in the material are vaporised and removed, reducing the amount of waste product produced.
  • the waste product takes the form of a solid vitrified material which may be used in, or as, secondary products (such as building materials) and, in any event, has a reduced size. When dealing with toxic or hazardous materials this solid form allows for easier handling and disposal.
  • the method is especially suitable for the treatment of Air Pollution Control residues (APC residues).
  • UK APC residues typically consist of 15 - 25 wt% chlorine.
  • APC residues typically consist of 4 - 25 wt% and more preferably from 5 to 20 wt% chlorine.
  • off-gas refers to the gaseous product that leaves the plasma treatment unit when carrying out plasma treatment of a material.
  • slag refers to the vitreous residue produced in the plasma furnace of the plasma treatment unit. It is formed as a result of the plasma treatment of the chlorine-containing material.
  • molten slag used herein refers to a slag that is solid at room temperature but molten at the operating temperature of the plasma treatment unit.
  • plasma treating refers to a method of applying plasma to a material.
  • a plasma is an electrically neutral, highly ionised gas composed of ions, electrons and neutral particles and is distinct from other forms of matter.
  • the term “plasma treatment unit” refers to any unit in which plasma is applied to a material, such as a plasma furnace. In a plasma furnace, electricity is passed between two or more electrodes spaced apart creating an electrical arc.
  • the plasma may preferably be produced in a plasma torch which allows for targeted plasma treatment. Gases, typically inert gases, under high pressure are passed through the arc and are turned into plasma. Plasma is a clean, functional heat source with strong environmental characteristics. It is also very efficient in destroying Persistent Organic Pollutants (POPs).
  • the plasma treatment unit is preferably a plasma furnace.
  • aqueous HCI refers to a solution of hydrogen ions and chlorine ions in a solvent comprising water.
  • aqueous HCI is a solution of aqueous HCI.
  • condensing unit refers to an apparatus capable of extracting HCI from the gas phase into either the solid, liquid or aqueous phases. Condensing apparatus are well known in other fields of technology.
  • the produced HCI is cooled in the condenser, and absorbed into water to form aqueous HCI.
  • the process may comprise a further step of adjusting the pH of the aqueous HCI as required.
  • HCI is selectively and preferentially dissolved in water to produce a HCI solution.
  • the HCI solution may have a concentration of 1-38 %w/w (kg HCI/kg), preferably, 3-30 %w/w, even more preferably 10-20 w/w %, and still even more preferably 12-18 w/w %.
  • the solution may be recycled through the condenser to increase the HCI concentration (i.e. typically until it has an HCI concentration of 12 % w/w or more). This is preferred as this is an efficient approach to obtaining a more concentrated product.
  • the condensing unit is maintained under acidic conditions so as to preferentially recover HCI.
  • the HCI solution is acidic, i.e. it has a pH less than 7.
  • the aqueous HCI product has a pH of less than 2, more preferably less than 1, even more preferably less than 0 and still even more preferably less than -0.5.
  • these highly acidic pH values have been found to limit the solubility of other gases such as sulphur oxides and hydrogen fluoride, which are rejected ensuring a low level of acid cross contamination.
  • the concentrations of other gases dissolved in the aqueous HCI is preferably less than 25 %, even more preferably less than 5 %, still even more preferably less than 1 % and still even more preferably less than 0.5 %.
  • HCI can be dissolved in a solvent comprising water and an organic component, for example an aqueous alcohol such as aqueous methanol.
  • a solvent comprising water and an organic component, for example an aqueous alcohol such as aqueous methanol.
  • the process further comprises:
  • step (a) pre-treating the off-gas used in step (ii) in a thermal oxidiser before performing step (ii);
  • step (b) pre-filtering the off-gas used in step (ii) before performing step (ii), preferably maintaining the off-gas at a temperature of at least 180 °C during filtration.
  • step (i) Contacting at least some of the off-gas produced in step (i) with a thermal oxidiser before performing step (ii) results in oxidation of any residual flammable gases and metallic/elemental species contained in the off-gas, e.g. carbon monoxide, lead, zinc, cadmium and hydrogen.
  • a thermal oxidiser e.g. carbon monoxide, lead, zinc, cadmium and hydrogen.
  • the off-gas is cooled after being contacted with the thermal oxidiser.
  • the cooling is carried out with the use of water injection and
  • the method involves filtering at least some of the off-gas produced in step (i) before performing step (ii), which results in the removal of particulates from the off-gas, which could contaminate the aqueous HCI solution produced.
  • particulates may be recovered as secondary APC residues.
  • Such filtering may comprise the dosing of Activated Carbon (AC) as a physical sorbent for the capture of mercury and other volatile metals.
  • AC Activated Carbon
  • filtering comprises on-line cleaning facilities e.g. the use of a reverse pulse jet for the removal of particulates.
  • secondary APC residues which are usually disposed of, may be recovered from the off-gas as a result of the filtering.
  • the off-gas is maintained at a temperature above 180 °C during filtration. This avoids blockage of the filter elements and corrosion due to condensation of water vapour and soluble gases contained in the off-gas.
  • the process further comprises treating the waste off-gas produced in step (ii) once the HCI has been recovered in a caustic wet scrubber.
  • wet scrubber used herein refers to a device that removes pollutants from a gas stream. In a wet scrubber, the polluted gas stream is brought into contact with a scrubbing liquid, so as to remove the pollutants from the gas stream by physical and/or chemical means.
  • caustic wet scrubber used herein refers to a wet scrubber in which the liquid contains an alkaline or caustic scrubbing agent, such as lime milk, sodium bicarbonate or sodium hydroxide.
  • the use of a caustic scrubbing agent makes the scrubber particularly effective for the removal of acidic gases from a gas stream.
  • the wet scrubber removes the residual gaseous contaminants, such as residual acid gases, contained in the off-gas.
  • the removal of such gaseous contaminants means that a reduced amount of environmental pollutants are released when the off-gas is subsequently discharged to the atmosphere through a stack and assessed for regulatory compliance.
  • the caustic wet scrubber is distinct from the condensing unit.
  • the off-gas passes to a continuous emission monitoring system (CEMS), after the caustic wet scrubber, and prior to discharge through a stack. This ensures that measurements are taken to confirm compliance with a set of Emission Limiting Values (ELVs) is achieved, such as those defined in the Waste incineration Directive (WID) or included within the plant's associated environmental permit to operate.
  • Emission Limiting Values Emission Limiting Values
  • the steps are typically carried out in the following order: plasma treating the material in a plasma treatment unit to produce an off-gas containing at lest some of the chlorine atoms (step (i)), passing the off-gas to a thermal oxidiser, filtering the off-gas (for example contacting the off-gas with a physical sorbent or physical membrane), passing at least some of the off-gas to a condensing unit to recover HCI in aqueous form (step (ii)), passing the off-gas to a caustic wet scrubber, passing the off-gas to a CEMS, discharging the off-gas to the atmosphere.
  • plasma treating the material in a plasma treatment unit to produce an off-gas containing at lest some of the chlorine atoms (step (i))
  • passing the off-gas to a thermal oxidiser for example contacting the off-gas with a physical sorbent or physical membrane
  • passing at least some of the off-gas to a condensing unit to recover HCI in aqueous form step
  • the plasma treatment is carried out in the presence of a plasma stabilising gas.
  • a plasma stabilising gas is selected from one or more of nitrogen, argon, helium and steam.
  • the step of plasma treatment further produces a molten slag.
  • the process can be tweaked so that the inert vitreous or semi-crystalline product conforms to local product qualifications.
  • the material is maintained at a temperature of 1400 - 1600 °C during the plasma treatment step. This ensures that any molten slag produced during the plasma treatment remains in the liquid state. Accordingly, any such molten slag can be more easily removed from the plasma treatment unit if desired.
  • the plasma treatment process can be carried out between 1000 and 3200°C.
  • the preferred lower limit for efficient HCI recovery is at least 1200°C.
  • the use of higher temperatures requires increased energy for the treatment process.
  • a preferred balance of yield and energy requirements is from 1200°C to 2000°C, more preferably 1400 - 1800 °C and most preferably from 1400 - 1600 °C.
  • the molten slag is continuously removed from the plasma treatment unit.
  • the molten slag is continuously removed at a dedicated channel. This encourages positive plug flow movement of molten slag without the associated build up of process gases. A build up of process gases within the plasma treatment unit could be hazardous.
  • the removed molten slag is cooled to form a solid vitrified material. This results in inorganic materials contained in the slag being trapped within the glass matrix.
  • the solid vitrified material exhibits a composition and leachability of metals below the inert waste landfill WAC (Waste Acceptance Criteria) leaching limits. This means that the solid vitrified material can be disposed of in landfill or more preferably qualified as a product in line with the requirements of the Waste Framework Directive.
  • the process further comprises adding one or more fluxing agents, if required, to the chlorine-containing material either before or during the plasma treatment.
  • Typical APC residues may be self-fluxing.
  • Lime-based APCs for example, contain CaOH.xH 2 0 which on heating provides a source of Calcium oxide and water.
  • flux ensures that a low melting point, low viscosity molten stable slag is produced from any inorganic, non-combustible materials that are present in the chlorine-containing material.
  • use of a fluxing agent results in environmental immobilisation of any heavy metals, such as lead, zinc and cadmium, or any compounds thereof, contained in the chlorine- containing material.
  • Typical fluxing agents are comprised of one or more of lime, alumina and silica.
  • One or more network stabilising agents may also be used alone or in combination with the fluxing agents. Network stabilising agents are known in the art.
  • the one or more fluxing agents comprise incinerator bottom ash (IBA) or alternative waste.
  • IBA incinerator bottom ash
  • IBA is a form of ash produced in incineration facilities, and is currently classified as non-hazardous waste in the UK. This material is discharged from the grate of municipal solid waste
  • IBA incinerators. Following combustion the ash typically has a small amount of ferrous metals contained within it.
  • IBA is typically comprised of a mixture of two or more compounds such as Si0 2 , CaO, AI2O3, Fe203, MgO, K 2 0, P 2 0 5 and S.
  • the use of IBA to replace virgin flux materials such as S1O2 and AI2O3 reduces the cost of flux materials accordingly and avoids the need to dispose of IBA in landfill.
  • the IBA is pre-treated before being used as a flux material.
  • Such pre- treating may include the removal of oversized (e.g. with a diameter greater than or equal to 10 mm) material and/or drying. This results in the plasma treatment unit being more stable and efficient.
  • oversized material e.g. with a diameter greater than or equal to 10 mm
  • the use of 'dried' IBA avoids rapid pressure increase within the plasma treatment unit due to the production of large amounts of steam.
  • the removal of oversized material means that the heat transferred from the plasma arc is better able to contact the chlorine-containing material under the intended steady state conditions. Both of these effects help to stabilise the voltage of the plasma, which is directly related to the plasma power.
  • a flux can be mixed with the material containing chlorine atoms either before or during plasma treatment.
  • the flux preferably IBA
  • the flux can form from 0 to 50wt% of the treated material, preferably from 15 to 35wt% and most preferably about 25wt%. This allows for a molten slag product with predictable characteristics while minimising the amount of extra heating required.
  • the present inventors have discovered that the moisture content of the material containing chlorine atoms treated can affect the recovery of the HCI. With increasing water content the recovery rate increases. For example, a five-fold increase in the moisture content can lead to a tripling of the recovery rate of HCI(g). However, the increased presence of moisture also increases the energy consumption of the process. Accordingly, the moisture content of the material containing chlorine atoms before treatment is preferably from 0.5 to 15wt%, more preferably from 1 to 5wt% and most typically from 2 to 3wt%.
  • the process further comprises a step of producing gaseous HCI from the aqueous HCI.
  • This may be performed by techniques well known in the art. This may be stored as a gas for sale and dispatch.
  • the material containing chlorine atoms is a waste material, preferably comprising inorganic material.
  • the waste material may also comprise organic material.
  • the material is preferably a hazardous waste and more preferably APC residue.
  • the material has a chlorine content of 5 - 40 wt%, more preferably 10 - 35 wt%, even more preferably 15 - 30 wt%, and still even more preferably 20 - 25 wt%.
  • the chlorine-containing material is an Air Pollution Control (APC) residue, sometimes referred to as "fly ash”.
  • APC Air Pollution Control
  • the APC residue is produced from high temperature incineration or other thermal waste management, manufacturing or power production processes. It is not necessary for APC residues to undergo any pre-treatment, such as washing, before being used in the method of the present invention.
  • HCI hydrogen and chlorine within the system.
  • the technical recovery rates of HCI have been observed to be higher than thermodynamically predicted and this is considered to be due to the combined plasma effects.
  • an HCI recovery apparatus for performing the process of the present invention, the apparatus comprising:
  • a plasma treatment unit for treating a material containing chlorine atoms to produce an off-gas containing at least some of the chlorine atoms
  • a typical plasma treatment unit for use in the present invention comprises a furnace and a graphite electrode system comprising one or more graphite electrodes to generate in use a plasma arc inside the furnace.
  • a chlorine-containing material is inserted into the furnace, typically through an inlet port.
  • a plasma arc then transfers from the tip of the graphite electrode to the chlorine-containing material.
  • the return electrical path is via an electrically conductive path built into a furnace sidewall or hearth. Preferably this will be via conductive refractories and/or interconnecting metal-encased bricks. Periodically this will need to be replenished to ensure good hearth electrical contact as it can become depleted through slow consumption process like reaction with chlorine.
  • the chlorine-containing material is fed into the furnace of the plasma treatment unit at a controlled rate and the plasma power is modulated to maintain the melt at a suitable liquid temperature, typically in the range 1400 - 1600 °C. Power is modulated in accordance with the feed rate of the material, of known bulk chemistry, undergoing treatment. It is preferred that the chlorine-containing material and any additional materials are fed into the plasma treatment unit under gravity. Preferably the feed material falls under gravity past the plasma device, whereby the plasma heat warms and volatilises the material, allowing kinetic reaction of the chlorine content before the mixture enters the bulk melt pool. In this way, the yield of HCI is surprisingly higher than predicted under the thermodynamic conditions of the melt pool.
  • the apparatus further comprises one or more of:
  • the filter may comprise one or more of an activated carbon dosing system and a particulate filter.
  • the apparatus of the present invention is typically arranged so that the off-gas produced in the plasma treatment unit enters each component in the following order: (i) the thermal oxidiser, (ii) the filter, (iii) the condensing unit and (iv) the caustic wet scrubber.
  • the apparatus can be arranged in any other suitable arrangement.
  • the plasma treatment unit comprises an overflow spout for the removal of molten slag from the plasma treatment unit.
  • the overflow spout comprises heating means, preferably a plasma torch. This avoids possible solidification of the molten slag, which would hinder its removal from the plasma treatment unit.
  • the plasma torch is distinct from the heating component of the plasma treatment unit.
  • the condensing unit comprises a graphite-lined heat exchanger. The use of a graphite lining avoids corrosion to the condensing unit by the aqueous HCI produced. Alternative linings such as chloro/fluoropolymer and/or enamels could be employed. Suitable lining systems exhibit chemical
  • the present invention provides a waste treatment plant for treating chlorine-containing material, the plant comprising:
  • an incinerator capable of producing incinerator bottom ash (IBA) and/or Air Pollution Control residues.
  • the incinerator produces both the IBA and APC residues and this leads to quick efficient remediation of the dangerous materials on site without delay.
  • co-location of such plants provides benefits in the efficiency of the associated infrastructure.
  • the incinerator may be a plasma treatment unit.
  • Figure 1 is a schematic of an example of an apparatus according to the second aspect of the present invention.
  • Figure 2 is a perspective view of an example of a waste treatment plant containing an example of an apparatus according to the second aspect of the present invention.
  • FIG. 3 shows graphs of the plasma characteristics of the plasma treatment unit used during Example 1 (top) and Example 2 (bottom). In each diagram the dashed rectangle indicates the feeding period.
  • average current 756 A
  • average volts 194 V
  • average power 145 kW (vs PFD 127.4 kW)
  • FIG. 1 shows a flowchart of the components and method steps used in the apparatus 100 and method of the present invention.
  • the apparatus 100 comprises a plasma treatment unit 101.
  • Flux materials 102 can be supplied to the hopper 103 where they pass to the blending system 105 for blending with APC residues 104.
  • the blended APC residues and flux materials are then supplied to the plasma furnace 107 via the feeder 106.
  • Plasma is then supplied to the plasma furnace 107 from the plasma source 108 (not shown).
  • the plasma source 108 comprises a cooling system 109, a pump 111 and a furnace manifold 112.
  • the pump 111 pumps cooling water 110.
  • the furnace manifold 112 is, in use, supplied with plasma gas 113.
  • the APC residues undergo plasma treatment in the plasma furnace 107 to produce an off-gas and a molten slag.
  • the molten slag is passed to a molten slag handling system 114 to be stored in a cold slag reservoir 115.
  • the off-gas then passes to the thermal oxidiser 116, where air 117 is supplied to oxidise any flammable gases contained in the off-gas.
  • the off-gas then passes to the gas cooling system 118, where water 119 is injected so as to cool the off-gas by evaporative cooling or equivalent means.
  • the off-gas then passes to the filter 20, where activated carbon 21 is used in order to capture any mercury, and other volatile species, contained in the off-gas.
  • Secondary APC residue 122 is recovered from the filter 120.
  • the off-gas then passes to the condensing unit 123 in order to recover aqueous HC1 124.
  • the off-gas then passes to the caustic wet scrubber 125, where a solution of alkaline scrubbing reagent, such as sodium bicarbonate, 126 is added in order to fix other acidic gases from the off-gas and to produce soluble salts such as Na 2 S03 which are dissolved in solution 127.
  • the off-gas then passes through an ID fan 128, which controls the pressure in the plasma furnace 107, and is then monitored by an emission monitoring system 129 to ensure
  • FIG. 2 shows a waste treatment plant containing a device according to the second aspect of the present invention.
  • the plant comprises air blast cooler 201 , a control room 202, a plasma power supply 203, a solid vitrified material reservoir 204, a plasma furnace 205, a flux material storage reservoir 206, APC residue storage reservoirs 207, a secondary fly ash storage reservoir 208, an off-gas system 209 and a stack 210.
  • Such a waste treatment plant is designed to fit inside a standard industrial unit.
  • Example 1 The process of the first aspect of the present invention was carried out using IBA as a flux material.
  • the IBA was obtained from a municipal solid waste (MSW) incinerator and had the composition according to Table 1 :
  • the APC residues used comprised -16.33 wt% elemental chlorine.
  • the chlorine was diluted to 1 .43 wt%.
  • the total mass of input material was 204 kg, including 187.0 kg of blended feed (containing 130.9 kg APC residue, 37.4 kg silica flux, 18.7 kg IBA), 0.0 kg of pig iron and 17.0 kg of remaining slag/metals.
  • the overall input mass of chlorine was 21.59 kg.
  • the IBA was graded to ⁇ 10 mm and then naturally (under ambient conditions) dried for more than three days. During the drying process, the colour of the IBA changed from dark grey to light grey.
  • the feed was then fed into a plasma treatment furnace at a rate of 52.6 kg/h and a plasma was applied to produce an off-gas and a molten slag.
  • the average plasma power during feeding was 145 kW and the furnace pressure was maintained at 50 + 20 Pa. Throughout the trial, the voltage of the plasma was quite stable (200 ⁇ 50 volts).
  • the off-gas was then passed to a thermal oxidiser where flammable gases were oxidised, and then passed to a baghouse filter where secondary APC (SAPC) residues were collected. Around 4.0 kg of SAPC residues was collected from the thermal oxidiser and the baghouse filter. This does not include SAPC residue contained on the inner wall of the off-gas ducts.
  • the off-gas was then passed to a graphite-lined heat exchanger, where aqueous HCI was recovered.
  • the off-gas was then passed to a caustic wet scrubber to remove other acidic gases, before being monitored by a continuous emission monitoring system and then discharged to the atmosphere.
  • Blended materials where: 187.0 1 1.43 21.37
  • the inventors have also found that once the CI in APCR is more than 2.58% (wt/wt), the ratio of CI dispersed into off-gas as HCI(g) increases with the increase of CI contents in APCR, until CI content reaches around 11.09% (wt/wt). Above a theoretical value of about 11.09% (wt/wt), more CI will be vitrified into slag predicted to form as CaC ⁇ , rather than dispersed into off-gas, although the absolute value of HCI(g) still increases. This is undesirable as one aim of the invention is to minimise the amount of Chlorine retained in the solid process waste. In practice, the upper limit is higher since the CI does not partition as
  • H 2 0 content in raw APCR can have an effect on HCI(g) production.
  • Higher H2O content will leads higher production rate of HCI(g), and more electricity will be consumed accordingly.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Treating Waste Gases (AREA)
  • Processing Of Solid Wastes (AREA)
  • Gasification And Melting Of Waste (AREA)

Abstract

L'invention concerne un procédé pour produire du chlorure d'hydrogène (HCI) aqueux à partir d'une matière qui contient des atomes de chlore, consistant : (i) à traiter la matière au plasma dans une unité de traitement au plasma pour produire un gaz d'échappement contenant au moins certains des atomes de chlore; et (ii) à faire passer au moins une partie du gaz d'échappement sur une unité de condensation afin de récupérer le HCI sous forme aqueuse.
EP11746282.0A 2010-08-02 2011-08-02 Procédé de production de chlorure d'hydrogène Withdrawn EP2601133A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB1012985.6A GB2482485A (en) 2010-08-02 2010-08-02 A process for the production of HCl
PCT/GB2011/001160 WO2012017200A1 (fr) 2010-08-02 2011-08-02 Procédé de production de chlorure d'hydrogène

Publications (1)

Publication Number Publication Date
EP2601133A1 true EP2601133A1 (fr) 2013-06-12

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CN (1) CN103153846B (fr)
AU (1) AU2011287422B2 (fr)
BR (1) BR112013002473A2 (fr)
CA (1) CA2807280A1 (fr)
GB (1) GB2482485A (fr)
MY (1) MY157559A (fr)
WO (1) WO2012017200A1 (fr)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU184389B (en) 1981-02-27 1984-08-28 Villamos Ipari Kutato Intezet Method and apparatus for destroying wastes by using of plasmatechnic
SE451033B (sv) * 1982-01-18 1987-08-24 Skf Steel Eng Ab Sett och anordning for omvandling av avfallsmaterial med plasmagenerator
NO171473C (no) * 1984-09-21 1993-03-17 Skf Steel Eng Ab Fremgangsmaate ved destruering av miljoefarlig avfall
JPH08323133A (ja) * 1995-05-30 1996-12-10 Nippon Steel Corp 高周波誘導熱プラズマを用いた有機ハロゲン化合物の高温加水分解により発生した排ガスの無害化処理方法
FR2773724B1 (fr) * 1998-01-19 2000-02-18 Alsthom Cge Alcatel Procede de traitement de rejets gazeux d'une unite de fabrication d'une preforme de fibre optique pour recuperation de germanium
US6173002B1 (en) * 1999-04-21 2001-01-09 Edgar J. Robert Electric arc gasifier as a waste processor
KR20030067241A (ko) * 2002-02-07 2003-08-14 주식회사 유민이엔씨 고온 플라즈마를 이용한 다이옥신 및 분진 제거방법 및 그장치
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
WO2004048851A1 (fr) * 2002-11-25 2004-06-10 David Systems Technology, S.L. Procede a induction et frequence plasmique integree pour traitement de dechets, recuperation de ressources et dispositif associe
CN1218782C (zh) * 2003-05-07 2005-09-14 华南理工大学 净化工业废气的发泡镍催化剂及其制备方法和应用
CN100531865C (zh) * 2004-03-29 2009-08-26 广东杰特科技发展有限公司 流光放电等离子体烟气污染物同步净化方法
US7658155B2 (en) 2005-06-29 2010-02-09 Advanced Plasma Power Limited Waste treatment process and apparatus
US20080102011A1 (en) * 2006-10-27 2008-05-01 Applied Materials, Inc. Treatment of effluent containing chlorine-containing gas

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
None *
See also references of WO2012017200A1 *

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GB2482485A (en) 2012-02-08
WO2012017200A1 (fr) 2012-02-09
AU2011287422A1 (en) 2013-02-28
CA2807280A1 (fr) 2012-02-09
AU2011287422B2 (en) 2014-11-27
CN103153846A (zh) 2013-06-12
BR112013002473A2 (pt) 2016-05-24
MY157559A (en) 2016-06-30
CN103153846B (zh) 2016-05-25
GB201012985D0 (en) 2010-09-15

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