EP2454100A2 - Procédé de fabrication d'un corps multicouche et corps multicouche - Google Patents

Procédé de fabrication d'un corps multicouche et corps multicouche

Info

Publication number
EP2454100A2
EP2454100A2 EP10732309A EP10732309A EP2454100A2 EP 2454100 A2 EP2454100 A2 EP 2454100A2 EP 10732309 A EP10732309 A EP 10732309A EP 10732309 A EP10732309 A EP 10732309A EP 2454100 A2 EP2454100 A2 EP 2454100A2
Authority
EP
European Patent Office
Prior art keywords
layer
region
carrier
multilayer body
decorative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP10732309A
Other languages
German (de)
English (en)
Other versions
EP2454100B1 (fr
Inventor
Ludwig Brehm
René Staub
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonhard Kurz Stiftung and Co KG
Original Assignee
Leonhard Kurz Stiftung and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leonhard Kurz Stiftung and Co KG filed Critical Leonhard Kurz Stiftung and Co KG
Publication of EP2454100A2 publication Critical patent/EP2454100A2/fr
Application granted granted Critical
Publication of EP2454100B1 publication Critical patent/EP2454100B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/41—Marking using electromagnetic radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/445—Marking by removal of material using chemical means, e.g. etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • B42D25/465—Associating two or more layers using chemicals or adhesives
    • B42D25/47—Associating two or more layers using chemicals or adhesives using adhesives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24521—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24521—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface
    • Y10T428/24529—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface and conforming component on an opposite nonplanar surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24835—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including developable image or soluble portion in coating or impregnation [e.g., safety paper, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

Definitions

  • the invention relates to a method for producing a multilayer body with a carrier layer and a single-layer or multi-layer decorative layer formed on and / or in the carrier layer, and a multi-layer body obtainable thereafter.
  • optical security elements are often used to make it difficult to copy documents or products to prevent their misuse. Thus, optical security elements find use for securing
  • optically variable elements as optical security elements which can not be duplicated by conventional copying methods. It is also known
  • a structured metal layer which is in the form of a text, logo or other pattern.
  • a structured metal layer from a metal layer requires a large number of processes, in particular if fine structures are to be produced which have a high level of protection against counterfeiting.
  • a metal layer applied over the entire area by positive or negative Partial demetallization or by laser ablation to demetalize and structure it.
  • metal layers by means of using vapor masks already in structured form on a support.
  • Object of the present invention is to provide a particularly difficult
  • the object is achieved by a method for producing a multilayer body, in which
  • Transmittance and in the second region has a larger compared to the first transmittance second transmittance, wherein said transmittances refer to an electromagnetic radiation having a suitable wavelength for a photoactivation,
  • Carrier layer is arranged, c) a photoactivatable resist layer (referred to as "resist” for short) by means of said electromagnetic radiation on the first side of the
  • Carrier layer is arranged so that the resist layer is disposed on the side facing away from the carrier layer side of at least one layer to be structured and the decorative layer on the other side of the at least one layer to be structured,
  • the decorative layer serving as an exposure mask through the formation of the first region and the second region, and
  • the decorative layer defining the first region and the second region acts as an exposure mask, since the first region has a transmittance which differs from the transmittance of the second Range is lowered.
  • Such a method allows the formation of particularly forgery-proof multilayer body.
  • the decorative layer during the production of the multilayer body serves as an exposure mask for an exposure, ie a photoactivation, the photoactivatable resist layer and on the finished multilayer body for decoration.
  • the decorative layer thus fulfills several completely different functions.
  • the decorative layer is designed such that a viewer of an article decorated by means of the multilayer body can view the at least one structured layer through the decorative layer.
  • the typical transmission of the first areas of the The decorative layer is therefore at least one order of magnitude larger than the typical transmission of a conventional exposure mask, for example made of metal.
  • Resist layer structured in register with the first and second areas of the decorative layer i. the structures of the patterned resist layer are arranged in register with the first and second areas of the decorative layer.
  • the at least one layer to be structured is patterned in register with the resist layer. The method thus allows the formation of at least three to each other
  • the multilayer body has the structured layer register-accurate in the first region or in the second region of the decorative layer.
  • Register or register accuracy is to be understood as meaning the positional arrangement of superimposed layers.
  • the register accuracy or register accuracy of the layers is preferably controlled by means of register marks or register marks, which at all
  • Layers are equally present and where, preferably by means of optical detection methods or sensors, it can be easily recognized whether the layers are arranged in the register. Register accuracy is in both dimensions, i. Length and width of the layers, given. Under Register or Passer the exact succession or
  • a layer comprises at least one layer.
  • a decorative layer comprises one or more decorative and / or protective layers, in particular as
  • the decorative layers can be arranged over the entire surface or in pattern-like structured form on the carrier layer.
  • the one or more decorative layers can be formed on one or both sides of the carrier layer, for example as a base or carrier film is, be arranged.
  • the decorative layer comprises at least one layer which weakens the electromagnetic radiation with the wavelength suitable for photoactivation.
  • the decor layer has in relation to the
  • electromagnetic radiation having the wavelength suitable for photoactivation a optical density greater than zero.
  • the formation of the exposure mask as a decorative layer inevitably results in an absolutely 100% registration accuracy of the exposure mask to the decorative layer, i.
  • the decorative layer itself acts at least in areas as an exposure mask.
  • the decorative layer and the exposure mask thus form a common functional unit.
  • Exposure mask must be brought into register to the decorative layer, which can be avoided in practice registry deviations in very few cases completely.
  • the layer to be structured can be registered in register with the components without additional technological effort
  • Decorative layer defined first and second areas are structured.
  • the problem may arise that of previous, in particular thermally and / or mechanically stressing , Linear and / or nonlinear distortions in the multilayer body caused by process steps can not be completely compensated for over the entire surface of the multilayer body by alignment of the mask on the multilayer body, although the mask alignment is located on existing, preferably on the horizontal and / or vertical edges of the multilayer body , Register or registration marks.
  • the tolerance fluctuates over the entire surface of the multilayer body in a comparatively big area.
  • the first and second regions defined by the decorative layer are used as a mask, wherein the parts of the decorative layer defining the first and second regions are applied in an early process step during the production of the multilayer body.
  • the mask designed as a decorative layer is therefore subjected to all subsequent process steps of the multilayer body, and thus automatically follows all the distortions possibly caused by these process steps in the multilayer body itself.
  • no additional tolerances in particular no additional tolerance fluctuations, can occur over the surface of the multilayer body the subsequent generation of a mask and the necessary register-accurate subsequent positioning of this independent of the previous process history mask is avoided.
  • inventive methods are based only in possibly not absolutely exactly trained edges of the first and second areas whose
  • Quality is determined by the particular manufacturing process used.
  • the tolerances or register accuracies in the method according to the invention are approximately in the micrometer range, and thus far below the
  • Resolving power of the eye i.e. the unarmed human eye can no longer perceive existing tolerances.
  • the resist layer is exposed to different areas in different areas. This different exposure of the resist layer is due to the different transmittances in the first and the second
  • the structuring of the at least one layer to be patterned and the photoactivatable resist layer, which is arranged on the first side of the carrier layer, is determined by the differently intense exposure of the resist layer, which in turn is defined by the first and the second region of the decorative layer; However, the structuring is independent of any existing relief structure and not due to a
  • Relief structure in particular independent of a molded in the carrier film or in a layer arranged on the carrier film relief structure.
  • Limits of the first and the second region of the decorative layer thus correspond, seen perpendicular to the plane of the carrier layer, register the boundaries of structuring the at least one layer to be patterned and the photoactivatable resist layer, but are independent of and not limited by boundaries, in particular contours of a relief structure.
  • the decorative layer is used as an exposure mask by the formation of the first region and the second region, the exposure mask thus formed being independent of an optionally existing relief structure, in particular independently of one in the carrier film or in one on the Carrier film arranged layer shaped relief structure.
  • the at least one layer to be patterned and the resist layer are synchronized with each other
  • structuring processes structured in register with each other, this structuring being dependent on the first and second regions of the decorative layer, but independent of any relief structure that may be present,
  • the function of the decorative layer as an exposure mask is independent of the layer to be structured.
  • the physical properties, in particular the effective thickness or the optical density, of the layer to be structured have no influence on or are independent of the physical properties the decorative layer, ie the exposure mask, in particular the degrees of transmission in the first and the second region of the decorative layer.
  • the decorative layer alone and detached from any existing relief structures, in particular diffractive relief structures and other, in particular physical and / or chemical properties of the layer to be structured determines the exposure mask according to the invention.
  • the layer to be structured is not part of the exposure mask, ie in the
  • the at least one layer prefferably be structured to have a constant layer thickness over the entire surface on which it is arranged on the first side of the carrier layer. It is possible for the decorative layer to comprise a first lacquer layer which is arranged in the first region with a first layer thickness and in the second region either not or with a smaller second layer thickness than the first layer thickness on the carrier layer, so that the decorative layer in the first region the said first transmittance and in the second region the said second transmittance.
  • the decorative layer comprises a first coloring of the carrier layer which is formed in the first region with a first layer thickness and in the second region either not or with a smaller compared to the first layer thickness second layer thickness, so that the decorative layer in the first region has said first transmittance and in said second region said second transmittance.
  • the coloring of the carrier layer may be formed as a colored or discolored area within the carrier layer.
  • a preferred method for forming a coloring of the carrier layer is a laser marking in the carrier layer with
  • Color change or a process in which pigments or dyes are allowed to diffuse into the carrier layer An example of a laser marking in the form of blackening or
  • PC polycarbonate
  • Such carrier layers are described, for example, in EP 0 991 523 B1 or EP 0 797 511 B1.
  • Dyes is the printing of the carrier layer with a solvent-containing color coat, the subsequent intermittent exposure of the color coat and the subsequent washing off of the color coat.
  • solvent (s) in the colored lacquer By the solvent (s) in the colored lacquer, the surface of the material of the carrier layer is partially attacked, whereby parts of the colored lacquer are at least in the upper layers of the carrier layer located in the region of the attacked surface
  • the material of the carrier layer is to be selected so that it can be attacked by a solvent used in the paint.
  • a solvent used in the paint Such a combination may e.g. a carrier layer of polycarbonate and a lake based on aromatic solvents. After removal of the colored lacquer, the diffused component of the colored lacquer remains in the carrier layer.
  • Layer thickness of the applied color coat and depending on the selection of the material of the carrier layer different amounts of pigments or dyes can diffuse into the carrier layer at different depths.
  • a slight blurring arises at the edges of the first and / or second regions, the horizontal extent of which however lies only in the region of the preferably vertical layer thickness of the printed color coat.
  • vertical refers to an extent substantially perpendicular to the carrier layer, and “horizontal” to an extent substantially in the plane formed by the carrier layer.
  • a color coat of a few micrometers for example 1 to 10 .mu.m
  • the fuzziness is also only in this range of 1 to 10 .mu.m and thus far below the resolution of the eye.
  • Another example of a process for diffusing pigments or dyes is the partial printing of a carrier layer with a liftoff lacquer for covering the second regions.
  • the support layer is exposed to an atmosphere of a vaporized colorant, for example, an atmosphere of an inert gas such as argon or nitrogen and vaporized iodine.
  • the vaporized colorant now diffuses into the carrier layer.
  • apolar solvents such as toluene or gasoline
  • UV blocker ultraviolet
  • the lift-off lacquer must be resistant to the solvents of the bath, eg as a water-soluble lift-off lacquer.
  • the dye and optionally the UV blocker diffuse into the first areas of the carrier layer not covered by the lift-off lacquer in the bath and thereby color the carrier layer.
  • the lift-off lacquer can be removed from the carrier layer.
  • Another example of a method for diffusing pigments or dyes is the printing of the carrier layer by means of a
  • an additional mask can be used, which is arranged between the thermal print head and the carrier layer and covers areas of the carrier layer which are not to be inked.
  • a layer of the decorative layer is formed as a layer of substantially uniform thickness and the layer only in regions, ie in a pattern-like structured form, is formed on and / or within the carrier layer.
  • the decorative layer it is possible for the decorative layer to comprise only layers applied on one side of the carrier layer or layers applied on both sides of the carrier layer.
  • the object is further achieved by a multi-layer body with a
  • Carrier layer having a first side and a second side, and a formed on and / or in the carrier layer single or multi-layer decorative layer having a first region and a second region, wherein the decorative layer seen perpendicular to the plane of the carrier layer in the first Range has a first transmittance and in the second region has a second compared to the first transmittance second transmittance, wherein said transmittances refer to an electromagnetic radiation having a suitable wavelength for a photoactivation, wherein the
  • Multilayer body also has at least one structured in the register to the first region and the second region layer.
  • the multilayer body according to the invention can be used, for example as a label, laminating, hot stamping or transfer film, to provide an optical security element used for securing documents, banknotes, credit and debit cards, identity cards, packaging of high-quality products and the like.
  • the decorative layer and the at least one register-specific arranged structured layer can serve as optical security element.
  • first area and / or in the second area When an arrangement of an object in the first area and / or in the second area is described below, it is to be understood that the object is arranged so that the object and the first and / or the second area of the decorative layer perpendicular to the plane of Overlap carrier layer seen. Also, in the following, the terms "first area” and "second area” will be applied to other objects, e.g.
  • a first / second area of an article means that the first / second region of the decorative layer and the first / second region of the article are congruent as viewed perpendicular to the plane of the carrier layer.
  • the exposure mask formed by the decoration layer includes the first region and the second region that have a different transmittance with respect to the radiation used in the exposure.
  • Exposure mask therefore has no absolutely impermeable area for the radiation used in the exposure, but only an area with a higher transmittance and an area with a smaller one
  • Transmittance and can therefore be referred to as a halftone mask.
  • the photoactivatable layer is activated to a lesser extent than the photoactivated layer exposed through the second region because the first region has a smaller transmittance than the second region.
  • Exposure refers to the selective irradiation of a photoactivatable layer by means of a
  • Exposure mask with the aim of locally changing the solubility of the photoactivatable layer by a photochemical reaction According to the nature of the photochemically achievable solubility change, a distinction is made between the following photoactivatable layers which can be formed as photoresists: In a first type of photoactivatable layers (eg negative resist), their solubility decreases as a result of exposure compared to unexposed areas of the layer For example, because the light leads to the curing of the layer, in a second type of photoactivatable
  • Layers decreases their solubility Exposure compared to unexposed areas of the layer, for example, because the light leads to the decomposition of the layer.
  • Photoresist disposed in the second region faster and better than the material of the resist layer, which is arranged in the first region.
  • the resist layer can be patterned, i. the resist layer is removed in the second region, but remains in the first region.
  • the layer to be structured is removed in the first or second region in which the resist layer has been removed. This can be done by an etchant such as an acid or alkali. It is preferable if the partial removal of the resist layer in the first or second region and thereby exposed in the first or second region
  • Regions of the layer to be structured takes place in the same process step. This can be achieved in a simple manner by a solvent / etchant such as a lye or acid which is capable of both the resist layer - with a positive resist in the exposed area, with a negative resist in the
  • the resist layer must be formed such that it uses the solvent or etchant used to remove the layer to be structured when using a positive resist in the unexposed area, when using a negative resist in the exposed area at least for a sufficient time, ie for the contact time Resists the solvent or etchant.
  • Multi-layered bodies whose durability and durability are increased because adhesion problems between adjacent layers are minimized.
  • the optical appearance of the multilayer body can be improved, since after removal of the resist, which in particular is colored and / or not completely transparent, but can only be translucent or opaque, the underlying areas are exposed again.
  • the resist on the structured layer without applications requiring particularly high resistance or optical appearance. Leaving the resist on the patterned layer may be particularly advantageous if it is designed as a relatively stable negative resist and has been colored.
  • the resist can be printed to with two or more colors too. Thus, when viewing the multi-layer body from different sides different color impressions can be realized.
  • the resist layer is exposed from the side of the carrier layer facing away from the resist layer by means of the said electromagnetic radiation, the decorative layer being formed by forming the at least one first region and the at least one second region
  • Exposure mask is used.
  • the at least one layer to be structured is structured by means of the photoactivatable layer removed after exposure in the at least one first region or the at least one second region in register with the at least one first region and the at least one second region.
  • the resist layer comprises a UV-activatable material.
  • UV radiation can be used for the exposure step d).
  • the exposure step d) is designed such that the radiation completely penetrates the resist layer, that is, it reaches its outer surface facing away from the carrier layer. Only then is it easily possible to remove the resist by means of a solvent from the side of the outer surface of the resist layer. If the resist is not completely irradiated, it generally has a "skin" on its outer surface facing away from the carrier layer, which at least partially prevents the attack of a solvent.
  • Carrier material based on polyvinyl alcohol and polyvinyl acetate
  • Polyester carrier based on aliphatic raw materials.
  • Wavelength partially penetrates the decorative layer in the first area.
  • the by the Decor layer trained exposure mask is so in the first area
  • Transmittance is equal to or greater than two.
  • the ratio between the first and the second transmittance is preferably 1: 2, also referred to as contrast 1: 2.
  • a contrast of 1: 2 is at least one
  • At least one layer can be structured, preferably directly on the first side of the carrier layer, at least one functional layer, in particular a
  • Release layer and / or a protective lacquer layer is arranged. This is particularly advantageous when using the multilayer film as a transfer film, in which the functional layer easily removes the
  • Carrier layer of a transfer layer the at least one layer of the
  • Decor layer and the structured layer includes allows. It has proven useful if the thickness and the material of the decorative layer is chosen such that the electromagnetic radiation, measured after passing through a layer package consisting of the carrier layer, the at least one functional layer and the decorative layer, in the first region
  • Relief structure is formed, and that the at least one layer to be structured on the surface of the at least one relief structure is arranged.
  • it may be provided on the first side of the carrier layer a
  • a replication layer is generally understood as meaning a layer which can be produced superficially with a relief structure. Fall under it
  • organic layers such as plastic or lacquer layers or inorganic layers such as inorganic plastics (for example silicones),
  • the replication layer be as a
  • a radiation-curable replication layer can be applied to the carrier layer, a relief can be shaped into the replication layer, and the replication layer can be cured with the embossment embossed therein. It is preferred if the relief is a light diffractive or refractive or light scattering, microscopic or macroscopic structure, such as a diffractive structure or a Diffraction grating or a matte structure or combinations of light diffractive or refractive or light scattering, microscopic or
  • macroscopic structures such as diffractive structures, matte structures or diffraction grating is formed.
  • the at least one relief structure can be arranged at least partially in the first region and / or in the second region.
  • the surface layout of the relief structure can be adapted to the surface layout of the first and second regions, in particular in the register, or the surface layout of the relief structure is, for example, as a continuous endless pattern independent of the surface layout of the first and the second
  • structuring layer is arranged, it is possible to arrange the layer to be structured at least partially on a relief structure, in contrast to patterning processes using washcoat.
  • washcoat comprising silica (or silica) or titanium dioxide (e.g., rutile)
  • the silica and titania by mechanical action destructively act on the surface of the replication roll, particularly with a nickel surface.
  • the differences in level between the washcoat layer and the underlying layer into which the relief structure is to be imprinted impede replication.
  • the layer to be structured is formed as a structured layer. It is preferred if after step e) the structured layer and the
  • Resist layer is removed in the first or the second region and is present in the other region.
  • the leveling layer can Recessed areas / wells of the structured layer are at least partially filled. It is possible that by applying the compensating layer, recessed regions / depressions of the resist layer are at least partially filled.
  • the leveling layer may comprise one or more different layer materials.
  • the compensation layer may be formed as a protective and / or adhesive and / or decorative layer. It is possible that on the side facing away from the carrier layer side of the compensation layer a
  • Adhesive layer, z. B. adhesive layer is applied.
  • the substrate can be, for example, paper, cardboard, textile or another fibrous material, or a plastic and in that case flexible or predominantly rigid.
  • at least one layer of the decorative layer is applied to the second side of the carrier layer.
  • one or more layers of the at least one layer can be removed again after the exposure step in which the decorative layer serves as an exposure mask. It is therefore possible that one or more layers of the applied on the second side of the carrier layer at least one layer of the decorative layer after the
  • Exposure step d) are removed again from the carrier layer.
  • the visible light decorative layer having a wavelength in a range of about 380 to 750 nm is at least partially transmissive. It is possible if the decorative layer is colored with at least one opaque and / or at least one transparent colorant which is colored or at least in a wavelength range of the electromagnetic spectrum
  • the coloration can be substantially constant over the entire colored surface area or can also be formed as a continuous color gradient, for example a linear or radial color gradient, ie the coloration has a gradient, the coloration in particular being able to vary between two or more color tones, for example, from red to blue and further to green or between one or more shades and an achromatic, for example between red and transparent, ie a non-colored decorative layer.
  • a linear or radial color gradient ie the coloration has a gradient
  • the coloration in particular being able to vary between two or more color tones, for example, from red to blue and further to green or between one or more shades and an achromatic, for example between red and transparent, ie a non-colored decorative layer.
  • Such color gradients are known and widely used in security printing because their forgery is difficult.
  • the decorative layer fulfills a dual function. On the one hand serves the
  • Decor layer as an exposure mask for forming at least one structured layer, which is arranged register accurate to the first and second region of the decorative layer.
  • the decorative layer serves as an exposure mask for a partial demetallization of a metal layer.
  • the decorative layer, or at least one or more layers of the decorative layer serves on the multi-layer body as an optical element, in particular as a single- or multi-colored ink layer for coloring the at least one structured layer, the ink layer registering over and / or next to / adjacent to the at least one structured layer is arranged.
  • the multi-layer body in the first area or the second area to have a photo-activatable resist layer, wherein the at least one structured layer and the resist layer are arranged precisely aligned with one another on the first side of the carrier layer such that the resist layer on the of the carrier layer facing away from the at least one structured layer and the decorative layer is arranged on the other side of the at least one structured layer.
  • the decorative layer to comprise a first lacquer layer which is arranged in the first region with a first layer thickness and in the second region either not or with a smaller second layer thickness compared to the first layer thickness on the carrier layer, so that the decorative layer in the first region the said first transmittance and in the second region the said second transmittance.
  • the decorative layer comprises a first coloring of the carrier layer, which is formed in the first region with a first layer thickness and in the second region either not or with a smaller compared to the first layer thickness second layer thickness, so that the decorative layer in the first region has said first transmittance and in said second region said second transmittance.
  • the ratio between the second transmittance and the first transmittance is greater than two.
  • Relief structure formed and the at least one layer to be structured on the surface of the at least one relief structure is arranged.
  • a replication layer to be arranged on the first side of the carrier layer and for the at least one relief structure to be embossed in a surface of the replication layer facing away from the carrier layer.
  • the at least one relief structure is embossed in the carrier layer. It is possible that the relief structure as a diffractive relief structure
  • the at least one relief structure is arranged at least partially in the first region and / or in the second region. It is possible that on the side facing away from the carrier layer of the
  • Adhesive layer is formed. It is possible that at least one layer of the decorative layer is arranged on the second side of the carrier layer. It is possible that the decorative layer at least two, different color impressions
  • the decorative layer comprises causing lacquer layers. It is possible for the decorative layer to comprise a first lacquer layer, which is applied only in regions on the carrier layer, and a second lacquer layer, which is applied over the entire surface to the carrier layer.
  • the at least one structured layer is not limited to the mentioned exemplary embodiments.
  • the layer to be patterned may be any material that is vulnerable, ie detachable or removable, to a solvent or etchant. It is possible that the at least one structured layer has a thickness in the range of 20 to 1000 nm, in particular 20 to 100 nm. It is preferable that the patterned layer of the multi-layered body as a reflection layer for light incident from the side of the replication layer. By combining a relief structure of the replication layer and an arranged underneath, for example as
  • Metal layer formed structured layer can be a variety of different and effective for security aspects usable optical effects.
  • the structured layer may consist of metal, for example aluminum or copper or silver, which in a subsequent
  • Process step is galvanically reinforced.
  • the metal used for galvanic reinforcement may be the same or different than the metal of the patterned layer.
  • An example is e.g. the galvanic reinforcement of a thin silver layer with copper.
  • the resist layer has a thickness in the range of 0.3 to 3 ⁇ m. It has been found to be useful if the resist layer is formed as an etching resist, wherein the resist layer, if it is formed as a positive photoresist, in the unexposed area and, if it is formed as a negative photoresist, in the exposed area opposite to one
  • structuring layer attacking etchant has a high resistance, which is sufficient to prevent the access of the etchant to the layer to be patterned in the area covered by the resist layer substantially at least until the etchant has removed the layer to be patterned in the desired area.
  • the said desired area is, if the resist layer is formed as a positive photoresist, the exposed area and, if the resist layer is formed as a negative photoresist, the unexposed area.
  • the decorative layer has a thickness in the range of 0.5 to 5 microns. It is possible that the decorative layer dyes or finely divided
  • Pigments in particular a Mikrolith ® -K pigment dispersion has. This is particularly advantageous in a colored decorative layer with pigment content. It is it is possible to add UV absorbers to the decor layer forming material, especially if this material contains relatively few pigments or other UV absorbing components. It is possible that the decorative layer comprises inorganic absorbers with a high proportion of scattered particles, in particular nanoscale UV absorbers based on inorganic oxides. TactedeO 2 and ZnO, in particular, have proved to be suitable oxides in highly dispersed form, as are also used in sunscreen creams with a high sun protection factor. These inorganic absorbers lead to a high degree of scattering and are therefore particularly suitable for a matt, in particular semi-gloss, coloring of the decorative layer.
  • the decorative layer has organic absorbers, in particular benzotriazole derivatives, with a mass fraction in the range of about 3% to 5%. Suitable organic absorbers are sold under the trade name Tinuvin ® from Ciba, Basel, Switzerland. It is possible that the decorative layer comprises fluorescent dyes or organic or inorganic fluorescent pigments in combination with finely divided pigments, especially Mikrolith ® -K. By excitation of these fluorescent pigments, the UV radiation is filtered out for the most part already in the decorative layer, so that only an insignificant fraction of the
  • the fluorescent pigments can be used in the multilayer body as an additional security feature.
  • a UV absorber which acts transparent in the visual wavelength range, in the decorative layer the property "color" of the decorative layer in the visual wavelength range of desired properties of the decorative layer for structuring the resist layer, eg sensitive in the near UV, and thereby the at least one to be structured In this way, a high contrast between the first and the second area can be achieved, regardless of the visually discernible coloration of the
  • the carrier layer is formed as a single-layer or multi-layer carrier film.
  • Multi-layer body in the range of 12 to 100 microns has been proven.
  • a material for the carrier film comes, for example, PET, but also others
  • FIG. 1a is a schematic section of a first manufacturing stage of the in Fig.
  • Fig. 1b-c are schematic sections of two alternative embodiments of a first manufacturing stage
  • Fig. 1d is a schematic plan view of the first shown in Fig. 1a
  • Fig. 8a shown multilayer body
  • FIG. 2a shows a schematic section of an alternative embodiment of a second manufacturing stage
  • FIG. 3 shows a schematic section of a third manufacturing stage of the embodiment shown in FIG.
  • Fig. 4 is a schematic section of a fourth manufacturing stage of in
  • Fig. 8a shown multilayer body
  • Fig. 8a shown multilayer body
  • Fig. 6 is a schematic section of a sixth manufacturing stage of in
  • Fig. 8a shown multilayer body
  • Fig. 7 is a schematic section of a seventh manufacturing stage of in
  • Fig. 8a shown multilayer body; 7a shows a schematic section of an eighth manufacturing stage of the in
  • Fig. 8a shown multilayer body
  • Fig. 8a is a schematic section of a first embodiment
  • a multilayer body according to the invention formed using a positive resist
  • Fig. 8b is a schematic section of an alternative
  • FIG. 9 shows a schematic section of a further exemplary embodiment of a multilayer body according to the invention, formed below
  • FIG. 10 shows a schematic section of a further embodiment of a multilayer body according to the invention.
  • FIG. 12 shows a schematic section of a further embodiment of a multilayer body according to the invention.
  • FIG. 13 is a schematic section of a manufacturing stage of a
  • Fig. 15 transmission spectra of various UV absorbers.
  • FIGS. 1a to 14 are each drawn diagrammatically and not to scale in order to ensure a clear representation of the essential features.
  • FIG. 8 a shows a multilayer body 100 which has a carrier layer 1 with a first side 11 and a second side 12, a functional layer 2 arranged on the first side 11 of the carrier layer 1, one on the functional layer 2
  • arranged decorative layer 3 with a first lacquer layer 31 formed in a first region 8, a replicating layer 4 adjacent to the decorative layer 3, a structured layer 5 arranged on the replicating layer 4 in the register for first resist layer 3 and on the replication layer 4 and the structured layer 5 arranged equalization layer 10 includes.
  • the carrier layer 1 is a preferably transparent
  • the carrier film 1 can hereby be monoaxially or biaxially stretched.
  • the carrier foil 1 not only to consist of one layer, but also of several layers.
  • the carrier film 1 it is possible, for example, for the carrier film 1 to have, in addition to a plastic carrier, for example a plastic film described above, a release layer which makes it possible to detach the layer structure consisting of the layers 2 to 6 and 10 from the plastic film, for example when using the
  • Multi-layer body 100 as a hot stamping foil
  • the functional layer 2 may comprise a release layer, for example of hotmelting material, which facilitates detachment of the carrier foil 1 from the layers of the multilayer body 100, which are arranged on a side of the release layer 2 facing away from the carrier foil 1.
  • a release layer for example of hotmelting material
  • This is particularly advantageous when the multi-layer body 100 is formed as a transfer layer, as used for example in a hot stamping process or an IMD process.
  • a protective layer for example a protective lacquer layer.
  • the protective layer forms one of the upper layers on the surface of the substrate arranged layers and layers arranged underneath protect from abrasion, damage, chemical attack or the like.
  • Multilayer body 100 may be a portion of a transfer film, for example a hot stamping foil, which may be disposed on a substrate by means of an adhesive layer.
  • the adhesive layer is preferably arranged on the side of the compensation layer 10 facing away from the carrier film 1.
  • the adhesive layer may be a hot melt adhesive which melts upon thermal exposure and bonds the multi-layer body 100 to the surface of the substrate.
  • a further carrier film may be provided on the side facing away from the carrier film 1
  • This laminate body which consists of two outer side carrier films and the inner layers of the
  • Multilayer body 100 is, for example, can be laminated for further use in card composites, for example from PC.
  • the carrier films made of the same material as those on the
  • Laminate body adjacent layers of the card composite for example, also made of PC.
  • a transparent, colored lacquer layer 31 is printed in the region 8.
  • Transparent means that the lacquer layer 31 is at least partially transparent to radiation in the visible wavelength range.
  • Colored means that the varnish layer 31 shows a visible color impression with sufficient daylight.
  • unprinted areas 9 of the functional layer 2 are of a
  • the replication layer 4 has a relief structure in a second zone 42 on, which is not present in a first zone 41. In the register and at
  • a thin metal layer 5 is arranged on the replication layer 4.
  • Both the regions 8 of the replication layer 4 covered by the metal layer 5 and the uncovered regions 9 of the replication layer 4 are covered with a compensation layer 10, the structures caused by the relief structure 42 and the metal layer 5 arranged in regions 8 (eg relief structure 42, different layer thicknesses, Height offset) equalized, ie covered and fills, so that the multi-layer body on the side facing away from the carrier film 1 side of the compensation layer 10 has a flat, substantially featureless surface. If the compensation layer 10 has a similar refractive index as the replication layer 4, i.
  • FIGS. 1a to 7a now show production stages of the multilayer body 100 shown in FIG. 8a. Identical elements as in FIG. 8a are designated by the same reference numerals.
  • FIG. 1a shows a first production stage 100a of the multilayer body 100, in which a functional layer 2 and a decorative layer 3 are arranged on a first side 11 of a carrier foil 1.
  • a functional layer 2 adjoins the carrier film 1, its other side adjoins the decorative layer 3.
  • the decorative layer 3 has a first region 8, in which a lacquer layer 31 is formed, and a second region 9, in which the lacquer layer 31 is absent is on.
  • Varnish layer 31 is printed on the functional layer 2, e.g. by
  • FIG. 1d shows a top view of the first manufacturing stage 100a of the multilayer body 100 shown in FIG. 1a with a viewing direction perpendicular to the plane of the carrier film 1.
  • the lacquer layer 31 is printed in the first region 8 on the functional layer 2 arranged over the entire surface on the carrier film 1. while the second area 9 of the functional layer 2 does not coincide with the
  • the first region 8 consists of two rectangular areas.
  • the first region 8 provided with the lacquer layer 31 may have any desired shape, e.g. alphanumeric characters, symbols, logos, fine line patterns, e.g. Grid, or ornaments, e.g. Guilloche, geometric, figurative or figurative pattern.
  • a sectional plane Ia is indicated; when looking at the sectional plane Ia in the direction indicated by the arrows, the section shown in Figure 1a results.
  • FIG. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1a shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • Fig. 1b shows an alternative embodiment of a first manufacturing stage of a multilayer body according to the invention.
  • the decorative layer 3 is not formed on the carrier film 1, but in the carrier film 1.
  • the carrier film 1 consists of three layers 1a, 1b and 1c.
  • the two outer layers 1a and 1c are made of PC.
  • middle layer 1b consists of a plastic material, such as a PC offset with additives, which on exposure to laser radiation of a certain energy shows a color change from a transparent, colorless, first state to a transparent, colored, second state, ie so-called laser blackening.
  • the plastic material remains in the once reached second state, even after the laser radiation has been removed.
  • 1c shows a further alternative embodiment of a first manufacturing stage of a multilayer body according to the invention. As in the embodiment shown in Fig. 1b is also shown in Fig. 1c
  • the decorative layer 3 is not formed on the carrier film 1, but in the carrier film 1.
  • the carrier film 1 consists of a plastic material in which dye / color pigments can diffuse.
  • Decor layer 3 the second surface 12 of the carrier film 1 in the first region 8 was brought into contact with a substance for a certain period of time, from which color pigments can diffuse into the carrier film 1. During this period, a part of these color pigments diffused into the carrier film 1, so that the discolored areas 34 with a certain layer thickness
  • the carrier film 1 is at the same time decorative layer and carrier.
  • FIG. 2 shows a second fabrication stage 100b of the multilayer body 100, which is formed from the first fabrication stage 100a in FIG. 1a, by focusing on the functional layer 2 and the region-wise, i. H. Restricted to the first region 8, disposed thereon lacquer layer 31 a replication 4
  • the order of the replication layer 4 is provided here over the entire surface.
  • the layer thickness of the replication layer 4 varies, as it compensates for the different levels of the decorative layer 3 comprising the printed first area 8 and the unprinted second area 9; In the first region 8, the layer thickness of the replication layer 4 is thinner than in the second region 9, so that the side of the replication layer 4 facing away from the carrier layer 1 has a flat, substantially featureless surface before the formation of the relief structure in the second zone 42.
  • Multi-layer body 100 may be provided.
  • the surface of the replication layer 4 is patterned by known methods in a second zone 42 while unstructured in a first zone 41.
  • a second zone 42 while unstructured in a first zone 41.
  • Replication Layer 4 A thermoplastic replicate varnish by printing, spraying or painting and applied a relief structure in the second zone 42 in the particular thermally curable / dryable replication varnish 4 by means of a heated punch or a heated replicating roller.
  • the replication layer 4 can also be a UV-curable replication varnish, which is structured, for example, by a replication roller and
  • the structuring can also be produced by UV irradiation through an exposure mask. In this way, the second zone 42 can be molded into the replication layer 4.
  • FIG. 2 a shows an alternative second production stage of a multilayer body, which is formed from the first manufacturing stage shown in FIG. 1 b, by embossing a relief structure 42 into the first side 11 of the carrier film 1.
  • the carrier foil 1 is at the same time a decorative layer, carrier and replication layer.
  • alternatives are also possible in which only a relief structure is embossed in the carrier layer 1, but the carrier layer 1 itself does not serve as a decorative layer.
  • FIG. 3 shows a third manufacturing stage 100c of the multilayer body 100, which is formed from the second manufacturing stage 100b in FIG. 2, in that the layer 5 to be structured has been applied to the replication layer 4.
  • This layer 5 to be patterned can be used, for example, as a vapor-deposited metal layer, e.g. made of silver or aluminum, be formed.
  • the order of the layer to be structured is provided here over the entire area. However, an application may also be provided only in a partial region of the multilayer body 100, e.g. with the aid of a partially shielding vapor deposition mask.
  • FIG. 4 shows a fourth manufacturing stage 100d of the multilayer body 100, which is formed from the third manufacturing stage 100c in FIG
  • photoactivatable resist layer 6 was applied to the layer 5 to be structured.
  • the resist layer 6 may be an organic layer which is replaced by classical ones
  • Coating process such as printing, casting or spraying, is applied in liquid form. It can also be provided that the resist layer 6 is vapor-deposited or laminated as a dry film.
  • the photoactivatable layer 6 may, for example, be a positive photoresist BAZ 1512 or AZ P 4620 from Clariant or S1822 from Shipley, which has an areal density of from 0.1 g / m 2 to 10 g / m 2 , preferably from 0, 1 g / m 2 to 1 g / m 2 is applied to the layer 5 to be structured.
  • the layer thickness depends on the desired resolution and the process. The order is provided here over the entire area. However, an application may also be provided only in a partial area of the multilayer body 100.
  • FIG. 5 shows a fifth production stage 100d of the multilayer body 100, in which the multilayer body 100 present after the fourth production stage 100d is irradiated.
  • Electromagnetic radiation 7 having a wavelength suitable for activating the photoactivatable resist layer 6 is produced from the second side 12 of the support film 1, i. the side of the carrier film 1 which is opposite to the side of the carrier film 1 coated with the resist layer 6 is blasted through the multilayer body 100d.
  • the irradiation serves to activate the photoactivatable resist layer 6 in the second region 9, in which the
  • Decor layer 3 has a higher transmittance than in the first area 8 identifies.
  • the strength and duration of the exposure to the electromagnetic radiation 7 is matched to the multi-layer body 100e such that the
  • Radiation 7 in the second region 9 leads to activation of the photoactivatable resist layer 6, on the other hand, does not lead to activation of the photoactivatable resist layer 6 in the first region 8 printed with the lacquer layer 31. It has proven useful if the contrast between the first region 8 and the second region 9 caused by the lacquer layer 31 is greater than two. Furthermore, it has proven useful if the lacquer layer 31 are designed such that the radiation 7 after passing through the entire multi-layer body 10Oe has a ratio of the transmittances, ie a contrast ratio of about 1: 2 between the first region 8 and the second region 9.
  • FIG. 6 shows a "developed" sixth manufacturing stage 100e of FIG. 6
  • Multilayer body 100 which is formed from the fifth manufacturing stage 100d in FIG. 5, by adding a developer solution, e.g. As solvents or alkalis, in particular a sodium carbonate solution or a sodium hydroxide solution on the side facing away from the carrier film 1 surface of the exposed developer solution, e.g. As solvents or alkalis, in particular a sodium carbonate solution or a sodium hydroxide solution on the side facing away from the carrier film 1 surface of the exposed
  • a developer solution e.g. As solvents or alkalis, in particular a sodium carbonate solution or a sodium hydroxide solution
  • photoactivated resist layer 6 has acted. This is the exposed one
  • Resist layer 6 has been removed in the second region 9. In the first region 8, the resist layer 6 is obtained because it absorbed in these regions
  • the resist layer 6 is therefore formed from a positive photoresist. In such a photoresist, the more exposed areas 9 in FIG.
  • Developer solution e.g. the solvent, soluble.
  • unexposed and less exposed portions 8 are soluble in the developing solution, as explained later in the embodiment shown in FIG.
  • FIG. 7 shows a seventh fabrication stage 100f of the multilayer body 100, which is formed from the sixth fabrication stage 100e in FIG. 6, by removing the layer 5 to be patterned in the second region 9 by an etchant. This is possible because in the second area 9 the to
  • the structuring layer 5 is not protected by the developed as resist mask developed resist layer 6 from the attack of the etchant.
  • the etchant may be, for example, an acid or alkali. In this way, the regions of the structured layer 5 shown in FIG. 7 are formed.
  • FIG. 7 a shows an eighth manufacturing stage 100 g of the multilayer body 100, which is formed from the seventh manufacturing stage 100 f in FIG
  • the resist of the resist layer 6 is generally only slightly resistant chemically since it must be vulnerable to attack by the developer solution in the present process On the multi-layer body, it would therefore be possible for the remaining areas of the resist layer 6 to weaken the stability and durability of the security element, such as counterfeiting the multilayer body using solvents or acids or alkalis
  • this disadvantage can be avoided that certain resists are chemically only slightly resistant, ie sensitive to solvents, but can also be exploited on a case-by-case basis after application of the multilayer body 100 to a substrate, in particular the surface of a security document, the resist is added together with a dye staining the resist
  • the layer 5 to be structured can be structured in register with the first and second regions 8 and 9 defined by the lacquer layer 31 without additional technological effort.
  • Mask exposure where the mask is either a separate unit, e.g. is present as a separate film or as a separate glass plate / glass roller, or as a subsequently printed layer, the problem arises that by previous, in particular thermally and / or mechanically consuming process steps, e.g. in creating the replication structure 42 in the replication layer 4,
  • Multi-body arranged arranged register or registration marks fluctuates over the entire surface of the multi-layer body 100 in a relatively large area.
  • the first and second regions 8 and 9 defined by the lacquer layer 31 are used as a mask, wherein the lacquer layer 31 is used in an early process step in the production of the
  • Multilayer body 100 is applied as described above. As a result, no additional tolerances and no additional
  • Registration accuracies in the method according to the invention lie only in the not absolutely exact course of the color edge of the first and second regions 8 and 9 defined by the lacquer layer 31, the quality of which is determined by the respectively applied printing method, and are approximately in the micrometer range, and thus far below the resolution of the eye; i.e. the unarmed human eye can no longer perceive existing tolerances.
  • the multilayer body 100 shown in FIG. 8a is formed from the manufacturing stage 100g of the multilayer body 100 shown in FIG. 7a by applying a compensating layer 10 to the exposed structured layer 5 arranged in the first region 8 and to the region 9 arranged in the second region structuring layer 5 and the photoresist layer 6 exposed replication layer 4 is applied.
  • a compensating layer 10 to the exposed structured layer 5 arranged in the first region 8 and to the region 9 arranged in the second region structuring layer 5 and the photoresist layer 6 exposed replication layer 4 is applied.
  • Compensation layer 10 is provided here over the entire surface.
  • the leveling layer 10 it is possible for the leveling layer 10 to be applied in each of the first area 8 and the second area 9 in a different layer thickness, e.g. by squeezing, printing or spraying, so that the
  • Leveling layer 10 on its side facing away from the carrier layer 1 side a level, having substantially structureless surface.
  • the layer thickness of the compensation layer 10 varies, since it compensates for the different levels of the structured layer 5 arranged in the first region 8 and the replication layer 4 exposed in the second region 9. In the second region 9, the layer thickness of the compensation layer 10 is greater than the layer thickness of
  • structured layer 5 is selected in the first area 8, so that the of the
  • Carrier layer 1 side facing away from the compensation layer 10 has a flat surface.
  • an application of the compensating layer 10 may also be provided only in a partial region of the multilayer body 100. It is possible for one or more further layers, e.g. an adhesive or adhesive layer. It is also possible in an advantageous manner for the adhesion or adhesive layer to assume the level-compensating effect of the compensation layer 10, so that no separate compensation layer 10 is necessary.
  • Fig. 8b shows an alternative embodiment of that shown in Fig. 8a
  • Multilayer body 100 which is formed from the manufacturing stage 100f of the multilayer body 100 shown in FIG. 7a, by an equalization layer 10 on the areas of the resist layer 6 remaining in the first area 8 and on the layer 5 arranged in the second area 9 and the photoresist layer 6 exposed
  • Replication layer 4 is applied.
  • the multilayer body shown in FIG. 8 b therefore comprises the areas of the resist layer 6 that have remained.
  • FIG. 9 shows an alternative embodiment according to the invention.
  • Multilayer body 100 ' in which, in contrast to the multilayer body 100 shown in FIG. 8, a negative resist layer 6 has been used instead of a positive resist layer 6.
  • the structured layer 5 and the resist layer 6 are not arranged like the lacquer layer 31 in the first region 8, but in the second region 9.
  • the structured layer 5 and the resist layer 6 of the alternative multilayer body 100 ' are similar to those in FIG. 8 shown multilayer body 100 in register with the range limits of the areas 8, 9 of the lacquer layer 31 is arranged, but not congruent to the lacquer layer 31, but in the unprinted spaces 9 of the lacquer layer 31st
  • FIG. 10 shows a multilayer body 100 ", in which the decorative layer 3 consists of a partially formed lacquer layer 31 which is arranged on the second side 12 of the carrier foil 1, the second side 12 of the first side 11 of the carrier foil 1 on which the structured one Layer 5 is arranged opposite.
  • FIGS. 11a to 11g show a schematic representation of different embodiments of the decorative layer 3 according to the invention
  • Carrier sheet 1 shown with a bottom and a top, on which a decorative layer 3 comprising a first region 8 and / or a second region 9 is arranged in different arrangements. At all shown
  • Embodiments may be the top either the first or the second side of the multilayer body according to the invention.
  • first lacquer layer and a “second lacquer layer”, it is meant that these are two
  • paint layers e.g. with different optical properties such as color and / or different mechanical
  • FIG. 11a shows the variant already shown in FIG. 10, in which the decorative layer 3 consists of a first lacquer layer 31 arranged in the first region 8 on the upper side of the carrier foil 1 and not present in the second region 9.
  • FIG. 11b shows a variant in which the decorative layer 3 consists of a first lacquer layer 31 which is arranged over the full area on the upper side of the carrier foil 1 and which has a greater thickness in the first region 8 than in the second region 9.
  • 11c shows a variant in which the decorative layer 3 consists of a first lacquer layer 31 arranged in the first region 8 on the upper side of the carrier foil 1 and a second lacquer layer 32 likewise arranged on the upper side of the carrier foil 1 in the second region 9.
  • the lacquer layers 31 and 32 can be
  • the decorative layer 3 consists of a first lacquer layer 31 arranged in the first region 8, which is not present in the second region 9.
  • the first lacquer layer comprises two layer elements, wherein a first layer element on the upper side of the carrier foil 1 and a second one
  • Layer element is arranged on the underside of the carrier film 1.
  • the decorative layer 3 comprises a first lacquer layer 31 having a first thickness arranged in the first region 8 on the upper side of the carrier foil 1 and a first lacquer layer 31 arranged in the second region 9 on the lower side of the carrier foil 1 second thickness, which is less than the first thickness.
  • 11f shows a variant in which the decorative layer 3 consists of a first lacquer layer 31 arranged in the first region 8 on the upper side of the carrier foil 1 and a second lacquer layer 32 arranged in the second region 9 on the lower side of the carrier foil 1.
  • 11g shows a variant in which the decorative layer 3 comprises a first lacquer layer 31 arranged in the first region 8 on the upper side of the carrier foil 1 and a second lacquer layer 32 arranged over the entire surface on the lower side of the carrier foil 1.
  • FIG. 12 shows a multilayer body 100 '", in which the decorative layer 3 is formed by a first lacquer layer 31, which produces a first color impression, and a second lacquer layer 32, which produces a second color impression, both lacquer layers 31, 32 on the same side the carrier layer 1 between the functional layer 2 and the replication 4 are arranged.
  • FIG. 13 shows a multi-layer body 100a 'in which the decorative layer 3 is formed from a first lacquer layer 31 applied in some regions and a second lacquer layer 32 applied over the entire area thereof, both of which
  • Lacquer layers 31, 32 are arranged on the same side of the carrier layer 1.
  • FIG. 14 shows a multilayer body 100a ", in which the decorative layer 3 is applied from a first lacquer layer 31, which is applied over the entire surface on the second side 12 of the carrier foil 1, and a second lacquer layer 32, which is applied in regions on the first side 11 of the carrier foil 1 , consists.
  • FIG. 15 shows transmission spectra of four different classes of UV absorbers which may be present in the first region 8 of the decorative layer 3 in order to form a first region 8 and a second region 9 in the first region 8
  • the UV absorbers are present in chloroform at a concentration of 0.00014 mol / l. Plotted is the percentage of transmittance measured% T over the wavelength ⁇ in the range of 280 to 410 nm.
  • the dashed-dotted line A indicates the transmission of

Abstract

L'invention concerne un procédé de fabrication d'un corps multicouche (100) et un corps multicouche (100) ainsi fabriqué. Une couche décorative (3) est créée sur et/ou dans une couche support (1). La couche décorative (3) présente une première partie (8) et une seconde partie (9). Vue perpendiculairement au plan de la couche support (1), la couche décorative (3) présente un premier facteur de transmission dans la première partie (8), et un second facteur de transmission supérieur au premier dans la seconde partie (9). Une couche à structurer (5) et une couche de réserve photoactivable sont appliquées sur le premier côté (11) de la couche support (1). La couche décorative (3) sert de masque d'exposition lors d'une exposition de la couche de réserve à travers la couche décorative (3). La ou les couches à structurer (5) et la couche de réserve sont structurées précisément l'une par rapport à l'autre au moyen de processus de structuration synchronisés les uns par rapport aux autres.
EP10732309.9A 2009-07-17 2010-07-13 Procédé de fabrication d'un corps multicouche et corps multicouche Active EP2454100B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009033762A DE102009033762A1 (de) 2009-07-17 2009-07-17 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper
PCT/EP2010/004251 WO2011006634A2 (fr) 2009-07-17 2010-07-13 Procédé de fabrication d'un corps multicouche et corps multicouche

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EP2454100A2 true EP2454100A2 (fr) 2012-05-23
EP2454100B1 EP2454100B1 (fr) 2016-03-16

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US (2) US8691493B2 (fr)
EP (1) EP2454100B1 (fr)
JP (1) JP5811484B2 (fr)
CN (1) CN102574411B (fr)
AU (1) AU2010272811B2 (fr)
DE (1) DE102009033762A1 (fr)
ES (1) ES2576788T3 (fr)
MX (1) MX2012000781A (fr)
PL (1) PL2454100T3 (fr)
RU (1) RU2540056C2 (fr)
WO (1) WO2011006634A2 (fr)

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Also Published As

Publication number Publication date
PL2454100T3 (pl) 2016-09-30
WO2011006634A2 (fr) 2011-01-20
WO2011006634A3 (fr) 2011-05-26
MX2012000781A (es) 2012-02-13
US8691493B2 (en) 2014-04-08
RU2540056C2 (ru) 2015-01-27
AU2010272811B2 (en) 2014-10-23
JP2012533760A (ja) 2012-12-27
EP2454100B1 (fr) 2016-03-16
US20140227488A1 (en) 2014-08-14
ES2576788T3 (es) 2016-07-11
RU2012105537A (ru) 2013-08-27
AU2010272811A1 (en) 2012-02-02
US9694618B2 (en) 2017-07-04
CN102574411A (zh) 2012-07-11
JP5811484B2 (ja) 2015-11-11
CN102574411B (zh) 2014-10-29
DE102009033762A1 (de) 2011-01-27
US20120156446A1 (en) 2012-06-21

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