EP2276875A1 - Verfahren zum entschichten von werkstücken und entschichtungslösung - Google Patents
Verfahren zum entschichten von werkstücken und entschichtungslösungInfo
- Publication number
- EP2276875A1 EP2276875A1 EP09737802A EP09737802A EP2276875A1 EP 2276875 A1 EP2276875 A1 EP 2276875A1 EP 09737802 A EP09737802 A EP 09737802A EP 09737802 A EP09737802 A EP 09737802A EP 2276875 A1 EP2276875 A1 EP 2276875A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- solution
- workpiece
- weight percent
- alkaline
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/38—Alkaline compositions for etching refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
- C23G1/205—Other heavy metals refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/22—Light metals
Definitions
- the present invention relates to the field of chemical wet delamination of workpieces, in particular of tools and components, which are coated with a hard material layer.
- a particular focus is on the stripping of hard material layers containing oxides, in particular chromium aluminum oxides (AlCrO layers).
- Coated and hard-optimized coatings are also used on other components that have comparable conditions in use are exposed and therefore require similar properties; Examples include bearing parts and components for the automotive industry such as coated pistons, injection nozzles, etc.
- the diverse application requirements result in a whole range of specialized layers and layer systems, which in turn entail different stripping requirements.
- the stripping should be economical (fast, no complicated equipment, low-cost consumables, applicable for as many layers as possible), safe (as few hazardous substances as possible), environmentally friendly and last but not least, the layer-bearing tool or component should not be damaged by stripping.
- EP 1 029 117 proposes a stripping process in which hydrogen peroxide, a base and at least one acid or the salt of an acid are used.
- the patent application DE 4339502 describes the non-destructive stripping of carbide substrates coated with i.a. TiAlN layers.
- the advantages over previous methods are indicated by the fact that in addition to the conventional complexing agents and stabilizers, inhibitors for the purpose of corrosion protection, other excipients are used, and the solution is adjusted to a pH, in conjunction with the other reagents, a draw of Co prevented from the workpiece. Disadvantages of this solution are the comparatively long stripping time for TiAlN and other coatings, the relatively high use of chemicals and the associated costs, the relatively complicated (because precisely to be observed) formulations and reaction conditions and the use of fluorine-containing reagents.
- WO 2005/073433 proposes applying a chromium- or aluminum-containing layer to a substrate in order to improve the stripping behavior and to provide the workpiece with an alkaline solution containing a strong oxidizing agent, eg. B. a Perranan- ganatlosung to decoat.
- a strong oxidizing agent eg. B. a Perranan- ganatlosung to decoat.
- Example 5 with the main components 20g / l NaOH and 20g / l KMnO 4 , are not optimal for modern AlCrN layers such as the market known Balinit Alcrona. Since these layers allow a maximum application temperature of over 1000 ° C, it is assumed that, depending on the actual use, oxygen is incorporated into the AlCrN layer and this compresses as a result. As a result, the stripping behavior deteriorates markedly. Basically the same problem occurs with AlCrO layers (aluminum-chromium oxides), which can not be stripped with a solution according to Example 5 as described above.
- AlCrO layers aluminum-chromium oxides
- the object of the invention to provide a method for EntSchichtung or a Ent harshungslosung, which allow to economically remove hard material layers of at least AlCr, AlCrN and / or AlCrO from a workpiece, without damaging the workpiece itself substantially.
- Substance mixture as aqueous, alkaline solution can be represented with 3 to 8 weight percent KMnO 4 , preferably between 3 and 5 weight percent KMnO 4 and at the same time has an alkaline content of 6 to 15 weight percent, preferably 6 and 12 weight percent.
- the solution contains 4 weight percent KMnO 4 , wherein at the same time the alkaline fraction between 8 and 11 weight percent, preferably at 10 weight percent.
- the alkaline fraction is formed in one embodiment by KOH or NaOH, the pH of the solution being above 13, preferably above 13.5.
- a work piece which is to be subjected to a method according to the invention has a layer system on the work piece which comprises at least one layer which in turn comprises at least one of the following materials: metallic AlCr, TiAlCr and other AlCr alloys; or one of their nitrides, carbides, borides, oxides or their combination and aluminum oxides.
- the erfmdungsgemasse method for shedding this layer system provides to introduce the workpiece in a Ent Harungslosung gemass above description and treat it there for a predetermined time.
- the solution can be moved during the treatment, e.g. B. by stirring or moving the workpiece.
- the treatment is preferably carried out at room temperature, eg between 15 and 30 ° C., but is also up to 60 or 70 ° C. at higher temperatures
- the z. B. include chemical or mechanical surface treatments. This includes at least one of the following treatment options: spooling, cleaning, ultrasonic bath treatment, drying, blasting, brushing, heat treatment.
- the materials 1.2379, ASP2023 (1.3343), 1.2344, SDK (1.3344) and QRS (1.2842) denote different types of steel, including high-alloy steels and high-speed steels.
- TTX, THM and TTR are indexable tungsten carbide inserts of different composition.
- Helicore refers to an AlCr-based layer material known on the market under the trade name Balinit® Helica.
- Alcrona refers to an AlCrN coating that is marketed as Balinit® Alcrona. As decoating solutions were used:
- the stripping times were determined under standardized, comparable conditions for different sample bodies and different layers.
- the table indicates in which time (mm) a 4 ⁇ m thick layer is completely removed from the workpiece.
- Specimens (flask) with a 0.8 ⁇ m high carbon tungsten carbide coating were stripped at 4K / 10Na and 4K / 10K. After 12 hours reaction time with 4K / 10K the sample was decoated, with 4K / 10Na not yet.
- Conventional hard metals or sintered carbide metals consist of 90-94% tungsten carbide as reinforcing phase and 6-10% cobalt as binder / binder phase. In the smelting process, the binder melts due to its lower (compared to carbide) melting point and bonds the carbide grains.
- materials besides TiC (titanium carbide), TiN (titanium nitride) or TaC (tantalum carbide) with tungsten carbide having a binder phase of Ni, Co or Mo are the TTX and TTR listed in this application Materials (TTX: 60% WC, 31% TiC + Ta (Nb) C + 9% Co).
- the state of the art proposes to avoid a strong alkaline environment when removing hard-material layers of hard metals.
- Table 7 shows that although the initial application of the 4K / 10Na and 4K / 10K solutions results in a greater removal from the substrate than in the solution according to the prior art, over time it appears that in particular the 4K / 10K solution only insignificantly higher removal caused than 4K / 10Na. This is surprising, since actually the high proportion of potassium hydroxide should attack the base material more strongly than the otherwise comparable solution with sodium hydroxide.
- Table 1 shows that the solutions according to the invention are on average twice as effective and permit significantly shorter reaction times (Table 6).
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemical Treatment Of Metals (AREA)
- Chemically Coating (AREA)
- Weting (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL09737802T PL2276875T3 (pl) | 2008-05-02 | 2009-04-09 | Sposób usuwania powłok z obrabianych przedmiotów i roztwór do usuwania powłok |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4989008P | 2008-05-02 | 2008-05-02 | |
| PCT/EP2009/002631 WO2009132758A1 (de) | 2008-05-02 | 2009-04-09 | Verfahren zum entschichten von werkstücken und entschichtungslösung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP2276875A1 true EP2276875A1 (de) | 2011-01-26 |
| EP2276875B1 EP2276875B1 (de) | 2019-10-09 |
Family
ID=40810251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP09737802.0A Active EP2276875B1 (de) | 2008-05-02 | 2009-04-09 | Verfahren zum entschichten von werkstücken und entschichtungslösung |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US9057134B2 (de) |
| EP (1) | EP2276875B1 (de) |
| JP (1) | JP5730189B2 (de) |
| KR (1) | KR101599085B1 (de) |
| CN (1) | CN102016122A (de) |
| BR (1) | BRPI0911617B1 (de) |
| CA (1) | CA2723136C (de) |
| ES (1) | ES2764249T3 (de) |
| MX (1) | MX347701B (de) |
| PL (1) | PL2276875T3 (de) |
| PT (1) | PT2276875T (de) |
| RU (1) | RU2507311C2 (de) |
| SG (1) | SG188875A1 (de) |
| WO (1) | WO2009132758A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011047091A1 (en) * | 2009-10-13 | 2011-04-21 | Martek Biosciences Corporation | Methods for treating traumatic brain injury |
| MY165291A (en) | 2011-06-07 | 2018-03-21 | Oerlikon Surface Solutions Ag Pfaeffikon | Stripping process for hard carbon coatings |
| DE102011105645A1 (de) | 2011-06-07 | 2012-12-13 | Oerlikon Trading Ag, Trübbach | Entschichtungsverfahren für harte Kohlenstoffschichten |
| CN102277587B (zh) * | 2011-07-29 | 2013-06-05 | 沈阳大学 | 一种多组元氮化物硬质反应膜的退除方法 |
| WO2015139731A1 (de) * | 2014-03-18 | 2015-09-24 | Platit Ag | Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten |
| US9406534B2 (en) * | 2014-09-17 | 2016-08-02 | Lam Research Corporation | Wet clean process for cleaning plasma processing chamber components |
| JP6334500B2 (ja) * | 2015-11-19 | 2018-05-30 | 株式会社ジーテクト | アルミニウムめっき鋼板の溶接方法 |
| CN106884168A (zh) * | 2017-04-07 | 2017-06-23 | 苏州星蓝纳米技术有限公司 | 一种硬质合金退涂液及其配制和使用方法 |
| CN107829090A (zh) * | 2017-11-15 | 2018-03-23 | 温州职业技术学院 | Dlc涂层的脱除方法 |
| CN110541169B (zh) * | 2018-06-29 | 2021-12-28 | 蓝思科技股份有限公司 | 一种用于脱除工件表面镀层的褪镀液及褪镀方法 |
| JP7570594B2 (ja) * | 2018-08-21 | 2024-10-22 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | コーティングal含有コーティングの剥離 |
| CN111676448A (zh) * | 2020-06-12 | 2020-09-18 | 艾瑞森表面技术(苏州)股份有限公司 | 一种可褪涂的TiAlCrN纳米复合涂层的制备方法 |
| CN112323136A (zh) * | 2020-10-26 | 2021-02-05 | 深圳市裕展精密科技有限公司 | 退镀液以及退镀方法 |
| CN115637433A (zh) * | 2022-09-28 | 2023-01-24 | 国营川西机器厂 | Al/BN封严涂层去除方法 |
| EP4638813A1 (de) | 2022-12-20 | 2025-10-29 | Wolfram Bergbau und Hütten AG | Verfahren zur vorbereitung von zementiertem karbidabfall für die wiederverwertung |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3085917A (en) | 1960-05-27 | 1963-04-16 | Gen Electric | Chemical cleaning method and material |
| FR1369568A (fr) * | 1963-06-24 | 1964-08-14 | Purex Corp | Composition pour le nettoyage des métaux |
| US3833414A (en) * | 1972-09-05 | 1974-09-03 | Gen Electric | Aluminide coating removal method |
| US4327134A (en) * | 1979-11-29 | 1982-04-27 | Alloy Surfaces Company, Inc. | Stripping of diffusion treated metals |
| US5128179A (en) * | 1981-07-08 | 1992-07-07 | Alloy Surfaces Company, Inc. | Metal diffusion and after-treatment |
| US4476047A (en) | 1982-03-22 | 1984-10-09 | London Nuclear Limited | Process for treatment of oxide films prior to chemical cleaning |
| DE4339502C2 (de) | 1993-11-24 | 1999-02-25 | Thoene Carl Stefan | Entschichtungslösung zum naßchemischen Entfernen von Hartstoffschichten und Verfahren zu deren Anwendung |
| US5700518A (en) * | 1996-04-26 | 1997-12-23 | Korea Institute Of Science And Technology | Fabrication method for diamond-coated cemented carbide cutting tool |
| US6036995A (en) * | 1997-01-31 | 2000-03-14 | Sermatech International, Inc. | Method for removal of surface layers of metallic coatings |
| DE59811875D1 (de) | 1997-11-10 | 2004-09-30 | Unaxis Trading Ag Truebbach | Verfahren zum entschichten von körpern |
| US7150922B2 (en) * | 2000-03-13 | 2006-12-19 | General Electric Company | Beta-phase nickel aluminide overlay coatings and process therefor |
| SG148819A1 (en) * | 2000-09-14 | 2009-01-29 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
| US7045073B2 (en) * | 2002-12-18 | 2006-05-16 | Intel Corporation | Pre-etch implantation damage for the removal of thin film layers |
| PL1725700T3 (pl) | 2004-01-29 | 2010-07-30 | Oerlikon Trading Ag | Sposób usuwania powłoki |
| US7077918B2 (en) * | 2004-01-29 | 2006-07-18 | Unaxis Balzers Ltd. | Stripping apparatus and method for removal of coatings on metal surfaces |
-
2009
- 2009-04-09 US US12/989,727 patent/US9057134B2/en active Active
- 2009-04-09 EP EP09737802.0A patent/EP2276875B1/de active Active
- 2009-04-09 CN CN2009801156527A patent/CN102016122A/zh active Pending
- 2009-04-09 SG SG2013017405A patent/SG188875A1/en unknown
- 2009-04-09 KR KR1020107024079A patent/KR101599085B1/ko active Active
- 2009-04-09 MX MX2010011871A patent/MX347701B/es active IP Right Grant
- 2009-04-09 ES ES09737802T patent/ES2764249T3/es active Active
- 2009-04-09 CA CA2723136A patent/CA2723136C/en active Active
- 2009-04-09 JP JP2011506589A patent/JP5730189B2/ja active Active
- 2009-04-09 WO PCT/EP2009/002631 patent/WO2009132758A1/de not_active Ceased
- 2009-04-09 PT PT97378020T patent/PT2276875T/pt unknown
- 2009-04-09 RU RU2010149274/02A patent/RU2507311C2/ru active
- 2009-04-09 PL PL09737802T patent/PL2276875T3/pl unknown
- 2009-04-09 BR BRPI0911617-6A patent/BRPI0911617B1/pt active IP Right Grant
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2009132758A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| PT2276875T (pt) | 2020-01-17 |
| JP5730189B2 (ja) | 2015-06-03 |
| JP2011520033A (ja) | 2011-07-14 |
| SG188875A1 (en) | 2013-04-30 |
| CA2723136A1 (en) | 2009-11-05 |
| US9057134B2 (en) | 2015-06-16 |
| PL2276875T3 (pl) | 2020-06-01 |
| MX347701B (es) | 2017-05-09 |
| RU2507311C2 (ru) | 2014-02-20 |
| BRPI0911617B1 (pt) | 2023-11-07 |
| CA2723136C (en) | 2017-11-07 |
| EP2276875B1 (de) | 2019-10-09 |
| BRPI0911617A2 (de) | 2017-07-25 |
| ES2764249T3 (es) | 2020-06-02 |
| WO2009132758A1 (de) | 2009-11-05 |
| KR101599085B1 (ko) | 2016-03-14 |
| KR20110003507A (ko) | 2011-01-12 |
| RU2010149274A (ru) | 2012-06-10 |
| US20110056914A1 (en) | 2011-03-10 |
| CN102016122A (zh) | 2011-04-13 |
| MX2010011871A (es) | 2010-11-30 |
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