EP2267184A1 - Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique - Google Patents

Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique Download PDF

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Publication number
EP2267184A1
EP2267184A1 EP20090163423 EP09163423A EP2267184A1 EP 2267184 A1 EP2267184 A1 EP 2267184A1 EP 20090163423 EP20090163423 EP 20090163423 EP 09163423 A EP09163423 A EP 09163423A EP 2267184 A1 EP2267184 A1 EP 2267184A1
Authority
EP
European Patent Office
Prior art keywords
copper
plating
plastic device
activation layer
plastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP20090163423
Other languages
German (de)
English (en)
Inventor
Rob Legtenberg
Hans Adelaar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales Nederland BV
Original Assignee
Thales Nederland BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales Nederland BV filed Critical Thales Nederland BV
Priority to EP20090163423 priority Critical patent/EP2267184A1/fr
Priority to PCT/EP2010/058845 priority patent/WO2010149667A1/fr
Publication of EP2267184A1 publication Critical patent/EP2267184A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/204—Radiation, e.g. UV, laser

Definitions

  • the present invention relates a method for plating a copper interconnection circuit on the outer surface of a plastic device.
  • the invention is particularly applicable to the three-dimensional (3D) Moulded Interconnect Device (MID) technologies.
  • the 3D MID technologies are based on plastic moulding and subsequent metallization techniques, which result in an interconnection circuit on the 3D outer surface of a moulded body.
  • a flexible way to write an interconnection circuit on the 3D outer surface of a plastic device is by means of laser, such as the Laser Direct Structuring (LDS) technology distributed by the German manufacturer LPKF.
  • LPKF-LDS process is the most widely used 3D laser structuring technology. It involves three main steps: injection moulding, laser structuring and electroless plating.
  • LPKF-LDS process is a plastic compounded with a special laser-sensitive metal complex developed by LPKF. When the polymer is exposed to the laser, the metal complex is broken down into elemental metal and residual organic groups. The laser draws the circuit pattern onto the part and leaves behind a roughened surface containing embedded metal particles. These particles act as nuclei for the crystal growth during subsequent electroless plating with copper.
  • the LPKF-LDS process requires special moulding compounds, which are available in limited materials, types and grades.
  • the additive metal-complex negatively affects compound properties, especially by modifying its dielectric loss properties.
  • the LPKF-LDS process is an additive technique, which requires laser structuring of the parts of the surface to be plated. In case of design where most of the surface has to be metal plated, this requires that most areas of the surface must be laser structured, hereby inducing longer laser structuring time.
  • the LPKF-LDS process may even require more than one set-up of the laser, in order to laser structure complex 3D shaped geometries, thus leading to higher cost and lower yield.
  • LSS Laser Subtractive Structuring
  • PCB Printed Circuit Board
  • a copper layer is plated on the surface of a plastic part.
  • a tin layer is plated above the copper layer.
  • the tin layer is then subtracted by laser structuring.
  • the underlying copper layer is etched by a wet etchant, whereas the remaining tin layer acts as a mask.
  • the remaining tin layer is stripped, thus creating a copper circuit.
  • the present invention aims to provide a subtractive technique involving a very few steps, which may be used to achieve an interconnection circuit on the outer surface of a plastic device at low cost and high yield.
  • the invention proposes a method for plating a copper interconnection circuit on the surface of a plastic device.
  • the method comprises a step of depositing an activation layer on the outer surface of the plastic device and a step of plating with copper the outer surface of the plastic device, the activation layer activating plating where copper is needed.
  • the method comprises a step of laser structuring the outer surface of the plastic device, in order to remove the activation layer locally where copper is not needed.
  • the step of plating may comprise a step of electroless copper plating, so as to deposit copper selectively where the activation layer has not been removed.
  • the method may also comprise a step of surface finishing, for example a step of electroless nickel-gold finishing.
  • the step of depositing the activation layer may comprise a step of applying one or a plurality of conditioning substances.
  • the plastic device may be a three-dimensional moulded plastic device.
  • an advantage provided by the present invention in any of its aspects is that all available metallizable mould compounds can be used. Moreover, it is compatible with all existing conventional plastic plating processes.
  • the exemplary sequence of steps illustrated by Figure 1 may comprise a step 1 of injection moulding, during which a conventional plastic material is used to form a 3D structure.
  • the exemplary sequence comprises a step 2 of depositing an activation layer, during which one or a plurality of substances are applied on the whole outer surface of the 3D structure.
  • the step 2 may be a complex process of applying various substances, these substances being chosen based on their ability, alone or in combination, to activate copper platting.
  • the exemplary sequence comprises also a step 3 of laser structuring, during which the activation layer is locally removed where copper is not needed, hereby creating a circuit pattern.
  • the exemplary sequence may also comprises a step 4 of electroless copper plating, so as to deposit a copper layer selectively where the activation layer has not been removed, hereby creating a copper interconnection circuit on a MID.
  • the exemplary sequence may advantageously comprise also a step 5 of surface finishing, during which the outer surface of the MID is finished.
  • the following table 1 illustrates a detailed exemplary sequence of steps according to the invention, including time and temperature settings.
  • the Ultem 2312 resin is used as plastic material to form a 3D structure.
  • many other plastic materials may be used.
  • sub-steps 2a to 2s of depositing an activation layer on the outer surface of the 3D structure involve applying a few substances, in order to activate copper plating on Ultem 2312.
  • many other substances may be applied depending on the plastic material.
  • the basic steps for depositing an activation layer according to the invention are the following: conditioner, etch, neutralizer, glass etch for glass filled compound, promoter, pre-dip, activator, dry.
  • the step 5 of surface finishing may advantageously comprise a step of electroless nickel-gold plating.
  • Table 1 Process flow Ultem 2312 metallization Step nr. Process settings 1 Injection moulding / Ultem 2312 2a Conditioner 10 min. / 80-84 °C. 2b Rinse 3 min. / RT 2c Sulfuric acid dip 1 min. / RT 2d Rinse 2 min. / RT 2e Permanganate 9 min. /80 °C. 2f Rinse 4 min. / RT 2g Neutraliser 3 min. / 45 °C. 2h Rinse 3 min. / RT 2i Glass etch 2 min. / 43 °C.
  • the present invention involves a very few steps in comparison with the LSS process known from the prior art: Table 2 Proces step LSS Laser Activated Surface Removal (invention) 1 Injection molding Injection molding 2 Electroless copper Surface activation 3 Full-build electroplate copper Laser structuring 4 Electroless tin Electroless copper 5 Laser structuring of tin layer Surface finishing 6 Etch copper 7 Strip tin layer 8 Surface finishing
  • the present invention requires only conventional plastic plating processes.
  • no specific catalyst material must be added in the plastic material and no special laser structuring technique is required.
  • the present invention provides a subtractive technique, which offers advantages compared to additive techniques, especially for designs in which a high surface coverage is needed or for designs in which the 3D shape is complex or for designs that include through holes.

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Chemically Coating (AREA)
EP20090163423 2009-06-22 2009-06-22 Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique Withdrawn EP2267184A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP20090163423 EP2267184A1 (fr) 2009-06-22 2009-06-22 Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique
PCT/EP2010/058845 WO2010149667A1 (fr) 2009-06-22 2010-06-22 Procédé de placage d’un circuit d’interconnexion de cuivre sur la surface d’un dispositif en plastique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20090163423 EP2267184A1 (fr) 2009-06-22 2009-06-22 Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique

Publications (1)

Publication Number Publication Date
EP2267184A1 true EP2267184A1 (fr) 2010-12-29

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ID=42077339

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20090163423 Withdrawn EP2267184A1 (fr) 2009-06-22 2009-06-22 Procédé de placage d'un circuit d'interconnexion au cuivre sur la surface d'un dispositif en plastique

Country Status (2)

Country Link
EP (1) EP2267184A1 (fr)
WO (1) WO2010149667A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016121391A (ja) * 2014-12-24 2016-07-07 キヤノン・コンポーネンツ株式会社 めっき皮膜付樹脂製品及びその製造方法並びに導電膜

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011050131B3 (de) * 2011-05-05 2012-08-16 Lpkf Laser & Electronics Ag Verfahren zur Herstellung von Metallisierungen auf Kunststoffteilen

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
E.BEYNE ET AL.: "The polymer stud grid array package", PROC. IEPS, 30 September 1996 (1996-09-30)
ESROM H ET AL: "Modification of surfaces with new excimer UV sources", 15 October 1992, THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH LNKD- DOI:10.1016/0040-6090(92)90923-Y, PAGE(S) 231 - 246, ISSN: 0040-6090, XP024605386 *
KOGELSCHATZ U ET AL: "Industrial applications of excimer ultraviolet sources", 1 October 1991, MATERIALS AND DESIGN, LONDON, GB LNKD- DOI:10.1016/0261-3069(91)90005-O, PAGE(S) 251 - 258, ISSN: 0261-3069, XP024152821 *
W.FALINSKI ET AL.: "Laser structuring of fine line printed circuit boards", 28TH SPRING SEMINAR ON ELECTRONICS TECHNOLOGY, pages 182 - 187

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016121391A (ja) * 2014-12-24 2016-07-07 キヤノン・コンポーネンツ株式会社 めっき皮膜付樹脂製品及びその製造方法並びに導電膜

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Publication number Publication date
WO2010149667A1 (fr) 2010-12-29

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