EP2212446A1 - Composés d'oxydes utilisés comme compositions de revêtement - Google Patents

Composés d'oxydes utilisés comme compositions de revêtement

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Publication number
EP2212446A1
EP2212446A1 EP08846249A EP08846249A EP2212446A1 EP 2212446 A1 EP2212446 A1 EP 2212446A1 EP 08846249 A EP08846249 A EP 08846249A EP 08846249 A EP08846249 A EP 08846249A EP 2212446 A1 EP2212446 A1 EP 2212446A1
Authority
EP
European Patent Office
Prior art keywords
oxide
composite structure
coating composition
substrate
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08846249A
Other languages
German (de)
English (en)
Inventor
Oral Cenk Aktas
Michael Veith
Sener Albayrak
Benny Siegert
Yann Patrick Wolf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Original Assignee
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH filed Critical Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Priority to EP14186650.9A priority Critical patent/EP2845920A1/fr
Publication of EP2212446A1 publication Critical patent/EP2212446A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • the present invention relates to a coating composition consisting of oxide compounds, a process for producing these oxide compounds and their use.
  • Oxide layers particularly ceramic, and particularly alumina (Al 2 O 3 ), are used as a coating material for a variety of applications requiring high heat and heat shock stability or resistance to wear, oxidation or hot corrosion, thermal stability, and provide electrical insulation.
  • Such layers can act as a diffusion barrier for ions and have high chemical stability and radiation resistance. They are therefore used in many areas.
  • alumina is used as insulation material in
  • alumina is present both as an amorphous phase and in various crystalline modifications with different properties. The latter have the more advantageous properties for protective coatings since amorphous phases are usually softer.
  • Crystalline alumina can exist in various modifications, of which only ⁇ -Al 2 ⁇ 3 (corundum) is thermodynamically stable.
  • transition aluminas such as Y, ⁇ , ⁇ , ⁇ , ⁇ , ⁇ , ⁇ f - Al 2 O 3 and Al 2 O 3 -KII, are metastable and can be irreversibly converted into C 1 -Al 2 O 3 . Above 1200 ° C, corundum is the only stable modification. Corundum is also the hardest modification of alumina. The low ionic conductivity and its high thermodynamic stability make it an important coating against oxidation.
  • a number of processes are known in the prior art to produce coatings and films of alumina, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), hydrothermal synthesis (hydrothermal synthesis), sputtering, or the sol- Gel method.
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • hydrothermal synthesis hydrothermal synthesis
  • sputtering or the sol- Gel method.
  • No. 6,521,203 describes the preparation of O-Al 2 O 3 by calcination of aluminum hydroxide produced by hydrolysis of aluminum. minium isopropoxide, at a temperature of 700 to 1300 0 C. However, this method does not allow the production of thin coatings.
  • US 5,302,368 describes the preparation of coatings by applying a dispersion of aluminum hydroxide and / or a transition alumina in an aqueous medium. After adjustment of the suspension and Sp ⁇ htrocknung the dry powder is calcined in the presence of a chlorine-containing substance at 1100 0 C to 1500 0 C.
  • CVD chemical vapor deposition
  • No. 5,654,035 describes such a process in which the body to be coated is contacted at high temperature with a hydrogen carrier gas containing one or more aluminum halides and with a hydrolyzing or oxidizing agent.
  • US 6,713,172 describes the use of this method for coating cutting tools, again at high temperatures of about 1000 0 C.
  • No. 7,238,420 describes a nanotemplate of relatively pure and completely crystalline OI-Al 2 O 3 on a metal alloy.
  • crystalline ⁇ -Al 2 O 3 is generated directly on the surface of the alloy by means of CVD. For this purpose, this is separated before deposition with a CO 2 / H 2 -
  • Pre-treated mixture at high temperatures of 1000 0 C to 1200 0 C. All procedures described require high temperatures. These not only limit the possible substrates, but can also lead to thermal cracks in the coating. Thus, the oxide coatings and the substrate often have different thermal expansion coefficients of film and substrate, resulting in thermally induced cracks in the coating.
  • PVD physical vapor deposition
  • No. 5,683,761 describes a process for depositing (X-Al 2 O 3 with the aid of electron beam PVD, however, the substrate must be heated to approximately 1000 ° C.
  • the deposition of pure oxide, in this case ⁇ -Al 2 C> 3 so it needs high temperatures.
  • Variants of the CVD methods such as plasma assisted / enhanced chemical vapor deposition (PACVD / PECVD) or metal organic chamical vapor deposition (MOCVD), also offer the possibility of using lower temperatures.
  • PCVD / PECVD plasma assisted / enhanced chemical vapor deposition
  • MOCVD metal organic chamical vapor deposition
  • MOCVD processes offer many advantages, such as lower temperatures, simple processes, uniform coatings or the use of a single precursor, a They also lead to carbonaceous impurities in the coating.
  • the degree of crystallinity and the crystalline phases within the deposited oxide layer are very important for their mechanical properties.
  • a pure phase with high thermal and mechanical stability is clearly preferred over a mixture of different phases.
  • this requires a suitable heat treatment of the coated substrate, which not only leads to the transformation into the desired phase, but also in addition to a densification of the coating, which likewise plays a major role in the mechanical stability of the layer.
  • Such heat treatment often requires temperatures of over 1200 0 C, which are not suitable for many substrates.
  • a local heat treatment is recommended.
  • lasers for the treatment of such ceramic materials have already been used successfully (laser sintering).
  • the coating is heated in a small area by means of a laser beam.
  • these methods are used because they absorb in the range of used C ⁇ 2 ⁇ laser.
  • a particular problem is the formation of thermally induced cracks during reconsolidation and cooling of the material. They result from the brittleness of the ceramics and from the high temperature gradient between the exposure area and the surrounding material, as well as the different thermal expansion coefficients of the coating and substrate.
  • Triantafyllids et al. Appl. Surf, 1886 (2002) 140-144) and WO 2007/102143 the occurrence of thermal induced cracks during laser sintering.
  • thermal induced cracks during laser sintering affect the density and stability of the coating and the homogeneity of the phase transformation.
  • binders to the oxide compounds, for example the aluminum oxide particles.
  • US Pat. No. 6,048,954 describes such a binder composition for high-melting inorganic particles.
  • binders increase the compaction of the coating, they are only applicable to powdered materials and the binder and its residues must be removed after laser sintering or even remain in the oxide layer.
  • DE 10 2006 013 484 A1 describes the production of an element / element oxide composite material, that is to say a material containing element and the corresponding element oxide, in this case of nanowires with metal core and oxide sheath.
  • the disadvantage of most processes for the production of oxide layers is the high temperatures of the process.
  • the main drawbacks are that only very specific lasers in a certain wavelength range, usually CO 2 ⁇ laser, are suitable to be used, the precursor used does not absorb other wavelengths. This causes high temperature gradients and leads to a higher load on the substrate and to thermally induced cracks and defects. Therefore, the addition of additional binders is often necessary to increase the absorption of the laser energy and to achieve a high quality of the coating. However, residues of these binders remain in the coating. Also, the production of high-quality and defect-free coatings requires a high degree of experience, since an influence on the underlying substrate or an excessive heating must be avoided.
  • the present invention has for its object to overcome the disadvantages of the prior art in the production of oxide layers as a coating composition.
  • the object of the invention is, in particular, to provide a process which enables the preparation of suitable oxide compounds as a coating composition.
  • oxide layers are obtained which have few to no defects and high hardness and densification.
  • the composite structure is called a composite structure because it consists of both the element and element oxide.
  • the inventive coating of the surface with the element / element oxide composite structure is preferably carried out by the metal organic chamical vapor deposition (MOCVD) method.
  • MOCVD metal organic chamical vapor deposition
  • organometallic precursors precursors
  • precursors are converted into the gas phase and thermally decomposed, with the non-volatile decomposition product usually being deposited on or on the substrate.
  • the precursors used in the invention have the general formula
  • El (OR) n H 2 wherein El is Al, Ga, In, Tl, Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2.
  • the aliphatic and alicyclic hydrocarbon radical is preferably saturated and has, for example, a length of 1 to 20 carbon atoms. Preference is given to alkyl or unsubstituted or the alkyl-substituted cycloalkyl.
  • the alkyl radical preferably has 2 to 15 C atoms, preferably 3 to 10 C atoms, and may be linear or branched, with branched alkyl radicals being preferred.
  • alicyclic rings may comprise one, two or more rings, each of which may be substituted with alkyl.
  • the alicyclic radical preferably has 5 to 10, particularly preferably 5 to 8, C atoms. Examples include cyclopentyl, cyclohexyl, methylcyclohexyl, norbornyl and adamantyl.
  • Aluminiumalkoxydihydride having branched alkoxy having 4 to 8 carbon atoms in particular aluminum tert. -butoxydihydrid.
  • the preparation of such compounds is described in DE 19529241 Al. They can be obtained, for example, by reacting aluminum hydride with the corresponding alcohol in a molar ratio of 1: 1, where the aluminum hydride can be prepared in situ by reaction of an alkali aluminum hydride with an aluminum halide.
  • the preparation of such compounds also by Veith et al. (Chem. Ber. 1996, 129, 381-384), wherein it is also shown that the compounds of the formula El (OR) H 2 can also comprise dimeric forms.
  • the compounds are preferably converted to the gas phase and thermally decomposed, the non-volatile decomposition product usually being formed on or on a substrate in the form of the element / element oxide composite structure.
  • Suitable substrates for applying the coating are all customary materials, for example metal, ceramics, alloys, quartz, glass or glass-like, preferably inert to the starting and end products.
  • the thermolysis can be carried out, for example, in an oven, on an inductively heated surface or on a surface located on an inductively heated sample carrier. In inductive heating only conductive substrates, such as metals, alloys or graphite can be used. For substrates with low conductivity, an electrically conductive substrate carrier or oven should be used with inductive heating.
  • the substrate may therefore be both a surface of the reaction space and a substrate placed therein.
  • the reactor space used may have any shape and consist of any conventional inert material, such as Duran- or quartz glass. Reactor rooms with hot or cold walls can be used. The heating can be done electrically or by other means, preferably with the aid of a high-frequency generator.
  • the oven, as well as the substrate carrier can have any shapes and sizes according to the type and shape of the substrate to be coated, the substrate may for example be a plate, planar surface, tubular, cylindrical, cuboid or have a more complex shape. It may be advantageous to rinse the reactor space several times with an inert gas, preferably nitrogen or argon, before introducing the precursor. In addition, it may be advantageous to apply an intermediate vacuum if necessary, in order to render the reactor space inert.
  • an inert gas preferably nitrogen or argon
  • the substrate to be coated such as metal, alloy, semiconductor, ceramic, quartz, glass or glass Similarly, to above 500 0 C in order to clean the surface.
  • the desired element / element oxide composite structure is preferably formed at temperatures above 400 ° C., more preferably above 450 ° C. Preference is given to temperatures of not more than 1200
  • the substrate on or at which the thermolysis takes place accordingly heated to the desired temperature.
  • the generation of the element / element oxide composite structure according to the invention is independent of the substrate material used and its nature.
  • the (organometallic) compound, or the precursor can be introduced from a storage vessel, which is preferably heated to a desired evaporation temperature in the reactor.
  • a storage vessel which is preferably heated to a desired evaporation temperature in the reactor.
  • Thermolysis in the reactor chamber is usually at a reduced pressure of 10 "-6 mbar up to atmospheric pressure, preferably in a range of 10 ⁇ 4 mbar to 10" 1 mbar, preferably from 10 -4 mbar to 10 "2 mbar.
  • a vacuum pump system can be connected to the reactor. NEN all conventional vacuum pumps are used, preferred is a combination of rotary vane pump and turbomolecular pump or a rotary vane pump.
  • the storage vessel for the precursor is expediently provided on the side of the reactor space and the vacuum pump system on the other side.
  • the substrate When the substrate is heated by induction, e.g. square centimeter-sized, electrically conductive metal platelets or foils are arranged as a substrate in a reaction tube of duran or quartz glass.
  • a reaction tube On the reaction tube, the supply vessel, which is tempered to the desired evaporation temperature, is connected on the input side to the precursor and, on the output side, a vacuum pump system.
  • the reaction tube is located in a high-frequency induction field, with the aid of which the substrate platelets or foils are heated to the desired temperature. After setting the desired pressure and introducing the precursor, the substrate is covered with the element / element oxide composite structure.
  • valve can be controlled manually or automatically.
  • duration of the addition of the precursor may be a few minutes to several hours.
  • the morphology of the element / element oxide composite structure can be controlled.
  • the element / element oxide composite structure obtained can be subjected to a treatment with a mixture, a solution and / or a suspension of organic and / or inorganic substances.
  • the substrate can be coated only in desired areas with the element / element oxide composite structure, which also limits the treatment by local heating to these areas.
  • the element / element oxide composite is heated locally, more preferably by means of a laser. This process is also called sintering.
  • the element / element oxide composite structure is converted into the desired elemental oxide structure. This change may also involve the conversion to one or more modifications of a crystal structure, most preferably the formation of a single modification of the element oxide.
  • the element / element oxide composite structure has better thermal conductivity than the pure element oxide and thereby results in a reduced temperature gradient during local heating. This reduces the cracks induced thereby.
  • the elemental component of the element / element oxide composite structure can act as a binder in that it melts during the heating and can thus fill in any cracks and pores which may have arisen from the heating in the element / element oxide composite structure.
  • the ele- / element oxide composite structure is not completely converted at the place of heating in the corresponding element oxide.
  • the degree of conversion can be controlled very accurately. This allows the selective production of areas of specific structure and morphology, and thus, for example, the production of nanowires, nanoparticles and fractal surfaces.
  • the element / element oxide composite structure at the place of heating is completely converted into the corresponding element oxide.
  • the degree of conversion can be controlled up to complete conversion.
  • the melting of the metallic component of the element / element oxide composite structure makes it possible to produce particularly defect-free and uniform oxide layers.
  • the produced element / element oxide composite structure can be a broadband absorber and consequently absorb light from a very broad wavelength range.
  • the wavelength of the laser can range from UV to electromagnetic waves, preferably in the range of 300 nm to 15 ⁇ m, more preferably in the range of 500 nm to 11 ⁇ m, even more advantageously, but not limited to, lasers with wavelengths of 488 nm. 514 nm, 532 nm, 635 nm, 1064 nm or 10.6 ⁇ m. Continuous (CW) or pulsed lasers can be used.
  • the laser energy used is between 1 milliwatt per square centimeter and several watts per square centimeter, preferably between 1 milliwatt per square centimeter and 10 watts per square centimeter, more preferably between 1 mW / cm 2, depending on the wavelength and element / element oxide composite structure used and 5 W / cm 2 .
  • a particular advantage of the invention is the realization of very low penetration depths of the laser.
  • the penetration depth can be reduced to a range of less than approximately 400 nm, preferably less than approximately 300 nm, particularly preferably less than approximately 200 nm, particularly preferably less than approximately 100 nm. This not only allows the production of very thin layers, but also a special protection of the substrate.
  • Layer thickness of the element oxide layer produced can accordingly between about 400 nm and about 10 nm, preferably between about 300 nm and about 10 nm, more preferably between about 200 nm and about 10 nm, more preferably between about 100 nm and about 10 nm. Theoretically, even the production of only a few monolayers of element oxide would be possible, i. only a few layers of atoms. Furthermore, the low penetration depth protects a temperature-sensitive substrate from thermal energy input and, in addition, mechanical stresses at the interface between coating and substrate are avoided. So can too
  • Substrates are used, which absorb even the laser wavelength used. In addition, only the surface of an element / element oxide composite structure with a greater layer thickness can be converted.
  • Another particular advantage of the invention lies in the possibility of being able to produce not only particularly thin, but also particularly hard oxide layers which are particularly preferred. zugt by low permeability provide high corrosion protection.
  • the light absorption of the element / element oxide composite structure is measured at the point of the treatment, during the heating or between several sintering processes.
  • the absorption for example of light in the visible region
  • the site of heating may change. From this change, it is possible to generate a certain degree of conversion by adjusting process parameters, such as, but not limited to, laser intensity, wavelength, laser exposure time, repetitions of the heating. After reaching the desired level, the heating can be stopped at this location.
  • the wavelength of the laser is chosen such that it is reflected by a pure element oxide layer.
  • the conversion can be stopped "on its own” when the pure element oxide is reached, since there is no further heating by the laser, thereby avoiding "overheating" of the element oxide layer, which leads to malposition, for example due to the formation of grain. can lead in the element oxide layer.
  • the underlying substrate can be spared in this way.
  • this development allows the use of higher laser intensities than in conventional methods with the same layer thickness and substrate were possible.
  • lasers having wavelengths in the visible range of the light are particularly preferably selected. Due to the absorption properties of the element / element oxide composite structure according to the invention, local heating with lasers with this wavelength range is possible.
  • the "overheating" of the oxide layer produced can also be used to adjust a certain porosity by the targeted generation of defects.
  • Another advantage of the present invention lies in the possibility of heating locally, i. not only with the protection of the underlying substrate, but also only in desired areas of the element / element oxide composite structure perform, if, for example, only on the outside of the substrate, such a coating is desired.
  • a further advantage of the present invention is the possibility of producing a specific desired structure on the surface of the substrate by targeted proportionate or complete conversion of the element / element oxide composite structure. Structures with significantly higher properties are possible by virtue of the possibility of using lasers of shorter wavelengths Resolution as possible with the previously customary CO 2 lasers, theoretically limited by half the wavelength used.
  • the local heating according to the invention can be carried out with the aid of a computer-controlled laser scanner, preferably with focusing optics, in order to better focus the laser beam.
  • the present invention further relates to a coating composition, in particular producible by the abovementioned process according to the invention, comprising oxide layers with a high to complete oxide content, which are obtained by thermolytic decomposition of organometallic compounds of the formula El (OR) n H 2 where El Al, Ga, In , Tl, Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2, are prepared at a temperature of more than 400 0 C to form an element / element oxide composite structure and the prepared element / element oxide composite structure is converted into the oxide compound by brief, local heating, preferably by means of a laser (sintering).
  • the proportion of the oxide compound in the coating composition is preferably at least 80%, preferably at least 95%, particularly preferably almost 100%.
  • the oxide compound is a ceramic oxide, more preferably aluminum or gallium oxide, more preferably alumina, and most preferably alumina as Ot-Al 2 O 3 (corundum).
  • the coating composition may have a high hardness, for example, in the case of alumina, a hardness of about 28 GPa can be achieved.
  • the coating compositions of the invention are characterized by a high adhesion to the substrate.
  • the coating compositions according to the invention have a low diffusion coefficient for ions and a low permeability to water. By these properties make them particularly suitable as protection of the substrate against corrosion or wear and abrasion.
  • the invention relates to the use of the coating composition according to the invention for coating substrates of, for example, metal, semiconductor, alloy, ceramic, quartz, glass or glass-like materials. This represents only a selection of the possible substrates and by no means a restriction.
  • the coating composition according to the invention can be applied to (almost) all substrates. Suitable substrates are known to the person skilled in the art.
  • the versatility of the method according to the invention with respect to the conversion of the element / element oxide composite structure allows numerous applications.
  • very hard, wear-resistant protective layers can be produced for components with high wear and tear.
  • the possibility of producing very defect-free layers makes it possible to use the protective layers for electrical or thermal insulation.
  • applications in the field of medicine, in particular as a coating for implants are possible.
  • Purposefully structured surfaces according to the invention are suitable for example in the field of catalysis, filtration or lithography up to storage media, such as information storage.
  • the element / element composite structure according to the invention is suitable for the production of surfaces with absorption of a broad wavelength range because of their absorption properties.
  • the invention comprises a device for carrying out the local heating, preferably with the aid of a laser, preferably with a computer-controlled laser scanner, particularly preferably with an optic focusing the laser beam.
  • a further advantageous development of the device according to the invention comprises the possibility of measuring the light absorption of the element / element oxide composite structure at the point of treatment, during the heating or between several sintering processes. This can be done by measuring the intensity of the reflection of the laser at the point of heating or by measuring the intensity of the reflection at the point of heating with another light source of suitable wavelength during sintering or between several sintering operations. This allows complete automation of the method according to the invention.
  • area information always includes all - not mentioned - intermediate values and all imaginable subintervals.
  • FIG. 1 shows an untreated Al / Al 2 O 3 composite structure
  • FIG. 2 shows a treated Al / Al 2 O 3 composite structure (5 Watt laser 5 mm / sec);
  • FIG. Fig. 3 recording a treated Al / Al 2 ⁇ 3 composite structure
  • the imaging series Fig. 1 to 3 clearly shows the influence of the action of the laser as a function of the exposure time, in this case given by the speed with which the laser has been moved over the sample.
  • FIG. 1 shows an untreated Al / Al 2 O 3 composite structure before the laser treatment. Neither a uniform surface nor a structuring of the surface can be recognized.
  • FIG. 2 shows an Al / Al 2 O 3 composite structure after a short laser treatment. This leads to the formation of new morphologies and structures, in this case nanowires and fractal structures.
  • FIG. 3 shows an Al / Al 2 O 3 composite structure treated to complete conversion. There are only a few defects and the surface appears uniform.
  • FIG. 4 shows the broad absorption of the Al / Al 2 O 3 composite structure (thickness: 200-400 nm). The absorption in a broad wavelength range allows the use of lasers in a wide wavelength range.
  • FIG. 5 and FIG. 6 show X-ray diffraction analysis of various Al / Al 2 O 3 composite structures which have been treated for different periods of time on two different substrates. It can be clearly seen that the signals of the 01-Al 2 O 3 crystal structure increase and the signals of the metallic aluminum decrease. This shows an increasing crystallization and formation of ⁇ -Al 2 C> 3 .
  • Figure 7 shows the selective conversion in certain range depending on the energy.
  • strip-shaped regions with increasing treatment intensity to the left which are each separated by untreated strips, were produced according to the method according to the invention. It is clear to recognize the precise resolution and the accuracy with which the inventive method allows the targeted production of structures on surfaces.
  • Fig. 8 shows the water permeability of differently treated
  • Al / Al 2 O 3 composite structures While the untreated Al / Al 2 O 3 composite structure (top, squares) shows a high water permeability and is therefore unsuitable as corrosion protection, the fully converted Al / Al 2 O 3 composite structure according to the invention shows no permeability (bottom, triangles) , A
  • FIG. 9 shows the measurement of the hardness of a fully converted Al / Al 2 O 3 composite structure by means of nanostation. A hardness of 28 (+/- 2) GPa was measured.
  • the precursor alumuninium-tert. Butoxide Dihydrid (Al (tBu) H 2 ) was deposited in a CVD apparatus under argon at a temperature of 600 0 C on a metal substrate (steel, copper, nickel or platinum) or alternatively on glass or ceramics.
  • the heating of the furnace was carried out inductively, wherein in the case of the glass, a conductive sample holder was used.
  • the pressure in the reactor was about 6.0 ⁇ 10 -2 mbar.
  • the volatile decomposition products of the precursor were detected with an attached mass spectrometer.
  • the duration of the precursor flow was about 10 minutes. With longer duration (30 to 90 minutes) higher thicknesses could be obtained.
  • the resulting A1 / A1 2 O 3 composite structure is dark to black in color because of its absorption.
  • the local heating was carried out by means of a laser.
  • an air-cooled CO 2 laser with a wavelength of 10.6 ⁇ m was used, which is characterized by a biconvex ZnSe lense was focused with a focal length of 120 mm.
  • the exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns.
  • the intensity of the laser was varied between 1 W / cm 2 and 5 W / cm 2 . This laser is absorbed by the Al / Al 2 O 3 composite structure and the alumina layer.
  • an argon ion laser with wavelengths in the range of visible light was used, which was focused by means of a biconvex lens with the focal length of 120 mm.
  • the exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns.
  • the wavelengths 514 nm, 488 nm and a wavelength range from 450 nm to 532 nm (mixed lme) were used.
  • the intensity was varied between 0.4 W / cm 2 and 2 W / cm 2 . This laser is absorbed only by the Al / Al 2 O 3 composite structure and not by the alumina layer obtained upon complete conversion.
  • a pulsed laser was used for fractured substrates, especially some glasses and ceramics. It was possible to treat thin, and very thin layers of Al / Al 2 ⁇ 3 composite structure influencing the substrate.
  • lasers with the wavelengths 266 nm, 355 nm, 532 nm or 1064 nm were used. The intensity was kept low and was 200 joules with a pulse length of 4-8 ns. The exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns.
  • the treatment was carried out with a single pulse as well as a repetition of pulses at a rate of 10 Hz. This allowed a low penetration depth of the laser of only 200-300 nm can be achieved. This allowed the production of very thin oxide films. ( ⁇ 300 nm and even ⁇ 200 nm) with particularly high corrosion protection and with a hardness of 28 (+/- 2) GPa.

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Abstract

L'invention concerne une composition de revêtement constituée par un composé d'oxydes. L'invention concerne en outre une composition de revêtement constituée par un composé d'oxydes, ainsi qu'un procédé de revêtement de substrats formés d'un métal, d'un semi-conducteur, de céramique, quartz, verre ou de matériaux du type du verre avec de telles compositions de revêtement. L'invention concerne également l'utilisation d'une composition de revêtement conforme à l'invention, pour le revêtement de substrats formés par un métal, semi-conducteur, alliage, céramique, quartz, verre et/ou un matériau du type du verre.
EP08846249A 2007-11-05 2008-11-04 Composés d'oxydes utilisés comme compositions de revêtement Withdrawn EP2212446A1 (fr)

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EP14186650.9A EP2845920A1 (fr) 2007-11-05 2008-11-04 Composés d'oxydes utilisés comme compositions de revêtement

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DE102007053023A DE102007053023A1 (de) 2007-11-05 2007-11-05 Oxidverbindungen als Beschichtungszusammensetzung
PCT/EP2008/009287 WO2009059740A1 (fr) 2007-11-05 2008-11-04 Composés d'oxydes utilisés comme compositions de revêtement

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US8911834B2 (en) 2014-12-16
US20150027543A1 (en) 2015-01-29
US20110017659A1 (en) 2011-01-27
EP2845920A1 (fr) 2015-03-11
DE102007053023A1 (de) 2009-05-07

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