EP2173561B1 - Tête d'impression à jet d'encre et polarités d'électrode d'actionneur opposées - Google Patents
Tête d'impression à jet d'encre et polarités d'électrode d'actionneur opposées Download PDFInfo
- Publication number
- EP2173561B1 EP2173561B1 EP07784706A EP07784706A EP2173561B1 EP 2173561 B1 EP2173561 B1 EP 2173561B1 EP 07784706 A EP07784706 A EP 07784706A EP 07784706 A EP07784706 A EP 07784706A EP 2173561 B1 EP2173561 B1 EP 2173561B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- printhead
- rows
- printhead according
- nozzles
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 238000007639 printing Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 15
- 239000012530 fluid Substances 0.000 claims description 11
- 230000005669 field effect Effects 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 39
- 239000000976 ink Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/145—Arrangement thereof
- B41J2/155—Arrangement thereof for line printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14072—Electrical connections, e.g. details on electrodes, connecting the chip to the outside...
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14387—Front shooter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14459—Matrix arrangement of the pressure chambers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/20—Modules
Definitions
- the present invention relates to the field of printing.
- the invention concerns an inkjet printhead for high resolution printing.
- the quality of a printed image depends largely on the resolution of the printer. Accordingly, there are ongoing efforts to improve the print resolution of printers.
- the print resolution strictly depends on the spacing of the printer addressable locations on the media substrate, and the drop volume.
- the spacing between the nozzles on the printhead need not be as small as the spacing between the addressable locations on the media substrate.
- the nozzle that prints a dot at one addressable location can be spaced any distance away from the nozzle that prints the dot at the adjacent addressable location. Movement of the printhead relative to the media, or vice versa, or both, will allow the printhead to eject drops at every addressable location regardless of the spacing between the nozzles on the printhead. In the extreme case, the same nozzle can print adjacent drops with the appropriate relative movement between the printhead and the media.
- the nozzles can be spaced along the media feed path or in the scan direction so that the spacing between addressable locations on the media are smaller than the physical spacing of adjacent nozzles. It will be appreciated that the spacing the nozzles over a large section of the paper path or scan direction is counter to compact design and requires the paper feed to carefully control the media position and the printer control of nozzle firing times must be precise.
- the large nozzle array emphasizes the problem. Spacing the nozzles over a large section of the paper path requires the nozzle array to have a relatively large area.
- the nozzle array must, by definition, extend the width of the media. But its dimension in the direction of media feed should be as small as possible. Arrays that extend a relatively long distance in the media feed direction require a complex media feed that maintains precise positioning of the nozzles relative to the media surface across the entire array.
- the Applicant has developed a range of pagewidth printheads with very high nozzle densities.
- the printheads use one or more printhead integrated circuits (ICs) that each have an array of nozzles fabricated on a silicon wafer substrate using semiconductor etching and deposition techniques.
- ICs integrated circuits
- Each nozzle is a MEMS (micro-electro-mechanical systems) device with an actuator mounted in a chamber for ejecting ink through a respective nozzle aperture.
- the printhead IC's on each printhead are mounted end to end in a line transverse to the paper feed direction. This keeps the width of the total nozzle array small to avoid, or at least minimize, the media feed control problems discussed above.
- end to end printhead ICs mean that the power and data to the nozzles must be fed to the side of each IC.
- the drive circuitry for each printhead IC is fabricated on the wafer substrate in the form of several metal layers separated by dielectric material through which vias establish the required inter layer connections.
- the drive circuitry has a drive FET (field effect transistor) for each actuator.
- the source of the FET is connected to a power plane (a metal layer connected to the position voltage of the power supply) and the drain connects to a ground plane (the metal layer at zero voltage or ground). Also connected to the ground plane and the power plane are the electrodes for each of the actuators.
- the power plane is typically the uppermost metal layer and the ground plane is the metal layer immediately beneath (separated by a dielectric layer).
- the actuators, ink chambers and nozzles are fabricated on top of the power plane metal layer. Holes are etched through this layer so that the negative electrode can connect to the ground plane and an ink passage can extend from the rear of the wafer substrate to the ink chambers. As the nozzle density increases, so to does the density of these holes, or punctuations through the power plane. With a greater density of punctuations through the power plane, the gap width between the punctuations is reduced. The thin bridge of metal layer between these gaps is a point of relatively high electrical resistance.
- the current to actuators on the non-supply side of the printhead IC may have had to pass through a series of these resistive gaps.
- the increased parasitic resistance to the non-supply side actuators will affect their drive voltage and ultimately the drop ejection characteristics from those nozzles.
- US-A-2007 0081032 discloses a printhead for an inkjet printer according to the preamble of claim 1.
- the present invention provides a printhead for an inkjet printer, the printhead comprising:
- the punctuations in the power plane of the CMOS can be kept to the outside edges of the adjacent rows. This moves one line of narrow resistive bridges between the punctuations to a position where the electrical current does not flow through them. This eliminates their resistance from the actuators drive circuit. By reducing the resistive losses for actuators remote from the power supply side of the printhead IC, the drop ejection characteristics are consistent across the entire array of nozzles.
- the electrodes in each row are offset from its adjacent actuators in a direction transverse to the row such that the electrodes of every second actuator are collinear.
- the offset is less than 40 microns.
- the offset is less than 30 microns.
- the array of nozzles is fabricated on an elongate wafer substrate extending parallel to the rows of the array, and the drive circuitry is CMOS layers on one surface of the wafer substrate, the CMOS layers being supplied with power and data along a long edge of the wafer substrate.
- the CMOS layers have a top metal layer forming a power plane that carries a positive voltage such that the electrodes having a negative voltage connect to vias formed in holes within the power plane.
- the CMOS layers have a drive FET (field effect transistor) for each actuator in a bottom metal layer.
- the CMOS layers have layers of metal less than 0.3 microns thick.
- the actuators are heater elements for generating a vapor bubble in the printing fluid such that a drop of the printing fluid is ejected from the ejection aperture.
- the heater elements are beams suspended between their respective electrodes such that they are immersed in the printing fluid.
- the ejection apertures are elliptical with the major axis of the ejection aperture parallel to the longitudinal axis of the beam.
- the major axes of the ejection apertures in one of the rows are respectively collinear with the major axes of the ejection apertures in the adjacent row such that each of the nozzles in one of the rows is aligned with one of the nozzles in the adjacent row.
- the major axes of adjacent ejection apertures are spaced apart less than 50 microns. In a further preferred form, the major axes of adjacent ejection apertures are spaced apart less than 25 microns. In a particularly preferred form, the major axes of adjacent ejection apertures are spaced apart less than 16 microns.
- the printhead has a nozzle pitch greater than 1600 nozzle per inch (npi) in a direction transverse to a media feed direction. In preferred embodiments, the nozzle pitch is greater than 3000 npi. In a particularly preferred embodiment, the printhead has a print resolution in dots per inch (dpi) that equals the nozzle pitch. In specific embodiments, the printhead is a pagewidth printhead configured for printing A4 sized media. Preferably, the printhead has more than 100,000 of the nozzles.
- the printhead IC (integrated circuit) shown in the accompanying drawings is fabricated using the same lithographic etching and deposition steps described in the USSN 11/246687 (Our Docket MNN001US) filed 11 October 2005, the contents of which are incorporated herein by reference.
- the ordinary worker will understand that the printhead IC shown in the accompanying drawings have a chamber, nozzle and heater electrode configuration that requires the use of exposure masks that differ from those shown in 11/246687 Figures.
- the process steps of forming the suspended beam heater elements, chambers and ejection apertures remains the same.
- the CMOS layers are formed in the same manner as that discussed 11/246687 with the exception of the drive FETs.
- the drive FETs need to be smaller because the higher density of the heater elements.
- the Applicant has developed a range of printhead devices that use a series of printhead integrated circuits (ICs) that link together to form a pagewidth printhead.
- the printhead IC's can be assembled into printheads used in applications ranging from wide format printing to cameras and cellphones with inbuilt printers.
- the printhead IC's are mounted end-to-end on a support member to form a pagewidth printhead.
- the support member mounts the printhead IC's in the printer and also distributes ink to the individual IC's.
- An example of this type of printhead is described in USSN 11/293,820 , the disclosure of which is incorporated herein by cross reference.
- any reference to the term 'ink' is to be interpreted as any printing fluid unless it is clear from the context that it is only a colorant for imaging print media.
- the printhead IC's can equally eject invisible inks, adhesives, medicaments or other functionalized fluids.
- Figure 1A shows a sketch of a pagewidth printhead 100 with the series of printhead ICs 92 mounted to a support member 94.
- the angled sides 96 allow the nozzles from one of the IC's 92 overlap with those of an adjacent IC in the paper feed direction 8. Overlapping the nozzles in each IC 92 provides continuous printing across the junction between two IC's. This avoids any 'banding' in the resulting print. Linking individual printhead IC's in this manner allows printheads of any desired length to be made by simply using different numbers of IC's.
- Figure 1B shows a section of the nozzle array on the Applicants recently developed 3200dpi printhead.
- the printhead has 'true' 3200dpi resolution in that the nozzle pitch is 3200npi rather than a printer with 3200dpi addressable locations and a nozzle pitch less than 3200npi.
- the section shown in Figure 1B shows eight unit cells of the nozzle array with the roof layer removed. For the purposes of illustration, the ejection apertures 2 have been shown in outline.
- the 'unit cell' is the smallest repeating unit of the nozzle array and has two complete droplet ejectors and four halves of the droplet ejectors on either side of the complete ejectors.
- a single unit cell is shown in Figure 2 .
- the nozzle rows extend transverse to the media feed direction 8.
- the middle four rows of nozzles are one color channel 4.
- Two rows extend either side of the ink supply channel 6.
- Ink from the opposing side of the wafer flows to the supply channel 6 through the ink feed conduits 14.
- the upper and lower ink supply channels 10 and 12 are separate color channels (although for greater color density they may print the same color ink - eg a CCMMY printhead).
- Rows 20 and 22 above the supply channel 6 are transversely offset with respect to the media feed direction 8.
- rows 24 and 26 are similarly offset along the width of the media.
- rows 20 and 22, and rows 24 and 26 are mutually offset with respect to each other.
- the combined nozzle pitch of rows 20 to 26 transverse to the media feed direction 8 is one quarter the nozzle pitch of any of the individual rows.
- the nozzle pitch along each row is approximately 32 microns (nominally 31.75 microns) and therefore the combined nozzle pitch for all the rows in one color channel is approximately 8 microns (nominally 7.9375 microns). This equates to a nozzle pitch of 3200 npi and hence the printhead has 'true' 3200 dpi resolution.
- FIG. 2 is a single unit cell of the nozzle array.
- Each unit cell has the equivalent of four droplet ejectors (two complete droplet ejectors and four halves of the droplet ejectors on both sides of the complete ejectors).
- the droplet ejectors are the nozzle, the chamber, drive FET and drive circuitry for a single MEMS fluid ejection device.
- the ordinary worker will appreciate that the droplet ejectors are often simply referred to as nozzles for convenience but it is understood from the context of use whether this term is a reference to just the ejection aperture or the entire MEMS device.
- the top two nozzle rows 18 are fed from the ink feed conduits 14 via the top ink supply channel 10.
- the bottom nozzle rows 16 are a different color channel fed from the supply channel 6.
- Each nozzle has an associated chamber 28 and heater element 30 extending between electrodes 34 and 36.
- the chambers 28 are elliptical and offset from each other so that their minor axes overlap transverse to the media feed direction. This configuration allows the chamber volume, nozzle area and heater size to be substantially the same as the 1600 dpi printheads shown in the above referenced USSN 11/246687 (Our Docket MNN001US) filed 11 October 2005.
- the chamber walls 32 remain 4 microns thick and the area of the contacts 34 and 36 are still 10 microns by 10 microns.
- FIG. 3 shows the unit cell replication pattern that makes up the nozzle array.
- the print density is higher than the 1600 dpi printhead of USSN 11/246687 (Our Docket MNN001US) filed 11 October 2005, or the printer can operate at 1600dpi to extend the life of the nozzles with a good print density. This feature of the printhead is discussed further below.
- the heater elements 30 and respective contacts 34 and 36 are the same dimensions as the 1600dpi printhead IC of USSN 11/246687 (Our Docket MNN001US) filed 11 October 2005. However, as there is twice the number of contacts, there is twice the number of FET contacts (negative contacts) that punctuate the 'power plane' (the CMOS metal layer carrying the positive voltage). A high density of holes in the power plane creates high resistance through the thin pieces of metal between the holes. This resistance is detrimental to overall printhead efficiency and can reduce the drive pulse to some heaters relative to others.
- FIG 4 is a schematic section view of the wafer, CMOS drive circuitry 56 and the heater.
- the drive circuitry 56 for each printhead IC is fabricated on the wafer substrate 48 in the form of several metal layers 40, 42, 44 and 45 separated by dielectric material 41, 43 and 47 through which vias 46 establish the required inter layer connections.
- the drive circuitry 56 has a drive FET (field effect transistor) 58 for each actuator 30.
- the source 54 of the FET 58 is connected to a power plane 40 (a metal layer connected to the position voltage of the power supply) and the drain 52 connects to a ground plane 42 (the metal layer at zero voltage or ground). Also connected to the ground plane 42 and the power plane 40 are the electrodes 34 and 36 or each of the actuators 30.
- the power plane 40 is typically the uppermost metal layer and the ground plane 42 is the metal layer immediately beneath (separated by a dielectric layer41).
- the actuators 30, ink chambers 28 and nozzles 2 are fabricated on top of the power plane metal layer 40. Holes 46 are etched through this layer so that the negative electrode 34 can connect to the ground plane and an ink passage 14 can extend from the rear of the wafer substrate 48 to the ink chambers 28. As the nozzle density increases, so to does the density of these holes, or punctuations through the power plane. With a greater density of punctuations through the power plane, the gaps between the punctuations are reduced. The thin bridge of metal layer though these gaps is a point of relatively high electrical resistance.
- the current to actuators on the non-supply side of the printhead IC may have had to pass through a series of these resistive gaps.
- the increased parasitic resistance to the non-supply side actuators will affect their drive current and ultimately the drop ejection characteristics from those nozzles.
- adjacent rows of actuators have opposite current flow directions. That is, the electrode polarity in one rows is switched in the adjacent row.
- two rows of nozzles adjacent the supply channel 6 should be considered as a single row as shown in Figure 5A instead of staggered as shown in the previous figures.
- the two rows A and B extend longitudinally along the length of the printhead IC. All the negative electrodes 34 are along the outer edges of the two adjacent rows A and B.
- the power is supplied from one side, say edge 62, and so the current only passes through one line of thin, resistive metal sections 64 before it flows through the heater elements 30 in both rows. Accordingly, the current flow direction in row A is opposite to the current flow direction in row B.
- the corresponding circuit diagram illustrates the benefit of this configuration.
- the power supply V+ drops because of the resistance R A of the thin sections between the negative electrodes 34 of row A.
- the voltage drop across all heaters 30 (resistances R HA and R HB respectively) in both rows A and B is uniform.
- the resistance R B from the thin bridges 66 between the negative electrodes 34 of row B is eliminated from the circuit for rows A and B.
- Figure 5B shows the situation if the polarities of the electrodes in adjacent rows are not opposing.
- the line of resistive sections 66 in row B are in the circuit.
- the supply voltage V+ drops through the resistance R A to V A - the voltage of the positive electrodes 36 of row A. From there the voltage drops to ground through the resistance R HA of the row A heaters 30.
- the voltage V B at the row B positive electrodes 36 drops from V A though R B from the thin section 66 between the row B negative electrodes 34.
- the voltage drop though the row B heaters 30 is less than that of row A. This in turn changes the drive pulse and therefore the drop ejection characteristics.
- the second measure used to maintain the integrity of the power plane is staggering adjacent electrodes pairs in each row.
- the negative electrodes 34 are now staggered such that every second electrode is displaced transversely to the row.
- the adjacent row of heater contacts 34 and 36 are likewise staggered. This serves to further widen the gaps 64 and 66 between the holes through the power plane 40. The wider gaps have less electrical resistance and the voltage drop to the heaters remote from the power supply side of the printhead IC is reduced.
- Figure 7 shows a larger section of the power plane 40.
- the electrodes 34 in staggered rows 41 and 44 correspond to the color channel feed by supply channel 6.
- the staggered rows 42 and 43 relate to one half the nozzles for the color channels on either side - the color fed by supply channel 10 and the color channel fed by supply channel 12. It will be appreciated that a five color channel printhead IC has nine rows of negative electrodes that can induce resistance for the heaters in the nozzles furthest from the power supply side. Widening the gaps between the negative electrodes greatly reduces the resistance they generate. This promotes more uniform drop ejection characteristics from the entire nozzle array.
- Each individual integrated circuit is about 22 mm long, less than 3 mm wide and can support more than 10000 nozzles. This represents a significant increase on the nozzle numbers (70,400 nozzles per IC) in the Applicants 1600 dpi printhead ICs (see for example MNN001US). In fact, a true 3200 dpi printhead nozzle array fabricated to the dimensions shown in Figure 12 , has 12,800 nozzles.
- a photolithographic stepper is sketched in Figure 14 .
- a light source 102 emits parallel rays of a particular wavelength 104 through the reticle 106 that carries the pattern to be transferred to the integrated circuit 92.
- the pattern is focused through a lens 108 to reduce the size of the features and projected onto a wafer stage 110 the carries the integrated circuits 92 (or 'dies' as they are also known).
- the area of the wafer stage 110 illuminated by the light 104 is called the exposure area 112.
- the exposure area 112 is limited in size to maintain the accuracy of the projected pattern - whole wafer discs can not be exposed simultaneously.
- the vast majority of photolithographic steppers have an exposure area 112 less than 30 mm by 30 mm.
- the stepper exposes one die, or a part of a die, and then steps to another, or another part of the same die. Having as many nozzles as possible on a single monolithic substrate is advantageous for compact printhead design and minimizing the assembly of the ICs on a support in precise relation to one another.
- the invention configures the nozzle array so that more than 10,000 nozzles fit into the exposure area. In fact the entire integrated circuit can fit into the exposure area so that more than 14,000 nozzles are fabricated on a single monolithic substrate without having to step and realign for each pattern.
- FIG. 15A to 15C The operation of a scanner is sketched in Figure 15A to 15C .
- the light source 102 emits a narrower beam of light 104 that is still wide enough to illuminate the entire width of the reticle 106.
- the narrow beam 104 is focused through a smaller lens 108 and projected onto part of the integrated circuit 92 mounted in the exposure area 112.
- the reticle 106 and the wafer stage 110 are moved in opposing directions relative to each other so that the reticle's pattern is scanned across the entire exposure area 112.
- this type of photo-imaging device is also suited to efficient fabrication of printhead ICs with large numbers of nozzles.
- the printhead IC is fabricated in accordance with the steps listed in cross referenced USSN 11/246687 (Our Docket MNN001US) filed 11 October 2005. Only the exposure mask patterns have been changed to provide the different chamber and heater configurations.
- the roof layer and the chamber walls are an integral structure - a single Plasma Enhanced Chemical Vapor Deposition (PECVD) of suitable roof and wall material.
- Suitable roof materials may be silicon nitride, silicon oxide, silicon oxynitride, aluminium nitride etc.
- the roof and walls are deposited over a scaffold layer of sacrificial photoresist to form an integral structure on the passivation layer of the CMOS.
- Figure 8 shows the pattern etched into the sacrificial layer 72.
- the pattern consists of the chamber walls 32 and columnar features 68 (discussed below) which are all of uniform thickness. In the embodiment shown, the thickness of the walls and columns is 4 microns. These structures are relatively thin so when the deposited roof and wall material cools there is little if any depression in the exterior surface of the roof layer 70 (see Figure 9 ). Thick features in the etch pattern will hold a relatively large volume of the roof/wall material. When the material cools and contracts, the exterior surface draws inwards to create a depression.
- depressions leave the exterior surface uneven which can be detrimental to the printhead maintenance. If the printhead is wiped or blotted, paper dust and other contaminants can lodge in the depressions. As shown in Figure 9 , the exterior surface of the roof layer 72 is flat and featureless except for the nozzles 2. Dust and dried ink is more easily removed by wiping or blotting.
- each ink inlet supplies four nozzles except at the longitudinal ends of the array where the inlets supply fewer nozzles.
- Redundant nozzle inlets 14 are an advantage during initial priming and in the event of air bubble obstruction.
- the refill flow to the chambers 28 remote from the inlets 14 is longer than the refill flow to the chambers 28 immediately proximate the supply channel 6.
- the inlets 76 to the proximate chambers are dimensioned differently to the inlets 78 to the remote chambers.
- the column features 68 are positioned to provide different levels of flow constriction for the proximate nozzle inlets 76 and the remote nozzle inlets 78.
- the dimensions of the inlets and the position of the column can tune the fluidic drag such that the refill times of all the nozzles in the array are uniform.
- the columns can also be positioned to damp the pressure pulses generated by the vapor bubble in the chamber 28. Damping pulses moving though the inlet prevents fluidic cross talk between nozzles.
- the gaps 80 and 82 between the columns 68 and the sides of the inlets 76 and 78 can be effective bubble traps for larger outgassing bubbles entrained in the ink refill flow.
- Figure 12 shows a section of one color channel in the nozzle array with the dimensions necessary for 3200 dpi resolution.
- 3200 dpi is very high resolution - greater than photographic quality. This resolution is excessive for many print jobs. A resolution of 1600 dpi is usually more than adequate.
- the printhead IC sacrifice resolution by sharing the print data between two adjacent nozzles. In this way the print data that would normally be sent to one nozzle in a 1600 dpi printhead is sent alternately to adjacent nozzles in a 3200 dpi printhead. This mode of operation more than doubles the life of the nozzles and it allows the printer to operate at much higher print speeds. In 3200 dpi mode, the printer prints at 60 ppm (full color A4) and in 1600 dpi mode, the speed approaches 120 ppm.
- An additional benefit of the 1600 dpi mode is the ability to use this printhead IC with print engine controllers (PEC) and flexible printed circuit boards (flex PCBs) that are configured for 1600dpi resolution only. This makes the printhead IC retro-compatible with the Applicant's earlier PECs and PCBs.
- the nozzle 83 is transversely offset from the nozzle 84 by only 7.9375 microns. They are spaced further apart in absolute terms but displacement in the paper feed direction can be accounted for with the timing of nozzle firing sequence. As the 8 microns transverse shift between adjacent nozzles is small, it can be ignored for rendering purposes. However, the shift can be addressed by optimizing the dither matrix if desired.
- Figure 13 is an enlarged view of the nozzle array.
- the ejection aperture 2 and the chamber walls 32 are both elliptical. Arranging the major axes parallel to the media feed direction allows the high nozzle pitch in the direction transverse to the feed direction while maintaining the necessary chamber volume. Furthermore, arranging the minor axes of the chambers so that they overlap in the transverse direction also improves the nozzle packing density.
- the heaters 30 are a suspended beam extending between their respective electrodes 34 and 36.
- the elongate beam heater elements generate a bubble that is substantially elliptical (in a section parallel to the plane of the wafer). Matching the bubble 90, chamber 28 and the ejection aperture 2 promotes energy efficient drop ejection. Low energy drop ejection is crucial for a 'self cooling' printhead.
- the printhead IC shown in the drawings provides 'true' 3200 dpi resolution and the option of significantly higher print speeds at 1600 dpi.
- the print data sharing at lower resolutions prolongs nozzle life and offers compatibility with existing 1600 dpi print engine controllers and flex PCBs.
- the uniform thickness chamber wall pattern gives a flat exterior nozzle surface that is less prone to clogging.
- the actuator contact configuration and elongate nozzle structures provide a high nozzle pitch transverse to the media feed direction while keeping the nozzle array thin parallel to the media feed direction.
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Ink Jet (AREA)
Claims (15)
- Tête d'impression pour un imprimante à jet d'encre, la tête d'impression comprenant :- un réseau de buses agencées en rangées adjacentes, chaque buse ayant une ouverture d'éjection et un actionneur correspondant pour éjecter du fluide d'impression à travers l'ouverture d'éjection, chaque actionneur ayant des électrodes espacées les unes des autres dans une direction transversale aux rangées ; et,- des circuits de commande pour transmettre de l'énergie électrique aux électrodes ; caractérisée par le fait que :- les électrodes des actionneurs dans des rangées adjacentes ont des polarités opposées de telle sorte que les actionneurs dans des rangées adjacentes ont des directions de flux de courant opposées.
- Tête d'impression selon la revendication 1, dans laquelle les électrodes dans chaque rangée sont décalées de leurs actionneurs adjacents dans une direction transversale à la rangée de telle sorte que les électrodes d'un actionneur sur deux sont colinéaires.
- Tête d'impression selon la revendication 2, dans laquelle le décalage est de moins de 30 micromètres.
- Tête d'impression selon la revendication 1, dans laquelle le réseau de buses est fabriquée sur un substrat de tranche allongé s'étendant parallèlement aux rangées du réseau, et les circuits de commande sont des couches de semi-conducteur complémentaire à l'oxyde de métal (CMOS) sur une surface du substrat de tranche, les couches CMOS étant alimentées en énergie et en données le long d'un bord long du substrat de tranche.
- Tête d'impression selon la revendication 4, dans laquelle les couches CMOS ont une couche métallique supérieure formant un plan d'énergie qui transporte une tension positive de telle sorte que les électrodes ayant une tension négative se connectent à des trous de raccordement formés dans des trous dans le plan d'énergie.
- Tête d'impression selon la revendication 5, dans laquelle les couches CMOS ont un FET (transistor à effet de champ) de commande pour chaque actionneur dans une couche métallique inférieure.
- Tête d'impression selon la revendication 1, dans laquelle les actionneurs sont des éléments chauffants pour générer une bulle de vapeur dans le fluide d'impression de telle sorte qu'une goutte du fluide d'impression est éjectée à partir de l'ouverture d'éjection.
- Tête d'impression selon la revendication 1, dans laquelle les éléments chauffants sont des poutres suspendues entre leurs électrodes respectives de telle sorte qu'elles sont immergées dans le fluide d'impression.
- Tête d'impression selon la revendication 8, dans laquelle les ouvertures d'éjection sont elliptiques avec l'axe majeur de l'ouverture d'éjection parallèle à l'axe longitudinal de la poutre.
- Tête d'impression selon la revendication 9, dans laquelle les axes majeurs des ouvertures d'éjection dans l'une des rangées sont respectivement colinéaires avec les axes majeurs des ouvertures d'éjection dans la rangée adjacente de telle sorte que chacune des buses dans l'une des rangées est alignée avec l'une des buses dans la rangée adjacente.
- Tête d'impression selon la revendication 10, dans laquelle les axes majeurs d'ouvertures d'éjection adjacentes sont espacés de moins de 25 micromètres.
- Tête d'impression selon la revendication 1, dans laquelle la tête d'impression a un pas de buse supérieur à 1600 buses par pouce (npi) dans une direction transversale à une direction d'avance de supports.
- Tête d'impression selon la revendication 1, dans laquelle le pas de buse est supérieur à 3000 npi.
- Tête d'impression selon la revendication 13, dans laquelle la tête d'impression a une résolution d'impression en points par pouce (dpi) qui est égale au pas de buse.
- Tête d'impression selon la revendication 1, dans laquelle la tête d'impression est une tête d'impression de largeur de page configurée pour impression de supports de dimension A4.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/AU2007/001061 WO2009015406A1 (fr) | 2007-07-30 | 2007-07-30 | Tête d'impression à jet d'encre et polarités d'électrode d'actionneur opposées |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2173561A1 EP2173561A1 (fr) | 2010-04-14 |
EP2173561A4 EP2173561A4 (fr) | 2011-09-14 |
EP2173561B1 true EP2173561B1 (fr) | 2013-03-27 |
Family
ID=40303786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP07784706A Active EP2173561B1 (fr) | 2007-07-30 | 2007-07-30 | Tête d'impression à jet d'encre et polarités d'électrode d'actionneur opposées |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2173561B1 (fr) |
TW (8) | TWI464073B (fr) |
WO (1) | WO2009015406A1 (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI398364B (zh) * | 2010-10-22 | 2013-06-11 | Microjet Technology Co Ltd | 多色噴印墨頭模組 |
TWI398359B (zh) * | 2010-10-22 | 2013-06-11 | Microjet Technology Co Ltd | 單色噴印墨頭模組 |
CN102689513B (zh) | 2011-03-23 | 2015-02-18 | 研能科技股份有限公司 | 喷墨头结构 |
TWI468303B (zh) * | 2011-03-23 | 2015-01-11 | Microjet Technology Co Ltd | 噴墨頭結構 |
TWI472437B (zh) * | 2011-03-23 | 2015-02-11 | Microjet Technology Co Ltd | 噴墨頭結構 |
TWI472436B (zh) * | 2011-03-23 | 2015-02-11 | Microjet Technology Co Ltd | 噴墨頭結構 |
TWI472438B (zh) * | 2011-03-23 | 2015-02-11 | Microjet Technology Co Ltd | 噴墨頭結構 |
TWI472440B (zh) * | 2012-08-27 | 2015-02-11 | Microjet Technology Co Ltd | 頁寬噴墨列印裝置 |
CN103625111B (zh) * | 2012-08-27 | 2016-09-28 | 研能科技股份有限公司 | 页宽喷墨打印装置 |
TWI556983B (zh) * | 2013-09-26 | 2016-11-11 | 研能科技股份有限公司 | 可共用於一般噴墨列印及頁寬列印之噴印單元 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5412410A (en) * | 1993-01-04 | 1995-05-02 | Xerox Corporation | Ink jet printhead for continuous tone and text printing |
US5719602A (en) * | 1995-01-20 | 1998-02-17 | Hewlett-Packard Company | Controlling PWA inkjet nozzle timing as a function of media speed |
US6336714B1 (en) * | 1996-02-07 | 2002-01-08 | Hewlett-Packard Company | Fully integrated thermal inkjet printhead having thin film layer shelf |
US6203145B1 (en) * | 1999-12-17 | 2001-03-20 | Eastman Kodak Company | Continuous ink jet system having non-circular orifices |
KR100408270B1 (ko) * | 2000-07-26 | 2003-12-01 | 삼성전자주식회사 | 버블 젯 방식의 잉크 젯 프린트 헤드 |
TWI232802B (en) * | 2001-02-15 | 2005-05-21 | Benq Corp | High density jetting apparatus |
TW503179B (en) * | 2001-05-07 | 2002-09-21 | Benq Corp | Ink jetting device having bubble valve and the method thereof |
US20050206679A1 (en) * | 2003-07-03 | 2005-09-22 | Rio Rivas | Fluid ejection assembly |
EP1693217B1 (fr) * | 2005-02-16 | 2009-01-14 | Seiko Epson Corporation | Dispositif d'éjection de liquide et unité de contre-appui |
US7744195B2 (en) * | 2005-10-11 | 2010-06-29 | Silverbrook Research Pty Ltd | Low loss electrode connection for inkjet printhead |
US7735975B2 (en) * | 2005-10-26 | 2010-06-15 | Seiko Epson Corporation | Liquid ejecting apparatus, recording apparatus, and field generating unit |
-
2007
- 2007-07-30 EP EP07784706A patent/EP2173561B1/fr active Active
- 2007-07-30 WO PCT/AU2007/001061 patent/WO2009015406A1/fr active Application Filing
- 2007-11-26 TW TW096144797A patent/TWI464073B/zh active
- 2007-11-26 TW TW096144801A patent/TW200904644A/zh unknown
- 2007-11-26 TW TW096144809A patent/TW200904647A/zh unknown
- 2007-11-26 TW TW096144804A patent/TWI380909B/zh active
- 2007-11-26 TW TW096144795A patent/TW200904643A/zh unknown
- 2007-11-26 TW TW096144806A patent/TWI402179B/zh not_active IP Right Cessation
- 2007-11-26 TW TW096144799A patent/TW200904641A/zh unknown
- 2007-11-26 TW TW096144793A patent/TWI465347B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI402179B (zh) | 2013-07-21 |
TW200904647A (en) | 2009-02-01 |
TW200904644A (en) | 2009-02-01 |
TWI380909B (zh) | 2013-01-01 |
TW200904641A (en) | 2009-02-01 |
TW200904639A (en) | 2009-02-01 |
EP2173561A4 (fr) | 2011-09-14 |
TW200904643A (en) | 2009-02-01 |
EP2173561A1 (fr) | 2010-04-14 |
TW200904642A (en) | 2009-02-01 |
TWI464073B (zh) | 2014-12-11 |
WO2009015406A1 (fr) | 2009-02-05 |
TW200904646A (en) | 2009-02-01 |
TW200904645A (en) | 2009-02-01 |
TWI465347B (zh) | 2014-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7798603B2 (en) | Printhead with high nozzle pitch tranverse to print direction | |
EP2173561B1 (fr) | Tête d'impression à jet d'encre et polarités d'électrode d'actionneur opposées | |
US7712876B2 (en) | Inkjet printhead with opposing actuator electrode polarities | |
US9925774B2 (en) | Ink-jet head having passage unit and actuator units attached to the passage unit, and ink-jet printer having the ink-jet head | |
US8485628B2 (en) | Printer with resolution reduction by nozzle data sharing | |
US7731332B2 (en) | Ejection head, image forming apparatus and image forming method | |
JP2016107477A (ja) | インクジェットヘッドおよびプリンタ | |
US7845765B2 (en) | Inkjet printers with elongate chambers, nozzles and heaters | |
US7841695B2 (en) | Printhead IC with more than 10000 nozzles in the exposure area of a photo-imaging device | |
JP4218524B2 (ja) | 液体吐出装置及び液体吐出方法 | |
US7775630B2 (en) | Printhead integrated circuit with high droplet ejector density | |
US7784902B2 (en) | Printhead integrated circuit with more than 10000 nozzles | |
US7824010B2 (en) | Pagewidth printhead with more than 100000 nozzles | |
JP2009051081A (ja) | 液滴吐出ヘッド、一体型液滴吐出ヘッドユニット及び画像形成装置 | |
US7794061B2 (en) | Inkjet printhead with non-uniform nozzle chamber inlets | |
JP2007168141A (ja) | 液体吐出ヘッドおよび液体吐出装置 | |
JP2006315306A (ja) | 液体吐出ヘッドの製造方法、液体吐出ヘッド及び液体吐出装置 | |
JP2005104039A (ja) | 液吐出ヘッド及び液吐出装置 | |
JPH11216861A (ja) | インクジェットヘッド |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20100111 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA HR MK RS |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20110818 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B41J 2/045 20060101ALI20110811BHEP Ipc: B41J 2/145 20060101AFI20110811BHEP |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ZAMTEC LIMITED |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 603099 Country of ref document: AT Kind code of ref document: T Effective date: 20130415 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602007029351 Country of ref document: DE Effective date: 20130523 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130627 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: T3 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 603099 Country of ref document: AT Kind code of ref document: T Effective date: 20130327 |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG4D |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130628 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130708 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130727 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130729 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
RAP2 | Party data changed (patent owner data changed or rights of a patent transferred) |
Owner name: ZAMTEC LIMITED |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
26N | No opposition filed |
Effective date: 20140103 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602007029351 Country of ref document: DE Effective date: 20140103 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130731 Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130731 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R081 Ref document number: 602007029351 Country of ref document: DE Owner name: MEMJET TECHNOLOGY LIMITED, IE Free format text: FORMER OWNER: ZAMTEC LTD., DUBLIN, IE Effective date: 20141027 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: CD Owner name: MEMJET TECHNOLOGY LIMITED, IE Effective date: 20141118 Ref country code: FR Ref legal event code: CA Effective date: 20141118 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: TD Effective date: 20150128 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 Ref country code: MT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20130327 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 9 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130730 Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO Effective date: 20070730 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 10 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 11 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 12 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20190726 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IE Payment date: 20190729 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20200727 Year of fee payment: 14 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MM Effective date: 20200801 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20200801 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20200730 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20210731 |
|
P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230415 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20240729 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20240729 Year of fee payment: 18 |