EP2112670B1 - Procede de production de fines particules conductrices - Google Patents

Procede de production de fines particules conductrices Download PDF

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Publication number
EP2112670B1
EP2112670B1 EP08710394.1A EP08710394A EP2112670B1 EP 2112670 B1 EP2112670 B1 EP 2112670B1 EP 08710394 A EP08710394 A EP 08710394A EP 2112670 B1 EP2112670 B1 EP 2112670B1
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Prior art keywords
fine particles
negative electrode
magnetic field
plasma
voltage
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EP08710394.1A
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German (de)
English (en)
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EP2112670A1 (fr
EP2112670A4 (fr
Inventor
Seiichi Watanabe
Yu Toriyabe
Shigeo Yatsu
Tamaki Shibayama
Tadahiko Mizuno
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KANKYOU ENGINEERING Co Ltd
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Kankyou Eng Co Ltd
Kankyou Engineering Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/06—Solidifying liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • B01J37/342—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electric, magnetic or electromagnetic fields, e.g. for magnetic separation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0822—The electrode being consumed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0824—Details relating to the shape of the electrodes
    • B01J2219/0826—Details relating to the shape of the electrodes essentially linear
    • B01J2219/0828—Wires
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0837—Details relating to the material of the electrodes
    • B01J2219/0841—Metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0845—Details relating to the type of discharge
    • B01J2219/0847—Glow discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0879—Solid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • the present invention relates to a method for producing conductor fine particles, more specifically to a method for producing conductor fine particles by utilizing submerged plasma discharge. Particularly, the present invention relates to a method for producing spherical conductor fine particles with an average particle diameter of 10-1,000nm.
  • Nano-sized, conductor or non-conductor particles are generally produced in a single gas phase or liquid phase (see Non-Patent Document 1).
  • Gas-phase methods are continuous processes suitable for high-speed mass production of highly pure particles and have reached a higher degree of technical maturity than other methods. Nevertheless, gas-phase methods still face the greatest challenge of improving the quality of nanoparticles themselves, with productivity (yield) and cost effectiveness (cost reduction and equipment/process simplification) also remaining to be improved. Liquid-phase methods, on the other hand, can produce less aggregated particles with a uniform particle diameter, but are similarly facing the challenge of improving cost effectiveness and functions (e.g., catalyst characteristics), as well as the quality of nanoparticles themselves.
  • Patent Document 1 reports a plasma generation method which includes the steps of: providing a fluid in a bath having therein separately-arranged electrodes constituting a cathode electrode and an anode electrode; forming a stream of air bubbles in the fluid in the vicinity of the cathode electrode; and applying a voltage between the cathode and anode electrodes to cause glow discharge in the air bubbles for plasma generation.
  • Patent Document 1 also reports that submerged plasma generation leads to production of fine particles from metal ions etc., contained in the fluid.
  • Patent Document 5 discloses a method to produce metal powder which causes a plasma discharge between an elemental metal electrode and a counter electrode placed in water to generate metal ion vapor. The metal ion vapor contacts with water to convert it to metal powder.
  • the present invention is directed to a method for producing conductor fine particles from negative electrode material by utilizing plasma generated using a pair of electrodes placed in a conductive liquid (in-liquid spark plasma). More specifically, the present invention relates to the following methods.
  • the inventive method can combine the advantages of conventional gas-phase methods and liquid-phase method because it utilizes a reaction process in a diphasic system containing both a liquid phase and a gas phase which has been partially or entirely changed into plasma phase by submerged discharge.
  • the inventive method requires no vacuuming system, reduced pressure, or vacuum chamber. For these reasons, the inventive method can produce a large amount of fine particles in a short time and can control the reaction site atmosphere more easily than gas-phase methods.
  • Table 1 shows physical properties and productivity of fine particles produced according to the present invention in comparison with those of fine particles produced by conventional methods.
  • Table 1 Inventive method (plasma is used: physical process using energy heam) Gas-phase method (CVD, gas atomizing, etc.) Liquid-phase methods (chemical synthesis) Solid- phase method (pulverizing, mechanical alloying) Quality (contamination, etc.) A A C D Productivity (cost effectiveness, mass productivity) B C A A Alloying capability (arbitrary composition) A B C A Size controllability (nanosizing property) A C A D Uniformity (particle size distribution) C C A B Classification property Aggregability B D A B Spheroidizing capability (nanoball) A D C B
  • fine particles With a production method of the present invention, conductor fine particles (hereinafter simply referred to as “fine particles”) can be produced.
  • fine particles refer to micro-sized particles or smaller, particularly nano-sized particles, i.e., particles with an average diameter of 10-1,000nm.
  • fine particles Preferably, fine particles have spherical shape; however, the particle shape is not specifically limited, and it may be needle shape, for example.
  • spherical fine particles are referred to as “nanoballs.”
  • Conductors encompass electric conductors such as metals and alloys and semiconductors such as silicon and carbon.
  • a production method of the present invention includes a step of applying a voltage between a pair of electrodes placed in a conductive liquid.
  • Any solvent can be used for the preparation of the conductive liquid as long as the solvent may dissolve electrolytic substance.
  • solvents include organic solvents such as ethylene carbonate (EC), diethyl carbonate (DEC), propylene carbonate, and dimethyl carbonate; water; and ionic liquids.
  • EC ethylene carbonate
  • DEC diethyl carbonate
  • propylene carbonate propylene carbonate
  • dimethyl carbonate water
  • ionic liquids water that contains electrolyte as solute
  • water that contains electrolyte as solute is referred to as "electrolytic aqueous solution.”
  • the conductive liquid may be a molten salt having conductive property.
  • the electrolyte may be neutral, alkaline, or acidic substance. Examples of alkaline electrolytes include carbonates such as potassium carbonate and sodium carbonate.
  • the conductive liquid temperature is not specifically limited as long as it is lower than temperature (which is higher than its boiling point) where the liquid will be entirely turned into gas; however, it may be around normal temperature.
  • the conductive liquid temperature is around normal temperature, the conductive material melted away from the negative electrode can be easily re-solidified, thereby facilitating production of fine particles.
  • the conductive liquid temperature is raised beforehand, gas phase generation is facilitated around the negative electrode.
  • a preferable temperature of the electrolytic aqueous solution is considered to be around 70-90°C under atmospheric pressure. Under increased pressure, however, the temperature of the electrolytic aqueous solution may be above 100°C.
  • Negative electrode material serves as a source of fine particles to be produced by a production method of the present invention, and therefore, it is appropriately selected according to the type of fine particles to be produced.
  • Negative electrode material, or fine particle source material is preferably a conductive or semiconductive material which can be formed into a negative electrode having a smooth surface. The smooth surface can achieve a uniform electric field at the negative electrode surface.
  • material with high thermal conductivity is generally preferable.
  • the negative electrode material be stable in a conductive liquid in a state where no electric current is applied.
  • the shape of the negative electrode is not specifically limited; however, the negative electrode is preferably highly symmetrical in view of achieving uniform electric field intensity, and spherical shape is ideal. It is, of course, possible to employ columnar or cylindrical shape, which may be more practical shape.
  • Anode electrode material is not specifically limited as long as the anode electrode is stable in a conductive liquid in a state where no electric current is applied.
  • platinum may be used.
  • the surface area of the positive electrode is preferably larger than that of the negative electrode.
  • the surface area of the positive electrode may be about 25-1000 times as large as that of the negative electrode, in order to generate a uniform electric field around the negative electrode and to cause voltage reduction, power loss and temperature increase to occur intensively in the vicinity of the negative electrode.
  • the positive electrode may be made large, or the positive electrode may be formed as a cylindrical mesh electrode surrounding the negative electrode.
  • the positive and negative electrodes are arranged in a conductive liquid without being in contact with each other. It is preferable that only a conductive liquid exist between the positive and negative electrodes. Although it is preferable to arrange the positive electrode in such a way as to concentrically surround the negative electrode, it is not necessarily required to arrange the positive electrode so as to surround all over the negative electrode.
  • the distance between the positive and negative electrodes is appropriately determined such that stable glow discharge occurs in the vicinity of a surface of the negative electrode for plasma generation, and that arc discharge never occurs due to electrode-to-electrode connection via a discharge path with high current density.
  • a typical electrode-to-electrode distance is 20-1,000nm.
  • the voltage to be applied may be high enough to cause plasma generation in the vicinity of the negative electrode.
  • the conductive liquid is an electrolyte aqueous solution, it is 16V or greater, preferably 80V or greater, more preferably 140V or greater.
  • a voltage of 140V or greater is generally a full plasma area that causes plasma emission from the entire surface of the negative electrode, resulting in the plasma generation virtually without depending on the type, size, etc., of negative electrode material, ingredients and concentration of the conductive liquid, etc.
  • the voltage to be applied is generally 1,000V or less, more preferably 300V or less.
  • the conductive liquid is an electrolytic aqueous solution
  • voltage application causes hydrogen gas generation by electrolysis or plasma decomposition of water molecules.
  • the present invention can also produce hydrogen by utilizing plasma.
  • the size of resulting fine particles may be adjusted. Specifically, by increasing voltage, it is possible to reduce particle size. This is demonstrated in Examples of the present invention described below (see FIG. 10 ).
  • a magnetic field is applied in the vicinity of the negative electrode during the production of fine particles.
  • This magnetic field can grow partial plasma, which has been generated near a part of the negative electrode, into full plasma surrounding the entire negative electrode.
  • the magnetic field applied in the vicinity of the negative electrode can shorten the time it takes for partial plasma to grow into full plasma (see FIG. 12 ).
  • Current concentration phenomenon is a phenomenon peculiar to atmospheric weakly-ionized plasma, where a uniform electric current passing through plasma changes into an intermittent, locally-concentrated current at multiple sites of the negative electrode surface. This current concentration phenomenon leads to melting of negative electrode surface, and then fine particles are formed. Accordingly, magnetic field application facilitates the generation of the current concentration phenomenon and thus can reduce voltage, enabling cost effective fine particle production.
  • the magnetic field applied in the vicinity of the negative electrode can control the plasma generation and plasma growth, it can also control the plasma-mediated hydrogen production process.
  • magnetic field application is more preferably following plasma generation.
  • this magnetic field it is preferable for this magnetic field to contain a component which is perpendicular to an electric current flowing from the negative electrode to the positive electrode, because partial plasma can be readily grown into full plasma which entirely covers the negative electrode.
  • the possible underlying mechanism of this is as follows: Application of a magnetic field containing a component perpendicular to the current flow direction can prevent the generation of heat flux which is perpendicular to the magnetic field direction, whereby heat generated near the negative electrode becomes difficult to diffuse so that plasma can easily cover the negative electrode entirely. Moreover, elevated plasma temperature achieves stable plasma retention.
  • the magnetic field preferably contains a component parallel to the major axis of the negative electrode. More preferably, the magnetic field contains a component parallel to the negative electrode surface.
  • the magnetic field preferably has a magnetic flux density (intensity) of 0.05 tesla (500 gauss) or greater.
  • a magnetic field generated using an electromagnet may be applied in the vicinity of the negative electrode.
  • electromagnets include Helmholtz coils.
  • the magnetic field may be partially enhanced by placing a high-magnetic permeability magnetic metal in the vicinity of the negative electrode.
  • magnetic metals include ferrite.
  • the magnetic flux density of the magnetic field applied in the vicinity of the negative electrode may be 1 tesla or greater.
  • the magnetic flux density is 1 tesla or greater, it results in "micronization” of a current concentration phenomenon due to hall effect.
  • “Micronization of current concentration phenomenon” as used herein means that a current concentration phenomenon occurs more frequently (temporally) and more densely (spatially). This achieves mass production of finer particles.
  • a production method of the present invention includes a series of the following steps of: applying a voltage between a pair of positive and negative electrodes so as to heat a conductive liquid around the negative electrode to a temperature equal to or greater than its boiling point for gasification; and generating plasma in a gas phase generated in the vicinity of, or around, the negative electrode, so that the negative electrode material is partially melted and then re-solidified to produce fine particles.
  • a magnetic field is applied in the vicinity of the negative electrode to facilitate the generation of full plasma to accelerate the occurrence of current concentration phenomenon.
  • Voltage application increases the electrode temperature due to power loss at the negative electrode surface and gasifies a portion of a conductive liquid (e.g., electrolytic aqueous solution) around the negative electrode by raising the conductive liquid temperature to a level equal to or greater than the boiling point. It is preferable to produce a sheath-shaped gas phase around the negative electrode.
  • a conductive liquid e.g., electrolytic aqueous solution
  • the temperature of the entire solution may be set somewhat higher beforehand. Glow discharge occurs in the generated gas phase to produce plasma.
  • the plasma generated according to the present invention is glow discharge plasma. The presence of plasma may be confirmed by observation of light emission from the plasma.
  • the conductive liquid may be caused to swirl about the major axis of the negative electrode, so that fine particles with a certain diameter (or weight) settle at the bottom of the apparatus for collecting.
  • the swirling flow in the cell can be generated by Lorentz force.
  • Discharge conditions include voltage level, current level, voltage and current fluctuations; discharge time; type, concentration and temperature of conductive liquid; elemental composition of electrode; electrode shape; initial electrode surface roughness; electrode temperature; and type and concentration of impurity or added element in the electrode material.
  • Different discharge conditions lead to production of fine particles of different conditions, e.g., fine particles with oxidized surface ( FIGS. 3A and 3B ), fine particles with defects ( FIG. 4 ), etc.
  • the size of fine particles can be made small.
  • physical properties of fine particles can also be controlled by the direction, intensity, and intensity distribution of a magnetic field applied.
  • increasing magnetic field intensity facilitates the occurrence of current concentration phenomenon and thus mass production of finer particles can be achieved.
  • fine particles produced along with magnetic field application in the vicinity of the negative electrode may be magnetic particles. Magnetic field application enables to control the particle size distribution of fine particles.
  • the degree of current concentration may be enhanced.
  • To achieve this heat diffusion from the negative electrode may be prevented; voltage and magnetic field intensity may be enhanced; and so forth.
  • Prevention of heat diffusion can be accomplished for instance by appropriate selection of the shape or physical properties of the negative electrode, and/or connection form between the negative electrode and negative electrode lead. It is possible to enhance the energy of electrons by increasing voltage and thus to increase the degree of current concentration. It is also possible to increase the degree of current concentration by hall effect by increasing the magnetic field intensity.
  • Particle size can be measured for instance by calculating the circle equivalent diameter based on the area of a projected SEM image.
  • Fine particles produced by a production method of the present invention may be spherical balls (nanoballs).
  • spherical ball means that, on any cross section of a particle, the diameter of one direction is 95-105%, more preferably 98%-102% of that of the other direction intersecting at right angle.
  • Fine particles produced according to the present invention are extremely small in size and therefore, when used as material for magnetic recording media, unprecedentedly high-recording density can be realized. Moreover, fine particles produced according to the present invention have high surface area-to-volume ratios and thus have potential to serve as excellent metal photocatalyst.
  • fine particles produced according to the present invention which are extremely small in size may undergo melting point reduction and changes in the physical property transition point (e.g., Curie point) due to ultra-small size effect, they can be utilized for the development of novel semiconductor elements, ferroelectric elements, and ferromagnetic elements.
  • Fine particles produced according to the present invention employing conductive polymer as a material for the negative electrode may become a novel source for pharmaceutical products (e.g., cosmetics).
  • fine particles produced according to the present invention employing metals (including alloys) as a source may present an innovative development in all aspects of engineering fields including fine particle production.
  • FIG. 1A is a schematic illustration of a fine particle production apparatus for carrying out a production method of the present invention.
  • a production method of the present invention is carried out with a fine particle production apparatus shown in FIG. 1A , which includes cell 1 as a container of a conductive liquid; a pair of separate electrodes (negative electrode 2 and positive electrode 3) placed in the cell; and a DC power source (not shown) for applying voltage between the electrodes.
  • This apparatus is similar to conventional water electrolysis apparatus.
  • a production method of the present invention may be carried out with a fine particle production apparatus shown in FIG.
  • generated gas recovery hose 12 for recovering generated gas (hydrogen gas in the case where water is employed as a solvent of the conductive liquid); generated gas recovery unit (not shown) connected to generated gas recovery hose 12; electromagnets 7 for applying a magnetic field in the vicinity of negative electrode 2; power source (not shown) for electromagnets 7; conductive liquid supplier 8 for refilling cell 1 with a conductive liquid for continuous operation; bottom liquid recovery unit 10 for recovering liquid at the bottom of the cell which contains fine particles produced; and magnetic stirring unit 9 for magnetically stirring the solution in the cell.
  • generated gas recovery hose 12 for recovering generated gas (hydrogen gas in the case where water is employed as a solvent of the conductive liquid)
  • generated gas recovery unit (not shown) connected to generated gas recovery hose 12
  • electromagnets 7 for applying a magnetic field in the vicinity of negative electrode 2
  • power source not shown
  • conductive liquid supplier 8 for refilling cell 1 with a conductive liquid for continuous operation
  • bottom liquid recovery unit 10 for recovering liquid at the bottom of the cell which contains fine particles produced
  • the material of cell 1 is not specifically limited; glass, Teflon (R) , polyethyl ether ketone (PEEK), etc., may be employed. These materials should however be stable against the conducive liquid such as aqueous solution.
  • the cell volume may be appropriately set.
  • any DC power source may be employed that can apply voltage capable of generating plasma (e.g., 16-300V) between the electrodes.
  • the above production apparatus may include cell cover 4 primarily made of electrical insulator. Cell cover 4 may be provided with opening 5 through which water is supplied or generated gas (e.g., hydrogen gas) is exhausted.
  • the above production apparatus may be further provided with means of maintaining the conductive liquid temperature, i.e., heating or cooling means with control mechanism (thermocouple 6 is shown in FIGS. 1A and 1B ), a temperature sensor (not shown), etc.
  • FIG. 1A An apparatus shown in FIG. 1A was prepared.
  • the thin metal wire was covered with Teflon (R) at a part other than the discharge part.
  • a mesh-shaped platinum electrode 50mm x 100mm was employed as positive electrode 3.
  • Glass cell 1 was filled with calcium carbonate (K 2 CO 3 ) aqueous solution (0.1mol/dm 3 ). The electrode pair was dipped in the aqueous solution at a depth of within 100mm from the liquid surface. The distance between the positive electrode and negative electrode was set to 50mm.
  • Negative electrode discharge electrolysis was carried out, with cell voltage set to 80-160V and discharge time set to about 30 minutes. Due to power loss at the negative electrode surface, the electrode temperature increased to a level exceeding the solution's boiling point, forming a sheath-shaped gas phase which contains water vapor at the negative electrode/solution interface. The cell voltage was high enough to cause glow discharge in the gas phase (occurrence of discharge was confirmed only around the negative electrode). The solution temperature was kept at around 70-90°C.
  • FIGS. 2A-2D After negative electrode discharge electrolysis, negative electrode surface was observed with a scanning electron microscope (SEM) ( FIGS. 2A-2D ). Further, liberated fine particles were observed with a transmission electron microscope (TEM) ( FIGS. 2E-2H ). As shown in FIGS. 2A-2L , fine particles ranging about 10nm-1 ⁇ m in diameter were observed; even fine particles of about 10nm in diameter were kept spherical. Under certain discharge conditions, ultrafine particles of less than 10nm in diameter (3-5nm) were produced.
  • FIGS. 2I-2L respectively show electron beam diffraction patterns of fine particles shown in FIGS. 2E-2H . In FIGS.
  • the right half images are theoretical diffraction patterns of the corresponding negative electrode materials (fine particle source), and the left half images are actual diffraction patterns measured for the corresponding fine particles.
  • the actual diffraction patterns of the fine particles shown in FIGS. 2I, 2K and 2L virtually match the theoretical diffraction patterns of their source material, suggesting that these fine particles are cubical crystals as are their source material.
  • titanium fine particles exhibited rutile structure ( FIG. 2J ) in contrast to the source material (negative electrode material). This is considered to be attributed to the oxidization of titanium fine particle surface.
  • FIGS. 3A and 3B show an electron beam diffraction pattern and an X-ray diffraction spectrum of Ti fine particles produced, respectively.
  • Energy dispersive X-ray spectroscopy (EDS) confirmed that Ti fine particle surface contains TiO 2
  • the crystal structure expected from the electron beam diffraction pattern shown in FIG. 3A and X-ray diffraction spectrum shown in FIG. 3B was consistent with the TiO 2 rutile structure expected by theoretical calculation.
  • FIG. 4 indicates a sequence of close-packed planes [111] and defect sites. These defects are considered to be produced due to rapid cooling of droplets of molten negative electrode material in the conductive liquid. With this effect, fine particles with amorphous structure may be produced. Specifically, when alloys which easily become amorphous are employed as the material for the negative electrode, metal glass may be obtained.
  • FIG. 5 shows a TEM image of fine particles produced from austenite stainless steel (SUS 316).
  • FIG. 5 indicates that spherical stainless alloy fine particles of several nanometers to 500nm in diameter were produced.
  • FIG. 6 shows an austenite stainless steel particle of about 300nm in diameter and also indicates this particle is spherical.
  • FIG. 7 shows concentration maps of elements of the fine particle shown in FIG. 6 , analyzed by transmission electron microscopy-energy dispersive spectroscopy (TEM-EDS).
  • FIG. 7 shows distributions of the elements of the fine particle measured by detecting corresponding characteristic X-rays.
  • CrK, MnK, FeK, NiK and MoK elemental distributions are shown which are measured based on the characteristic X-rays unique to each element, which emits when an electron falls from an outer shell to the K shell in each atom.
  • FeL Fe distribution is shown which is measured based on the characteristic X-ray which emits when an electron falls from an outer shell to the L shell in the iron atom.
  • FIG. 7 indicates that the above elements exist at high density in the fine particle.
  • FIG. 8 shows a constituent element spectrum of the entire fine particle shown in FIG. 6 analyzed by transmission electron microscopy-energy dispersive spectroscopy (TEM-EDS).
  • TEM-EDS transmission electron microscopy-energy dispersive spectroscopy
  • Table 2 shows proportions of the elements of the fine particle of FIG. 6 in units of weight percent. The values in Table 2 were calculated from FIGS. 7 and 8 under the following analysis condition:
  • Table 3 shows an elemental composition of a particle source material, i.e., an austenite stainless steel negative electrode.
  • Table 3 Element Weight% Cr 16-18 Mn 0-2 Fe 62-72 Ni 10-14 Mo 2-3
  • FIG. 9 shows a particle size distribution of fine particles produced according to the present invention, where the vertical axis represents particle count and the horizontal axis represents particle diameter (nm), which is a circle equivalent diameter calculated based on the area of a projected SEM image. More specifically, FIG. 9 shows a particle size distribution of nickel fine particles produced using as a negative electrode a 1.5mm-diameter nickel thin wire while applying 160V voltage for 30 minutes. The nickel fine particles produced under the above condition had a minimum diameter of 46nm, maximum diameter of 180.5nm, and average particle diameter of 93.8nm.
  • FIG. 10 is a graph showing average particle diameters of Ni fine particles (nanoparticles) calculated based on SEM images as a function of cell voltage, where the vertical axis represents particle diameter and the horizontal axis represents value of applied voltage.
  • Nickel fine particles were produced under different conditions: The diameter of the Ni thin wire was set to 1.0mm or 1.5mm, and voltage application time was set to 10 minutes or 30 minutes.
  • the diameter of the Ni thin wire was set to 1.0mm or 1.5mm, and voltage application time was set to 10 minutes or 30 minutes.
  • black square symbol represents data where Ni thin wire diameter was set to 1.0mm and voltage application time was set to 30 minutes; black round symbol represents data where Ni thin wire diameter was set to 1.5mm and voltage application time was set to 30 minutes; white square symbol represents data where Ni thin wire diameter was set to 1.0mm and voltage application time was set to 10 minutes; and white round symbol represents data where Ni thin wire diameter was set to 1.5mm and voltage application time was set to 10 minutes.
  • FIG. 11 shows a relationship between plasma generation and applied voltage level.
  • the vertical axis represents current value
  • horizontal axis represents voltage value. It was confirmed that while no or little plasma was generated in the typical electrolysis area A and transition area C and at breakdown point B, plasma was clearly generated in the partial plasma area D or full plasma area E, i.e., when about 80V or greater voltage was placed.
  • FIG. 12 shows a relationship between discharge characteristics and presence of a magnetic field.
  • current flowing from the positive electrode to negative electrode was measured at different voltage levels with and without application of a magnetic field containing a component parallel to the negative electrode surface.
  • a cylindrically-curved platinum mesh was employed as the positive electrode and was placed 48mm away from the negative electrode so as to surround it.
  • the intensity (magnetic flux density) of the applied magnetic field was 0.1 tesla (1,000 gauss) and a Helmholtz coil was used as a magnetic field application means. The same condition was used except for the presence of a magnetic field applied.
  • Calcium carbonate (K 2 CO 3 ) aqueous solution (0.1mol/dm 3 ) was employed as the conductive liquid.
  • line A indicates changes in current with respect to voltage when no magnetic field is applied
  • line B indicates changes in current with respect to voltage when a magnetic field is applied.
  • the generation of partial plasma and generation of full plasma can be controlled by magnetic field application.
  • the conductive liquid is an electrolytic aqueous solution
  • hydrogen is generated in the ohmic phase by electrolysis
  • the plasma-mediated phase hydrogen is generated by plasma decomposition of water molecules.
  • the plasma generation can be controlled by magnetic field application, it is also possible to control the ratio of contribution of the plasma decomposition and electrolysis to hydrogen generation.
  • conductor fine particles it is possible to produce conductor fine particles much more inexpensively than other conventional production methods.
  • conductor fine particles By controlling discharge conditions, it is also possible to produce conductor fine particles with desired size (e.g., nanosize), shape, etc.
  • Conductor fine particles produced according to the present invention are used in a variety of applications; for example, they can be contained in semiconductor sealing materials, fine films, display sealing materials, ultra large-area chemical catalysts, cosmetics, pharmaceuticals, etc.
  • complex conductor fine particles or multilayered conductor fine particles are produced by combining thermal fluid control or chemical reactions in the liquid phase near the electrode.
  • Fine particles produced according to the present invention are extremely small in size and therefore, when used as material for magnetic recording media, unprecedentedly high-recording density can be realized. Moreover, fine particles produced according to the present invention have high surface area-to-volume ratios and thus have potential to serve as excellent metal photocatalyst.
  • fine particles produced according to the present invention which are extremely small in size may undergo melting point reduction due to ultra-small size effect and changes in the physical property transition point (e.g., Curie point), they can be utilized for the development of novel semiconductor elements, ferroelectric elements, and ferromagnetic elements.
  • Fine particles produced according to the present invention employing conductive polymer as a material for the negative electrode may become a novel source for pharmaceutical products (e.g., cosmetics).
  • fine particles produced according to the present invention employing metals (including alloys) as a source may present an innovative development in all aspects of engineering fields including fine particle production.

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Claims (15)

  1. Procédé destiné à produire des particules fines de conducteur, comprenant les étapes consistant à :
    appliquer une tension entre une électrode positive (3) et une électrode négative (2) placées dans un liquide conducteur pour générer un plasma dans le voisinage de l'électrode négative (2), et
    faire fondre partiellement un matériau conducteur constituant l'électrode négative (2), puis solidifier à nouveau pour produire des particules fines,
    caractérisé en ce que
    le plasma provoque un phénomène de concentration de courant au niveau de l'interface électrode négative/liquide conducteur ;
    un champ magnétique est appliqué dans le voisinage de l'électrode négative pour accélérer l'apparition du phénomène de concentration de courant, et
    la fusion partielle du matériau conducteur est provoquée par le phénomène de concentration de courant.
  2. Procédé selon la revendication 1, dans lequel la direction du champ magnétique est parallèle au grand axe de l'électrode négative (2).
  3. Procédé selon la revendication 1, dans lequel le champ magnétique présente une densité de flux magnétique supérieure ou égale à 0,05 tesla.
  4. Procédé selon la revendication 1, dans lequel le champ magnétique présente une densité de flux magnétique supérieure ou égale à 1 tesla.
  5. Procédé selon la revendication 1, dans lequel l'étape pour appliquer un champ magnétique est exécutée après l'étape de génération de plasma et avant l'étape de génération de particules fines.
  6. Procédé selon la revendication 1, dans lequel le liquide conducteur contient une substance électrolytique et un liquide qui peut dissoudre la substance électrolytique.
  7. Procédé selon la revendication 6, dans lequel le solvant pour le liquide conducteur est du carbonate d'éthylène (EC), du carbonate de diéthylène (DEC), du carbonate de propylène, du carbonate de diméthyle, de l'eau, ou un liquide ionique.
  8. Procédé selon la revendication 1, dans lequel le liquide conducteur contient de l'eau, et l'hydrogène est généré conjointement aux particules fines de conducteur par le procédé.
  9. Procédé selon la revendication 1, dans lequel l'électrode positive (3) présente une aire supérieure à l'aire de l'électrode négative (2).
  10. Procédé selon la revendication 1, dans lequel l'aire de l'électrode positive (3) est de 25 à 1000 fois supérieure à l'aire de l'électrode négative (2).
  11. Procédé selon la revendication 1, dans lequel la tension est 10-1000 V.
  12. Procédé selon la revendication 1, dans lequel la tension est 80-300 V.
  13. Procédé selon la revendication 1, dans lequel les particules fines présentent un diamètre de particules moyen de 10-1000 nm.
  14. Procédé selon la revendication 1, dans lequel les particules fines sont sphériques.
  15. Procédé selon la revendication 1, dans lequel les particules fines présentent des diamètres de particules allant de 3 nm à 2000 nm.
EP08710394.1A 2007-02-15 2008-02-15 Procede de production de fines particules conductrices Not-in-force EP2112670B1 (fr)

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WO2008099618A1 (fr) 2008-08-21

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