EP2094441B1 - Verfahren und vorrichtung zur behandlung von verbrauchten schleifschlämmen aus dem läppverfahren zur rückgewinnung ihrer wiederverwendbaren schleifbestandteile - Google Patents

Verfahren und vorrichtung zur behandlung von verbrauchten schleifschlämmen aus dem läppverfahren zur rückgewinnung ihrer wiederverwendbaren schleifbestandteile Download PDF

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EP2094441B1
EP2094441B1 EP07866781A EP07866781A EP2094441B1 EP 2094441 B1 EP2094441 B1 EP 2094441B1 EP 07866781 A EP07866781 A EP 07866781A EP 07866781 A EP07866781 A EP 07866781A EP 2094441 B1 EP2094441 B1 EP 2094441B1
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Prior art keywords
abrasive grains
hydrocyclone
reusable
battery
fine
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French (fr)
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EP2094441A1 (de
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Guido Fragiacomo
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GARBO Srl
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GARBO Srl
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Definitions

  • the present invention concerns a process and relative apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component.
  • Document JP 04 315 576 A discloses an example of a method according to the preamble of claim 1. More specifically, the invention concerns a process, with the necessary equipment for implementing it, for recovering the reusable abrasive component contained in an abrasive slurry for lapping silicon, quartz or ceramic wafers when it is exhausted and enriched with undesired waste matter.
  • the process enables the total recovery of the still reusable abrasive grains contained in the exhausted slurry coming from the lapping process that are the sole reusable component in this type of slurries, because the suspension liquid consists of water and the suspension additive is present in insufficient amount to make its recovery economically feasible.
  • wafers which are obtained from either polycrystalline or monocrystalline silicon ingots by first cutting the ingot perpendicularly to its length.
  • this slicing operation is carried out by means of wire saws or cutters in which a metal wire of considerable length and suitable mechanical resistance, wound in a system of rollers and spools, is contacted while moving with the ingot, perpendicularly to the ingot length, at the points where the cut is to be made.
  • a slurry containing abrasive grains or particles is fed to the contact area between the cutter wire and the ingot.
  • the conventional abrasive slurries used for cutting ingots of silicon, quartz or other ceramic material with a wire saw consist of a suspending, lubricant or cooling fluid such as a mineral oil or water-soluble organic liquids of high molecular weight (in particular, polyethylene glycol, PEG) in which abrasive particles of suitable hardness, generally of silicon carbide (SiC), are suspended.
  • a suspending, lubricant or cooling fluid such as a mineral oil or water-soluble organic liquids of high molecular weight (in particular, polyethylene glycol, PEG) in which abrasive particles of suitable hardness, generally of silicon carbide (SiC), are suspended.
  • the silicon wafers then undergo a lapping process, which is necessary in order to guarantee the strict mechanical tolerances required by the microelectronics industry and to eliminate any damage to the silicon crystalline lattice introduced by the previous cutting operation as well as to prepare the surfaces for the subsequent polishing operation.
  • the lapping operation is carried out with lapping machines essentially consisting of two large perfectly flat and round overlapping horizontal cast-iron plates that rotate in opposite directions to one another.
  • the lower plate is uniformly covered with an abrasive slurry and the silicon wafers coming from the cutting operation are placed on it within special satellites that are thinner than the silicon wafers to be lapped.
  • the satellites are made to rotate by the movement of the lower round plate by means of a cogged transmission system.
  • the wafers are then uniformly covered with the abrasive slurry and the upper plate is lowered onto them.
  • the whole system is thus made to rotate and the abrasive slurry is continuously fed into the space between the two plates throughout the lapping process. The operation continues until the wafer thickness required by the microelectronics technology is reached.
  • the abrasive slurry used for the lapping process is composed of a mixture of de-ionised water (suspending liquid), the actual abrasive, usually alumina, Al 2 O 3 , with a target grain size between 4 and 20 ⁇ m, depending on the required characteristics, and a commercially available suspension additive which has the task of facilitating and stabilising the suspension of abrasive particles in water.
  • This additive is present in the suspension in an amount ranging between 3 and 4% weight, and is normally a product of such low economic value that its recovery from exhausted abrasive slurry is not considered worthwhile.
  • a typical composition of abrasive slurry for silicon wafer lapping is as follows: - de-ionised water 76.5% by weight - commercial suspension additive 3.5% by weight - abrasive: pure alumina (with typical grain size PW9 or PW15) 20.0% by weight or mixed with other oxides 200-300 g/l - suspension viscosity 450 centipoise
  • part of the abrasive grains lose their useful characteristics for the optimal functioning of the process itself because the alumina particles break down into smaller particles and are thus no longer suitable for the lapping operation: this is shown by the fact that the grain size distribution of the abrasive particles decreases to lower average values.
  • the abrasive slurry becomes enriched with fine particulate coming from the silicon wafers when their thickness is reduced and from the cast iron plates (largely iron particulate) of the lapping machine that are abraded along with the silicon, as well as from the metal pipes of the machine itself.
  • the percentage of fine particles (particles of a size ⁇ 4 ⁇ m of abrasive, iron and silicon) in an exhausted slurry is about 30% of the solid fraction.
  • agglomerates of abrasive grains are created and accumulated during the lapping operation, especially owing to the deposition of fine particulate on the abrasive grains themselves, that are undesirable because they can potentially scratch and damage the surfaces undergoing the lapping process.
  • the abrasive slurry coming out of the lower plate of the lapping machine no longer has the mechanical and chemical properties of fresh abrasive slurry: should it be reused as it is for another lapping cycle, it would negatively affect lapping process efficiency both in terms of outflow speed and the mechanical parameters of the silicon wafers obtained as well as in terms of metallic contamination.
  • the exhausted abrasive slurry that is discarded may be disposed of via municipal and industrial waste treatment plants. However, the resulting sludge must then go to a landfill.
  • the Japanese patent application JP 2003266309 ( Komatsu Denshi Kinzoku KK) describes a system for automating the operations for recovering, recycling and feeding the abrasive slurry to the lapping machines, and for improving the lapping yield by breaking down the abrasive grain agglomerates and eliminating the foreign contaminating particles.
  • Decomposition of the abrasive grain agglomerates is carried out by means of a battery of tumbler screeners fed with the exhausted slurry coming from the lapping process; the abrasive grain agglomerates are thus broken down and the grains are then separated with the help of a recycling liquid.
  • This liquid enables obtaining a suspension containing abrasive grains of suitable specific weight to be reused, which grains are recycled in the lapping machines.
  • the recycling liquid itself enables obtaining a second suspension containing the non-reusable abrasive grains (that is, grains of low specific weight) and most of the contaminants, like iron and silicon, and this suspension can then be sent to a landfill for disposal.
  • the non-reusable abrasive grains that is, grains of low specific weight
  • the sorting system described allows eliminating the abrasive agglomerates but does not yield a high quality of recovered abrasive grains, because the recovered abrasive fraction still contains a certain amount of fine contaminating abrasive particles and fine powders (iron and silicon) which build up in the exhausted abrasive slurry as residues of the lapping process.
  • the described process is based on the separation of abrasive grains by centrifugation: the exhausted slurry coming from the lapping machines is fed into a first centrifuge which enables separating the lapping process liquid from the abrasive grains and from the impurities.
  • the abrasive grains of the first centrifuge are mixed with a liquid for cleaning and separating the fine particles and are then fed into two consecutive centrifuges which separate the reusable abrasive grains from the cleaning liquid, which will thus contain the fine abrasive grains and impurities.
  • the abrasive grains obtained from the two consecutive centrifuges are mixed with the lapping liquid obtained from the first centrifuge and the recovery suspension thus obtained is fed to the lapping machines.
  • the separation of the abrasive component and of the impurities from the lapping process liquid is carried out by a single centrifugation operation (first centrifuge).
  • first centrifuge a single centrifugation operation
  • an object of the present invention is thus to provide a method for treating exhausted abrasive slurries of the kind used in the lapping of silicon wafers by means of lapping machines, and enabling the virtually complete recovery of the abrasive grains that are still of a suitable size to be reused in the lapping process, with an economically feasible process that is easy to run.
  • the method must also be able to guarantee the complete elimination, from the recovered and reusable component, of the waste matter coming from the lapping process (such as silicon and iron from the cast-iron plates of the lapping machines) and the broken-down grains of abrasive material that is no longer active.
  • the feed to be treated is fed from the top at high speed and tangentially into the apparatus, so that the centrifugal force pushes the heavier particles towards the sides of the container. Moving in a spiral manner, the heavier particles are then collected in the container's conical bottom (underflow), while the clarified liquid comes out at the top from a central duct (overflow).
  • the abrasive-grain enriched suspension obtained as an underflow (UF) from the bottom of the hydrocyclone goes to feed the next hydrocyclone in the series, and the bottom of the latter hydrocyclone yields a suspension of abrasive grains of suitable size for their reuse.
  • the present invention specifically provides a process for treating exhausted abrasive slurries from the lapping process, comprising a suspending liquid essentially composed of water and an additive for stabilising the suspension, as well as reusable abrasive grains, fine abrasive grains, fine silicon particles and fine metallic particles, which process comprises the following steps:
  • the aforesaid described process represents the simplest version of the procedure according to the present invention, to be used when the final concentration of fine iron particulate in the recovered abrasive component is not critical.
  • the liquid suspension containing the reusable abrasive grains obtained from the bottom of the last hydrocyclone of the said first battery undergoes further treatment in order to obtain abrasive grains purified of traces of fine iron particles by chemical etching, by adding a solution of acid agent to the liquid suspension containing the reusable abrasive grains.
  • the acid agent may be selected from the group consisting of nitric acid, hydrochloric acid, oxalic acid, sulphuric acid, citric acid and tartaric acid or their mixtures, and is used in excess so that the outflow liquid obtained from the treatment, which is discarded, contains the iron salts deriving from the acid leaching operation, along with the excess acid and any fine iron residues.
  • the liquid suspension containing the reusable abrasive grains undergoes further wet size-sorting treatment, also carried out by treating the mixture in a battery of at least two hydrocyclones connected in series and fed in counter-current with water.
  • a liquid suspension containing the reusable abrasive grains and essentially free of fine unusable abrasive grains is obtained from the bottom of the last hydrocyclone of the second battery.
  • the top of the first hydrocyclone of the said second battery yields a liquid suspension of fine iron particulates, excess acid and iron salts, which is discarded.
  • the number of hydrocyclones connected in series is normally between two and six, and is preferably four.
  • the liquid suspension containing the reusable abrasive grains is subjected to a filtering operation by adding water, thereby obtaining - in the filtration cake - a solid phase containing the reusable abrasive grains and essentially devoid of fine abrasive grains.
  • the filtrate of the said filtration operation yields a liquid suspension of excess acid and iron salts, and is discarded.
  • the abrasive grains resulting from the process proposed according to the present invention are suitable to be reused in the lapping process, and to this end they are preventively placed in a suspension maturation tank with a shaker mechanism, after adding the necessary amount of water and fresh stabilising additive.
  • the recovered abrasive suspension thus obtained may be mixed, before use, with a suitable quantity of fresh abrasive slurry and the whole lot is fed to the lapping process.
  • the present invention concerns an apparatus for treating exhausted abrasive slurries coming from the lapping process according to claims 14.
  • a tank with a shaker mechanism for the chemical etching of fine iron particles upstream of the said tank with shaker mechanism for the preparation of the lapping suspension liquid to be reused in the lapping process, there is also a tank with a shaker mechanism for the chemical etching of fine iron particles, and downstream of the said tank for the chemical etching of fine iron particles there is a second battery of at least two hydrocyclones connected in series, connected in counter-current with water supply, wherein the inlet of the first hydrocyclone is connected with the feed of exhausted abrasive slurries and the underflow of each hydrocyclone is connected with the inlet of the next hydrocyclone, as is the outlet of the overflow of the next but one hydrocyclone.
  • the suspension from the bottom of the last hydrocyclone feeds the said tank with shaker mechanism for the preparation of the lapping suspension to be reused.
  • the apparatus arrangement which adopts a filtering operation in place of the second battery of hydrocyclones, downstream of the said tank for the chemical etching of the fine iron particles there is a filtering apparatus from which the outflowing clarified liquid, consisting of a liquid suspension of excess acid and iron salts, is discarded.
  • the process according to the preferred variant of the present invention is essentially composed of three sections: 1 st hydrocyclone battery - chemical etching - 2 nd hydrocyclone battery.
  • the illustrated arrangement is used when the final concentration of iron in the recovered abrasive component is critical, and is essentially composed of the following operations:
  • the process carried out according to the arrangement illustrated in Figure 3 is a simplification of the two aforesaid arrangements and consists of only the first hydrocyclone battery; this process is used when the initial concentration of iron in the abrasive component is not critical.
  • the process consists of the following operations:
  • the hydrocyclone battery arrangement illustrated in Figure 4 can be used in order to separate the reusable abrasive grains (size > 4 ⁇ m) from the used and no-longer reusable abrasive grains (size ⁇ 4 ⁇ m) and from the fine particles of iron and silicon.
  • the first hydrocyclone of this battery is fed with the exhausted abrasive slurry mixed with the overflow of the second hydrocyclone.
  • the first hydrocyclone generates an underflow suspension, which goes to feed the second hydrocyclone, and an overflow suspension containing the abrasive grains of size ⁇ 4 ⁇ m, the fine particles of iron and silicon and the additive present in the exhausted slurry, which is discarded and sent to the waste treatment plant.
  • the second hydrocyclone is fed with the underflow suspension of the first hydrocyclone mixed with the overflow suspension of the third hydrocyclone; the overflow suspension generated by the second hydrocyclone goes to feed the first hydrocyclone while the underflow suspension feeds the third hydrocyclone.
  • the third hydrocyclones is fed with the underflow suspension of the second hydrocyclone mixed with the overflow suspension of the fourth hydrocyclone; the overflow suspension generated by the third hydrocyclone goes to feed the second hydrocyclone while the underflow suspension feeds the fourth hydrocyclone.
  • the fourth hydrocyclone is fed with the underflow suspension of the third hydrocyclone preventively mixed with water; the overflow suspension generated by the fourth hydrocyclone goes to feed the third hydrocyclone while the underflow suspension containing the reusable abrasive grains of size > 4 ⁇ m, with an iron content within the limits of 1000-1500 ppm, is conveyed to collection Tank 2.
  • the second battery of hydrocyclones is used in order to further reduce the iron content in the reusable abrasive slurry by combining the separating centrifugal action of the hydrocyclone with the chemical etching activity of an acid on the iron-based particles.
  • the first hydrocyclone of the second battery is fed with the reusable abrasive suspension coming from Tank 2 mixed with the overflow of the second hydrocyclone.
  • the first hydrocyclone generates an underflow suspension, which goes to feed the second hydrocyclone, and an overflow suspension containing the eliminated fine iron particles and the excess acid, that is discarded.
  • the second hydrocyclone of the second battery is fed with the underflow suspension of the first hydrocyclone mixed with the overflow suspension of the third hydrocyclone; the overflow suspension generated by the second hydrocyclone goes to feed the first hydrocyclone while the underflow suspension feeds the third hydrocyclone.
  • the third hydrocyclone is fed with the underflow suspension of the second hydrocyclone mixed with the overflow suspension of the fourth hydrocyclone; the overflow suspension generated by the third hydrocyclone goes to feed the second hydrocyclone while the underflow suspension feeds the fourth hydrocyclone.
  • the fourth hydrocyclone is fed with the underflow suspension of the third hydrocyclone preventively mixed with water; the overflow suspension generated by the fourth hydrocyclone goes to feed the third hydrocyclone while the underflow suspension containing the reusable abrasive grains of size > 4 ⁇ m, with an iron content within the limits of 100-500 ppm, is conveyed to collection Tank 2, where the regenerated suspension is prepared by adding water and an additive.
  • the process according to the present invention aims to achieve the result of advantageously applying to the field of recovering abrasive grains from the lapping process a technology similar to the one described in the co-pending patent application RM2005 A000329 .
  • the main differences between the two processes are as follows:

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Disintegrating Or Milling (AREA)
  • Treatment Of Sludge (AREA)

Claims (17)

  1. Verfahren zur Behandlung von verbrauchten Schleifschlämmen aus dem Läppverfahren, die eine Suspendierflüssigkeit, die im Wesentlichen aus Wasser und einem Additiv zur Stabilisierung der Suspension aufgebaut ist, sowie wiederverwendbare Schleifkörner, feine Schleifkörner, feine Siliciumpartikel und feine Metallpartikel umfassen, welches Verfahren die folgenden Schritte umfasst:
    a) Trennen eines verbrauchten Schlammes durch eine Größensortierungs-Nassbehandlung in: i) eine flüssige Suspension, welche wiederverwendbare Schleifkörner enthält, und ii) eine flüssige Suspension, welche die feinen Schleifkörner sowie die feinen Siliciumpartikel und feinen Metallpartikel enthält;
    b) Verwerfen der flüssigen Suspension, welche die feinen Schleifkörner und die feinen Siliciumpartikel und feinen Metallpartikel enthält, und Gewinnen der flüssigen Suspension, welche die wiederverwendbaren Schleifkörner enthält, um sie in das Läppverfahren zurückzuführen;
    wobei das Verfahren dadurch gekennzeichnet ist, dass die Größensortierungs-Nassbehandlung des Vorgangs a) durchgeführt wird durch Behandlung der Mischung in einer ersten Batterie von mindestens zwei in Reihe verbundenen Hydrozyklonen, die im Gegenstrom mit Wasser versorgt werden, wodurch vom Boden des letzten Hydrozyklons der Batterie eine flüssige Suspension, welche die wiederverwendbaren Schleifkörner und eine vernachlässigbare Menge von feinen Schleifkörnern enthält, erhalten wird.
  2. Verfahren nach Anspruch 1, wobei die erste Batterie von Hydrozyklonen aus 2 bis 6 in Reihe verbundenen Hydrozyklonen aufgebaut ist.
  3. Verfahren nach Anspruch 2, wobei die erste Batterie von Hydrozyklonen aus 4 in Reihe verbundenen Hydrozyklonen aufgebaut ist.
  4. Verfahren nach Anspruch 1, wobei die flüssige Suspension, enthaltend die wiederverwendbaren Schleifkörner, welche vom Boden des letzten Hydrozyklons der ersten Batterie erhalten wurde, durch chemisches Ätzen, bei dem eine Lösung eines sauren Agens der flüssigen Suspension, welche die wiederverwendbaren Schleifkörner enthält, zugesetzt wird, weiterbehandelt wird, um Schleifkörner ohne Spuren von feinen Eisenpartikeln zu erhalten.
  5. Verfahren nach Anspruch 4, wobei das saure Agens aus der Gruppe, welche aus Salpetersäure, Salzsäure, Oxalsäure, Schwefelsäure, Citronensäure und Weinsäure oder deren Mischungen besteht, ausgewählt ist.
  6. Verfahren nach Anspruch 4 oder 5, wobei nach der Zugabe der Lösung des sauren Agens, die flüssige Suspension, welche die wiederverwendbaren Schleifkörner enthält, einer weiteren Größensortierungs-Nassbehandlung durch eine zweite Batterie von mindestens 2 in Reihe verbundenen Hydrozyklonen, die im Gegenstrom mit Wasser versorgt werden, unterworfen wird und vom Boden des letzten Hydrozyklons der zweiten Batterie eine flüssige Suspension, welche die wiederverwendbaren Schleifkörner enthält und im Wesentlichen frei von nichtwiederverwendbaren feinen Schleifkörnern ist, erhalten wird.
  7. Verfahren nach Anspruch 6, wobei vom oberen Teil des ersten Hydrozyklons der zweiten Batterie eine flüssige Suspension von feinen Eisenpartikeln, überschüssiger Säure und Eisensalzen erhalten wird, welche verworfen wird.
  8. Verfahren nach Anspruch 6 oder 7, wobei die zweite Batterie von Hydrozyklonen aus 2 bis 6 in Reihe verbundenen Hydrozyklonen aufgebaut ist.
  9. Verfahren nach Anspruch 2, wobei die zweite Batterie von Hydrozyklonen aus 4 in Reihe verbundenen Hydrozyklonen aufgebaut ist.
  10. Verfahren nach Anspruch 4 oder 5, wobei nach Zugabe der Lösung des sauren Agens die flüssige Suspension, welche die wiederverwendbaren Schleifkörner enthält, einen Filtrationsvorgang durch Zugabe von Wasser erfährt, wodurch im Filterkuchen eine feste Phase, welche die wiederverwendbaren Schleifkörner enthält und im Wesentlichen frei von nichtwiederverwendbaren feinen Schleifkörnern ist, erhalten wird.
  11. Verfahren nach Anspruch 10, wobei das Filtrat des Filtrationsvorgangs eine flüssige Suspension von überschüssiger Säure und Eisensalzen liefert, welche dann verworfen wird.
  12. Verfahren nach irgendeinem der vorhergehenden Ansprüche, wobei die wiederverwendbaren Schleifkörner in das Läppverfahren zurückgeführt werden, nachdem sie für einen Zeitraum in einem Schütteltank zur Suspensionsreifung gehalten wurden.
  13. Verfahren nach Anspruch 12, wobei die Schleifkörner nach Zugabe einer erforderlichen Menge von ergänzendem Schleifschlamm, hergestellt mit frischem Schleifmaterial, Wasser und frischem Stabilisierungsadditiv, in das Läppverfahren zurückgeführt werden.
  14. Vorrichtung zur Behandlung verbrauchter Schleifschlämme aus dem Läppverfahren gemäß dem Verfahren nach Anspruch 1, welche die folgenden miteinander verbundenen Elemente in Sequenz einschließt:
    I. eine erste Batterie von mindestens 2 in Reihe verbundenen Hydrozyklonen, die im Gegenstrom mit einer Wasserversorgung verbunden sind, wobei der Einlass des ersten Hydrozyklons mit der Zufuhr von verbrauchten Schleifschlämmen verbunden ist und der Unterstrom eines jeden Hydrozyklons mit dem Einlass des nächsten Hydrozyklons verbunden ist, ebenso wie der Auslass des Überstroms des übernächsten Hydrozyklons, wobei vom Boden des letzten Hydrozyklons der Batterie eine flüssige Suspension, welche die wiederverwendbaren Schleifkörner und eine vernachlässigbare Menge an feinen Schleifkörnern enthält, erhältlich ist;
    II. einen Tank, der mit einem Schüttelmechanismus zur Herstellung eines Läppschlammes, der im Läppverfahren wiederverwendet werden soll, ausgerüstet ist;
    III. einen Tank, der mit einem Schüttelmechanismus zur Reifung der gewonnenen Suspension ausgerüstet ist.
  15. Vorrichtung nach Anspruch 14, wobei sich stromaufwärts des Tanks mit dem Schüttelmechanismus zur Herstellung eines Läppschlammes, der im Läppverfahren widerverwendet werden soll, ein Tank mit einem Schüttelmechanismus für das chemische Ätzen der feinen Eisenpartikel befindet.
  16. Vorrichtung nach Anspruch 15, wobei sich stromabwärts des Tanks für das chemische Ätzen der feinen Eisenpartikel eine zweite Batterie von mindestens 2 in Reihe verbundenen Hydrozyklonen, die im Gegenstrom mit einer Wasserversorgung verbunden sind, befindet, wobei der Einlass des ersten Hydrozyklons mit der Zufuhr von verbrauchten Schleifschlämmen verbunden ist und der Unterstrom eines jeden Hydrozyklons mit dem Einlass des nächsten Hydrozyklons verbunden ist, ebenso wie der Auslass des Überstroms des übernächsten Hydrozyklons, und der Unterstrom des letzten Hydrozyklons mit dem Tank mit dem Schüttelmechanismus zur Herstellung des wiederverwendbaren Läppschlammes verbunden ist.
  17. Verfahren nach Anspruch 16, wobei sich stromabwärts des Tanks für das chemische Ätzen der feinen Eisenpartikel eine Filtrationsvorrichtung befindet, von der die ausströmende geklärte Flüssigkeit, bestehend aus einer flüssigen Suspension von überschüssiger Säure und Eisensalzen, verworfen wird und der erhaltene Filterkuchen, enthaltend die wiederverwendbaren Schleifkörner, dem Tank mit einem Schüttelmechanismus zur Herstellung des wiederverwendbaren Läppschlammes zugeführt wird.
EP07866781A 2006-12-22 2007-12-04 Verfahren und vorrichtung zur behandlung von verbrauchten schleifschlämmen aus dem läppverfahren zur rückgewinnung ihrer wiederverwendbaren schleifbestandteile Not-in-force EP2094441B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000692A ITRM20060692A1 (it) 2006-12-22 2006-12-22 Procedimento per il trattamento di sospensioni abrasive esauste dal processo di lappatura per il recupero della componente di abrasivo riciclabile e relativo impianto.
PCT/IT2007/000844 WO2008078349A1 (en) 2006-12-22 2007-12-04 Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component

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EP2094441A1 EP2094441A1 (de) 2009-09-02
EP2094441B1 true EP2094441B1 (de) 2012-02-22

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EP (1) EP2094441B1 (de)
AT (1) ATE546256T1 (de)
IT (1) ITRM20060692A1 (de)
TW (1) TW200841991A (de)
WO (1) WO2008078349A1 (de)

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JP2010253621A (ja) * 2009-04-27 2010-11-11 Ihi Compressor & Machinery Co Ltd ワイヤソーのクーラント管理方法及び装置
JP5399125B2 (ja) * 2009-04-27 2014-01-29 株式会社Ｉｈｉ回転機械 ワイヤソーのクーラント管理方法及び装置
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