EP2076570A2 - Revetements mesostructures pour application en aeronautique et aerospatiale. - Google Patents
Revetements mesostructures pour application en aeronautique et aerospatiale.Info
- Publication number
- EP2076570A2 EP2076570A2 EP07848356A EP07848356A EP2076570A2 EP 2076570 A2 EP2076570 A2 EP 2076570A2 EP 07848356 A EP07848356 A EP 07848356A EP 07848356 A EP07848356 A EP 07848356A EP 2076570 A2 EP2076570 A2 EP 2076570A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- structure according
- groups
- chosen
- copolymers
- surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004094 surface-active agent Substances 0.000 claims abstract description 53
- 238000002360 preparation method Methods 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000002243 precursor Substances 0.000 claims abstract description 33
- -1 methacryloxy Chemical group 0.000 claims description 72
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 239000003795 chemical substances by application Substances 0.000 claims description 38
- 229920001577 copolymer Polymers 0.000 claims description 33
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 25
- 238000005260 corrosion Methods 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 21
- 239000010703 silicon Substances 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 230000007797 corrosion Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 17
- 238000007306 functionalization reaction Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 125000002947 alkylene group Chemical group 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000003446 ligand Substances 0.000 claims description 12
- 239000011159 matrix material Substances 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 125000004429 atom Chemical group 0.000 claims description 11
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 11
- 239000000523 sample Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000004703 alkoxides Chemical class 0.000 claims description 10
- 150000004820 halides Chemical class 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 238000005507 spraying Methods 0.000 claims description 9
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 8
- 230000002209 hydrophobic effect Effects 0.000 claims description 8
- 239000004816 latex Substances 0.000 claims description 8
- 229920000126 latex Polymers 0.000 claims description 8
- 239000002105 nanoparticle Substances 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 239000012736 aqueous medium Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 7
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 6
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 150000001413 amino acids Chemical class 0.000 claims description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 6
- 125000002091 cationic group Chemical group 0.000 claims description 6
- 229910001507 metal halide Inorganic materials 0.000 claims description 6
- 150000005309 metal halides Chemical class 0.000 claims description 6
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 claims description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 6
- GUEIZVNYDFNHJU-UHFFFAOYSA-N quinizarin Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(O)=CC=C2O GUEIZVNYDFNHJU-UHFFFAOYSA-N 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N 1H-imidazole Chemical group C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 5
- 229910019142 PO4 Inorganic materials 0.000 claims description 5
- 125000000129 anionic group Chemical group 0.000 claims description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 5
- 239000003054 catalyst Substances 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 239000007850 fluorescent dye Substances 0.000 claims description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 5
- 125000005641 methacryl group Chemical group 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 235000021317 phosphate Nutrition 0.000 claims description 5
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 claims description 5
- 238000006748 scratching Methods 0.000 claims description 5
- 230000002393 scratching effect Effects 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- 125000006017 1-propenyl group Chemical group 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 claims description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 239000003945 anionic surfactant Substances 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 150000001277 beta hydroxy acids Chemical class 0.000 claims description 4
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 claims description 4
- 150000007942 carboxylates Chemical class 0.000 claims description 4
- 230000000536 complexating effect Effects 0.000 claims description 4
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 claims description 4
- 230000033444 hydroxylation Effects 0.000 claims description 4
- 238000005805 hydroxylation reaction Methods 0.000 claims description 4
- 229960000907 methylthioninium chloride Drugs 0.000 claims description 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 claims description 3
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 claims description 3
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 3
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 3
- 229920002845 Poly(methacrylic acid) Polymers 0.000 claims description 3
- 229920002367 Polyisobutene Polymers 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical group [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 150000001298 alcohols Chemical class 0.000 claims description 3
- 125000004450 alkenylene group Chemical group 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 3
- 125000000732 arylene group Chemical group 0.000 claims description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- 150000001993 dienes Chemical class 0.000 claims description 3
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 3
- 239000000194 fatty acid Substances 0.000 claims description 3
- 229930195729 fatty acid Natural products 0.000 claims description 3
- 125000000524 functional group Chemical group 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 claims description 3
- 229940012189 methyl orange Drugs 0.000 claims description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 229920001451 polypropylene glycol Polymers 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- DWMSYQDOPYSCJR-UHFFFAOYSA-M 2-ethenyl-1-methylpyridin-1-ium;iodide Chemical compound [I-].C[N+]1=CC=CC=C1C=C DWMSYQDOPYSCJR-UHFFFAOYSA-M 0.000 claims description 2
- MUHSSCIXCFPQHS-UHFFFAOYSA-N 5-methyltetrathiane Chemical compound CC1CSSSS1 MUHSSCIXCFPQHS-UHFFFAOYSA-N 0.000 claims description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 claims description 2
- 125000003282 alkyl amino group Chemical group 0.000 claims description 2
- 229920000469 amphiphilic block copolymer Polymers 0.000 claims description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 2
- 238000009833 condensation Methods 0.000 claims description 2
- 238000000280 densification Methods 0.000 claims description 2
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 claims description 2
- 238000000605 extraction Methods 0.000 claims description 2
- 125000001188 haloalkyl group Chemical group 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000005009 perfluoropropyl group Chemical group FC(C(C(F)(F)F)(F)F)(F)* 0.000 claims description 2
- 238000006068 polycondensation reaction Methods 0.000 claims description 2
- 150000008117 polysulfides Polymers 0.000 claims description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 239000002689 soil Substances 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 claims 2
- 125000001453 quaternary ammonium group Chemical group 0.000 claims 2
- 229910021653 sulphate ion Chemical group 0.000 claims 2
- 125000006681 (C2-C10) alkylene group Chemical group 0.000 claims 1
- 125000006650 (C2-C4) alkynyl group Chemical group 0.000 claims 1
- WDRZVZVXHZNSFG-UHFFFAOYSA-N 1-ethenylpyridin-1-ium Chemical compound C=C[N+]1=CC=CC=C1 WDRZVZVXHZNSFG-UHFFFAOYSA-N 0.000 claims 1
- VWWWHWOQGKCWDN-UHFFFAOYSA-N 3,5-dimethyldithiane-4-thiol Chemical compound SC1C(C)SSCC1C VWWWHWOQGKCWDN-UHFFFAOYSA-N 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 claims 1
- 150000003851 azoles Chemical class 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 150000004665 fatty acids Chemical class 0.000 claims 1
- 229920001021 polysulfide Polymers 0.000 claims 1
- 239000005077 polysulfide Substances 0.000 claims 1
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 26
- 239000000203 mixture Substances 0.000 description 21
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 14
- 238000003756 stirring Methods 0.000 description 9
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 229920001983 poloxamer Polymers 0.000 description 6
- 235000001014 amino acid Nutrition 0.000 description 5
- 229920001400 block copolymer Polymers 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 4
- 239000012964 benzotriazole Substances 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229960003540 oxyquinoline Drugs 0.000 description 3
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 3
- 229920000428 triblock copolymer Polymers 0.000 description 3
- QQVDJLLNRSOCEL-UHFFFAOYSA-N (2-aminoethyl)phosphonic acid Chemical compound [NH3+]CCP(O)([O-])=O QQVDJLLNRSOCEL-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 2
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 235000004279 alanine Nutrition 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical group CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- WJYAJBDKANFOID-UHFFFAOYSA-N 2-(dodecylamino)propanoic acid Chemical compound CCCCCCCCCCCCNC(C)C(O)=O WJYAJBDKANFOID-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- 229910001250 2024 aluminium alloy Inorganic materials 0.000 description 1
- PGBVLOMZZHYJFP-UHFFFAOYSA-N 3-methyldithietane Chemical group CC1CSS1 PGBVLOMZZHYJFP-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- KWRJJRJSLJRTRC-UHFFFAOYSA-N 6-aminodecanoic acid Chemical compound CCCCC(N)CCCCC(O)=O KWRJJRJSLJRTRC-UHFFFAOYSA-N 0.000 description 1
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical compound NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 108010039918 Polylysine Proteins 0.000 description 1
- 229920001213 Polysorbate 20 Polymers 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 229910007932 ZrCl4 Inorganic materials 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 125000004419 alkynylene group Chemical group 0.000 description 1
- 150000001280 alpha hydroxy acids Chemical class 0.000 description 1
- 229960002684 aminocaproic acid Drugs 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 125000005569 butenylene group Chemical group 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical compound CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- OGQYPPBGSLZBEG-UHFFFAOYSA-N dimethyl(dioctadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC OGQYPPBGSLZBEG-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- UCYFZDNMZYZSPN-UHFFFAOYSA-N docosyl(trimethyl)azanium Chemical compound CCCCCCCCCCCCCCCCCCCCCC[N+](C)(C)C UCYFZDNMZYZSPN-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000000693 micelle Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 description 1
- IPMWIVQWGGRTLD-UHFFFAOYSA-N n'-[2-(propylamino)ethyl]ethane-1,2-diamine Chemical compound CCCNCCNCCN IPMWIVQWGGRTLD-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- IYPZRUYMFDWKSS-UHFFFAOYSA-N piperazin-1-amine Chemical compound NN1CCNCC1 IYPZRUYMFDWKSS-UHFFFAOYSA-N 0.000 description 1
- LWMPFIOTEAXAGV-UHFFFAOYSA-N piperidin-1-amine Chemical compound NN1CCCCC1 LWMPFIOTEAXAGV-UHFFFAOYSA-N 0.000 description 1
- 229920001308 poly(aminoacid) Polymers 0.000 description 1
- 229920000656 polylysine Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- RIZGKEIRSQLIBK-UHFFFAOYSA-N prop-1-ene-1-thiol Chemical group CC=CS RIZGKEIRSQLIBK-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical group 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000012686 silicon precursor Substances 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000012703 sol-gel precursor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- 239000002888 zwitterionic surfactant Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249961—With gradual property change within a component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- the present invention relates to a structure comprising a mesostructured coating for use in aeronautical and aerospace applications.
- protection against corrosion is generally provided by chromium VI surface treatments, for example, by means of a chromic anodic oxidation process, or a conversion layer.
- US 2003/024432 discloses a coating having anti-corrosion properties, prepared sol-gel from an organometallic salt such as an alkoxyzirconium, an organosilane, and one or more compounds carrying a borate, zinc or phosphate function, in the presence of an organic catalyst such as acetic acid.
- organometallic salt such as an alkoxyzirconium, an organosilane, and one or more compounds carrying a borate, zinc or phosphate function
- US Pat. Nos. 6,261,638 and 1,097,259 disclose methods for preventing the corrosion of metals, comprising the application of a treatment solution based on polyfunctional silanes and difunctional silanes comprising in their chain several atoms. sulfur, respectively.
- these materials have the disadvantage of not being micro- or nanostructured, that is, the distribution of the organic and inorganic domains in the material can not be controlled at the micrometric or nanometric scale. This random distribution can lead to non-reproducible properties from one material to another.
- An advantage of the sol-gel process consists in constructing a three-dimensional network from starting precursors under so-called mild conditions, that is to say at a temperature below 200 ° C., and in a water or water / solvent medium. less harmful to the environment than those used for conventional surface treatments.
- the starting precursors generally used in said sol-gel process are metal alkoxides comprising one or more hydrolyzable groups.
- these coatings are prepared from a titanium alkoxide, leading to a photocatalyst material that degrades rapidly when exposed to the sun.
- This control is achieved by means of structures comprising at least one particular mesostructured layer and a metal substrate.
- Hybrid and inorganic mesostructured layers are in particular known and described in the article "mesostructured hybrid organic-inorganic thin films, by L. Nicole et al., J. Mater. Chem. , 2005, 15, 3598-3627.
- These mesostructured layers have a controlled porosity, that is to say a pore size of between 2 and 50 nm, measured for example according to the method of Brunauer, Emmett and Teller (BET), and are structured at the nanoscale .
- BET Brunauer, Emmett and Teller
- sol-gel precursors and surfactant molecules are obtained from sol-gel precursors and surfactant molecules. This particular combination makes possible the construction of an inorganic or hybrid network around the surfactant molecules. A mesostructured material is then obtained, the micelles of surfactant molecules being arranged periodically throughout the material.
- These mesostructured layers may comprise various functionalities that make it possible to confer on a metal substrate (or surface), in particular an alloy of aluminum, titanium or magnesium, or a steel, for example, a protection against corrosion, a resistance to scratches and rubbing, good mechanical strength and / or color and / or constitute a probe for quality control while having good adhesion to the metal substrate.
- these layers can allow the coexistence of several different functionalities and can be deposited by any conventional technique such as, for example, by dip-coating, deposit on spinning substrate (or spin-coating) , spraying, spraying, laminar coating and brush coating.
- the individual components may be designed to have a life time compatible with industrial cycles, for example, greater than or equal to 12 months, and to be mixed just prior to their application.
- Their formulation has the additional advantage of using components compatible with environmental regulations, and in particular to be predominantly in an aqueous medium.
- the subject of the present invention is therefore a structure comprising: at least one mesostructured layer prepared by the sol-gel method from at least one metal molecular precursor of the alkoxide or metal halide type of formula:
- R represents an alkyl group preferably comprising 1 to 4 carbon atoms, such as a methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl or t-butyl group, preferably methyl or ethyl, better still ethyl; each R 'represents, independently of one another, a non-hydrolyzable group selected from alkyl groups, especially C 1-4 , for example, methyl, ethyl, propyl or butyl; alkenyl groups, in particular C 2 -4 alkenyl, such as vinyl, 1-propenyl, 2-propenyl and butenyl; alkynyl groups, especially C 2 -4 , such as acetylenyl and propargyl; aryl groups, in particular C 6-10 , such as phenyl and naphthyl; methacryl or methacryloxy (C 1 -C 10 ) al
- L represents a monodentate or polydentate complexing ligand, preferably polydentate, for example a carboxylic acid such as acetic acid, a ⁇ -diketone such as acetylacetone, a ⁇ -ketoester such as methyl acetoacetate, an ⁇ - or ⁇ -hydroxyacid; such as lactic acid, an amino acid such as alanine, a polyamine such as diethylenetriamine (or DETA), or phosphonic acid or a phosphonate; m is the hydroxylation number of ligand L; and
- R represents a non-hydrolysable functional group chosen from alkylene groups, preferably C 2 -I, e.g., methylene, ethylene, propylene, butylene, hexylene, octylene, decylene and dodecylene; N, N-di (alkylene C 2- io) amino such as N, N- diéthylèneamino; groups bis [N, N-di (C 2- io alkylene) amino] such as bis [N- (3-propylene) -N-methyleneamino]; C 2 -C 10 mercaptoalkylene such as mercaptopropylene, C 2 -C 10 alkylene polysulfide groups such as propylene disulfide or propylene tetrasulfide, and C 2 -C 4 alkenylene groups such as vinylene; especially C 6-10, such as phenylene; the di (C 2- io alkylene)
- a particular embodiment of the present invention is that, during the preparation of the mesostructured layer by sol-gel, the molecular precursor (s) of molecular formula (1), (2), (3) or ( 4) are used in combination with at least one precursor based on silicon, silicon alkoxide type, organoalkoxysilane or silicon halide.
- this or these precursors based on silicon of the silicon alkoxide, organoalkoxysilane or silicon halide type correspond to the following formulas:
- organoalkoxysilane of formula (6) there may be mentioned 3-aminopropyltrialkoxysilane (RO) 3 Si- (CH 3 ) 3 -
- a bis- [trialkoxysilyl] methane (RO) 3 Si-CH 2 -Si (OR) 3 , a bis- [trialkoxysilyl] ethane (RO) 3 Si- is preferably used.
- the structure may further comprise another ingredient such as a particulate oxide or hydroxide precursor, such as cerium oxide or zirconium oxide.
- amphiphilic surfactant (s) which may be used in the invention are ionic amphiphilic surfactants such as anionic or cationic, amphoteric, zwitterionic or nonionic surfactants, and which may also be photo- or thermopolymerizable.
- This surfactant can be an amphiphilic molecule or a macromolecule (or polymer) having an amphiphilic structure.
- cationic amphiphilic surfactants examples include quaternary ammonium or phosphonium salts.
- radicals Rs to Rn which may be identical or different, represent a linear or branched alkyl group containing from 1 to 30 carbon atoms, and
- X represents a halogen atom such as a chlorine or bromine atom, or a sulfate.
- tetraalkylammonium halides such as, for example, dialkyldimethylammonium or alkyltrimethylammonium halides in which the alkyl radical comprises approximately 12 to 22 carbon atoms, in particular behenyltrimethylammonium, distearyldimethylammonium, cetyltrimethylammonium, benzyldimethylstearylammonium halides.
- Preferred halides are chlorides and bromides.
- amphoteric or zwitterionic amphiphilic surfactants examples include amino acids such as propionic amino acids of formula (R I 2 ) SN + -CH 2 -CH 2 -COO " in which each R 2 , which is identical or different, , represents a hydrogen atom or a C 1-20 alkyl group such as dodecyl, and more particularly dodecylamino propionic acid.
- the molecular nonionic amphiphilic surfactants that can be used in the present invention are preferably linear ethoxylated C 12-22 alcohols containing from 2 to 30 ethylene oxide units, or fatty acid esters containing from 12 to 22 carbon atoms. carbon, and sorbitan. It may especially be mentioned as examples those sold under the trademarks Brij ®, Span ® and Tween ® by Aldrich, for example, Brij ® 56 and 78, Tween 20 and Span ® 80 ®.
- Polymeric nonionic amphiphilic surfactants are any amphiphilic polymer having both a hydrophilic character and a hydrophobic character.
- the block copolymers comprising two blocks, three blocks of type ABA or ABC or four blocks, and any other amphiphilic copolymer known to those skilled in the art, and more particularly those described in Adv. Mater. , S. Fôrster, M. Antonietti, 1998, 10, 195-217 or Angew. Chem. Int. , S. Forster, T. Plantenberg, Ed, 2002, 41, 688-714, or Macromol. Rapid Common, H. Coolf, 2001, 22, 219-252.
- an amphiphilic block copolymer of the following type is preferably used: copolymer based on poly (meth) acrylic acid, polydiene-based copolymer, hydrogenated diene-based copolymer, poly-based copolymer (propylene oxide), poly (ethylene oxide) copolymers, polyisobutylene copolymer, polystyrene copolymer, polysiloxane copolymer, poly (2-vinyl-naphthalene) copolymer, copolymer based on poly (vinyl pyridine and N-methyl vinyl pyridinium iodide), copolymer based on poly (vinyl pyrrolidone).
- a block copolymer consisting of poly (alkylene oxide) chains is preferably used, each block consisting of a poly (alkylene oxide) chain, the alkylene having a different number of carbon atoms depending on each chain. .
- one of the two blocks consists of a poly (alkylene oxide) chain of hydrophilic nature and the other block consists of a poly (oxide) chain. alkylene) of hydrophobic nature.
- two of the blocks are hydrophilic in nature while the other block, located between the two hydrophilic blocks, is hydrophobic in nature.
- the hydrophilic poly (alkylene oxide) chains are poly (ethylene oxide) chains noted (POE) 11 and (POE) W and the Poly (alkylene oxide) chains of hydrophobic nature are chains of poly (propylene oxide) denoted (POP) V or poly (oxide) chains. butylene), or mixed chains in which each chain is a mixture of several alkylene oxide monomers.
- a compound of formula (POE) u - (POP) v - (POE) W can be used with 5 ⁇ u ⁇ 106, 33 ⁇ v ⁇ 70 and 5 ⁇ w ⁇ 106
- the amphiphilic surfactant (s) are preferably used in an amount ranging from 0.05 to 2 mol% and more particularly from 0.2 to 1 mol% relative to the total number of moles of the molecular metal precursor (s).
- the total number of moles of the molecular metal precursor (s) comprises the total number of moles of the molecular metallic precursor (s) of formulas (1) to (4) and of the possible silicon precursor.
- a latex may also be added during the preparation of the mesostructured layer.
- the mesostructured layer is functionalized, that is to say that it comprises groups imparting macroscopic properties to the substrate, such as corrosion resistance, scratch and friction resistance, mechanical strength and hydrophobic character which can be modulated as desired, and or groups constituting a probe for quality control.
- probe is meant by way of example an optical probe, a pH sensitive probe, a dye or a selective fluorescent probe with specific cations or anions.
- This functionalization results either from the presence in at least one starting molecular metal precursor of formula (2), (3), (4), (6), (7) or (8), formulas, of a group R ' , L and / or R "representing a group which confers a functionality (or group which confers a function on the mesostructured layer), or the addition of at least one functionalizing agent during the preparation of the mesostructured layer or the treatment of the mesostructured layer after obtaining it, with at least one functionalizing agent, or a combination of these three possibilities.
- functionalization agent is understood to mean an agent conferring a function on the mesostructured layer, such as a resistance to corrosion, a resistance to scratching and friction or a mechanical strength, or constituting a fluorescent probe for capturing halogenated compounds, a pH sensitive probe, or a staining agent.
- agents conferring resistance to corrosion By way of examples of agents conferring resistance to corrosion, particular mention may be made of organic anti-corrosion agents of azole types, such as benzotriazole, tolyltriazole and imidazole, of amine types such as aminopiperidine or aminopiperazine, types mercaptan -SH, carboxylates such -. COO "as acetate, or types phosphonates, corrosion inhibitors and inorganic non-oxidizing ions such as molybdates, phosphates, and borates may be used as an agent conferring resistance to scratches and rubbing, a titanium or aluminum alkoxide, or nanoparticles of silica or alumina.
- azole types such as benzotriazole, tolyltriazole and imidazole
- amine types such as aminopiperidine or aminopiperazine
- types mercaptan -SH carboxylates such -.
- agent conferring a mechanical strength particular mention may be made of zirconia oxide.
- the agent constituting a fluorescent probe for capturing halogenated compounds may consist of an anthracene molecule carrying imidazolium groups.
- a pH-sensitive probe methyl orange or phenolphthalein may be used as the constituting agent.
- a dye-giving agent there may be mentioned rhodamine, fluorescein, quinizarin, methylene blue and ethylvinol.
- the starting components are added in the following order during the preparation of the mesostructured layer:
- the structure can comprise several mesostructured layers, for example from 2 to 10 layers, whose porosities constitute a gradient, that is to say, for example in the case of four mesostructured layers having respective porosities P 1, P 2, P 3 and P4 between 2 and 50 nm, P 1> P2> P3> P4, the layer having a porosity P 1 being in direct contact with the substrate.
- the structure comprises in a single mesostructured layer, a porosity gradient.
- the metal substrate that can be used in the present invention is preferably titanium, aluminum or one of their respective alloys, such as, for example, TA6V titanium, aluminum of the 2000 family, more particularly the plated or unplated Ai 2024 aluminum of the 7000 family, more particularly AI 7075 or 7175 and aluminum of the 6000 or 5000 family, or of stainless steel, such as for example NCD 16 or 15-5 PH, or magnesium alloy.
- TA6V titanium aluminum of the 2000 family
- the plated or unplated Ai 2024 aluminum of the 7000 family more particularly AI 7075 or 7175 and aluminum of the 6000 or 5000 family
- stainless steel such as for example NCD 16 or 15-5 PH, or magnesium alloy.
- the mesostructured layer is deposited by means of simple techniques to be carried out on the metal substrates, for example by soaking-shrinking, deposition on spinning substrate (or spin-coating), spraying, spraying, laminar coating or brush coating, and preferably by spraying.
- these techniques use products that are compatible with the environment.
- the structures thus obtained exhibit, in particular, corrosion resistance, scratch and friction resistance, coloration and / or hydrophobicity which can be modulated as desired, good adhesion being observed between the mesostructured layer (s) and the metal substrate.
- the structure further comprises at least one dense layer prepared by sol-gel route, as a layer described in French Patent Application No. 2,899,906.
- dense layer is meant a layer having no porosity at the micrometer scale visible by scanning electron microscope (SEM), and more particularly having a porosity of less than 1 micron, measured according to the BET method.
- the dense layer is especially prepared by sol-gel from at least one alkoxide or halide metal or silicon as defined above.
- Said additional dense layer preferably comprises elementary nanoblocks (or nanobuilding blocks (NBB)) and a polymer or hybrid organic / inorganic matrix.
- the elementary nanoblocks may be in the form of clusters or nanoparticles, preferably nanoparticles of size ranging from 2 to 100 nm, better still from 2 to 50 nm, and even more preferably from 2 to 20 nm, the diameter of these nanoparticles being measured by X-ray diffraction and small-angle X-ray scattering, transmission (or TEM) microscopy or light scattering.
- These elementary nanoblocks are essentially based on at least one metal oxide, for example an oxide of aluminum, cerium III or IV, silicon, zirconium, titanium or tin.
- a first method for synthesizing these elementary nanoblocks consists of synthesizing them from metal salts by precipitation.
- Complexing agents may be introduced into the reaction medium to control the size of the elementary nanoblocks formed and ensure their dispersion in the solvent by functionalization of 80 to 100% of the surface of the nanoblocks with monodentate or polydentate complexing agents, such as, for example, carboxylic acid, ⁇ -diketone, ⁇ -ketoester, ⁇ - or ⁇ -hydroxy acid, phosphonate, polyamine and amino acid.
- monodentate or polydentate complexing agents such as, for example, carboxylic acid, ⁇ -diketone, ⁇ -ketoester, ⁇ - or ⁇ -hydroxy acid, phosphonate, polyamine and amino acid.
- the weight ratio between the mineral and organic components is in particular between 20 and 95%.
- the elementary nanoblocks can also be obtained from at least one metal alkoxide or metal halide via hydrolytic or non-hydrolytic processes.
- a hydrolytic process the controlled hydrolysis of at least one metal alkoxide precursor or metal halide of general formula is carried out:
- Mi represents Al (III), Ce (III), Ce (IV), Si (IV), Zr (IV), Ti (IV) or Sn (IV), preferably Zr (IV) or Ce (IV), the the parenthetical number being the valency of the metal atom, nor is the valence of the M 1 atom, xi is an integer from 1 to n 1, Z 1 represents a halogen atom such as F, Cl, Br and I, preferably
- R 1 represents an alkyl group preferably comprising 1 to 4 carbon atoms, such as a methyl, ethyl, n-propyl, i-propyl or butyl group, preferably methyl or ethyl;
- R 1 ' represents a non-hydrolyzable group selected from alkyl groups including C 1-4 , for example, methyl, ethyl, propyl or butyl; alkenyl groups, in particular C 2-4 alkenyl, such as vinyl, 1-propenyl, 2-propenyl and butenyl; alkynyl groups, especially C 2-4 , such as acetylenyl and propargyl; aryl groups, especially C 6-10 , such as phenyl and naphthyl; methacryl or methacryloxy (C 1-10 alkyl) groups such as methacryloxypropyl; and epoxyalkyl or epoxyalkoxyalkyl groups in which the alkyl group is linear,
- controlled hydrolysis is meant a limitation of the growth of the species formed by controlling the amount of water introduced into the medium and possibly by introducing a complexing agent of the metallic central atom, in order to reduce the reactivity of the precursors .
- the elementary nanoblocks preferably in the form of amorphous or crystalline nanoparticles, can be functionalized on the surface. Their functionalization is carried out either directly during their synthesis, or during a second step following their synthesis, in the presence of a functionalization agent for NBB, and preferably during a second step. We speak respectively of pre- or post-functionalization.
- the post-functionalization can be carried out chemically, by choosing a difunctional molecule as functionalizing agent for NBB, one of whose functions has an affinity for the surface of the elementary nanoblock and the other function will be able to interact with the matrix but will not present any affinity for the surface of the elemental nanoblock.
- the chemical functionalization thus makes it possible to modify the surface of the nanoblocks, in particular by simply mixing a solution containing the elementary nanoblocks with a solution containing the functionalizing agent for NBB.
- Examples of functional groups having an affinity for the surface of the nanoblock include, for example, a carboxylic acid function, a diketone function or a phosphate or phosphonate function.
- functions that can interact with the matrix include primary, secondary or secondary amine groups.
- tertiary such as C 1 -C 5 alkylamino
- polymerizable functions such as vinyl, acrylate or methacrylate.
- di-functional molecules used as functionalizing agent for NBB mention may be made in particular of 6-aminocaproic acid and 2-aminoethylphosphonic acid.
- the degree of functionalization is preferably greater than 50%, more preferably greater than 80%.
- the elementary nanoblocks are introduced into an inorganic / organic polymer or hybrid matrix, preferably a hybrid of the sol / gel type, better still based on silica, and even more preferably consisting of silica or silica / oxide. of zirconium.
- This matrix will serve as a connector through which the elementary blocks will form a three-dimensional network.
- the inorganic / organic hybrid matrices are especially obtained by polycondensation of at least two metal alkoxides or metal halides in the presence of a solvent, and optionally a catalyst.
- the metal alkoxides or metal halides employed are especially chosen from those having the general formulas:
- n 2 represents the valence of the metal atom M 2 , preferably 3, 4 or 5;
- x 2 is an integer ranging from 1 to n 2 - 1;
- M 2 represents a metal atom of valence III such as Al; a metal atom of valence IV such as Si, Ce, Zr and Ti; or a metal atom of valence V such as Nb.
- Z 2 represents a hydrolyzable group chosen from halogen atoms, for example F, Cl, Br and I, preferably Cl and Br; preferably C 1-4 alkoxy groups, such as methoxy, ethoxy, n-propoxy, i-propoxy and butoxy; aryloxy groups, in particular C 6-10 , such as phenoxy; especially C 1-4 acyloxy groups, such as acetoxy and propionyloxy; and C 1-10 alkylcarbonyl groups such as acetyl.
- Z 2 represents an alkoxy group, and more particularly an ethoxy or methoxy group;
- R 2 represents a monovalent non-hydrolyzable group selected from alkyl preferably Ci-4, for example, methyl, ethyl, propyl and butyl; alkenyl groups, especially C 2-4 alkenyl groups, such as vinyl, 1-propenyl, 2-propenyl and butenyl; alkynyl groups, especially C 2-4 such as acetylenyl and propargyl; aryl groups, especially C 6-10 , such as phenyl and naphthyl; methacryl and methacryloxy (C 1 -C 10 ) alkyl groups such as methacryloxypropyl; and epoxyalkyl or epoxyalkoxyalkyl groups in which the alkyl group is linear, branched or cyclic, C 1 -C 10 , and the alkoxy group has 1 to 10 carbon atoms, such as glycidyl and glycidyloxy (C 1 -C 10 alkyl) .
- R 2 is
- R 3 represents a divalent non-hydrolyzable moiety selected from alkylene groups, preferably Ci-4, for example, methylene, ethylene, propylene and butylene; alkenylene groups, especially C 2-4 alkenylene, such as vinylene, 1-propenylene, 2-propenylene and butenylene; alkynylene groups, especially C 2-4 such as acetylenylene and propargylene; arylene groups, in particular C 6-10 , such as phenylene and naphthylene; methacryl and methacryloxy (C 1 -C 10 alkyl) groups such as methacryloxypropyl; and epoxyalkyl or epoxyalkoxyalkyl groups in which the alkyl group is linear, branched or cyclic, C 1 -C 10 , and the alkoxy group contains from 1 to 10 carbon atoms.
- alkylene groups preferably Ci-4, for example, methylene, ethylene, propylene and butylene
- R 3 preferably represents a group methylene or glycidyloxy (C 1 -C 10 alkyl) such as glycidyloxypropyl;
- the solvent used in the preparation of the matrix consists mainly of water. Preferably, it comprises 80 to 100% by weight of water relative to the total weight of the solvent, and optionally a C 1-4 alcohol, preferably ethanol or
- the catalyst is preferably an acid, more preferably acetic acid, or CO 2 .
- At least one additive may optionally be added, either during the preparation of the elementary nanoblocks, or during the mixing of the functionalized elementary nanoblocks and the matrix, or during these two steps.
- the additives that can be used in the invention include surfactants for improving the wettability of the soil on the metal substrate, such as the fluorinated nonionic polymers sold under the trademarks FC 4432 and FC4430 by the company 3M; colorants, for example rhodamine, fluorescein, methylene blue and ethyl-violet; crosslinking agents such as diethylenetriamine (or DETA); coupling agents such as aminopropyltriethoxysilane (APTS); nanopigments, or mixtures thereof
- Said dense layer preferably comprising elementary nanoblocks and an organic / inorganic hybrid matrix, is obtained in particular on the one hand: by preparing the elementary nanoblocks, in particular by a hydrolytic process or not as described above, and possibly functionalizing them, on the other hand - by preparing the matrix, and then mixing the optionally functionalized elementary nanoblocks and the matrix.
- the mesostructured layer is preferably in direct contact with the substrate and thus acts as nanoresist of active compounds.
- the structure comprises a multilayer coating comprising at least one mesostructured layer as described above, more particularly at least two layers which comprise at least one mesostructured layer and optionally at least one dense layer as described above, preferably from 2 to 10, more preferably from 2 to 5 layers.
- the total thickness of this multilayer coating preferably varies from 1 to 10 ⁇ m.
- Another object of the present invention is a method for preparing a structure as defined above, comprising the steps of: (a) preparing a sol-gel material by hydrolyzing-condensation of at least one molecular metal precursor of formula (1), (2), (3) or (4) as defined above, optionally in combination with at least one alkoxide or silicon halide of formula
- step (b) depositing the material obtained in step (a) on a metal substrate, for example by soaking-shrinking, depositing on a rotating substrate (or spin-coating), spraying, spraying, laminar coating or brush coating,
- step (e) can be carried out, for example, by preparing a solution containing the functionalizing agent and then impregnating the structure obtained in step (c) or (d) by soaking in said solution for a period of time. from a few minutes to a few hours.
- the functionalizing agent is preferably used in an amount ranging from 1 to 20% by weight relative to the total weight of the solution.
- the preparation of the sol-gel material in step (a) is accomplished by adding the starting components in the following order:
- the amphiphilic surfactant (s) are preferably used in an amount ranging from 0.05 to 2 mol% and more particularly from 0.2 to 1 mol% relative to the total number of moles of the molecular metal precursor (s).
- the subject of the invention is also the use of the structure according to the invention for improving the resistance to corrosion, scratching and friction, the mechanical strength, the probe, the coloration and / or the hydrophobic character of a metal substrate in the aeronautical or aerospace field. The invention and the advantages it brings will be better understood thanks to the examples given below as an indication.
- a precursor mixture solution was prepared. 0.7 g of ZrCU are added to 55.5 g of ethanol with stirring at room temperature. Then 5.62 g of tetraethoxysilane (TEOS) was added dropwise.
- TEOS tetraethoxysilane
- TMOS tetramethoxysilane
- DMDES dimethyldiethoxysilane
- a second type of NBB was further added in the form of a mixture of a 70% tetrapropoxyzirconium (TPO 2) solution in propanol / CH 3 COOH / H 2 O in a weight ratio of 1: 1. 6g / 4.5g, previously stirred for 30 minutes.
- TPO 2 70% tetrapropoxyzirconium
- the final solution was stirred at room temperature for 30 minutes, then 7.96 g of (3-trimethoxysilylpropyl) diethylenetriamine was added dropwise as a crosslinking agent, and let the solution stand for 15 hours at room temperature with vigorous and regular stirring.
- Rhodamine B was added to the solution in such a quantity that its concentration in the final solution was about 10 -3 M.
- a precursor mixture solution was first prepared. 0.7 g of ZrCU are added to 55.5 g of ethanol with stirring at room temperature, then 5.60 g of TEOS are added dropwise. Was used as the surfactant amphiphilic triblock copolymer sold under the trademark Pluronic ® F 127 was added
- the films were stored at room temperature (20-22 ° C.) and high humidity (50%). for 12 hours. After aging, the coating was thermally treated at 250 ° C. for 1 hour to remove the surfactant and then treated in a UV / O 3 oven for 15 minutes.
- the mesostructured coating was then functionalized by immersing the treated layer in an aqueous solution of 0.01 M mercaptosuccinic acid, with stirring for several hours. After immersion, the layer was rinsed with water and dried in air.
- this first mesostructured layer can also be done in a single step (or "one pot"), namely that the surfactant is preserved and the mercaptosuccinic acid is introduced directly into the solution.
- the shrinkage speed was set at 0.68 cm. s "1. was then densified deposition in an oven at 6O 0 C for 2 hours.
- a treatment solution was prepared by adding 0.1 mol of the mixture of the two metal chlorides YCl 3 and ZrCU (with
- the film was kept at room temperature (20-22 ° C.) and high humidity (> 50%) for 12 hours. After aging, the film was densified at 110 ° C. for 1 hour.
- a film was deposited on a metal substrate whose surface was previously prepared as indicated in Example 1, by soaking-removing said substrate in composition 4, with a withdrawal rate of 0.28 cm.s -1 , under controlled ambient conditions
- the shrinkage speed was set at 0.68 cm. s "1. was then densified deposition in an oven at 60 0 C for 2 hours.
- coatings in the form of films having total thicknesses ranging from 500 nm to several ⁇ m, more particularly from 1 to 6 ⁇ m, and preferably between
- These films have a good stability of interfaces, savo ir between the deposited layer and the metal substrate, and between the deposited layer and the primary paint deposit, and good resistance to mechanical deformation such as shock and bending.
- the corrosion resistance with or without paint is at least comparable to that of the chromated layers, or even better in some cases than those of the chromated layers.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Wood Science & Technology (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0608614A FR2906539B1 (fr) | 2006-10-02 | 2006-10-02 | Revetements mesostructures pour application en aeronautique et aerospatiale |
| PCT/FR2007/051985 WO2008040895A2 (fr) | 2006-10-02 | 2007-09-21 | Revetements mesostructures pour application en aeronautique et aerospatiale. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2076570A2 true EP2076570A2 (fr) | 2009-07-08 |
Family
ID=37983584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP07848356A Withdrawn EP2076570A2 (fr) | 2006-10-02 | 2007-09-21 | Revetements mesostructures pour application en aeronautique et aerospatiale. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20100266836A1 (enrdf_load_stackoverflow) |
| EP (1) | EP2076570A2 (enrdf_load_stackoverflow) |
| JP (1) | JP5563303B2 (enrdf_load_stackoverflow) |
| FR (1) | FR2906539B1 (enrdf_load_stackoverflow) |
| WO (1) | WO2008040895A2 (enrdf_load_stackoverflow) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2929622B1 (fr) * | 2008-04-04 | 2011-03-04 | Eads Europ Aeronautic Defence | Revetements mesostructures comprenant un agent texturant particulier, pour application en aeronautique et aerospatiale |
| FR2942229B1 (fr) * | 2009-02-18 | 2011-02-25 | Univ Paris Curie | Materiau solide hybride inorganique-organique polycarboxylate a base de titane, son procede de preparation et utilisations |
| EP2563865B1 (en) * | 2010-04-28 | 2016-06-01 | 3M Innovative Properties Company | Articles including nanosilica-based primers for polymer coatings and methods |
| EP2563848B1 (en) | 2010-04-28 | 2020-08-26 | 3M Innovative Properties Company | Silicone-based material |
| WO2012047749A1 (en) | 2010-10-06 | 2012-04-12 | 3M Innovative Properties Company | Anti-reflective articles with nanosilica-based coatings and barrier layer |
| DE102011101179A1 (de) * | 2011-05-11 | 2012-11-15 | Fachhochschule Kiel | Beschichtungen für Polymere |
| US9605162B2 (en) | 2013-03-15 | 2017-03-28 | Honda Motor Co., Ltd. | Corrosion inhibiting compositions and methods of making and using |
| US9816189B2 (en) | 2013-03-15 | 2017-11-14 | Honda Motor Co., Ltd. | Corrosion inhibiting compositions and coatings including the same |
| RU2630724C2 (ru) * | 2013-03-16 | 2017-09-12 | Прк-Десото Интернэшнл, Инк. | Золь-гель композиции, ингибирующие коррозию |
| CN103755620B (zh) * | 2014-01-13 | 2015-12-30 | 阜阳师范学院 | 一种镁离子荧光探针及其制备方法与应用 |
| WO2018189624A1 (en) * | 2017-04-14 | 2018-10-18 | Inm Technologies Private Limited | Corrosion resistant multilayer coatings |
| CN111363459A (zh) * | 2020-04-15 | 2020-07-03 | 上海达克罗涂复工业有限公司 | 一种锌铝涂料及其制备方法和应用 |
| FR3113059B1 (fr) * | 2020-07-31 | 2022-09-09 | Arcane Ind | Composition et utilisation de cette composition pour la formation d’un revêtement de type sol-gel sur une surface métallique |
| CN114150301B (zh) * | 2021-10-29 | 2023-12-12 | 北京卫星制造厂有限公司 | 一种镁锂合金蒙皮表面防腐处理方法 |
| CN114134500B (zh) * | 2021-10-29 | 2023-12-12 | 北京卫星制造厂有限公司 | 一种镁锂合金蒙皮表面结合力提升处理方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4417405A1 (de) * | 1994-05-18 | 1995-11-23 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von strukturierten anorganischen Schichten |
| US6605365B1 (en) * | 1996-11-04 | 2003-08-12 | The Boeing Company | Pigmented alkoxyzirconium sol |
| US6733907B2 (en) * | 1998-03-27 | 2004-05-11 | Siemens Westinghouse Power Corporation | Hybrid ceramic material composed of insulating and structural ceramic layers |
| JP2000063762A (ja) * | 1998-08-21 | 2000-02-29 | Asahi Kagaku Kogyo Co Ltd | 熱板材料 |
| US6541539B1 (en) * | 1998-11-04 | 2003-04-01 | President And Fellows Of Harvard College | Hierarchically ordered porous oxides |
| JP2000345355A (ja) * | 1999-06-04 | 2000-12-12 | Mitsubishi Materials Corp | Ｚｒ含有シリカ質被膜およびその被膜形成液 |
| AU1461501A (en) * | 1999-12-03 | 2001-06-12 | Caterpillar Inc. | Patterned hydrophilic-oleophilic metal oxide coating and method of forming |
| US6890640B2 (en) * | 1999-12-03 | 2005-05-10 | Caterpillar Inc | Patterned hydrophilic-oleophilic metal oxide coating and method of forming |
| US6387453B1 (en) * | 2000-03-02 | 2002-05-14 | Sandia Corporation | Method for making surfactant-templated thin films |
| JP4170563B2 (ja) * | 2000-06-12 | 2008-10-22 | 独立行政法人科学技術振興機構 | 結晶化した細孔壁を持つメソポーラス遷移金属酸化物及びその製造方法 |
| US6579472B2 (en) * | 2001-07-27 | 2003-06-17 | The Boeing Company | Corrosion inhibiting sol-gel coatings for metal alloys |
| JP4520088B2 (ja) * | 2002-05-16 | 2010-08-04 | 独立行政法人科学技術振興機構 | ３次元の高規則性を有するメソポーラス酸化物の合成法 |
| JP2005538921A (ja) * | 2002-09-17 | 2005-12-22 | スリーエム イノベイティブ プロパティズ カンパニー | ポーラスな界面活性剤媒介金属酸化物フィルム |
| JP2004307897A (ja) * | 2003-04-03 | 2004-11-04 | Nippon Steel Corp | シリカ−ジルコニア系皮膜を有する表面処理金属材料およびその製造方法 |
| DE10320779A1 (de) * | 2003-05-09 | 2004-11-18 | Degussa Ag | Korrosionsschutz auf Metallen |
| FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
| FR2886309B1 (fr) * | 2005-05-31 | 2007-08-17 | Airbus France Sas | Sol pour le revetement par voie sol-gel d'une surface et procede de revetement par voie sol-gel le mettant en oeuvre |
-
2006
- 2006-10-02 FR FR0608614A patent/FR2906539B1/fr not_active Expired - Fee Related
-
2007
- 2007-09-21 JP JP2009530913A patent/JP5563303B2/ja active Active
- 2007-09-21 WO PCT/FR2007/051985 patent/WO2008040895A2/fr active Application Filing
- 2007-09-21 US US12/443,869 patent/US20100266836A1/en not_active Abandoned
- 2007-09-21 EP EP07848356A patent/EP2076570A2/fr not_active Withdrawn
Non-Patent Citations (3)
| Title |
|---|
| ANGELOME P C ET AL: "Organically Modified Transition-Metal Oxide Mesoporous Thin Films and Xerogels", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, US, vol. 17, no. 2, 1 January 2005 (2005-01-01), pages 322 - 331, XP008105890, ISSN: 0897-4756, [retrieved on 20041216], DOI: 10.1021/CM048559B * |
| GALO J. A. A. SOLER-ILLIA ET AL: "Highly ordered hybrid mesoporous bifunctional thin films", CHEMICAL COMMUNICATIONS, no. 24, 1 January 2004 (2004-01-01), pages 2854, XP055166934, ISSN: 1359-7345, DOI: 10.1039/b413260b * |
| PEIDONG YANG ET AL: "Block copolymer templating syntheses of mesoporous metal oxides with large ordering lengths and semicrystalline framework", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, US, vol. 11, no. 10, 1 October 1999 (1999-10-01), pages 2813 - 2826, XP002162652, ISSN: 0897-4756, DOI: 10.1021/CM990185C * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008040895A2 (fr) | 2008-04-10 |
| WO2008040895A3 (fr) | 2008-05-22 |
| US20100266836A1 (en) | 2010-10-21 |
| FR2906539A1 (fr) | 2008-04-04 |
| JP2010506041A (ja) | 2010-02-25 |
| JP5563303B2 (ja) | 2014-07-30 |
| FR2906539B1 (fr) | 2009-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2008040895A2 (fr) | Revetements mesostructures pour application en aeronautique et aerospatiale. | |
| EP1978055B1 (fr) | Matériau nanostructuré particulier, comme revêtement protecteur de surfaces métalliques. | |
| EP2010612B1 (fr) | Utilisation d'un materiau nanostructure, comme revetement protecteur de surfaces metalliques | |
| WO2009136044A2 (fr) | Revêtements mésostructurés comprenant un agent texturant particulier, pour application en aéronautique et aérospatiale | |
| CN100473469C (zh) | 金属的防腐 | |
| JP4746323B2 (ja) | 腐食に対して保護する金属の被覆のための組成物 | |
| Zheludkevich et al. | Sol–gel coatings for corrosion protection of metals | |
| US8715405B2 (en) | Sol for sol-gel process coating of a surface and coating method by sol-gel process using same | |
| FR3029835B1 (fr) | Revetements anticorrosion charges en particules mesostructurees | |
| EP2245094A1 (fr) | Materiau hybride organique-inorganique, couche mince optique de ce materiau, materiau optique les comprenant, et leur procede de fabrication | |
| EP3234029A1 (fr) | Particules mésostructurées chargées en agents anticorrosion obtenues par aérosol | |
| EP2766508B1 (fr) | Procédé de traitement anticorrosion d'un substrat métallique solide | |
| WO2013054066A1 (fr) | Procédé de traitement anticorrosion d'un substrat métallique solide et substrat métallique susceptible d'être obtenu par un tel procédé | |
| Pehkonen et al. | Inorganic-organic hybrid coatings | |
| Fedel et al. | Innovative silanes-based pretreatment to improve the adhesion of organic coatings |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20090504 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR |
|
| 17Q | First examination report despatched |
Effective date: 20090901 |
|
| DAX | Request for extension of the european patent (deleted) | ||
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6) Owner name: AIRBUS (SAS) Owner name: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N. |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
| 18W | Application withdrawn |
Effective date: 20191212 |