EP1846495A1 - Hydroxyalkyl-funktionalisierte füllstoffe - Google Patents
Hydroxyalkyl-funktionalisierte füllstoffeInfo
- Publication number
- EP1846495A1 EP1846495A1 EP06701799A EP06701799A EP1846495A1 EP 1846495 A1 EP1846495 A1 EP 1846495A1 EP 06701799 A EP06701799 A EP 06701799A EP 06701799 A EP06701799 A EP 06701799A EP 1846495 A1 EP1846495 A1 EP 1846495A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- general formula
- particles
- groups
- particle
- formula iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000945 filler Substances 0.000 title description 13
- 239000002245 particle Substances 0.000 claims abstract description 85
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 10
- 239000004593 Epoxy Substances 0.000 claims abstract description 7
- 150000002367 halogens Chemical group 0.000 claims abstract description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 5
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims abstract description 5
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 3
- -1 preferably a silica Chemical class 0.000 claims description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 41
- 150000001875 compounds Chemical class 0.000 claims description 40
- 229910044991 metal oxide Inorganic materials 0.000 claims description 37
- 150000004706 metal oxides Chemical class 0.000 claims description 36
- 230000008569 process Effects 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 18
- 239000000377 silicon dioxide Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 239000004215 Carbon black (E152) Substances 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 229930195733 hydrocarbon Natural products 0.000 claims description 9
- 238000000746 purification Methods 0.000 claims description 9
- 239000012763 reinforcing filler Substances 0.000 claims description 7
- 239000006254 rheological additive Substances 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 229910021485 fumed silica Inorganic materials 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- 239000011164 primary particle Substances 0.000 claims description 6
- 125000005372 silanol group Chemical group 0.000 claims description 6
- 238000006884 silylation reaction Methods 0.000 claims description 6
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical group [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 claims description 5
- 125000005375 organosiloxane group Chemical group 0.000 claims description 5
- 229910002808 Si–O–Si Inorganic materials 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 229910003849 O-Si Inorganic materials 0.000 claims description 3
- 229910003872 O—Si Inorganic materials 0.000 claims description 3
- 229910008051 Si-OH Inorganic materials 0.000 claims description 3
- 229910006358 Si—OH Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 238000006136 alcoholysis reaction Methods 0.000 claims description 2
- 239000012298 atmosphere Substances 0.000 claims description 2
- 125000001475 halogen functional group Chemical group 0.000 claims description 2
- 230000007062 hydrolysis Effects 0.000 claims description 2
- 238000006460 hydrolysis reaction Methods 0.000 claims description 2
- 238000011068 loading method Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 229910020175 SiOH Inorganic materials 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 23
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 239000003054 catalyst Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 239000000843 powder Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 230000005291 magnetic effect Effects 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 235000019241 carbon black Nutrition 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 238000005243 fluidization Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000004438 BET method Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 5
- 238000007306 functionalization reaction Methods 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 239000004814 polyurethane Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 235000010215 titanium dioxide Nutrition 0.000 description 5
- 239000001993 wax Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229920004482 WACKER® Polymers 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 238000005056 compaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000006386 neutralization reaction Methods 0.000 description 4
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000003586 protic polar solvent Substances 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229920002379 silicone rubber Polymers 0.000 description 4
- 235000002639 sodium chloride Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000005840 aryl radicals Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 150000004759 cyclic silanes Chemical class 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- QUPDWYMUPZLYJZ-UHFFFAOYSA-N ethyl Chemical compound C[CH2] QUPDWYMUPZLYJZ-UHFFFAOYSA-N 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000002574 poison Substances 0.000 description 3
- 231100000614 poison Toxicity 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- 239000002879 Lewis base Substances 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000010923 batch production Methods 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical class OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000010431 corundum Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 150000007527 lewis bases Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 150000002835 noble gases Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 239000012255 powdered metal Substances 0.000 description 2
- 230000001698 pyrogenic effect Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 125000005624 silicic acid group Chemical class 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- ORGHESHFQPYLAO-UHFFFAOYSA-N vinyl radical Chemical compound C=[CH] ORGHESHFQPYLAO-UHFFFAOYSA-N 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 description 1
- UWIYMYGTAQMBAW-UHFFFAOYSA-N 2,2,5,6-tetramethyl-1,4,2-dioxasilinane Chemical compound CC1OC[Si](C)(C)OC1C UWIYMYGTAQMBAW-UHFFFAOYSA-N 0.000 description 1
- SNQTUOXRSHTXGP-UHFFFAOYSA-N 2,2,5,7-tetramethyl-1,4,2-dioxasilepane Chemical compound CC1CC(C)O[Si](C)(C)CO1 SNQTUOXRSHTXGP-UHFFFAOYSA-N 0.000 description 1
- IPYWFLWULMDARQ-UHFFFAOYSA-N 2,2,5-trimethyl-1,4,2-dioxasilepane Chemical compound CC1CCO[Si](C)(C)CO1 IPYWFLWULMDARQ-UHFFFAOYSA-N 0.000 description 1
- BJFYOUPERWUMHW-UHFFFAOYSA-N 2,2,5-trimethyl-1,4,2-dioxasilinane Chemical compound CC1CO[Si](C)(C)CO1 BJFYOUPERWUMHW-UHFFFAOYSA-N 0.000 description 1
- YIRCYVMHOZPMLU-UHFFFAOYSA-N 2,2,7-trimethyl-1,4,2-dioxasilepane Chemical compound CC1CCOC[Si](C)(C)O1 YIRCYVMHOZPMLU-UHFFFAOYSA-N 0.000 description 1
- IIEFLVHXKFHAAP-UHFFFAOYSA-N 2,2-dimethyl-1,4,2-dioxasilepane Chemical compound C[Si]1(C)COCCCO1 IIEFLVHXKFHAAP-UHFFFAOYSA-N 0.000 description 1
- LFTRYJGXQHFPCE-UHFFFAOYSA-N 2,2-dimethyl-1,4,2-dioxasilinane Chemical compound C[Si]1(C)COCCO1 LFTRYJGXQHFPCE-UHFFFAOYSA-N 0.000 description 1
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000005711 Benzoic acid Chemical class 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- 239000003341 Bronsted base Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- OCBFFGCSTGGPSQ-UHFFFAOYSA-N [CH2]CC Chemical compound [CH2]CC OCBFFGCSTGGPSQ-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 235000012216 bentonite Nutrition 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000003738 black carbon Substances 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical class C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- 125000004803 chlorobenzyl group Chemical group 0.000 description 1
- ZCSLOBFDVTWIBL-UHFFFAOYSA-N chloromethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCl ZCSLOBFDVTWIBL-UHFFFAOYSA-N 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000012767 functional filler Substances 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 229940119177 germanium dioxide Drugs 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 235000013980 iron oxide Nutrition 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- JILPJDVXYVTZDQ-UHFFFAOYSA-N lithium methoxide Chemical compound [Li+].[O-]C JILPJDVXYVTZDQ-UHFFFAOYSA-N 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000004692 metal hydroxides Chemical group 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 150000002900 organolithium compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229910052615 phyllosilicate Inorganic materials 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000002510 pyrogen Substances 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical group 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229940058287 salicylic acid derivative anticestodals Drugs 0.000 description 1
- 150000003872 salicylic acid derivatives Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Definitions
- the invention relates to hydroxyalkyl-functionalized fillers, a process for their preparation and their use.
- the filler is a finely divided solid, which changes its properties by addition to a matrix.
- Fillers are used today in the chemical industry for many purposes. You can change the mechanical properties of plastics such as: As hardness, tear resistance, chemical resistance, electrical or thermal conductivities, adhesion or shrinkage in temperature changes. Furthermore, they influence u. a. also the rheological behavior of plastic melts.
- By functionalizing fillers with chemically reactive groups it is possible to improve the compatibility of the filler with the matrix and thus also optimize the property profile of the resulting compound. Preference is given to groups which can react with the matrix itself, such as carbinol groups, the z. B. can react with polyesters, polyurethanes or polyacrylates.
- suitable modification of the fillers or particle surface ensures compatibility of the particle with the surrounding polymer matrix.
- the particle surface has a suitable reactivity with respect to the matrix so that it can react with the binder system under the particular curing conditions of the formulation, it is possible to chemically incorporate the particles into the matrix during the curing, which often has a positive effect on the property profile of the compound affects.
- EP-768347 describes a process for treating fillers which is derived from specific cyclic silanes of general go from the formula I, which can react with Metallhydroxidfunktionen to carbinol groups.
- R 1 is a carbon radical having up to 20 carbon atoms
- R 2 is hydrogen or a hydrocarbon radical having up to 20 carbon atoms and a usually has a value of 3 or 4.
- the reaction without the use of catalysts at temperatures between 25 0 C and 15O 0 C is executed.
- the synthesis of this stable 6-ring also requires a very complicated process in which an organometallic silicon compound is inserted into a tetrahydrofuran ring.
- EP-768347 5-rings are unstable as a substance and tend to decompose or autopolymerization.
- the process for industrial use described in EP-768347 is not very suitable, since either the silane compounds used can not be obtained stably or are accessible only via technically complicated synthesis methods.
- the object of the present invention was to provide a hydroxyalkyl-functional filler which can be prepared by a simple process.
- the invention relates to particles P1 which have residues of general formula II on their surface,
- R 1 and R 3 are identical or different and are hydrogen or monovalent, optionally with -CN, -NCO, -NR X 2, -COOH, -COOR X , -PO (OR X ) 2, -halogen, -acrylic, -epoxy, -SH, -OH or -CONR X 2 substituted C] _- C20 ⁇ ⁇ ° hydrogen radical or C] _- C] _5-Kohlenwasserstoffoxyrest, in each of which one or more, non-adjacent methylene units by groups -0-, -CO -, -C00-, -0C0-, or -OCOO-, -S-, or
- R x is hydrogen radical or an optionally substituted by -CN or halogen C ] _-C ] _o ⁇ hydrocarbon radical, b integer value of at least 1 means.
- the particles P1 are preferably particles having a modified surface of a metal oxide, more preferably a silicic acid, particularly preferably a fumed silica, the surface being modified with groups of the general formula II.
- the particles P1 according to the invention preferably have an average primary particle particle size, ie an average particle diameter, smaller than 100 nm, particularly preferably with an average primary particle particle size of 5 to 50 nm, these primary particles often do not exist in isolation in the silica, but are components of larger aggregates (definition according to DIN 53206), which have a diameter of 100 to 1000 nm and agglomerates (definition according to DIN 53206) build, depending on the external shear load sizes from 1 to 500 microns, wherein the silica has a specific surface of 10 to 400 m.2 / g (measured by the BET method according to DIN 66131 and 66132), wherein the silica has a fractal dimension of the mass D m of smaller or equal to 2, 8, preferably equal to or less than 2, 7, more preferably from 2, 4 to 2, 6, and a density of surface silanol groups SiOH of less than 1.5 SiOH / nm 2, preferably of smaller as 0.5 SiOH / nm
- the particles Pl can be produced by reaction of
- particles P of a material which has a surface with a radical selected from the group Me-OH, Si-OH, Me-O-Me, Me-O-Si, Si-O-Si, Me-OR 1 and Si-OR 1 has (b) with compounds of general formula III
- R ⁇ and R ⁇ are the same or different and are hydrogen or monovalent, optionally with -CN, -NCO, -NR X 2, -COOH, -COOR X , -PO (OR X ) 2, -halo, -acryl, -epoxy , -SH, -OH or -C0NR x 2 substituted C] _- C2o ⁇ ⁇ ° hlenwasserstoffrest, or C 1-C! _5-Hydrocarbonoxy in which one or more non-contiguous methylene units are represented by groups -O-, -CO-, -COO-, -OCO-, or -O-, -S-, or
- R x is hydrogen radical or an optionally substituted by -CN or halogen C ⁇ -C ] _o ⁇ hydrocarbon radical, b integer value ⁇ 1, n 0 or an integer value.
- R 3 is preferably hydrogen, an alkyl, cycloalkyl or aryl radical, more preferably hydrogen, methyl, ethyl or phenyl radical, particularly preferably hydrogen, a methyl or ethyl radical.
- R 4 is preferably hydrogen, an alkyl, cycloalkyl, aryl or arylalkyl radical, particularly preferably hydrogen, methyl, ethyl or phenyl radical, particularly preferably hydrogen.
- the reaction mixture further comprises a protic solvent, preferably water or an alcohol.
- a protic solvent preferably water or an alcohol.
- the use of compounds of general formula III allows the particle functionalization even in the absence of water. In a stoichiometric reaction, almost all metal OH and / or SiOH groups on the surface of the particle can be mixed with residues of the general. Saturate formula II. Remaining metal OH and / or SiOH groups that stabilize the are thus largely preventable.
- Particles P are characterized by having metal (MeOH), silicon hydroxide (SiOH), Me-O-Me, Me-O-Si, and / or Si-O-Si functions on their surface , via which a reaction with the compound of general formula III can take place.
- metal oxide and mixed metal oxide particles for example aluminum oxides such as corundum, aluminum mixed oxides with other metals and / or silicon, titanium oxides, zirconium oxides, iron oxides, zinc oxides, etc.
- silica particles for example colloidal oxides
- organic radicals for example silicone resins
- metals with an oxidized surface such as silicon, aluminum, iron.
- the particles P preferably have an average particle size of less than 1 mm, the average size of the particles being determined by transmission electron microscopy.
- these primary particles can be present in isolation. However, they can also be components of larger aggregates and agglomerates.
- Preferred particles P are metal oxides.
- the metal oxide has a specific surface area of preferably 0.1 to
- the particle P may have aggregates (definition according to DIN 53206) in the range of preferably diameters 100 to 1000 nm, wherein the metal oxide of aggregates constructed agglomerates (definition according to DIN 53206), which depends on the external shear stress (eg by the measurement conditions) sizes of 1 to 1000 microns may have.
- the particle P is preferably an oxide with a covalent bond fraction in the metal-oxygen bond, preferably an oxide in the solid state of the main and subgroup elements, such as the third main group, such as boron, aluminum, gallium or indium oxide, or the 4th main group, such as silica, germanium dioxide, or tin oxide or dioxide, lead oxide or dioxide, or a 4th transition group oxide, such as titanium dioxide, zirconium oxide, or hafnium oxide.
- the third main group such as boron, aluminum, gallium or indium oxide
- the 4th main group such as silica, germanium dioxide, or tin oxide or dioxide, lead oxide or dioxide, or a 4th transition group oxide, such as titanium dioxide, zirconium oxide, or hafnium oxide.
- Other examples are stable nickel, cobalt, iron, manganese, chromium or vanadium oxides.
- aluminum (III), titanium (IV) and silicon (IV) oxides such as, for example, precipitated silicas or silica gels, or aluminum oxides, titanium dioxides or silicas prepared in processes at elevated temperature, for example pyrogen produced aluminas, titanium dioxides or silicas.
- Other solids which can be used as particles P are silicates, ⁇
- Further solids which can be used as particles P are carbon blacks, such as flame blacks, furnace blacks, so-called furnace blacks, or carbon blacks which can be used as dye or as reinforcing filler or as rheological additive, so-called "carbon black” carbon blacks.
- fumed silica which is prepared in a flame reaction of organosilicon compounds.
- the production takes place z. B. of silicon tetrachloride, methyldichlorosilane, hydrogentrichlorosilane, hydrogenmethyldichlorosilane, other methylchlorosilanes or alkylchlorosilanes, also mixed with hydrocarbons, eg. B. in a hydrogen-oxygen flame, or even a carbon monoxide
- the preparation of the silica can be carried out optionally with and without the addition of water, for example in the step of purification; preferred is no addition of water.
- the fumed silica has a fractal surface dimension of less than or equal to 2.3, more preferably less than or equal to 2.1, most preferably from 1.95 to 2.05.
- the fractal dimension of the surface D s is as follows defined: Particle surface A is proportional to the particle radius R high D 3 .
- the precipitated silica has a fractal dimension of the mass D m of preferably less than or equal to 2, 8, preferably equal to or less than 2, 7, more preferably from 2, 4 to 2, 6.
- the fractal dimension of the mass D m is defined as follows: Particle mass M is proportional to the particle radius R high D m .
- the silica preferably has a density in a chemical reaction accessible surface silanol groups SiOH of less than 2, 5 SiOH / nm 2, preferably less than 2, 1 SiOH / nm 2, preferably less than 2 SiOH / nm 2, more preferably from 1.7 to 1.9 SiOH / nm 2 .
- silicas prepared by a wet-chemical route or silicas prepared at high temperatures Particular preference is given to pyrogenically prepared silicic acids.
- hydrophilic metal oxides which, freshly prepared, come directly from the burner, are temporarily stored or are already packaged in a commercial manner.
- hydrophobized metal oxides or silicic acids eg. B. commercially available silicas used. It is possible to use uncompressed silicas having bulk densities of preferably less than 60 g / l, but also compacted silicas having bulk densities of preferably greater than 60 g / l.
- the compounds of general formula III can be used alone or in any desired mixtures with organosiloxanes composed of units of the formulas
- R 5 Si0 3/2 are used, the number of these units in egg nem organosiloxane is at least 2, and R 5 is an optionally mono- or polyunsaturated, monovalent, optionally halogenated, hydrocarbon radical having preferably 1 to 18 carbon atoms or halogen, nitrogen radical, OR 6 , OCOR 6 , O (CH 2) X OR 6 where R 6 is hydrogen or a monovalent one
- Hydrocarbon radical having 1 to 18 carbon atoms, and the radicals R 5 may be the same or different.
- the organosiloxanes are preferably liquid at the coating temperature.
- R 1 examples are alkyl radicals such as the methyl radical, the ethyl radical, propyl radicals such as the isopropyl or n-propyl radical, butyl radicals such as the t- or n-butyl radical, pentyl radicals such as the neo, iso or n Pentyl radicals, hexyl radicals such as the n-hexyl radical, heptyl radicals such as the n-heptyl radical, octyl radicals such as the 2-ethylhexyl or the n-octyl radical, decyl radicals such as the n-decyl radical, dodecyl radicals such as the n-dodecyl radical, hexadecyl radicals such as n Hexadecyl radical, octadecyl radicals such as the n-octadecyl radical, alkeny
- R 1 are the methyl radical, the octyl radical and the vinyl radical, particularly preferably the methyl radical.
- organosiloxyariene are linear or cyclic dialkylsiloxanes having an average number of dialkylsiloxy units of greater than 2, preferably greater than 10.
- the dialkylsiloxanes are preferably dimethylsiloxanes.
- Examples of linear polydimethylsiloxanes are those having the terminal groups: trimethylsiloxy, dimethylhydroxysiloxy, dimethylchlorosiloxy, methyldichlorosiloxy, dimethylmethoxysiloxy, methyldimethoxysiloxy, dimethylethoxysiloxy, methyldiethoxysiloxy, dimethylacetoxysiloxy, methyldiacetoxysiloxy; especially Preferred are trimethylsiloxy and dimethylhydroxysiloxy.
- the end groups can be the same or different.
- the particle according to the invention can be prepared in continuous or batch processes.
- the silylation process may be composed of one or more steps.
- the silylated particle is prepared by a process comprising the following steps:
- the silylation is preferably carried out in an atmosphere which does not result in the oxidation of the silylated metal oxide, i. H. preferably less than 10% by volume of oxygen, more preferably less than 2.5% by volume, best results being achieved at less than 1% by volume of oxygen, d. H. that the reaction is carried out in a predominantly inert carrier gas.
- Assignment, reaction and purification can be carried out as a batch or continuous process, for technical reasons, preference is given to a continuous reaction.
- the assignment is preferably carried out at temperatures of -30 - 25O 0 C, preferably 20-150 0 C, more preferably 20-120 0 C;
- the occupation step is cooled to 30-50 0 C.
- the residence time is 1 min. - 48 h, preferably 15 min to 360 min, for reasons of space-time yield particularly preferably 15 min to 90 min.
- the pressure in the occupancy ranges from weak negative pressure to 0, 2 bar to overpressure of 100 bar, for technical reasons normal pressure, that is pressure-free working against outside / atmospheric pressure, is preferred.
- the compound of general formula III is preferably added to the particles as a liquid and in particular mixed into the powdered metal oxide.
- This is preferably done by nozzle techniques or similar techniques, such as effective atomization techniques, such as atomizing in 1-fluid nozzles under pressure (preferably 5 to 20 bar), spraying in 2-fluid nozzles under pressure (preferably gas and liquid 2-20 bar), ultrafine parts with atomizers or gas-solid exchange units with movable, rotating or static internals, which allow a homogeneous mixing of the silane with the powdered metal oxide.
- the silane of the general formula III is preferably added to the metal oxide as a finely divided aerosol which has a sinking rate of 0.1 to 20 cm / s and a droplet size with an aerodynamic particle radius of 5 to 25 ⁇ m.
- the loading of the metal oxide and the reaction with the compound of the general formula III takes place under mechanical or gas-borne fluidization. Particularly preferred is the mechanical fluidization.
- Gas-borne fluidization may be by any inert gas that does not react with the compound of general formula III, the metal oxide, and the silylated metal oxide. that is, do not lead to side reactions, degradation reactions, oxidation processes and flame and explosion phenomena.
- the inert gas is N 2, Ar, others
- the supply of the gases for fluidization preferably takes place in the range of empty-tube gas velocities of 0.55 to 5 cm / s, more preferably of 0.5-2.5 cm / s.
- Particular preference is given to the mechanical fluidization which takes place without additional gas addition beyond the inertization, by paddle stirrers, anchor stirrers and other suitable stirring organs.
- unreacted compound of general formula III and exhaust gases from the purification step are returned to the step of occupying the metal oxide; this can be done partially or completely, preferably at 10-90% of the total volume flow of the gas volumes leaving the purification.
- This recycling is preferably carried out in non-condensed phase, ie as gas or as vapor.
- This recycling can be carried out as mass transfer along a pressure equalization or as controlled mass transport with the technically usual systems of gas transport, such as fans, pumps, compressed air membrane pumps. Since the return of the non-condensed phase is preferred, the heating of the returning lines may be recommended.
- the recycling of the unreacted silane of the general formula III and the exhaust gases can be between 5 and 100% by weight, based on their total mass, preferably between 30 and 80% by weight. % lie .
- the recycling can be based on 100 parts of freshly inserted silane, between 1 and 200 parts, preferably 10 to 30 parts.
- the return of the Abcuri excursi the Silylierretress in the occupancy is preferably carried out continuously.
- the reaction is preferably carried out at temperatures of -30 - 250 0 C, preferably 20-150 0 C and particularly preferably at 20-120 0 C.
- the reaction time is 1 min to 48 h, preferably 15 min. until 6 h.
- protic solvents may be added, such as liquid or volatilizable alcohols or water; typical alcohols are isopropanol, ethanol and methanol. It is also possible to add mixtures of the abovementioned protic solvents.
- acidic catalysts of acidic character in the sense of a Lewis acid or a Brönsted acid, such as chlorine-hydrogen or basic catalysts of basic character, can be added in the sense of a Lewis base or a Brönsted base, such as ammonia. When catalysts are added, they are preferably added in traces, i. H . in amounts less than 1000 ppm. Most preferably, no catalysts are added.
- the dedusting is vozugmik at a cleaning temperature of 20 to 200 0 C, particularly preferably from 50 0 C to 150 0 C, particularly preferably from 50 to 100 0 C.
- the cleaning step is preferably characterized by movement, with slow movement and low mixing being particularly preferred.
- the stirring elements are advantageously adjusted and moved so that preferably a mixing and fluidization occurs.
- the cleaning step may further be characterized by increased gas input, corresponding to an empty-tube gas velocity of preferably 0.001 to 10 cm / s, preferably 0, 01 to 1 cm / s.
- colloidal silicon or metal oxides are used as particles P, which are preferably present as a dispersion of the corresponding oxide particles of micron or submicron size in an aqueous or organic solvent.
- the oxides of the metals aluminum, titanium, zirconium, tantalum, tungsten, hafnium, tin or zinc can preferably be used.
- One or more different particle types P can be used.
- filler systems can be produced which contain corundum in addition to SiO 2.
- Examples of compounds of general formula III which are preferably used are 2, 2-dimethyl-1,4-dioxa-2-silacyclohexane; 2, 2, 5-trimethyl-1,4-dioxa-2-silacyclohexane, 2,2, ⁇ -trimethyl-1,4-dioxa-2-silacyclohexane; 2, 2, 5, 6-tetramethyl-1,4-dioxa-2-silacyclohexane; 2, 2-dimethyl-1,4-dioxa-2-silacycloheptane; 2, 2, 5-trimethyl-1,4-dioxa-2-silacycloheptane; 2, 2, ⁇ -trimethyl-1,4-dioxa-2-silacycloheptane; 2, 2, 7-trimethyl-1,4-dioxa-2-silacycloheptane; 2, 2, 5, 7-tetramethyl-1,4-dioxa-2-silacyclo
- R3, R4 and b have the meanings already mentioned.
- Particularly preferred b is 2, R ⁇ hydrogen radical and R ⁇ is methyl or ethyl radical.
- Such a method may uncatalyzed, preferably at temperatures of 0 0 C to 200 0 C, are performed.
- Reaction temperatures are preferably used edoch j of at least 40 0 C.
- the process can still be improved by adding certain catalysts. These catalysts are acidic or basic compounds and cause both reaction times and reaction temperatures can be reduced.
- the catalyst used is an inorganic or organic Lewis acid or Lewis base, such as organic Bronsted acid or base, an organometallic compound or a halide salt.
- Preferred acids used are carboxylic acids, partially esterified carboxylic acids, in particular monocarboxylic acids, preferably formic acid or acetic acid, or unesterified or partially esterified mono-, oligo- or polyphosphoric acids.
- Preferred bases are preferably alkylammonium hydroxides, alkylammonium siloxanes, ammonium alkoxides, alkylammonium fluorides, amine bases or metal alcoholates or metal alkyls.
- Preferred metal alcoholates are lithium or sodium alcoholates.
- Preferred organometallic reagents are organo-tin compounds, organo-zinc compounds or organotitanium compounds or organo-lithium compounds or. Gringard reagents.
- Preferred salts are tetraalkylammonium fluorides.
- R5 an optionally substituted linear or branched C] _- C3o-alkyl, C2-C4 alkenyl or Q alkoxyalkyl, C2-C4Q-polyether, C5-C] _4-cycloalkyl or
- -Arylrest and v represent the values 0, 1 or 2.
- the catalysts used are deactivated after the functionalization reaction of the silanol groups, preferably by adding so-called anti-catalysts or catalyst poisons, before they can lead to cleavage of the Si-O-Si groups. This side reaction is dependent on the catalyst used and does not necessarily occur, so that it may optionally be possible to dispense with a deactivation.
- catalyst poisons are in the use of bases, for. B. Acids and when using acid, e.g. B. Bases, which ultimately leads to a simple neutralization reaction with corresponding neutralization products, which can optionally be filtered off or extracted. Depending on the use of the product, the corresponding reaction product between catalyst and catalyst poison can either be removed from the product or remain in the product.
- the reaction product after neutralization has a slightly acidic pH of 3 to 7.
- the amount of the compound used of the general formula III is dependent on the amount of Me-OH groups to be functionalized in the filler. However, if a complete functionalization of the OH groups is to be achieved, the compound having units of the general formula III must be added in at least equimolar amounts, based on n. If one uses compound with units of the general formula III in excess, unreacted compound can subsequently either be distilled off or hydrolyzed and then, if appropriate, distilled off.
- the process can be carried out both with the inclusion of solvents, or even without the use of solvents in suitable reactors. If appropriate, work is carried out under reduced pressure or under elevated pressure or at atmospheric pressure (0.1 Mpa).
- solvents are inert, especially aprotic solvents such as aliphatic hydrocarbons, such as. B. Heptane or decane, and aromatic hydrocarbons such. B. Toluene or xylene, preferred. Also, ethers such as THF, diethyl ether or MTBE can be used. The amount of solvent should be sufficient to ensure sufficient homogenization of the reaction mixture. Solvent or solvent mixtures with a boiling point or. Boiling range of up to 12O 0 C at 0, 1 MPa are preferred.
- step (B) 2 a mechanical densification during the silylation, in step (B) 2) the reaction by press rolls, the above-mentioned grinding units such as ball mills or compaction by screws, screw mixers, screw compressors, briquetting.
- the above-mentioned grinding units such as ball mills or compaction by screws, screw mixers, screw compressors, briquetting.
- processes for the mechanical compaction of the metal oxide are used following the purification, such as compaction by aspiration of the air or gas contents by suitable vacuum methods or press rolls or a combination of both processes.
- processes for deagglomerating the metal oxide can be used, such as pin mills or devices for grinding sifting, such as pin mills, hammer mills, countercurrent mills, impact mills or devices for grinding sifting.
- the compound of general formula III is preferably in an amount greater than 0, 5 wt. % (based on the metal oxide), preferably greater than 3 wt. % (based on the metal oxide), more preferably preferably greater than 5 wt.% (Based on the metal oxide) used.
- the surface-modified metal oxide is further characterized by being used in polar systems, such as solvent-free polymers and resins, or solutions, suspensions, emulsions and dispersions of organic resins, in aqueous systems or in organic solvents (e.g. .: Polyester, vinyl esters, epoxides, polyurethanes, alkyd resins and others) has a high thickening effect. It is thus suitable as a rheological additive in the systems mentioned.
- polar systems such as solvent-free polymers and resins, or solutions, suspensions, emulsions and dispersions of organic resins, in aqueous systems or in organic solvents (e.g. .: Polyester, vinyl esters, epoxides, polyurethanes, alkyd resins and others) has a high thickening effect. It is thus suitable as a rheological additive in the systems mentioned.
- the surface-modified metal oxide is further characterized in that it has a low thickening effect in non-polar systems, such as uncrosslinked silicone rubber, but at the same time shows a high reinforcing effect in the crosslinked silicone rubbers and is therefore outstandingly suitable as reinforcing filler for silicone rubbers ,
- the invention thus also relates to a reinforcing filler or a theological additive, which is characterized in that it comprises particles P1 according to the invention, preferably a metal oxide according to the invention, particularly preferably a silica according to the invention.
- the surface-modified particles Pl are characterized in that in powdery systems caked or agglomerated, for. B. prevented under the influence of moisture, but also does not tend to Reagglomeration, and thus the undesirable separation, but powder is flowable and thus allows load-stable and storage-stable mixtures.
- particle amounts of 0.1 to 3% by weight, based on the powdery system, are used.
- the invention further relates to the use of the particles P1 of the invention in systems of low to high polarity as a viscosity-giving component. This applies to all solvent-free, solvent-borne, water-dilutable, film-forming paints, adhesives, sealants and potting compounds as well as other comparable systems.
- the particle can be used in systems such as: epoxy systems,
- the particles P1 provide the required viscosity, intrinsic viscosity, thixotropy and a flow limit which is sufficient for standing on vertical surfaces.
- the particles P1 can be used specifically as a rheological additive and reinforcing filler in uncrosslinked and crosslinked silicone systems such as silicone elastomers composed of silicone polymers such as polydimethylsiloxanes, fillers and other additives.
- silicone elastomers composed of silicone polymers such as polydimethylsiloxanes, fillers and other additives.
- These can be z. B. with peroxides or via addition reactions, the so-called hydrosilylation, between olefinic groups and Si-H groups are crosslinked or via condensation reactions between silanol groups, eg. B. those that develop under the influence of water.
- the particles P1 can also be used as reinforcing filler, rheological additive and additionally as crosslinking component in elastomers, resins, reactive resins, and polymers.
- the particles Pl can also be used as a rheological additive and reinforcing filler and as an additional crosslinking component for improving the mechanical properties, such as impact resistance or scratch resistance of reactive resin systems, such.
- B Epoxy, polyurethane, vinyl ester, unsaturated polyester or methacrylate resins. This applies to all solvent-free, solvent-based, water-dilutable, film-forming paints, adhesives, sealants and potting compounds and other comparable systems. Typical amounts used of the modified particle are in the range of 3 - 50% based on the resin system.
- Another object of the invention are toners, developers and charge control adjuvants containing a surface-modified metal oxide according to the invention.
- Such developers and toners are for.
- These toners may consist of resins, such as styrene resins and acrylic resins, and preferably be ground to particle distributions of 1-100 .mu.m, or may be resins used in polymerization processes in dispersion or emulsion or solution or in bulk to particle distributions of preferably 1-100 ⁇ m were produced.
- the metal oxide is preferably used to improve and control the powder flow behavior and / or to regulate and control the triboelectric charging properties of the toner or developer.
- Such toners and developers can be used in electrophotographic printing and printing processes, and are useful in direct image transfer processes.
- a toner typically has the following composition: solid resin as a binder, which is sufficiently hard to produce a powder thereof, preferably having a molecular weight above 10,000, preferably having a proportion of polymers of a molecular weight below 10,000 of less than 10% by weight. , z. B. a polyester resin which may be a co-condensate of diol and carboxylic acid, ester or anhydride, e.g. B. with an acid number of 1 to 1000, preferably 5 to 200, or a polyacrylate or a polystyrene, or mixtures, or co-polymers thereof, and having a mean particle diameter smaller than 20 microns, preferably less than 15 microns, more preferably less than 10 microns.
- the toner resin may contain alcohols, carboxylic acids and polycarboxylic acid.
- Technically conventional dyes such as black carbon black, carbon black, cyan dyes, magenta dyes, yellow dyes.
- polyamines typically less than 5% by weight. %.
- Optionally negative charge control agents Charge controlling additives such as metal-containing azo dyes, or copper phthalocyanine dyes, or metal complexes of, for example, alkylated salicylic acid derivatives or benzoic acid, especially with boron or aluminum, in the required amounts, typically less than 5 wt %.
- Charge controlling additives such as metal-containing azo dyes, or copper phthalocyanine dyes, or metal complexes of, for example, alkylated salicylic acid derivatives or benzoic acid, especially with boron or aluminum, in the required amounts, typically less than 5 wt %.
- magnetic powders may be added to produce magnetic toners, such as.
- B. Powders that can be magnetized in a magnetic field such as ferromagnetic substances, such as iron, cobalt, nickel, alloys, or compounds such as magnetite, hermatite or ferrite.
- developers may also be added, such as iron powder, glass powder, nickel powder, ferrite powder.
- - Metal oxide is in contents, based on a solid resin binder with 20 micron average particle diameter, greater than 0, 01 wt.%, Preferably greater than 0, 1 wt.% Used. With decreasing average particle diameter of the binder, higher levels of metal oxide are generally required, with the necessary amount of metal oxide increasing in inverse proportion to the particle diameter of the binder.
- the content of me- However, tallow oxide is preferably less than 5% by weight in each case. % based on binder resin.
- inorganic additives such as finely divided and coarse silica, including those with 100 to 1000 nm average diameter, aluminum oxides, such as pyrogenic aluminas, titanium dioxides, such as pyrogenic or Anastas or rutile, zirconium oxides, are possible.
- Waxes such as paraffinic waxes having 10 to 500 carbon atoms, silicone waxes, olefinic waxes, waxes having an iodine value of less than 50, preferably less than 25, and a saponification number of 10 to 1000, preferably 25 to 300, can be used.
- the toner can be used in various development processes, such as electrophotographic imaging and reproduction, such as. B. magnetic brush method, cascade method, use of conductive and non-conductive magnetic systems, powder cloud method, development in impression and others.
- the filtrate was fractionally distilled twice under normal pressure, wherein at the 132 0 C passing fraction 26 g of pure 2, 2-dimethyl-2-sila-l, 4-cyclohexane (132, 23 g / mol, 20 mmol) in a yield of 27%.
- the mixture was homogenized by stirring and then heated to 6O 0 C for 3 h. After neutralization of the catalyst with phosphoric acid, the toluene and excess silane were removed. The silicic acid thus charged no longer showed any free Si-OH groups in 29 Si NMR.
- .% SiO 2 mean particle size - at a temperature of 25 0 C in a 100 ml 3-neck of the company NIS san Chemicals, 30 weight be pistons 50, 0 g of an SiO 2 organosol (IPA-ST® 12 nm) 1.98 g (14, 9 mmol) of 2, 2-dimethyl- [1, 4] dioxa-2-sila-cyclohexane.
- the mixture is stirred for 6 h at 5O 0 C and for an additional 24 h at room temperature to yield a clear suspension containing egg weak Tyndall effect.
- 1 H-NMR and 29 Si-NMR show that approx. 80% of the cyclic silane have reacted with the particle. This turnover can not be further increased by longer reaction times.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Silicon Compounds (AREA)
- Cosmetics (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005005046A DE102005005046A1 (de) | 2005-02-03 | 2005-02-03 | Hydroxyalkyl-funktionalisierte Füllstoffe |
| PCT/EP2006/000691 WO2006081979A1 (de) | 2005-02-03 | 2006-01-26 | Hydroxyalkyl-funktionalisierte füllstoffe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1846495A1 true EP1846495A1 (de) | 2007-10-24 |
Family
ID=36264067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06701799A Withdrawn EP1846495A1 (de) | 2005-02-03 | 2006-01-26 | Hydroxyalkyl-funktionalisierte füllstoffe |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7576229B2 (de) |
| EP (1) | EP1846495A1 (de) |
| JP (1) | JP2008530258A (de) |
| KR (1) | KR100887273B1 (de) |
| CN (1) | CN101115794A (de) |
| DE (1) | DE102005005046A1 (de) |
| WO (1) | WO2006081979A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007052269A1 (de) * | 2007-11-02 | 2009-05-07 | Evonik Degussa Gmbh | Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator |
| US7985292B2 (en) | 2007-11-26 | 2011-07-26 | Evonik Degussa Corporation | Precipitated silica for thickening and creating thixotropic behavior in liquid systems |
| DE102008031901A1 (de) * | 2008-07-08 | 2010-01-14 | Eckart Gmbh | Metalleffektpigmente, Verfahren zu deren Herstellung sowie Verwendung derselben und Pulverlack |
| DE102008044396A1 (de) * | 2008-12-05 | 2010-06-10 | Wacker Chemie Ag | Hochhydrophobe Beschichtungen |
| JP4894876B2 (ja) * | 2009-03-25 | 2012-03-14 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、トナーカートリッジ、プロセスカートリッジ及び画像形成装置 |
| KR101757786B1 (ko) | 2012-05-18 | 2017-07-14 | 스미토모 오사카 세멘토 가부시키가이샤 | 표면수식 금속산화물 입자재료, 분산액, 실리콘 수지 조성물, 실리콘 수지 복합체, 광반도체 발광 장치, 조명 기구 및 액정 화상 장치 |
| TWI582150B (zh) * | 2012-05-18 | 2017-05-11 | Sumitomo Osaka Cement Co Ltd | Surface-modified metal oxide particle material, dispersion liquid, polysiloxane resin composition, polysiloxane resin composite, optical semiconductor light emitting device, lighting device and liquid crystal image device |
| DE102013205347A1 (de) * | 2013-03-26 | 2014-10-02 | Hilti Aktiengesellschaft | Additiv-Zusammensetzung für Amin-Härter, deren Verwendung sowie diese enthaltende Amin-Härterzusammensetzung |
| JP2016057457A (ja) * | 2014-09-09 | 2016-04-21 | 富士ゼロックス株式会社 | 静電荷像現像剤、画像形成方法、及び、画像形成装置 |
| JP2021528349A (ja) * | 2018-06-19 | 2021-10-21 | ローディア オペレーションズ | 口腔ケア組成物のためのシリカ |
| UA129167C2 (uk) * | 2020-01-14 | 2025-01-29 | Евонік Оперейшнс Гмбх | Колоїдний оксид кремнію з активною модифікованою поверхнею |
| EP4317063A4 (de) * | 2021-03-24 | 2025-07-30 | Dainippon Ink & Chemicals | Molybdänverbindung und verfahren zur herstellung davon |
| JP7041787B1 (ja) * | 2021-10-20 | 2022-03-24 | デンカ株式会社 | 球状シリカ粒子の製造方法 |
| JP7041786B1 (ja) * | 2021-10-20 | 2022-03-24 | デンカ株式会社 | 球状シリカ粒子及びそれを用いた樹脂組成物 |
| JP7041788B1 (ja) * | 2021-10-20 | 2022-03-24 | デンカ株式会社 | 球状シリカ粒子及びそれを用いた樹脂組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2113297A1 (de) * | 1971-03-19 | 1972-09-21 | Bayer Ag | Leicht dispergierbare anorganische Pigmente |
| US5595593A (en) * | 1995-10-12 | 1997-01-21 | Dow Corning Corporation | Treatment of fillers with oxa-silacycloalkanes |
-
2005
- 2005-02-03 DE DE102005005046A patent/DE102005005046A1/de not_active Withdrawn
-
2006
- 2006-01-26 CN CNA2006800040182A patent/CN101115794A/zh active Pending
- 2006-01-26 JP JP2007553508A patent/JP2008530258A/ja not_active Withdrawn
- 2006-01-26 KR KR1020077020122A patent/KR100887273B1/ko not_active Expired - Fee Related
- 2006-01-26 WO PCT/EP2006/000691 patent/WO2006081979A1/de not_active Ceased
- 2006-01-26 US US11/815,354 patent/US7576229B2/en not_active Expired - Fee Related
- 2006-01-26 EP EP06701799A patent/EP1846495A1/de not_active Withdrawn
Non-Patent Citations (3)
| Title |
|---|
| "There's more than one way to measure powder particle size!", METAL POWDER REPORT, MPR PUBLISHING SERVICES, SHREWSBURY, GB, vol. 58, no. 11, 11 October 2003 (2003-10-11), pages 26 - 31, XP004471292, ISSN: 0026-0657 * |
| BOWEN P: "Particle Size Distribution Measurement from Millimeters to Nanometers and from Rods to Platelets", JOURNAL OF DISPERSION SCIENCE AND TECHNOLOGY, TAYLOR AND FRANCIS GROUP, NEW YORK, NY, US, vol. 23, no. 5, 1 January 2002 (2002-01-01), pages 631 - 662, XP009102859, ISSN: 0193-2691, DOI: DOI:10.1081/DIS-120015368 * |
| STANLEY-WOOD N: "Particle size analysis: Introduction", 1 January 2000, ENCYCLOPEDIA OF ANALYTICAL CHEMISTRY, XX, XX, PAGE(S) 1 - 37, XP002510930 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008530258A (ja) | 2008-08-07 |
| KR20070100418A (ko) | 2007-10-10 |
| KR100887273B1 (ko) | 2009-03-06 |
| US20080139833A1 (en) | 2008-06-12 |
| DE102005005046A1 (de) | 2006-08-10 |
| WO2006081979A1 (de) | 2006-08-10 |
| CN101115794A (zh) | 2008-01-30 |
| US7576229B2 (en) | 2009-08-18 |
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